JP4517683B2 - Method for producing hot-dip plated plate - Google Patents

Method for producing hot-dip plated plate Download PDF

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JP4517683B2
JP4517683B2 JP2004066754A JP2004066754A JP4517683B2 JP 4517683 B2 JP4517683 B2 JP 4517683B2 JP 2004066754 A JP2004066754 A JP 2004066754A JP 2004066754 A JP2004066754 A JP 2004066754A JP 4517683 B2 JP4517683 B2 JP 4517683B2
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plating
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JP2005256043A (en
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理孝 櫻井
雅毅 多田
章一郎 平
芳春 杉本
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JFE Steel Corp
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本発明は、溶融めっき方式による分散めっき板製造方法に関するものである。 The present invention relates to a manufacturing method of the dispersion plating plate by melt plating method.

溶融めっき鋼板は、品種の多様化と共に量的拡大を示している鉄鋼製品の一つである。その背景には、(1)省資源・省エネルギーなどの社会的要請、(2)要業界の技術革新・先端分野の発展、(3)生活水準の向上とライフスタイルの変化が起こり、消費者ニーズの多様化・高級化・多機能化したため、溶融めっき板の適用範囲が拡大するという変化があったことがあげられる。   Hot dip plated steel is one of the steel products that has shown a quantitative expansion along with diversification of varieties. The reasons behind this are (1) social demands such as resource and energy savings, (2) technological innovations in key industries and development of advanced fields, and (3) improvement of living standards and lifestyle changes. As a result of the diversification, upgrading, and multifunctionality, there has been a change that the application range of hot-dip plated sheets has expanded.

従来の亜鉛めっきより優れた耐食性を求めて、多くの亜鉛系合金めっきが開発された。高耐食性を目指す方向としては合金化が1つの方法であり、これによって製品の耐用年数は伸びたといえる。しかしながら、需要家の要望はメインテナンスフリーであり、さらに高耐食性を有する材料の要求がある。これに応えるためには、めっき皮膜の複合化が必要である。   Many zinc-based alloy platings have been developed in search of corrosion resistance superior to conventional galvanizing. Alloying is one method for achieving high corrosion resistance, and it can be said that the service life of the product has been extended. However, customer demand is maintenance-free, and there is a further demand for materials having high corrosion resistance. In order to respond to this, it is necessary to combine plating films.

1)高耐食性分散めっき
亜鉛めっき中にSiO2ゾルを共析させる分散めっきが電気めっき法により開発されている。SiO2は広いpH範囲で安定な物質であり、Znとの複合酸化物は、Cl-、O2、H2Oなどの腐食因子に対してバリアーとして働く。これまで、めっき皮膜の複合化は、化成処理などでめっき表面に何らかの皮膜を形成させることにより行われていた。そのために表面に傷がつくと表層が破壊され、容易に機能が失われていた。それに対し分散めっきでは、めっき皮膜全体にSiO2ゾル、Al23ゾル、BaCrO4、SrCrO4等を容易に分散できるので、従来の亜鉛めっきに比べはるかに耐食性に優れためっき皮膜が形成される。
1) Dispersion plating with high corrosion resistance Dispersion plating that co-deposits SiO 2 sol during zinc plating has been developed by electroplating. SiO 2 is a stable substance over a wide pH range, and a complex oxide with Zn acts as a barrier against corrosion factors such as Cl , O 2 , and H 2 O. Until now, the composite of plating films has been performed by forming some film on the plating surface by chemical conversion treatment or the like. Therefore, when the surface was scratched, the surface layer was destroyed and the function was easily lost. In contrast, with dispersion plating, SiO 2 sol, Al 2 O 3 sol, BaCrO 4 , SrCrO 4, etc. can be easily dispersed throughout the plating film, resulting in the formation of a plating film with much better corrosion resistance than conventional zinc plating. The

2)着色分散めっき
従来、めっき皮膜の着色は、亜鉛めっき板の表面上に塗料を塗って行われており、カラー板と呼ばれている。また、亜鉛めっき皮膜自体を発色させる方法として、亜鉛浴中に特殊元素を添加し、後処理により酸化皮膜を形成させその干渉色により色を出す方法も開発されている。これらは、いずれも表面にしか着色層が付いていないので、傷によって着色効果は失われてしまう。
2) Colored dispersion plating Conventionally, the plating film is colored by applying a paint on the surface of the galvanized plate, which is called a color plate. In addition, as a method for coloring the galvanized film itself, a method has been developed in which a special element is added to a zinc bath, an oxide film is formed by post-treatment, and a color is produced by the interference color. Since these all have a colored layer only on the surface, the coloring effect is lost due to scratches.

そこで、めっき金属中に着色顔料や蛍光顔料を分散させたカラーめっきが有望である。顔料の色調に応じた金属めっき皮膜が得られ、めっき金属による耐食性と色による意匠静とを兼ね備えることができる。さらには、塗装と異なり皮膜に傷が付いても色が失われることはないという特徴を持つ。   Therefore, color plating in which a color pigment or a fluorescent pigment is dispersed in a plated metal is promising. A metal plating film corresponding to the color tone of the pigment can be obtained, and it can have both corrosion resistance due to the plating metal and design static due to the color. Furthermore, unlike painting, it has the characteristic that the color is not lost even if the film is scratched.

3)耐熱性分散めっき
現在、耐熱性めっき板としては、Alめっきがある。しかしながら、より高温で使用される場合にはステンレスが用いられ、高温耐食性が必要な場合にはAlめっきステンレスが用いられている。Alめっき皮膜中にSiO2などの粒子を分散させれば、耐熱・高温耐食性めっき皮膜を得ることができる。
3) Heat resistant dispersion plating Currently, there is Al plating as a heat resistant plating plate. However, stainless steel is used when used at higher temperatures, and Al plated stainless steel is used when high temperature corrosion resistance is required. If particles such as SiO 2 are dispersed in the Al plating film, a heat-resistant and high-temperature corrosion-resistant plating film can be obtained.

4)分散めっき板の製造方法
高耐食性、着色、高耐熱性などの高い機能を付与しためっき板は、上記のように、金属マトリックス中に微粒子を均一に分散させた分散めっきが有望である。
4) Dispersion plating plate manufacturing method As described above, a dispersion plate in which fine particles are uniformly dispersed in a metal matrix is promising for a plating plate having high functions such as high corrosion resistance, coloring, and high heat resistance.

分散めっきの製造方法としては、電気めっき法によるものと無電解めっき法によるものとが開発されている。しかしながら、マトリックス金属と分散粒子の組み合わせには制約があり、また、分散粒子の皮膜中への析出効率が低いなどの問題がある。また、これらの方法ではめっき金属の析出速度が遅いため連続めっき板への適用は難しい。   As a method for producing dispersion plating, an electroplating method and an electroless plating method have been developed. However, there are restrictions on the combination of the matrix metal and the dispersed particles, and there are problems such as low deposition efficiency of the dispersed particles in the film. In addition, these methods are difficult to apply to a continuous plating plate because the deposition rate of the plating metal is slow.

一方、亜鉛、アルミニウムや、その合金などの溶融めっき板は、従来、一般的に以下のように製造されている。すなわち、冷間圧延後の薄板に対し前処理工程で表面の洗浄を施し、無酸化性あるいは還元性の雰囲気に保たれた焼鈍炉内において表面酸化膜を除去し、焼鈍を行い、次いで冷却して溶融金属浴温度とほぼ同程度まで冷却して溶融金属浴中に侵入させる。その後、板を浴から引き上げ、板表面に付着した過剰の溶融金属をガスワイパーで払拭している。   On the other hand, hot-dip plated plates such as zinc, aluminum, and alloys thereof are conventionally manufactured as follows. That is, the thin sheet after cold rolling is subjected to surface cleaning in a pretreatment step, the surface oxide film is removed in an annealing furnace maintained in a non-oxidizing or reducing atmosphere, annealing is performed, and then cooling is performed. Then, it is cooled to about the same temperature as the molten metal bath temperature and penetrates into the molten metal bath. Thereafter, the plate is pulled up from the bath, and excess molten metal adhering to the plate surface is wiped with a gas wiper.

従来の溶融めっき板の製造に用いられる溶融めっき板製造設備の要部配置を示す概略断面図を図1に示す。板1は、焼鈍炉2にて材質を調整された後、非酸化性雰囲気に保たれたスナウト3からめっきポット4aに保持された溶融金属浴4に引き込まれ、シンクロール5を経て鉛直方向に引き上げられ、ガスワイパー6で過剰の溶融金属が払拭される。合金化溶融亜鉛めき板を製造する場合には、加熱炉8で加熱することによりめっきした亜鉛と地鉄のFeとを拡散合金化させ、めっき皮膜をFe−Zn合金とする。その後、冷却装置9により常温程度にまで冷却され、後工程に導かれ、製品となる。   FIG. 1 is a schematic cross-sectional view showing the arrangement of main parts of a hot-dip plating plate manufacturing facility used for manufacturing a conventional hot-dip plating plate. After the material is adjusted in the annealing furnace 2, the plate 1 is drawn into the molten metal bath 4 held in the plating pot 4 a from the snout 3 kept in a non-oxidizing atmosphere, and passes through the sink roll 5 in the vertical direction. The excess molten metal is wiped off by the gas wiper 6. In the case of producing an alloyed hot-dip galvanized sheet, the zinc plated by heating in the heating furnace 8 and the Fe of the base iron are diffusion-alloyed, and the plating film is made an Fe—Zn alloy. Then, it cools to about normal temperature with the cooling device 9, is led to a post process, and becomes a product.

この連続溶融めっきラインにおいて分散めっきを製造する方法としては、溶融金属中に粒子を均一に分散させ、これに板を浸漬しめっきする必要がある。しかしながら、実際には、溶融金属の浴を強力に攪拌しても、浴中に粒子を均一に分散させることは困難であり、粒子の凝集は防止し得ない。このため、めっき板も、めっき皮膜中に粒子が不均一に分散したものしか得られず、事実上連続溶融めっきラインによる分散めっき板の製造は不可能に近い。 As a method for producing dispersion plating in this continuous hot dipping line, it is necessary to disperse particles uniformly in the molten metal and to immerse and plate the plate. However, in practice, even if the molten metal bath is vigorously stirred, it is difficult to uniformly disperse the particles in the bath, and the aggregation of the particles cannot be prevented. For this reason, only a plating plate in which particles are dispersed non-uniformly in the plating film can be obtained, and it is virtually impossible to produce a dispersion plating plate by a continuous hot dipping line.

従って、この発明の目的は、このような従来の問題に鑑み、溶融めっき方式により、めっき皮膜中に粒子が均一に分散した分散めっき板製造方法を提供することである。 Accordingly, an object of the present invention has been made in view of such conventional problems, the hot dipping method, particles in the plating film is to provide a method for producing a uniformly dispersed dispersion plating plate.

本発明者等は、あらかじめ粒子を分散させた溶融金属めっきポットを有することなく、分散めっき板を製造することができる、溶融分散めっき板の製造設備及び方法について鋭意検討した。   The inventors of the present invention have intensively studied a production facility and a method for a hot-dip dispersion plating plate that can produce a hot-dip plating plate without having a hot metal plating pot in which particles are dispersed in advance.

その結果、単一のめっき浴(純金属あるいは合金)で溶融めっきを行い、分散させる粒子は溶融めっきが完了した後に、供給して付着させ、さらにその後で加熱してめっき金属を溶融することで、めっき金属と付着させた粒子とを混合させることにより、溶融めっき法により分散めっき板が製造できることを見出した。   As a result, hot dip plating is performed in a single plating bath (pure metal or alloy), and dispersed particles are supplied and adhered after hot dip plating is completed, and then heated to melt the plated metal. It has been found that a dispersion plating plate can be manufactured by a hot dipping method by mixing the plated metal and the adhered particles.

本発明はこの知見に基づくものである。本発明の要旨は次のとおりである。   The present invention is based on this finding. The gist of the present invention is as follows.

発明は、金属板を溶融金属浴中を通過させて前記金属板に溶融めっき処理を施して、前記金属板の少なくとも1つの表面に溶融めっき層を形成する溶融めっき金属板の製造方法において、
前記溶融金属浴を通過させた金属板をめっき金属が凝固する温度まで冷却する工程と、
前記金属板の少なくとも一方の面のめっき表面に、めっき層中に分散させる酸化物粒子を付着させる付着工程と、
前記金属板を加熱して、溶融めっき金属と付着させた酸化物粒子とを混合させる工程と、
をこの順で有することを特徴とする、溶融分散めっき金属板の製造方法である。
In a first aspect of the present invention, there is provided a method of manufacturing a hot-dip plated metal plate, wherein the hot-dip plating process is performed on the metal plate by passing the metal plate through a hot-metal bath and a hot-dip plated layer is formed on at least one surface of the metal plate ,
Cooling the metal plate passed through the molten metal bath to a temperature at which the plated metal solidifies;
An adhesion step of attaching oxide particles dispersed in the plating layer to the plating surface of at least one surface of the metal plate;
Heating the metal plate and mixing the hot-dip plated metal and the adhered oxide particles;
In this order, a method for producing a hot-dip plated metal sheet.

発明は、第1発明において、前記付着工程は、めっき層中に分散させる酸化物粒子をめっき金属板に吹付けることを特徴とする溶融分散めっき金属板の製造方法である。 A second invention is the method for producing a hot-dip plated metal sheet according to the first invention , wherein the attaching step sprays oxide particles to be dispersed in the plated layer onto the plated metal sheet.

発明は、第1発明において、前記付着工程は、めっき層中に分散させる酸化物粒子をめっき金属板に電気めっきすることを特徴とする溶融分散めっき金属板の製造方法である。 A third invention is the method for producing a hot-dip dispersed plated metal plate according to the first invention , wherein the attaching step comprises electroplating a plated metal plate with oxide particles to be dispersed in the plated layer.

発明は、第1発明において、前記付着工程は、めっき層中に分散させる酸化物粒子をめっき金属板に塗布することを特徴とする溶融分散めっき金属板の製造方法である。 According to a fourth invention, in the first invention , the adhesion step is a method for producing a hot-dip plated metal sheet, characterized in that oxide particles dispersed in the plating layer are applied to the plated metal sheet.

発明は、第発明において、前記付着工程は、前記めっき層中に分散させる酸化物粒子をめっき金属板に塗布した後、前記酸化物粒子をめっき表面に圧着させる圧着工程を有することを特徴とする溶融めっき合金化処理鋼金属板の製造方法である。
発明は、第1発明〜第発明において、前記酸化物粒子に代えて、酸化物粒子に金属粒子を混合した粒子を用いることを特徴とする溶融めっき合金化処理鋼金属板の製造方法である。
According to a fifth aspect of the present invention, in the fourth aspect of the invention, the attaching step includes a pressure-bonding step in which the oxide particles dispersed in the plating layer are applied to the plated metal plate and then the oxide particles are pressure-bonded to the plating surface. It is the manufacturing method of the hot dip alloying treatment steel metal plate characterized.
A sixth invention is the method of manufacturing a hot-dip galvannealed steel plate according to any one of the first to fifth inventions, wherein particles obtained by mixing metal particles with oxide particles are used instead of the oxide particles. It is.

本発明においては、分散させる粒子は、ベースのめっきを行った後に供給するので、あらかじめ粒子を分散させた溶融金属めっきポットを有することなく、分散めっき板を製造することができる。   In the present invention, since the particles to be dispersed are supplied after performing the base plating, a dispersed plating plate can be produced without having a molten metal plating pot in which the particles are dispersed in advance.

以下、本発明の実施の形態について説明する。以下の図において、説明済みの図に示された部分と同じ部分には同じ符号を付してその説明を省略する。   Embodiments of the present invention will be described below. In the following drawings, the same parts as those shown in the already described figures are denoted by the same reference numerals, and the description thereof is omitted.

図2は、本発明の第1発明の実施の形態に係る溶融分散めっき板の製造設備の要部を示す概略断面図である。図2において、7aは分散させる粒子をめっき表面に付着させる粒子付着装置、8aは加熱炉、9aは冷却装置である。   FIG. 2 is a schematic cross-sectional view showing the main part of the manufacturing equipment for the hot-dip plated sheet according to the embodiment of the first invention of the present invention. In FIG. 2, 7a is a particle adhering device for adhering dispersed particles to the plating surface, 8a is a heating furnace, and 9a is a cooling device.

図3は、本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第1の実施の形態を説明する概略断面図である。本実施の形態に係る粒子付着装置は、めっき層中に分散させる粒子(分散粒子)をガスに混合させ、めっき板に粒子を吹付けて付着させる粒子吹き付け装置の一実施の形態である。   FIG. 3 is a schematic cross-sectional view for explaining a first embodiment of a particle adhering device arranged in a manufacturing facility for a hot-dip plated plate according to an embodiment of the present invention. The particle adhering apparatus according to the present embodiment is an embodiment of a particle spraying apparatus that mixes particles dispersed in a plating layer (dispersed particles) with a gas and sprays and adheres particles to a plating plate.

図3において、10aは粒子供給装置、11はブロワ(粒子吹き付けブロワ)、12は粒子供給管、13は粒子戻り管、14は粒子吹き付けボックスである。粒子を板1の両側に吹きつけて板の両面に粒子を付着させることができるように構成されている。板1の走行方向は、図中矢印の方向である。   In FIG. 3, 10a is a particle supply device, 11 is a blower (particle blowing blower), 12 is a particle supply pipe, 13 is a particle return pipe, and 14 is a particle blowing box. The particles are sprayed on both sides of the plate 1 so that the particles can adhere to both sides of the plate. The traveling direction of the plate 1 is the direction of the arrow in the figure.

粒子は、粒子供給装置10aからブロワ11の粒子戻り管13に供給してガスに混合させてブロワ11により加圧し、粒子供給管12を通って、粒子吹き付けボックス14の吹き付けチャンバー15に送り、該吹き付けチャンバー15のスリット16から板1に吹付けて板1のめっき表面に付着させる。余剰の粒子は、粒子吹き付けボックス14の上下部のスリット18から吸引されて排気チャンバー17に戻り、粒子供給管13を通って、再び粒子吹き付けブロワ11で加圧し、循環使用する。粒子供給量は、板巾、ラインスピード、めっき付着量および目標の合金化率により調整する必要があり、めっき表面へ付着する粉末の歩留まり(=付着効率)も考慮する必要がある。   The particles are supplied from the particle supply device 10 a to the particle return pipe 13 of the blower 11, mixed with the gas, pressurized by the blower 11, passed through the particle supply pipe 12, and sent to the spraying chamber 15 of the particle spraying box 14. It sprays on the board 1 from the slit 16 of the spraying chamber 15, and is made to adhere to the plating surface of the board 1. Excess particles are sucked from the upper and lower slits 18 of the particle blowing box 14, returned to the exhaust chamber 17, passed through the particle supply pipe 13, pressurized again by the particle blowing blower 11, and used for circulation. It is necessary to adjust the particle supply amount according to the plate width, the line speed, the plating adhesion amount, and the target alloying rate, and it is also necessary to consider the yield of the powder adhering to the plating surface (= adhesion efficiency).

粒子は、物理的粉砕法、液相法、気相法などにより製造されたものを用いることができる。粒子は、金属系あるいはセラミックス形の粒子を用いることができる。粒子径は、分級処理により、そろえたものを用いる。平均粒径は、0.01μm〜200μmのものを用いる。粒径は小さいほど、めっき皮膜の中への分散が行いやすい。また、めっき皮膜厚より粒径が大きい場合には、粒子の一部が表面に露出したような分散めっきの形態をとる。一方、200μmを越えると、上記の粒子の全部が表面に露出したような形態をとる可能性があり好ましくない。   Particles produced by a physical pulverization method, a liquid phase method, a gas phase method, or the like can be used. As the particles, metallic or ceramic particles can be used. As the particle diameter, those prepared by classification are used. The average particle diameter is 0.01 μm to 200 μm. The smaller the particle size, the easier the dispersion into the plating film. Further, when the particle diameter is larger than the thickness of the plating film, the dispersion plating is formed such that part of the particles are exposed on the surface. On the other hand, if it exceeds 200 μm, it is possible that the entire particle is exposed on the surface, which is not preferable.

図3の粒子吹き付け装置7cを図2の設備に配置する場合、粒子吹き付けボックス14は、板1の走行方向が鉛直方向になるように配置され、溶融状態にあるめっき金属表面に粒子を吹き付けてめっき金属表面に粒子を付着させる。   When the particle spraying device 7c of FIG. 3 is disposed in the facility of FIG. 2, the particle spraying box 14 is disposed such that the traveling direction of the plate 1 is a vertical direction, and sprays particles onto the surface of the plated metal in a molten state. Adhere particles to the plated metal surface.

加熱炉8aは、板1を加熱して、溶融めっき金属と粒子付着装置7aで付着させた粒子とを混合させる。加熱炉8aの加熱条件は、溶融めっき金属種およびその付着量、付着させた粒子種およびその付着量により調整される。加熱炉8aの加熱方式は特に限定されない。ガス加熱炉、高周波誘導加熱炉等公知の装置を採用できるが、加熱温度の制御性の点から高周波誘導加熱炉が有利である。   The heating furnace 8a heats the plate 1 and mixes the molten metal and the particles adhered by the particle adhesion device 7a. The heating condition of the heating furnace 8a is adjusted by the hot-dip metal species and their adhesion amount, the adhered particle species and their adhesion amount. The heating method of the heating furnace 8a is not particularly limited. A known apparatus such as a gas heating furnace or a high-frequency induction heating furnace can be adopted, but a high-frequency induction heating furnace is advantageous in terms of controllability of the heating temperature.

冷却装置9aは合金化処理後の板1を常温程度の温度まで冷却する。板表面に空気を吹き付けて冷却する空冷装置等、公知の冷却装置を採用できる。   The cooling device 9a cools the alloyed plate 1 to a temperature of about room temperature. A known cooling device such as an air cooling device that blows air on the plate surface to cool the plate can be employed.

図2の設備に図3の粒子付着装置を設置した場合、次のようにして溶融分散めっき板を製造する。板1は、焼鈍炉2にて材質を調整された後、非酸化性雰囲気に保たれたスナウト3から溶融金属浴4に引き込まれ、シンクロール5を経て鉛直方向に引き上げられて溶融めっきされガスワイパー6で過剰の溶融金属が払拭されされて、所定のめっき付着量に調整される。その直後に、分散させる粒子をめっき表面に付着させる粒子付着装置7により、分散させる粒子を付着させ、さらに、加熱炉8で板を加熱して、溶融めっき金属と付着させた粒子とを混合させ、その後、冷却装置9により常温程度にまで冷却し、そのままコイル状に巻き取り、又はコイル状に巻き取る前に、調質圧延を施したり、化成処理・潤滑処理皮膜等を形成する後処理を施したりする後工程を経て、所要の製品(溶融分散めっき板)となる。付着させる粒子が金属である場合には粒子の表層の一部が溶融めっき金属と合金化する場合がある。一方、完全に合金化され1つの層を形成した場合には、分散めっきとしての効果が失われるので、好ましくない。   When the particle adhering apparatus shown in FIG. 3 is installed in the facility shown in FIG. 2, a hot-dip plated sheet is manufactured as follows. After the material is adjusted in the annealing furnace 2, the plate 1 is drawn into the molten metal bath 4 from the snout 3 kept in a non-oxidizing atmosphere, pulled up in the vertical direction through the sink roll 5, and hot-dip plated. Excess molten metal is wiped off by the wiper 6 and adjusted to a predetermined plating adhesion amount. Immediately thereafter, the particles to be dispersed are adhered by the particle adhering device 7 for adhering the particles to be dispersed to the plating surface, and further, the plate is heated in the heating furnace 8 to mix the molten plating metal with the adhered particles. Then, after cooling to the room temperature by the cooling device 9, the coil is wound as it is, or before being wound into a coil, it is subjected to temper rolling or a post-treatment for forming a chemical conversion treatment / lubricating film, etc. After a subsequent process, the required product (molten dispersion plating plate) is obtained. When the particles to be deposited are metal, a part of the surface layer of the particles may be alloyed with the hot dip metal. On the other hand, when the alloy is completely alloyed to form one layer, the effect as dispersion plating is lost, which is not preferable.

図4は、本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第2の実施の形態を説明する概略断面図である。本実施の形態に係る粒子付着装置は、粒子をめっき表面に吹き付けて付着させる粒子吹き付け装置の別の実施の形態である。本実施の形態の装置は粒子をめっき表面に投射して付着させる。   FIG. 4 is a schematic cross-sectional view for explaining a second embodiment of the particle adhering device arranged in the manufacturing facility for the hot-dip plated plate according to the embodiment of the present invention. The particle adhesion apparatus according to the present embodiment is another embodiment of the particle spraying apparatus that sprays and adheres particles to the plating surface. The apparatus of the present embodiment projects and deposits particles on the plating surface.

図4において、(a)は粒子吹き付け装置7dの構造を説明する概略図で、粒子吹き付け装置7dは、めっき板の上下面の各々に対向して粒子を板表面に投射する粒子投射装置21a、21bを備える。図4(b)は板上面に粒子を投射する粒子投射装置21aの構造を説明する概略図で、10bは粒子供給装置、22はモーター、23は遠心ロータである。粒子24は粒子供給装置10bから供給し、モーター22で遠心ロータ23を回転させ、供給された粒子24を板1上面に投射してめっき表面に粒子24を付着させる。板下面に粒子を投射する粒子投射装置21bも同様の構成を備え、板下面に粒子を投射してめっき表面に粒子を付着させる。   In FIG. 4, (a) is a schematic diagram for explaining the structure of the particle spraying device 7d. The particle spraying device 7d is a particle projecting device 21a for projecting particles onto the plate surface facing the upper and lower surfaces of the plated plate. 21b. FIG. 4B is a schematic diagram illustrating the structure of a particle projection device 21a that projects particles onto the upper surface of the plate. 10b is a particle supply device, 22 is a motor, and 23 is a centrifugal rotor. The particles 24 are supplied from the particle supply device 10b, the centrifugal rotor 23 is rotated by the motor 22, the supplied particles 24 are projected onto the upper surface of the plate 1, and the particles 24 are attached to the plating surface. The particle projection device 21b that projects particles onto the lower surface of the plate also has the same configuration, and projects the particles onto the lower surface of the plate and attaches the particles to the plating surface.

粒子は、物理的粉砕法、液相法、気相法などにより製造されたものを用いることができる。粒子は、金属系あるいはセラミックス形の粒子を用いることができる。粒子径は、分級処理により、そろえたものを用いる。   Particles produced by a physical pulverization method, a liquid phase method, a gas phase method, or the like can be used. As the particles, metallic or ceramic particles can be used. As the particle diameter, those prepared by classification are used.

粒子を投射する際には、粒子の平均粒子径を10〜300μmにする必要がある。これは、平均粒子径が10μm未満であると、投射した固体粒子の速度が空気中で低下するため、投射速度を非常に大きくしなければ、付着させることができないためである。一方、平均粒子径が300μmを超えると合金化率の調整が難しくなる。また、粒子の投射速度は30m/sec以上にする必要がある。これは、投射速度が30m/s未満であると、粒子をめっき表面に付着させるために十分な運動エネルギーが付与されないためである。この観点から投射速度の上限は特に設けないが、投射速度が大きいと、粒子の運動エネルギーが過大となり亜鉛めっき皮膜を損傷させる可能性があることから、300m/sec以下であることが望ましい。粒子供給量は、板巾、ラインスピード、めっき付着量および目標の合金化率により調整する必要があり、めっき表面へ付着する粒子の歩留まり(=付着効率)も考慮する必要がある。   When projecting the particles, the average particle size of the particles needs to be 10 to 300 μm. This is because if the average particle diameter is less than 10 μm, the velocity of the projected solid particles decreases in the air, so that the projection cannot be made unless the projection velocity is increased very much. On the other hand, when the average particle diameter exceeds 300 μm, it is difficult to adjust the alloying rate. Further, the particle projection speed needs to be 30 m / sec or more. This is because if the projection speed is less than 30 m / s, sufficient kinetic energy is not imparted to attach the particles to the plating surface. From this viewpoint, the upper limit of the projection speed is not particularly set. However, if the projection speed is high, the kinetic energy of the particles becomes excessive and may damage the galvanized film. It is necessary to adjust the particle supply amount according to the plate width, line speed, plating adhesion amount and target alloying rate, and it is also necessary to consider the yield (= adhesion efficiency) of particles adhering to the plating surface.

図2の設備に図4の粒子吹き付け装置7dを設置した場合、該粒子吹き付け装置7dを用いて、溶融状態にあるめっき金属表面に粒子を吹き付けてめっき金属表面に粒子を付着させ、次に、加熱炉8aで板を加熱して、溶融めっき金属と付着させた粒子とを混合させ、冷却装置9aにより常温程度にまで冷却することで溶融分散めっき板を製造することができる。   When the particle spraying device 7d of FIG. 4 is installed in the facility of FIG. 2, using the particle spraying device 7d, the particles are sprayed on the surface of the plated metal in the molten state to adhere the particles to the surface of the plated metal, The plate is heated in the heating furnace 8a, the molten plating metal and the adhered particles are mixed, and the molten dispersion plating plate can be manufactured by cooling to about room temperature with the cooling device 9a.

図5は、本発明の第2発明の実施の形態に係る溶融分散めっき板の製造設備の要部を示す概略断面図である。図5において、7bは粒子付着装置、8bは加熱炉、9b、9cは冷却装置である。加熱炉8bは、板1を加熱して、溶融めっき金属と粒子付着装置7bで付着させた粒子を混合させる。加熱方式は特に限定されない。ガス加熱炉、高周波誘導加熱炉等公知の装置を採用できるが、合金化率の制御性の点から高周波誘導加熱炉が有利である。冷却装置9b、9cは各々板1を常温程度の温度まで冷却する。板表面に空気を吹き付けて冷却する空冷装置等、公知の冷却装置を採用できる。   FIG. 5 is a schematic cross-sectional view showing a main part of the manufacturing equipment for the hot-dip dispersion plated plate according to the second embodiment of the present invention. In FIG. 5, 7b is a particle adhering device, 8b is a heating furnace, and 9b and 9c are cooling devices. The heating furnace 8b heats the plate 1 and mixes the molten metal and the particles adhered by the particle adhesion device 7b. The heating method is not particularly limited. A known apparatus such as a gas heating furnace or a high-frequency induction heating furnace can be employed, but a high-frequency induction heating furnace is advantageous in terms of controllability of the alloying rate. The cooling devices 9b and 9c each cool the plate 1 to a temperature of about room temperature. A known cooling device such as an air cooling device that blows air on the plate surface to cool the plate can be employed.

図5の装置に配置する粒子付着装置は、前述の図3、図4に示した粒子吹き付け装置を使用することができる。   As the particle adhering device disposed in the apparatus shown in FIG. 5, the particle spraying apparatus shown in FIGS. 3 and 4 can be used.

図3の粒子吹き付け装置7cを図5の設備に配置する場合、粒子粉吹き付けボックス14は、板1の走行方向が水平方向になるように配置される。図5の設備に図3の粒子付着装置を配置した場合、次のようにして溶融分散めっき板を製造する。板1は、焼鈍炉2にて材質を調整された後、非酸化性雰囲気に保たれたスナウト3から溶融金属浴4に引き込まれ、シンクロール5を経て鉛直方向に引き上げられ引き上げられて溶融めっきされ、ガスワイパー6で過剰の溶融金属が払拭されされて、所定のめっき付着量に調整される。その後、冷却装置9aにより常温程度にまで冷却された後に、分散させる粒子をめっき表面に付着させる粒子付着装置7により、分散させる粒子を付着させ、さらに、加熱炉8で板を再加熱して、溶融めっき金属と付着させた粒子とを混合させ、その後、冷却装置9bにより常温程度にまで冷却され、後工程に導かれ、製品(溶融分散めっき板)となる。   When the particle spraying device 7c of FIG. 3 is disposed in the facility of FIG. 5, the particle powder spraying box 14 is disposed such that the traveling direction of the plate 1 is in the horizontal direction. When the particle adhering device of FIG. 3 is arranged in the facility of FIG. 5, a hot-dip plated plate is manufactured as follows. After the material is adjusted in the annealing furnace 2, the plate 1 is drawn into the molten metal bath 4 from the snout 3 kept in a non-oxidizing atmosphere, pulled up in the vertical direction through the sink roll 5, and then hot-dipped. Then, excess molten metal is wiped off by the gas wiper 6 and adjusted to a predetermined plating adhesion amount. Then, after being cooled to about room temperature by the cooling device 9a, the particles to be dispersed are attached by the particle attaching device 7 for attaching the particles to be dispersed to the plating surface, and the plate is reheated in the heating furnace 8, The hot-dip plated metal and the adhered particles are mixed, and then cooled to about room temperature by the cooling device 9b and led to a subsequent process to become a product (hot-dispersed plated plate).

図4の粒子吹き付け装置7dを図5の設備に配置したときは、図4に示されるように、粒子吹き付け装置7dは、板1の走行方向が水平方向になるように配置される。常温程度に冷却されためっき板表面に粒子付着装置装置を用いて粒子を吹きつけてめっき金属表面に粒子を付着させる。次に、加熱炉8bで板を加熱して、溶融めっき金属と付着させた粒子とを混合させ、冷却装置9cにより常温程度にまで冷却することで溶融分散めっき板を製造することができる。   When the particle spraying device 7d of FIG. 4 is disposed in the facility of FIG. 5, as shown in FIG. 4, the particle spraying device 7d is disposed so that the traveling direction of the plate 1 is horizontal. Particles are sprayed onto the surface of the plated metal by spraying the particles onto the surface of the plated plate cooled to about room temperature using a particle adhesion device. Next, the plate is heated in the heating furnace 8b, the molten plating metal and the adhered particles are mixed, and the molten dispersion plated plate is manufactured by cooling to about room temperature with the cooling device 9c.

前述の図3および図4の装置dは、粒子は板1の両面に付着させるように構成されているが、必要に応じて、板の一方の面のみに粒子を吹き付けて付着させるように構成してもよい。   The apparatus d in FIG. 3 and FIG. 4 described above is configured so that the particles adhere to both surfaces of the plate 1, but if necessary, the particles are sprayed and adhered to only one surface of the plate. May be.

図6は、本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第3の実施の形態を説明する概略断面図である。本実施の形態に係る粒子付着装置は、粒子をめっき板に電気めっきによって付着させる電気めっき装置である場合の一実施の形態である。図6において、電気めっき装置7eは、前処理装置31、めっき装置32、水洗乾燥装置33を備える。   FIG. 6 is a schematic cross-sectional view for explaining a third embodiment of the particle adhering device arranged in the production facility for the hot-dip plated plate according to the embodiment of the present invention. The particle adhesion apparatus according to the present embodiment is an embodiment in the case of an electroplating apparatus that adheres particles to a plating plate by electroplating. In FIG. 6, the electroplating device 7 e includes a pretreatment device 31, a plating device 32, and a water washing and drying device 33.

前処理装置31、めっき装置32、水洗装置33は板の電気めっきで一般的に用いられる装置でよい。例えば前処理装置31は、アルカリ脱脂装置でよく、必要に応じて、アルカリ脱脂装置の後に、水洗装置、酸洗酸洗装置、水洗スクラバーを順次配置しても良い。めっき装置32は通常の電気めっき装置でよく、水洗乾燥装置33は、電気めっき液を中和するための表面調整装置や湯洗装置でよい。   The pretreatment device 31, the plating device 32, and the water washing device 33 may be devices generally used for electroplating plates. For example, the pretreatment device 31 may be an alkaline degreasing device, and if necessary, a washing device, a pickling and pickling device, and a washing scrubber may be sequentially arranged after the alkaline degreasing device. The plating device 32 may be a normal electroplating device, and the water washing and drying device 33 may be a surface adjustment device or a hot water washing device for neutralizing the electroplating solution.

図6の粒子付着装置(電気めっき装置7e)は、図5の溶融分散めっき板の製造設備に配置され、次のようにして、溶融分散めっき板を製造する。溶融金属めっきされ、冷却装置9bで常温程度に冷却されためっき板は、前処理装置31で前処理され、めっき装置32で分散させる粒子が電気めっきされ、水洗乾燥装置31で水洗乾燥される。次に、加熱炉8bで板を加熱して、溶融めっき金属と付着させた粒子とを混合させ、冷却装置9cにより常温程度にまで冷却する。   The particle adhering apparatus (electroplating apparatus 7e) of FIG. 6 is disposed in the hot-dispersion plating plate manufacturing facility of FIG. 5, and manufactures the hot-dispersion plating plate as follows. The plated plate that has been subjected to molten metal plating and cooled to about room temperature by the cooling device 9 b is pretreated by the pretreatment device 31, the particles to be dispersed by the plating device 32 are electroplated, and washed and dried by the washing and drying device 31. Next, the plate is heated in the heating furnace 8b to mix the molten plating metal and the adhered particles, and is cooled to about room temperature by the cooling device 9c.

図7は、本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第4の実施の形態を説明する概略断面図である。本実施の形態に係る粒子付着装置は、粒子をめっき板に塗布して付着させる粒子塗布装置である場合の一実施の形態である。   FIG. 7 is a schematic cross-sectional view for explaining a fourth embodiment of the particle adhering apparatus arranged in the hot-dispersion plated plate manufacturing facility according to the embodiment of the present invention. The particle adhering apparatus according to the present embodiment is an embodiment in the case of a particle applying apparatus that applies and adheres particles to a plating plate.

図7において、粒子塗布装置7fは、塗布装置41、乾燥装置42、圧着装置43を備える。   In FIG. 7, the particle coating device 7 f includes a coating device 41, a drying device 42, and a pressure bonding device 43.

塗布装置41は、粒子のスラリーをめっき板表面に塗布できるものであればよい。カーテンコーター、ロールコーター、スプレーコーターなど、スラリーの塗布に使用される公知の塗布装置を使用できる。乾燥装置42は高周波誘導加熱が好ましく、公知の乾燥装置(熱風乾燥炉、焼き付け炉)を使用できる。圧着装置43は圧延ロールを使用できる。   The coating device 41 may be any device that can apply the particle slurry to the surface of the plating plate. A known coating apparatus used for slurry application, such as a curtain coater, a roll coater, or a spray coater, can be used. The drying device 42 is preferably high-frequency induction heating, and a known drying device (hot air drying furnace, baking furnace) can be used. The crimping device 43 can use a rolling roll.

分散させる粒子は、スラリーとして供給される。粒子は、前述の図3、図4の装置で使用する粒子と同様の粒子を使用することができる。図7の粒子付着装置(粒子塗布装置7f)は、図5の溶融分散めっき板の製造設備に配置され、次のようにして、溶融分散めっき板を製造する。溶融金属めっきされ、冷却装置9bで常温程度に冷却されためっき板に対して、塗布工程、乾燥工程、圧着工程が順次行われる。すなわち、分散させる粒子のスラリーは、塗布装置41を用いて常温程度に冷却されためっき板表面に塗布され、乾燥装置42で加熱乾燥してめっき表面に分散させる粒子を付着させる。次いで圧着装置43を用いて粒子が付着しためっき板を圧延して粒子をめっき表面に圧着する。なお、圧着装置43は必要に応じて使用される。次に、加熱炉8bで板を加熱して、溶融めっき金属と圧着した粒子とを混合させ、冷却装置9cにより常温程度にまで冷却される。スラリ状の金属粉末がロールコーター等の塗布装置で塗布される場合、金属粉末、水、微量の反応抑制剤よりなるスラリーは、金属粉末の含有量と粒径を適度に調整する必要がある。即ち、ロールコーターで塗布する上でスラリーの粘度は200cp以上であることが必要である。   The particles to be dispersed are supplied as a slurry. As the particles, the same particles as those used in the apparatus shown in FIGS. 3 and 4 can be used. The particle adhering device (particle applying device 7f) of FIG. 7 is arranged in the manufacturing facility for the hot dispersion plated plate of FIG. 5, and manufactures the hot dispersion plated plate as follows. A coating process, a drying process, and a press-bonding process are sequentially performed on the plated plate that has been subjected to molten metal plating and cooled to about room temperature by the cooling device 9b. That is, the slurry of particles to be dispersed is applied to the surface of the plating plate cooled to about room temperature using the coating device 41, and heated and dried by the drying device 42 to adhere the particles to be dispersed on the plating surface. Next, the plating plate to which the particles are adhered is rolled using the pressure bonding device 43 to press the particles to the plating surface. The crimping device 43 is used as necessary. Next, the plate is heated in the heating furnace 8b to mix the hot-dip metal and the pressure-bonded particles, and is cooled to about room temperature by the cooling device 9c. When slurry-like metal powder is applied by an application device such as a roll coater, the slurry made of metal powder, water, and a small amount of a reaction inhibitor needs to appropriately adjust the content and particle size of the metal powder. That is, the viscosity of the slurry needs to be 200 cp or more when applied by a roll coater.

また、塗布装置41は、乾燥した粒子を静電気的に板に付着させる静電塗布装置を使用してもよい。静電的に塗布する装置は、例えば、ノズルから噴出するガスジェットによって金属粉末をチャンバー内に導入しチャンバー内に発生しているコロナ放電で帯電させて、アースした鋼板に静電気的に付着させる方法である。この場合には、スラリーを用いたときのような水を含まない乾式法であるので、乾燥装置42はもうけなくてもよい。   The coating device 41 may be an electrostatic coating device that electrostatically attaches dried particles to a plate. For example, the electrostatic coating apparatus is a method in which a metal powder is introduced into a chamber by a gas jet ejected from a nozzle, charged by corona discharge generated in the chamber, and electrostatically adhered to a grounded steel sheet. It is. In this case, since the dry method does not include water as in the case of using a slurry, the drying device 42 may not be provided.

なお、本発明は上記実施形態に限定されることなく種々変形可能である。   The present invention can be variously modified without being limited to the above embodiment.

本発明では、ベースとなる溶融めっきは、種々の金属めっきまたは合金めっきに適用でき、さらに、付着させる粒子(分散粒子)を適宜選択することにより、多種多様の分散めっきを製造できることができる。   In the present invention, the base hot-dip plating can be applied to various metal platings or alloy platings, and various kinds of dispersion plating can be manufactured by appropriately selecting particles to be adhered (dispersion particles).

溶融めっき金属は、単一の金属だけでなく、種々の合金金属を用いることができる。すなわち、純金属では、亜鉛、アルミニウム、鉛などがあり、合金では、Al−Zn合金(5%Al−Zn合金めっき、22%Al−Zn合金めっき(超塑性合金めっき)、55%Al−Zn合金めっき)、Sn−Zn合金、Pb−Zn合金など、を用いることができる。   As the hot dip metal, not only a single metal but also various alloy metals can be used. That is, pure metals include zinc, aluminum, lead, etc., and alloys include Al—Zn alloys (5% Al—Zn alloy plating, 22% Al—Zn alloy plating (superplastic alloy plating), 55% Al—Zn. Alloy plating), Sn—Zn alloy, Pb—Zn alloy, and the like can be used.

付着させる粒子(分散させる粒子)として、単一種の粒子だけではなく、2種類以上の粒子を配合することにより、多種多様の分散めっきを製造することができる。さらに、分散させる粒子に金属粉を混合することにより、多種多様の分散合金めっきも製造することが可能である。   As the particles to be adhered (particles to be dispersed), not only a single kind of particles but also two or more kinds of particles can be blended to produce a wide variety of dispersion plating. Furthermore, a wide variety of dispersed alloy platings can be produced by mixing metal powder with the particles to be dispersed.

発現させる機能は、上述した、高耐食性、着色性、耐熱性などにとどまらず、次に示すような機能の発現が期待できる。即ち、
(1)電気的機能:絶縁性、誘電性、圧電性、焦電性半導性、イオン導電性、電子放射性、磁気特性
(2)光学的機能:透光性、偏向性、導光性、蛍光性、感光性、エレクトロルミネッセンス(EL)
(3)生物的機能
(4)化学的機能:吸着性、触媒活性、耐食性、放射線性、耐熱性
が挙げられる。
The function to be expressed is not limited to the above-described high corrosion resistance, colorability, heat resistance, etc., and the following functions can be expected to be expressed. That is,
(1) Electrical functions: insulating, dielectric, piezoelectric, pyroelectric semiconductivity, ionic conductivity, electron emission, magnetic properties (2) Optical functions: translucency, deflection, light guide, Fluorescence, photosensitivity, electroluminescence (EL)
(3) Biological function (4) Chemical function: adsorptivity, catalytic activity, corrosion resistance, radiation property, heat resistance can be mentioned.

これらの機能を発現させる粒子としては、アルミナ、ジルコニア(酸化ジルコニウム)、チタン酸ジルコン酸鉛(PZT)系セラミック、ムライト、フェライト(Fe23・MO)、チタン酸バリウム(TiBaO3)、チタン酸ストロンチウム(SrTiO3)、酸化チタン(TiO2)、酸化亜鉛(ZnO)、酸化スズ(SnO2)、酸化マグネシウム(MgO)、炭化ケイ素(SiC)、炭化ホウ素(B4C)、窒化ケイ素(Si34)、窒化アルミニウム(AlN)、窒化ホウ素、サイアロン(SiAlON)、二ホウ化チタン(TiB2)、二ホウ化ジルコニウム(ZrB2)、ハイブリッドセラミックス、SiC−TiC、Al23−TiC系、A123−TiC、TiB2系、A123−TiC、SiC、SiO2系、A123−ムライト系、A123−Ti系、A123−ZrO2系、A123−SiCウィスカー、ムライト−ZrO2系、ムライト−β−スポンジューメン系、SiC−TiC系、SiC−TiB2系、SiC−Si34系、SiC−BN系、BN−AlN系、β−サイアロン−炭化ケイ素系などの粒子が適用可能である。 Particles that exhibit these functions include alumina, zirconia (zirconium oxide), lead zirconate titanate (PZT) ceramic, mullite, ferrite (Fe 2 O 3 .MO), barium titanate (TiBaO 3 ), titanium Strontium acid (SrTiO 3 ), titanium oxide (TiO 2 ), zinc oxide (ZnO), tin oxide (SnO 2 ), magnesium oxide (MgO), silicon carbide (SiC), boron carbide (B 4 C), silicon nitride ( Si 3 N 4 ), aluminum nitride (AlN), boron nitride, sialon (SiAlON), titanium diboride (TiB 2 ), zirconium diboride (ZrB 2 ), hybrid ceramics, SiC-TiC, Al 2 O 3 TiC-based, A1 2 O 3 -TiC, TiB 2 based, A1 2 O 3 -TiC, SiC , SiO 2 system A1 2 O 3 - mullite, A1 2 O 3 -Ti system, A1 2 O 3 -ZrO 2 system, A1 2 O 3 -SiC whiskers, mullite -ZrO 2 system, mullite -β- sponge-menu Men system, SiC- TiC-based, SiC-TiB 2 based, SiC-Si 3 N 4 system, SiC-BN system, BN-AlN-based, beta-sialon - a particle such as silicon carbide-based can be applied.

本発明において、被めっき鋼板は冷延鋼板だけでなく脱スケール処理された熱延鋼板であってもよい。   In the present invention, the steel plate to be plated may be not only a cold rolled steel plate but also a descaled hot rolled steel plate.

本発明において、溶融めっき金属のめっき方法は公知の方法でよい。溶融金属浴は配した溶融めっき設備も限定されない。全還元方式連続溶融めっき設備や、直火加熱式連続溶融めっき設備などの全ての連続溶融めっき設備に対して本発明を適用できる。   In the present invention, the plating method of the hot dip metal may be a known method. The molten metal bath is not limited in the hot dipping equipment. The present invention can be applied to all continuous hot dip plating equipment such as all-reduction-type continuous hot dip plating equipment and direct flame heating type hot dip continuous hot dip plating equipment.

表1に示した成分組成(残部はFe及び不可避不純物)からなる汎用の低炭素Alキルド鋼の板厚0.8mmの冷延鋼板を、無酸化炉および還元加熱炉を備えた連続式溶融めっき設備に装入して、焼鈍、溶融金属めっきを行い、さらに粒子付着工程でめっき表面に粒子を付着させた後、加熱工程で下地の溶融金属めっきの融点以上に加熱して溶融させ、溶融金属めっき層に付着工程で付着させた粒子をめっき皮膜中に分散させた。   Continuous hot-dip plating of general-purpose low-carbon Al-killed steel with a thickness of 0.8 mm made of the component composition shown in Table 1 (the balance being Fe and inevitable impurities) equipped with a non-oxidation furnace and a reduction heating furnace After charging into the equipment, annealing and molten metal plating are performed, and particles are adhered to the plating surface in the particle adhesion process, and then heated to the melting point of the underlying molten metal plating in the heating process to be melted. The particles adhered to the plating layer in the adhesion process were dispersed in the plating film.

Figure 0004517683
Figure 0004517683

溶融金属めっきは、通常の溶融亜鉛めっき鋼板の製造に用いる0.2%Al−Zn浴、5%Al−Znめっき(ガルファン)、55%Al−Znめっき(ガルバリウム)ならびに、91%Al−9%Si(Alめっき)浴で実施した。   The hot-dip metal plating includes 0.2% Al—Zn bath, 5% Al—Zn plating (Galfan), 55% Al—Zn plating (Galbalium), and 91% Al-9 used for the production of ordinary hot-dip galvanized steel sheets. It was carried out in a% Si (Al plating) bath.

めっき表面への粒子を付着は、(1)ガスによる粒子粉吹き付け、(2)投射による粒子吹き付け、(3)電気めっき、(4)スラリー塗布のいずれかの方法で行った。各々の条件を以下に記載する。
(1)ガスによる粒子吹き付け(試験材No.1〜3、13〜15、25〜27)
・粒子種:Al23
・平均粉末粒径:1、5、10μm
・フローレート(噴射口):300〜1000g/分、窒素ガス吹き付け
(2)投射による粒子吹き付け(試験材No.4〜6、16〜18、28〜30)
・粒子種:SiO2
・平均粉末粒径:10μm
・投射速度(投射口):100m/s
・投射距離:500mm
・投射量:7.5〜30g/m2
(3)電気めっき(試験材No.7〜9、19〜21、31〜33)
・めっき金属:SiO2−Zn分散めっき
・めっき液:硫酸亜鉛:300g/L、硫酸ソーダ:30g/L、酢酸ソーダ:12g/L、コロイダルシリカ:70g/L、硝酸ナトリウム:1.6g/L、pH:2
・電流密度:50A/dm2
(4)スラリー塗布法(試験材No.10〜12、22〜24、34〜38)
・粒子種:Al23、カーボン顔料、酸化チタン顔料、ベンガラ顔料、紺青顔料、蛍光性顔料
・スラリー:粒子(平均粒径:0.1、1μm)を水分散、粒子量1000g/l
・ロールコーターで塗布乾燥
加熱工程は誘導加熱炉を使用し、合金化処理後の冷却工程は空冷とした。前記で作製しためっき鋼板のめっき皮膜の断面をSEM観察して、粒子がめっき皮膜中に分散しているものを「分散」と評価し、めっき皮膜中に分散していないものを「非分散」と評価した。
Adhesion of particles to the plating surface was performed by any of the following methods: (1) spraying particles with gas, (2) spraying particles with projection, (3) electroplating, and (4) slurry application. Each condition is described below.
(1) Particle spraying with gas (test materials No. 1-3, 13-15, 25-27)
・ Particle type: Al 2 O 3
Average particle size: 1, 5, 10 μm
-Flow rate (injection port): 300-1000 g / min, nitrogen gas spray (2) Particle spray by projection (test material Nos. 4-6, 16-18, 28-30)
・ Particle type: SiO 2
-Average powder particle size: 10 μm
-Projection speed (projection port): 100 m / s
・ Projection distance: 500mm
Projection amount: 7.5 to 30 g / m 2
(3) Electroplating (test materials No. 7-9, 19-21, 31-33)
Plating Metal: SiO 2 -Zn dispersion plating-plating solution: zinc sulfate: 300 g / L, sodium sulfate: 30 g / L, sodium acetate: 12 g / L, colloidal silica: 70 g / L, sodium nitrate: 1.6 g / L , PH: 2
・ Current density: 50 A / dm 2
(4) Slurry coating method (test materials No. 10-12, 22-24, 34-38)
・ Particle type: Al 2 O 3 , carbon pigment, titanium oxide pigment, bengara pigment, bitumen pigment, fluorescent pigment ・ Slurry: particles (average particle size: 0.1, 1 μm) dispersed in water, particle amount 1000 g / l
-Application drying with a roll coater An induction heating furnace was used for the heating process, and the cooling process after alloying was air-cooled. SEM observation of the cross-section of the plated film of the plated steel sheet prepared above, and the case where the particles are dispersed in the plated film is evaluated as “dispersed”, and the one that is not dispersed in the plated film is “non-dispersed”. It was evaluated.

各工程の条件および粒子の分散状態の評価結果を表2および表3に示す。   Tables 2 and 3 show the conditions of each step and the evaluation results of the dispersed state of the particles.

Figure 0004517683
Figure 0004517683

Figure 0004517683
Figure 0004517683

表2および表3に示されるように、いずれの例でもめっき表面に付着させた粒子は加熱工程後めっき皮膜中に分散しており、溶融めっきするめっき金属に対し、粒子を分散させた溶融分散めっき鋼板が得られている。表2および表3の「粒子分散により向上する特性」の欄に記載されるように、溶融めっき金属種および該溶融金属めっき皮膜中に分散させる粒子の組み合わせに応じて、多様な特性を向上できるようになる。   As shown in Table 2 and Table 3, in both examples, the particles adhered to the plating surface are dispersed in the plating film after the heating step, and the melt dispersion in which the particles are dispersed with respect to the plating metal to be hot-plated A plated steel sheet is obtained. As described in the column of “Characteristics improved by particle dispersion” in Tables 2 and 3, various characteristics can be improved according to the combination of the hot-dip metal species and the particles dispersed in the hot-metal plating film. It becomes like this.

本発明の製造設備は、溶融分散めっき板を製造する設備として利用することができる。   The manufacturing facility of the present invention can be used as a facility for manufacturing a hot-dip dispersion plated plate.

本発明の製造方法は、めっき層中に分散粒子を混合して存在させる溶融分散めっき板を製造する方法として利用することができる。   The production method of the present invention can be used as a method for producing a molten dispersion plated plate in which dispersed particles are present in a plating layer.

従来の溶融めっき板の製造に用いられる溶融めっき板製造設備の要部配置を示す概略断面図である。It is a schematic sectional drawing which shows the principal part arrangement | positioning of the hot dip plate manufacturing equipment used for manufacture of the conventional hot dip plate. 本発明の第1発明の実施の形態に係る溶融分散めっき板の製造設備の要部を示す概略断面図である。It is a schematic sectional drawing which shows the principal part of the manufacturing equipment of the hot-dip dispersion plating board which concerns on embodiment of 1st invention of this invention. 本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第1の実施の形態を説明する概略断面図である。BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic sectional drawing explaining 1st Embodiment of the particle adhesion apparatus arrange | positioned at the manufacturing equipment of the hot-dip dispersion plating board which concerns on embodiment of this invention. 本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第2の実施の形態を説明する概略断面図である。It is a schematic sectional drawing explaining 2nd Embodiment of the particle adhesion apparatus arrange | positioned at the manufacturing equipment of the hot-dip dispersion plating board which concerns on embodiment of this invention. 本発明の第2発明の実施の形態に係る溶融分散めっき板の製造設備の要部を示す概略断面図である。It is a schematic sectional drawing which shows the principal part of the manufacturing equipment of the hot-dip dispersion plating board which concerns on embodiment of 2nd invention of this invention. 本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第3の実施の形態を説明する概略断面図である。It is a schematic sectional drawing explaining 3rd Embodiment of the particle adhesion apparatus arrange | positioned at the manufacturing equipment of the hot-dip-plating plate which concerns on embodiment of this invention. 本発明の実施の形態に係る溶融分散めっき板の製造設備に配置される粒子付着装置の第4の実施の形態を説明する概略断面図である。It is a schematic sectional drawing explaining 4th Embodiment of the particle adhesion apparatus arrange | positioned at the manufacturing equipment of the hot-dip dispersion plating board which concerns on embodiment of this invention.

符号の説明Explanation of symbols

1 板
2 焼鈍炉
3 スナウト
4a めっきポット
4 溶融金属浴
5 シンクロール
6 ガスワイパー
7a、7b 粒子付着装置
7c、7d 粒子吹き付け装置
7e 電気めっき装置
7f 粒子塗布装置
8、8a、8b 加熱炉
9、9a、9b、9c 冷却装置
10a、10b 粒子供給装置
11 ブロワ(粒子吹き付けブロワ)
12 粒子供給管
13 粒子戻り管
14 粒子吹き付けボックス
15 吹き付けチャンバー
16 スリット
17 排気チャンバー
18 スリット
21a、21b 粒子投射装置
22 モーター
23 遠心ロータ
24 粒子
31 前処理装置
32 めっき装置
33 水洗乾燥装置
41 粉末塗布装置
42 乾燥装置
43 圧着装置
DESCRIPTION OF SYMBOLS 1 Sheet | seat 2 Annealing furnace 3 Snout 4a Plating pot 4 Molten metal bath 5 Sink roll 6 Gas wiper 7a, 7b Particle adhesion apparatus 7c, 7d Particle spraying apparatus 7e Electroplating apparatus 7f Particle coating apparatus 8, 8a, 8b Heating furnace 9, 9a , 9b, 9c Cooling device 10a, 10b Particle supply device 11 Blower (particle blowing blower)
DESCRIPTION OF SYMBOLS 12 Particle supply pipe 13 Particle return pipe 14 Particle spray box 15 Spray chamber 16 Slit 17 Exhaust chamber 18 Slit 21a, 21b Particle projection apparatus 22 Motor 23 Centrifugal rotor 24 Particle 31 Pretreatment apparatus 32 Plating apparatus 33 Washing and drying apparatus 41 Powder coating apparatus 42 Drying equipment 43 Crimping equipment

Claims (6)

金属板を溶融金属浴中を通過させて前記金属板に溶融めっき処理を施して、前記金属板の少なくとも1つの表面に溶融めっき層を形成する溶融めっき金属板の製造方法において、
前記溶融金属浴を通過させた金属板をめっき金属が凝固する温度まで冷却する工程と、
前記金属板の少なくとも一方の面のめっき表面に、めっき層中に分散させる酸化物粒子を付着させる付着工程と、
前記金属板を加熱して、溶融めっき金属と付着させた酸化物粒子とを混合させる工程と、
をこの順で有することを特徴とする、溶融分散めっき金属板の製造方法。
In the method for producing a hot-dip metal sheet, the hot-dip metallization process is performed on the metal plate by passing the metal plate through a hot-metal bath, and a hot-dip plating layer is formed on at least one surface of the metal plate.
Cooling the metal plate passed through the molten metal bath to a temperature at which the plated metal solidifies;
An adhesion step of attaching oxide particles dispersed in the plating layer to the plating surface of at least one surface of the metal plate;
Heating the metal plate and mixing the hot-dip plated metal and the adhered oxide particles;
In this order, the manufacturing method of the hot-dip dispersion plating metal plate characterized by the above-mentioned.
前記付着工程は、めっき層中に分散させる酸化物粒子をめっき金属板に吹付けることを特徴とする請求項1に記載の溶融分散めっき金属板の製造方法。 The method of manufacturing a hot-dip dispersed plated metal sheet according to claim 1 , wherein the attaching step sprays the plated metal sheet with oxide particles dispersed in the plated layer. 前記付着工程は、めっき層中に分散させる酸化物粒子をめっき金属板に電気めっきすることを特徴とする請求項1に記載の溶融分散めっき金属板の製造方法。 The method of manufacturing a hot-dip dispersed plated metal plate according to claim 1 , wherein the attaching step includes electroplating a plated metal plate with oxide particles dispersed in the plated layer. 前記付着工程は、めっき層中に分散させる酸化物粒子をめっき金属板に塗布することを特徴とする請求項1に記載の溶融分散めっき金属板の製造方法。 The method for producing a hot-dip dispersed plated metal sheet according to claim 1 , wherein in the attaching step, oxide particles dispersed in the plated layer are applied to the plated metal sheet. 前記付着工程は、前記めっき層中に分散させる酸化物粒子をめっき金属板に塗布した後、前記酸化物粒子をめっき表面に圧着させる圧着工程を有することを特徴とする請求項に記載の溶融めっき合金化処理鋼金属板の製造方法。 5. The melting according to claim 4 , wherein the adhesion step includes a pressure-bonding step in which the oxide particles dispersed in the plating layer are applied to a plated metal plate, and then the oxide particles are pressure-bonded to a plating surface. A method of manufacturing a plated alloyed steel metal plate. 前記酸化物粒子に代えて、酸化物粒子に金属粒子を混合した粒子を用いることを特徴とする請求項1〜の何れかの項に記載の溶融めっき合金化処理鋼金属板の製造方法。 The method for producing a hot-dip galvannealed steel metal plate according to any one of claims 1 to 5 , wherein particles obtained by mixing metal particles with oxide particles are used instead of the oxide particles.
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Citations (10)

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Publication number Priority date Publication date Assignee Title
JPS583956A (en) * 1981-06-29 1983-01-10 Nippon Kokan Kk <Nkk> Production of al-zn alloy plated steel plate
JPH0250946A (en) * 1988-08-11 1990-02-20 Nippon Steel Corp Weldable hot dip galvanized steel sheet excellent in press formability and chemical conversion treating property
JPH04131386A (en) * 1990-09-21 1992-05-06 Sumitomo Metal Ind Ltd Zinc plated steel sheet and production thereof
JPH04160142A (en) * 1990-10-23 1992-06-03 Mitsubishi Heavy Ind Ltd Hot dip galvanizing steel sheet and its manufacture
JPH04276058A (en) * 1991-03-01 1992-10-01 Sumitomo Metal Ind Ltd Manufacture of dispersion plated steel sheet and torch to be used
JPH059747A (en) * 1991-06-28 1993-01-19 Suzuki Motor Corp Composite member and production thereof
JPH05247617A (en) * 1992-03-05 1993-09-24 Nippon Steel Corp Manufacture of galvannealed steel sheet having excellent powdering resistance and workability
JPH08296059A (en) * 1995-04-28 1996-11-12 Nippon Steel Corp Production of galvanized steel sheet excellent in pressability, chemical convertibility and degreasing liquid contamination resistance
JPH08325696A (en) * 1995-05-26 1996-12-10 Nippon Steel Corp Equipment for manufacturing hot dip galvanized steel sheet
JP2003311622A (en) * 2002-04-18 2003-11-05 Jfe Steel Kk Manufacturing method of plated steel plate, and plated steel plate

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583956A (en) * 1981-06-29 1983-01-10 Nippon Kokan Kk <Nkk> Production of al-zn alloy plated steel plate
JPH0250946A (en) * 1988-08-11 1990-02-20 Nippon Steel Corp Weldable hot dip galvanized steel sheet excellent in press formability and chemical conversion treating property
JPH04131386A (en) * 1990-09-21 1992-05-06 Sumitomo Metal Ind Ltd Zinc plated steel sheet and production thereof
JPH04160142A (en) * 1990-10-23 1992-06-03 Mitsubishi Heavy Ind Ltd Hot dip galvanizing steel sheet and its manufacture
JPH04276058A (en) * 1991-03-01 1992-10-01 Sumitomo Metal Ind Ltd Manufacture of dispersion plated steel sheet and torch to be used
JPH059747A (en) * 1991-06-28 1993-01-19 Suzuki Motor Corp Composite member and production thereof
JPH05247617A (en) * 1992-03-05 1993-09-24 Nippon Steel Corp Manufacture of galvannealed steel sheet having excellent powdering resistance and workability
JPH08296059A (en) * 1995-04-28 1996-11-12 Nippon Steel Corp Production of galvanized steel sheet excellent in pressability, chemical convertibility and degreasing liquid contamination resistance
JPH08325696A (en) * 1995-05-26 1996-12-10 Nippon Steel Corp Equipment for manufacturing hot dip galvanized steel sheet
JP2003311622A (en) * 2002-04-18 2003-11-05 Jfe Steel Kk Manufacturing method of plated steel plate, and plated steel plate

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