JP4472358B2 - ツインステージリソグラフィツールにおける干渉計システム誤差の補償 - Google Patents

ツインステージリソグラフィツールにおける干渉計システム誤差の補償 Download PDF

Info

Publication number
JP4472358B2
JP4472358B2 JP2003584816A JP2003584816A JP4472358B2 JP 4472358 B2 JP4472358 B2 JP 4472358B2 JP 2003584816 A JP2003584816 A JP 2003584816A JP 2003584816 A JP2003584816 A JP 2003584816A JP 4472358 B2 JP4472358 B2 JP 4472358B2
Authority
JP
Japan
Prior art keywords
stage
interferometer
wafer
exposure
error
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003584816A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005522705A (ja
JP2005522705A5 (cg-RX-API-DMAC10.html
Inventor
エイ． ヒル、ヘンリー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Publication of JP2005522705A publication Critical patent/JP2005522705A/ja
Publication of JP2005522705A5 publication Critical patent/JP2005522705A5/ja
Application granted granted Critical
Publication of JP4472358B2 publication Critical patent/JP4472358B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2003584816A 2002-04-11 2003-04-11 ツインステージリソグラフィツールにおける干渉計システム誤差の補償 Expired - Fee Related JP4472358B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37186902P 2002-04-11 2002-04-11
PCT/US2003/011048 WO2003087934A2 (en) 2002-04-11 2003-04-11 Interferometry system error compensation in twin stage lithography tools

Publications (3)

Publication Number Publication Date
JP2005522705A JP2005522705A (ja) 2005-07-28
JP2005522705A5 JP2005522705A5 (cg-RX-API-DMAC10.html) 2010-03-18
JP4472358B2 true JP4472358B2 (ja) 2010-06-02

Family

ID=29250751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003584816A Expired - Fee Related JP4472358B2 (ja) 2002-04-11 2003-04-11 ツインステージリソグラフィツールにおける干渉計システム誤差の補償

Country Status (4)

Country Link
US (1) US6924896B2 (cg-RX-API-DMAC10.html)
JP (1) JP4472358B2 (cg-RX-API-DMAC10.html)
AU (1) AU2003223545A1 (cg-RX-API-DMAC10.html)
WO (1) WO2003087934A2 (cg-RX-API-DMAC10.html)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002134396A (ja) * 2000-10-25 2002-05-10 Sony Corp 半導体装置の製造方法および半導体パターン自動調節装置
US7251042B2 (en) * 2003-10-30 2007-07-31 Asml Netherlands B.V. Lithographic apparatus, interferometer and device manufacturing method
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20060047462A1 (en) * 2004-08-31 2006-03-02 Picciotto Carl E Displacement estimation system and method
WO2006040890A1 (ja) * 2004-10-08 2006-04-20 Nikon Corporation 露光装置及びデバイス製造方法
EP1975981A1 (en) * 2005-12-28 2008-10-01 Nikon Corporation Pattern formation method, pattern formation device, and device fabrication method
JP5558005B2 (ja) * 2006-01-23 2014-07-23 ザイゴ コーポレーション 物体をモニタする干渉計システム
TW200815912A (en) * 2006-04-03 2008-04-01 Molecular Imprints Inc Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
KR100781985B1 (ko) * 2006-07-14 2007-12-06 삼성전자주식회사 변위 간섭계 시스템 및 그가 채용되는 노광설비
US7970577B2 (en) * 2007-06-11 2011-06-28 Applied Materials Israel, Ltd. Method and system for evaluating an object that has a repetitive pattern
CN101874194B (zh) * 2007-09-17 2013-03-20 安华高科技光纤Ip（新加坡）私人有限公司 用于测量风力发电设备形变的光纤传感器
NL1036180A1 (nl) * 2007-11-20 2009-05-25 Asml Netherlands Bv Stage system, lithographic apparatus including such stage system, and correction method.
US8120781B2 (en) 2008-11-26 2012-02-21 Zygo Corporation Interferometric systems and methods featuring spectral analysis of unevenly sampled data
US8760629B2 (en) 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8599359B2 (en) * 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
CN112835269B (zh) * 2021-01-19 2024-04-12 上海集成电路装备材料产业创新中心有限公司 一种光刻装置及曝光方法
CN113532324A (zh) * 2021-08-31 2021-10-22 中国科学院重庆绿色智能技术研究院 一种纳米精度多维光学干涉测量系统及其测量方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5363196A (en) 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
JP3653827B2 (ja) * 1995-10-20 2005-06-02 株式会社ニコン 干渉計
CN1244018C (zh) * 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
JP2000049066A (ja) 1998-07-27 2000-02-18 Canon Inc 露光装置およびデバイス製造方法
JP4211150B2 (ja) 1998-08-20 2009-01-21 株式会社ニコン レーザ干渉計及び露光装置
US6785005B2 (en) * 2001-09-21 2004-08-31 Nikon Corporation Switching type dual wafer stage
US6665054B2 (en) * 2001-10-22 2003-12-16 Nikon Corporation Two stage method
US6777143B2 (en) * 2002-01-28 2004-08-17 Taiwan Semiconductor Manufacturing Company Multiple mask step and scan aligner

Also Published As

Publication number Publication date
WO2003087934A3 (en) 2004-02-26
JP2005522705A (ja) 2005-07-28
WO2003087934A2 (en) 2003-10-23
US6924896B2 (en) 2005-08-02
AU2003223545A8 (en) 2003-10-27
AU2003223545A1 (en) 2003-10-27
US20030223079A1 (en) 2003-12-04

Similar Documents

Publication Publication Date Title
JP5276595B2 (ja) リソグラフィツールにおいて使用される距離測定干渉計及びエンコーダ測定システム
JP4583759B2 (ja) 多自由度干渉計
US7379190B2 (en) Stage alignment in lithography tools
JP4030960B2 (ja) 入力ビームの方向の動的干渉分光制御
JP4790632B2 (ja) 多軸干渉計ならびに多軸干渉計を用いる方法およびシステム
JP2005522705A (ja) ツインステージリソグラフィツールにおける干渉計システム誤差の補償
US7289226B2 (en) Characterization and compensation of errors in multi-axis interferometry systems
JP4279679B2 (ja) 干渉法システムにおける非サイクリック・エラーの特性評価および補償
EP1454112A2 (en) Interferometry system having a dynamic beam-steering assembly for measuring angle and distance
US20110032535A1 (en) Interferometer for determining overlay errors
WO2001098839A2 (en) Dynamic beam steering interferometer
JP2005516185A (ja) 干渉計内のガスの時変光学的性質を補償するための方法および装置
JP2009528541A (ja) 干渉計測システムおよび干渉計測システムを使用する方法
US7365857B2 (en) Precompensation of polarization errors in heterodyne interferometry
WO2003095940A2 (en) Compensation for geometric effects of beam misalignments in plane mirror interferometers
US7321432B2 (en) Measurement and compensation of errors in interferometers
US7286240B2 (en) Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems
JP2010507804A (ja) 光学測定における大気摂動の影響の補正

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060406

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080228

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081007

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090107

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090115

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090325

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090908

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091028

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091124

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20100122

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100223

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100303

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130312

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130312

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140312

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees