JP4312031B2 - Metal base circuit board and semiconductor device manufacturing method using the same - Google Patents

Metal base circuit board and semiconductor device manufacturing method using the same Download PDF

Info

Publication number
JP4312031B2
JP4312031B2 JP2003377198A JP2003377198A JP4312031B2 JP 4312031 B2 JP4312031 B2 JP 4312031B2 JP 2003377198 A JP2003377198 A JP 2003377198A JP 2003377198 A JP2003377198 A JP 2003377198A JP 4312031 B2 JP4312031 B2 JP 4312031B2
Authority
JP
Japan
Prior art keywords
lead frame
circuit board
metal base
base circuit
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003377198A
Other languages
Japanese (ja)
Other versions
JP2005142356A (en
Inventor
裕 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP2003377198A priority Critical patent/JP4312031B2/en
Publication of JP2005142356A publication Critical patent/JP2005142356A/en
Application granted granted Critical
Publication of JP4312031B2 publication Critical patent/JP4312031B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Description

本発明は、電気機器、通信機、自動車等に用いられる半導体装置の製造方法に関するもので、ことに当該半導体装置が金属ベース回路基板上に半導体素子を搭載しているリードフレームと前記半導体素子を封止している樹脂とを搭載してなる半導体装置であり、更に、それに用いる特定構造を有する金属ベース回路基板に関する。 The present invention relates to a method of manufacturing a semiconductor device used in electrical equipment, a communication device, an automobile, and the like. In particular, the semiconductor device includes a lead frame in which a semiconductor element is mounted on a metal base circuit board, and the semiconductor element. The present invention relates to a metal base circuit board having a specific structure for use in a semiconductor device having a sealed resin mounted thereon.

電気機器、通信機、自動車等の幅広い分野で半導体素子を搭載した半導体装置が知られているが、特に、大電流を流す半導体素子を使用するものについては、当該半導体装置において半導体素子や回路などから発生する熱を放散するために金属ベース回路基板が使用されることも公知である。 Semiconductor devices equipped with semiconductor elements are known in a wide range of fields such as electrical equipment, communication equipment, automobiles, etc., especially those using semiconductor elements that flow a large current, such as semiconductor elements and circuits in the semiconductor devices It is also known that metal-based circuit boards are used to dissipate the heat generated from the.

そして、半導体素子の過渡熱を吸収緩衝しながら、金属ベース回路基板に熱伝達するために、金属ベース回路基板の回路上にリードフレームを半田付けし、前記リードフーレム上に更に半導体素子を半田付けし、実装することも公知である(特許文献1参照)。
特開2002−314004。
Then, in order to transfer heat to the metal base circuit board while absorbing and buffering transient heat of the semiconductor element, a lead frame is soldered on the circuit of the metal base circuit board, and further a semiconductor element is soldered on the lead frame. It is also known to mount (see Patent Document 1).
JP 2002-314004.

前記構造において、半導体素子等の電子部品は、予めリードフレーム上に積載されているか、または後工程で実装される。また、リードフレームは外部との接続をする端子の一部として使用されるので、リードフレームを金属ベース回路基板の回路上に半田付けする際には、相互の位置が規定どおり維持されていることが非常に重要である。 In the structure described above, electronic components such as semiconductor elements are pre-loaded on the lead frame or mounted in a later process. In addition, since the lead frame is used as a part of the terminal that connects to the outside, when the lead frame is soldered on the circuit of the metal base circuit board, the mutual position is maintained as prescribed. Is very important.

しかしながら、従来の公知技術においては、金属ベース回路基板の回路上にペースト状の半田クリームを印刷し、その上にリードフレームを載せ、半田クリームの自己粘着力で仮止めすることで位置固定し、加熱炉で半田を熔融接合していたために、リードフレームが金属ベース回路基板の回路上の所定位置からズレ易く、後工程での電子部品実装が難かしかったり、リードフレームを外部端子とする際に他機器との接続不良の原因となる等の問題がある。 However, in the conventional known technology, a paste-like solder cream is printed on a circuit of a metal base circuit board, a lead frame is placed thereon, and the position is fixed by temporarily fixing with the self-adhesive force of the solder cream, Since the solder was melt-bonded in the heating furnace, the lead frame was easily displaced from a predetermined position on the circuit of the metal base circuit board, and it was difficult to mount electronic components in the later process. There are problems such as causing connection failure with other devices.

そこで、金属ベース回路基板の金属板と、リードフレームとの接合位置合わせに関して、予め金属ベース回路基板の裏面からプレス金型で金属板の厚さの半分の深さまで打ち抜くことで、金属板表面又は裏面に突起物を形成し、リードフレームの位置合わせ用の穴をこの突起物に嵌合する方法が検討されている。しかしながら、突起物を金属板の表面又は裏面に設けることは、金属ベース回路基板の有効面積を減少させたり、半田ペーストを印刷塗布する際に物理的な支障となる等の問題がある。 Therefore, regarding the bonding position alignment between the metal plate of the metal base circuit board and the lead frame, the surface of the metal plate or the surface of the metal base circuit board or by punching in advance from the back surface of the metal base circuit board to a half depth of the metal plate with a press die. A method has been studied in which a protrusion is formed on the back surface and a lead frame alignment hole is fitted to the protrusion. However, providing the protrusions on the front or back surface of the metal plate has problems such as reducing the effective area of the metal base circuit board or causing a physical hindrance when printing and applying the solder paste.

本発明は、上記の事情に鑑みてなされたものであり、その目的は、金属ベース回路基板にリードフレームを搭載し半田接合する際に、簡単に所定の位置に正確に載置することができ、しかも加熱炉での熔融、固化工程においても位置ズレする事が無く、高信頼性の接合が可能であり、その結果、高信頼性の半導体装置を能率良く実装することができる半導体素子の製造方法を提供することであり、そのための金属ベース回路基板を提供することである。 The present invention has been made in view of the above circumstances, and its purpose is to be able to easily and accurately place a lead frame on a metal base circuit board at a predetermined position when soldering. In addition, there is no misalignment in the melting and solidification process in the heating furnace, and highly reliable joining is possible. As a result, the manufacture of a semiconductor element capable of efficiently mounting a highly reliable semiconductor device. It is to provide a method and to provide a metal-based circuit board therefor.

即ち、本発明は、金属ベース回路基板上に、半導体素子を搭載し嵌合用の端子部を有しているリードフレームと前記半導体素子を封止している樹脂とを搭載して半導体装置を製造する方法であって、前記金属ベース回路基板のリードフレーム搭載側と反対側の主面の周縁部に前記リードフレームとの嵌合するための段差を設け、しかも前記嵌合段差の深さが前記リードフレーム厚さより0.01〜0.5mm深く、前記嵌合段差の幅は前記リードフレームの幅より0.05〜0.1mm大きく形成されている金属ベース回路基板を用いることを特徴とする半導体装置の製造方法である。 That is, according to the present invention, a semiconductor device is manufactured by mounting a lead frame on which a semiconductor element is mounted and having a fitting terminal portion and a resin sealing the semiconductor element on a metal base circuit board. A step for fitting with the lead frame is provided at a peripheral portion of the main surface opposite to the lead frame mounting side of the metal base circuit board, and the depth of the fitting step is A semiconductor using a metal base circuit board formed 0.01 to 0.5 mm deeper than the lead frame thickness and having a width of the fitting step 0.05 to 0.1 mm larger than the width of the lead frame. It is a manufacturing method of an apparatus.

本発明の金属ベース回路基板は、それを構成している金属板の回路を設けていない側の主面の周縁部にリードフレームとの嵌合段差を設けている特徴を有しているので、リードフレームを当該金属ベース回路基板に搭載するに際して、リードフレームの一部と嵌合して、寸法のばらつき無く一体化される特徴を有しているし、更に、生産性高く一体化できる特徴をも有している。 Since the metal base circuit board of the present invention has a feature in which a fitting step with a lead frame is provided on the peripheral portion of the main surface on the side where the circuit of the metal plate constituting the metal plate is not provided, When mounting the lead frame on the metal base circuit board, it has the feature that it fits with a part of the lead frame and is integrated without variation in dimensions, and it can be integrated with high productivity. Also have.

本発明の半導体装置の製造方法は、前記特定構造の金属ベース回路基板を用いているので、容易に、生産性高く、高精度に組み立てられた半導体装置を得ることができ、従って、安価で高信頼性の半導体装置を提供できる特徴がある。 Since the semiconductor device manufacturing method of the present invention uses the metal base circuit board having the specific structure, a semiconductor device assembled with high productivity and high accuracy can be easily obtained. There is a feature that a reliable semiconductor device can be provided.

以下、図に基づいて、本発明を詳説する。 Hereinafter, the present invention will be described in detail with reference to the drawings.

図1は、本発明の金属ベース回路基板とそれを用いてなる半導体装置の製造方法の一例を示す図である。 FIG. 1 is a diagram showing an example of a metal base circuit board according to the present invention and a method for manufacturing a semiconductor device using the same.

図1(a)は、発明の金属ベース回路基板の一例を示す図で、金属板1の回路3が設けられていない面の平面図と、その中にA−A’で示した部分の断面図とを示している。金属板1の回路3が設けられていない主面の周縁部には、リードフレームを搭載するときに位置を定めるための嵌合段差4が設けられている。当該嵌合段差は、金属ベース回路基板が長辺部と短辺部とを夫々1組を有する形状であり、しかも前記嵌合段差が当該金属板の少なくとも相対する長辺部に設けられているとき、本発明の効果が容易に達成できるので、特に好ましい。なお、前記回路3は、無機質フィラーを含有した樹脂からなる絶縁層2により金属板1とは電気絶縁されている。 FIG. 1A is a diagram showing an example of a metal base circuit board according to the present invention, a plan view of a surface of a metal plate 1 where a circuit 3 is not provided, and a cross section of a portion indicated by AA ′ therein FIG. A fitting step 4 for determining the position when the lead frame is mounted is provided on the peripheral portion of the main surface of the metal plate 1 where the circuit 3 is not provided. The fitting step has a shape in which the metal base circuit board has one set each of a long side portion and a short side portion, and the fitting step is provided at least on the long side portion facing the metal plate. In particular, the effect of the present invention can be easily achieved, which is particularly preferable. The circuit 3 is electrically insulated from the metal plate 1 by an insulating layer 2 made of a resin containing an inorganic filler.

図1(b)は、回路3に半田ペースト5を塗布した後に、リードフレーム6を載置したときの断面図と、回路が搭載されていない側から見たときの、平面図である。リードフレーム6の一部に予め作製された金属板との嵌合用の端子部7が、金属板1の回路を設けていない側の主面の周縁部に設けられた前記嵌合段差4に組み合わされ、リードフレームと金属ベース回路基板とが位置合わせされている。 FIG. 1B is a cross-sectional view when the lead frame 6 is placed after the solder paste 5 is applied to the circuit 3 and a plan view when viewed from the side where the circuit is not mounted. A terminal portion 7 for fitting with a metal plate prepared in advance on a part of the lead frame 6 is combined with the fitting step 4 provided on the peripheral portion of the main surface on the side where the circuit of the metal plate 1 is not provided. The lead frame and the metal base circuit board are aligned.

そして、図1(b)のものは、加熱炉で半田を熔融し、両者を接続した後、更に電子部品等を樹脂封止して樹脂封止型半導体装置を得ることができる。当該半導体装置は、前記特徴のある金属ベース回路基板を用いているので、加熱炉で半田を熔融し、両者を接続した場合に従来公知技術に比べ格段に寸法精度が向上しており、その結果、信頼性のある半導体装置が得られる。 In the case of FIG. 1B, after melting solder in a heating furnace and connecting the two, an electronic component or the like is further resin-sealed to obtain a resin-sealed semiconductor device. Since the semiconductor device uses the metal base circuit board having the characteristics described above, when the solder is melted in a heating furnace and both are connected, the dimensional accuracy is remarkably improved as compared with the conventionally known technology. A reliable semiconductor device can be obtained.

本発明に用いる金属ベース回路基板は、リードフレームとの嵌合段差が設けられているものであるならば、どのようなものであっても構わず、その作成方法も従来公知の方法のもので構わない。例えば、予め一主面の周縁部に段差を設けた金属板の前記一主面とは反対の主面上に、無機質フィラーを含有する硬化性樹脂からなる絶縁接着剤を塗布し、前記樹脂が十分に硬化する前に前記絶縁接着剤上に金属箔を積層し、前記樹脂を十分に硬化した後、前記金属箔をエッチング等により加工して回路を形成するという方法が知られている。 The metal base circuit board used in the present invention may be any one as long as it is provided with a step difference with the lead frame, and its production method is also a conventionally known method. I do not care. For example, an insulating adhesive made of a curable resin containing an inorganic filler is applied to a main surface opposite to the one main surface of a metal plate provided with a step at a peripheral portion of one main surface in advance, and the resin is A method is known in which a metal foil is laminated on the insulating adhesive before being sufficiently cured, the resin is sufficiently cured, and then the metal foil is processed by etching or the like to form a circuit.

本発明においては、金属板に設ける嵌合段差の深さに関して、これを定めるべき格別の技術的理由は無いものと予想されたが、本発明者の検討結果に拠れば、リードフレームの厚さとの兼ね合いより選定され、0.35〜2.1mmが好ましく選択される。 In the present invention, with respect to the depth of the fitting step provided on the metal plate, it was expected that there was no particular technical reason to determine this, but according to the results of the study by the present inventors, the thickness of the lead frame And is preferably selected from 0.35 to 2.1 mm.

この理由に関して本発明者は次のように考えている。即ち、リードフレームの厚さは、一般に0.3〜1.5mmが用いられ、嵌合段差に嵌め込んだ際に、金属板の裏面表面より凸状態とならないことが重要である。本発明の金属ベース回路基板を用いた半導体装置は、一般に樹脂封止型半導体装置なので、放熱フィンに取付けられ、封止された電子部品からの発熱をリードフレーム、絶縁層、金属板を介して放熱フィンに効率良く放熱される必要がある。この為には、金属板裏面と放熱フィンが隙間無く密着される必要があり、従って、嵌合段差の深さは、リードフレームの厚さより僅かでも深くして置くことが重要となり、リードフレーム厚さより0.01〜0.5mm深いことが好ましく、前記数値範囲が好ましく選択される。 The inventor considers the reason as follows. That is, the thickness of the lead frame is generally 0.3 to 1.5 mm, and it is important that the lead frame does not protrude from the back surface of the metal plate when fitted into the fitting step. Since a semiconductor device using a metal base circuit board of the present invention is generally a resin-encapsulated semiconductor device, heat generated from a sealed electronic component attached to a heat radiating fin is transmitted through a lead frame, an insulating layer, and a metal plate. It is necessary to efficiently radiate heat to the radiating fins. For this purpose, the back surface of the metal plate and the radiating fins need to be in close contact with each other. Therefore, it is important that the depth of the fitting step is set slightly deeper than the thickness of the lead frame. It is preferable that the depth is 0.01 to 0.5 mm deeper than that, and the numerical range is preferably selected.

また、本発明の金属ベース回路基板において、嵌合段差の幅はリードフレームを実装するに際し、導電回路との位置ズレを防止し、高位置精度を得る上で重要である。リードフレームを半田ペーストの上に載置し、加熱炉で半田を熔融した場合、リードフレームは振動や水平方向の傾きによってズレてしまう恐れがある。従って、嵌合段差の幅とリードフレームの幅の差はできるだけ小さいことが好ましい。しかしながら、実装する際には両者の差が大きいほど作業性に優れることから、両者のバランスを見て、リードフレームや嵌合段差の幅が選定される。一般的に嵌合段差の幅はリードフレームの幅より0.05〜0.1mm大きく形成すればよい。また、リードフレームの嵌合段差と接合される金属板との嵌合用の端子部の幅は適度な強度が必要であり、あまりにも大きくてはリードフレームにおける有効な空間部分が不足してしまうことから、通常1mm〜5mmが好ましく選択される。 Further, in the metal base circuit board of the present invention, the width of the fitting step is important in preventing the positional deviation from the conductive circuit and obtaining high positional accuracy when the lead frame is mounted. When the lead frame is placed on the solder paste and the solder is melted in a heating furnace, the lead frame may be displaced due to vibration or horizontal inclination. Therefore, the difference between the width of the fitting step and the width of the lead frame is preferably as small as possible. However, when mounting, the greater the difference between the two, the better the workability. Therefore, the width of the lead frame and the fitting step is selected in view of the balance between the two. In general, the width of the fitting step may be 0.05 to 0.1 mm larger than the width of the lead frame. Also, the width of the terminal portion for fitting between the fitting step of the lead frame and the metal plate to be joined needs to have an appropriate strength, and if it is too large, the effective space in the lead frame will be insufficient. Therefore, usually 1 mm to 5 mm is preferably selected.

本発明の金属ベース回路基板において、嵌合段差の形成手段については、前記した通りに、特に拘る必要がないが、プレス成形やエンドミル切削による方法が採用される。プレス成形は、嵌合段差に相当するパンチを装備したプレス金型で金属板の裏面の嵌合段差部分を裏面から所定の深さまでプレス機で加圧することにより嵌合段差が容易に能率よく、均一な精度で得られ、プレス金型の初期投資は必要であるが、数量の多い量産加工に適する。エンドミル切削法においては、金属板の裏面をエンドミルを回転切削により容易に得られ、プレス金型を必要としないので、少量の試作加工に適する。 In the metal base circuit board of the present invention, the means for forming the fitting step need not be particularly concerned as described above, but a method by press molding or end mill cutting is adopted. Press molding is a press mold equipped with a punch corresponding to the fitting step, and the fitting step on the back side of the metal plate is pressed from the back side to a predetermined depth with a press to make the fitting step easy and efficient. It can be obtained with uniform accuracy, and it requires initial investment for a press die, but it is suitable for mass production processing with a large quantity. In the end mill cutting method, the back surface of the metal plate can be easily obtained by rotating the end mill, and a press die is not required.

本発明において、金属板1は、アルミニウム、鉄、銅等或いはこれらの合金、複合材のいずれでも構わないが、熱放散性が良く、安価で、軽量であること、プレス成形で嵌合段差が形成しやすい。また、板厚については通常1.0〜5.0mmである。 In the present invention, the metal plate 1 may be aluminum, iron, copper or the like, or any of these alloys and composite materials, but has good heat dissipation, is inexpensive and lightweight, and has a fitting step due to press molding. Easy to form. The plate thickness is usually 1.0 to 5.0 mm.

本発明において、絶縁層2としては、絶縁性を有していて、熱硬化性樹脂であればいずれも採用でき、これらの樹脂として、例えばエポキシ樹脂、フェノール樹脂、不飽和ポリエステル樹脂、ポリイミド樹脂等の樹脂が挙げられる。このうち、エポキシ樹脂は金属板1、並びに導電回路3との接着性に優れることから好ましく選択される。また、樹脂は、樹脂単独で用いる他、ガラス布、粉末状或いは繊維状のいろいろな無機質フイラーを充填したもの、或いは、これらを組み合わせた形態で用いることもできる。尚樹脂には本発明の目的、効果を阻害しない限りにおいて添加剤、例えば顔料、潤滑材等を適宜添加することができる。 In the present invention, the insulating layer 2 has insulating properties, and any thermosetting resin can be adopted. Examples of these resins include epoxy resins, phenol resins, unsaturated polyester resins, polyimide resins, and the like. These resins are mentioned. Among these, the epoxy resin is preferably selected because it is excellent in adhesiveness with the metal plate 1 and the conductive circuit 3. In addition to using the resin alone, the resin can be used in the form of glass cloth, powder or fiber filled with various inorganic fillers, or a combination thereof. It should be noted that additives such as pigments, lubricants and the like can be appropriately added to the resin as long as the objects and effects of the present invention are not impaired.

前記無機質フィラーに関しては、酸化アルミニウム、酸化珪素、窒化アルミニウム、窒化珪素、窒化硼素等の高い電気絶縁性を有し、しかも熱伝導率の高いものが好ましい。これらの無機質フィラーに関して、前記絶縁層にエポキシ樹脂を選択する場合、高充填でき、その結果、高い熱放散性と高い耐電圧特性を有し、しかも金属板やリードフレームとの密着性に優れる絶縁層を、安価に得られることから、酸化アルミニウム及び窒化アルミニウムが好ましく選択される。 As the inorganic filler, those having high electrical insulation properties and high thermal conductivity such as aluminum oxide, silicon oxide, aluminum nitride, silicon nitride, boron nitride and the like are preferable. With respect to these inorganic fillers, when an epoxy resin is selected for the insulating layer, the insulating layer can be highly filled. Aluminum oxide and aluminum nitride are preferably selected because the layer can be obtained inexpensively.

また、回路3には銅箔を貼りエッチングによりパターンを形成したもの、更にはNiめっき、あるいはAuめっきを施したいずれも採用できる。 Further, the circuit 3 may be formed by attaching a copper foil and forming a pattern by etching, and further applying Ni plating or Au plating.

尚、本発明の半導体装置を製造する場合に用いるリードフレーム4としては、42Ni−Fe合金、銅板、銅板にNiめっきあるいはAuめっきを施したもの、銅合金等のいずれも採用でき、厚さは通常0.5〜2mmが用いられる。そして、通常の電子部品を搭載した半田付け部の他に、下方に嵌合用の端子部7を有している構造である必要がある。 As the lead frame 4 used when manufacturing the semiconductor device of the present invention, any of 42Ni-Fe alloy, copper plate, copper plate with Ni plating or Au plating, copper alloy, etc. can be adopted. Usually 0.5 to 2 mm is used. In addition to the soldering part on which a normal electronic component is mounted, it is necessary to have a structure having a fitting terminal part 7 below.

また、当該半導体装置の封止樹脂としては、絶縁性を有する材質であればいずれも採用でき、例えばエポキシ樹脂、フェノール樹脂、不飽和ポリエステル樹脂、ポリイミド樹脂等の樹脂が用いられる。また、樹脂は、樹脂単独で用いる他、粉末状或いは繊維状のいろいろな無機質フイラーを充填したもの、或いは、これらを組み合わせた形態で用いることができる。また、前記無機質フィラーに関しては、酸化アルミニウム、酸化珪素、窒化アルミニウム、窒化珪素、窒化硼素、シリカ等の高い電気絶縁性を有し、しかも熱伝導率の高いものが好ましい。 As the sealing resin for the semiconductor device, any insulating material can be used. For example, an epoxy resin, a phenol resin, an unsaturated polyester resin, a polyimide resin, or the like is used. In addition to using the resin alone, the resin can be used in a form filled with various inorganic fillers in the form of powder or fiber, or a combination thereof. As the inorganic filler, those having high electrical insulation and high thermal conductivity such as aluminum oxide, silicon oxide, aluminum nitride, silicon nitride, boron nitride and silica are preferable.

〔実施例〕厚さ3.0mmのアルミニウム板(5052H34)の上に、酸化アルミニウム粉末を含有するエポキシ樹脂からなる樹脂組成物を、加熱硬化後の厚さが120μmとなるように塗布して、加熱炉でBステージ状態となるように硬化した後、回路となる厚さ35μmの銅箔を貼った金属ベース基板を作成した。 [Example] On an aluminum plate (5052H34) having a thickness of 3.0 mm, a resin composition composed of an epoxy resin containing aluminum oxide powder was applied so that the thickness after heat curing was 120 μm. After curing so as to be in a B stage state in a heating furnace, a metal base substrate on which a 35 μm thick copper foil serving as a circuit was pasted was created.

前記の金属ベース基板に、エッチングで導電回路を形成し、またプレス金型を用いて金属板の回路が設けられていない主面の周縁部分に嵌合段差を形成後、打ち抜き、リードフレーム搭載用の金属ベース回路基板を作製した。 A conductive circuit is formed on the metal base substrate by etching, and a press step is used to form a fitting step on the peripheral portion of the main surface where the metal plate circuit is not provided, and then punched for lead frame mounting. A metal base circuit board was prepared.

ここで、嵌合段差の幅は1.6mm、奥行き0.95mm、深さ1.0mmで対辺の各辺2箇所に形成した。 前記嵌合段差の幅と奥行きはプレス金型のパンチ寸法と取付け位置で調整した。尚、深さはプレス機の下降点位置で任意設定可能であり、リードフレームの厚さ変更にも適宜対応可能である。プレス金型のパンチ材質は金属板より硬く耐摩耗、靭性のあるもので良く、本実施例ではSKD11を採用した。 Here, the width of the fitting step was 1.6 mm, the depth was 0.95 mm, and the depth was 1.0 mm. The width and depth of the fitting step were adjusted by the punch size and mounting position of the press die. The depth can be arbitrarily set at the position of the descent point of the press machine, and can appropriately correspond to a change in the thickness of the lead frame. The punch material of the press mold may be harder than the metal plate, and may have wear resistance and toughness. In this embodiment, SKD11 was adopted.

次に、前記金属ベース回路基板の回路上に半田ペーストを厚さ0.2mmで塗布し、厚さ0.7mm、幅1.5mmのリードフレーム嵌合部を前記金属ベース回路基板の嵌合段差に差し込みつつ、上部は回路上の半田ペースト上に載せて、リードフレーム本体部と端子部分と両者により、金属ベース回路基板を挟み込んだ状態とした。ついで加熱炉で加熱して、半田ペーストを熔融し、金属ベース回路基板とリードフレームとを接合した。 Next, a solder paste is applied on the circuit of the metal base circuit board to a thickness of 0.2 mm, and a lead frame fitting portion having a thickness of 0.7 mm and a width of 1.5 mm is formed on the fitting step of the metal base circuit board. The metal base circuit board was sandwiched between the lead frame main body part and the terminal part while the upper part was placed on the solder paste on the circuit. Subsequently, it heated with the heating furnace, the solder paste was melted, and the metal base circuit board and the lead frame were joined.

前記操作で得た、樹脂封止前の半導体装置について、リードフレームと導電回路との位置精度を測定した。測定精度の測定は、前記半導体装置10個に関しその2箇所について設計位置との差異を側長機ニコンVM−1000Nにて測定し、平均値と最小値、最大値を測定した。この結果を表1に示す。

Figure 0004312031
About the semiconductor device before resin sealing obtained by the above operation, the positional accuracy between the lead frame and the conductive circuit was measured. The measurement accuracy was measured by measuring the difference between the two positions of the 10 semiconductor devices from the design position with the side length machine Nikon VM-1000N, and measuring the average value, the minimum value, and the maximum value. The results are shown in Table 1.
Figure 0004312031

〔比較例〕実施例と同一構成で嵌合段差を有しない金属ベース絶縁基板を作成し、リードフレームを半田付けした。そして実施例と同じ評価を行い、その結果を表1に示した。 [Comparative Example] A metal base insulating substrate having the same configuration as the example and having no fitting step was prepared, and the lead frame was soldered. And the same evaluation as an Example was performed and the result was shown in Table 1.

本発明の金属ベース回路基板は、金属板の裏面にリードフレームを嵌合し固定するための段差を有しているので、高信頼性の半導体装置を容易に、再現性高く得ることができるという効果が得られ、従来方法では達成できなかった回路とリードフレームとの位置ズレがなく、効率的に搭載できるという特徴を有しているので、半導体装置の製造に好適である。 Since the metal base circuit board of the present invention has a step for fitting and fixing the lead frame to the back surface of the metal plate, a highly reliable semiconductor device can be easily obtained with high reproducibility. It is advantageous for manufacturing a semiconductor device because it has an advantage that it can be mounted efficiently without causing a positional shift between the circuit and the lead frame that could not be achieved by the conventional method.

本発明の半導体装置の製造方法は、前記特定構造の金属ベース回路基板を用いるので、リードフレームの一部を嵌合段差に差し込んで半田付けするだけで、リードフレームを位置精度よく効率的に実装できる特徴があり、その結果として、基板表面積を有効に活用でき且つ電子部品の発生熱を効率よく放熱でき、搭載部品の高密度化ができ、軽量小型で信頼性が高い半導体装置を得られるので、電気機器、通信機、自動車等の幅広い分野の産業に適用できる。 Since the semiconductor device manufacturing method of the present invention uses the metal base circuit board having the specific structure, the lead frame can be mounted efficiently with high positional accuracy by simply inserting a part of the lead frame into the fitting step and soldering. As a result, the surface area of the substrate can be used effectively, the heat generated by the electronic components can be efficiently dissipated, the density of the mounted components can be increased, and a lightweight, small and highly reliable semiconductor device can be obtained. It can be applied to a wide range of industries such as electrical equipment, communication equipment, and automobiles.

(a)本発明に係る金属ベース回路基板の一例を示す図。(b)本発明に係る金属ベース回路基板にリードフレームを搭載した状態を示す図。(A) The figure which shows an example of the metal base circuit board based on this invention. (B) The figure which shows the state which mounted the lead frame on the metal base circuit board based on this invention.

符号の説明Explanation of symbols

1 :金属板
2 :絶縁層
3 :回路
4 :嵌合段差
5 :半田ペースト
6 :リードフレーム
7 :端子部
1: Metal plate 2: Insulating layer 3: Circuit 4: Fitting step 5: Solder paste 6: Lead frame 7: Terminal part

Claims (1)

金属ベース回路基板上に、半導体素子を搭載し嵌合用の端子部を有しているリードフレームと前記半導体素子を封止している樹脂とを搭載して半導体装置を製造する方法であって、前記金属ベース回路基板のリードフレーム搭載側と反対側の主面の周縁部に前記リードフレームとの嵌合するための段差を設け、しかも前記嵌合段差の深さが前記リードフレーム厚さより0.01〜0.5mm深く、前記嵌合段差の幅は前記リードフレームの幅より0.05〜0.1mm大きく形成されている金属ベース回路基板を用いることを特徴とする半導体装置の製造方法。A method of manufacturing a semiconductor device by mounting a lead frame on which a semiconductor element is mounted and having a fitting terminal portion on a metal base circuit board and a resin sealing the semiconductor element, A step for fitting with the lead frame is provided at the peripheral portion of the main surface opposite to the lead frame mounting side of the metal base circuit board, and the depth of the fitting step is less than the thickness of the lead frame. A method of manufacturing a semiconductor device, comprising using a metal base circuit board having a depth of 01 to 0.5 mm and a width of the fitting step being 0.05 to 0.1 mm larger than a width of the lead frame.
JP2003377198A 2003-11-06 2003-11-06 Metal base circuit board and semiconductor device manufacturing method using the same Expired - Fee Related JP4312031B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003377198A JP4312031B2 (en) 2003-11-06 2003-11-06 Metal base circuit board and semiconductor device manufacturing method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003377198A JP4312031B2 (en) 2003-11-06 2003-11-06 Metal base circuit board and semiconductor device manufacturing method using the same

Publications (2)

Publication Number Publication Date
JP2005142356A JP2005142356A (en) 2005-06-02
JP4312031B2 true JP4312031B2 (en) 2009-08-12

Family

ID=34687998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003377198A Expired - Fee Related JP4312031B2 (en) 2003-11-06 2003-11-06 Metal base circuit board and semiconductor device manufacturing method using the same

Country Status (1)

Country Link
JP (1) JP4312031B2 (en)

Also Published As

Publication number Publication date
JP2005142356A (en) 2005-06-02

Similar Documents

Publication Publication Date Title
US7059042B2 (en) Method of manufacturing a thermal conductive circuit board with grounding pattern connected to a heat sink
JP5383621B2 (en) Power semiconductor device
JP3605547B2 (en) Heat dissipating substrate and manufacturing method thereof
JP4453498B2 (en) Power semiconductor module and manufacturing method thereof
JP3312723B2 (en) Heat conductive sheet, method of manufacturing the same, heat conductive substrate using the same, and method of manufacturing the same
JP2010027813A (en) Power semiconductor device
JP5885630B2 (en) Printed board
JP4946488B2 (en) Circuit module
JP4220641B2 (en) Resin mold circuit board and electronic package
US6617200B2 (en) System and method for fabricating a semiconductor device
JP2008218617A (en) Heat radiation substrate and circuit module using the same
JP3981090B2 (en) Manufacturing method of electronic device
JP2008205344A (en) Conductive heat transfer board, manufacturing method therefor, and circuit module using the board
JP4312031B2 (en) Metal base circuit board and semiconductor device manufacturing method using the same
JP2008210920A (en) Heat conduction substrate, manufacturing method thereof and circuit module
CN116053144A (en) Power module and packaging method thereof
CN110838475A (en) Chip assembly and manufacturing method thereof
JP5239736B2 (en) Electronic equipment
JP4667154B2 (en) Wiring board, electrical element device and composite board
JP6983119B2 (en) Heat dissipation plate, semiconductor package and semiconductor device
JP2008218616A (en) Circuit module
JP4249366B2 (en) Metal base circuit board and electronic module manufacturing method
CN209748883U (en) Electronic device and printed circuit board thereof
JP2001156205A (en) Metal base circuit substrate and electronic circuit package
CN115579345A (en) Power semiconductor module for PCB embedding, and related power electronic component and manufacturing method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051207

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070828

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070904

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071030

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20071204

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080116

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090303

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090408

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090512

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090512

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120522

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4312031

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130522

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130522

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees