JP4581243B2 - Low temperature tank equipment - Google Patents

Low temperature tank equipment Download PDF

Info

Publication number
JP4581243B2
JP4581243B2 JP2000390827A JP2000390827A JP4581243B2 JP 4581243 B2 JP4581243 B2 JP 4581243B2 JP 2000390827 A JP2000390827 A JP 2000390827A JP 2000390827 A JP2000390827 A JP 2000390827A JP 4581243 B2 JP4581243 B2 JP 4581243B2
Authority
JP
Japan
Prior art keywords
line
low
temperature tank
liquid
boiling point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000390827A
Other languages
Japanese (ja)
Other versions
JP2002188798A (en
Inventor
康雄 国府田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IHI Corp
Original Assignee
IHI Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IHI Corp filed Critical IHI Corp
Priority to JP2000390827A priority Critical patent/JP4581243B2/en
Publication of JP2002188798A publication Critical patent/JP2002188798A/en
Application granted granted Critical
Publication of JP4581243B2 publication Critical patent/JP4581243B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Description

【０００１】
【発明の属する技術分野】
本発明は、低沸点液を低温タンクへ供給しない時に受入ライン内の低沸点液の突沸を防止する低温タンク設備に関するものである。
【０００２】
【従来の技術】
一般に低温タンク設備は、図３に示す如く、低温タンク１に対して供給源のタンカー２より液化天然ガス（ＬＮＧ）等の低沸点液を供給し得るよう、タンカー２に接続するローディングアーム３と、ローディングアーム３より低温タンク１まで延在する受入ライン４とを備えている。
【０００３】
受入ライン４は、ローディングアーム３から所定位置まで供給用の開閉弁５を介して延在する一系統配管６と、一系統配管６から低温タンク１側の所定位置まで二系統の流路に分岐されて略平行に延在する二系統配管７と、二系統配管７から低温タンク１の屋根１ａまで供給用の開閉弁８を介して延在する一系統配管９とから構成されている。
【０００４】
二系統配管７は、全長にわたって桟橋等の種々の構造物に沿う様々な高低差の段差部１０を備えており、二系統配管７の低温タンク１側には、夫々供給用の開閉弁１１を設けている。
【０００５】
又、二系統配管７から低温タンク１までの間の一系統配管９は、供給用の開閉弁８の上流側より循環用の開閉弁１２を介して低温タンク１の胴部１ｂに接続する下方ライン１３を設けている。
【０００６】
一方、低温タンク１には、送出ポンプ１４を備えた送出ライン１５を接続し、送出ライン１５における送出ポンプ１４の下流側には、低沸点液を加熱して気化する気化器１６を設け、低沸点液を低温タンク１より消費先へ気化ガスとして送出するようになっている。
【０００７】
又、低温タンク１には、二系統配管７のうち一方の配管７ａへ低沸点液を導入するよう、循環ポンプ１７を備えた循環ライン１８を接続している。
【０００８】
低温タンク１へ低沸点液を供給する場合には、供給源のタンカー２にローディングアーム３を接続して受入ライン４の全ての供給用の開閉弁５，１１，８を開き、タンカー２より、ローディングアーム３、ローディングアーム３と二系統配管７の間の一系統配管６、二系統配管７、二系統配管７と低温タンク１の間における一系統配管９を順に介して低温タンク１へ低沸点液を供給する。
【０００９】
一方、低温タンク１へ低沸点液を供給しない場合には、受入ライン４を常に低沸点液を供給可能な温度にするよう受入ライン４に低沸点液を常時満たしており、更に、受入ライン４内の低沸点液が熱流体上の不安定現象（ガイザリング現象）により突沸しないよう、二系統配管７のうち一方の配管７ａの供給用の開閉弁１１ａと、ローディングアーム３と二系統配管７の間における一系統配管６の供給用の開閉弁５とを夫々閉じると共に、二系統配管７のうち他方の配管７ｂの供給用の開閉弁１１ｂと、下方ライン１３の循環用の開閉弁１２とを夫々開き、次いで循環ライン１８の循環ポンプ１７を駆動することによって、低沸点液を、循環ライン１８から、二系統配管７の一方の配管７ａ、二系統配管７の他方の配管７ｂ、下方ライン１３、低温タンク１、循環ライン１８と順に循環させている。
【００１０】
【発明が解決しようとする課題】
しかしながら、従来の低温タンク設備は、受入ライン４の低沸点液を循環させる動力源として循環ポンプ１７を用いるため、設備全体の建設費が増加し、更に、低沸点液を循環させる際には常に循環ポンプ１７を駆動する必要があるため、維持費が増大するという問題があった。
【００１１】
本発明は、循環ポンプを用いることなく受入ラインに低沸点液を循環させる低温タンク設備を提供することを目的としている。
【００１２】
【課題を解決するための手段】
本発明の低温タンク設備は、低温タンクへ供給源より所定高さの段差部を経て低沸点液を供給し得る二系統の流路を備え且つ低沸点液を供給する開閉弁の開閉により前記段差部を介して低沸点液を二系統の流路の間で循環させるよう構成した受入ラインと、前記低温タンクから消費先に低沸点液を気化ガスとして送出する送出ラインとを備えた低温タンク設備であって、前記受入ラインの二系統の流路のうち一方の流路に、前記送出ラインの気化ガスを前記段差部の下方より導入するガス導入ラインを備えるものである。
【００１３】
又、本発明の低温タンク設備は、ガス導入ラインを受入ラインの中で最も高低差のある段差部の下端に接続してもよい。
【００１４】
本発明の低温タンク設備において低温タンクへ低沸点液を供給しない場合には、受入ラインの開閉弁を開閉して二系統の流路の間で低沸点液を互いに流通可能な状態にし、次いでガス導入ラインから受入ラインの段差部に下方より気化ガスを導入して段差部内で気化ガスを上昇させ、気化ガスのガスリフト作用により二系統の流路の間で低沸点液を互いに循環させ、熱流体上の不安定現象（ガイザリング現象）による受入ライン内の低沸点液の突沸を防止している。
【００１５】
このように、ガス導入ラインより導入する気化ガスを動力源として二系統の受入ライン内の低沸点液を循環させるので、動力源の循環ポンプを設ける必要がなく設備全体の建設費、維持費を低減することができる。
【００１６】
ガス導入ラインを受入ラインの中で最も高低差のある段差部の下端に接続すると、導入した気化ガスによるガスリフト作用を一層高めるので、低沸点液を二系統の受入ライン内で確実に循環させることができる。
【００１７】
【発明の実施の形態】
以下、本発明の実施の形態を、図示例と共に説明する。
【００１８】
図１、図２は本発明の低温タンク設備の実施の形態例であって、図中、図３と同一の符号を付した部分は同一物を表わしている。
【００１９】
受入ライン４における二系統配管７のうち一方の配管７ａで最も高低差のある段差部１０の下端には、送出ライン１５における気化器１６の下流側から分岐して延在するガス導入ライン２０を接続しており、配管７ａにおける段差部１０の下流側で所定高さの位置には、受入ライン４内に生じるガスを排出するよう排出調整弁２１を備えた排出ライン２２を設け、排出ライン２２には低沸点液の液面の高さより排出調整弁２１を制御するレベルコントローラ２３を備えている。ここで、ガス導入ライン２０を備える段差部１０の高低差は５ｍ〜１０ｍ、好ましくは７ｍ〜８ｍがよい。
【００２０】
又、ガス導入ライン２０の中途部には、受入ライン４内に導入する気化ガスの流量を調節するガス流量調整弁２４を備え、ガス導入ライン２０におけるガス流量調整弁２４の上流側にはガス流量調整弁２４を制御するフローコントローラ２５を備えている。
【００２１】
更に、ローディングアーム３から二系統配管７までの間の一系統配管６には、二系統配管７のうち一方の配管７ａに備えられた排出ライン２２と略同様に、受入ライン４内のガスを排出するよう排出調整弁２６を備えた排出ライン２７を設け、排出ライン２７には、低沸点液の液面の高さより排出調整弁２６を制御するレベルコントローラ２８を備えている。
【００２２】
一方、受入ライン４の二系統配管７のどちらか一方（図１では配管７ａ）には、循環ポンプ１７を備えた循環ライン１８を設けることなく、送出ライン１５における送出ポンプ１４と気化器１６の間の所定位置より分岐して延在する液導入ライン２９を接続し、液導入ライン２９の中途部には、受入ライン４内に低沸点液の液量を調節する液量調整弁３０を備え、液量調整弁３０は、二系統配管７から低温タンク１までの間における一系統配管９の開閉弁８近傍に備えられたレベルコントローラ３１により制御されている。
【００２３】
以下、本発明の実施の形態例の作用を説明する。
【００２４】
低温タンク１へ低沸点液を供給しない場合には、ローディングアーム３と二系統配管７の間における一系統配管６の供給用の開閉弁５と、二系統配管７と低温タンク１の間における下方ライン１３の開閉弁１２とを夫々閉じると共に、二系統配管７の供給用の開閉弁１１ａ，１１ｂを夫々開き、更にガス導入ライン２０から段差部１０の下端に気化ガスを導入する。
【００２５】
この時、受入ラインの段差部１０に導入する気化ガスの流速は、フローコントローラ２５により計測され、所定の流量になるようガス流量調整弁２４により調整されている。
【００２６】
次いで段差部１０の下端に気化ガスが導入されると、気化ガスは段差部１０を上昇することにより気化ガスのガスリフト作用で二系統配管７内の低沸点液を循環させ、熱流体上の不安定現象（ガイザリング現象）による受入ライン４内の低沸点液の突沸を防止する。
【００２７】
ここで、受入ライン４において一般的な配管の長さ及び配管径を備えている場合には、経験的に低沸点液を２時間〜７時間で循環させることが好ましい。
【００２８】
ローディングアーム３と二系統配管７の間の一系統配管６、及び二系統配管７と低温タンク１の間の一系統配管９及び下方ライン１３においては、夫々の内部の低沸点液が、二系統配管７内で互いに循環する低沸点液によって徐々に置換され、熱流体上の不安定現象（ガイザリング現象）による低沸点液の突沸を防止している。
【００２９】
更に、受入ライン４に気化ガスが溜まった際には、レベルコントローラ２３，２８によって低沸点液の液面位置を測定することにより、排出調整弁２１，２６を介して排出ライン２２，２７より外部へ排出している。又、受入ライン４の低沸点液の液量が気化等により減少した際には、レベルコントローラ３１によって低沸点液の液面位置を測定することより低沸点液の減少量分を計測し、液量調整弁３０を介して液導入ライン２９より減少量分の低沸点液を充填している。
【００３０】
このように、ガス導入ライン２０より導入する気化ガスを動力源として二系統配管７内の低沸点液を循環させるので、動力源の循環ポンプ１７を設ける必要がなく設備全体の建設費、維持費を低減することができる。
【００３１】
ガス導入ライン２０を受入ライン４の中で最も高低差のある段差部１０の下端に接続すると、導入した気化ガスによるガスリフト作用を一層高めるので、低沸点液を二系統の受入ライン４内で確実に循環させることができる。
【００３２】
なお、本発明の低温タンク設備は、上述の実施の形態例に限定されるものではなく、気化ガスは他のラインで生じたものを用いてもよいこと、その他本発明の要旨を逸脱しない範囲内において種々変更を加え得ることは勿論である。
【００３３】
【発明の効果】
本発明の低温タンク設備によれば、下記の如き種々の優れた効果を奏し得る。
【００３４】
Ｉ）ガス導入ラインより導入する気化ガスを動力源として二系統の受入ライン内の低沸点液を循環させるので、動力源の循環ポンプを設ける必要がなく設備全体の建設費、維持費を低減することができる。
【００３５】
ＩＩ）ガス導入ラインを受入ラインの中で最も高低差のある段差部の下端に接続すると、導入した気化ガスによるガスリフト作用を一層高めるので、低沸点液を二系統の受入ライン内で確実に循環させることができる。
【図面の簡単な説明】
【図１】本発明の低温タンク設備の実施の形態の一例を示す全体系統図である。
【図２】低沸点液に気化ガスを導入するよう段差部に導入配管を接続した状態を示す概略図である。
【図３】従来の低温タンク設備を示す全体系統図である。
【符号の説明】
１ 低温タンク
２ タンカー（供給源）
４ 受入ライン
５ 供給用の開閉弁（開閉弁）
７ 二系統配管（二系統の流路）
８ 供給用の開閉弁（開閉弁）
１０ 段差部
１１ 供給用の開閉弁（開閉弁）
１５ 送出ライン
２０ ガス導入ライン[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a low-temperature tank facility that prevents bumping of a low-boiling liquid in a receiving line when the low-boiling liquid is not supplied to a low-temperature tank.
[0002]
[Prior art]
In general, the low temperature tank facility includes a loading arm 3 connected to the tanker 2 so that a low boiling point liquid such as liquefied natural gas (LNG) can be supplied to the low temperature tank 1 from a tanker 2 as a supply source, as shown in FIG. And a receiving line 4 extending from the loading arm 3 to the low temperature tank 1.
[0003]
The receiving line 4 branches from the loading arm 3 to a predetermined position via a supply opening / closing valve 5 and a two-channel flow path from the single line piping 6 to a predetermined position on the low temperature tank 1 side. The two-line pipe 7 extending substantially in parallel and the one-line pipe 9 extending from the two-line pipe 7 to the roof 1a of the low-temperature tank 1 via the supply on-off valve 8 are configured.
[0004]
The two-line piping 7 is provided with various height difference steps 10 along various structures such as a pier over the entire length, and a supply on-off valve 11 is provided on the low-temperature tank 1 side of the two-line piping 7. Provided.
[0005]
Further, the one-line pipe 9 between the two-line pipe 7 and the low-temperature tank 1 is connected to the body 1b of the low-temperature tank 1 from the upstream side of the supply on-off valve 8 via the circulation on-off valve 12. Line 13 is provided.
[0006]
On the other hand, the low temperature tank 1 is connected with a delivery line 15 equipped with a delivery pump 14, and a vaporizer 16 for heating and vaporizing the low boiling point liquid is provided on the downstream side of the delivery pump 14 in the delivery line 15. The boiling liquid is sent from the low temperature tank 1 to the consumer as vaporized gas.
[0007]
In addition, a circulation line 18 having a circulation pump 17 is connected to the low temperature tank 1 so as to introduce a low boiling point liquid into one of the two pipes 7.
[0008]
When supplying a low boiling point liquid to the low temperature tank 1, the loading arm 3 is connected to the tanker 2 of the supply source, and all the on-off valves 5, 11, 8 for the supply line 4 are opened. Low boiling point to the low temperature tank 1 through the loading arm 3, the one line piping 6 between the loading arm 3 and the two line piping 7, the two line piping 7, the one line piping 9 between the two line piping 7 and the low temperature tank 1 in order. Supply liquid.
[0009]
On the other hand, when the low-boiling point liquid is not supplied to the low temperature tank 1, the receiving line 4 is always filled with the low-boiling point liquid so that the receiving line 4 is always at a temperature at which the low-boiling point liquid can be supplied. In order to prevent the low-boiling point liquid from bouncing off due to instability phenomenon (Geisering phenomenon) on the thermal fluid, the on-off valve 11a for supplying one pipe 7a of the two system pipes 7, the loading arm 3 and the two system pipes 7 The on-off valve 5 for supplying the one-line pipe 6 between them is closed, and the on-off valve 11b for supplying the other pipe 7b of the two-line pipe 7 and the on-off valve 12 for circulation in the lower line 13 are closed. By opening the circulation pump 17 of the circulation line 18 and then driving the circulation pump 17, the low boiling point liquid is supplied from the circulation line 18 to one pipe 7 a of the two-line pipe 7, the other pipe 7 b of the two-line pipe 7, and the lower line 13. Cryogenic reservoir 1, which is circulated in the circulation line 18 sequentially.
[0010]
[Problems to be solved by the invention]
However, the conventional low-temperature tank equipment uses the circulation pump 17 as a power source for circulating the low-boiling liquid in the receiving line 4, which increases the construction cost of the entire equipment, and always circulates the low-boiling liquid whenever it is circulated. Since the circulation pump 17 needs to be driven, there is a problem that the maintenance cost increases.
[0011]
An object of the present invention is to provide a low-temperature tank facility that circulates a low-boiling liquid in a receiving line without using a circulation pump.
[0012]
[Means for Solving the Problems]
The low-temperature tank facility of the present invention includes two channels that can supply a low-boiling point liquid to a low-temperature tank through a step portion having a predetermined height from a supply source, and the step is opened and closed by opening and closing an on-off valve that supplies the low-boiling point liquid. A low-temperature tank facility comprising a receiving line configured to circulate a low-boiling liquid between two channels through a section, and a delivery line for sending the low-boiling liquid as vaporized gas from the low-temperature tank to a consumer And the gas introduction line which introduces the vaporization gas of the said delivery line from the lower part of the said level | step-difference part is provided in one flow path among the two flow paths of the said receiving line.
[0013]
Moreover, the low temperature tank installation of this invention may connect a gas introduction line to the lower end of the level | step-difference part with the highest height difference in a receiving line.
[0014]
When the low boiling point liquid is not supplied to the low temperature tank in the low temperature tank facility of the present invention, the open / close valve of the receiving line is opened and closed so that the low boiling point liquid can flow between the two flow paths, and then the gas Vaporized gas is introduced from below into the stepped portion of the receiving line from the introduction line to raise the vaporized gas in the stepped portion, and the low-boiling liquid is circulated between the two flow paths by the gas lift action of the vaporized gas, Prevents sudden boiling of low-boiling liquid in the receiving line due to the above unstable phenomenon (Geisering phenomenon).
[0015]
In this way, since the low-boiling liquid in the two receiving lines is circulated using the vaporized gas introduced from the gas introduction line as a power source, it is not necessary to provide a circulation pump for the power source, thereby reducing the construction cost and maintenance cost of the entire facility. Can be reduced.
[0016]
Connecting the gas introduction line to the lower end of the step with the highest difference in the receiving line further enhances the gas lift effect of the introduced vaporized gas, so that the low boiling point liquid is reliably circulated in the two receiving lines. Can do.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0018]
1 and 2 show an embodiment of a cryogenic tank facility according to the present invention. In the figure, the same reference numerals as those in FIG. 3 denote the same components.
[0019]
A gas introduction line 20 that branches off from the downstream side of the vaporizer 16 in the delivery line 15 and extends to the lower end of the stepped portion 10 having the highest height difference in one of the pipes 7 a in the receiving line 4. A discharge line 22 having a discharge adjusting valve 21 is provided at a position at a predetermined height downstream of the stepped portion 10 in the pipe 7a so as to discharge the gas generated in the receiving line 4. Is provided with a level controller 23 for controlling the discharge regulating valve 21 from the level of the low boiling point liquid. Here, the height difference of the stepped portion 10 including the gas introduction line 20 is 5 m to 10 m, preferably 7 m to 8 m.
[0020]
A gas flow rate adjustment valve 24 for adjusting the flow rate of the vaporized gas introduced into the receiving line 4 is provided in the middle of the gas introduction line 20, and a gas is provided upstream of the gas flow rate adjustment valve 24 in the gas introduction line 20. A flow controller 25 for controlling the flow rate adjusting valve 24 is provided.
[0021]
Further, the gas in the receiving line 4 is supplied to the one-line pipe 6 between the loading arm 3 and the two-line pipe 7 in substantially the same manner as the discharge line 22 provided in one of the two-line pipes 7a. A discharge line 27 provided with a discharge adjustment valve 26 is provided to discharge, and the discharge line 27 is provided with a level controller 28 that controls the discharge adjustment valve 26 from the level of the low boiling liquid level.
[0022]
On the other hand, one of the two-line piping 7 of the receiving line 4 (the piping 7a in FIG. 1) is not provided with the circulation line 18 provided with the circulation pump 17, and the delivery pump 14 and the vaporizer 16 of the delivery line 15 are not provided. A liquid introduction line 29 that branches and extends from a predetermined position is connected, and a liquid amount adjusting valve 30 that adjusts the amount of low boiling point liquid is provided in the receiving line 4 in the middle of the liquid introduction line 29. The liquid amount adjusting valve 30 is controlled by a level controller 31 provided in the vicinity of the on-off valve 8 of the one-line pipe 9 between the two-line pipe 7 and the low temperature tank 1.
[0023]
The operation of the embodiment of the present invention will be described below.
[0024]
When the low boiling point liquid is not supplied to the low temperature tank 1, the on-off valve 5 for supplying the one-line pipe 6 between the loading arm 3 and the two-line pipe 7, and the lower part between the two-line pipe 7 and the low-temperature tank 1. The on-off valve 12 of the line 13 is closed, the on-off valves 11a and 11b for supplying the dual piping 7 are opened, and the vaporized gas is introduced from the gas introduction line 20 to the lower end of the step portion 10.
[0025]
At this time, the flow rate of the vaporized gas introduced into the stepped portion 10 of the receiving line is measured by the flow controller 25 and adjusted by the gas flow rate adjusting valve 24 so as to have a predetermined flow rate.
[0026]
Next, when the vaporized gas is introduced into the lower end of the stepped portion 10, the vaporized gas ascends the stepped portion 10 to circulate the low-boiling liquid in the two-line piping 7 by the gas lift action of the vaporized gas, and the thermal fluid is not heated. The bumping of the low boiling point liquid in the receiving line 4 due to the stability phenomenon (Gaithering phenomenon) is prevented.
[0027]
Here, when the receiving line 4 has a general pipe length and pipe diameter, it is empirically preferable to circulate the low boiling point liquid in 2 hours to 7 hours.
[0028]
In the one-line pipe 6 between the loading arm 3 and the two-line pipe 7, and the one-line pipe 9 and the lower line 13 between the two-line pipe 7 and the low-temperature tank 1, the low-boiling liquids in the respective interiors are double-lined. The low-boiling liquid is gradually replaced by low-boiling liquid circulating in the pipe 7 to prevent bumping of the low-boiling liquid due to an unstable phenomenon (Gaithering phenomenon) on the thermal fluid.
[0029]
Further, when vaporized gas accumulates in the receiving line 4, the level controller 23, 28 measures the liquid surface position of the low-boiling point liquid, so that it is external to the discharge lines 22, 27 via the discharge adjustment valves 21, 26. Are discharged. Further, when the amount of the low boiling point liquid in the receiving line 4 decreases due to vaporization or the like, the level controller 31 measures the amount of the low boiling point liquid by measuring the liquid level position of the low boiling point liquid. A low boiling point liquid corresponding to a reduced amount is filled from the liquid introduction line 29 through the amount adjusting valve 30.
[0030]
Thus, since the low boiling point liquid in the two-line piping 7 is circulated using the vaporized gas introduced from the gas introduction line 20 as a power source, it is not necessary to provide a circulation pump 17 for the power source, and the construction cost and maintenance cost of the entire facility Can be reduced.
[0031]
Connecting the gas introduction line 20 to the lower end of the step 10 having the highest difference in the receiving line 4 further enhances the gas lift action by the introduced vaporized gas, so that the low-boiling point liquid is surely contained in the two receiving lines 4. Can be circulated.
[0032]
The low-temperature tank facility of the present invention is not limited to the above-described embodiment, and the vaporized gas may be generated from another line, and other ranges not departing from the gist of the present invention. Of course, various changes can be made.
[0033]
【The invention's effect】
According to the low-temperature tank facility of the present invention, various excellent effects as described below can be obtained.
[0034]
I) Since the low-boiling liquid in the two receiving lines is circulated using the vaporized gas introduced from the gas introduction line as a power source, it is not necessary to provide a circulation pump for the power source, thereby reducing the construction cost and maintenance cost of the entire facility. be able to.
[0035]
II) Connecting the gas introduction line to the lower end of the step with the highest difference in the receiving line further enhances the gas lift action by the introduced vaporized gas, so that low boiling liquid is reliably circulated in the two receiving lines. Can be made.
[Brief description of the drawings]
FIG. 1 is an overall system diagram showing an example of an embodiment of a cryogenic tank facility of the present invention.
FIG. 2 is a schematic view showing a state in which an introduction pipe is connected to a step portion so as to introduce vaporized gas into a low boiling point liquid.
FIG. 3 is an overall system diagram showing a conventional cryogenic tank facility.
[Explanation of symbols]
1 Low temperature tank 2 Tanker (supply source)
4 Receiving line 5 Open / close valve for supply (open / close valve)
7 Two-line piping (two channels)
8 On-off valve for supply (on-off valve)
10 Stepped portion 11 Supplying on / off valve (open / close valve)
15 Delivery line 20 Gas introduction line

Claims (2)

低温タンクへ供給源より所定高さの段差部を経て低沸点液を供給し得る二系統の流路を備え且つ低沸点液を供給する開閉弁の開閉により前記段差部を介して低沸点液を二系統の流路の間で循環させるよう構成した受入ラインと、前記低温タンクから消費先に低沸点液を気化ガスとして送出する送出ラインとを備えた低温タンク設備であって、前記受入ラインの二系統の流路のうち一方の流路に、前記送出ラインの気化ガスを前記段差部の下方より導入するガス導入ラインを備えたことを特徴とする低温タンク設備。A low-boiling point liquid is provided through the stepped portion by opening and closing an on-off valve that has two channels capable of supplying a low-boiling point liquid from a supply source to a low-temperature tank through a stepped portion having a predetermined height. A low-temperature tank facility comprising a receiving line configured to circulate between two flow paths and a delivery line for sending low-boiling liquid as vaporized gas from the low-temperature tank to a consumer, wherein the receiving line A cryogenic tank facility comprising a gas introduction line for introducing the vaporized gas of the delivery line from below the stepped portion into one of the two channels. ガス導入ラインを、受入ラインの中で最も高低差のある段差部の下端に接続した請求項１記載の低温タンク設備。The low-temperature tank equipment according to claim 1, wherein the gas introduction line is connected to the lower end of the step portion having the highest difference in height in the receiving line.
JP2000390827A 2000-12-22 2000-12-22 Low temperature tank equipment Expired - Fee Related JP4581243B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000390827A JP4581243B2 (en) 2000-12-22 2000-12-22 Low temperature tank equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000390827A JP4581243B2 (en) 2000-12-22 2000-12-22 Low temperature tank equipment

Publications (2)

Publication Number Publication Date
JP2002188798A JP2002188798A (en) 2002-07-05
JP4581243B2 true JP4581243B2 (en) 2010-11-17

Family

ID=18857118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000390827A Expired - Fee Related JP4581243B2 (en) 2000-12-22 2000-12-22 Low temperature tank equipment

Country Status (1)

Country Link
JP (1) JP4581243B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007292181A (en) * 2006-04-25 2007-11-08 Chiyoda Corp Bog restraining method of liquefied gas facility
JP2007292178A (en) * 2006-04-25 2007-11-08 Chiyoda Corp Cold insulation circulation system of liquefied gas facility
JP5051615B2 (en) * 2007-04-26 2012-10-17 株式会社Ｉｈｉ LNG storage facility
JP4984325B2 (en) * 2007-06-18 2012-07-25 株式会社Ｉｈｉ Liquefied gas receiving storage device
JP5828629B2 (en) * 2010-11-30 2015-12-09 Ｊｘ日鉱日石エネルギー株式会社 LNG facility cold insulation system
KR101456015B1 (en) * 2013-03-14 2014-11-03 삼성중공업 주식회사 Device for liquefied gas drain and floating natural gas bunkering station having the same
JP6582182B2 (en) * 2015-04-14 2019-10-02 株式会社Ihi Facility for receiving liquefied gas

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0369391U (en) * 1989-07-31 1991-07-10

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6329000U (en) * 1986-08-08 1988-02-25
JPH0417912Y2 (en) * 1987-07-11 1992-04-21
JPH0633872B2 (en) * 1987-11-02 1994-05-02 石川島播磨重工業株式会社 Precooling method for LNG receiving piping
JPH0446299A (en) * 1990-06-11 1992-02-17 Ishikawajima Harima Heavy Ind Co Ltd Maintaining device for cooled state of low temperature liquid receiving piping

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0369391U (en) * 1989-07-31 1991-07-10

Also Published As

Publication number Publication date
JP2002188798A (en) 2002-07-05

Similar Documents

Publication Publication Date Title
US11441736B2 (en) Multi-vessel fluid storage and delivery system
US7497180B2 (en) Gas supply arrangement of a marine vessel and method of providing gas in a gas supply arrangement of a marine vessel
KR101245977B1 (en) An installation for supplying gaseous fuel to an energy production unit of a ship for transporting liquefied gas, and method for regulating a compressor for the same
JP3400527B2 (en) Fuel supply system for vehicles using natural gas as fuel
KR101130383B1 (en) Gas supply arrangement of a marine vessel and method of providing gas in a marine vessel
US6799429B2 (en) High flow pressurized cryogenic fluid dispensing system
EP2989370B1 (en) Liquid natural gas cooling on the fly
US20080078188A1 (en) Method and Device for Filling a Container with Liquid Gas from a Storage Tank
MX2013014000A (en) Heat management system and method for cryogenic liquid dispensing systems.
JP4570130B2 (en) Equipment-linked low temperature liquefied gas supply equipment
JP4581243B2 (en) Low temperature tank equipment
KR102233968B1 (en) A Regasification System Of Gas and Vessel having same
JP2004069029A (en) Filling system of liquefied petroleum gas
EP3279544A1 (en) Regasification unit
WO2019049789A1 (en) Ship
NO345279B1 (en) LNG tank pressure control by heating during bunkering
WO2024101235A1 (en) Granular heat insulating material filling device and method
JP4122757B2 (en) Liquefied gas supply system
JPS5986800A (en) Propane gas supply apparatus
JP2005030434A (en) Liquefied gas filler
JP2004263867A (en) Liquefied gas supply device
JP2002303400A (en) Low temperature tank equipment and ejector used for the tank equipment
JP2008275127A (en) Liquefied gas transferring and filling device
KR20000010414U (en) Liquefied petroleum gas supply system
JP2005090554A (en) System for transferring and filling liquefied gas

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071024

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100422

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100709

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100803

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100816

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130910

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees