JP4415426B2 - Color filter and manufacturing method thereof - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention employs a material formed in a relatively thick film such as a resin-based material in the light shielding pattern portion among the color filters incorporated in the color liquid crystal display device, and the color reproduction characteristics do not necessarily require strictness. The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device for non-use applications.
[0002]
[Prior art]
In order to perform color display in a color liquid crystal display device, a light-shielding layer (black matrix) in which a pattern with an opening is formed in a light transmission part, and red, green, and blue photosensitive colored resins are formed in the light transmission part. Thus, a color filter which is a colored pixel layer is generally used. One of the market demands for recent liquid crystal display devices is cost reduction. Therefore, instead of using a pattern etching method in which an expensive metal or metal oxide film is formed on a substrate as a black matrix, a light transmitting portion is used. A method using a photosensitive colored resin similar to that of the colored pixel layer has been devised and put into practical use, and it is employed in a considerable proportion.
[0003]
However, in the case of this resin black matrix, the thickness is about 1 μm, which is relatively thick compared to the conventional metal black matrix. Therefore, unlike the conventional case, the colored pixel portion cannot be formed in a stripe shape so as to cross the black matrix portion by utilizing the fact that the black matrix portion is a film much thinner than the colored pixel portion. Therefore, inevitably, when the resin black matrix is employed, the formation pattern of the colored pixel portion is an island shape matching the shape of the opening of the black matrix.
[0004]
However, the conventional island-shaped colored pixel portion resist pattern has an outer shape slightly larger than the black matrix opening in view of a margin of alignment accuracy so that a gap with the black matrix does not occur. Therefore, the cross-sectional shape of the color filter after the formation of the colored pixel portion is such that the colored pixel portion 3 overlaps the end of the black matrix 2 as shown in FIG. It had been.
[0005]
With such a cross-sectional shape, for example, when a liquid crystal display panel is formed, a part of the beads 4 that serve to regulate the thickness of the gap between the two substrates by being dispersed between the opposing substrates is fixed. As shown in FIG. 4, there is a problem that an accurate gap interval cannot be obtained when it is located at the protrusion C portion of the colored pixel portion 3.
Furthermore, when the liquid crystal injected between the two substrates operates as a liquid crystal display panel, there is a problem that the alignment of the liquid crystal is disturbed by the protrusions C in FIG. 4 and the display quality is adversely affected.
[0006]
[Problems to be solved by the invention]
The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a color filter having a configuration in which no protruding portion of a colored pixel portion is generated.
[0007]
[Means for Solving the Problems]
The present invention relates to a color filter comprising a black matrix using a colored light-shielding resin and a color filter layer using a colored transparent resin, wherein the color filter has a pattern outer shape on the inner side of the peripheral edge of the black matrix and the black filter. The color filter is characterized in that the width of the gap between the uppermost contour of the matrix pattern and the pattern outer shape of the color filter is in the range of 1 to 5 μm.
The present invention also provides a method for producing a color filter comprising a black matrix using a colored light-shielding resin and a color filter layer using a colored transparent resin, wherein the pattern outer shape of the color filter is located on the inner side of the periphery of the opening of the black matrix. A pattern exposure is performed using a color filter mask in which the width of the gap between the top contour of the black matrix pattern and the pattern outer shape of the color filter mask is 2 to 5 μm. It is a manufacturing method.
[0008]
DETAILED DESCRIPTION OF THE INVENTION
The color filter of the present invention and the manufacturing method thereof will be described in detail below based on the embodiment.
First, an ultraviolet curable photosensitive resin (for example, product name “CK-2000” manufactured by Fuji Hunt Electronics Technology Co., Ltd., manufactured by Fuji Hunt Electronics Technology Co., Ltd.) in which a black pigment is dispersed is applied and dried on a non-alkali glass substrate 1 by a spin coater. The film is irradiated with ultraviolet rays through a photomask having the pattern shape described above, developed after baking. The black matrix 2 thus formed functions as a light-shielding layer between pixels of red, green, and blue colors and serves to improve the contrast of the display image. The thickness of the black matrix 2 layer is determined by the transmission density (log). ₁₀ I ₀ / I ₁ , where I ₀ is the amount of incident light and I ₁ is the amount of transmitted light), for example, is about 1.0 μm.
[0009]
Subsequently, the colored pixel portions 3 of red, green, and blue are provided in an island shape inside the pattern opening of the black matrix 2 as shown in FIG. First, as a red coloring material, an ultraviolet curable photosensitive resin in which a red pigment is dispersed (for example, product name “CR-2000” manufactured by Fuji Hunt Electronics Technology Co., Ltd.) is applied and dried by a spin coater, and a predetermined color as shown in FIG. Ultraviolet rays are irradiated through the color filter mask 5 having a shape pattern, followed by baking and development. Note that the photomask (color filter mask 5) used here has a pattern shape in which a post-sensitivity remaining portion of the negative photosensitive resin is opened, and the shape will be described below. Here, the thickness of the red color filter 3R is suitably about 1.0 to 1.2 μm in order to obtain desired spectral characteristics.
[0010]
Here, the outer shape of the colored pixel portion 3 (excluding the skirt portion, the outermost shape of the pattern) has a gap portion (transmission portion) between it and the black matrix 2 as shown in A of FIG. When the substrate 1 on which the black matrix 2 is formed and the photomask at the time of forming the colored pixel portion 3 is shifted by an error in alignment accuracy, that is, as shown in A 'of FIG. Even in such a case, the black matrix 2 and the outer periphery of the uppermost portion of the colored pixel portion 3 have an outer shape with a margin that does not overlap when the protrusion is formed.
[0011]
Specifically, since the current alignment accuracy (error) is about 2 to 3 μm, the width between the peripheral portions of the black matrix 2 and the color filter mask 5 shown in FIG. It is necessary to secure the degree. However, when the outer peripheral taper portion (hem portion) after the formation of the colored pixel portion 3 is formed larger than the outer shape of the mask and covers the taper portion of the black matrix 2, the hem portion of the colored pixel portion 3 is correspondingly increased. Lifts up. Further, the outer shape may be formed to be significantly thicker than the outer shape of the mask depending on the degree of development. That is, as a result, as shown in FIG. 1, the gap indicated by A on the color filter substrate on which the colored pixel portion 3 is formed is narrower than the gap B in FIG.
[0012]
Considering these, it is desirable that the width of the gap between the peripheral portions of the black matrix 2 and the color filter mask 5 shown in FIG. 2B is in the range of 2 to 5 μm. The width of the gap indicated by A on the color filter substrate on which the colored pixel portion 3 is formed is preferably in the range of 1 to 5 μm.
[0013]
Subsequently, the same operation is performed to form green and blue colored pixel portions 3. As a coloring material, an ultraviolet curable photosensitive resin in which a green pigment is dispersed (for example, product name “CG-2000” manufactured by Fuji Hunt Electronics Technology Co., Ltd.) and an ultraviolet curable photosensitive resin in which a blue pigment is dispersed (for example, Fuji Hunt Electronics). Technology Co., Ltd., product name “CB-2000”), each is coated and dried with a spin coater, and irradiated with ultraviolet rays through a mask having a predetermined shape pattern, and then repeatedly baked and developed. To complete the color filter substrate.
[0014]
【The invention's effect】
Since the colored pixel portion is provided in an island shape inside the pattern opening portion of the black matrix, the colored pixel portion overlaps with the end portion of the black matrix, and the overlapping portion does not become a large protrusion. Further, considering that the outer shape of the colored pixel portion is formed to be significantly thicker than the mask shape depending on the degree of development, and that the outer peripheral tapered portion of the colored pixel portion may be formed outside the outer shape of the mask. The width of the gap is desirably 2 to 5 μm, and accordingly, a color filter surface can be obtained in which the boundary between the colored pixel portion and the black matrix is appropriately minimized and no large protrusion is generated.
[0015]
[Brief description of the drawings]
FIG. 1 is an explanatory diagram showing a part of a color filter of the present invention.
FIG. 2 is an explanatory diagram showing a state in which a substrate on which only a black matrix is formed in a color filter of the present invention and a color filter pattern mask are overlaid.
FIGS. 3A to 3B are cross-sectional views showing a color filter of the present invention.
FIG. 4 is a cross-sectional view showing a state of a conventional color filter.
[Explanation of symbols]
1 Substrate 2 Black matrix 3 Colored pixel 4 Spacer 5 Color filter mask

Claims (2)

In a color filter composed of a black matrix using a colored light-shielding resin and a color filter layer using a colored transparent resin, the color filter pattern outline is on the inner side of the peripheral edge of the black matrix opening and the black matrix pattern outermost The width of the gap between the upper contour and the color filter pattern outer shape is in the range of 1 to 5 μm , and the color filter pattern outer shape is in a state where the black matrix and the uppermost outer periphery of the color filter have protrusions. A color filter characterized by an outer shape that does not overlap .   In a method for producing a color filter comprising a black matrix using a colored light-shielding resin and a color filter layer using a colored transparent resin, the pattern outer shape of the color filter is inside the periphery of the opening of the black matrix, and the black matrix A method for producing a color filter, wherein pattern exposure is carried out using a color filter mask in which the width of the gap between the pattern top contour and the pattern outer shape of the color filter mask is in the range of 2 to 5 μm.

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