JP4628564B2 - Coating device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a coating apparatus that applies a coating liquid onto a substrate, and more particularly, to a coating apparatus that can accurately apply a coating liquid onto a substrate.
[0002]
[Prior art]
Conventionally, when producing a housing-related member, furniture, a blind or the like, a coating liquid is applied by dropping the coating liquid from a curtain head onto a substrate.
[0003]
The coating liquid freely falls from the curtain head and is dropped onto the traveling substrate, and thus a coating film having a certain thickness can be formed on the substrate.
[0004]
Such a coating method is also used when a resist or the like is applied to a substrate such as a film.
[0005]
[Problems to be solved by the invention]
By the way, when applying the coating liquid by dripping the coating liquid from the curtain head onto the base material, an air flow is caught between the base material and the coating liquid while the base material is running, and bubbles are formed in the coating film. May remain. In this case, it is difficult to obtain a desired coating solution quality by the bubbles.
[0006]
The present invention has been made in consideration of such points, and an object of the present invention is to provide a coating apparatus capable of coating a coating liquid on a substrate with high accuracy.
[0007]
[Means for Solving the Problems]
The present invention comprises a dip tank in which a base material enters and a supporting liquid is housed, and a curtain head that is provided in the dip tank and discharges a coating liquid toward the base material. The coating liquid is applied via the dip tank, and the dip tank stores a solvent that is incompatible with the coating liquid discharged from the curtain head as a supporting liquid .
[0008]
According to the present invention, the substrate travels in the support liquid of the dip tank. During this time, the coating liquid is discharged from the curtain head toward the base material, and the coating liquid from the curtain head is applied onto the base material via the support liquid. For this reason, bubbles are not caught between the substrate and the coating liquid.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0010]
1 and 2 are diagrams showing an embodiment of a coating apparatus according to the present invention.
[0011]
As shown in FIGS. 1 and 2, the coating apparatus 10 includes a dip tank 11 in which a base material W such as a film enters and a support liquid 12 is stored, and a guide that is provided in the dip tank 11 and guides the base material W. The roller 13 and the curtain head 14 which is provided in the dip tank 11 and discharges the coating liquid 19 to the base material W are provided.
[0012]
Among these, for example, a resist solution is discharged from the curtain head 14 to the substrate W as a coating solution 19, and a solvent that is not compatible with the resist solution is stored in the dip tank 11 as the support solution 12.
[0013]
The curtain head 14 is supplied with a resist solution from a supply source 17 through a supply line 16 and a pump.
[0014]
Further, the substrate W on which the coating liquid 19 is applied in the dip tank 11 is then sent to the drying device 18.
[0015]
Next, the operation of the embodiment of the present invention having such a configuration will be described.
[0016]
First, the traveling substrate W enters the dip tank 11 in which the support liquid 12 is stored, and the substrate W passes through the guide roll 13 and is sent outward from the dip tank 11.
[0017]
During this time, the coating liquid 19 is discharged from the curtain head 14 to the substrate W. The coating liquid 19 from the curtain head 14 freely falls downward in the support liquid 12, reaches the base material W, and is then applied onto the base material W.
[0018]
Although the base material W travels in the dip tank 11, the base material W travels in the support liquid 12, so that no bubbles are caught in the base material W. For this reason, the coating liquid 19 discharged from the curtain head 14 is applied onto the substrate W via the support liquid 12 without entraining bubbles.
[0019]
The base material W coated with the coating liquid 19 is then discharged outward from the support liquid 12 and dried in the drying device 18. In this way, a product 20 having a three-layer structure including the substrate W, the support film 12a made of the support liquid 12, and the coating film 19a made of the coating liquid 19 is obtained (FIG. 2).
[0020]
In the product 20 shown in FIG. 2, since no entrainment of bubbles occurs between the substrate W and the coating film 19a, the support film 12a and the coating film 19a can be formed with substantially uniform film thicknesses. . For this reason, the accuracy of the product 20 can be improved. Furthermore, the product 20 having a desired layer structure can be obtained by appropriately selecting the support liquid 12 and the coating liquid 19.
[0021]
In the embodiment described above, an example in which a resist solution is used as the coating solution 19 and a solvent incompatible with the resist solution is used as the support solution 12 is shown. However, the support solution 12 is not compatible with the resist solution. In addition, it is preferable to use one having the same or faster drying speed than the resist solution.
[0022]
【The invention's effect】
As described above, according to the present invention, the coating liquid can be applied via the support liquid without entraining bubbles on the substrate. For this reason, the film thicknesses of the support film made of the support liquid and the coating film made of the coating liquid can be made uniform. Therefore, the support film and the coating film can be formed on the substrate with high accuracy.
[Brief description of the drawings]
FIG. 1 is a schematic view showing an embodiment of a coating apparatus according to the present invention. FIG. 2 is a diagram showing a product obtained by the coating apparatus.
DESCRIPTION OF SYMBOLS 10 Coating apparatus 11 Dip tank 12 Support liquid 13 Guide roller 14 Curtain head 19 Coating liquid 20 Product

Claims (1)

A dip tank in which the base material enters and the supporting liquid is stored;
A curtain head that is provided in the dip tank and discharges the coating liquid toward the substrate;
Apply the coating liquid on the substrate via the support liquid ,
The dip tank stores a solvent which is not compatible with the coating liquid discharged from the curtain head as a supporting liquid .

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