JP4272803B2 - Photoelectric device sensitivity and light distribution control method - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a photoelectric device such as a proximity sensor configured as a photoelectric type with a light emitting element and a light receiving element, a tilt sensor, or a projector configured with a light emitting element, a light receiver configured with a light receiving element, and the like. Specifically, it relates to a sensitivity adjustment method that is performed so that there is no difference in detection contents before and after replacement when a proximity sensor, projector, receiver, etc. need to be replaced. is there.
[0002]
[Prior art]
5 to 7 show examples of sensitivity adjustment methods in this type of conventional photoelectric sensor. First, the method shown in FIG. 5 is applied to a single light emitting element 90 such as an LED lamp incorporated in the photoelectric sensor. A variable resistor 91 is connected in series to the light emitting element 90, the light emitting element 90 is lit at a specified current, and the output of the variable resistor is measured with an illuminometer 80 or the like. The device 91 is adjusted so that all of the predetermined number have the same output.
[0003]
6 is performed in order to improve this point because the variable resistor 91 is too large and expensive compared to the light emitting element 90. A standard resistor 81 or the like is connected instead of the variable resistor 91, adjustment is performed in the same manner as described above, the value of the standard resistor is read at that time, and the fixed resistor 92 having the same value is attached. is there.
[0004]
Further, in FIG. 7, a diaphragm plate 93 is provided on the light emitting element 90, and the diaphragm is slidably attached to a case 94 while measuring the output with an illuminance meter 80 or the like as described above. The plate 93 is moved forward or backward to adjust the illuminance meter 80 so that a predetermined value is obtained and fixed.
[0005]
[Problems to be solved by the invention]
However, in the conventional sensitivity adjustment method described above, the variable resistor 91 as shown in FIG. 5 has an advantage that the adjustment process can be carried out relatively easily. However, since the size of the photoelectric sensor is increased and the size of the photoelectric sensor is increased, applications are restricted.
[0006]
In addition, in the adjustment method shown in FIG. 6, the variable resistor 91 is certainly unnecessary, and the purpose of downsizing is achieved. However, as a price, the adjustment process becomes complicated and accuracy is ensured. For this purpose, it is necessary to select the fixed resistor 92 and the assembly process becomes complicated, which still causes a problem of cost increase. Further, in the case shown in FIG. 7, a mechanism for holding the diaphragm plate 93 and securely fixing it is necessary, and as with the method shown in FIG. It has become.
[0007]
[Means for Solving the Problems]
The present invention provides a method for controlling sensitivity and light distribution of a photoelectric device including a light emitting element, a light receiving element, or both, as a specific means for solving the above-described conventional problems. When one of the elements is included, the element itself or the surface of the light transmitting portion of the case housing the element is subjected to fine unevenness processing by a laser marker device , and the photoelectric device is a light emitting element In the case where both of the light receiving elements are included, at least one of the elements itself, or the surface of the light transmitting portion of the case housing at least one of the elements is subjected to fine unevenness processing by a laser marker device. in and controls the sensitivity, the roughened is subjected in the state in which the measurement of the output of the photoelectric device is being performed, the optionally It solves the problem by providing a sensitivity and light distribution controlling method for a photovoltaic device, characterized in that also controls the light distribution pattern at the same time as the sensitivity by changing the pattern of convex machining.
[0008]
DETAILED DESCRIPTION OF THE INVENTION
Below, this invention is demonstrated in detail based on embodiment shown in a figure. FIG. 1 shows an embodiment in which the present invention is applied to the light emitting element 1 itself. At this time, the light receiving device 10 whose sensitivity has been verified is kept facing the light emitting element 1 at a predetermined distance L, and the control device 20 is connected to the output of the light receiving device 10.
[0009]
Further, a fine uneven processing machine 21 is connected to the control device 20, and the operation of the fine uneven processing machine 21 is controlled by the output of the control device 20. Here, the fine unevenness processing machine 21 is specifically a laser marker device or a sandblasting device, and forms fine unevenness on the surface of the casing of the light emitting element 1.
[0010]
In the embodiment shown in FIG. 1A, the fine unevenness machine 21 is a laser marker device. The fine unevenness machine 21 has the light emitting element 1 facing the light receiving device 10. In this state, that is, in a state where the measurement of the light amount is being performed, the position is set as a position where the uneven processing can be performed.
[0011]
By doing so, the light emitting element 1, the light receiving device 10, the control device 20, and the fine unevenness processing machine 21 constitute one closed loop, and the output from the light receiving device 10 is a predetermined value. If the operation of the fine unevenness processing machine 21 is stopped at this time, the individual variations of the light emitting element 1 are corrected, and the same output is obtained. These processes can be fully automated by providing the control device 20, and there is no significant increase in assembly man-hours.
[0012]
FIG. 1B is an example of an embodiment when the fine uneven processing machine 21 is a sand blasting device, and the sand blasting device forms unevenness with dents when fine particles collide with an object. Therefore, in the course of processing, the fine particles described above may adhere to the surface of the object, that is, the casing of the light-emitting element 1 and remain and there is a possibility that an accurate light amount cannot be measured.
[0013]
In such a case, the control device 20 calculates an appropriate jetting time for the sandblasting device from the initial light quantity of the light emitting element 1, and controls the sandblasting device (fine unevenness processing machine 21) based on this calculation. Yes, at this time, it is not necessary to continuously measure the amount of light from the light emitting element 1, so it is not necessary to face the light receiving device 10, and it is also separated to prevent dust during processing from adhering to the light receiving device 10. Preferably it is done in position.
[0014]
As described above, by performing fine uneven processing on the light emitting element 1, the basic characteristic D0 of the light emitting element 1 shown in FIG. 2A is wide in the uneven processing portion as shown in FIG. 2B. The light distribution characteristic D1 is diffused in the range, and as a result, the peak value is attenuated and the light quantity is adjusted. Here, FIG. 2 (C) illustrates another action by performing the uneven processing.
[0015]
When the fine concavo-convex processing machine 12 is a laser marker device, the processing pattern can be set freely. For example, if the concavo-convex processing is performed in a donut shape surrounding the central axis of the light emitting element 1, the light distribution characteristic is shown in FIG. As shown as D2, the light passing through the donut-shaped inner diameter is not diffused, but is diffused to a wide irradiation angle portion. It becomes narrow, that is, the light distribution characteristic can be adjusted.
[0016]
FIG. 3 shows a state when the present invention is applied to the light receiving element 2, and the standard light source device 11 is installed with the light receiving element 2 having a predetermined distance L. The output from the light receiving element 2 is connected to the control device 20, and the control device 20 controls the fine uneven processing machine 21 similar to the above to perform uneven processing that obtains desired characteristics. At this time, it goes without saying that the fine uneven processing machine 21 may be a laser marker device or a sand blast device. Further, since the adjustment method is the same as that of the light emitting element 1, detailed description thereof is omitted here.
[0017]
By doing so, for example, when a projector is formed, a projector having the same characteristics can be manufactured when any light emitting element 1 is assembled indiscriminately. The same applies when a light receiver is formed by the light receiving element 2. Furthermore, the same applies to the formation of the photoelectric sensor 3 in which the light emitting element 1 and the light receiving element 2 are combined. When any light emitting element 1 and the light receiving element 2 are combined without selection, the photoelectric sensor 3 having the same characteristics is used. The sensor 3 is obtained.
[0018]
FIG. 4 shows an example in which the present invention is applied to a photoelectric sensor 3 configured by combining a light emitting element 1 and a light receiving element 2, and this type of photoelectric sensor 3 is used as a proximity sensor, an inclination sensor, or the like. It is what. In the photoelectric sensor 3, the presence of the detection object or the distance to the detection object is detected by the amount of light emitted from the light emitting element 1 in contact with the detection object and reflected.
[0019]
Therefore, when the photoelectric sensor 3 is implemented, a dummy object 12 whose reflectivity and the like are tested in advance at a predetermined distance L is installed, and the control device 20 is connected to the output of the light receiving element 2. Are connected, and the control device 20 controls the micro uneven processing machine 21.
[0020]
In this embodiment, the fine uneven processing machine 21 performs uneven processing on the surface of the case 4 that houses the light emitting element 1 and the light receiving element 2. At this time, the uneven processing is performed on the front surface of the light emitting element 1. Or a portion corresponding to the front surface of the light receiving element 2, or a portion corresponding to both front surfaces.
[0021]
However, since the change in output becomes rapid when performed on both surfaces, it is preferable to perform either one of the light emitting element 1 and the light receiving element 2 from the viewpoint of ensuring accuracy. It is preferable to perform either one of the above in terms of uniformity of characteristics of the photoelectric sensor 3 when the element itself has a large variation.
[0022]
When sensitivity adjustment is performed in the state of the photoelectric sensor 3 in this way, each photoelectric sensor 3 has the same detection sensitivity, but strictly speaking, a bright light emitting element 1 and a low sensitivity light receiving element 2 are combined. On the contrary, there is a variation such as a combination of the dark light emitting element 1 and the high sensitivity light receiving element 2. However, the number of man-hours is halved compared to that performed for each of the elements 1 and 2, and any one may be selected according to the accuracy required for the photoelectric sensor 3.
[0023]
【The invention's effect】
As described above, according to the present invention, there is provided a method for controlling sensitivity and light distribution of a photoelectric device including a light emitting element, a light receiving element, or both, wherein the photoelectric device includes one of a light emitting element and a light receiving element. In the case where the element itself, or the surface of the light transmission part of the case housing the element is subjected to fine unevenness processing, and the photoelectric device includes both a light emitting element and a light receiving element, At least one of the elements themselves or the surface of the light transmission part of the case containing at least one of the elements is subjected to fine unevenness processing to control sensitivity, and the unevenness processing pattern as necessary. The sensitivity and light distribution control method of the photoelectric device that controls the shape of light distribution at the same time as the sensitivity by changing the Floodlight properties, light receiver, it is assumed that the photoelectric device such as a photoelectric sensor is obtained, in which exhibits the excellent effects to the miniaturization of this type of photovoltaic device.
[0024]
Further, in the method of the present invention, the control device is provided, so that the process can be fully automated. Thus, when making adjustments to the light emitting element, the light receiving element, the photoelectric sensor, etc., a significant increase in man-hours, etc. In comparison with the conventional photoelectric device that performs sensitivity adjustment manually, it is possible to achieve an extremely excellent effect that enables cost reduction.
[Brief description of the drawings]
BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is an explanatory diagram showing a procedure when a sensitivity and a light distribution control method of a photoelectric device according to the present invention are performed on a light emitting element.
FIG. 2 is a graph showing the light distribution characteristics of the effects obtained by the implementation of the present invention.
FIG. 3 is an explanatory diagram showing a procedure when the sensitivity and light distribution control method of the photoelectric device according to the present invention is carried out on a light receiving element.
FIG. 4 is an explanatory diagram showing a procedure when the sensitivity and light distribution control method of the photoelectric device according to the present invention is implemented in the photoelectric sensor.
FIG. 5 is an explanatory diagram showing a conventional example.
FIG. 6 is an explanatory diagram showing another conventional example.
FIG. 7 is an explanatory view showing still another conventional example.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Light emitting element 2 ... Light receiving element 3 ... Photoelectric sensor 4 ... Case 10 ... Light receiving device 11 ... Standard light source device 12 ... Dummy detected object 20 ... Control apparatus 21 ... Fine uneven processing machine

Claims (1)

A method for controlling sensitivity and light distribution of a photoelectric device including a light emitting element, a light receiving element or both,
When the photoelectric device includes any one of a light emitting element and a light receiving element, fine unevenness processing by a laser marker device is performed on the surface of the element itself or the light transmitting portion of the case housing the element. In the case where the photoelectric device includes both a light emitting element and a light receiving element, a laser marker device is provided on at least one of the elements themselves or on the surface of the light transmitting portion of the case housing at least one of the elements The sensitivity is controlled by applying fine irregularities with
The uneven processing is performed in a state where the output of the photoelectric device is being measured , and the light distribution shape is controlled simultaneously with the sensitivity by changing the pattern of the uneven processing as necessary. Sensitivity and light distribution control method of photoelectric device.

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