JP4437906B2 - 構造体の製造方法、多孔質構造体の製造方法、及び多孔質構造体 - Google Patents

構造体の製造方法、多孔質構造体の製造方法、及び多孔質構造体 Download PDF

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JP4437906B2
JP4437906B2 JP2003318158A JP2003318158A JP4437906B2 JP 4437906 B2 JP4437906 B2 JP 4437906B2 JP 2003318158 A JP2003318158 A JP 2003318158A JP 2003318158 A JP2003318158 A JP 2003318158A JP 4437906 B2 JP4437906 B2 JP 4437906B2
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core
particles
shell
sol
alkoxide
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JP2005082746A (ja
JP2005082746A5 (enExample
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憲正 深澤
仁華 金
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Kawamura Institute of Chemical Research
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Kawamura Institute of Chemical Research
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  • Optical Integrated Circuits (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
JP2003318158A 2003-09-10 2003-09-10 構造体の製造方法、多孔質構造体の製造方法、及び多孔質構造体 Expired - Fee Related JP4437906B2 (ja)

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JP2005082746A5 JP2005082746A5 (enExample) 2006-09-28
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108084334A (zh) * 2017-12-19 2018-05-29 苏州中科纳福材料科技有限公司 聚异丙基丙烯酰胺-丙烯酸光子晶体的制备方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010070664A (ja) * 2008-09-19 2010-04-02 Konica Minolta Business Technologies Inc 表示部材およびその製造方法
JP5950505B2 (ja) * 2011-04-08 2016-07-13 キヤノン株式会社 屈折率分布構造体とその製造方法、屈折率分布構造体を備えた画像表示装置
EP2826815B1 (en) * 2012-03-12 2023-05-24 Nanotheta Co., Ltd. Ultra-thin polymer film disk and method of preparation
WO2017150423A1 (ja) 2016-02-29 2017-09-08 積水化成品工業株式会社 シリカ内包マイクロカプセル樹脂粒子、その製造方法及びその用途
JP6185217B1 (ja) * 2016-02-29 2017-08-23 積水化成品工業株式会社 シリカ内包マイクロカプセル樹脂粒子、その製造方法及びその用途
CN111208059B (zh) * 2020-02-11 2022-09-30 南京信息工程大学 基于核/壳纳米周期性线阵列等离子体超材料的光纤氢气传感器
CN117264267A (zh) * 2023-09-20 2023-12-22 燕山大学 多物理量响应的多层反蛋白石水凝胶薄膜及其制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108084334A (zh) * 2017-12-19 2018-05-29 苏州中科纳福材料科技有限公司 聚异丙基丙烯酰胺-丙烯酸光子晶体的制备方法

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