JP2002188798A - Low-temperature tank facility - Google Patents
Low-temperature tank facilityInfo
- Publication number
- JP2002188798A JP2002188798A JP2000390827A JP2000390827A JP2002188798A JP 2002188798 A JP2002188798 A JP 2002188798A JP 2000390827 A JP2000390827 A JP 2000390827A JP 2000390827 A JP2000390827 A JP 2000390827A JP 2002188798 A JP2002188798 A JP 2002188798A
- Authority
- JP
- Japan
- Prior art keywords
- low
- line
- temperature tank
- boiling
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、低沸点液を低温タ
ンクへ供給しない時に受入ライン内の低沸点液の突沸を
防止する低温タンク設備に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low-temperature tank facility for preventing bumping of a low-boiling liquid in a receiving line when the low-boiling liquid is not supplied to the low-temperature tank.
【０００２】[0002]
【従来の技術】一般に低温タンク設備は、図３に示す如
く、低温タンク１に対して供給源のタンカー２より液化
天然ガス（ＬＮＧ）等の低沸点液を供給し得るよう、タ
ンカー２に接続するローディングアーム３と、ローディ
ングアーム３より低温タンク１まで延在する受入ライン
４とを備えている。2. Description of the Related Art In general, as shown in FIG. 3, a low-temperature tank facility is connected to a low-temperature tank 1 so that a low-boiling point liquid such as liquefied natural gas (LNG) can be supplied from a supply tanker 2 to a low-temperature tank 1. And a receiving line 4 extending from the loading arm 3 to the low temperature tank 1.
【０００３】受入ライン４は、ローディングアーム３か
ら所定位置まで供給用の開閉弁５を介して延在する一系
統配管６と、一系統配管６から低温タンク１側の所定位
置まで二系統の流路に分岐されて略平行に延在する二系
統配管７と、二系統配管７から低温タンク１の屋根１ａ
まで供給用の開閉弁８を介して延在する一系統配管９と
から構成されている。[0003] The receiving line 4 has a one-system pipe 6 extending from the loading arm 3 to a predetermined position via a supply on-off valve 5 and a two-system flow from the one-system pipe 6 to a predetermined position on the low-temperature tank 1 side. A two-system pipe 7 that is branched into a road and extends substantially in parallel, and a roof 1 a of the low-temperature tank 1 from the two-system pipe 7.
And a one-system pipe 9 extending through an on-off valve 8 for supply.
【０００４】二系統配管７は、全長にわたって桟橋等の
種々の構造物に沿う様々な高低差の段差部１０を備えて
おり、二系統配管７の低温タンク１側には、夫々供給用
の開閉弁１１を設けている。[0004] The dual-system piping 7 is provided with steps 10 having various height differences along various structures such as piers over the entire length thereof. A valve 11 is provided.
【０００５】又、二系統配管７から低温タンク１までの
間の一系統配管９は、供給用の開閉弁８の上流側より循
環用の開閉弁１２を介して低温タンク１の胴部１ｂに接
続する下方ライン１３を設けている。[0005] The one-system pipe 9 from the two-system pipe 7 to the low-temperature tank 1 is connected to the body 1b of the low-temperature tank 1 via the circulation on-off valve 12 from the upstream side of the supply on-off valve 8. A lower line 13 for connection is provided.
【０００６】一方、低温タンク１には、送出ポンプ１４
を備えた送出ライン１５を接続し、送出ライン１５にお
ける送出ポンプ１４の下流側には、低沸点液を加熱して
気化する気化器１６を設け、低沸点液を低温タンク１よ
り消費先へ気化ガスとして送出するようになっている。On the other hand, the low-temperature tank 1 has a delivery pump 14
A vaporizer 16 for heating and vaporizing the low-boiling liquid is provided on the downstream side of the delivery pump 14 in the delivery line 15, and the low-boiling liquid is vaporized from the low-temperature tank 1 to the consumption destination. The gas is sent out.
【０００７】又、低温タンク１には、二系統配管７のう
ち一方の配管７ａへ低沸点液を導入するよう、循環ポン
プ１７を備えた循環ライン１８を接続している。The low-temperature tank 1 is connected to a circulation line 18 having a circulation pump 17 so as to introduce a low-boiling liquid to one of the two-system piping 7.
【０００８】低温タンク１へ低沸点液を供給する場合に
は、供給源のタンカー２にローディングアーム３を接続
して受入ライン４の全ての供給用の開閉弁５，１１，８
を開き、タンカー２より、ローディングアーム３、ロー
ディングアーム３と二系統配管７の間の一系統配管６、
二系統配管７、二系統配管７と低温タンク１の間におけ
る一系統配管９を順に介して低温タンク１へ低沸点液を
供給する。When a low boiling point liquid is supplied to the low temperature tank 1, the loading arm 3 is connected to the tanker 2 as a supply source, and all supply opening / closing valves 5, 11, 8 of the receiving line 4 are provided.
From the tanker 2, the loading arm 3, the one-system pipe 6 between the loading arm 3 and the two-system pipe 7,
The low-boiling-point liquid is supplied to the low-temperature tank 1 via the two-system piping 7 and the one-system piping 9 between the two-system piping 7 and the low-temperature tank 1 in order.
【０００９】一方、低温タンク１へ低沸点液を供給しな
い場合には、受入ライン４を常に低沸点液を供給可能な
温度にするよう受入ライン４に低沸点液を常時満たして
おり、更に、受入ライン４内の低沸点液が熱流体上の不
安定現象（ガイザリング現象）により突沸しないよう、
二系統配管７のうち一方の配管７ａの供給用の開閉弁１
１ａと、ローディングアーム３と二系統配管７の間にお
ける一系統配管６の供給用の開閉弁５とを夫々閉じると
共に、二系統配管７のうち他方の配管７ｂの供給用の開
閉弁１１ｂと、下方ライン１３の循環用の開閉弁１２と
を夫々開き、次いで循環ライン１８の循環ポンプ１７を
駆動することによって、低沸点液を、循環ライン１８か
ら、二系統配管７の一方の配管７ａ、二系統配管７の他
方の配管７ｂ、下方ライン１３、低温タンク１、循環ラ
イン１８と順に循環させている。On the other hand, when the low-boiling liquid is not supplied to the low-temperature tank 1, the receiving line 4 is always filled with the low-boiling liquid so that the receiving line 4 is always at a temperature at which the low-boiling liquid can be supplied. In order to prevent the low boiling point liquid in the receiving line 4 from bumping due to an unstable phenomenon (geysering phenomenon) on the thermal fluid,
On-off valve 1 for supplying one of pipes 7a of two-system pipe 7
1a, an on-off valve 5 for supplying the one-system piping 6 between the loading arm 3 and the two-system piping 7 is closed, and an on-off valve 11b for supplying the other piping 7b of the two-system piping 7; By opening the circulation on-off valve 12 of the lower line 13 and the circulation pump 17 of the circulation line 18 respectively, the low boiling point liquid is supplied from the circulation line 18 to one of the pipes 7a, The other pipe 7b of the system pipe 7, the lower line 13, the low temperature tank 1, and the circulation line 18 are circulated in this order.
【００１０】[0010]
【発明が解決しようとする課題】しかしながら、従来の
低温タンク設備は、受入ライン４の低沸点液を循環させ
る動力源として循環ポンプ１７を用いるため、設備全体
の建設費が増加し、更に、低沸点液を循環させる際には
常に循環ポンプ１７を駆動する必要があるため、維持費
が増大するという問題があった。However, the conventional low-temperature tank equipment uses the circulating pump 17 as a power source for circulating the low-boiling liquid in the receiving line 4, so that the construction cost of the entire equipment increases and the low-temperature tank equipment further reduces the cost. When circulating the boiling point liquid, it is necessary to always drive the circulation pump 17, so that there is a problem that the maintenance cost increases.
【００１１】本発明は、循環ポンプを用いることなく受
入ラインに低沸点液を循環させる低温タンク設備を提供
することを目的としている。An object of the present invention is to provide a low-temperature tank facility for circulating a low-boiling liquid in a receiving line without using a circulation pump.
【００１２】[0012]
【課題を解決するための手段】本発明の低温タンク設備
は、低温タンクへ供給源より所定高さの段差部を経て低
沸点液を供給し得る二系統の流路を備え且つ低沸点液を
供給する開閉弁の開閉により前記段差部を介して低沸点
液を二系統の流路の間で循環させるよう構成した受入ラ
インと、前記低温タンクから消費先に低沸点液を気化ガ
スとして送出する送出ラインとを備えた低温タンク設備
であって、前記受入ラインの二系統の流路のうち一方の
流路に、前記送出ラインの気化ガスを前記段差部の下方
より導入するガス導入ラインを備えるものである。The low-temperature tank equipment according to the present invention has two flow paths capable of supplying a low-boiling liquid to the low-temperature tank through a stepped portion having a predetermined height from a supply source. A receiving line configured to circulate the low boiling point liquid between the two flow paths through the step by opening and closing the supply on-off valve, and the low boiling point liquid is sent out as a vaporized gas from the low temperature tank to the consumption destination. A low-temperature tank facility comprising a delivery line, and a gas introduction line for introducing the vaporized gas of the delivery line from below the step in one of the two flow paths of the receiving line. Things.
【００１３】又、本発明の低温タンク設備は、ガス導入
ラインを受入ラインの中で最も高低差のある段差部の下
端に接続してもよい。Further, in the low-temperature tank equipment of the present invention, the gas introduction line may be connected to the lower end of the step having the highest difference in the receiving line.
【００１４】本発明の低温タンク設備において低温タン
クへ低沸点液を供給しない場合には、受入ラインの開閉
弁を開閉して二系統の流路の間で低沸点液を互いに流通
可能な状態にし、次いでガス導入ラインから受入ライン
の段差部に下方より気化ガスを導入して段差部内で気化
ガスを上昇させ、気化ガスのガスリフト作用により二系
統の流路の間で低沸点液を互いに循環させ、熱流体上の
不安定現象（ガイザリング現象）による受入ライン内の
低沸点液の突沸を防止している。When the low-boiling liquid is not supplied to the low-temperature tank in the low-temperature tank equipment of the present invention, the on-off valve of the receiving line is opened and closed so that the low-boiling liquid can flow between the two flow paths. Then, the vaporized gas is introduced from below into the step of the receiving line from the gas introduction line to raise the vaporized gas in the step, and the low-boiling liquid is circulated between the two flow paths by the gas lift action of the vaporized gas. In addition, bumping of the low boiling point liquid in the receiving line due to the unstable phenomenon (geysering phenomenon) on the thermal fluid is prevented.
【００１５】このように、ガス導入ラインより導入する
気化ガスを動力源として二系統の受入ライン内の低沸点
液を循環させるので、動力源の循環ポンプを設ける必要
がなく設備全体の建設費、維持費を低減することができ
る。As described above, the low-boiling liquid in the two receiving lines is circulated using the vaporized gas introduced from the gas introduction line as a power source, so that there is no need to provide a circulating pump for the power source, and the construction cost of the entire equipment is reduced. Maintenance costs can be reduced.
【００１６】ガス導入ラインを受入ラインの中で最も高
低差のある段差部の下端に接続すると、導入した気化ガ
スによるガスリフト作用を一層高めるので、低沸点液を
二系統の受入ライン内で確実に循環させることができ
る。If the gas introduction line is connected to the lower end of the step having the highest level difference among the receiving lines, the gas lift action by the introduced vaporized gas is further enhanced, so that the low boiling point liquid can be reliably supplied to the two receiving lines. Can be circulated.
【００１７】[0017]
【発明の実施の形態】以下、本発明の実施の形態を、図
示例と共に説明する。Embodiments of the present invention will be described below with reference to the drawings.
【００１８】図１、図２は本発明の低温タンク設備の実
施の形態例であって、図中、図３と同一の符号を付した
部分は同一物を表わしている。FIGS. 1 and 2 show an embodiment of the low-temperature tank equipment according to the present invention. In FIG. 1 and FIG. 2, the same reference numerals as those in FIG. 3 denote the same parts.
【００１９】受入ライン４における二系統配管７のうち
一方の配管７ａで最も高低差のある段差部１０の下端に
は、送出ライン１５における気化器１６の下流側から分
岐して延在するガス導入ライン２０を接続しており、配
管７ａにおける段差部１０の下流側で所定高さの位置に
は、受入ライン４内に生じるガスを排出するよう排出調
整弁２１を備えた排出ライン２２を設け、排出ライン２
２には低沸点液の液面の高さより排出調整弁２１を制御
するレベルコントローラ２３を備えている。ここで、ガ
ス導入ライン２０を備える段差部１０の高低差は５ｍ〜
１０ｍ、好ましくは７ｍ〜８ｍがよい。At the lower end of the step 10 having the highest level difference in one of the pipes 7a of the two-system pipe 7 in the receiving line 4, a gas introduction branching from the downstream side of the vaporizer 16 in the delivery line 15 and extending. A discharge line 22 having a discharge control valve 21 for discharging gas generated in the receiving line 4 is provided at a position at a predetermined height downstream of the stepped portion 10 in the pipe 7a and connected to the line 20; Discharge line 2
2 is provided with a level controller 23 for controlling the discharge adjusting valve 21 based on the level of the low boiling point liquid. Here, the height difference of the step portion 10 including the gas introduction line 20 is 5 m or more.
10 m, preferably 7 m to 8 m.
【００２０】又、ガス導入ライン２０の中途部には、受
入ライン４内に導入する気化ガスの流量を調節するガス
流量調整弁２４を備え、ガス導入ライン２０におけるガ
ス流量調整弁２４の上流側にはガス流量調整弁２４を制
御するフローコントローラ２５を備えている。A gas flow regulating valve 24 for regulating the flow rate of the vaporized gas introduced into the receiving line 4 is provided in the middle of the gas introduction line 20. Is provided with a flow controller 25 for controlling the gas flow control valve 24.
【００２１】更に、ローディングアーム３から二系統配
管７までの間の一系統配管６には、二系統配管７のうち
一方の配管７ａに備えられた排出ライン２２と略同様
に、受入ライン４内のガスを排出するよう排出調整弁２
６を備えた排出ライン２７を設け、排出ライン２７に
は、低沸点液の液面の高さより排出調整弁２６を制御す
るレベルコントローラ２８を備えている。Further, the one-system piping 6 between the loading arm 3 and the two-system piping 7 has the receiving line 4 in substantially the same manner as the discharge line 22 provided in one of the two-system piping 7. Discharge control valve 2 to discharge gas
6 is provided, and the discharge line 27 is provided with a level controller 28 that controls the discharge adjustment valve 26 based on the level of the low boiling point liquid.
【００２２】一方、受入ライン４の二系統配管７のどち
らか一方（図１では配管７ａ）には、循環ポンプ１７を
備えた循環ライン１８を設けることなく、送出ライン１
５における送出ポンプ１４と気化器１６の間の所定位置
より分岐して延在する液導入ライン２９を接続し、液導
入ライン２９の中途部には、受入ライン４内に低沸点液
の液量を調節する液量調整弁３０を備え、液量調整弁３
０は、二系統配管７から低温タンク１までの間における
一系統配管９の開閉弁８近傍に備えられたレベルコント
ローラ３１により制御されている。On the other hand, in one of the two-system pipes 7 of the receiving line 4 (the pipe 7a in FIG. 1), there is no circulation line 18 provided with a circulation pump
5 is connected to a liquid introduction line 29 that branches off from a predetermined position between the delivery pump 14 and the vaporizer 16, and the liquid introduction line 29 is provided with a low boiling point liquid And a liquid amount adjusting valve 30 for adjusting the pressure.
0 is controlled by a level controller 31 provided near the opening / closing valve 8 of the one-system pipe 9 between the two-system pipe 7 and the low-temperature tank 1.
【００２３】以下、本発明の実施の形態例の作用を説明
する。The operation of the embodiment of the present invention will be described below.
【００２４】低温タンク１へ低沸点液を供給しない場合
には、ローディングアーム３と二系統配管７の間におけ
る一系統配管６の供給用の開閉弁５と、二系統配管７と
低温タンク１の間における下方ライン１３の開閉弁１２
とを夫々閉じると共に、二系統配管７の供給用の開閉弁
１１ａ，１１ｂを夫々開き、更にガス導入ライン２０か
ら段差部１０の下端に気化ガスを導入する。When the low boiling point liquid is not supplied to the low-temperature tank 1, the on-off valve 5 for supplying the one-system piping 6 between the loading arm 3 and the two-system piping 7, and the two-system piping 7 and the low-temperature tank 1 Opening and closing valve 12 of lower line 13 between
Are closed, the on-off valves 11a and 11b for supplying the two-system piping 7 are respectively opened, and further, the vaporized gas is introduced from the gas introduction line 20 to the lower end of the step portion 10.
【００２５】この時、受入ラインの段差部１０に導入す
る気化ガスの流速は、フローコントローラ２５により計
測され、所定の流量になるようガス流量調整弁２４によ
り調整されている。At this time, the flow rate of the vaporized gas introduced into the step 10 of the receiving line is measured by the flow controller 25 and adjusted by the gas flow control valve 24 so as to have a predetermined flow rate.
【００２６】次いで段差部１０の下端に気化ガスが導入
されると、気化ガスは段差部１０を上昇することにより
気化ガスのガスリフト作用で二系統配管７内の低沸点液
を循環させ、熱流体上の不安定現象（ガイザリング現
象）による受入ライン４内の低沸点液の突沸を防止す
る。Next, when the vaporized gas is introduced into the lower end of the step portion 10, the vaporized gas rises in the step portion 10 to circulate the low boiling point liquid in the two-system pipe 7 by the gas lift action of the vaporized gas, and The bumping of the low boiling point liquid in the receiving line 4 due to the above instability phenomenon (Gysering phenomenon) is prevented.
【００２７】ここで、受入ライン４において一般的な配
管の長さ及び配管径を備えている場合には、経験的に低
沸点液を２時間〜７時間で循環させることが好ましい。Here, when the receiving line 4 has a general pipe length and pipe diameter, it is empirically preferable to circulate the low-boiling liquid for 2 hours to 7 hours.
【００２８】ローディングアーム３と二系統配管７の間
の一系統配管６、及び二系統配管７と低温タンク１の間
の一系統配管９及び下方ライン１３においては、夫々の
内部の低沸点液が、二系統配管７内で互いに循環する低
沸点液によって徐々に置換され、熱流体上の不安定現象
（ガイザリング現象）による低沸点液の突沸を防止して
いる。In the one-system pipe 6 between the loading arm 3 and the two-system pipe 7, and in the one-system pipe 9 and the lower line 13 between the two-system pipe 7 and the low-temperature tank 1, the low-boiling liquid inside each of them is supplied. The low-boiling liquid is gradually replaced by the low-boiling liquid circulating in the two-system piping 7 to prevent bumping of the low-boiling liquid due to an unstable phenomenon (geysering phenomenon) on the thermal fluid.
【００２９】更に、受入ライン４に気化ガスが溜まった
際には、レベルコントローラ２３，２８によって低沸点
液の液面位置を測定することにより、排出調整弁２１，
２６を介して排出ライン２２，２７より外部へ排出して
いる。又、受入ライン４の低沸点液の液量が気化等によ
り減少した際には、レベルコントローラ３１によって低
沸点液の液面位置を測定することより低沸点液の減少量
分を計測し、液量調整弁３０を介して液導入ライン２９
より減少量分の低沸点液を充填している。Further, when the vaporized gas accumulates in the receiving line 4, the level controllers 23 and 28 measure the liquid surface position of the low boiling point liquid, so that the discharge regulating valve 21 and
The air is discharged from the discharge lines 22 and 27 to the outside through the air. When the amount of the low-boiling liquid in the receiving line 4 decreases due to vaporization or the like, the level controller 31 measures the level of the low-boiling liquid to measure the amount of the reduced low-boiling liquid. The liquid introduction line 29 via the amount adjustment valve 30
A smaller amount of the low boiling point liquid is filled.
【００３０】このように、ガス導入ライン２０より導入
する気化ガスを動力源として二系統配管７内の低沸点液
を循環させるので、動力源の循環ポンプ１７を設ける必
要がなく設備全体の建設費、維持費を低減することがで
きる。As described above, since the low-boiling liquid in the two-system pipe 7 is circulated using the vaporized gas introduced from the gas introduction line 20 as a power source, there is no need to provide a circulating pump 17 as a power source, and the construction cost of the entire equipment is reduced. , Maintenance costs can be reduced.
【００３１】ガス導入ライン２０を受入ライン４の中で
最も高低差のある段差部１０の下端に接続すると、導入
した気化ガスによるガスリフト作用を一層高めるので、
低沸点液を二系統の受入ライン４内で確実に循環させる
ことができる。When the gas introduction line 20 is connected to the lower end of the step portion 10 having the highest difference in the receiving line 4, the gas lift effect by the introduced vaporized gas is further enhanced.
The low boiling point liquid can be reliably circulated in the two receiving lines 4.
【００３２】なお、本発明の低温タンク設備は、上述の
実施の形態例に限定されるものではなく、気化ガスは他
のラインで生じたものを用いてもよいこと、その他本発
明の要旨を逸脱しない範囲内において種々変更を加え得
ることは勿論である。Note that the low-temperature tank equipment of the present invention is not limited to the above-described embodiment, and that the vaporized gas generated in another line may be used. Of course, various changes can be made without departing from the scope.
【００３３】[0033]
【発明の効果】本発明の低温タンク設備によれば、下記
の如き種々の優れた効果を奏し得る。According to the low-temperature tank equipment of the present invention, various excellent effects as described below can be obtained.
【００３４】Ｉ）ガス導入ラインより導入する気化ガス
を動力源として二系統の受入ライン内の低沸点液を循環
させるので、動力源の循環ポンプを設ける必要がなく設
備全体の建設費、維持費を低減することができる。I) Since the low boiling point liquid in the two receiving lines is circulated by using the vaporized gas introduced from the gas introduction line as a power source, there is no need to provide a circulating pump for the power source, and the construction and maintenance costs of the entire facility are eliminated. Can be reduced.
【００３５】ＩＩ）ガス導入ラインを受入ラインの中で
最も高低差のある段差部の下端に接続すると、導入した
気化ガスによるガスリフト作用を一層高めるので、低沸
点液を二系統の受入ライン内で確実に循環させることが
できる。II) When the gas introduction line is connected to the lower end of the step portion having the highest difference in the receiving line, the gas lift action by the introduced vaporized gas is further enhanced, so that the low boiling point liquid is supplied to the two receiving lines. It can be reliably circulated.
【図１】本発明の低温タンク設備の実施の形態の一例を
示す全体系統図である。FIG. 1 is an overall system diagram showing an example of an embodiment of a low-temperature tank facility of the present invention.
【図２】低沸点液に気化ガスを導入するよう段差部に導
入配管を接続した状態を示す概略図である。FIG. 2 is a schematic diagram showing a state where an introduction pipe is connected to a step portion so as to introduce a vaporized gas into a low boiling point liquid.
【図３】従来の低温タンク設備を示す全体系統図であ
る。FIG. 3 is an overall system diagram showing a conventional low-temperature tank facility.
１ 低温タンク ２ タンカー（供給源） ４ 受入ライン ５ 供給用の開閉弁（開閉弁） ７ 二系統配管（二系統の流路） ８ 供給用の開閉弁（開閉弁） １０ 段差部 １１ 供給用の開閉弁（開閉弁） １５ 送出ライン ２０ ガス導入ライン DESCRIPTION OF SYMBOLS 1 Low-temperature tank 2 Tanker (supply source) 4 Receiving line 5 Supply opening / closing valve (opening / closing valve) 7 Two-system piping (two systems flow path) 8 Supply opening / closing valve (opening / closing valve) 10 Step part 11 Supply On-off valve (on-off valve) 15 Delivery line 20 Gas introduction line
Claims (2)
部を経て低沸点液を供給し得る二系統の流路を備え且つ
低沸点液を供給する開閉弁の開閉により前記段差部を介
して低沸点液を二系統の流路の間で循環させるよう構成
した受入ラインと、前記低温タンクから消費先に低沸点
液を気化ガスとして送出する送出ラインとを備えた低温
タンク設備であって、前記受入ラインの二系統の流路の
うち一方の流路に、前記送出ラインの気化ガスを前記段
差部の下方より導入するガス導入ラインを備えたことを
特徴とする低温タンク設備。1. A low-temperature tank is provided with two flow paths capable of supplying a low-boiling liquid from a supply source through a step of a predetermined height from a supply source, and an on-off valve for supplying the low-boiling liquid is opened and closed via the step. Low-temperature tank equipment comprising a receiving line configured to circulate the low-boiling liquid between the two flow paths, and a sending line that sends the low-boiling liquid as a vaporized gas from the low-temperature tank to a consumer. And a gas introduction line for introducing the vaporized gas of the delivery line from below the step portion in one of the two passages of the receiving line.
も高低差のある段差部の下端に接続した請求項１記載の
低温タンク設備。2. The low-temperature tank facility according to claim 1, wherein the gas introduction line is connected to a lower end of a step portion having the highest level difference in the receiving line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000390827A JP4581243B2 (en) | 2000-12-22 | 2000-12-22 | Low temperature tank equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000390827A JP4581243B2 (en) | 2000-12-22 | 2000-12-22 | Low temperature tank equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002188798A true JP2002188798A (en) | 2002-07-05 |
| JP4581243B2 JP4581243B2 (en) | 2010-11-17 |
Family
ID=18857118
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000390827A Expired - Fee Related JP4581243B2 (en) | 2000-12-22 | 2000-12-22 | Low temperature tank equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4581243B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007292181A (en) * | 2006-04-25 | 2007-11-08 | Chiyoda Corp | Bog restraining method of liquefied gas facility |
| JP2007292178A (en) * | 2006-04-25 | 2007-11-08 | Chiyoda Corp | Cold insulation circulation system of liquefied gas facility |
| JP2008275002A (en) * | 2007-04-26 | 2008-11-13 | Ihi Corp | Liquefied gas receiving storage facility |
| JP2008309301A (en) * | 2007-06-18 | 2008-12-25 | Ihi Corp | Liquefied gas receiving storage device |
| JP2012117574A (en) * | 2010-11-30 | 2012-06-21 | Jx Nippon Oil & Energy Corp | Cold insulation system of lng facility |
| KR101456015B1 (en) * | 2013-03-14 | 2014-11-03 | 삼성중공업 주식회사 | Device for liquefied gas drain and floating natural gas bunkering station having the same |
| JP2016200258A (en) * | 2015-04-14 | 2016-12-01 | 株式会社Ihi | Liquefied natural gas receiving facility |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6329000U (en) * | 1986-08-08 | 1988-02-25 | ||
| JPS6345299U (en) * | 1987-07-11 | 1988-03-26 | ||
| JPH01120500A (en) * | 1987-11-02 | 1989-05-12 | Ishikawajima Harima Heavy Ind Co Ltd | Method for holding lng receiving piping in precooling |
| JPH0369391U (en) * | 1989-07-31 | 1991-07-10 | ||
| JPH0446299A (en) * | 1990-06-11 | 1992-02-17 | Ishikawajima Harima Heavy Ind Co Ltd | Maintaining device for cooled state of low temperature liquid receiving piping |
-
2000
- 2000-12-22 JP JP2000390827A patent/JP4581243B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6329000U (en) * | 1986-08-08 | 1988-02-25 | ||
| JPS6345299U (en) * | 1987-07-11 | 1988-03-26 | ||
| JPH01120500A (en) * | 1987-11-02 | 1989-05-12 | Ishikawajima Harima Heavy Ind Co Ltd | Method for holding lng receiving piping in precooling |
| JPH0369391U (en) * | 1989-07-31 | 1991-07-10 | ||
| JPH0446299A (en) * | 1990-06-11 | 1992-02-17 | Ishikawajima Harima Heavy Ind Co Ltd | Maintaining device for cooled state of low temperature liquid receiving piping |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007292181A (en) * | 2006-04-25 | 2007-11-08 | Chiyoda Corp | Bog restraining method of liquefied gas facility |
| JP2007292178A (en) * | 2006-04-25 | 2007-11-08 | Chiyoda Corp | Cold insulation circulation system of liquefied gas facility |
| JP2008275002A (en) * | 2007-04-26 | 2008-11-13 | Ihi Corp | Liquefied gas receiving storage facility |
| JP2008309301A (en) * | 2007-06-18 | 2008-12-25 | Ihi Corp | Liquefied gas receiving storage device |
| JP2012117574A (en) * | 2010-11-30 | 2012-06-21 | Jx Nippon Oil & Energy Corp | Cold insulation system of lng facility |
| KR101456015B1 (en) * | 2013-03-14 | 2014-11-03 | 삼성중공업 주식회사 | Device for liquefied gas drain and floating natural gas bunkering station having the same |
| JP2016200258A (en) * | 2015-04-14 | 2016-12-01 | 株式会社Ihi | Liquefied natural gas receiving facility |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4581243B2 (en) | 2010-11-17 |
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