JP4568596B2 - Polishing surface plate - Google Patents

Polishing surface plate Download PDF

Info

Publication number
JP4568596B2
JP4568596B2 JP2004364318A JP2004364318A JP4568596B2 JP 4568596 B2 JP4568596 B2 JP 4568596B2 JP 2004364318 A JP2004364318 A JP 2004364318A JP 2004364318 A JP2004364318 A JP 2004364318A JP 4568596 B2 JP4568596 B2 JP 4568596B2
Authority
JP
Japan
Prior art keywords
pellets
work
surface plate
row
work material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004364318A
Other languages
Japanese (ja)
Other versions
JP2006167869A (en
Inventor
徹 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Diamond Industrial Co Ltd
Original Assignee
Asahi Diamond Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Diamond Industrial Co Ltd filed Critical Asahi Diamond Industrial Co Ltd
Priority to JP2004364318A priority Critical patent/JP4568596B2/en
Publication of JP2006167869A publication Critical patent/JP2006167869A/en
Application granted granted Critical
Publication of JP4568596B2 publication Critical patent/JP4568596B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Polishing Bodies And Polishing Tools (AREA)

Description

本発明は超砥粒ペレットを基板の片面に貼付した研摩用定盤に関する。さらに詳細に言えば、硬脆材料や金属材料などの、特に薄板状の被削材の研摩に使用する、超砥粒ペレットを用いた研摩用定盤に関する。   The present invention relates to a polishing surface plate in which superabrasive pellets are attached to one side of a substrate. More specifically, the present invention relates to a polishing surface plate using superabrasive pellets used for polishing thin plate-like work materials such as hard and brittle materials and metal materials.

円板状の基板の片面に超砥粒ペレットを固着した、例えば両頭研削で使用する定盤に代表される研摩用定盤が知られている。この研摩用定盤は、ペレットを用いることにより広い作用面を有するホイールを安価に製作できること、ペレットを貼付する基板を再利用可能であること、ペレットの密度(単位面積当たりのペレットの個数)を変えることにより切味や寿命を制御できることなどの利点があり、硬脆材料や金属材料の、特に薄板状の被削材の研摩に広く使用されている。使用する超砥粒としては、鉄系の被削材にはCBNが、それ以外の被削材にはダイヤモンド砥粒が適していることが知られている。また、ペレットを形成するためのボンド材としてはメタル、レジン、ビトリファイド等が使用される。また、研摩方法として、研摩を行う際の被削材の移動のさせ方によってインフィードとスルーフィードとがある。   A polishing surface plate represented by a surface plate used in double-head grinding, for example, in which superabrasive pellets are fixed to one surface of a disk-shaped substrate is known. This polishing surface plate can produce a wheel having a wide working surface at low cost by using pellets, can reuse the substrate to which the pellets are attached, and the density of the pellets (number of pellets per unit area). It has the advantage that the sharpness and life can be controlled by changing it, and is widely used for polishing hard and brittle materials and metal materials, especially thin plate-like work materials. As superabrasive grains to be used, it is known that CBN is suitable for iron-based work materials and diamond abrasive grains are suitable for other work materials. Moreover, a metal, resin, vitrified, etc. are used as a bond material for forming a pellet. Further, as a polishing method, there are infeed and throughfeed depending on how the work material is moved during polishing.

ところで、研摩用定盤としてはその機能上、切味と耐摩耗性はきわめて重要な問題となる。切味については、ペレットの密度を下げることにより砥粒密度を下げて切味を向上させる方法がある。しかしペレットの密度を下げるトペレットの間隔が広くなり、研摩中に移動する被削材の端部がペレット間に落ち込み、そのまま次のペレットに当たるので、被削材を傷付け、研摩面の平坦度も得られず、被削材が割れてしまう場合もある。また、ペレットの損傷、脱落も生じ、ペレットの脱落が生じると、この落ち込みの現象は益々ひどくなる。   By the way, as a polishing surface plate, sharpness and wear resistance are extremely important problems in terms of its function. As for the sharpness, there is a method for improving the sharpness by lowering the density of the pellets to lower the abrasive density. However, the interval between pellets, which lowers the density of the pellets, becomes wider, and the end of the workpiece that moves during polishing falls between the pellets and hits the next pellet as it is, so the workpiece is damaged and the flatness of the polished surface is also obtained. In some cases, the work material may break. In addition, the pellets are damaged and fall off, and when the pellets fall off, the phenomenon of the drop becomes worse.

耐摩耗性については特に偏摩耗が問題となる。すなわち、基板上に同じペレットを間隔などの諸条件を略同じ条件で全体的に配置した場合、必ずしも全体的に均一に摩耗するとは限らず、むしろ偏摩耗が生じることが多い。偏摩耗が生じると、被削材の平面度が得られず、ホイールを再研摩して研摩面を平坦に整える必要があり、当然それだけ手間が掛かると同時にホイールの寿命も短くなる。なお以下において、上記したように同じペレットを間隔などの諸条件を略同じ条件で全体的に配置した場合に摩耗が相対的に大きくなる領域を被削材に対する仕事量が多い領域、摩耗が相対的に少ない領域を被削材に対する仕事量が少ない領域という。   As for wear resistance, uneven wear is a problem. That is, when the same pellets are disposed on the substrate as a whole under various conditions such as the spacing, the wear is not always uniform and rather uneven wear often occurs. If uneven wear occurs, the flatness of the work material cannot be obtained, and it is necessary to re-grind the wheel to make the polished surface flat. Of course, it takes time and labor and the life of the wheel is shortened. In the following, as described above, when the same pellets are arranged as a whole under substantially the same conditions such as the interval, the area where the wear is relatively large is the area where the work is large with respect to the work material, and the wear is relative Region with a small amount is called a region with a small amount of work on the work material.

特開平11−165254は、研削面の最外周と最内周に配置されたペレットのコーナ部(エッジ部)の偏摩耗に対処するものとして、ペレットを放射状に配置し、外周近くで各放射線の間にさらにペレットを配置してペレットの配置密度を高めるとと共に、最外周、最内周にリング状或いはセグメント状の超砥粒層を配置した構成を示している。   In JP-A-11-165254, pellets are arranged radially to deal with uneven wear at the corners (edges) of the pellets arranged on the outermost and innermost circumferences of the grinding surface, and each radiation is arranged near the outer circumference. A configuration is shown in which pellets are further arranged between them to increase the arrangement density of the pellets, and a ring-shaped or segmented superabrasive layer is disposed on the outermost periphery and the innermost periphery.

特開平11−165254JP-A-11-165254

しかし、前述したように砥粒密度が高まると切味は悪くなるので、内外周部での砥粒密度を高くするにも限度がある。また、偏摩耗を防止しようとすれば内外周部とそれらの間の部分での砥粒のバランスを図る必要があるが、内外周との関係で中間の部分でのペレットの密度を低くすると前述した被削材の落込みの問題が生じやすくなる。   However, as described above, when the abrasive density is increased, the sharpness is deteriorated, so there is a limit to increasing the abrasive density at the inner and outer peripheral portions. Further, if it is intended to prevent uneven wear, it is necessary to balance the abrasive grains in the inner and outer peripheral parts and the part between them. The problem of falling of the cut work material is likely to occur.

さらに、同じ研摩用定盤を用いても、被削材の材質、形状、大きさ或いは研摩方法又は条件によって偏摩耗が生じる部位が異なり、ケースによっては内外周部ではなく中央部に偏摩耗が生じる場合もあり、また生じる偏摩耗の量も異なる。   Furthermore, even if the same polishing surface plate is used, the portion where uneven wear occurs depends on the material, shape, size, polishing method or conditions of the work material, and depending on the case, uneven wear may occur in the central portion instead of the inner and outer peripheral portions. It may occur and the amount of uneven wear that occurs is also different.

本願発明は上記従来の問題点に鑑みなされたものであり、切味に優れ、偏摩耗が生じにくく、良好な平坦度をもって被削材を研摩できる研摩用定盤を提供することをその課題とする。   The present invention has been made in view of the above-described conventional problems, and it is an object of the present invention to provide a polishing surface plate that is excellent in sharpness, hardly causes uneven wear, and can polish a work material with good flatness. To do.

上記課題を解決するために本願発明に係る研摩用定盤においては、円板状基板の一方の面上の円環状の領域に複数の超砥粒ペレットを固着した研摩用定盤において、被削材に対する仕事量が相対的に多い領域には相対的に耐摩耗性の高いペレットを、被削材に対する仕事量が相対的に少ない領域には相対的に耐摩耗性の低いペレットを配置した。   In order to solve the above problems, in the polishing surface plate according to the present invention, in the polishing surface plate in which a plurality of superabrasive pellets are fixed to an annular region on one surface of a disk-shaped substrate, Pellets with relatively high wear resistance were placed in regions with a relatively large amount of work on the material, and pellets with relatively low wear resistance were placed on regions with a relatively small amount of work on the work material.

具体的には、その耐摩耗性の低いペレットは、耐摩耗性の高いペレットと略同じ長さの外径を有し、円環状のリング又は円環の一部を切り欠いたリングの形をしている。 Specifically, the low wear-resistant pellet has an outer diameter of approximately the same length as the high wear-resistant pellet, and has a shape of an annular ring or a ring with a part of the ring cut out. is doing.

本発明では、上記の如く基板上に貼付する超砥粒ペレットとして、被削材に対する仕事量の多い領域には相対的に耐摩耗性の高いペレットを、被削材に対する仕事量が相対的に少ない領域には相対的に耐摩耗性の低いペレットを使用するようにしたので、被削材の材質、形状、大きさ、或いは研摩方法、研摩条件に応じて耐摩耗性の高いペレットと低いペレットを適宜配置して摩耗を均一化できる。従って、前述の被削材の落込みなどが生じない程度のペレットの配置密度を全体的に維持し、且つ砥粒密度を過度に高めることなく良好な切味が得られる。さらに全体的に均一に摩耗して偏摩耗が生じないので、被削材には高い平坦度が得られる。また、定盤の研摩面の平坦度を出す作業回数も減少し、作業効率が向上し、定盤自体の長寿命化も図れる。そして、耐摩耗性の低いペレットとして、耐摩耗性の高いペレットと外形寸法が同じ円環状のリング又は円環の一部を切り欠いたリングの形をしたペレットを使用しているので、ペレット間隔を広げずに作用面積を下げることができる。
In the present invention, as described above, as the superabrasive pellets to be affixed on the substrate, relatively high wear-resistant pellets are used in a region having a large amount of work on the work material, and the work on the work material is relatively high. Pellets with relatively low wear resistance are used in a small area, so pellets with high wear resistance and low pellets according to the material, shape, size, polishing method, and polishing conditions of the work material It is possible to make the wear uniform by arranging them appropriately. Therefore, it is possible to maintain the pellet arrangement density to such an extent that the above-described cutting of the work material does not occur, and to obtain a good sharpness without excessively increasing the abrasive density. Furthermore, since it wears out uniformly as a whole and uneven wear does not occur, a high flatness is obtained for the work material. In addition, the number of operations for obtaining the flatness of the polished surface of the surface plate is reduced, the work efficiency is improved, and the life of the surface plate itself can be extended. And, as pellets with low wear resistance, pellets in the form of an annular ring with the same external dimensions as the high wear resistance pellet or a ring with a part of the ring cut out are used. The working area can be lowered without widening.

以下、本願発明の具体的な実施の形態について図面を参照しながら説明する。図1は本願発明の第1の実施の形態に係る研摩用定盤1を示す、一部を切り欠いた平面図である。定盤1は公知の形状及び材料を用いて形成することのできる円板状の基板3と、その片面に固着された多数のペレット5からなる。本実施の形態ではペレット5は基板3の径方向で同心状、等間隔に内側から第1列7、第2列9、第3列11、第4列13、第5列15の5列に配置されている。各列に配置されたペレット8、10、12、14、16は各列において円周方向で略等間隔に配置されている。そして各列に配置されるペレットの数は、それぞれの列でのペレットの間隔が互いに近い値となるようになっている。   Hereinafter, specific embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a plan view with a part cut away, showing a polishing surface plate 1 according to a first embodiment of the present invention. The surface plate 1 includes a disk-shaped substrate 3 that can be formed using a known shape and material, and a large number of pellets 5 fixed to one surface thereof. In the present embodiment, the pellets 5 are concentric in the radial direction of the substrate 3 and are arranged in five rows of first row 7, second row 9, third row 11, fourth row 13, and fifth row 15 from the inside at equal intervals. Has been placed. The pellets 8, 10, 12, 14, 16 arranged in each row are arranged at substantially equal intervals in the circumferential direction in each row. The number of pellets arranged in each row is such that the intervals between the pellets in each row are close to each other.

5列のペレットのうち、中間の第2列、第3列、第4列に配置されたペレット10、12、14は、ダイヤモンド砥粒を含んで形成されたダイヤモンドペレットであり、本実施の形態ではメタルボンドを結合剤として使用している。その形状は、従来公知の小さい円盤状をしている。一方内周側と外周側となる第1列及び第5列のペレット8、16はペレット10、12、14と同じダイヤモンド砥粒を含み、同じメタルボンドを用いて形成されているが、ペレット10、12、14とは異なり、リング状に形成されている。すなわち、ペレット8、16は図2に示されるように、外形はペレット10、12、14と同じ半径の円形であるが、ペレット10、12、14が中実に形成されているのに対してペレット8、16は中心穴8a1、6aが明けられて円環状のリングになっている。なお、ペレットの配置は5列に限定されるものではなく、必要に応じてその数を増やし、内周側と外周側とで所望の列だけペレット8、16を配置することができる。   Of the five rows of pellets, the pellets 10, 12, and 14 arranged in the second, third, and fourth rows in the middle are diamond pellets that include diamond abrasive grains. So, metal bond is used as a binder. The shape is a conventionally known small disk shape. On the other hand, the pellets 8 and 16 in the first row and the fifth row on the inner peripheral side and the outer peripheral side include the same diamond abrasive grains as the pellets 10, 12, and 14, and are formed using the same metal bond. , 12 and 14 are formed in a ring shape. That is, as shown in FIG. 2, the pellets 8 and 16 are circular with the same radius as the pellets 10, 12, and 14, but the pellets 10, 12, and 14 are solidly formed. The center holes 8a1 and 6a are opened in the holes 8 and 16 to form an annular ring. In addition, arrangement | positioning of a pellet is not limited to 5 rows, The number can be increased as needed and the pellets 8 and 16 can be arrange | positioned only the desired row | line | column by the inner peripheral side and an outer peripheral side.

図1に2点鎖線で略正方形の、例えばガラス板の被削材Wを示してある。図において定盤は符号A方向に回転し、被削材Wは図示しないキャリアに保持されながら符号Bの方向に自転しながら且つ符号Aの方向へ公転する。図示の状態では各列のペレットの被削材Wに接触する長さは略同じであるが、この状態から被削材Wが45度自転した状態では第1列と第5列のペレットの被削材Wへの接触長さは短くなって被削材に対する仕事量は相対的に少なくなる一方、第2列乃至第4列のペレットのそれは長くなって被削材に対する仕事量が多くなる。従って全てのペレットを同じダイヤモンドペレットで構成した場合、中央部のペレットの摩耗が進んで偏摩耗が生じてしまうが、本実施の形態によれば被削材への仕事量が相対的に少ない領域である内外周部のペレットがリング状で、中央部の列のペレットより耐摩耗性が低くなっており、偏摩耗が生じない。従って被削材Wの支持を均一に行うことができ、平坦度の高い加工面を得ることができる。   FIG. 1 shows a work material W made of, for example, a glass plate, which is substantially square with a two-dot chain line. In the figure, the surface plate rotates in the direction of symbol A, and the work material W revolves in the direction of symbol A while rotating in the direction of symbol B while being held by a carrier (not shown). In the state shown in the figure, the length of the pellets in each row contacting the work material W is substantially the same, but in the state where the work material W has rotated 45 degrees from this state, the work of the first row and the fifth row of pellets is performed. The length of contact with the work material W is shortened and the work amount on the work material is relatively reduced, while that of the pellets in the second to fourth rows is longer and the work amount on the work material is increased. Therefore, when all the pellets are composed of the same diamond pellets, wear of the pellets in the central part is advanced and uneven wear occurs, but according to the present embodiment, the work amount on the work material is relatively small. The inner and outer peripheral pellets are ring-shaped and have lower wear resistance than the central row of pellets, and uneven wear does not occur. Therefore, the work material W can be supported uniformly, and a processed surface with high flatness can be obtained.

図3は他の実施の形態で使用するペレット及びその配列を示すペレット配置説明図である。この実施の形態において前述の第1の実施の形態と異なる点は、第1列と第5列に使用するペレットの形状である。すなわち、第1列と第5列に使用するペレットは第1の実施の形態では円環状のリングであったのに対して、この実施の形態での第1列と第5列のペレット31、39は円環の一部を切り欠いたリングになっている。そして第1列のペレット31はその切欠き31aが基板の径方向で中心側を向いて配置されており、第5列のペレット39はその切欠き39aが径方向外方を向いて配置されている。   FIG. 3 is an explanatory view of pellet arrangement showing pellets and their arrangement used in another embodiment. In this embodiment, the difference from the first embodiment described above is the shape of the pellets used in the first row and the fifth row. That is, the pellets used in the first row and the fifth row were annular rings in the first embodiment, whereas the pellets 31 in the first row and the fifth row in this embodiment, 39 is a ring with a part of the ring cut out. The pellets 31 in the first row are arranged with the notches 31a facing the center in the radial direction of the substrate, and the pellets 39 in the fifth row are arranged with the notches 39a facing outward in the radial direction. Yes.

上記においては、ペレットの形状を変え、各ペレットの被削材に接触する面積を変えることにより耐摩耗性を変えたが、耐摩耗性を変えるにはこれに限定されない。例えば砥粒の集中度、砥粒の粒度、砥粒の種類、充填剤の添加量などを変えることにより耐摩耗性を変えてもよい。   In the above description, the wear resistance is changed by changing the shape of the pellets and changing the area of each pellet that contacts the work material. However, the wear resistance is not limited to this. For example, the wear resistance may be changed by changing the concentration of abrasive grains, the grain size of abrasive grains, the type of abrasive grains, the amount of filler added, and the like.

また、上記実施の形態においては内外周部が相対的に被削材に対する仕事量が少ない領域で、中央部分が相対的に被削材に対する仕事量が多い領域である例について説明したが、本願発明が適用されるのはこれに限定されない。例えば、スルーフィードで研摩を行う場合には被削材が定盤の外側から入り込む形となるので、外周側の領域に配置されたペレットの被削材に対する仕事量が他の領域のペレットに対して相対的に多くなるので、例えば外周側の2列に耐摩耗性の高いペレットを、それより内周側の列には耐摩耗性の低いペレットを配置すると良い。   Further, in the above embodiment, the example has been described in which the inner and outer peripheral portions are regions with a relatively small amount of work with respect to the work material, and the central portion is a region with relatively large work amounts with respect to the work material. The invention is not limited to this. For example, when polishing with through-feed, the work material enters from the outside of the surface plate, so the work amount of the pellets arranged in the outer peripheral area to the work material is smaller than the pellets in other areas Therefore, for example, pellets with high wear resistance may be disposed in two rows on the outer peripheral side, and pellets with low wear resistance may be disposed on the inner peripheral row.

本発明の第1の実施の形態に係る研摩用定盤を示す一部切欠き平面図である。1 is a partially cutaway plan view showing a polishing surface plate according to a first embodiment of the present invention. 図1の定盤で使用する耐摩耗性の低いペレットの平面図である。It is a top view of the pellet with low abrasion resistance used with the surface plate of FIG. 第2の実施の形態で使用するペレットの形状及び配置を示すペレット配置説明図である。It is pellet arrangement explanatory drawing which shows the shape and arrangement | positioning of the pellet used by 2nd Embodiment.

符号の説明Explanation of symbols

1:研摩用定盤 3:基板 8:第1列のペレット 10:第2列のペレット 12:第3列のペレット 14:第4列のペレット 16:第5列のペレット
1: Polishing platen 3: Substrate 8: First row of pellets 10: Second row of pellets 12: Third row of pellets 14: Fourth row of pellets 16: Fifth row of pellets

Claims (2)

円板状基板の一方の面上円環状の領域に複数の超砥粒ペレットを固着した研摩用定盤において、被削材に対する仕事量が相対的に多い領域には円盤状のペレットを、被削材に対する仕事量が相対的に少ない領域には前記円盤状のペレットと略同じ長さの外径を有し、円環状のリング又は円環の一部を切り欠いたリングの形をしているペレットを配置したことを特徴とする、研摩用定盤。 In a polishing surface plate in which a plurality of superabrasive pellets are fixed to an annular region on one surface of a disk-shaped substrate, a disk-shaped pellet is applied to a region where the work amount relative to the work material is relatively large. In the region where the amount of work on the cutting material is relatively small, it has an outer diameter of approximately the same length as the disk-shaped pellet, and is in the form of an annular ring or a ring with a part of the ring cut out. A polishing surface plate characterized by arranging pellets. 請求項1記載の研摩用定盤において、前記ペレットはいずれもダイヤモンド砥粒を含んで形成されていることを特徴とする、研摩用定盤。 2. The polishing surface plate according to claim 1, wherein each of the pellets is formed to contain diamond abrasive grains .
JP2004364318A 2004-12-16 2004-12-16 Polishing surface plate Expired - Fee Related JP4568596B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004364318A JP4568596B2 (en) 2004-12-16 2004-12-16 Polishing surface plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004364318A JP4568596B2 (en) 2004-12-16 2004-12-16 Polishing surface plate

Publications (2)

Publication Number Publication Date
JP2006167869A JP2006167869A (en) 2006-06-29
JP4568596B2 true JP4568596B2 (en) 2010-10-27

Family

ID=36669143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004364318A Expired - Fee Related JP4568596B2 (en) 2004-12-16 2004-12-16 Polishing surface plate

Country Status (1)

Country Link
JP (1) JP4568596B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4610575B2 (en) * 2007-03-29 2011-01-12 株式会社ノリタケスーパーアブレーシブ Electrodeposition wheel

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62107980A (en) * 1985-11-06 1987-05-19 Mitsubishi Metal Corp Segment chip of grinding stone and grinding stone using segment chip
JP2000288917A (en) * 1999-04-06 2000-10-17 Nippon Sheet Glass Co Ltd Wrapping device and polishing method using it
JP2004243465A (en) * 2003-02-13 2004-09-02 Allied Material Corp Diamond lapping surface plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62107980A (en) * 1985-11-06 1987-05-19 Mitsubishi Metal Corp Segment chip of grinding stone and grinding stone using segment chip
JP2000288917A (en) * 1999-04-06 2000-10-17 Nippon Sheet Glass Co Ltd Wrapping device and polishing method using it
JP2004243465A (en) * 2003-02-13 2004-09-02 Allied Material Corp Diamond lapping surface plate

Also Published As

Publication number Publication date
JP2006167869A (en) 2006-06-29

Similar Documents

Publication Publication Date Title
US20100190418A1 (en) Lapping plate-conditioning grindstone segment, lapping plate-conditioning lapping machine, and method for conditioning lapping plate
WO2010038646A1 (en) Apparatus for polishing spherical body, method for polishing spherical body and method for manufacturing spherical member
JPH06210571A (en) Disk-like grinding tool
JP4568596B2 (en) Polishing surface plate
JP4610575B2 (en) Electrodeposition wheel
JP3664691B2 (en) Dresser for CMP processing
JP2010036303A (en) Grinding wheel for semiconductor wafer back-surface and grinding method for semiconductor wafer back-surface
CN107671724A (en) Chemical mechanical grinding dresser and manufacturing method thereof
JP4203486B2 (en) Polishing pad dresser for dressing polishing pad used for finish polishing of aluminum substrate for hard disk, and method for polishing aluminum substrate for hard disk
JP4352588B2 (en) Grinding wheel
JP2004243465A (en) Diamond lapping surface plate
JP6199231B2 (en) Whetstone for lapping
JP2006167865A (en) Surface plate for polishing and polishing method of plate glass using surface plate for polishing
JPH0760648A (en) Precision grinding cutting grinding wheel
JP4485914B2 (en) Grinding wheel
JP2007266441A (en) Cup-like grinding stone for semiconductor wafer rear surface grinding and grinding method
JPH11207635A (en) Cup-like grinding wheel and wafer surface grinding method
JP7441376B2 (en) Polishing pad dresser, dressing method, polishing method, and workpiece manufacturing method
JP2005279845A (en) Grinding wheel
JP6203980B1 (en) Total rotary dresser and dressing method
JPH11165254A (en) Super abrasive grain lapping surface plate
JPH11188642A (en) Disk-like grinding wheel
US3471975A (en) Surfacing wheel
JPH03264267A (en) Diamond wheel
JP2009269105A (en) Grinding wheel

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071203

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100318

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100323

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100513

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100708

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100809

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130813

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees