JP4452767B2 - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof Download PDF

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JP4452767B2
JP4452767B2 JP2004127261A JP2004127261A JP4452767B2 JP 4452767 B2 JP4452767 B2 JP 4452767B2 JP 2004127261 A JP2004127261 A JP 2004127261A JP 2004127261 A JP2004127261 A JP 2004127261A JP 4452767 B2 JP4452767 B2 JP 4452767B2
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semiconductor device
semiconductor chip
sealing body
sealing
semiconductor
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JP2005123567A (en
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均 川口
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Ibiden Co Ltd
Disco Corp
Sumitomo Bakelite Co Ltd
Toppan Inc
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Ibiden Co Ltd
Disco Corp
Sumitomo Bakelite Co Ltd
Toppan Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
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    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

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  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a technology of manufacturing efficiently a package which contains a plurality of semiconductor chips. <P>SOLUTION: A method of manufacturing the semiconductor device first seals the semiconductor chip with resin to form a seal (S10), and performs polishing/thin filming for the seal (S12). Continuously, the operation of the seal (S14) is inspected, and a laminate is formed by laminating with other semiconductor chip or the seal using only a good article (S18). Then, the laminate is sealed with the resin (S20). Thus, the semiconductor device is obtained. <P>COPYRIGHT: (C)2005,JPO&amp;NCIPI

Description

本発明は、半導体装置およびその製造方法に関する。   The present invention relates to a semiconductor device and a manufacturing method thereof.

近年の電子機器の高機能化並びに軽薄短小化の要求に伴い、電子部品の高密度集積化、さらには高密度実装化が進んできている。これらの電子機器に使用される半導体パッケージは、小型化かつ多ピン化してきており、また、半導体パッケージを含めた電子部品を実装する、実装用基板も小型化してきている。さらには電子機器への収納性を高めるため、リジット基板とフレキシブル基板を積層し一体化して、折り曲げを可能としたリジットフレックス基板が、実装用基板として使われるようになってきている。   With recent demands for higher functionality and lighter, thinner and smaller electronic devices, electronic components have been increasingly integrated and densely packaged. Semiconductor packages used in these electronic devices have been reduced in size and increased in pin count, and mounting substrates on which electronic components including the semiconductor package are mounted have also been reduced in size. Furthermore, in order to improve the storage property in an electronic device, a rigid flex board that can be bent by laminating and integrating a rigid board and a flexible board has been used as a mounting board.

半導体パッケージはその小型化に伴って、従来のようなリードフレームを使用した形態のパッケージでは、小型化に限界がきているため、最近では回路基板上にチップを実装したものとして、BGA(Ball Grid Array)や、CSP(Chip Scale Package)といった、エリア実装型の新しいパッケージ方式が提案されている。これらの半導体パッケージにおいて、半導体チップの電極と従来型半導体パッケージのリードフレームの機能を有するサブストレートが用いられる。サブストレートは、半導体パッケージ用基板とも呼ばれ、プラスチックやセラミックス等各種材料を使って構成される。半導体チップとサブストレートの端子との電気的接続方法として、ワイヤボンディング方式やTAB(Tape Automated Bonding)方式、またはFC(Frip Chip)方式などが知られているが、最近では、半導体パッケージの小型化に有利なFC接続方式を用いた、BGAやCSPの構造が盛んに提案されている。   With the miniaturization of semiconductor packages, the conventional package using a lead frame has a limit on miniaturization. Therefore, recently, it is assumed that a chip is mounted on a circuit board, and BGA (Ball Grid) is used. Array) and a new area mounting type packaging method such as CSP (Chip Scale Package) have been proposed. In these semiconductor packages, a substrate having the functions of an electrode of a semiconductor chip and a lead frame of a conventional semiconductor package is used. The substrate is also called a semiconductor package substrate, and is made of various materials such as plastic and ceramics. As an electrical connection method between a semiconductor chip and a substrate terminal, a wire bonding method, a TAB (Tape Automated Bonding) method, or an FC (Flip Chip) method is known. BGA and CSP structures using an FC connection method that is advantageous to the above are actively proposed.

しかしながら、上記工法では一つの半導体パッケージに対し半導体チップを一つしか収納できないため、半導体パッケージの小型化には自ずと限界がある。このため、一つの半導体パッケージの内部に複数個の半導体チップを積み重ねて収納することにより、実装密度を向上させる手法が提案されている(特許文献1)。
特開平10−70232号公報
However, since the above method can accommodate only one semiconductor chip in one semiconductor package, there is a limit to downsizing the semiconductor package. For this reason, a technique for improving the mounting density by stacking and storing a plurality of semiconductor chips inside one semiconductor package has been proposed (Patent Document 1).
JP-A-10-70232

しかしながら、積層される半導体チップの動作が保証される割合が低い場合(良品チップ(KGD)ではない場合)、このような手法をとると半導体パッケージが完成するまで、製品の動作が不確定であり、パッケージ化されてから不具合が発見された場合、そこに組み込まれた良品半導体チップまでが無駄になってしまうという問題があった。   However, if the percentage of guaranteed operation of the stacked semiconductor chips is low (not a good chip (KGD)), the operation of the product is uncertain until the semiconductor package is completed using this method. When a defect is discovered after being packaged, there is a problem that even a non-defective semiconductor chip incorporated therein is wasted.

本発明は上記事情を踏まえてなされたものであり、本発明の目的は、半導体チップをマルチチップパッケージ製造工程中で個別に動作確認可能な形態にすることにより、半導体チップを複数個収容したパッケージを効率よく製造する技術を提供することにある。   The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a package in which a plurality of semiconductor chips are accommodated by making the semiconductor chip into a form in which operation can be individually confirmed during the manufacturing process of the multichip package. It is to provide a technology for efficiently manufacturing the above.

本発明によれば、第一の半導体チップを樹脂封止した第一の封止体と、第二の半導体チップと、が積層された積層体を含むことを特徴とする半導体装置が提供される。   According to the present invention, there is provided a semiconductor device including a stacked body in which a first sealing body in which a first semiconductor chip is sealed with a resin and a second semiconductor chip are stacked. .

このように、半導体チップを樹脂封止した後に積層することにより、積層前に封止体の動作を簡易に検査することができ、良品のみを用いて積層体を製造することができる。これにより、動作不能な半導体チップとともに積層してしまい、良品の半導体チップも使用不能となるという状況を防ぐことができる。これにより、半導体装置を効率よく製造することができるとともに、半導体装置の製造コストを低減することもできる。   Thus, by laminating the semiconductor chip after resin sealing, the operation of the encapsulant can be easily inspected before lamination, and the laminate can be manufactured using only good products. As a result, it is possible to prevent a situation in which the non-operational semiconductor chip is stacked and a non-defective semiconductor chip becomes unusable. As a result, the semiconductor device can be efficiently manufactured and the manufacturing cost of the semiconductor device can be reduced.

本発明の半導体装置において、積層体は、第二の半導体チップが樹脂封止された第二の封止体と、第一の封止体とが積層された構造を有することができる。   In the semiconductor device of the present invention, the stacked body may have a structure in which a second sealed body in which a second semiconductor chip is sealed with a resin and a first sealed body are stacked.

本発明の半導体装置において、積層体をさらに樹脂封止することができる。   In the semiconductor device of the present invention, the laminate can be further resin-sealed.

本発明の半導体装置は、パッケージ基板をさらに含むことができ、第一の封止体は、パッケージ基板上に配置することができ、第二の半導体チップは、第一の封止体上に配置することができる。   The semiconductor device of the present invention can further include a package substrate, the first sealing body can be disposed on the package substrate, and the second semiconductor chip is disposed on the first sealing body. can do.

本発明の半導体装置において、パッケージ基板は、第一の半導体チップと、第二の半導体チップとを電気的に接続する導体回路を含むことができる。このようなパッケージ基板を用いることにより、半導体チップを樹脂封止した後に積層しても、積層した半導体チップ間を電気的に接続することができる。   In the semiconductor device of the present invention, the package substrate can include a conductor circuit that electrically connects the first semiconductor chip and the second semiconductor chip. By using such a package substrate, it is possible to electrically connect the stacked semiconductor chips even when the semiconductor chips are stacked after resin sealing.

本発明の半導体装置において、第一の封止体は、研磨により薄層化することができる。これにより、半導体装置を小型化することができる。第二の半導体チップを樹脂封止して第二の封止体を形成した場合も、第二の封止体を研磨により薄層化することができる。   In the semiconductor device of the present invention, the first sealing body can be thinned by polishing. Thereby, a semiconductor device can be reduced in size. Even when the second semiconductor chip is formed by resin sealing the second sealing body, the second sealing body can be thinned by polishing.

本発明の半導体装置において、第一の封止体は、樹脂の周囲または内部に設けられ、樹脂よりも熱伝導性の高い材料により構成された熱伝導部材を含むことができ、当該熱伝導部材は、積層方向において、封止体と略等しい高さに形成することができる。   In the semiconductor device of the present invention, the first sealing body may include a heat conductive member provided around or inside the resin and made of a material having higher heat conductivity than the resin. Can be formed at substantially the same height as the sealing body in the stacking direction.

ここで、熱伝導部材としては、金属やシリコンを用いることができる。このような材料を用いることにより、たとえば積層された半導体チップをサブストレート等のパッケージ基板を介して他の半導体チップとワイヤボンディングの手法により接合する場合、積層されたサブストレートのボンディングワイヤへの熱伝導を良好にすることができる。   Here, a metal or silicon can be used as the heat conducting member. By using such a material, for example, when a laminated semiconductor chip is bonded to another semiconductor chip via a substrate substrate such as a substrate by a wire bonding technique, heat to the bonding wire of the laminated substrate is applied. Conductivity can be improved.

本発明の半導体装置において、第二の半導体チップは、ボンディングワイヤを介して第一の半導体チップと電気的に接続することができる。   In the semiconductor device of the present invention, the second semiconductor chip can be electrically connected to the first semiconductor chip via a bonding wire.

ここで、ボンディングワイヤとしては、金線を用いることができる。ワイヤボンディングにより半導体チップを接続することにより、設計の異なる種々の半導体チップ間の接続を、柔軟に行うことができる。   Here, a gold wire can be used as the bonding wire. By connecting semiconductor chips by wire bonding, various semiconductor chips having different designs can be flexibly connected.

本発明によれば、第一の半導体チップを封止樹脂により封止して封止体を形成する工程と、封止体と第二の半導体チップとを積層して積層体を形成する工程と、を含むことを特徴とする半導体装置の製造方法が提供される。   According to the present invention, a step of forming a sealing body by sealing the first semiconductor chip with a sealing resin, a step of forming a stacked body by stacking the sealing body and the second semiconductor chip, and A method for manufacturing a semiconductor device is provided.

本発明の半導体装置の製造方法は、積層体を封止樹脂により封止する工程をさらに含むことができる。   The method for manufacturing a semiconductor device of the present invention can further include a step of sealing the stacked body with a sealing resin.

本発明の半導体装置の製造方法は、封止体を研磨により薄層化する工程をさらに含むことができ、積層体を形成する工程において、薄層化した封止体を積層することができる。   The method for manufacturing a semiconductor device of the present invention can further include a step of thinning the sealing body by polishing, and the thinned sealing body can be stacked in the step of forming the stacked body.

本発明の半導体装置の製造方法は、封止体に含まれる第一の半導体チップの良否を検査する工程をさらに含むことができ、第一の半導体チップの動作を検査する工程で良品と判定された封止体を用いて、積層体を形成することを特徴とする半導体装置の製造方法。   The method for manufacturing a semiconductor device of the present invention can further include a step of inspecting the quality of the first semiconductor chip included in the sealing body, and is determined as a non-defective product in the step of inspecting the operation of the first semiconductor chip. A method for manufacturing a semiconductor device, comprising: forming a stacked body using the sealed body.

これにより、良品のみを用いて積層体を製造し、半導体装置を製造することができる。   Thereby, a laminated body can be manufactured using only good products, and a semiconductor device can be manufactured.

本発明によれば、半導体チップをマルチチップパッケージ製造工程中で個別に動作確認可能な形態にすることにより、半導体チップを複数個収容したパッケージを効率よく製造することができる。   According to the present invention, it is possible to efficiently manufacture a package containing a plurality of semiconductor chips by making the semiconductor chip into a form in which the operation can be individually confirmed in the multi-chip package manufacturing process.

図1は、本発明の実施の形態における、半導体装置の製造手順を示すフローチャートである。
本実施の形態においては、まず、積層する半導体チップ(半導体素子)を、それぞれサブストレート上に配置し、サブストレートと電気的に接合させる(S8)。ここで、サブストレートとしては、リジットプリント配線板、フレキシブルプリント配線板、セラミック基板等、その上に積層される半導体チップと他の半導体チップとを電気的に接続する導体回路を含むものを用いることができる。また、サブストレートと半導体チップとの電気的接合の方法としてはワイヤボンディング、半田ボール、金スタッドバンプ、導電ペースト、異方導電性等を用いることができる。
FIG. 1 is a flowchart showing a procedure for manufacturing a semiconductor device in an embodiment of the present invention.
In the present embodiment, first, semiconductor chips (semiconductor elements) to be stacked are arranged on a substrate and electrically joined to the substrate (S8). Here, as the substrate, a rigid printed wiring board, a flexible printed wiring board, a ceramic substrate, or the like including a conductive circuit that electrically connects a semiconductor chip stacked thereon and another semiconductor chip is used. Can do. In addition, as a method of electrical bonding between the substrate and the semiconductor chip, wire bonding, solder balls, gold stud bumps, conductive paste, anisotropic conductivity, or the like can be used.

つづいて、サブストレート上に配置された半導体チップを、封止樹脂により封止して封止体を形成する(S10)。封止方法としては、トランスファーモールド、インジェクションモールド、ポッティングモールド等を用いることができる。   Subsequently, the semiconductor chip disposed on the substrate is sealed with a sealing resin to form a sealing body (S10). As a sealing method, a transfer mold, an injection mold, a potting mold, or the like can be used.

その後、封止体の封止樹脂部分を砥石により研磨し、表面を平坦化するとともに薄層化する(S12)。半導体チップとサブストレートとの電気的接合をワイヤボンディングで行った場合は、ボンディングワイヤが露出しない程度に研磨を行うことができる。その他の方法で電気的接合を行った場合は、半導体チップごと研磨してさらに薄層化することもできる。このように、封止体を薄層化することにより、半導体装置を小型化することができる。封止体は、薄ければ薄いほど小型化するのに好適であるが、ハンドリング上で必要な剛性を維持するため、封止体の厚みは、たとえば50μm以上、好ましくは75μm以上とすることができる。なお、封止体の封止樹脂部分が最初から薄く、または平坦に形成されている場合は、このステップを省略することができる。   Thereafter, the sealing resin portion of the sealing body is polished with a grindstone, and the surface is flattened and thinned (S12). When electrical bonding between the semiconductor chip and the substrate is performed by wire bonding, polishing can be performed to the extent that the bonding wires are not exposed. When electrical bonding is performed by other methods, the entire semiconductor chip can be polished and further thinned. In this manner, the semiconductor device can be reduced in size by thinning the sealing body. The thinner the sealing body, the better the size reduction. However, in order to maintain the rigidity necessary for handling, the thickness of the sealing body is, for example, 50 μm or more, preferably 75 μm or more. it can. If the sealing resin portion of the sealing body is thin or flat from the beginning, this step can be omitted.

つづいて、封止した半導体チップは、それぞれ、電気的なテストにより検査され、良品が選別される(S14およびS16)。   Subsequently, each of the sealed semiconductor chips is inspected by an electrical test, and non-defective products are selected (S14 and S16).

つづいて、上記のように薄層化された封止体の上に、同様に封止および薄層化され、良品であると判断された他の封止体を搭載し、積層された半導体チップ間を電気的に接続する(S18)。半導体チップ間の電気的接続は、たとえばワイヤボンディングにより行うことができる。   Subsequently, another sealing body which is similarly sealed and thinned and judged to be a non-defective product is mounted on the thinned sealing body as described above, and is laminated. They are electrically connected (S18). The electrical connection between the semiconductor chips can be performed by wire bonding, for example.

ここで、最下層の封止体は、一つのサブストレート上に複数の半導体チップを配置し、それぞれ封止することにより形成することができる。一方、上層に積層される封止体は、個別化された状態で下層の封止体上に積層することができる。このような状態で、最下層の封止体のうち、良品であると判断されたチップ上に、順次上層の封止体を積層する。このように、最下層の封止体を個別化しない状態で複数の封止体を積層することにより、取り扱いを容易にすることができる。   Here, the lowermost sealing body can be formed by arranging a plurality of semiconductor chips on one substrate and sealing each of them. On the other hand, the sealing body laminated on the upper layer can be laminated on the lower sealing body in an individualized state. In such a state, an upper layer sealing body is sequentially laminated on a chip determined to be a non-defective product among the lowermost sealing bodies. Thus, handling can be facilitated by laminating a plurality of sealing bodies without individualizing the lowermost sealing body.

所定数の封止体を積層した後、これらの封止体を再度封止樹脂により封止する(S20)。ここで、たとえばトランスファーモールド等により、複数の積層体を同時に封止することができ、封止後に積層体毎に個別化し、半導体装置を得る。   After laminating a predetermined number of sealing bodies, these sealing bodies are again sealed with a sealing resin (S20). Here, for example, a plurality of stacked bodies can be sealed at the same time by transfer molding or the like, and after sealing, each stacked body is individualized to obtain a semiconductor device.

以上のような方法を用いることにより、検査されて良品と判断された半導体チップのみを積層した半導体装置を製造することができる。これにより、半導体装置を製造後に、積層体の中に、不良な半導体チップが一つ含まれるために他の半導体チップが無駄になるということを防ぐことができる。また、半導体チップを封止した後に積層しているが、封止体を薄層化して積層しているので、半導体装置を小型化することもできる。   By using the method as described above, it is possible to manufacture a semiconductor device in which only semiconductor chips that have been inspected and judged as non-defective products are stacked. Thereby, after manufacturing the semiconductor device, it is possible to prevent other semiconductor chips from being wasted because one defective semiconductor chip is included in the stacked body. In addition, the semiconductor chip is stacked after sealing, but since the sealing body is thinned and stacked, the semiconductor device can be downsized.

以下に、本発明の実施の形態の一例を詳細に説明する。なお、本発明は、これにより限定されるものではない。   Hereinafter, an example of an embodiment of the present invention will be described in detail. In addition, this invention is not limited by this.

図2は、本実施例で作製した封止体の製造工程を示す工程断面図である。
以下、最下層の封止体の製造工程を説明する。ここでは、サブストレートとして、プリント配線板102を用いた(図2(a))。プリント配線板102は、厚さ約100μmのFR5製プリント配線板である。つづいて、プリント配線板102上に、第一の半導体チップ104をフィルム状接着剤を用いてマウントした(図2(b))。第一の半導体チップ104は、素子形成面の中央部に直線状に配列された複数のパッドを有し、厚さ約80μmである。ここでは一つの第一の半導体チップ104しか示していないが、最下層の封止体は、プリント配線板102上に複数の第一の半導体チップ104を配置し、その状態で封止体を形成した。
FIG. 2 is a process cross-sectional view showing the manufacturing process of the sealing body produced in this example.
Hereinafter, the manufacturing process of the lowermost sealed body will be described. Here, the printed wiring board 102 was used as the substrate (FIG. 2A). The printed wiring board 102 is an FR5 printed wiring board having a thickness of about 100 μm. Subsequently, the first semiconductor chip 104 was mounted on the printed wiring board 102 using a film adhesive (FIG. 2B). The first semiconductor chip 104 has a plurality of pads arranged linearly at the center of the element formation surface and has a thickness of about 80 μm. Although only one first semiconductor chip 104 is shown here, the lowermost sealing body has a plurality of first semiconductor chips 104 arranged on the printed wiring board 102 and forms the sealing body in that state. did.

つづいて、ボンディングワイヤ106により、第一の半導体チップ104のパッドとプリント配線板102とを電気的に接合した(図2(c))。ボンディングワイヤ106としては金線を用いた。ボンディングワイヤ106の最頂部の高さは、プリント配線板102の表面から約180μmであった。   Subsequently, the pads of the first semiconductor chip 104 and the printed wiring board 102 were electrically joined by the bonding wires 106 (FIG. 2C). A gold wire was used as the bonding wire 106. The height of the topmost part of the bonding wire 106 was about 180 μm from the surface of the printed wiring board 102.

次に、第一の半導体チップ104の周囲に、枠材108をペースト接着剤を用いてマウントした(図2(d))。ここでは、厚さ約200μmの銅製の枠を用いた。   Next, the frame member 108 was mounted around the first semiconductor chip 104 using a paste adhesive (FIG. 2D). Here, a copper frame having a thickness of about 200 μm was used.

ここで、枠材108の材料としてはとくに限定されないが、たとえば積層された半導体チップをサブストレートや他の半導体チップとワイヤボンディングの手法により接合する場合、積層されたサブストレートのボンディングワイヤへの熱伝導が不充分となることがあるため、枠材108として熱伝導性の良好な材料を用いることが好ましい。これにより、枠材108を介してサブストレートに熱を伝導することが可能となるため、ボンディングワイヤへの熱伝導を確保することができる。枠材108は、後の工程の研磨時に、封止樹脂表面に露出するように形成される。   Here, the material of the frame member 108 is not particularly limited. For example, when a laminated semiconductor chip is bonded to a substrate or another semiconductor chip by a wire bonding technique, the heat applied to the bonding wire of the laminated substrate is not limited. Since conduction may be insufficient, it is preferable to use a material having good thermal conductivity as the frame member 108. Thereby, heat can be conducted to the substrate through the frame member 108, so that heat conduction to the bonding wire can be ensured. The frame material 108 is formed so as to be exposed on the surface of the sealing resin when polishing in a later step.

また、枠材108の大きさを適宜設定することにより、半導体チップをポッティングモールドする際に、封止領域を小さくすることができ、半導体装置を小型化することができる。   In addition, by appropriately setting the size of the frame member 108, when the semiconductor chip is potted, the sealing region can be reduced and the semiconductor device can be downsized.

つづいて、枠材108内にポッティング封止樹脂を注入し、硬化させることにより、第一の半導体チップ104を封止した(図2(e))。封止樹脂としては、CRP−3900(住友ベークライト株式会社製)を用いた。   Subsequently, a potting sealing resin was injected into the frame material 108 and cured to seal the first semiconductor chip 104 (FIG. 2E). CRP-3900 (manufactured by Sumitomo Bakelite Co., Ltd.) was used as the sealing resin.

つづいて、封止樹脂110を砥石150により研磨し、封止樹脂110表面を平坦化させるとともに、封止樹脂110の厚さを約200μmに薄層化した(図2(f))。これにより、第一の封止体100を得た。この後、電気的なテストにより検査を行い、良品を選別した。   Subsequently, the sealing resin 110 was polished with a grindstone 150 to flatten the surface of the sealing resin 110 and the thickness of the sealing resin 110 was reduced to about 200 μm (FIG. 2F). Thereby, the 1st sealing body 100 was obtained. Thereafter, inspection was conducted by an electrical test to select non-defective products.

図3は、本実施例で作製した封止体の製造工程を示す工程断面図である。
ここでは、サブストレートとして、プリント配線板202を用いた(図3(a))。プリント配線板202は、厚さ約50μmのフレキシブルプリント配線板である。つづいて、プリント配線板202の所定の箇所にフィルム203を貼り付けた(図3(b))。フィルム203は、ノンコンダクティブフィルムである。
FIG. 3 is a process cross-sectional view showing the manufacturing process of the sealing body produced in this example.
Here, a printed wiring board 202 was used as the substrate (FIG. 3A). The printed wiring board 202 is a flexible printed wiring board having a thickness of about 50 μm. Subsequently, a film 203 was attached to a predetermined portion of the printed wiring board 202 (FIG. 3B). The film 203 is a non-conductive film.

次に、素子形成面の周辺部全体に端子を有する第二の半導体チップ204をプリント配線板202上にマウントした(図3(c))。ここでは、第二の半導体チップ204の端子上に金スタッドバンプを形成し、フリップチップボンダーにより第二の半導体チップ204を位置あわせしつつ加熱加圧することにより、プリント配線板202上にマウントするとともに、電気的接合を行った。   Next, the second semiconductor chip 204 having terminals on the entire periphery of the element formation surface was mounted on the printed wiring board 202 (FIG. 3C). Here, a gold stud bump is formed on the terminal of the second semiconductor chip 204, and the second semiconductor chip 204 is mounted on the printed wiring board 202 by applying heat and pressure while aligning the second semiconductor chip 204 with a flip chip bonder. Electrical connection was performed.

つづいて、トランスファーモールドを用いて封止樹脂210により、第二の半導体チップ204を封止した(図3(d))。封止樹脂としては、EME−7200(住友ベークライト株式会社製)を用いた。   Subsequently, the second semiconductor chip 204 was sealed with a sealing resin 210 using a transfer mold (FIG. 3D). EME-7200 (manufactured by Sumitomo Bakelite Co., Ltd.) was used as the sealing resin.

その後、封止樹脂210を砥石250により研磨し、封止樹脂210表面を平坦化させるとともに、封止樹脂210の厚さを約150μmに薄層化した(図3(e))。これにより、第二の封止体200を得た。この後、電気的なテストにより検査を行い、良品を選別した。   Thereafter, the sealing resin 210 was polished with a grindstone 250 to flatten the surface of the sealing resin 210, and the thickness of the sealing resin 210 was reduced to about 150 μm (FIG. 3E). Thereby, the 2nd sealing body 200 was obtained. Thereafter, inspection was conducted by an electrical test to select non-defective products.

図4は、半導体装置の製造工程の一例を示す工程断面図である。
まず、図2に示した第一の封止体100上に、図3に示した第二の封止体200を積層した(図4(a))。これらは、フィルム状接着剤により接合した。ここで、第一の封止体100に含まれる枠材108が、第二の封止体200のプリント配線板202の周辺部と重なるように積層した。
FIG. 4 is a process cross-sectional view illustrating an example of a semiconductor device manufacturing process.
First, the second sealing body 200 shown in FIG. 3 was laminated on the first sealing body 100 shown in FIG. 2 (FIG. 4A). These were joined by a film adhesive. Here, the frame member 108 included in the first sealing body 100 was laminated so as to overlap the peripheral portion of the printed wiring board 202 of the second sealing body 200.

つづいて、第二の封止体200のプリント配線板202の周辺部と、第一の封止体100のプリント配線板102の周辺部とを、ボンディングワイヤ302により電気的に接合した(図4(b))。上述したように、第一の封止体100に含まれる枠材108が、第二の封止体200のプリント配線板202の周辺部と重なるように積層しているので、ボンディングワイヤ302形成時に、プリント配線板202周辺部に熱を伝導することができ、良好にボンディングワイヤ302を形成することができる。   Subsequently, the peripheral portion of the printed wiring board 202 of the second sealing body 200 and the peripheral portion of the printed wiring board 102 of the first sealing body 100 are electrically joined by the bonding wires 302 (FIG. 4). (B)). As described above, since the frame material 108 included in the first sealing body 100 is laminated so as to overlap with the peripheral portion of the printed wiring board 202 of the second sealing body 200, when the bonding wire 302 is formed. Heat can be conducted to the periphery of the printed wiring board 202, and the bonding wire 302 can be formed satisfactorily.

つづいて、第一の封止体100と第二の封止体200の積層体を一括して封止樹脂304により封止した(図4(c))。ここで、封止樹脂としては、EME−7200(住友ベークライト株式会社製)を用いた。この後、積層体毎に個別化し、半導体装置300を得た。   Then, the laminated body of the 1st sealing body 100 and the 2nd sealing body 200 was collectively sealed with the sealing resin 304 (FIG.4 (c)). Here, EME-7200 (manufactured by Sumitomo Bakelite Co., Ltd.) was used as the sealing resin. Then, it individualized for every laminated body and the semiconductor device 300 was obtained.

以上の半導体装置300の動作確認を行った結果、半導体装置として正常に動作することが確認された。   As a result of confirming the operation of the semiconductor device 300 as described above, it was confirmed that the semiconductor device operates normally.

以上のように、本発明によれば、複数の半導体チップを3次元に積層してパッケージ化したマルチチップパッケージの製造において、半導体装置の歩留まりを向上させることができるとともに、小型・軽量化及び高機能・大容量化を図ることができる。   As described above, according to the present invention, in the manufacture of a multichip package in which a plurality of semiconductor chips are three-dimensionally stacked and packaged, the yield of the semiconductor device can be improved, and the size and weight can be reduced. Increases functionality and capacity.

以上、本発明を実施の形態および実施例に基づいて説明した。この実施の形態および実施例はあくまで例示であり、種々の変形例が可能なこと、またそうした変形例も本発明の範囲にあることは当業者に理解されるところである。   The present invention has been described based on the embodiments and examples. It is to be understood by those skilled in the art that the embodiments and examples are merely examples, and various modifications are possible and that such modifications are within the scope of the present invention.

たとえば、以上の形態では、封止樹脂により封止された封止体どうしを積層する例を示したが、本発明は、封止樹脂により封止された封止体と、封止されていない半導体チップとを積層する場合にも適用することができる。   For example, in the above embodiment, the example in which the sealing bodies sealed with the sealing resin are stacked is shown. However, the present invention is not sealed with the sealing body sealed with the sealing resin. The present invention can also be applied to a case where a semiconductor chip is stacked.

また、半導体チップに加えて、受動素子を積層することもできる。この場合、受動素子を樹脂封止して、積層してもよい。   In addition to the semiconductor chip, passive elements can be stacked. In this case, the passive elements may be laminated with resin sealing.

図5は、半導体装置300の他の例を示す断面図である。第一の封止体100と、第二の封止体200は、たとえば配線パターンが形成された絶縁フィルム214を挟んで積層することもできる。ここで、第二の封止体200は、プリント配線板202を有しない構成とすることができる。第二の半導体素子204の端子は絶縁フィルム214の配線パターンと電気的に接合される。絶縁フィルム214の端部には貫通電極が設けられ、配線パターンとプリント配線板102上の電極パッド114とが電気的に接続される。これにより、プリント配線板102を介して第一の半導体素子104と第二の半導体素子204が電気的に接続される。このように、第一の封止体100と第二の封止体200は、種々の形態で電気的に接続することができる。   FIG. 5 is a cross-sectional view illustrating another example of the semiconductor device 300. The 1st sealing body 100 and the 2nd sealing body 200 can also be laminated | stacked on both sides of the insulating film 214 in which the wiring pattern was formed, for example. Here, the second sealing body 200 can be configured without the printed wiring board 202. The terminals of the second semiconductor element 204 are electrically joined to the wiring pattern of the insulating film 214. A through electrode is provided at an end of the insulating film 214, and the wiring pattern and the electrode pad 114 on the printed wiring board 102 are electrically connected. Accordingly, the first semiconductor element 104 and the second semiconductor element 204 are electrically connected via the printed wiring board 102. As described above, the first sealing body 100 and the second sealing body 200 can be electrically connected in various forms.

また、図2において、ポッティング封止樹脂を用いる際に枠材108として熱伝導性の良好な材料を用いる例を示したが、他の方法で封止を行う場合にも、ボンディングワイヤ形成時の熱伝導を確保する目的で、熱伝導性の良好な材料を封止樹脂の周囲または内部に設けておくことができる。   2 shows an example in which a material having good thermal conductivity is used as the frame member 108 when using the potting sealing resin. However, when sealing by other methods, the bonding wire is formed. In order to ensure heat conduction, a material having good heat conductivity can be provided around or inside the sealing resin.

さらに、本発明は、以下の態様も含む。
[1] 半導体パッケージの動作を確認した後、動作を確認された複数の半導体パッケージを積層してマルチチップパッケージを製造するマルチチップパッケージの製造方法であって、積層される半導体パッケージと他の半導体パッケージとを金線により接続することを特徴とするマルチチップパッケージの製造方法、
[2] 半導体パッケージの少なくとも1つが、半導体素子を半導体素子との接続用端子、他のパッケージとの接続用端子及びそれらを接続する導体回路を有する有機サブストレート上に搭載し、電気的接続を行った後、半導体素子を封止樹脂により封止したものである[1]に記載のマルチチップパッケージの製造方法、
[3] 複数の半導体パッケージを積層する前に半導体パッケージの封止材上面を研磨し平坦化する[1]または[2]に記載のマルチチップパッケージの製造方法、
[4] 半導体装置を構成する封止材と略同じ高さの金属製若しくはシリコン製の部材を封止材内部若しくは端部に配置する[1]、[2]または[3]に記載のマルチチップパッケージの製造方法、
[5] [1]〜[4]のいずれかに記載の製造方法により製造されたマルチチップパッケージ。
Furthermore, the present invention includes the following aspects.
[1] A method for manufacturing a multi-chip package by stacking a plurality of semiconductor packages whose operations have been confirmed after confirming the operation of the semiconductor package, wherein the stacked semiconductor package and another semiconductor A method of manufacturing a multi-chip package, wherein the package is connected by a gold wire;
[2] At least one of the semiconductor packages has a semiconductor element mounted on an organic substrate having a terminal for connecting to the semiconductor element, a terminal for connecting to another package, and a conductor circuit for connecting them. After performing, the manufacturing method of the multichip package as described in [1] which is what sealed the semiconductor element with sealing resin,
[3] The multichip package manufacturing method according to [1] or [2], in which the upper surface of the sealing material of the semiconductor package is polished and planarized before the plurality of semiconductor packages are stacked.
[4] A metal or silicon member having substantially the same height as the sealing material constituting the semiconductor device is disposed inside or at the end of the sealing material. The multi described in [1], [2] or [3] Chip package manufacturing method,
[5] A multichip package manufactured by the manufacturing method according to any one of [1] to [4].

本発明の実施の形態における、半導体装置の製造手順を示すフローチャートである。4 is a flowchart showing a manufacturing procedure of a semiconductor device in the embodiment of the present invention. 実施例で作製した封止体の製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the sealing body produced in the Example. 実施例で作製した封止体の製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the sealing body produced in the Example. 実施例で作製した半導体装置の製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the semiconductor device produced in the Example. 本発明の半導体装置の他の例を示す断面図である。It is sectional drawing which shows the other example of the semiconductor device of this invention.

符号の説明Explanation of symbols

100 第一の封止体
102 プリント配線板
104 第一の半導体チップ
106 ボンディングワイヤ
108 枠材
110 封止樹脂
150 砥石
200 第二の封止体
202 プリント配線板
203 フィルム
204 第二の半導体チップ
210 封止樹脂
250 砥石
300 半導体装置
302 ボンディングワイヤ
304 封止樹脂
DESCRIPTION OF SYMBOLS 100 1st sealing body 102 Printed wiring board 104 1st semiconductor chip 106 Bonding wire 108 Frame material 110 Sealing resin 150 Grinding stone 200 2nd sealing body 202 Printed wiring board 203 Film 204 2nd semiconductor chip 210 Sealing Stop resin 250 Grinding stone 300 Semiconductor device 302 Bonding wire 304 Sealing resin

Claims (11)

第一の半導体チップを樹脂封止した第一の封止体と、
第二の半導体チップと、
が積層された積層体を含み、
前記第一の封止体は、前記樹脂の周囲または内部に、前記第一の半導体チップを囲むように設けられた、前記樹脂よりも熱伝導性の高い材料により構成された熱伝導部材である枠材を含み、当該枠材は、積層方向において、前記封止体と等しい高さに形成されたことを特徴とする半導体装置。
A first sealing body in which the first semiconductor chip is resin-sealed;
A second semiconductor chip;
Including a laminated body,
The first sealing body is a heat conducting member made of a material having higher thermal conductivity than the resin, which is provided around or inside the resin so as to surround the first semiconductor chip. includes a frame member, the frame member is a semiconductor device characterized by the laminating direction, were formed in the same height as the sealing body.
請求項1に記載の半導体装置において、
前記積層体は、前記第二の半導体チップが樹脂封止された第二の封止体と、前記第一の封止体とが積層された構造を有することを特徴とする半導体装置。
The semiconductor device according to claim 1,
The stacked body has a structure in which a second sealing body in which the second semiconductor chip is sealed with a resin and the first sealing body are stacked.
請求項1または2に記載の半導体装置において、
前記積層体がさらに樹脂封止されたことを特徴とする半導体装置。
The semiconductor device according to claim 1 or 2,
A semiconductor device, wherein the laminate is further sealed with resin.
請求項1乃至3いずれかに記載の半導体装置において、
パッケージ基板をさらに含み、
前記第一の封止体は、前記パッケージ基板上に配置され、前記第二の半導体チップは、前記第一の封止体上に配置されたことを特徴とする半導体装置。
The semiconductor device according to claim 1,
A package substrate,
The first sealing body is disposed on the package substrate, and the second semiconductor chip is disposed on the first sealing body.
請求項4に記載の半導体装置において、
前記パッケージ基板は、前記第一の半導体チップと、前記第二の半導体チップとを電気的に接続する導体回路を含むことを特徴とする半導体装置。
The semiconductor device according to claim 4,
The package substrate includes a conductor circuit that electrically connects the first semiconductor chip and the second semiconductor chip.
請求項1乃至5いずれかに記載の半導体装置において、
前記第一の封止体は、研磨により薄層化されたことを特徴とする半導体装置。
The semiconductor device according to claim 1,
The semiconductor device, wherein the first sealing body is thinned by polishing.
請求項1乃至6いずれかに記載の半導体装置において、
前記第二の半導体チップは、ボンディングワイヤを介して前記第一の半導体チップと電
気的に接続されたことを特徴とする半導体装置。
The semiconductor device according to claim 1,
The semiconductor device, wherein the second semiconductor chip is electrically connected to the first semiconductor chip via a bonding wire.
第一の半導体チップを封止樹脂により封止して封止体を形成する第一の工程と、
前記封止体と第二の半導体チップとを積層して積層体を形成する第二の工程と、
を含み、
前記第一の工程において、前記樹脂よりも熱伝導性の高い材料により構成された熱伝導部材による枠材を前記樹脂の周囲または内部に、前記第一の半導体チップを囲むように設け、積層方向に前記封止体と等しい高さに形成することを特徴とする半導体装置の製造方法。
A first step of sealing the first semiconductor chip with a sealing resin to form a sealing body;
A second step of stacking the sealing body and the second semiconductor chip to form a stacked body;
Including
In the first step, a frame member made of a heat conductive member made of a material having higher thermal conductivity than the resin is provided around or inside the resin so as to surround the first semiconductor chip , and in a stacking direction The method for manufacturing a semiconductor device is characterized in that the semiconductor device is formed at a height equal to that of the sealing body.
請求項8に記載の半導体装置の製造方法において、
前記積層体を封止樹脂により封止する工程をさらに含むことを特徴とする半導体装置の製造方法。
In the manufacturing method of the semiconductor device according to claim 8,
The manufacturing method of the semiconductor device characterized by further including the process of sealing the said laminated body with sealing resin.
請求項8または9に記載の半導体装置の製造方法において、
前記封止体を研磨により薄層化する工程をさらに含み、
前記積層体を形成する工程において、薄層化した前記封止体を積層することを特徴とする半導体装置の製造方法。
In the manufacturing method of the semiconductor device according to claim 8 or 9,
Further comprising the step of thinning the sealing body by polishing,
In the step of forming the stacked body, the thinned sealing body is stacked.
請求項8乃至10いずれかに記載の半導体装置の製造方法において、
前記封止体に含まれる前記第一の半導体チップの良否を検査する工程をさらに含み、
前記第一の半導体チップの動作を検査する工程で良品と判定された前記封止体を用いて、前記積層体を形成することを特徴とする半導体装置の製造方法。
In the manufacturing method of the semiconductor device according to claim 8,
Further comprising the step of inspecting the quality of the first semiconductor chip included in the sealing body,
A method of manufacturing a semiconductor device, comprising: forming the stacked body using the sealing body determined to be a non-defective product in the step of inspecting the operation of the first semiconductor chip.
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