JP4627771B2 - Charged particle beam equipment - Google Patents

Description

The present invention relates to a charged particle beam apparatus using a charged particle beam such as an electron beam or an ion beam, and in particular, to obtain a high resolution image while suppressing degradation of resolution even when the charged particle beam is tilted on a sample. The present invention relates to a suitable charged particle beam apparatus.

In a charged particle beam apparatus typified by a scanning electron microscope, desired information (for example, a sample image) is obtained from a sample by scanning a charged particle beam that is finely focused on the sample. In such a charged particle beam apparatus, the resolution has been increasing year by year, and at the same time, it has recently been necessary to tilt the charged particle beam with respect to the sample to obtain a tilted image of the sample. In general, the sample stage is tilted to obtain a tilted image of the sample. However, in order to prevent field shift at a high magnification and to obtain a sample tilted image at a higher speed, the sample stage is mechanically tilted. The reason is that it is more reasonable to tilt the charged particle beam with respect to the sample than to do it.

As a technique for tilting the charged particle beam while maintaining the high resolution conditions of the apparatus, the charged particle beam is incident off the axis of the objective lens in Japanese Utility Model Laid-Open No. 55-48610 and Japanese Patent Laid-Open No. 2-333843, A method using the focusing action (backing action) of the objective lens is disclosed. JP 2000-3
Japanese Patent No. 48658 discloses a method in which charged particle beams are deflected in directions opposite to each other within a focusing magnetic field of an objective lens.
A technique for correcting off-axis chromatic aberration generated when a charged particle beam is tilted off the axis of the objective lens is disclosed. Japanese Patent Laid-Open No. 2001-15055 discloses a chromatic aberration (off-axis chromatic aberration) generated off the axis of the objective lens by providing a deflection means for passing the charged particle beam off the axis of the objective lens on the electron source side of the objective lens. Has been disclosed that reduces resolution degradation when a charged particle beam is tilted by correcting it with a Wien filter provided on the electron source side of the objective lens. Further, WO 01/33603 discloses that a Wien filter that generates an orthogonal electromagnetic field in an arbitrary two-dimensional direction orthogonal to the optical axis is arranged on the optical axis closer to the electron source than the objective lens, and is off-axis in an arbitrary direction. A technique for correcting chromatic aberration is disclosed.
Japanese Utility Model Publication No.55-48610 JP-A-2-33843 JP 2000-348658 Japanese Patent Laid-Open No. 2001-15055 WO 01/33603

JP-A-2000-348658 describes a method of deflecting a charged particle beam in two steps within a magnetic field of an objective lens, in which the objective lens magnetic field, which has become common in recent years, leaks to the sample side to achieve high resolution. For the obtained method, the space in which the two-stage deflecting means is to be placed is between the objective lens magnetic pole and the sample, so that it is necessary to increase the distance between the objective lens magnetic pole and the sample and high resolution can be obtained. There is a problem that disappears. For this reason, Japanese Patent Application Laid-Open No. 2000-348658 discloses that the magnetic pole of the objective lens is 4
The technology to switch the combination of magnetic poles for high-resolution observation and charged particle beam tilting is shown, but this method is used when the number of magnetic poles increases and the axis shifts or switches between the magnetic poles. It is necessary to solve these problems (magnification deviation, axis deviation, change in scanning conditions, etc.), and there is a problem with practical difficulties.

In general, when the charged particle beam is tilted by utilizing the off-axis property of the objective lens, not only off-axis chromatic aberration but also coma aberration is generated, and off-axis chromatic aberration is dominant at low acceleration voltage. When high acceleration voltages are used, coma rather than off-axis chromatic aberration becomes a problem. Therefore, it is important to remove coma at a relatively high acceleration voltage. Even at a low acceleration voltage, coma aberration increases when the tilt angle of the charged particle beam is increased, so that high resolution cannot be obtained even if off-axis chromatic aberration is corrected. Therefore, in order to obtain a high-resolution image by tilting the charged particle beam at a high angle, it is necessary to correct off-axis chromatic aberration and coma at the same time.
In the prior art described in Japanese Patent No. 48658, this point is not taken into consideration, and there is a problem that the resolution is lowered when tilting at a high angle.

On the other hand, in the technique described in Japanese Patent Application Laid-Open No. 2001-15055, off-axis chromatic aberration that occurs when a charged particle beam is incident off the axis of the objective lens is corrected by the Wien filter. Therefore, there is a problem that the resolution is lowered when the charged particle beam is tilted at a high angle or when the charged particle beam is tilted with respect to a relatively high acceleration voltage.

The aberration that occurs when the charged particle beam (beam) is tilted on the sample using the swinging action of the objective lens will be described with reference to FIG. When the beam 4 is deflected at the object point of the objective lens 7 by the beam tilt angle control coil 51 and is incident off the axis of the objective lens 7, the beam 4 is tilted on the sample 10 by the focusing action of the objective lens 7. In this case, since the object point position seen from the objective lens 7 has not moved, the field of view does not move even if the beam is tilted. When the visual field shift when the beam is tilted is corrected, the beam in principle satisfies the deflection condition shown in FIG.

The aberrations of the objective lens that occur when the object point is on the optical axis are spherical aberration and axial chromatic aberration. At this time, the aberration (Δw _i ) generated in the objective lens is expressed by the following polynomial (1) as a function of the orbital gradient (w ′ _i ) on the sample. The orbital gradient is represented by a derivative with respect to the optical axis z of the orbital function w (w = x + j · y: j is an imaginary unit of a complex number), and in this specification, a derivative with respect to z is represented by a dash “′”.

When the beam is tilted by the swinging action of the objective lens, the orbital gradient on the sample (w ' _i )
Is the orbital gradient (w ' _t ) corresponding to the beam tilt angle and the orbital gradient (w' _f ) related to the beam opening angle.
) As the sum of

FIG. 3 is a schematic diagram showing the state of the beam in the orbital gradient coordinate system (w ′ _i -coordinate system) on the sample. The horizontal axis in FIG. 3 represents the inclination of the trajectory in the X direction on the image plane, and the vertical axis represents the inclination of the trajectory in the Y direction. Since the gradient of the orbit is expressed by a differential with respect to z, the dash “′” is added as described above. The circular figure (beam region) shown in FIG. 3 represents the region of this set because the primary beam is expressed as a set of trajectories having various gradients by the focusing action of the lens. In FIG. 3, since the center of the beam focusing trajectory corresponds to the beam tilt (w ′ _t ), the circular figure is displaced from the center of the coordinate system (x _i ′, y _i ′) by this amount. The aberration when the beam is tilted can be obtained by substituting Equations (3) and (4) into Equation (1) as Equation (5).

When formula (5) is developed, formula (6) is obtained, and originally Seidel aberration (spherical aberration, coma aberration, astigmatism, field curvature aberration, Distortion)
It can be seen that on-axis chromatic aberration and off-axis chromatic aberration occur.

  These aberrations are listed below by item.

Among the items described above, the term including w ′ _t is an aberration generated by the beam tilt, and includes coma, astigmatism, curvature of field aberration, distortion, and off-axis chromatic aberration. w ' _f ),
And only aberrations including energy range ΔV function ε _i (coma, astigmatism, field curvature,
Off-axis chromatic aberration) reduces resolution when the beam is tilted.

Among the aberrations that reduce the resolution when the beam is tilted, astigmatism can be easily corrected by a commonly used astigmatism correction coil. Further, the field curvature aberration can be eliminated by correcting the focus condition (objective lens current) because it is out of focus due to beam tilt. Furthermore, the distortion can be eliminated if the irradiation position is corrected in conjunction with the beam inclination because the irradiation position is shifted due to the beam inclination. Therefore, the aberrations to be finally considered are off-axis chromatic aberration and coma aberration, both of which increase in proportion to the beam tilt angle (w ′ _t ).

An object of the present invention is to provide a charged particle beam apparatus capable of removing the above-described off-axis chromatic aberration and coma aberration by a practically easy method and capable of tilting a high angle beam while suppressing a decrease in resolution.

In order to achieve the above object, at least two or more stages of focusing lenses including an objective lens are arranged, and a deflecting unit for making a beam incident outside each lens axis is provided, and off-axis aberrations (off-axis chromatic aberration and (Or coma aberration) cancel each other, that is, the sum of off-axis aberrations generated in each lens is zero or close to zero. In addition, means for controlling astigmatism in conjunction with the beam tilt angle is provided to enable correction of astigmatism that varies with the beam tilt angle. It is also effective to control the focal length of the objective lens in conjunction with the beam tilt angle. Furthermore, it has become possible to correct the deviation of the irradiation position in conjunction with the beam tilt angle.

As another configuration, a diaphragm mechanism is provided in place of the deflecting means, and the passage of the beam is limited so that the beam is substantially incident outside the lens axis.

According to the present invention, it is possible to obtain a high-resolution tilt observation image without being affected by off-axis chromatic aberration, coma aberration, and astigmatism even when beam tilting using the focusing action of the objective lens is performed. Become.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, the same functional parts are denoted by the same reference numerals, and redundant description is omitted.

FIG. 1 is a schematic configuration diagram of a scanning electron microscope which is an example of the present invention. Cathode 1 and first anode 2
In the meantime, a voltage is applied by the high-voltage control power source 20 controlled by the computer 40, and the primary electron beam 4 is drawn from the cathode 1 with a predetermined emission current. An acceleration voltage is applied between the cathode 1 and the second anode 3 by a high-voltage control power source 20 controlled by a computer 40, and the primary electron beam 4 emitted from the cathode 1 is accelerated and proceeds to the subsequent lens system. . The primary electron beam 4 is focused by the focusing lens 5 controlled by the lens control power source 21, and after the unnecessary region of the primary electron beam is removed by the diaphragm plate 8, the focusing lens 6 controlled by the lens control power source 22, And the object lens 7 controlled by the object lens control power source 23 is focused on the sample 10 as a minute spot. The objective lens 7 can take various forms such as an in-lens system, an out-lens system, and a snorkel system (semi-in-lens system). A retarding method is also possible in which a negative voltage is applied to the sample to decelerate the primary electron beam. Furthermore, each lens may be composed of an electrostatic lens composed of a plurality of electrodes.

The primary electron beam 4 is scanned by a scanning coil 9 controlled by a scanning coil control power supply 24 and a sample 10.
The top is scanned two-dimensionally. The secondary signal 12 such as secondary electrons generated from the sample 10 by the irradiation of the primary electron beam travels to the upper part of the objective lens 7 and then the orthogonal electromagnetic field generator 1 for secondary signal separation.
1 is separated from the primary electrons and detected by the secondary signal detector 13. Secondary signal detector 13
After being amplified by the signal amplifier 14, it is transferred to the image memory 25 and displayed on the image display device 26 as a sample image.

A two-stage deflection coil 51 is disposed at the same position as the scanning coil 9, and the tilt control power supply 31 is provided.
The primary electron beam 4 incident on the objective lens so that the object point of the objective lens becomes a deflection fulcrum by
Can be controlled two-dimensionally. In this way, the beam can be tilted with respect to the optical axis of the objective lens. An astigmatism correction coil 53 is disposed in the vicinity of the focusing lens 6 and is controlled by the astigmatism correction power source 33 in conjunction with the beam tilt condition. A two-stage deflection coil 52 is disposed between the focusing lens 6 and the aperture plate 8, and the primary incident on the focusing lens 6 by the aberration control power supply 32 so that the object point of the focusing lens 6 becomes a deflection fulcrum. The position of the electron beam 4 can be controlled two-dimensionally. In addition to the primary electron beam position control signal in which the object point of the objective lens is the deflection fulcrum, a control signal that can two-dimensionally control the irradiation position of the primary electron beam on the sample can be passed to the deflection coil 51. The displacement of the irradiation position can be corrected in conjunction with the beam tilt condition.

The sample stage 15 has at least two directions (X direction, Y direction) in a plane perpendicular to the primary electron beam.
The sample 10 can be moved in the direction). From the input device 42, an image capture condition (
It is possible to specify scanning speed, acceleration voltage, etc.) and beam tilt conditions (tilt direction and tilt angle), and output of images, storage in the storage device 41, and the like.

[Example 1]
An embodiment for correcting off-axis chromatic aberration that occurs when the beam is tilted by the scanning electron microscope having the configuration shown in FIG. 1 will be described below in detail with reference to FIG.
When the primary beam 4 is deflected by the deflection coil 52 (hereinafter, this deflection coil 52 is referred to as an aberration control coil) so that the object point of the focusing lens 6 becomes a deflection fulcrum, the aberration of the same property as that of the beam tilting is obtained. Can be generated. When the beam energy at the image point of the focusing lens 6 (crossover point) and V _1, the parameters of the energy width corresponding to formula (2) is represented by the following formula (13).

On the other hand, if the angular magnification of the objective lens is Ma, the beam converging angle (w '
_f1 ) is given by equation (14).

Furthermore, if the beam tilt angle (for aberration correction) of the focusing lens 6 is w ′ _t1 and the ratio to the beam tilt angle w ′ _t by the objective lens 7 is represented by k, it is generated in the focusing lens 6 from the equation (15). The amount Δw ₁ at which the aberration appears at the final focus point is expressed by Equation (16), where M is the optical magnification of the objective lens.

C _s1 : spherical aberration coefficient of the focusing lens 6
C _c1 : On-axis chromatic aberration coefficient of the focusing lens 6 From this, the beam tilt condition (condition of k) of the focusing lens 6 for canceling off-axis chromatic aberration generated by the objective lens 7 is expressed by the following equation (18) )

Here, a minus sign is attached to the right side of the equation (18), but in the case of the configuration of FIG. 4, the optical magnification M is a minus value and the value of k in the equation (18) is a plus. . For example, the value of equation (18) is 0
If it becomes 0.2, the beam may be tilted by the focusing lens 6 by an angle 0.2 times the beam tilt angle by the objective lens 7. The beam tilt angle by the objective lens 7 depends on the deflection coil 5.
1 (hereinafter, this deflection coil 51 is referred to as a beam tilt angle control coil), the relationship between the current of the beam tilt angle control coil 51 and the beam tilt angle by the corresponding objective lens 7 is stored in the storage device 41 in advance. It can be preset by registering. Further, since the beam tilt angle by the focusing lens 6 is proportional to the current of the aberration control coil 52, the relationship between the current of the aberration control coil 52 and the beam tilt angle by the focusing lens 6 is preset in the storage device 41 or the like. Can be kept. With these preset conditions and the value of equation (18), the beam inclination angle control power supply 31 and the beam inclination angle control power source 31 are set so that the proportional relationship between the currents of the beam inclination angle control coil 51 and the aberration control coil 52 satisfies the value k of equation (18). The aberration control power source 32 can be controlled by the computer 40. On the other hand, if the sign of k in equation (18) is negative, it means that the beam is tilted by the focusing lens 6 in the direction opposite to the beam tilt direction of the objective lens. Aberration correction coil 52 for beam tilt angle control coil 51
The current of reverse polarity.

  On the other hand, when the condition for canceling the coma aberration is obtained, Expression (20) is obtained from Expression (19).

Since the value of k in this case is generally different from the value of k in equation (18), when the value of k in equation (20) is selected, equation (18) is not satisfied, and chromatic aberration is associated with beam tilt. Will occur. this is,
Since the shapes of the objective lens 7 and the focusing lens 6 are different, the ratio between the magnitude of chromatic aberration and coma aberration that occurs when the beam is tilted by the objective lens 7 is the chromatic aberration that occurs when the beam is tilted by the focusing lens 6. And the coma aberration magnitude ratio does not match.

In this embodiment, for example, when the off-axis chromatic aberration is dominant at a low acceleration voltage of 5 kV or less, the beam tilt angle control coil 51 and the aberration control coil 52 are interlocked so as to satisfy the condition of Expression (18). And control. Further, since the coma aberration is dominant under the condition that the acceleration voltage exceeds 5 kV, the beam tilt angle control coil 51 and the aberration control coil 52 are controlled in conjunction so as to satisfy the equation (20). The acceleration voltage that determines the boundary between chromatic aberration control and coma aberration control depends on the spherical aberration coefficient and axial chromatic aberration coefficient of the objective lens, and the energy width of the primary electron beam. Therefore, the acceleration voltage at the boundary is limited to 5 kV. Is not to be done. Since the optimum control condition of the aberration control coil 52 is proportional to the beam tilt angle, in this embodiment, an appropriate condition is preset in advance for a specific beam tilt angle, and from this value, control for an arbitrary beam tilt angle is performed. The conditions are calculated to determine the interlocking condition between the beam tilt angle control coil 51 and the aberration control coil 52, and each coil is controlled.

[Example 2]
When the off-axis chromatic aberration and the coma aberration are affected to the same extent when the beam is tilted, or when the beam tilt angle is large, for example, 5 ° or more, it is necessary to correct the off-axis chromatic aberration and the coma aberration at the same time.
In order to simultaneously correct the off-axis chromatic aberration and the coma aberration, it is necessary that Expression (18) and Expression (20) have the same value of k. In order to satisfy this condition, it is necessary to set conditions including the optical magnification (lateral magnification) of the objective lens. This condition is given by equation (22) using relational equation (21) well known in electron optical theory.

Expression (22) can be satisfied by setting the focal position of the focusing lens 6 to a predetermined condition. That is, the value of M increases when the focal position of the focusing lens 6 is moved toward the objective lens, and the value of M decreases when the focus lens 6 is moved away from the objective lens. Therefore, as shown in FIG. 5, when A (= M ² (C _ci / C _si ) − (C _c1 / C _s1 )) is taken on the vertical axis and the focal position of the focusing lens 6 is taken on the horizontal axis, A It is possible to find the focal position where = 0. Since the focus position where A = 0 is satisfied, that is, the condition satisfying the equation (22), this focus position can be determined in advance by simulation or experiment.

Using the relationship of Equation (21), Equation (20) that gives the optimal control condition for the aberration control coil 52 is
(23)

In the present embodiment, the excitation condition of the focusing lens 6 is set so as to satisfy the relationship of the equation (21), and the beam tilt angle control coil 51 and the aberration control coil 52 are interlocked so as to satisfy the relationship of the equation (23). Control.

A control flow for simultaneously correcting chromatic aberration and coma will be described with reference to the flowchart of FIG.

First, the focal position of the focusing lens 6 for realizing the value of M satisfying the equation (22) is obtained in advance by simulation or experiment and registered in the storage device 41 (step 11). Next, a value of k that satisfies Equation (23) is calculated in advance and registered in the storage device 41. As the value of k, a value determined in advance by simulation or experiment can be used (step 12).

Further, the relationship between the beam tilt angle by the objective lens 7 and the current of the beam tilt angle control coil 51 is obtained in advance by simulation or experiment and registered in the storage device 41 (step 13), and the beam tilt angle by the focusing lens 6 and the aberration control coil are registered. The relationship between the currents of 52 is obtained in advance by simulation or experiment and registered in the storage device 41 (step 14). Next, the relationship between the currents of the beam tilt angle control coil 51 and the aberration control coil 52 is obtained from the value of k satisfying Expression (23), and the storage device 41 is obtained.
(Step 15).

Next, the current of the beam tilt angle control coil 51 is set by the computer 40 from the relationship registered in step 13 and the beam tilt angle (step 16), and the beam tilt angle control coil 51 is handled from the relationship registered in step 15. The current of the aberration control coil 52 to be set is set (step 17).

Example 3
In this embodiment, the astigmatism correction coil and the objective lens current are further controlled in conjunction with the beam tilt. Astigmatism generated by the beam tilt increases in proportion to the square of the beam tilt angle (w ′ _t ), as is apparent from the equation (9). The beam tilt angle (w ' _t ) is determined by the beam tilt angle control coil 5.
In this embodiment, astigmatism is corrected for astigmatism as shown in FIG. 9 with respect to a plurality of predetermined conditions for the current of the beam tilt angle control coil 51. The operation conditions of the correction coil 53 are preset in the storage device 41 or the like. Astigmatism caused by the beam tilt has a beam tilt angle of 0 (the current of the beam tilt angle control coil 51 is 0).
) Is the difference between the astigmatism correction amount (Isx0, Isy0) and the astigmatism correction amount at an arbitrary beam tilt angle. Therefore, the astigmatism correction current under the condition that the current (Ix, Iy) of the beam tilt angle control coil 51 is (0, 0) and the predetermined current (Ix0, Iy0) is (Isx0, Isy0) at ( Ix, Iy) = (0
, 0), (Isx1, Isy1) at (Ix, Iy) = (Ix0, 0), (Isx2, Isy2) at (Ix, Iy) = (0, Iy0), (Isx
3, Isy3) at (Ix, Iy) = (Ix0, Iy0) is preset in the storage device 41, and the computer 40 determines the current (Ix,
The current (Isx, Isy) of the astigmatism correction coil 53 with respect to Iy) is controlled in conjunction with the following.

With this control, the astigmatism correction coil 53 is set so that astigmatism is automatically corrected even if the beam tilt angle is controlled by setting the current of the beam tilt angle control coil 51.

Further, when the current (Ix, Iy) of the beam tilt angle control coil 51 is changed from (0, 0) to (Ix0, 0), the focus current (objective lens current) shift is ΔIo1 and (Ix, Iy) is (0 , 0) to (0
, Iy0) is registered in the storage device 41 as ΔIo2, respectively. The computer 40 uses these registered values to select an arbitrary beam tilt angle control coil 51.
The focus current correction value ΔIo is controlled in conjunction with the current (Ix, Iy) in the following manner.

By this control, even if the beam tilt angle is controlled by setting the current of the beam tilt angle control coil 51, the focus shift is automatically corrected.

Example 4
FIG. 7 shows an embodiment in which the focusing lens 6 is composed of two lenses. In order to generate an aberration that cancels coma generated in the objective lens due to beam tilt in the focusing lens closer to the electron source than the objective lens, it is necessary to increase the spherical aberration of the focusing lens. What happens is the expression (2
This is because the contribution (aberration correction amount) given by the spherical aberration of the focusing lens to the final focus point becomes smaller in proportion to the cube of the optical magnification (M <1) of the objective lens, as shown in 3). Therefore, a focusing lens having a small pole hole diameter and a small gap is desirable so that a large spherical aberration can be obtained when the beam is tilted. On the other hand, a lens having a large spherical aberration brings a disadvantage for high-resolution observation. In this embodiment, in order to achieve both a purpose specialized for high resolution and a beam tilt function, a lens 61 having a large geometric aberration is paired with a lens 61 having a small geometric aberration such as spherical aberration.

According to the present embodiment, a high resolution lens (a lens having a magnetic pole having a large hole diameter) 61 is used for an application not tilting the beam, and a lens having a large geometric aberration (a small hole diameter and a small gap) is used for tilting the beam. The lens can be switched to a lens 62 having a magnetic pole. That is, at the time of high resolution observation, the high resolution lens 61 having a small geometric aberration is used and the lens 62 having a large geometric aberration is turned off. On the other hand, when the beam is tilted, a lens 62 having a large geometric aberration is used.
The high resolution lens 61 is turned off. Further, by making the aberration control coil 63 also function as an alignment coil for correcting the axial deviation, the axial deviation associated with the switching of the magnetic pole can be solved.

In the embodiments described above, the method of correcting the aberration of the objective lens caused by the beam tilt with another lens is disclosed. However, two or more lenses are used to correct the aberration of the objective lens. Is also possible.

For example, the principle of correcting the aberration of the objective lens with a plurality of lenses will be described with reference to FIG. 8, taking chromatic aberration occurring when the beam is tilted as an example. The chromatic aberration that occurs when the beam is tilted by the objective lens has an X component and a Y component corresponding to the beam tilt direction. This aberration is generated not only in the objective lens but also in any converging lens if the beam is tilted, but the magnitude varies depending on the magnetic pole shape of the lens and the operating conditions (focal length, etc.). Therefore, when a plurality of lenses are used and the beam is tilted by each lens, the sum (vector sum) of the chromatic aberration vector created by them and the chromatic aberration vector created by the objective lens becomes 0 as shown in FIG. By returning, the chromatic aberration of the objective lens is corrected. Therefore, any number of lenses may be used for correction, and it is important that the sum of chromatic aberration vectors is zero. Similarly, coma aberration occurs in the direction and magnitude corresponding to the beam tilt, and therefore FIG.
The figure shown in Fig. 5 is also applied as a coma correction principle.

Hereinafter, another embodiment of the present invention will be described with reference to FIGS. FIGS. 10 to 18 are diagrams showing examples of trajectory control for reducing the sum of aberrations generated by a plurality of lenses including the objective lens to 0 when the beam is tilted by the objective lens.

Example 5
FIG. 10 is a diagram illustrating an example of trajectory control when one deflector is disposed between the focusing lens 6 and the diaphragm 8. In this example, the aberration control coil 52 formed of a two-stage deflector disposed between the diaphragm 8 and the focusing lens 5 creates a condition for the primary electron beam 4 to pass through at the center of the hole of the diaphragm 8. The deflector 521 disposed between the focusing lens 6 and the focusing lens 6 controls the trajectory so that the deflection fulcrum of the primary electron beam 4 viewed from the focusing lens 6 becomes the focusing point A of the focusing lens 5. The focusing point B of the focusing lens 6 coincides with the deflection fulcrum of the beam tilt angle control coil 51, and the primary electron beam 4 is tilted by the operation of the beam tilt angle control coil 51 and the objective lens 7.

Example 6
FIG. 11 is a diagram illustrating an example of trajectory control when a deflector cannot be disposed between the focusing lens 6 and the diaphragm 8. In this example, the primary electron beam is such that the deflection fulcrum of the primary electron beam 4 apparently coincides with the electron source position by the aberration control coil 52 formed of a two-stage deflector disposed between the focusing lens 5 and the electron source. 4 trajectories are controlled. At this time, since the direction of the aberration generated by the focusing lens 5 is reversed by the focusing lens 6, in order to cancel the aberration generated by the objective lens 7, the primary electron beam 4 when passing through the focusing lens 5 is used. The direction of deviation of the orbit is opposite to that in FIG. 10 (the direction of aberration is opposite). The position of the focusing point A of the focusing lens 5 is the deflector 52.
1 (deflection fulcrum), and the trajectory of the primary electron beam 4 is made to coincide with the optical axis again with the focusing point A as a deflection fulcrum.

Example 7
FIG. 12 is a diagram illustrating an example of trajectory control when the diaphragm 8 is disposed between the focusing lens 6 and the objective lens 7. In this example, since it is difficult to correct the aberration of the objective lens 7 with the focusing lens 6, the focusing lens 5 corrects the aberration of the objective lens that occurs when the primary electron beam 4 is tilted, as in FIG. Aberrations necessary for this are generated.

Example 8
FIG. 13 is a diagram showing an example of trajectory control when the beam is tilted by correcting aberrations in an optical system that uses a two-stage lens system by once converging the beam between the lenses. FIG.
In the example of FIG. 3, the diaphragm 8 is disposed between the focusing lens 5 and the electron source, and the aberration control coil 52 including a two-stage deflector disposed between the diaphragm 8 and the focusing lens 5 apparently causes the electron source. The beam is deflected so that the position becomes a deflection fulcrum. A beam tilt angle control coil 51 is disposed at the beam focusing point by the focusing lens 5, and the sample 10 is formed by the beam tilt angle control coil 51.
Control the beam tilt angle above.

Example 9
FIG. 14 is a diagram illustrating an example of trajectory control when the beam is tilted by correcting aberration in an optical system that uses a two-stage lens system and does not focus the beam in the middle of the lens.
When the beam is not focused halfway between the lenses, the direction of the aberration generated by the focusing lens 5 is not reversed halfway, so that the beam tilt angle control is performed in order to cancel the aberration of the focusing lens 5 and the aberration of the objective lens 7. The direction of deflection by the coil 51 and the deflection direction of the aberration control coil 52 are opposite.

Example 10
FIG. 15 is a view showing an embodiment in which the position of the diaphragm 8 is arranged in the middle of the focusing lens 5 and the objective lens 7 with respect to the optical system in FIG. 14 (a crossover is not made in the middle). In this example, a beam tilt angle control coil 51 is arranged before and after the aperture 8 so that the primary electron beam 4 passes through the center of the aperture of the aperture 8, and the beam tilt is performed so that the deflected trajectory passes through the center of the aperture 8. Angle control coil 51
To work.

Example 11
FIG. 16 is a diagram illustrating an example of trajectory control when the primary electron beam 4 is tilted by the objective lens 7 in a state where a negative voltage (Vr) is applied to the sample 10. When a negative voltage (Vr) is applied to the sample 10, the primary electron beam 4 is rapidly decelerated immediately before the sample 10, so that the beam tilt angle on the sample can be made larger than when no negative voltage is applied. .

Example 12
FIG. 17 is a diagram showing an embodiment in which the thin film sample 10 is irradiated with the primary electron beam 4 tilted by the objective lens 7 and the electrons 121 transmitted through the sample 10 are detected. When acquiring a scanning transmission image (STEM image) of a thin film sample having a crystal structure, it is often necessary to make the irradiation direction of the primary electron beam correspond to the crystal direction of the sample. Since the crystal orientation of the sample varies depending on the variation in cutting out the thin film slice, the crystal orientation deviates from several degrees to about 10 degrees in an arbitrary direction. Therefore, compared to the method of aligning the sample mechanically tilted, as in this example,
By arbitrarily tilting the primary electron beam while suppressing a decrease in resolution, the alignment operation between the crystal and the electron beam becomes extremely simple. Below the thin film sample 10, a deflector 54 for aligning the transmitted electrons 121 with respect to the transmitted electron detector 131 is disposed.
It is controlled in conjunction with the tilt angle of the primary electron beam 4. Although not shown in FIG. 17, a means (such as a lens or a diaphragm) for limiting the detection angle of transmitted electrons can be disposed between the thin film sample 10 and the transmitted electron detector 131.

Example 13
FIG. 18 is a diagram illustrating an example of trajectory control when two focusing lenses 6 a and 6 b are arranged between the diaphragm 8 and the objective lens 7. In this example, the primary electron beam 4 between the focusing lenses 6a and 6b.
Is provided, and the aberration control coil 52 is disposed at the position of the focusing point, and aberration is generated by the focusing lens 6b. A beam tilt angle control coil 51 is disposed at the focal position of the primary electron beam by the focusing lens 6b, and the primary electron beam 4 is incident off the axis of the objective lens 7 to tilt the beam with respect to the optical axis. The aberration control coil 52 is configured so that the aberration generated in the objective lens 7 is the focusing lens 6b.
It is controlled to cancel with the aberration of.

Example 14
FIG. 19 to FIG. 25 show an embodiment in which a diaphragm moving mechanism is adopted as an optical axis control means for controlling the incident position with respect to a plurality of lens groups for focusing charged particle beams. In particular, FIG. 19 shows the overall configuration of a scanning electron microscope for pattern dimension measurement and shape observation formed on a semiconductor wafer. Here, a different part from the schematic block diagram of FIG. 1 is demonstrated.

An astigmatism correction coil 53 and an aligner coil 55 that corrects an irradiation position shift caused by the operation of the astigmatism correction coil 53 are arranged at substantially the same height as the first focusing lens 5. Via the computer 40. The diaphragm plate 8 can be moved with high accuracy in a plane perpendicular to the optical axis by the drive mechanism 18. The drive mechanism 18 is a computer 40.
It is connected to the. A two-stage image shift coil 57 and an alignment coil 56 are arranged at the same position as the scanning coil 9 and are connected to the computer 40 via power supplies 37 and 36, respectively.

A scanning electron microscope for observing a semiconductor wafer generally uses a low-acceleration primary electron beam of about several hundred volts from the viewpoint of preventing damage to a sample. To achieve low resolution and high resolution,
A retarding power source 38 is connected to apply a negative voltage to the sample 10 to decelerate the primary electron beam 4. Further, the boosting power source 39 is connected and a positive high voltage is applied to the boosting electrode 16 to accelerate the primary electron beam later, thereby reducing the chromatic aberration of the objective lens 7 and increasing the resolution.

The retarding and boosting voltages are applied in the vicinity of the surface of the sample 10 with secondary electrons 12.
An electric field distribution that accelerates the light toward the reflecting plate (conversion electrode) 17 is formed. As a result, the accelerated secondary electrons 12 pass through the scanning coil 9 and collide with the reflecting plate 17 to be converted into new secondary electrons 65. The converted secondary electrons 65 are detected by the secondary signal detector 13.

FIG. 20 shows the trajectory of the primary electron beam 4 in this embodiment in detail. In this example, the crossover 4 c of the second focusing lens 6 is made to coincide with the position of the aligner coil 56. The emitted electrons 4a extracted from the cathode 1 are sufficiently spread compared with the aperture diameter of the aperture plate 8. The off-axis primary electron beam 4b can be selected and used by moving the aperture within the irradiation range of the emitted electrons 4a. The tilt angle w ′ _t1 of the second focusing lens 6 and the movement amount δ of the diaphragm are in a proportional relationship, and the off-axis chromatic aberration is controlled by controlling the beam tilt angle w ′ _t with the aligner coil 56 so as to satisfy Expression (18). A tilted image with no image can be obtained.

The feature of this method is that it can be realized simply by replacing the diaphragm with a computer-controlled drive mechanism from manual operation. Further, since the primary electron beam 4b passes off-axis from the cathode 1 to the crossover 4c of the second focusing lens 6, the aberration coefficient of the correction lens is several times larger than the aberration coefficient of the second focusing lens alone. Thus, it is possible to correct off-axis chromatic aberration up to a large inclination angle.

FIG. 21 shows changes in the correction condition k when the position of the crossover 4c is changed from the second focusing lens 6 side to the objective lens 7 side. When the crossover 4c is brought closer to the objective lens 7, k becomes small, and it can be confirmed that there is one point of the crossover 4c that satisfies the condition that the off-axis chromatic aberration and the coma aberration can be corrected simultaneously, that is, the expression (22).

FIG. 22 shows the movement of the diaphragm 8 when the position of the crossover 4c is changed from the second focusing lens 6 side to the objective lens 7 side under the condition of the equation (18) in which off-axis chromatic aberration is corrected. The change in the quantity δ is shown. It can be seen that when the crossover 4c is brought closer to the objective lens 7, the movement amount δ decreases.

FIG. 23 shows individual aberration amounts and final values when the position of the crossover 4c is changed from the second focusing lens side to the objective lens side under the condition of the equation (18) in which the off-axis chromatic aberration is corrected. The change in beam diameter (or resolution) is shown. When the crossover 4c is brought close to the objective lens,
Although the coma aberration decreases, the reflection of the diffraction aberration and the light source size (contraction rate of the electron source tip diameter by the lens) increases, and the optimum position of the crossover 4c is determined.

FIG. 24 shows an embodiment in which the resolution is prioritized and the position of the crossover 4 c is not matched with the position of the aligner coil 56. In this case, the virtual object point 4 viewed from the objective lens 7
Since d does not coincide with the crossover 4c, the beam arrival position 4e on the sample 10 is displaced from the central axis, but can be moved on the central axis by controlling the image shift coil 57. Alternatively, the sample stage 15 can be moved to avoid visual field shift. In any case, the relationship between the beam tilt angles can be controlled by the computer 40 by presetting the relationship in the storage device 41 in advance.

FIG. 25 shows an execution flowchart of beam tilt including the above-described field deviation correction. When the beam is moved to the observation point (S21) and a beam tilt command is issued (S22), the movement amount of the diaphragm 8 and the current amount of the aligner coil 56 are calculated from the preset values according to the requested beam tilt angle. Then, beam tilt and aperture movement are executed (S23). At the same time, the focus correction value and the astigmatism correction value are predicted from the preset values according to the requested beam tilt angle, and the primary correction is executed (S24). Subsequently, according to the required beam tilt angle, correction of visual field deviation,
Distortion correction is executed (S25). Since the focus and astigmatism corrections in step 24 are roughly matched, the secondary correction can be completed in a narrower search range compared to normal autofocus and autoastigmatism (S26), and high-resolution image acquisition can be achieved. Yes (S27). After acquiring the image,
The beam tilt angle is returned to 0, and the visual field shift correction in step 25 is canceled (S28).

1 is a schematic configuration diagram of a scanning electron microscope that is an example of the present invention. The principle figure of the beam inclination method using the focusing effect | action of an objective lens. The figure which shows distribution of the orbital gradient at the time of beam inclination. The principle figure which correct | amends the aberration at the time of beam inclination. The figure showing the conditions of a focusing lens focal position for correcting chromatic aberration and coma simultaneously. The flowchart of the beam inclination which correct | amends a chromatic aberration and a coma aberration simultaneously. The block diagram of the focusing lens comprised with four magnetic poles. The figure which shows the principle which correct | amends the chromatic aberration of the objective lens which generate | occur | produces at the time of beam inclination by the effect | action of a some lens. The figure showing the relationship between the beam tilt angle control coil current and the astigmatism correction coil current for correcting astigmatism generated by the beam tilt. The figure which shows the example of the trajectory control for correct | amending the aberration of an objective lens. The figure which shows the example of the trajectory control for correct | amending the aberration of an objective lens. The figure which shows the example of the trajectory control for correct | amending the aberration of an objective lens. The figure which shows the example of orbit control when making the crossover (focusing point) of a beam in the middle and tilting a beam in a two-stage lens system. The figure which shows the example of orbit control when inclining a beam, without making the crossover (focusing point) of a beam in the middle in a two-stage lens system. FIG. 5 is a diagram illustrating an example of trajectory control when a diaphragm plate is disposed between two-stage lenses in a two-stage lens system and the beam is tilted without forming a beam crossover (focusing point) on the way. The figure which shows the example of orbit control when a negative voltage is applied to a sample and a primary electron beam is inclined by an objective lens. The figure which shows the Example which irradiates the beam inclined with the objective lens to the thin film sample, and obtains a scanning transmission image (STEM image). The figure which shows the example of orbit control when two condensing lenses are arrange | positioned between an aperture stop and an objective lens. The whole block diagram of the scanning electron microscope which is the other example of this invention. The detailed explanatory view of the orbit of the primary electron beam. The figure which shows the change of the correction conditions k at the time of changing the crossover position of a 2nd focusing lens. The figure which shows the change of the aperture movement amount (delta) at the time of changing the crossover position of a 2nd focusing lens. The figure which shows the change of the individual aberration amount when the crossover position of a 2nd focusing lens is changed, and the final beam diameter. The figure which shows the Example at the time of not making the position of a crossover correspond with the position of an aligner coil. The execution flowchart of beam inclination.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Cathode, 2 ... 1st anode, 3 ... 2nd anode, 4 ... Primary electron beam, 5 ... 1st focusing lens, 6 ... 2nd focusing lens, 7 ... Objective lens, 8 ... Diaphragm plate, 9 ... Scanning coil DESCRIPTION OF SYMBOLS 10 ... Sample, 11 ... Orthogonal electromagnetic field (ExB) generator for secondary signal separation, 12 ... Secondary signal, 13 ... Detector for secondary signal, 1
DESCRIPTION OF SYMBOLS 4 ... Signal amplifier, 15 ... Sample stage, 20 ... High voltage control power supply, 21 ... First focusing lens control power supply, 22 ... Second focusing lens control power supply, 23 ... Objective lens control power supply, 24 ... Scanning coil control power supply, 25 ... Image memory, 26: Image display device, 31: Beam tilt angle control power source, 32: Aberration control power source, 33: Astigmatism correction power source, 40 ... Computer, 41 ... Storage device, 42 ... Input device, 51 ... Beam tilt angle control Coil, 52 ... aberration control coil, 53 ... astigmatism correction coil, 54 ... deflector, 61 ... high resolution lens, 62 ... beam tilting lens (for aberration correction),
63: Alignment and aberration control deflector, 121: Transmitted electron, 131: Transmitted electron detector, 521: Deflector

Claims (9)

In a charged particle beam apparatus comprising a charged particle source and a charged particle optical system that focuses the charged particle beam emitted from the charged particle source and scans it on the sample,
The charged particle optical system includes:
An objective lens that focuses and irradiates the charged particle beam on the sample;
Another lens that is disposed between the objective lens and the charged particle source and that irradiates the objective lens with the charged particle beam without creating a crossover with the objective lens;
A first deflector that deflects the charged particle beam so as to be tilted from the off-axis of the objective lens and irradiate the sample by passing the off-axis of the objective lens;
Coma aberration generated by the objective lens and the other lens by passing the off-axis of the other lens by deflecting the charged particle beam in a direction opposite to the deflection direction of the first deflector. And a second deflector that cancels the charged particle beam device.   2. The charged particle beam apparatus according to claim 1, wherein the first deflector deflects the charged particle beam that has passed through the other lens in a direction opposite to a deflection direction by the second deflector. A charged particle beam apparatus comprising: a coil; and a second coil that deflects the charged particle beam deflected by the first coil toward the objective lens.   The charged particle beam apparatus according to claim 2, wherein a diaphragm is disposed between the first coil and the second coil.   2. The charged particle beam apparatus according to claim 1, further comprising means for applying a negative voltage to the sample. In a charged particle beam apparatus comprising a charged particle source and a charged particle optical system that focuses the charged particle beam emitted from the charged particle source and scans it on the sample,
The charged particle optical system includes:
An objective lens that focuses and irradiates the charged particle beam on the sample;
Another lens that is disposed between the objective lens and the charged particle source and that irradiates the charged particle beam to the objective lens without focusing the charged particle beam between the objective lens and
A first deflector that deflects the charged particle beam so as to be tilted from the off-axis of the objective lens and irradiate the sample by passing the off-axis of the objective lens;
Coma aberration generated by the objective lens and the other lens by passing the off-axis of the other lens by deflecting the charged particle beam in a direction opposite to the deflection direction of the first deflector. A charged particle beam apparatus comprising a second deflector for canceling the above.   6. The charged particle beam apparatus according to claim 5, wherein the first deflector deflects the charged particle beam that has passed through the other lens in a direction opposite to a deflection direction by the second deflector. A charged particle beam apparatus comprising: a coil; and a second coil that deflects the charged particle beam deflected by the first coil toward the objective lens.   The charged particle beam apparatus according to claim 6, wherein a diaphragm is disposed between the first coil and the second coil.   6. The charged particle beam apparatus according to claim 5, further comprising means for applying a negative voltage to the sample. In a charged particle beam apparatus comprising a charged particle source and a charged particle optical system that focuses the charged particle beam emitted from the charged particle source and scans it on the sample,
The charged particle optical system includes:
An objective lens that focuses and irradiates the charged particle beam on the sample;
Another lens that is disposed between the objective lens and the charged particle source and that irradiates the objective lens with the charged particle beam without creating a crossover with the objective lens;
It said charged the particle source is arranged between the other lens, the first coil and the charged particle beam deflected by the first coil for deflecting the charged particle beam emitted from the charged particle source A second coil that deflects in the opposite direction to the first coil and passes off-axis of the other lens;
Wherein said other lens is disposed between the objective lens, the third coil and said third coil for deflecting in the opposite direction to the previous SL first coil a charged particle beam having passed through the other lens charged particle beam apparatus characterized in that a fourth coil for deflecting the charged particle beam in the opposite direction to the.

Images