JP4316340B2 - Recycling method of quartz glass jig - Google Patents

Description

  The present invention relates to a method for regenerating a quartz glass jig used in a semiconductor manufacturing process or the like.

  Conventionally, a semiconductor device such as a MOS LSI or a bipolar LSI is usually manufactured through many processes exceeding 500, such as an oxidation process, a CVD process, and an etching process. Each process requires a large number of semiconductor device manufacturing apparatuses, and quartz glass jigs are incorporated in these semiconductor device manufacturing apparatuses. In addition, these quartz glass jigs are handled as consumables, and minor damages are repaired and used. However, exhausted ones are disposed of.

  FIG. 14 is a diagram showing a schematic flow of processing a conventional quartz glass jig tool. As shown in FIG. 14, quality data 114 is attached to the quartz glass material 112 supplied from the quartz glass material manufacturer 110 to the quartz glass material processing manufacturer 120. In general, the user 130 purchases the quartz glass jig 122 from the quartz glass material processing manufacturer 120, and disposes of the consumable quartz glass jig 132, 134.

  However, the prior art has the following problems. Since quartz glass and quartz glass-made jigs are expensive, attempts have been made to restore (recycle) waste products to their original shape. However, it is difficult to reduce the impurities contained in the recycled product less than the impurities contained in the original tool.

FIG. 15 is a diagram showing an example of the impurity content when processing is performed at a flame temperature (1850 ° C.) of the prior art.
As shown in FIG. 15, the amount of impurities contained in the quartz glass material is greater after treatment (regeneration (2) in the figure) than before treatment (regeneration product in the figure) (Al (aluminum)). In the case of increase from 11.67 ppm to 12.35 ppm).

  That is, when manufacturing a quartz glass jig tool, the means for confirming the concentration of impurities contained in the material is only the impurity analysis slip attached to the material quartz glass at the stage of acceptance. In the processing process after acceptance, it is handled so that impurities do not increase as much as possible, but there is no method of actively reducing impurities. At present, processing contamination is inevitable.

  In a regenerative system that is repeatedly performed, if the same tool is subjected to regeneration processing many times, and if the contained impurities tend to increase even slightly compared to the original tool, this increase in impurities accumulates to an unusable impurity level. Will increase. In existing processing equipment and processing systems, impurities are increased, so that regeneration processing is generally not performed. In addition, since the tool to be regenerated is used by the user and is further contaminated, there is a problem that the existing machining method cannot cope with it.

  The present invention has been made in view of such problems, and the object of the present invention is to recycle the quartz glass tool by remelting the quartz glass and removing impurities by high-temperature flame treatment. It is in the point which provides the technique regarding the reproduction | regenerating method of the quartz glass jig | tool regenerated as a quartz glass jig | tool.

In order to achieve the above object, the invention described in claim 1 is a method for regenerating a quartz glass jig tool used in a semiconductor manufacturing process ,
A material receiving process for receiving quartz glass material;
Deposits for removing reaction by- products, by-product film removal step;
A cleaning process using dilute hydrofluoric acid or ultrapure water ;
An inspection process for inspecting the dimensions and appearance of the quartz glass material;
A processing step of processing the quartz glass material to produce a regenerated quartz glass jig tool,
The quartz glass material in the material receiving step is a consumable quartz glass jig that is disposed of after use in a semiconductor manufacturing factory,
The processing in the processing step is a flame processing step for removing impurities by remelting the quartz glass at a flame temperature equal to or higher than a predetermined temperature in a flame processing chamber in which cold air is introduced using a cooling device to increase the indoor pressure. Including
In the flame treatment process, the quartz glass material having a substantially plate shape or a substantially dome shape is subjected to etching in the semiconductor manufacturing process, or overlaying to compensate for a thickness reduction due to grinding for removal of reaction byproducts, It is characterized by including a thickness regenerating step performed on the surface opposite to the surface where the thickness is reduced .

According to a second aspect of the present invention, in the method for regenerating a quartz glass jig tool according to the first aspect , the processing step is adapted to apply the substantially plate-like or substantially dome-like quartz glass material to the semiconductor manufacturing step. And a polishing step of polishing the reference surface having the roughness .

Invention of Claim 3 is the reproduction | regeneration method of the quartz glass-made jig tools used for a semiconductor manufacturing process ,
A material receiving process for receiving quartz glass material;
Deposits for removing reaction by- products, by-product film removal step;
A cleaning process using dilute hydrofluoric acid or ultrapure water ;
An inspection process for inspecting the dimensions and appearance of the quartz glass material;
A processing step of processing the quartz glass material to produce a regenerated quartz glass jig tool,
The quartz glass material in the material receiving step is a consumable quartz glass jig that is disposed of after use in a semiconductor manufacturing factory,
The processing in the processing step is a flame processing step for removing impurities by remelting the quartz glass at a flame temperature equal to or higher than a predetermined temperature in a flame processing chamber in which cold air is introduced using a cooling device to increase the indoor pressure. Including
In the flame treatment step, the substantially glass-shaped quartz glass material is re-melted, and the meat glass is prepared so as to recover the thickness of the quartz glass material, and another meat is prepared on the meat-soy tube. It includes a step of melt-connecting the walled tube and cutting the melt-connected walled tube into a predetermined length for finishing .

Invention of Claim 4 is the reproduction | regeneration method of the quartz glass jig tool of Claim 1 or 3 , In the flame treatment process,
Using an oxyhydrogen burner whose nozzle outlet is made of quartz glass, performing a flame treatment performed at a high temperature of 1950 ° C. or higher;
And a step of mixing oxygen and hydrogen, which generate a high-temperature flame radiated from the nozzle outlet, in a mixing section maintained at a predetermined piping distance from the nozzle outlet.

The invention according to claim 5 is the method for regenerating a quartz glass jig according to claim 1 or 3 , wherein the flame processing chamber is provided with an opening / closing door for opening / closing an entrance / exit and an exhaust hole in a ceiling,
Cooling air is introduced into the room from the lower side or near the lower side of the room by the cooling device so that the room air pressure is raised by 0.8 to 1.2 atmospheres from the outdoor pressure, and dust or the like from outside when the door is opened or closed In an environment that prevents intrusion of the air, the indoor air that has become hot is raised in a substantially vertical direction using the exhaust holes, and is naturally exhausted from the holes, thereby preventing sweating of the worker. It is characterized by doing so.

The invention according to claim 6 is the method for regenerating a quartz glass jig according to claim 1, 3 or 5 , characterized in that the entrance / exit of the processing chamber is partitioned by an air curtain. Yes.

  The present invention has the following effects. For consumable quartz glass jigs that are normally disposed of in quartz glass jig tool remanufacturers, the impurities are removed by remelting part of the quartz glass by high-temperature flame treatment without increasing the contained impurities. It can be reused as a high-quality recycled quartz glass jig tool with low content.

  Also, instead of melting all quartz glass, which is a material for consumable quartz glass jigs, and newly producing another quartz glass jig, use most of the quartz glass as it is and remelt part of it. Therefore, manufacturing costs (regeneration costs) including energy costs can be kept low. As a result, effective use of resources and reduction of environmental load can be achieved.

  Hereinafter, an example of an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is an explanatory diagram showing a flow of schematic processing of an embodiment of a method for regenerating a quartz glass jig tool of the present invention.

  As shown in FIG. 1, the method for regenerating a quartz glass jig tool of the present embodiment (Embodiment 1) is a consumable quartz glass tool (quartz) supplied from a user 10A by a quartz glass jig tool manufacturer 20A. Glass material) 12 is reprocessed, and a regenerated quartz glass jig 22 with quality data 24 attached is delivered to the user 10B.

  In other words, the consumable quartz glass jig 12 that has been disposed of in the past is commercialized as a recycled quartz glass jig 22 by re-melting the quartz glass by high-temperature flame treatment to remove impurities, and the amount of impurities contained Is attached to the product and delivered to the user 10B. The user 10A and the user 10B may be the same user.

FIG. 2 is a diagram showing an example of a process in which the recycled quartz glass jig 22 shown in FIG. 1 is processed.
After receiving the material (step 001), the deposits and by-product film are removed (step 002). In this step, the deposits and reaction byproducts attached to the product to be recycled are removed in a clean room with a cleanliness class JIS standard 1000. The removal treatment is performed using, for example, a mixture of hydrofluoric acid and nitric acid or aqua regia when a metal is included, or using a mixture of ammonia and hydrogen peroxide in the case of an organic system, depending on the type of deposit. .

  Next, cleaning is performed using dilute hydrofluoric acid or ultrapure water (step 003). In this step, rinsing is performed by applying ultrasonic waves with pure water for the purpose of completely removing the remaining portion of the adhered portion. The cleanliness of this processing chamber is also class 1000.

  Next, inspection of dimensions, appearance, etc. is performed (step 004). In this process, the dimensions and shape of the recycled product are measured and a recycling plan is made.

  Next, reduction processing is performed (step 005). In this process, the inner wall surface of the used quartz glass material 12 (the reaction chamber is used as an example in the first embodiment) is etched in the semiconductor manufacturing process, and reaction by-products are attached, so that the quality is improved. For the purpose, the inner side is shaved (the inner surface is shaved by grinding etc.). In the subsequent process, the overlaying process is performed on the outside. However, since the inner diameter is increased only by this method, the following reduction process is performed.

Here, the processing of steps 005 to 007 will be described in detail with reference to the drawings.
FIG. 3 shows a perspective view of the quartz glass material 12 to be reduced in step 005 of FIG.

A chemical reaction for regenerating the quartz glass material 12 (reaction chamber) is performed on the inner surface 12X of the substantially dome-shaped reaction chamber. In the figure, a ring shape 12B from which the quartz glass material 12 is cut off is shown.
FIG. 4 is a diagram showing each process of the reduction process of FIG.
As shown in FIG. 4A, the dome lower portion 12A of the substantially dome-shaped quartz glass material 12 is cut into a ring shape 12B having a predetermined width, and the dome portion 12D is removed from the flange 12C as shown in FIG. Separate.

  Since the next process is a high-temperature thermal processing process, cleaning is performed in a class 1000 area (clean room) in order to prevent internal diffusion of impurities (process 006). The high-temperature heat processing is performed by using the oxyhydrogen burner 55B (see FIG. 5) in the flame processing chamber 30 (see FIG. 8) at a flame temperature equal to or higher than a predetermined temperature. Details regarding the flame processing chamber 30, the oxyhydrogen burner 50B, and the flame treatment will be described later.

  The separated portion is welded again with a quartz glass oxyhydrogen burner 50B, and the thickness is regenerated (step 007). In the reduction process, the inner diameter is reduced, and the reaction chamber is reduced by cutting the ring-shaped 12B, and the outer diameter of the reaction chamber is also reduced. Therefore, by welding quartz glass (not shown) to the outside, Thickness regeneration is performed. The thickness regeneration (building-up) is performed by welding quartz glass formed in a rod shape or plate shape to a target portion while melting the quartz glass at a flame temperature equal to or higher than a predetermined temperature by the burner. Thereby, overlaying is performed while remelting the target part. Examples of the flame temperature of the burner 55B include a temperature of about 1950 ° C. to about 2000 ° C. The quartz glass used for overlaying is usually a new quartz glass, but a recycled quartz glass may be used.

  As shown in FIG. 4C, the overlay 12E is applied to the outer surface of the dome portion 12D, the overlay 12F is also applied to the flange 12C, and the dome portion 12D is attached to the flange 12C again. By these processes, the inner diameter of the reaction chamber can be reduced.

  In subsequent steps 008 to 015, polishing (considering a reference surface having roughness adapted to the semiconductor manufacturing process), machining (considering the shape), cleaning using dilute hydrofluoric acid or ultrapure water, baking finish Then, high-temperature annealing, dimensional inspection, cleaning using dilute hydrofluoric acid or ultrapure water are performed, and the recycled quartz glass jig 22 is shipped after packing.

  Next, the heating temperature when processing the quartz glass material 12 using a quartz glass oxyhydrogen burner will be described.

FIG. 5 is a diagram showing an example of a quartz glass oxyhydrogen burner used for processing the quartz glass material 12 of FIG.
FIG. 5A shows an example of a conventional oxyhydrogen burner 50A. In this oxyhydrogen burner 50A, oxygen (O2) and hydrogen (H2) are mixed at the outlet 53 of the nozzle, and hydrogen burns.

  FIG. 5B shows an example of a quartz glass oxyhydrogen burner (oxyhydrogen burner) 50B used in the quartz glass jig / tool regeneration manufacturer 20 of FIG.

  In the oxyhydrogen burner 50 </ b> B, hydrogen 52 and oxygen 54 are mixed in advance in the mixing unit 51 that is maintained at a predetermined distance from the nozzle outlet 56 of the burner 50 </ b> B, and a flame is generated from the nozzle outlet 56.

  In FIG. 5 (a), the flame temperature is increased by increasing the flow rate of hydrogen (about 5 atm) by the Bernoulli effect to improve the mixing of oxygen and hydrogen. Inhaling air also has a cooling effect on the flame, and the flame temperature has a temperature upper limit of about 1800 ° C.

  On the other hand, in FIG. 5B, since the hydrogen 52 and oxygen 54 are mixed in the mixing unit 51 without using the Bernoulli effect, the cooling effect due to the flow rate of hydrogen (about 2 atm) is small and 1900 ° C. Thus, the flame temperature can be maintained.

  The explosion limit of hydrogen is 4% to 75% in the atmosphere, and all of the definitions apply to the definition of combustible gas, with a lower limit of 10% or less and an upper limit and lower limit range of 20% or more.

  In general, combustion of hydrogen is performed within the range of explosive concentrations, but if all react, there is no problem, and in the prior art, there is no fear of explosion after unreacted hydrogen diffuses into the atmosphere. The limit of the ratio is decided. In particular, in a system in which hydrogen is mixed with oxygen at the nozzle outlet, the safety factor is kept high, and hydrogen: oxygen = 1: 1 is often used at most.

  On the other hand, in the present embodiment, oxygen 54 and hydrogen 52 meet and are sufficiently mixed in the mixing unit 51 where a predetermined piping distance is maintained from the nozzle outlet 56, and hydrogen 52: oxygen 54 having an ideal mixing ratio. = 2 Even if it is close to 2: 1, it can be mixed so that unreacted hydrogen does not come out.

  In addition, the raw material of the nozzle exit 56 prevents mixing of the metal into a flame by using quartz glass.

  FIG. 6 is a diagram showing the impurity content in the quartz glass treated using the quartz glass oxyhydrogen burner 50B of FIG. 5 (b). The impurity content is measured by flameless atomic absorption, and the measured values are summarized in a table and a graph.

  FIG. 6A is a table and graph of the impurity content (unit PPM) when the processing of the quartz glass material 12 is performed twice (indicated by one regeneration and two regenerations in the figure). is there. 6B is a table and a graph of the impurity content (unit PPM) when the processing of the quartz glass material 12 is performed once (in the figure, indicated as a recycled product).

  The target impurities are aluminum (Al), iron (Fe), sodium (Na), potassium (K), copper (Cu), lithium (Li), and titanium (Ti), and all impurities are processed. It can be seen that the impurities contained in the processed quartz glass material 12 are reduced or equivalent to the impurities contained in the previous quartz glass material 12.

  In particular, in the case of aluminum having the largest content, in FIG. 6A, processing is performed in order of 55A before regeneration, 55B before regeneration, and 55C before regeneration, and in order of 12.60PPM, 12.10PPM, 12.00PPM. Each time it is done, the content decreases.

  In FIG. 6B, the impurity content is reduced to 12.73 PPM and 11.67 PPM corresponding to the used 57A and the recycled product 57B.

The decrease in the impurity content is presumed to be that metal impurities such as aluminum evaporated and diffused into the atmosphere by performing a high-temperature flame treatment at about 1950 ° C. or higher.
In Embodiment 1, the oxyhydrogen burner 50B is used, and the quartz glass material 12 is flame-treated at a temperature of about 1950 ° C. or higher (for example, about 1950 ° C. to about 2000 ° C.). However, the flame temperature may be 2000 ° C. or higher. This flame treatment is the same in the embodiments described below.

  Next, the flame processing chamber 30 for performing high-temperature heat processing such as overlaying will be described. FIG. 7 is an explanatory diagram showing an outline of an example of a flame processing chamber.

  As shown in FIG. 7, the flame processing chamber 30 includes an entrance / exit 31 provided in an appropriate part such as a side wall of the chamber 30, and an opening / closing door 32 such as an automatic door that opens and closes the entrance / exit 31. The ceiling 33 is provided with an exhaust hole 34 of an appropriate size.

  When the worker 39 working in the processing chamber 30 sweats, there is a possibility that sodium or a sodium compound contained in the sweat may affect the product. Therefore, the processing chamber 30 is designed with a high ceiling 33 in order to make it easy to raise the atmosphere in the chamber 30 that has become hot. The height 35 of the ceiling 33 can be set according to the size or the like of the processing chamber 30. For example, the size of the chamber 30 is about 15 m in width and about 30 m in length (vertical width). In this case, the height 35 of the ceiling 33 can be set to about 13 m. However, the height of the ceiling is given as an example, and is not limited to the height.

  A cooling device 36 is installed in an appropriate portion outside the processing chamber 30, and cool air supplied from the cooling device 36 through a filter is supplied to the lower side in the processing chamber 30 from the outlet of the feed pipe 38 through the pipe 37. Alternatively, the air pressure is introduced into the chamber 30 from a portion close to the lower side so that the indoor pressure is increased by about 0.8 to about 1.2 atm (about 800 to 1200 hps) from the outdoor pressure. In the embodiment, cold air is introduced near the worker 39 in the processing chamber 30.

  By raising the ceiling of the processing chamber 30 and introducing cold air into the chamber 30 as described above, the widths of the high-temperature portion 40 and the low-temperature portion 41 are increased, and the temperature becomes high as shown by the arrow 42 in FIG. The air in the chamber 30 is raised in a substantially vertical direction and is naturally exhausted from the exhaust hole 34. Therefore, the work environment of the worker 39 can be lowered and sweating can be suppressed.

  In addition, the entrance 31 of the processing chamber 30 is partitioned by an air curtain 43 inside and outside the chamber 30. In the embodiment, the cool air supplied from the cooling device 36 through the filter is used, and the cool air is supplied from the supply unit 45 of the ceiling 33 to the inlet / outlet 31 via the pipe 44, and the cool air is used as the air. The curtain 43 is configured to be formed. In this manner, the entrance / exit 31 is partitioned by the air curtain 43 and the inside and outside of the processing chamber 30 are made higher than the outdoor pressure by the cold air introduced from the supply pipe 38. It is formed in an environment that prevents entry of dust and the like from the outside during opening and closing. Since the processing chamber 30 has an increased atmospheric pressure, it is possible to prevent intrusion of dust and the like from the outside when the door 32 is opened and closed even when the air curtain 43 is not provided at the entrance 31. By forming the film, it is possible to perform a dust intrusion preventing function more satisfactorily. In this case, a plurality of cooling devices 36 may be installed, and the cooling air may be separately supplied to the room and the air curtain side.

  Next, another embodiment will be described in which the quartz glass material 12 is processed by using the quartz glass oxyhydrogen burner 50B of FIG. 5 to produce the recycled quartz glass jig 22. In the embodiment described below, the thermal processing using the burner 50B is performed in the flame processing chamber 30 as in the first embodiment.

FIG. 8 is an explanatory view showing another embodiment (Embodiment 2) of the method for regenerating a quartz glass jig tool of the present invention.
FIG. 8A shows the quartz glass using part 72 in the semiconductor manufacturing apparatus 70. FIG. 8B is a diagram showing details of the quartz glass using portion 72 in FIG. The side on which the wafer 76 on the quartz glass ring 74 holding the wafer 76 is etched by reactive ions is the reaction surface side 74A of the quartz glass ring 74, and the opposite surface side is the opposite surface side 74B.

  In the quartz glass ring 74, impurities are accumulated on the reaction surface side 74A when the semiconductor manufacturing process is repeatedly performed. Therefore, the removal of the impurities is repeated by grinding or the like on the reaction surface side 74A, and the quartz glass ring 74 has a thickness that cannot be ground. As a consumable quartz glass jig 12, a quartz glass material 12 for reprocessing is obtained.

FIG. 9 is a diagram showing details of the quartz glass ring 74 of FIG.
9A shows the reaction surface side 74A and the opposite surface side 74B described with reference to FIG.

  In the semiconductor manufacturing process, grinding of the reaction surface side 74 </ b> A in FIG. 9B is repeated to form a consumable quartz glass jig 12.

  In the second embodiment, as shown in FIG. 9C, the quartz glass overlay 74C is applied to the opposite surface 74B of the quartz glass ring 74.

  Thereafter, the reaction surface side 74A of the quartz glass ring 74 is ground to adjust the thickness 74D. In FIG. 8A, 71 is a magnetron, 73 is a waveguide, 75 is a solenoid coil, 77 is an electric field, and 78 is an etching gas.

  FIG. 10 is an explanatory view showing still another embodiment (Embodiment 3) of the method for regenerating a quartz glass jig tool of the present invention.

  A part made of quartz glass has a window for observing the reaction chamber and analyzing the reaction. Compared to other jigs and tools, the surface on the reaction chamber side is less likely to be etched, so that the regenerated thickness (building up) may be small.

  In the case of a rectangular relatively small plate-like quartz glass material 12 as shown in FIG. 10 (a), the adhering reaction by-products are removed, washed with dilute hydrofluoric acid, and dried. The reaction chamber side surface 82 in the side view shown in (b) is ground to remove the contaminated layer. In the figure, the opposite surface is the outer surface 81.

  Next, after washing with dilute hydrofluoric acid and drying, quartz glass 83 is deposited on the outer surface 81 shown in FIG. As in the first embodiment, the oxyhydrogen burner used at this time is a flame 84 having a temperature of about 1950 ° C., which is about 100 ° C. higher than the flame temperature (about 1850 ° C.) of the conventional burner. As a result, as shown in the impurity content measurement data in FIG. 6, the impurity content of the recycled product is smaller than that of the consumable quartz glass jig 12.

  Next, as shown in FIG. 10 (d), the reaction chamber side surface 82 is ground so as to have a predetermined thickness, the outer surface 81 and the reaction chamber side surface 82 are polished on both sides, and strain relief annealing is performed. It is performed at the highest temperature used in the MOS device manufacturing process, and is completed by inspection, cleaning, drying, and packing in a clean room.

  In the case of the third embodiment, in the environment in which the tool is used in the semiconductor manufacturing process, the decrease due to etching is small, so that the portion regenerated by the build-up 83 is very emergency until it is exposed to the reaction chamber side surface 82 by grinding or polishing. A long period of time is required. Therefore, the surface of the reaction chamber after the regeneration is overlaid 83, that is, the outer surface 81 in FIG. 10D is attached to the semiconductor manufacturing apparatus so as to be on the reaction chamber side. The surface with less impurities) can face the reaction chamber side. Thus, it goes without saying that a sufficient effect can be obtained without attaching the jig in the opposite direction.

  FIG. 11 is an explanatory view showing still another embodiment (Embodiment 4) of the method for regenerating a quartz glass jig tool of the present invention.

  FIG. 11A shows the case where the quartz glass material 12 is a tube 90. Conventionally, when the thickness 91 of the tube 90 is reduced, the tube 90 is discarded, but in the fourth embodiment, it is used as the quartz glass material 12.

  As shown in (b) of FIG. 11, while the tube 90 is remelted, the meat tube is moved so that the thickness of the reaction tube (tube) is recovered, and the meat tube 90A is created.

  Next, as shown in (c) of FIG. 11, another meat sieving tube 90B adapted to the meat sieving tube 90A is melt-connected 92.

  Then, as shown in FIG. 11 (d), the melted and connected meat stuffing tube 90A and the meat stuffing tube 90B are cut into a predetermined length (size) and finished.

  (E) of FIG. 11 shows an example of equipment used when executing the processes of (a) to (d) of FIG.

  FIG. 12 is an explanatory view showing still another embodiment (Embodiment 5) of the method for regenerating a quartz glass jig tool of the present invention.

  As shown in FIGS. 12A and 12B, the quartz glass material 12 of the fifth embodiment has a thin bottom made up of a ring-shaped outer peripheral portion 61 and a plate-like portion 63 having a circular hole 62 in the central portion. It is formed in a dish shape. And as shown to (a) and (b) of the figure, the peripheral part and outer surface of the circular hole 62 of the plate-shaped part 63 are etched, and it is the etching part 64. As shown in FIG.

  In the fifth embodiment, the plate-like portion 63 is cut off from the outer peripheral portion 61 as shown in FIGS. Further, as shown in FIGS. 12C and 12F, a plate-like portion (new quartz glass part) 63A corresponding to the plate-like portion 63 is created. Then, while remelting the outer peripheral portion 61, the produced quartz glass part 63A is welded 65 to the outer peripheral portion 61 and regenerated as shown in FIGS. 12 (g) and (h).

  FIG. 13 is an explanatory view showing still another embodiment (Embodiment 6) of the method for regenerating a quartz glass jig tool of the present invention.

  The sixth embodiment shows a case where the quartz glass material 12 is a consumable quartz glass jig 98 having a substantially dome shape, similar to the quartz glass material 12 of the first embodiment. In the sixth embodiment, as shown in FIG. 13, an arbitrary number of slits 98B are provided in the dome portion 98A in the vertical direction (vertical direction in FIG. 13) in order to reduce the inner diameter of the dome portion 98A. And the formation part of the said slit 98B is welded again, remelting the dome part 98A. As a result, the inner diameter of the dome portion 98A is reduced. Thereafter, as in the first embodiment, grinding and overlaying are processed and reproduced.

  Although not shown in the drawings, the method for regenerating a quartz glass jig tool of the present invention is a method of correcting the shape of a quartz boat, which is a heat-treated quartz glass material 12, during the heat treatment using a quartz glass straightening jig. It can also be applied to.

  Further, in each process including the processing process and the cleaning process in each of the above-described embodiments, the processing chamber or the processing chamber is separated for each work process, and independent air conditioning is performed so as not to mix the atmosphere. It is preferable to do.

  According to the method for regenerating a quartz glass jig according to each embodiment described above, the following effects can be obtained.

  The quartz glass jig / tool refurbishing maker 20 uses a consumable quartz glass jig / tool 12 or the like normally discarded by the user 10A of the semiconductor manufacturing industry as a raw material to remelt a part of the quartz glass by high-temperature flame treatment to produce impurities. And can be reused as a product of the regenerated quartz glass jig 22. By performing a high-temperature flame treatment at about 1950 ° C., the quality of high-quality quartz glass with a small impurity content can be maintained without increasing the content of impurities.

  It is possible to prevent the worker working in the flame processing chamber from sweating. Further, by performing a high-temperature flame treatment, it is possible to easily process quartz glass having a high viscosity even during a high-temperature treatment, thereby improving workability. As a result, the regenerated quartz glass jig 22 can be regenerated even by an operator with a low level of skill.

  Instead of melting all the quartz glass, which is the material of the consumable quartz glass jig 12 as waste, and newly producing another quartz glass jig, the majority of the shape of the quartz glass is used as it is. The regenerated quartz glass jig 22 can be regenerated only by remelting the part, and the manufacturing cost (regeneration cost) including the energy cost can be kept low.

  In addition, embodiment mentioned above was disclosed as an example, This invention is not limited to it, It can apply to the reproduction | regenerating method of a quartz glass jig tool suitable for applying this invention.

  In addition, the number, position, shape, and the like of the constituent members are not limited to the above-described embodiment, and can be set to a suitable number, position, shape, and the like in practicing the present invention.

  In each figure, the same numerals are given to the same component.

It is a figure which shows the flow of the schematic process of one Embodiment of the reproduction | regenerating method of the quartz glass jig tool of this invention. It is a figure which shows an example of the process by which the recycled quartz glass jig tool of FIG. 1 is processed. FIG. 3 shows a perspective view of a quartz glass material to be reduced in step 005 of FIG. 2. It is explanatory drawing which shows the processing process of the quartz glass material of FIG. 3, Comprising: (a) of the figure is a figure which shows the process of cutting out the dome lower part of quartz glass material, (b) of the figure is a dome part from a flange. The figure which shows the state which cut | disconnected, (c) of the figure is a figure which shows the process of building up. It is a figure which shows an oxyhydrogen burner, Comprising: (a) of the figure is explanatory drawing which shows an example of the conventional oxyhydrogen burner, (b) of the figure is oxyhydrogen utilized for the process of the quartz glass material of this invention It is explanatory drawing which shows an example of a burner. It is a figure which shows the impurity content in the quartz glass processed using the oxyhydrogen burner of FIG.5 (b), Comprising: (a) of the figure is a table | surface of the impurity content at the time of processing twice. (B) of the same figure is the table | surface and graph of impurity content at the time of processing once. It is explanatory drawing which shows an example of a flame processing chamber. It is explanatory drawing which shows other embodiment of the reproduction | regeneration method of the quartz glass jig tool of this invention, Comprising: (a) of the figure is explanatory drawing which shows the quartz glass use part in a semiconductor manufacturing apparatus, (b) of the figure () Is explanatory drawing which shows the detail of the quartz glass use part in (a) of the figure. It is explanatory drawing which shows the processing process of the quartz glass ring shown to (b) of FIG. 8, Comprising: (a) of the figure is a perspective view of a quartz glass ring, (b) of the figure is a side view, FIG. (C) is explanatory drawing which shows the process of overlaying quartz glass on a glass ring same as the above, (d) of the figure is explanatory drawing which shows the process of grinding a glass ring same as the above. It is explanatory drawing which shows other embodiment of the reproduction | regenerating method of the quartz glass jig tool of this invention, Comprising: (a) of the figure is a perspective view of quartz glass material, (b) of the figure is also a side view (C) of the figure is explanatory drawing which shows the process of building up quartz glass, (d) of the figure is explanatory drawing which shows the process of grinding. It is explanatory drawing which shows other embodiment of the reproduction | regeneration method of the quartz glass jig tool of this invention, Comprising: (a) of the figure is a perspective view of quartz glass material, (b) of the figure is a meat gathering process (C) of the same figure is explanatory drawing which shows the process of melt-connecting the meat collusion tube, (d) of the figure is a perspective view which shows the state which connected the collusion tube, (e) of the figure. These are figures which show an example of the apparatus utilized when performing each process of (a) thru | or (d) of the figure. It is explanatory drawing which shows other embodiment of the reproduction | regenerating method of the quartz glass jig tool of this invention, Comprising: (a) of the figure is a top view of quartz glass material, (b) of the figure is the same figure (A) AA line end view, (c) is a diagram showing a step of cutting the etched plate-like portion, (d) is a BB line end surface of (c) of the same figure The figure, (e) of the figure is a plan view showing a new plate-like part (quartz glass material part), (f) of the figure is an end view taken along the line CC of FIG. (E), and (g) of the figure. Fig. 4 is a plan view showing a recycled quartz glass jig regenerated by welding the quartz glass part to the outer peripheral part, and Fig. 11 (h) is an end view taken along the line D-D of Fig. (G). It is explanatory drawing which shows the processing of the quartz glass material of other embodiment of the reproduction | regenerating method of the quartz glass jig tool of this invention. It is a figure which shows the general | schematic flow by which the conventional quartz glass jig tool is processed. It is a figure which shows an example of the impurity content processed at the flame temperature of a prior art.

10A User 10B User 12 Consumable quartz glass jig (quartz glass material)
22 Recycled quartz glass jig 24 Quality data 30 Flame processing chamber 50B Oxyhydrogen burner

Claims (6)

A method for regenerating a quartz glass jig used in a semiconductor manufacturing process ,
A material receiving process for receiving quartz glass material;
Deposits for removing reaction by- products, by-product film removal step;
A cleaning process using dilute hydrofluoric acid or ultrapure water ;
An inspection process for inspecting the dimensions and appearance of the quartz glass material;
A processing step of processing the quartz glass material to produce a regenerated quartz glass jig tool,
The quartz glass material in the material receiving step is a consumable quartz glass jig that is disposed of after use in a semiconductor manufacturing factory,
The processing in the processing step is a flame processing step for removing impurities by remelting the quartz glass at a flame temperature equal to or higher than a predetermined temperature in a flame processing chamber in which cold air is introduced using a cooling device to increase the indoor pressure. Including
In the flame treatment process, the quartz glass material having a substantially plate shape or a substantially dome shape is subjected to etching in the semiconductor manufacturing process, or overlaying to compensate for a thickness reduction due to grinding for removal of reaction byproducts, A method for reclaiming a quartz glass jig, comprising a step of regenerating a thickness on a surface opposite to a surface having a reduced thickness . Said processing step, the quartz glass material of the substantially plate-shaped and substantially dome-shaped, said characterized in that it comprises a polishing step of polishing the reference surface having a semiconductor manufacturing process crude adapted to it is, in claim 1 The reproduction | regenerating method of the quartz glass jigs described. A method for regenerating a quartz glass jig used in a semiconductor manufacturing process ,
A material receiving process for receiving quartz glass material;
Deposits for removing reaction by- products, by-product film removal step;
A cleaning process using dilute hydrofluoric acid or ultrapure water ;
An inspection process for inspecting the dimensions and appearance of the quartz glass material;
A processing step of processing the quartz glass material to produce a regenerated quartz glass jig tool,
The quartz glass material in the material receiving step is a consumable quartz glass jig that is disposed of after use in a semiconductor manufacturing factory,
The processing in the processing step is a flame processing step for removing impurities by remelting the quartz glass at a flame temperature equal to or higher than a predetermined temperature in a flame processing chamber in which cold air is introduced using a cooling device to increase the indoor pressure. Including
In the flame treatment step, the substantially glass-shaped quartz glass material is re-melted, and the meat glass is prepared so as to recover the thickness of the quartz glass material, and another meat is prepared on the meat-soy tube. A method for reclaiming a quartz glass jig tool, comprising: a step of melting and connecting a stop tube, and cutting the melted and connected meat stop tube into a predetermined length . The flame treatment process includes:
Using an oxyhydrogen burner whose nozzle outlet is made of quartz glass, performing a flame treatment performed at a high temperature of 1950 ° C. or higher;
Characterized by a step of mixing at the oxygen and hydrogen to generate a high temperature flame emitted from the nozzle outlet, wherein the predetermined pipeline distance from the nozzle exit is maintained mixing unit, according to claim 1 Or a method for regenerating a quartz glass jig / tool according to 3 . The flame processing chamber includes an opening / closing door that opens and closes an entrance and an exhaust hole in a ceiling,
Cooling air is introduced into the room from the lower side or near the lower side of the room by the cooling device so that the room air pressure is raised by 0.8 to 1.2 atmospheres from the outdoor pressure, and dust or the like from outside when the door is opened or closed In an environment that prevents intrusion of the air, the indoor air that has become hot is raised in a substantially vertical direction using the exhaust holes, and is naturally exhausted from the holes, thereby preventing sweating of the worker. The method for regenerating a quartz glass jig / tool according to claim 1 or 3 , characterized in that it is configured as described above. Wherein the entrance opening of the processing chamber is characterized in that it is a partition of the chamber outside the air curtain, according to claim 1 or 3 or 5 method of reproducing quartz glass jigs and tools described.

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