JP4387912B2 - Substrate processing apparatus and substrate processing method - Google Patents

Description

  The present invention uses a roll brush to supply a processing liquid to the main surface of a substrate while transporting a substrate such as a glass substrate for a liquid crystal display (LCD), a glass substrate for a plasma display (PDP), or a printed substrate in a horizontal direction. The present invention relates to a substrate processing apparatus and a substrate processing method for performing processing such as scrub cleaning of a substrate.

For example, scrub cleaning using a roll brush is generally performed to remove contaminants such as particles of 1 μm or more adhering to the surface of a glass substrate for a flat panel display (FPD) such as LCD and PDP. . A roll brush cleaning device that performs such processing is composed of a plurality of transport rollers arranged in parallel to each other, supports a substrate and transports it horizontally, and the main surface of the substrate transported by this roller conveyor. The nozzle is configured to supply a cleaning liquid such as pure water and a roll brush that abuts against the main surface of the substrate and rubs the substrate. In the roll brush, the rotating shaft portion outside the brush bristle planting portion is supported at two locations, and is driven to rotate by a motor connected to the rotating shaft (see, for example, Patent Document 1).
Japanese Patent Laid-Open No. 10-5702 (page 4-5, FIGS. 1 and 2)

  In the above-described roll brush cleaning apparatus, when the width dimension of the substrate to be cleaned is small, the bending of the roll brush has not been regarded as a problem. However, when the substrate becomes larger as in recent years, such as 1.5 m to 1.8 m, the influence of the deflection of the roll brush becomes significant. In other words, when the roll brush is bent, partial roll (vibration) occurs in the roll brush, and the bristles of the brush do not come into contact with the entire main surface of the substrate with uniform pressure. As a result, there is a problem that the degree of cleaning of the main surface of the substrate becomes non-uniform.

  The present invention has been made in view of the circumstances as described above, and even if the roll brush is bent and the roll brush is partially shaken, it is more uniform over the entire main surface of the substrate. It is an object of the present invention to provide a substrate processing apparatus and a substrate processing method capable of performing processing.

The invention according to claim 1 is supported such that the rotation axis intersects with the relative movement direction of the substrate, is spaced in the relative movement direction of the substrate and is arranged in parallel with each other, and each is entirely brushed. At least two roll brushes having a cylindrical peripheral surface in which bristles are implanted, the cylindrical peripheral surface being in contact with the main surface of the substrate, and being driven to rotate, and the substrate relative to these roll brushes In the substrate processing apparatus comprising the moving means for moving, when each of the roll brushes, an axial center blur area in which an axial center position shifts at the time of its rotation appears in a wave shape at a plurality of substantially fixed positions in the axial direction. The axial center blur areas of at least two roll brushes are shifted from each other in the width direction of the substrate perpendicular to the substrate transport direction.

  According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect, at least two roll brushes have the same length and the same number of rotations, and the two roll brushes have a substrate transport direction and It is characterized in that the positions in the width direction of the orthogonal substrates are set so as to deviate from each other.

  According to a third aspect of the present invention, in the substrate processing apparatus according to the first aspect, the length of at least two roll brushes and the position in the width direction of the substrate perpendicular to the substrate transport direction are the same. The number of rotations of the book roll brush is set to be different from each other.

  According to a fourth aspect of the present invention, in the substrate processing apparatus according to the first aspect, the rotational speed of at least two roll brushes and the position in the width direction of the substrate perpendicular to the substrate transport direction are the same. The lengths of the book roll brushes are set to be different from each other.

The invention according to claim 5 is supported so that the rotation axis intersects with the relative movement direction of the substrate, is spaced in the relative movement direction of the substrate, and is arranged in parallel with each other so that the brush hairs are entirely planted. At least two roll brushes having a cylindrical peripheral surface provided are driven to rotate, and the cylindrical peripheral surfaces of the roll brushes are respectively brought into contact with the main surface of the substrate moving relative to the roll brush. In the substrate processing method for processing a substrate, each roll brush is rotated at a predetermined number of rotations, and the shaft center position deviates during the rotation, and the shaft centers appear in a plurality of substantially fixed positions in the axial direction. At least two roll brushes are prepared on the basis of the preparation process for acquiring the data relating to the shake area and the data relating to the axial shake area obtained in the preparation process. That axis motion zone, characterized in that it comprises a setting step of setting to be shifted between each other in the width direction of the substrate perpendicular to the transport direction of the substrate.

In the substrate processing apparatus according to the first aspect of the present invention, a plurality of axial center blurring areas appearing on one roll brush, that is, an area where the brush tip contacts the main surface of the substrate with a relatively large pressure. And the tip of the brush against the main surface of the substrate, that is, a plurality of axial run-out areas appearing on another roll brush arranged at a distance in the relative movement direction of the roll brush and the substrate. Since the area in contact with the large pressure deviates from each other in the width direction of the substrate perpendicular to the substrate transport direction, the substrate passes through two (or more) roll brushes, and thus the main surface of the substrate On the other hand, the magnitude of the pressure with which the bristles of the brush come into contact is leveled in the width direction of the substrate.
Therefore, when the substrate processing apparatus of the invention according to claim 1 is used, even if the roll brush is bent and the roll brush is partially shaken, the entire main surface of the substrate is more uniformly processed. It can be carried out.

  In the substrate processing apparatus according to the second aspect of the present invention, the number and the absolute position of the axial center blur areas appearing on the two (or more) roll brushes are the same, and the two roll brushes By setting the positions in the width direction of the substrate to deviate from each other, two roll brushes have an axial center blur area, that is, an area where the brush tip abuts against the main surface of the substrate with a relatively large pressure. In the width direction of the substrate. For this reason, when the substrate passes through the two roll brushes, the magnitude of the pressure with which the brush tip comes into contact with the main surface of the substrate is leveled in the width direction of the substrate.

  In the substrate processing apparatus according to the third aspect of the present invention, the rotation center of the two (or more) roll brushes is set to be different from each other, so that the axial center blur areas appearing on the two roll brushes respectively. That is, the number and absolute position of the areas where the brush tips contact with the main surface of the substrate with a relatively large pressure are different from each other. For this reason, when the substrate passes through the two roll brushes, the magnitude of the pressure with which the brush tip comes into contact with the main surface of the substrate is leveled in the width direction of the substrate.

  In the substrate processing apparatus according to the fourth aspect of the present invention, the lengths of the two (or more) roll brushes are set to be different from each other, so that the axial blurring appearing on the two roll brushes respectively. At least absolute positions of the areas, that is, the areas where the brush tips contact with the main surface of the substrate with a relatively large pressure are different from each other. For this reason, when the substrate passes through the two roll brushes, the magnitude of the pressure with which the brush tip comes into contact with the main surface of the substrate is leveled in the width direction of the substrate.

According to the substrate processing method of the invention according to claim 5, in the preparation step, the pressure of the brush tip is relatively large with respect to the axial center fluctuation area of two (or more) roll brushes, that is, the main surface of the substrate. In the setting process, based on the data relating to the axial runout area acquired in the preparation process, the axial runout areas in the two roll brushes are mutually in the width direction of the substrate. Set to deviate. For this reason, when the substrate passes through the two roll brushes, the magnitude of the pressure with which the bristles of the brush come into contact with the main surface of the substrate is leveled in the width direction of the substrate.
Therefore, according to the substrate processing method of the invention according to claim 5, even if the roll brush is bent and the roll brush is partially shaken, the entire main surface of the substrate is more uniformly processed. be able to.

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the best embodiment of the present invention will be described with reference to the drawings.
1 and 2 show an example of an embodiment of the present invention, FIG. 1 is a plan view showing a schematic configuration of a substrate processing apparatus, in this example, a substrate cleaning apparatus, and FIG. 2 is a schematic side view thereof. It is.

  As shown in FIG. 2, this substrate cleaning apparatus is composed of a plurality of transport rollers 10 arranged in parallel to each other, and is a roller conveyor (shown in FIG. 1) that supports the substrate W in a horizontal position and transports it in the horizontal direction. ), The main surface of the substrate W conveyed by the roller conveyor, in this example, the nozzle 12 for supplying a cleaning liquid such as pure water to the upper surface, and the substrate W is supported so as to intersect with the conveying direction of the substrate W and in the illustrated example. The two roll brushes 14a and 14b that are driven to rotate while the cylindrical peripheral surface formed by brush hairs such as mohair and nylon is in contact with the main surface of the substrate W, and the roll brushes 14a and 14b. The motors 16a and 16b that are driven to rotate are provided. In the roll brushes 14a and 14b, the brush bristle planted portions have a length equal to or greater than the width direction dimension of the substrate W, and are not shown, but both ends of the rotating shafts 18a and 18b are omitted. The outer portion of the brush bristle planting portion is supported by a support mechanism. The two roll brushes 14a and 14b are spaced apart from each other in the substrate transport direction and are arranged in parallel to each other. The nozzles 12 are respectively installed in the vicinity of the roll brushes 14a and 14b on the rear side of the roll brushes 14a and 14b in the substrate transport direction. From the nozzle 12, pure water is discharged and supplied over the entire width of the substrate W perpendicular to the transport direction. The main surface of the substrate W is scrubbed by roll brushes 14a and 14b that are rotationally driven while supplying pure water from the nozzle 12 onto the main surface of the substrate W to be transported. The two roll brushes 14a and 14b have the same length and are driven to rotate at the same rotational speed by the motors 16a and 16b.

  Here, when the roll brushes 14a and 14b that have a certain length and are bent are rotated at a predetermined number of rotations, the roll brushes 14a and 14b have a phenomenon that the axial center position of the roll brushes 14a and 14b fluctuates. In this case, on the roll brushes 14a and 14b, as shown in FIG. 3, the axial center fluctuation areas where the axial center position is shifted appear in a wave shape at a plurality of substantially fixed positions in the axial direction. That is, the axial center fixing point where the axial center position hardly fluctuates and the axial center fluctuation area where the axial center position varies are alternately and repeatedly appear in the axial direction. In FIG. 3, the horizontal axis represents the distance from one end of the roll brushes 14a and 14b, and the vertical axis represents the amount of displacement from the reference axis position. The distance between the upper curve and the lower curve indicates the fluctuation width of the axial center position, and the fluctuation width changes in the axial direction and fluctuates as a plurality of spindle shapes are connected. The experimental data shown in FIG. 3 is for the case where the length of the roll brush is 193 cm and the rotation speed of the roll brush is 150 rpm.

  The two roll brushes 14a and 14b having the same rotational characteristics as described above are installed so that the positions in the width direction of the substrate W perpendicular to the transport direction of the substrate W are shifted from each other as shown in FIG. As a result, as shown in FIG. 4, the axial center blur areas of the two roll brushes 14 a and 14 b are shifted from each other in the width direction of the substrate W. In FIG. 4, a curve indicated by a solid line indicates a state where the axial center position of one roll brush 14 a is blurred, and a curve indicated by a two-dot chain line indicates a state where the axial center position of the other roll brush 14 b is blurred. As described above, a plurality of axial center blur regions appearing on one roll brush 14a, that is, a region where the brush tip abuts against the main surface of the substrate W with a relatively large pressure, and the other roll brush 14b. A plurality of appearing axial center blur areas, that is, areas where the brush tips contact with the main surface of the substrate W with a relatively large pressure are mutually in the width direction of the substrate perpendicular to the transport direction of the substrate W. The level of pressure at which the brush tips come into contact with the main surface of the substrate W passing through the two roll brushes 14a and 14b is leveled in the width direction of the substrate W. For this reason, even if the roll brushes 14a and 14b are shaken, the degree of cleaning with respect to the entire main surface of the substrate W can be made more uniform.

  As described above, the roll brushes 14a and 14b are arranged such that a plurality of axial center blur areas appearing on the two roll brushes 14a and 14b are shifted from each other in the width direction of the substrate perpendicular to the transport direction of the substrate W. In order to set the positions of 14b and 14b, the roll brushes 14a and 14b are respectively rotated at various rotational speeds, and data relating to the axial center shake area appearing at the time of the rotation is acquired in advance. . Then, before performing the substrate cleaning process, based on the data on the axial center shake area acquired in advance, the position where the axial center shake areas of the two roll brushes 14a and 14b are shifted from each other in the width direction of the board. It should be set.

  FIG. 5 is a schematic plan view of a substrate cleaning apparatus showing another embodiment of the present invention. Since the bending generated in the roll brushes 14a and 14b is not symmetrical with respect to the center position in the length direction of the roll brushes 14a and 14b, in this apparatus, the motor 16b side of the other roll brush 14b is placed on one roll. In reverse to the motor 16a side of the brush 14a, the maximum deflection positions of the two roll brushes 14a and 14b are made to coincide with each other in the width direction of the substrate perpendicular to the transport direction of the substrate W, and the two The axial blur regions of the roll brushes 14a and 14b are shifted from each other in the width direction of the substrate W.

  FIG. 6 is a schematic plan view of a substrate cleaning apparatus showing still another embodiment of the present invention. In this apparatus, the two roll brushes 14a and 14b are installed so that the positions in the width direction of the substrate W perpendicular to the transport direction of the substrate W coincide with each other. On the other hand, the two roll brushes 14a and 14b are driven to rotate at different rotational speeds.

  Here, when the rotational speeds of the two roll brushes 14a and 14b are different from each other, the axial center blurring areas appearing on the two roll brushes 14a and 14b, that is, the main surface of the substrate W, respectively. The number and absolute position of the areas where the bristles contact with a relatively large pressure will differ from each other. FIG. 7 is a diagram showing the shake of the axial center when the number of rotations of the other roll brush 14b is increased. This experimental data indicates that when the number of rotations of the roll brush is 450 rpm (the length of the roll brush is 193 cm). As shown in FIG. 7, when the rotation speed of the other roll brush 14b is made larger than the rotation speed of the one roll brush 14a, the other roll is compared with the number of axial runout areas appearing on the one roll brush 14a. The number of the axial blurring areas appearing on the brush 14b increases, and the absolute positions of the axial blurring areas are also different from each other. For this reason, as shown in FIG. 8 (the curve shown by the solid line shows the state where the axial center position of one roll brush 14a is blurred, and the curve shown by the broken line shows the axis center position of the other roll brush 14b is blurred. The state and the absolute position of the axial center blur areas of the two roll brushes 14a and 14b are different from each other, thereby making the main surface of the substrate W passing through the two roll brushes 14a and 14b. The magnitude of the pressure with which the brush tips contact is leveled in the width direction of the substrate W.

  FIG. 9 is a schematic plan view of a substrate cleaning apparatus showing still another embodiment of the present invention. In this apparatus, the lengths of the two roll brushes 14a and 14c are different from each other. On the other hand, in the two roll brushes 14a and 14c, the rotation shafts 18a and 18c are rotationally driven at the same rotation speed by the motors 16a and 16c, and the position in the width direction of the substrate W orthogonal to the transport direction of the substrate W is set. The roll brushes 14a and 14c are installed so as to be the same without being shifted, that is, the center positions in the length direction of the roll brushes 14a and 14c are coincident with each other.

  Even in the case where the lengths of the two roll brushes 14a and 14c are different from each other as in the apparatus shown in FIG. 9, the axial wobbling areas appearing on the respective roll brushes 14a and 14c, that is, the substrate W The absolute positions of the areas where the bristles of the brush come into contact with the main surface with a relatively large pressure are different from each other. For this reason, the magnitude of the pressure at which the brush tips come into contact with the main surface of the substrate W passing through the two roll brushes 14 a and 14 c is leveled in the width direction of the substrate W.

  In the above-described embodiment, the processing for cleaning the substrate has been described. However, the present invention can also be applied to substrate processing other than cleaning, for example, development processing using a roll brush. Further, in the above-described embodiment, the roll brushes 14 a and 14 b are disposed so as to be orthogonal to the transport direction of the substrate W, but may be disposed obliquely with respect to the transport direction of the substrate W. Further, three or more roll brushes may be arranged in parallel with each other at intervals in the substrate transport direction. Furthermore, in the said embodiment, although the board | substrate was conveyed in the horizontal direction, it is good also as a structure which fixes a board | substrate and moves a roll brush with respect to a board | substrate.

It is a top view which shows one example of embodiment of this invention and shows schematic structure of a substrate cleaning apparatus. It is a schematic side view of the substrate cleaning apparatus shown in FIG. It is a figure which shows the shake of the axial center which generate | occur | produces at the time of rotation of a roll brush in a board | substrate cleaning apparatus. When two roll brushes having the same length and being driven to rotate at the same number of rotations are installed so that the positions in the width direction of the substrate perpendicular to the substrate transport direction are shifted from each other, the two roll brushes FIG. 6 is a view for explaining that the axial center blur areas appearing in FIG. 1 are shifted from each other in the width direction of the substrate. It is a top view which shows another embodiment of this invention and shows schematic structure of a board | substrate cleaning apparatus. It is a top view which shows another embodiment of this invention and shows schematic structure of a board | substrate cleaning apparatus. It is a figure which shows the shake of the axial center which generate | occur | produces at the time of rotation of a roll brush in a board | substrate cleaning apparatus, Comprising: It is a thing when the rotation speed of a roll brush is enlarged. When the rotation speeds of two roll brushes having the same length are set to be different from each other, the number and the absolute position of the axial runout areas appearing on the two roll brushes are different from each other. It is a figure for demonstrating. It is a top view which shows another embodiment of this invention and shows schematic structure of a board | substrate cleaning apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Conveyance roller 12 Nozzle 14a, 14b, 14c Roll brush 16a, 16b, 16c Motor 18a, 18b, 18c Roll brush rotating shaft W Substrate

Claims (5)

Cylindrical shapes that are supported so that the rotation axis intersects with the relative movement direction of the substrate, are spaced in parallel with each other in the relative movement direction of the substrate, and are arranged in parallel with each other , and brush hairs are planted as a whole. At least two roll brushes that have a peripheral surface and whose cylindrical peripheral surface is in contact with the main surface of the substrate and is driven to rotate;
Moving means for moving the substrate relative to these roll brushes;
In a substrate processing apparatus comprising:
When each of the roll brushes has a shaft center blur area in which the center position of the roll brush fluctuates when rotating, the shaft center blur areas of at least two roll brushes appear in a plurality of substantially constant positions in the axial direction. Are shifted from each other in the width direction of the substrate orthogonal to the substrate transport direction. The substrate processing apparatus according to claim 1,
The length and the number of rotations of at least two roll brushes are the same, and the two roll brushes are set so that their positions in the width direction of the substrate perpendicular to the substrate transport direction are shifted from each other. Substrate processing apparatus. The substrate processing apparatus according to claim 1,
The length of at least two roll brushes and the position in the width direction of the substrate orthogonal to the substrate transport direction are the same, and the rotation speeds of the two roll brushes are set to be different from each other. Substrate processing equipment. The substrate processing apparatus according to claim 1,
The rotational speed of at least two roll brushes and the position in the width direction of the substrate orthogonal to the substrate transport direction are the same, and the lengths of the two roll brushes are different from each other. Substrate processing apparatus. Cylindrical peripheral surfaces that are supported so that the rotation axes intersect with the relative movement direction of the substrate, are spaced in the relative movement direction of the substrate, are arranged in parallel with each other , and brush hairs are entirely implanted. A substrate processing method for processing a substrate by rotating and driving at least two roll brushes each having a cylindrical peripheral surface of each of the roll brushes in contact with a main surface of a substrate that moves relative to the roll brush. In
A preparation step of rotating each roll brush at a predetermined number of rotations, and acquiring data relating to the axial center blur area that appears in a wave shape at a plurality of substantially fixed positions in the axial direction due to the axial center position blurring during the rotation. When,
Based on the data relating to the axial center fluctuation area acquired in this preparation step, the axial center fluctuation area in at least two roll brushes is set to be shifted between each other in the width direction of the substrate perpendicular to the substrate transport direction. A setting process;
A substrate processing method comprising:

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