JP4570257B2 - Pressurized cleaning device - Google Patents

Pressurized cleaning device Download PDF

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Publication number
JP4570257B2
JP4570257B2 JP2001017053A JP2001017053A JP4570257B2 JP 4570257 B2 JP4570257 B2 JP 4570257B2 JP 2001017053 A JP2001017053 A JP 2001017053A JP 2001017053 A JP2001017053 A JP 2001017053A JP 4570257 B2 JP4570257 B2 JP 4570257B2
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liquid
plate
cylindrical body
chip
cleaning
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JP2002219425A (en
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雅俊 山口
敬人 菊川
恭一 岸
義浩 露木
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Panac Industries Inc
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Panac Industries Inc
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Priority to JP2001017053A priority Critical patent/JP4570257B2/en
Priority to US09/789,947 priority patent/US6623564B2/en
Priority to TW90103894A priority patent/TW496792B/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00Technologies for solid waste management
    • Y02W30/50Reuse, recycling or recovery technologies
    • Y02W30/62Plastics recycling; Rubber recycling

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  • Cleaning By Liquid Or Steam (AREA)
  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)

Description

【0001】
【産業上の利用分野】
本発明は、合成樹脂又は天然樹脂よりなるプラスチックを含むチップを100℃を越える温度で洗浄できる加圧式洗浄装置に関し、詳しくは、合成樹脂製の支持体上に種々の機能層が積層された記録材料などから合成樹脂を回収するための加圧式洗浄装置に関する。
【0002】
【従来の技術】
セルロース有機エステル又は合成樹脂よりなる支持体上に種々の機能を有する層を積層した材料が多くの分野で使用されている。例えば、三酢酸セルロール、芳香族ポリエステル、芳香族ポリカーボネート等の熱可塑性樹脂よりなるプラスチックス支持体上に記録層などが積層された各種の記録材料が広く使用されている。これらの記録材料には、三酢酸セルロール支持体又はポリエステル支持体上にハロゲン化銀感光層を設けた写真感光材料、ポリカーボネート基板に色素記録層や反射層を設けたCD−ROM、光ディスク、ポリエステル支持体又はポリイミド支持体上に磁気記録層を設けた磁気テープや磁気ディスク、等が含まれる。
【0003】
これらの記録材料から合成樹脂等を回収するための洗浄装置としては、特開平5−8228号に記載の装置が知られている。この装置は、短時間にチップを効率良く洗浄し、洗浄されたチップを短時間に手間をかけずに取り出すことができる洗浄装置であるが、加圧装置でないためにその洗浄温度は100℃が上限であり、洗浄時間の短縮と回収樹脂の品質向上には限界がある。また、前記のチップ洗浄装置を通常の設計により加圧容器にしようとすると、底部の鏡板を平鏡板にすると数センチメートルの厚い平鏡板が必要となり、一方、半球形又は皿形の鏡板にすると、鏡板は薄くできるものの底部に大きなデッドスペースが生じてしまい、大型の装置になるばかりか操作性が極めて悪い。
【0004】
【発明が解決しようとする課題】
本発明は上記のような事情に鑑みてなされたものであり、本発明が解決しようとする課題は、第一にセルロース有機酸エステル又は合成樹脂を含むチップを100℃を越える温度で洗浄して効率よく高純度の原料樹脂を回収することができる加圧容器を提供することである。
本発明が解決しようとする課題は、第二にコンパクトでかつ操作性の良い洗浄装置を提供することである。
【0005】
【課題を解決するための手段】
本発明は、以下の手段により達成された。
(1)横断面が円形の縦型筒状胴部、この筒状胴部の上部に接続された鏡板、及びこの筒状胴部の下部に上に凸となるように接続された逆鏡板よりなる加圧容器であって、この鏡板にはチップ投入可能な蓋及び洗浄液供給口が設けられ、この胴部下方には、チップ取出口が設けられ、筒状胴部の内部下方には胴部を横断する液切り板が設けられ、前記液切り板の上方に近接して撹拌羽根が設けられ、この撹拌羽根の撹拌軸が前記逆鏡板を貫通して設けられたことを特徴とする加圧式洗浄装置、
(2)前記液切り板と前記下部鏡板との空間を埋めるための中空の中子、及び、この中子と加圧容器内の圧力を均等とするための均圧管を設けた請求項1記載の加圧式洗浄装置、
(3)チップ取出口が筒状胴部に接続されたクラッチドアであり、このクラッチドアが筒状胴部側に接続された円形フランジ部を構成する駒輪と、取り出し蓋の円形フランジ部を構成する鏡輪とを対面させ両輪を外輪により挟み込み固定するように構成した(1)又は(2)に記載の加圧式洗浄装置。
【0006】
【発明の実施の形態】
本発明の好適ないくつかの実施態様を下記に列挙する。
1)液切り板が容器の中心軸に垂直な平面と10〜30度の狭角を有する上記の加圧式洗浄装置。
2)液切り板に、1〜10mmの径を有する小穴が2〜10mmの穴端間隔で設けられている上記の加圧式洗浄装置。
3)筒状胴部に加熱冷却用のジャケットが設けられている上記の加圧式洗浄装置。
4)容器の内径Dと内高さHとの比が、D:H=1:1〜2.5であることを特徴とする上記の加圧式洗浄装置。
【0007】
本発明の加圧式洗浄装置を、添付する図面を参照して詳細に説明する。
図1は、本発明に係るチップ洗浄装置の一実施例の概略を示す斜視図である。
図2は、図1におけるA−A線断面(拡大)概略図である。
図3は容器内底部に中子を有する一実施態様を示す。図4はクラッチドアの一実施態様を示す。
【0008】
図1及び図2において、加圧式洗浄装置は、架台80に固定された圧力容器40及び撹拌羽根駆動機構70からなる。圧力容器40は、横断面が円形の縦型筒状容器であり、筒状胴部1の上部に鏡板3が設けられ、この鏡板3の中央部にはチップ投入口等に使用できる蓋35が設けられ、蓋35はクラッチドアにより開閉できるようになっている。鏡板3には更に洗浄液供給口37、38が設けられている。圧力容器40の底部には上に凸の形状を有する逆鏡板5が接続されている。逆鏡板5の中央部近くには、撹拌羽根駆動機構の撹拌軸が、好ましくは圧力容器40の中心軸Xに対して傾斜して、貫通して設けられている。筒状胴部1及び鏡板3は、それぞれに設けた筒状胴部上部フランジ部19及び鏡板フランジ部31により接続されていることが好ましい。また、筒状胴部1及び逆鏡板5は、それぞれに設けた筒状胴部下部フランジ部18及び逆鏡板フランジ部58により接続されていることが好ましい。
【0009】
本発明の圧力容器40の筒状胴部1下方には、チップ取出口13が設けられ、又、筒状胴部1の内部下方には胴部を横断する液切り板12が設けられている。
液切り板12は、多数の小穴を有し、さらに好ましくは、1.5〜6mmの径を有する小穴を2〜10mmの穴端間隔で穿設する。これらの小穴の直径は液切り板の厚さ方向に均一としても良いが、好ましい一実施態様によると、液切り板のほぼ直径に相当する深さ方向途中から裏側にかけては小孔の表側直径の約2倍の大きさの直径を有する穴に拡大させる。小穴の直径を裏面側に向かって拡大することにより、チップの穴詰まりを減少させることができるために好ましい。
【0010】
液切り板は、好ましくは、容器の中心軸に対する垂直面ではなく、この垂直面との狭角が10ないし30度となるように傾けて設ける。更に好ましくは、液切り板の最下部の位置とチップ取出口の最下端が一致させて、洗浄済みのチップの排出を容易にすることができる。
液切り板は、洗浄液の温度変化による伸縮歪みを緩和するため、円形又は楕円形の一体形状ではなくて、半径方向に数枚に分割し組み合わせた構造とする方が好ましい。
【0011】
図3には、液切り板12に近接してその下方にこの液切り板とほぼ平行になるような位置に上面を有する中空の中子9を設けた実施態様の一例を示す。この中子9と圧力容器40の鏡板3の周辺とを均圧管95により接続することが好ましい。
【0012】
中子9の上面91は、撹拌軸スペース51の胴部と共に洗浄空間の底面を構成し、この底面の上方には、間隙93をあけてほぼに平行に液切り板12が設けられていることになる。液切り板12には、前述のように、それを貫通するか、又は好ましくはそれを貫通し下面が上面よりも大きな直径を有する多数の小穴が設けられている。液切り板12の上方には、液切り板12に近接して撹拌羽根71が設けられ、撹拌羽根71は、撹拌羽根駆動機構のモータにより変速機を経て駆動され、逆鏡板5及び液切り板12を貫通して設けられた撹拌軸73に固着され回転駆動される。液切り板12の最下部の位置に相当する圧力容器40の筒状胴部1には、チップ取出口13が設けられており、チップ取出口13の最下端が液切り板12の上面に一致するように設けられている。チップ取出口13は好ましくはクラッチドアにより開閉できるようになっている。逆鏡板5には、洗浄液排出管52が設けられ、筒状胴部には水蒸気吹き込み管55が設けられ、水蒸気を中子上面と液切り板との間に吹き込むことができる。
【0013】
圧力容器40は、温度100℃超、好ましくは105℃以上150℃以下、更に好ましくは、105℃以上130℃以下の温度において、洗浄液を液状に維持するに必要な圧力(約2〜5kgf/cm)に耐え得るような容器である。チップ投入等に使用できる蓋35はクラッチドアとして密閉できることが好ましい。圧力容器40には、例えば加熱冷却のために加圧水蒸気、井水等を循環するためのジャケット15を設けることが好ましい。容器の形状は上記の条件を満足する限り特に限定されないが、その内径Dと内高さHとの比が、D:H=1:1〜2である形状を有するものが、内容物の撹拌効率、温度制御などの点で好ましい。蓋35又は筒状胴部1に、加圧容器40の内部用照明及び観察用の窓を設けてもよい。
【0014】
筒状胴部の中央部付近には、加圧容器全体を架台に固定するための支持台17が周方向に設けられている。
【0015】
液切り板12が中心軸Xに対して傾斜している程度は特に限定されないが圧力容器40内の液切り板12と圧力容器40の中心軸Xに垂直な平面Yとの狭角αが10〜30度であるように傾斜していることが好ましい。狭角αが、上記範囲よりも小さいと洗浄されたチップの取り出し速度が遅くなり、上記範囲よりも大きいと洗浄処理中のチップの撹拌効果が低下し洗浄時間が長くなる傾向にある。
圧力容器40が円形の横断面を有しており、液切り板12が上記のように形成されているので、液切り板12の平面形状は円形乃至楕円形である。
【0016】
液切り板12は、洗浄処理が終了した後に、洗浄処理されたチップをその上に残し、汚染された洗浄液及びすすぎ水を下に通し排出する役割をする。従って、液切り板12に設けられた小穴の大きさ及び密度は、チップの大きさや排液量などを考慮して適宜定めればよいが、一般に小穴の直径が1〜10mmであり、小穴の穴端間隔が2〜10mmであることが好ましい。
【0017】
撹拌羽根71は、洗浄処理中はチップを洗浄液中に十分分散させる役割をなし、洗浄処理して液切りを行なった後、洗浄されたチップをチップ取出口から排出させる役割をなす。従って、撹拌羽根71は、液切り板12に近接して設けられ、洗浄処理中は圧力容器40の内容物を上方に送って対流運動させるような機能を有するものであることが好ましい。撹拌羽根71の形状は、ファンタービン型羽根や、湾曲ファンタービン型羽根、角度付きファンタービン型羽根、ファウドラー型羽根などであることが好ましいが、その他の形状のものであってもよい。
撹拌羽根71の長さは特に限定されないが、洗浄されたチップの取り出しを容易にするために、撹拌羽根71の先端ができるだけ圧力容器40の側壁内面に近接するようにすることが好ましい。
【0018】
撹拌軸73は、撹拌軸スペース51に液シールされた状態で取り付けられており、液切り板12との間には適度の間隙があってもよい。図1、図2及び図3には、撹拌羽根71を圧力容器40の下方から駆動させる態様を示したが、撹拌軸を圧力容器40の蓋部3又は筒状胴部1を貫通させて設け、撹拌羽根を上方から駆動させるようにしてもよい。
【0019】
蓋35及びチップ取出口13は、図3に示すようなクラッチドアとするほかに、スライド方式で開閉できるようにしてもよい。
【0020】
この加圧式洗浄装置を使用してチップの洗浄を継続している内に、液切り板12の小穴が除去物質で閉塞されることがある。その場合、液切り板12の下側から上方に洗水を流して小穴の閉塞物質を除去するために、液排出管52に洗水管を設けてもよい。勿論、洗浄液排出バルブから洗水を容器3内へ逆流させることもできる。
【0021】
本発明の圧力容器は、わが国においては日本規格(JIS)上の第1種圧力容器として設計することが好ましい。ここで、第1種圧力容器とは、設計温度が材料のクリープ領域未満で、設計圧力が100MPa(1,000kgf/cm)未満の圧力容器をいう。圧力容器の建造に使用される円筒胴、鏡板、ジャケット、及び開口部の詳細な形状・寸法やそれらの材料は、JIS規格に詳細に規定されている。
又米国においてはASMEボイラー及び圧力容器(AMSE Boiler and Pressure Vessel Code, Section VIII Pressure Vessel, Division I)の規格に従い製作する。
【0022】
次に、加圧式洗浄装置を使用して、記録層が積層されたポリカーボネートチップ、などを洗浄する方法について説明する。
【0023】
本発明の洗浄装置により洗浄することができるチップは、必要に応じて、予め切断、破砕若しくは粉砕などによりチップ形状としたものであれば特に限定されない。洗浄し得るチップの例としては、汚れた又は塗布層が積層された、プラスチックスのフィルム、シート及びその他の成形品などを挙げることができる。チップの大きさは特に限定されず、一般に約100mm角以下、特に約30mm角以下の大きさを有するものであることが好ましい。
【0024】
本発明の洗浄装置により特に有効に洗浄することができるチップとしては、例えば、セルロール系プラスチックス、ポリエステル、その他のプラスチックスの支持体上に感光層などが積層された各種の写真感光材料、このような支持体上に磁気材料の層などが形成された磁気テープや磁気ディスク、このような支持体上に金属や色素の層などが積層された光ディスク、このような支持体上に金属や色素の層や感光性樹脂の層などが積層された印刷用材料、内容物で汚れたプラスチックスの空容器などを挙げることができる。
【0025】
先ず、取り出し口13及び洗浄液排出バルブを閉じ、蓋35から洗浄したいチップを圧力容器40に投入し、蓋35を密閉する。次いで、洗浄液供給口37,38から所定量の所定組成を有する洗浄液を入れバルブを閉める。次に、撹拌羽根13を回転させながら、圧力容器のジャケットに加圧水蒸気を通して加熱し、又、加圧水蒸気を圧力容器40内に吹き込んで内温を105℃ないし130℃に昇温する。回転数を徐々に増加させ、所定の回転数で所定時間撹拌しながら洗浄処理する。洗浄処理が終了した後、洗浄液排出バルブを開け、液排出管52から洗浄液を排出する。排出する洗浄液の流量は、所定量の井水(18℃)と混合して混合後の温度が95℃以下になるように調節する。これで一段の洗浄処理を終了するが、必要があれば、洗浄液の組成を変えて別の洗浄処理を行なってもよい。洗浄処理の間に、チップに付着していた汚れやチップの支持体に積層されていた層は剥離され、洗浄液に溶解したり微細な屑となって洗浄液と共に液排出管から排出され、液切り板12上に洗浄処理されたチップが残留する。
【0026】
洗浄処理が終了した後、同様に水によりチップを水洗する。水洗した水は洗浄液排出管から排出され、液切り板12上に水洗処理されたチップが残留する。水洗の間、必要に応じて液温度を所定の温度に維持する。
【0027】
必要ならば、圧力容器1の内壁に付着したチップを水のシャワーリングにより洗い流す。水洗処理が終了した後、十分水切りをして、チップ取出口13を開いて撹拌機を低速で回転させながら、チップ取出口13から洗浄、水洗処理されたチップを排出させる。
【0028】
本発明のチップ洗浄装置は前記のような構造を有しているので、チップの洗浄及水洗を有効に行なうことができ、使用した洗浄液及水洗水の排出が容易であり、更に、水洗処理されたチップを少ない労力で円滑に短時間に容器から取り出すことが可能になる。
【0029】
【発明の効果】
本発明の加圧式洗浄装置は、(1)100℃超の温度で洗浄するために、洗浄剤に使用する薬品の量を減少させることができ、処理時間を短縮することができる、(2)薬品の使用量が少ないために水洗が簡便である(3)残留薬剤を痕跡量に低減でき高品質で安定な樹脂を回収できる洗浄装置である。
【図面の簡単な説明】
【図1】本発明に係る加圧式洗浄装置の一実施例の概略を示す斜視図である。
【図2】図1における洗浄装置の断面を拡大した概略図である。
【図3】圧力容器の下部に中子を設けた一実施態様である。
【図4】チップ取り出し口の一実施態様としてのクラッチドアの概念図を示す。
【符号の説明】
1 筒状胴部
3 鏡板
5 逆鏡板
9 中子
12 液切り板
13 チップ取出口
15 ジャケット
17 支持台
18 筒状胴部下部フランジ部
19 筒状胴部上部フランジ部
31 鏡板フランジ部
35 蓋
37,38 洗浄液供給口
40 圧力容器
51 撹拌軸スペース
52 液排出口
55 水蒸気吹き込み管
58 逆鏡板フランジ部
70 撹拌羽根駆動機構
71 撹拌羽根
73 撹拌軸
80 架台
91 上面
93 間隙
95 均圧管
[0001]
[Industrial application fields]
The present invention relates to a pressure-type cleaning apparatus capable of cleaning a chip including a plastic made of a synthetic resin or a natural resin at a temperature exceeding 100 ° C., and more specifically, a recording in which various functional layers are laminated on a support made of synthetic resin. The present invention relates to a pressure cleaning apparatus for recovering synthetic resin from materials and the like.
[0002]
[Prior art]
Materials in which layers having various functions are laminated on a support made of cellulose organic ester or synthetic resin are used in many fields. For example, various recording materials in which a recording layer is laminated on a plastic support made of a thermoplastic resin such as triacetate cellulose, aromatic polyester, aromatic polycarbonate or the like are widely used. These recording materials include a photographic photosensitive material in which a silver halide photosensitive layer is provided on a triacetate cellulose support or a polyester support, a CD-ROM in which a dye recording layer and a reflective layer are provided on a polycarbonate substrate, an optical disk, and a polyester support. A magnetic tape or a magnetic disk provided with a magnetic recording layer on a substrate or a polyimide support.
[0003]
As a cleaning apparatus for recovering synthetic resin and the like from these recording materials, an apparatus described in JP-A-5-8228 is known. This device is a cleaning device that can efficiently clean a chip in a short time and take out the cleaned chip in a short time without trouble. However, since it is not a pressurizing device, the cleaning temperature is 100 ° C. This is the upper limit, and there are limits to shortening the cleaning time and improving the quality of the recovered resin. In addition, if the tip cleaning device is to be a pressurized container according to a normal design, if the bottom end plate is a flat end plate, a flat end plate of several centimeters is required. Although the end plate can be made thin, a large dead space is generated at the bottom, which results in a large apparatus and extremely poor operability.
[0004]
[Problems to be solved by the invention]
The present invention has been made in view of the above circumstances, and the problem to be solved by the present invention is to first wash a chip containing a cellulose organic acid ester or a synthetic resin at a temperature exceeding 100 ° C. An object of the present invention is to provide a pressurized container that can efficiently recover a high-purity raw material resin.
The problem to be solved by the present invention is secondly to provide a cleaning device that is compact and has good operability.
[0005]
[Means for Solving the Problems]
The present invention has been achieved by the following means.
(1) From a vertical cylindrical barrel having a circular cross section, an end plate connected to the upper portion of the cylindrical barrel portion, and a reverse end plate connected to be convex upward at the lower portion of the cylindrical barrel portion The end plate is provided with a lid into which chips can be inserted and a cleaning liquid supply port. A tip outlet is provided below the barrel, and a barrel is provided below the cylindrical barrel. A pressurizing type characterized in that a liquid draining plate is provided across the liquid draining plate, a stirring blade is provided close to the upper side of the liquid cutting plate, and a stirring shaft of the stirring blade is provided through the reverse mirror plate. Cleaning equipment,
(2) A hollow core for filling a space between the liquid draining plate and the lower end plate, and a pressure equalizing pipe for equalizing the pressure in the core and the pressurized container are provided. Pressure-type cleaning equipment,
(3) The chip outlet is a clutch door connected to the cylindrical body, and the clutch door forms a circular flange connected to the cylindrical body, and the circular flange of the take-out lid The pressure-type cleaning device according to (1) or (2), which is configured to face a configured mirror ring and sandwich and fix both wheels with an outer ring.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
Some preferred embodiments of the present invention are listed below.
1) The above-described pressure-type cleaning apparatus in which the liquid draining plate has a plane perpendicular to the central axis of the container and a narrow angle of 10 to 30 degrees.
2) The pressure-type cleaning device described above, wherein small holes having a diameter of 1 to 10 mm are provided in the liquid draining plate at a hole end interval of 2 to 10 mm.
3) The above-described pressure-type cleaning device in which a jacket for heating and cooling is provided on the cylindrical body.
4) The above-described pressure-type cleaning apparatus, wherein the ratio of the inner diameter D and the inner height H of the container is D: H = 1: 1 to 2.5.
[0007]
DETAILED DESCRIPTION OF THE INVENTION A pressure cleaning apparatus according to the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a perspective view schematically showing an embodiment of a chip cleaning apparatus according to the present invention.
2 is a schematic cross-sectional view (enlarged) taken along line AA in FIG.
FIG. 3 shows an embodiment having a core at the bottom of the container. FIG. 4 shows one embodiment of the clutch door.
[0008]
1 and 2, the pressure-type cleaning device includes a pressure vessel 40 and a stirring blade driving mechanism 70 fixed to a gantry 80. The pressure vessel 40 is a vertical cylindrical vessel having a circular cross section, and the end plate 3 is provided on the upper portion of the cylindrical body 1, and a lid 35 that can be used for a chip insertion port or the like is provided at the center of the end plate 3. The lid 35 can be opened and closed by a clutch door. The end plate 3 is further provided with cleaning liquid supply ports 37 and 38. A reverse mirror plate 5 having a convex shape is connected to the bottom of the pressure vessel 40. Near the central part of the reverse mirror plate 5, the stirring shaft of the stirring blade drive mechanism is preferably provided so as to be inclined with respect to the central axis X of the pressure vessel 40. It is preferable that the cylindrical trunk | drum 1 and the end plate 3 are connected by the cylindrical trunk | drum upper flange part 19 and the end plate flange part 31 which were each provided. Moreover, it is preferable that the cylindrical trunk | drum 1 and the reverse mirror board 5 are connected by the cylindrical trunk | drum lower flange part 18 and the reverse mirror board flange part 58 which were each provided.
[0009]
A tip outlet 13 is provided below the cylindrical body 1 of the pressure vessel 40 of the present invention, and a liquid draining plate 12 that crosses the body is provided below the inside of the cylindrical body 1. .
The liquid draining plate 12 has a large number of small holes, and more preferably, small holes having a diameter of 1.5 to 6 mm are formed at intervals of 2 to 10 mm. Although the diameter of these small holes may be uniform in the thickness direction of the liquid cutting plate, according to a preferred embodiment, the diameter of the front side of the small hole is from the middle of the depth direction corresponding to the diameter of the liquid cutting plate to the back side. Expand to a hole with a diameter approximately twice as large. It is preferable because the clogging of the chip can be reduced by increasing the diameter of the small hole toward the back surface side.
[0010]
The liquid draining plate is preferably provided in an inclined manner so that a narrow angle with the vertical surface is 10 to 30 degrees, not a vertical surface with respect to the central axis of the container. More preferably, the position of the lowermost part of the liquid draining plate and the lowermost end of the chip outlet are made coincident to facilitate the discharge of the cleaned chips.
In order to relieve expansion and contraction strain due to temperature change of the cleaning liquid, the liquid draining plate is preferably not a circular or elliptical integrated shape but a structure in which the liquid dividing plate is divided into several pieces in the radial direction and combined.
[0011]
FIG. 3 shows an example of an embodiment in which a hollow core 9 having an upper surface is provided at a position close to the liquid draining plate 12 and below the liquid draining plate 12 so as to be substantially parallel to the liquid draining plate. The core 9 and the periphery of the end plate 3 of the pressure vessel 40 are preferably connected by a pressure equalizing tube 95.
[0012]
The upper surface 91 of the core 9 constitutes the bottom surface of the cleaning space together with the body portion of the stirring shaft space 51, and the liquid draining plate 12 is provided above the bottom surface with a gap 93 approximately in parallel. become. As described above, the liquid draining plate 12 is provided with a plurality of small holes penetrating through the liquid cutting plate 12 or preferably having a diameter lower than that of the upper surface. Above the liquid cutting plate 12, a stirring blade 71 is provided close to the liquid cutting plate 12, and the stirring blade 71 is driven through a transmission by a motor of a stirring blade driving mechanism, and the reverse mirror plate 5 and the liquid cutting plate are driven. 12 is fixed to a stirring shaft 73 provided so as to penetrate through 12 and is driven to rotate. The cylindrical body 1 of the pressure vessel 40 corresponding to the lowermost position of the liquid draining plate 12 is provided with a chip outlet 13, and the lowermost end of the chip outlet 13 coincides with the upper surface of the liquid separator 12. It is provided to do. The tip outlet 13 is preferably openable and closable by a clutch door. The reverse mirror plate 5 is provided with a cleaning liquid discharge pipe 52, and the cylindrical body portion is provided with a water vapor blowing pipe 55, so that water vapor can be blown between the upper surface of the core and the liquid cutting plate.
[0013]
The pressure vessel 40 has a pressure (about 2 to 5 kgf / cm) necessary for maintaining the cleaning liquid in a liquid state at a temperature exceeding 100 ° C., preferably 105 ° C. to 150 ° C., more preferably 105 ° C. to 130 ° C. It is a container that can withstand 2 ). The lid 35 that can be used for chip insertion or the like is preferably sealed as a clutch door. The pressure vessel 40 is preferably provided with a jacket 15 for circulating pressurized steam, well water or the like for heating and cooling, for example. The shape of the container is not particularly limited as long as the above conditions are satisfied, but the content of the container having a shape in which the ratio of the inner diameter D to the inner height H is D: H = 1: 1 to 2 is agitated. It is preferable in terms of efficiency and temperature control. The lid 35 or the cylindrical body 1 may be provided with illumination for the inside of the pressurized container 40 and an observation window.
[0014]
A support base 17 for fixing the entire pressurized container to the gantry is provided in the circumferential direction near the center of the cylindrical body.
[0015]
The degree to which the liquid draining plate 12 is inclined with respect to the central axis X is not particularly limited, but the narrow angle α between the liquid draining plate 12 in the pressure vessel 40 and the plane Y perpendicular to the central axis X of the pressure vessel 40 is 10. It is preferable to incline so that it may be -30 degree | times. When the narrow angle α is smaller than the above range, the speed of taking out the cleaned chips becomes slow, and when the narrow angle α is larger than the above range, the stirring effect of the chips during the cleaning process tends to decrease and the cleaning time tends to be long.
Since the pressure vessel 40 has a circular cross section and the liquid cutting plate 12 is formed as described above, the planar shape of the liquid cutting plate 12 is circular or elliptical.
[0016]
The liquid draining plate 12 serves to discharge the contaminated cleaning liquid and the rinsing water through the bottom of the chip subjected to the cleaning process after the cleaning process is finished. Accordingly, the size and density of the small holes provided in the liquid draining plate 12 may be appropriately determined in consideration of the size of the chip, the amount of drainage, etc. Generally, the diameter of the small holes is 1 to 10 mm. The hole end interval is preferably 2 to 10 mm.
[0017]
The agitation blade 71 serves to sufficiently disperse the chip in the cleaning liquid during the cleaning process, and after discharging the liquid after the cleaning process, the stirring chip 71 discharges the cleaned chip from the chip outlet. Therefore, it is preferable that the stirring blade 71 is provided in the vicinity of the liquid draining plate 12 and has a function of sending the contents of the pressure vessel 40 upward and causing convection movement during the cleaning process. The shape of the stirring blades 71 is preferably a fan turbine blade, a curved fan turbine blade, an angled fan turbine blade, a Fowler blade, or the like, but may be of other shapes.
The length of the stirring blade 71 is not particularly limited, but it is preferable that the tip of the stirring blade 71 is as close as possible to the inner surface of the side wall of the pressure vessel 40 in order to facilitate the removal of the cleaned tip.
[0018]
The stirring shaft 73 is attached in a state of being liquid-sealed in the stirring shaft space 51, and there may be an appropriate gap between the stirring shaft 73 and the liquid draining plate 12. 1, 2, and 3 show a mode in which the stirring blade 71 is driven from below the pressure vessel 40, but the stirring shaft is provided through the lid portion 3 or the cylindrical body portion 1 of the pressure vessel 40. The stirring blade may be driven from above.
[0019]
In addition to the clutch door as shown in FIG. 3, the lid 35 and the chip outlet 13 may be opened and closed by a sliding method.
[0020]
While the cleaning of the chip is continued using this pressure type cleaning device, the small hole of the liquid draining plate 12 may be blocked with the removing substance. In that case, a washing pipe may be provided in the liquid discharge pipe 52 in order to flush the washing water from the lower side of the liquid cutting plate 12 and remove the clogging substance in the small holes. Of course, the washing water can be made to flow back into the container 3 from the washing liquid discharge valve.
[0021]
In Japan, the pressure vessel of the present invention is preferably designed as a first type pressure vessel on the Japanese standard (JIS). Here, the first type pressure vessel refers to a pressure vessel whose design temperature is less than the creep region of the material and whose design pressure is less than 100 MPa (1,000 kgf / cm 2 ). The detailed shape and dimensions of the cylindrical body, the end plate, the jacket, and the opening used for the construction of the pressure vessel, and their materials are stipulated in detail in JIS standards.
In the US, it is manufactured according to the standard of ASME boiler and pressure vessel (Section VIII Pressure Vessel, Division I).
[0022]
Next, a method for cleaning a polycarbonate chip on which a recording layer is laminated using a pressure type cleaning apparatus will be described.
[0023]
The chip that can be cleaned by the cleaning apparatus of the present invention is not particularly limited as long as it is formed into a chip shape by cutting, crushing, or pulverizing in advance. Examples of chips that can be cleaned include plastics films, sheets, and other molded articles that are soiled or laminated with a coating layer. The size of the chip is not particularly limited, and is generally preferably about 100 mm square or less, particularly about 30 mm square or less.
[0024]
Examples of chips that can be cleaned particularly effectively by the cleaning apparatus of the present invention include, for example, various types of photographic photosensitive materials in which a photosensitive layer is laminated on a support of cellulose plastics, polyester, or other plastics. Magnetic tape or magnetic disk in which a layer of magnetic material is formed on such a support, optical disc in which a layer of metal or pigment is laminated on such a support, metal or dye on such a support And a printing material in which a layer of photosensitive resin or the like is laminated, and an empty plastic container contaminated with the contents.
[0025]
First, the take-out port 13 and the cleaning liquid discharge valve are closed, a chip to be cleaned is put into the pressure vessel 40 from the lid 35, and the lid 35 is sealed. Next, a predetermined amount of cleaning liquid having a predetermined composition is introduced from the cleaning liquid supply ports 37 and 38, and the valve is closed. Next, while rotating the stirring blade 13, pressurized steam is heated through the jacket of the pressure vessel, and the pressurized steam is blown into the pressure vessel 40 to raise the internal temperature to 105 ° C. to 130 ° C. The number of rotations is gradually increased, and the cleaning process is performed while stirring for a predetermined time at a predetermined number of rotations. After the cleaning process is completed, the cleaning liquid discharge valve is opened and the cleaning liquid is discharged from the liquid discharge pipe 52. The flow rate of the cleaning liquid to be discharged is adjusted so that the temperature after mixing with a predetermined amount of well water (18 ° C.) becomes 95 ° C. or less. This completes the one-stage cleaning process, but if necessary, another cleaning process may be performed by changing the composition of the cleaning liquid. During the cleaning process, dirt adhering to the chip and the layer laminated on the support of the chip are peeled off and dissolved in the cleaning liquid or become fine debris and discharged from the liquid discharge pipe together with the cleaning liquid. The cleaned chip remains on the plate 12.
[0026]
After the cleaning process is completed, the chip is similarly washed with water. The washed water is discharged from the washing liquid discharge pipe, and the washed chips remain on the liquid draining plate 12. During washing with water, the liquid temperature is maintained at a predetermined temperature as necessary.
[0027]
If necessary, the chips adhering to the inner wall of the pressure vessel 1 are washed away with a water shower ring. After the water washing process is completed, water is sufficiently drained, the chip outlet 13 is opened and the agitator is rotated at a low speed, and the washed and washed chips are discharged from the chip outlet 13.
[0028]
Since the chip cleaning apparatus of the present invention has the structure as described above, it is possible to effectively perform chip cleaning and water washing, and it is easy to discharge the used cleaning liquid and water, and further, water washing treatment is performed. Chips can be removed from the container smoothly and in a short time with little effort.
[0029]
【The invention's effect】
The pressure type cleaning apparatus of the present invention (1) Since the cleaning is performed at a temperature higher than 100 ° C., the amount of chemicals used for the cleaning agent can be reduced, and the processing time can be shortened. (2) Washing with water is simple because the amount of chemicals used is small. (3) This is a cleaning device that can reduce residual chemicals to trace amounts and recover high-quality and stable resin.
[Brief description of the drawings]
FIG. 1 is a perspective view showing an outline of an embodiment of a pressure type cleaning apparatus according to the present invention.
FIG. 2 is an enlarged schematic view of a cross section of the cleaning apparatus in FIG.
FIG. 3 is an embodiment in which a core is provided in the lower part of the pressure vessel.
FIG. 4 is a conceptual diagram of a clutch door as one embodiment of a chip outlet.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Cylindrical trunk | drum 3 End plate 5 Reverse end plate 9 Core 12 Liquid draining plate 13 Chip outlet 15 Jacket 17 Support stand 18 Cylindrical trunk | drum lower flange part 19 Cylindrical trunk | drum upper flange part 31 End-plate flange part 35 Lid 37, 38 Washing liquid supply port 40 Pressure vessel 51 Stirring shaft space 52 Liquid discharge port 55 Water vapor blowing tube 58 Reverse end plate flange portion 70 Stirring blade drive mechanism 71 Stirring blade 73 Stirring shaft 80 Stand 91 Upper surface 93 Gap 95 Pressure equalizing tube

Claims (3)

横断面が円形の縦型筒状胴部、この筒状胴部の上部に接続された鏡板、及びこの筒状胴部の下部に上に凸となるように接続された逆鏡板よりなる加圧容器であって、この鏡板にはチップ投入可能な蓋及び洗浄液供給口が設けられ、この胴部下方には、チップ取出口が設けられ、筒状胴部下方内部には胴部を横断する液切り板が設けられ、前記液切り板の上方に前記液切り板に近接して撹拌羽根が設けられ、この撹拌羽根の撹拌軸が前記逆鏡板を貫通して設けられ、前記液切り版の表面形状が、円形又は楕円形の半径方向に数枚に分割し組み合わせた構造を有し、前記液切り版には1.5〜6mmの径を有する小穴が2〜10mmの穴端間隔で穿設されており、前記小穴の直径が、液切り板の表面側の表面直径に相当する深さ方向途中から裏面側にかけて小穴の表面側直径の約2倍の大きさに拡大されたことを特徴とする加圧式洗浄装置。Pressurization comprising a vertical cylindrical body having a circular cross section, an end plate connected to the upper portion of the cylindrical body, and a reverse end plate connected to be protruded upward at the lower portion of the cylindrical body The end plate is provided with a lid into which a chip can be inserted and a cleaning liquid supply port. A chip outlet is provided below the body part, and a liquid that crosses the body part is provided below the cylindrical body part. A cutting plate is provided, and a stirring blade is provided in the vicinity of the liquid cutting plate above the liquid cutting plate, and a stirring shaft of the stirring blade is provided through the reverse mirror plate, and the surface of the liquid cutting plate The shape is a circular or elliptical structure divided into several pieces in the radial direction, and a small hole having a diameter of 1.5 to 6 mm is drilled in the liquid cutting plate at a hole end interval of 2 to 10 mm. The diameter of the small hole is from the middle in the depth direction corresponding to the surface diameter on the surface side of the liquid cutting plate. About twice that which is enlarged to the size pressurized cleaning apparatus characterized by the surface-side diameter of the eyelet toward. 前記液切り板と前記下部鏡板との間に生じる空間を埋めるための中空の中子、及び、この中子と加圧容器内の圧力を均等とするための均圧管を設けた請求項1に記載の加圧式洗浄装置。  A hollow core for filling a space generated between the liquid draining plate and the lower end plate, and a pressure equalizing pipe for equalizing the pressure in the core and the pressurized container are provided. The pressure-type cleaning apparatus as described. チップ取出口が筒状胴部に接続されたクラッチドアであり、このクラッチドアが筒状胴部側に接続された円形フランジ部を構成する胴輪と、取り出し蓋の鏡板円形フランジ部を構成する鏡輪とを対面させ両輪を外輪により挟み込み固定するように構成した請求項1又は2に記載の加圧式洗浄装置。  The chip outlet is a clutch door connected to the cylindrical body, and the clutch door forms a circular flange part that forms a circular flange part connected to the cylindrical body part, and an end plate circular flange part of the take-out lid The pressurization type washing apparatus according to claim 1 or 2, wherein the wheel is opposed to the mirror wheel and both wheels are sandwiched and fixed by the outer ring.
JP2001017053A 2000-02-22 2001-01-25 Pressurized cleaning device Expired - Lifetime JP4570257B2 (en)

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JP2001017053A JP4570257B2 (en) 2001-01-25 2001-01-25 Pressurized cleaning device
US09/789,947 US6623564B2 (en) 2000-02-22 2001-02-21 Method of recovering synthetic substrates
TW90103894A TW496792B (en) 2000-02-22 2001-02-21 Process for recovery of synthetic resin substrate and pressured type cleaning apparatus used thereof

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KR100840557B1 (en) * 2006-12-07 2008-06-23 신종우 Pressure and Heated Curing Unit
CN108554919A (en) * 2018-06-06 2018-09-21 江西金昌食品有限公司 A kind of rice flour former material material cleaning device convenient for discharge
CN108654718A (en) * 2018-06-12 2018-10-16 江西金昌食品有限公司 A kind of feeding equipment of rice flour raw material cleaning
JP7118378B2 (en) * 2019-10-03 2022-08-16 株式会社加藤製缶鉄工所 Insulation structure in high-temperature processing equipment
WO2024058134A1 (en) * 2022-09-13 2024-03-21 リンテック株式会社 Method for removing coating layer and device for removing coating layer

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JPH03140408A (en) * 1989-10-27 1991-06-14 Nippon Steel Corp Sealing device for sub-lance hole in pressurizing type converter waste gas treating apparatus
JPH058228A (en) * 1991-04-30 1993-01-19 Panatsuku Kogyo Kk Chip washing device
JPH1059493A (en) * 1996-08-12 1998-03-03 Toshiba Mach Co Ltd Washing water supplying container for beverage distributing device
JPH10230112A (en) * 1997-02-18 1998-09-02 Toyota Motor Corp Filter and its manufacture
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JP2001012856A (en) * 1999-06-28 2001-01-19 Hitachi Chemical Techno-Plant Co Ltd Heat treating apparatus

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