JP4219241B2 - Laser processing apparatus and laser processing method - Google Patents

Laser processing apparatus and laser processing method Download PDF

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JP4219241B2
JP4219241B2 JP2003323682A JP2003323682A JP4219241B2 JP 4219241 B2 JP4219241 B2 JP 4219241B2 JP 2003323682 A JP2003323682 A JP 2003323682A JP 2003323682 A JP2003323682 A JP 2003323682A JP 4219241 B2 JP4219241 B2 JP 4219241B2
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workpiece
laser
laser light
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protective member
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秀樹 立石
由紀夫 福永
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Ebara Corp
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Description

本発明は、レーザ光を用いたレーザ加工装置及びレーザ加工方法に係り、特に、液中の被加工物に向けてレーザ光を照射して被加工物を加工するレーザ加工装置及びレーザ加工方法に関する。   The present invention relates to a laser processing apparatus and a laser processing method using a laser beam, and more particularly to a laser processing apparatus and a laser processing method for processing a workpiece by irradiating a laser beam toward the workpiece in a liquid. .

被加工物に穴あけや切断等の加工を行う装置として、レーザ光を用いたレーザ加工装置が知られている。このレーザ加工装置は、レーザを適切に選択することにより精密な微細加工が可能であることから半導体製造工程にも採用されつつあり、基板の表面に形成された絶縁膜や金属膜などの薄膜にレーザ光を照射してこれらの薄膜を選択的に除去することが行われている。   2. Description of the Related Art A laser processing apparatus using laser light is known as an apparatus that performs processing such as drilling and cutting on a workpiece. This laser processing apparatus is being adopted in the semiconductor manufacturing process because precise microfabrication is possible by appropriately selecting a laser, and it is used for thin films such as insulating films and metal films formed on the surface of a substrate. These thin films are selectively removed by irradiating a laser beam.

一般に、レーザ加工装置は、レーザ光を発生させるレーザ光源と、レーザ光をレーザ光源から被加工物まで導くレーザ導波手段とを備えている。レーザ光源で発生したレーザ光は、レーザ導波手段の終端に配置されたレンズ(レーザ光出射部)から被加工物に向けて照射される。このようなレーザ光の照射により、被加工物においてアブレーション(ablation)現象が生じ、このアブレーション現象によって被加工物を加工することができる。このアブレーション現象は、従来の機械的加工とは異なり、被加工物に対する熱的影響が少なく、加工により生ずる被加工物に対する物理的、熱的損傷を大幅に低減することができる。   Generally, a laser processing apparatus includes a laser light source that generates laser light and laser waveguide means that guides the laser light from the laser light source to a workpiece. Laser light generated by the laser light source is irradiated toward the workpiece from a lens (laser light emitting portion) disposed at the end of the laser waveguide means. By irradiation with such laser light, an ablation phenomenon occurs in the workpiece, and the workpiece can be processed by this ablation phenomenon. Unlike the conventional mechanical processing, this ablation phenomenon has little thermal influence on the workpiece, and can significantly reduce physical and thermal damage to the workpiece caused by the processing.

ところで、レーザ加工時においては、レンズ(レーザ光出射部)を被加工物に対向させた状態でレーザ光を照射するため、このレンズの表面に被加工物から飛散した加工屑が付着し、この加工屑が加工の障害となることがある。この対策として、例えば特許文献1に開示されているように、レーザ導波手段の終端のレンズと被加工物とをともに水中に配置し、被加工物から飛散した加工屑がレンズに付着しないように、被加工物の被加工部に沿って高速水流を形成する技術が提案されている。   By the way, at the time of laser processing, since laser light is irradiated in a state where the lens (laser light emitting portion) is opposed to the workpiece, the processing dust scattered from the workpiece adheres to the surface of the lens. Machining scraps may interfere with processing. As a countermeasure for this, for example, as disclosed in Patent Document 1, the lens at the end of the laser waveguide means and the workpiece are both placed in water so that the processing waste scattered from the workpiece does not adhere to the lens. In addition, a technique for forming a high-speed water flow along a workpiece portion of a workpiece has been proposed.

特開平6−142971号公報JP-A-6-142971

しかしながら、加工の高速化のために高出力のレーザを用いる場合や、微細な加工を行うためにレンズを被加工物に近づける場合には、上述した高速水流のみでは加工屑のレンズへの付着を防止するには不十分な場合がある。このため、従来のレーザ加工装置では、レンズに付着した加工屑によってレーザ光のエネルギー密度が低下することがあり、加工の高速化や精密な微細加工を行うことができないという問題があった。   However, when using a high-power laser for speeding up the processing, or when bringing the lens close to the work piece for fine processing, the above-described high-speed water flow alone causes the processing dust to adhere to the lens. May not be sufficient to prevent. For this reason, in the conventional laser processing apparatus, the energy density of the laser beam may be reduced due to the processing dust attached to the lens, and there is a problem that the processing speed cannot be increased and precise fine processing cannot be performed.

本発明は、上述した従来の問題点を解決するためになされたもので、レーザ導波手段の終端に配置されるレーザ光出射部への加工屑の付着を防止し、加工の高速化及び精密な微細加工を行うことができるレーザ加工装置及びレーザ加工方法を提供することを目的とする。   The present invention has been made to solve the above-described conventional problems, and prevents the processing dust from adhering to the laser beam emitting portion disposed at the end of the laser waveguide means, thereby increasing the processing speed and precision. An object of the present invention is to provide a laser processing apparatus and a laser processing method capable of performing fine processing.

上述した目的を達成するため、本発明の一態様は、レーザ光を発生させるレーザ光源と、被加工物を保持する保持部と、前記被加工物と前記保持部とを液中に浸漬させる容器と、レーザ光を前記レーザ光源から前記被加工物まで導くレーザ導波手段と、前記レーザ導波手段のレーザ光出射部と前記被加工物との間に配置された保護部材とを備え、前記保護部材はレーザ光を透過させる材料から構成されることを特徴とするレーザ加工装置である。   In order to achieve the above-described object, one embodiment of the present invention includes a laser light source that generates laser light, a holding unit that holds a workpiece, and a container that immerses the workpiece and the holding unit in a liquid. And laser waveguide means for guiding laser light from the laser light source to the workpiece, and a protective member disposed between the laser light emitting portion of the laser waveguide means and the workpiece, The protective member is a laser processing apparatus that is made of a material that transmits laser light.

本発明によれば、保護部材を設けることによって、被加工物から飛散した加工屑がレーザ導波手段のレーザ光出射部に付着してしまうことが防止でき、これにより、加工屑に妨げられることなくレーザ光を被加工物に照射することができる。   According to the present invention, by providing the protective member, it is possible to prevent the processing waste scattered from the workpiece from adhering to the laser light emitting portion of the laser waveguide means, and this prevents the processing waste. The workpiece can be irradiated with laser light without any problem.

また、本発明によれば、保護部材に付着した加工屑を保護部材と共にレーザ光の光路から移動させることができ、保護部材の透過性を良好に維持することができる。 Moreover, according to this invention, the processing waste adhering to a protection member can be moved from the optical path of a laser beam with a protection member, and the transparency of a protection member can be maintained favorable.

記被加工物と前記保護部材との間に液体の流れを発生させる液流れ発生機構を更に備えてもよい
本発明によれば、加工屑を液体の流れによって下流側に移送することができるので、保護部材に付着する加工屑の量を少なくすることができる。
Before SL liquid flow generating mechanism that generates a flow of liquid may further comprise between the protective member and the workpiece.
According to the present invention, since the processing waste can be transferred to the downstream side by the flow of liquid, the amount of processing waste attached to the protective member can be reduced.

記保護部材の前記被加工物に面した表面を清浄にする清浄化手段を更に備え、前記清浄化手段は、レーザ光の照射及び前記液流れ発生機構により発生した液体の流れを妨げないような位置に配置されていてもよい
本発明によれば、清浄化手段により保護部材に付着した加工屑を除去することができるので、レーザ加工を継続して行うことができる。
Further comprising a cleaning means for cleaning the surface facing the workpiece before Symbol protective member, the cleaning means, so as not interfere with the flow of liquid generated by irradiation and the liquid flow generating mechanism of the laser beam It may be arranged at any position.
According to the present invention, since the processing waste adhering to the protection member can be removed by the cleaning means, laser processing can be continuously performed.

記保護部材の前記被加工物を向いた表面をレーザ光の光軸に垂直な面に対して所定角度だけ傾けてもよい
本発明によれば、レーザ導波手段のレーザ光出射部から照射されたレーザ光が保護部材に反射してレーザ光源に戻ることを防止することができ、反射光によるレーザ光源の損傷を防ぐことができる。また、被加工物の表面で反射した反射光が保護部材でさらに反射して再び被加工物に照射されることを防止することができ、被加工物の被加工部が多重加工されることを防止することができる。
It may be inclined by a predetermined angle with respect to a plane perpendicular to the workpiece surface optical axis of the laser light which faces the front Symbol protective member.
According to the present invention, it is possible to prevent the laser light irradiated from the laser light emitting portion of the laser waveguide means from being reflected by the protective member and returning to the laser light source, and to prevent the laser light source from being damaged by the reflected light. Can do. Further, it is possible to prevent the reflected light reflected from the surface of the work piece from being further reflected by the protective member and irradiated again to the work piece, and the work portion of the work piece can be multi-processed. Can be prevented.

本発明の他の態様は、被加工物を保持部により保持して前記被加工物を液中に浸漬させ、レーザ導波手段のレーザ光出射部を前記被加工物に対向するように液中に配置し、レーザ光を透過させる材料から構成された保護部材を前記レーザ光出射部と前記被加工物との間に配置し、レーザ光を横切る方向に前記保護部材を移動させながら、レーザ光を前記レーザ導波手段を介して前記レーザ光出射部から液中の前記被加工物に照射することを特徴とするレーザ加工方法である
この場合において、前記被加工物と前記保護部材との間に液体の流れを発生させながら、レーザ光を前記被加工物に照射してもよい。
また、レーザ光の照射を妨げない位置で、前記保護部材の前記被加工物に面した表面を清浄にしながら、レーザ光を前記被加工物に照射してもよい。
前記保護部材の前記被加工物を向いた表面をレーザ光の光軸に垂直な面に対して所定角度だけ傾けてもよい。
In another aspect of the present invention, the workpiece is held by a holding portion, the workpiece is immersed in the liquid, and the laser light emitting portion of the laser waveguide means is immersed in the liquid so as to face the workpiece. A protective member made of a material that transmits laser light is disposed between the laser light emitting portion and the workpiece, and the laser light is moved while moving the protective member in a direction crossing the laser light. Is irradiated to the workpiece in the liquid from the laser beam emitting portion via the laser waveguide means .
In this case, before Symbol while generating a flow of liquid between the protective member and the workpiece may be irradiated with laser light to the workpiece.
Further, the workpiece may be irradiated with the laser beam while the surface of the protective member facing the workpiece is cleaned at a position that does not hinder the irradiation of the laser beam .
The surface of the protective member facing the workpiece may be inclined by a predetermined angle with respect to a plane perpendicular to the optical axis of the laser beam.

本発明によれば、被加工物から飛散した加工屑がレーザ導波手段のレーザ光出射部に付着することを防止することができる。したがって、加工屑によるレーザ光のエネルギー密度の低下を防止することができ、加工の高速化及び精密な微細加工が可能となる。   ADVANTAGE OF THE INVENTION According to this invention, it can prevent that the processing waste scattered from the to-be-processed object adheres to the laser beam emission part of a laser waveguide means. Therefore, it is possible to prevent the energy density of the laser beam from being lowered due to the processing waste, and it is possible to increase the processing speed and perform precise microfabrication.

以下、本発明の実施形態に係るレーザ加工装置について図面を参照して説明する。
図1は本発明の第1の実施形態におけるレーザ加工装置の全体構成を示す模式図である。
図1に示すように、レーザ加工装置は、所定の波長及び所定のエネルギーを有するレーザ光を発生させるレーザ光源1と、被加工物2を保持する保持部3と、被加工物2と保持部3とを収容する容器4と、レーザ光をレーザ光源1から被加工物2まで導くレーザ導波手段5とを備えている。レーザ導波手段5は、レーザ光の光路を変える反射鏡8と、鏡筒9と、鏡筒9の出口に取り付けられたレンズ10とを備えている。レンズ10は保持部3によって保持された被加工物2に対向して配置され、被加工物2に向けてレーザ光を照射するレーザ光出射部として構成される。保持部3は容器4内に収容された基台17の上に載置され、保持部3の上部に被加工物2が載置されて保持される。
Hereinafter, a laser processing apparatus according to an embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic diagram showing the overall configuration of the laser processing apparatus according to the first embodiment of the present invention.
As shown in FIG. 1, a laser processing apparatus includes a laser light source 1 that generates laser light having a predetermined wavelength and predetermined energy, a holding unit 3 that holds a workpiece 2, a workpiece 2 and a holding unit. 3 and a laser waveguide means 5 for guiding laser light from the laser light source 1 to the workpiece 2. The laser waveguide means 5 includes a reflecting mirror 8 that changes the optical path of laser light, a lens barrel 9, and a lens 10 attached to the outlet of the lens barrel 9. The lens 10 is disposed so as to face the workpiece 2 held by the holding unit 3, and is configured as a laser beam emitting unit that emits laser light toward the workpiece 2. The holding unit 3 is placed on the base 17 accommodated in the container 4, and the workpiece 2 is placed and held on the upper part of the holding unit 3.

保持部3は、基台17に固定された水平移動機構12に連結されており、この水平移動機構12により保持部3が水平方向に移動されるようになっている。また、基台17には垂直移動機構14が連結されており、この垂直移動機構14により基台17を介して保持部3が垂直方向に移動されるようになっている。このような構成により、保持部3上の被加工物2はレンズ10に対して相対移動可能となっている。なお、水平移動機構12及び垂直移動機構14は、被加工物2をレンズ10に対して相対移動させるための相対移動機構を構成する。容器4内には図示しない液体供給源から所定の液体13が供給され、保持部3とこの保持部3によって保持された被加工物2とが液体13中に浸漬されるようになっている。なお、液体13としては水(純水を含む)が好適に用いられる。また、被加工物2としては、金属、樹脂、複合材料、半導体ウェハ上に形成された絶縁膜や金属膜などが挙げられる。   The holding unit 3 is connected to a horizontal moving mechanism 12 fixed to the base 17, and the holding unit 3 is moved in the horizontal direction by the horizontal moving mechanism 12. A vertical movement mechanism 14 is connected to the base 17, and the holding unit 3 is moved in the vertical direction by the vertical movement mechanism 14 via the base 17. With such a configuration, the workpiece 2 on the holding unit 3 can be moved relative to the lens 10. The horizontal movement mechanism 12 and the vertical movement mechanism 14 constitute a relative movement mechanism for moving the workpiece 2 relative to the lens 10. A predetermined liquid 13 is supplied into the container 4 from a liquid supply source (not shown), and the holding unit 3 and the workpiece 2 held by the holding unit 3 are immersed in the liquid 13. As the liquid 13, water (including pure water) is preferably used. Examples of the workpiece 2 include metals, resins, composite materials, and insulating films and metal films formed on semiconductor wafers.

上述の構成において、レーザ光源1で発生したレーザ光は、反射鏡8で進行方向を変え、鏡筒9内を通過し、鏡筒9の出口に配置されたレンズ10で集光もしくは拡散される。レンズ10を通過したレーザ光は、容器4内の液体13を透過して、保持部3に保持された被加工物2に達し、所定の加工が行われる。レーザ光の波長は、被加工物2の種類に応じて適宜選択されるが、容器4内の液体(水)13に吸収されることなく液体13を透過するような波長であることが好ましい。なお、本実施形態では、レーザ光源1としてYAGレーザが用いられているが、本発明のレーザ光源はこれに限られない。例えば、加工の種類に応じて、COレーザなどを用いることもできる。 In the above-described configuration, the laser light generated by the laser light source 1 changes its traveling direction by the reflecting mirror 8, passes through the lens barrel 9, and is condensed or diffused by the lens 10 disposed at the exit of the lens barrel 9. . The laser light that has passed through the lens 10 passes through the liquid 13 in the container 4, reaches the workpiece 2 held by the holding unit 3, and is subjected to predetermined processing. The wavelength of the laser light is appropriately selected according to the type of the workpiece 2, but is preferably a wavelength that allows the liquid 13 to pass through without being absorbed by the liquid (water) 13 in the container 4. In this embodiment, a YAG laser is used as the laser light source 1, but the laser light source of the present invention is not limited to this. For example, a CO 2 laser or the like can be used depending on the type of processing.

本実施形態に係るレーザ加工装置は、レンズ10と被加工物2との間に配置される平板状の保護部材15を備えている。この保護部材15はレーザ光を透過させる材料で構成され、レンズ10から照射されたレーザ光の光軸(レーザ光の光路の中心線)に対して略垂直に配置されている。保護部材15には移動機構16が連結されており、この移動機構16により、保護部材15がレーザ光の光軸と略垂直な方向(レーザ光を横切る方向)に移動される。なお、保護部材15を構成する材料としては、レーザ光を実質的に吸収せず、被加工物2への照射を妨げないような高い透過性を有するものが好ましく、例えば、石英ガラスが好適に用いられる。   The laser processing apparatus according to the present embodiment includes a flat plate-shaped protection member 15 disposed between the lens 10 and the workpiece 2. The protective member 15 is made of a material that transmits laser light, and is disposed substantially perpendicular to the optical axis of the laser light irradiated from the lens 10 (the center line of the optical path of the laser light). A movement mechanism 16 is connected to the protection member 15, and the movement mechanism 16 moves the protection member 15 in a direction substantially perpendicular to the optical axis of the laser beam (a direction crossing the laser beam). The material constituting the protection member 15 is preferably a material that does not substantially absorb laser light and has high transparency so as not to interfere with the irradiation of the workpiece 2. For example, quartz glass is preferable. Used.

容器4の一方の側部には給液口20が設けられ、反対側の側部には給液口20に対応した位置に排液口21が設けられている。給液口20は高圧液供給源22に接続されており、高圧液供給源22から供給された液体は、給液口20を介して容器4内に流入し、保持部3に保持された被加工物2と保護部材15との間に高速な液体の流れ23を発生させる。排液口21は液体の流れ23の終点に配置されており、液体の流れ23を形成する液体13は排液口21から排出される。なお、本実施形態では、給液口20、排液口21、及び高圧液供給源22により液流れ発生機構が形成される。   A liquid supply port 20 is provided on one side of the container 4, and a liquid discharge port 21 is provided at a position corresponding to the liquid supply port 20 on the opposite side. The liquid supply port 20 is connected to a high-pressure liquid supply source 22, and the liquid supplied from the high-pressure liquid supply source 22 flows into the container 4 through the liquid supply port 20 and is held by the holding unit 3. A high-speed liquid flow 23 is generated between the workpiece 2 and the protection member 15. The liquid discharge port 21 is disposed at the end point of the liquid flow 23, and the liquid 13 forming the liquid flow 23 is discharged from the liquid discharge port 21. In the present embodiment, a liquid flow generating mechanism is formed by the liquid supply port 20, the drainage port 21, and the high-pressure liquid supply source 22.

次に、上記の構成を有するレーザ加工装置の動作について以下に説明する。
まず、被加工物2を保持部3により保持させ、被加工物2及びレーザ導波手段5のレンズ10を液中に浸漬させる。次に、水平移動機構12及び垂直移動機構14により被加工物2の被加工部をレーザ光の照射位置に移動させる。その後、保護部材15と被加工物2との間に液体の流れ23を発生させ、保護部材15をレーザ光の光軸に対して略垂直な方向に移動させる。この状態で、レーザ光源1を作動させて所定波長及び所定エネルギーのレーザ光を発生させ、レーザ導波手段5を経由して、レーザ光を被加工物2の被加工部に照射する。
Next, the operation of the laser processing apparatus having the above configuration will be described below.
First, the workpiece 2 is held by the holding unit 3, and the workpiece 2 and the lens 10 of the laser waveguide means 5 are immersed in the liquid. Next, the part to be processed of the workpiece 2 is moved to the irradiation position of the laser beam by the horizontal movement mechanism 12 and the vertical movement mechanism 14. Thereafter, a liquid flow 23 is generated between the protection member 15 and the workpiece 2, and the protection member 15 is moved in a direction substantially perpendicular to the optical axis of the laser beam. In this state, the laser light source 1 is operated to generate a laser beam having a predetermined wavelength and a predetermined energy, and the laser beam is irradiated to the processing portion of the workpiece 2 through the laser waveguide means 5.

レーザ光が被加工物2の被加工部に照射されると、被加工部からは加工屑及び気泡が発生する。これらの加工屑及び気泡の多くは、液体の流れ23により搬送され排液口21から排出される。液体の流れ23で搬送されなかった加工屑及び気泡は保護部材15に付着するが、保護部材15に付着した加工屑及び気泡は、保護部材15と共にレーザ光の光路を横切る方向に移動するので、連続するレーザ加工の障害にはならない。なお、必要に応じて、被加工物2を水平方向及び/又は垂直方向移動させながらレーザ光源1を被加工物2に照射することにより、所望の面積および所望の深さの被加工部を加工できる。   When the laser beam is irradiated onto the processing portion of the workpiece 2, processing scraps and bubbles are generated from the processing portion. Most of these processing scraps and bubbles are conveyed by the liquid flow 23 and discharged from the drain port 21. The processing waste and bubbles that have not been transported in the liquid flow 23 adhere to the protection member 15, but the processing waste and bubbles attached to the protection member 15 move together with the protection member 15 in a direction crossing the optical path of the laser beam. There is no obstacle to continuous laser processing. If necessary, the workpiece 2 having a desired area and a desired depth is processed by irradiating the workpiece 2 with the laser light source 1 while moving the workpiece 2 in the horizontal direction and / or the vertical direction. it can.

なお、本実施形態では、水平移動機構12及び垂直移動機構14により保持部3をレンズ10に対して相対移動させることでレーザ導波手段5のレンズ10と被加工物2との相対位置を調節するようにしているが、保持部3の位置を固定させた状態でレーザ光源1及びレーザ導波手段5を被加工物2に対して一体的に相対移動させることでレンズ10と被加工物2との相対位置を調節するようにしてもよい。   In this embodiment, the relative position between the lens 10 of the laser waveguide means 5 and the workpiece 2 is adjusted by moving the holding unit 3 relative to the lens 10 by the horizontal movement mechanism 12 and the vertical movement mechanism 14. However, the lens 10 and the workpiece 2 are integrally moved relative to the workpiece 2 while the position of the holding portion 3 is fixed. You may make it adjust the relative position with.

次に、本発明の第2の実施形態に係るレーザ加工装置について図2を参照して説明する。図2は本発明の第2の実施形態に係るレーザ加工装置の全体構成を示す模式図である。なお、特に説明しない本実施形態の構成及び動作については、上述した第1の実施形態と同様であるので、その重複する説明を省略する。   Next, a laser processing apparatus according to a second embodiment of the present invention will be described with reference to FIG. FIG. 2 is a schematic diagram showing an overall configuration of a laser processing apparatus according to the second embodiment of the present invention. Note that the configuration and operation of the present embodiment that are not specifically described are the same as those of the first embodiment described above, and therefore, redundant description thereof is omitted.

本実施形態と第1の実施形態とが異なる点は、レーザ導波手段5及び保護部材15の構成である。図2示すように、本実施形態では、レーザ導波手段5を構成する部材として光ファイバ30が用いられている。光ファイバ30は、レーザ光を通過させる芯材(コア)31と、芯材31の外側を被覆する被覆部(クラッド)32とを備えている。光ファイバ30の一端はレーザ光源1に接続されており、レーザ光源1で発生したレーザ光は芯材31の内部を全反射しながらその他端に伝達される。光ファイバ30の終端にはレンズ(レーザ光出射部)10が液密に取り付けられ、レーザ光はレンズ10から被加工物2に向けて照射される。光ファイバ30は容易にたわませることが可能であることから、第1の実施形態におけるレーザ導波手段5に比べて、光ファイバ30を用いたレーザ導波手段5は、その設置位置の自由度が高いという利点を有する。   The difference between the present embodiment and the first embodiment is the configuration of the laser waveguide means 5 and the protection member 15. As shown in FIG. 2, in this embodiment, an optical fiber 30 is used as a member constituting the laser waveguide means 5. The optical fiber 30 includes a core material (core) 31 that allows laser light to pass therethrough and a covering portion (cladding) 32 that covers the outside of the core material 31. One end of the optical fiber 30 is connected to the laser light source 1, and the laser light generated by the laser light source 1 is transmitted to the other end while totally reflecting the inside of the core material 31. A lens (laser light emitting unit) 10 is attached to the end of the optical fiber 30 in a liquid-tight manner, and the laser light is irradiated from the lens 10 toward the workpiece 2. Since the optical fiber 30 can be easily bent, the laser waveguide means 5 using the optical fiber 30 can be freely installed as compared with the laser waveguide means 5 in the first embodiment. It has the advantage of high degree.

本実施形態における保護部材15は、レンズ10から照射されたレーザ光の光軸に垂直な面に対して所定の角度θだけ傾けて設置されている。この理由は、保護部材15からの反射光がレーザ光源1に戻ってレーザ光源1に損傷を与えることを避けるため、ならびに被加工物2の表面で反射した反射光が再び保護部材15で反射し、被加工部を多重に加工することを避けるためである。なお、保護部材15は、液体の流れ23の上流側から下流側に向かって上方に傾斜するように設置されている。保護部材15は円板状の形状を有しており、その中心部には、保護部材15に対して垂直に延びる回転軸35が固定されている。この回転軸35にはモータ(図示せず)などを備えた移動機構16が連結されており、この移動機構16を駆動させることにより保護部材15と回転軸35とが一体に回転するようになっている。   The protection member 15 in the present embodiment is installed to be inclined by a predetermined angle θ with respect to a plane perpendicular to the optical axis of the laser light emitted from the lens 10. This is because the reflected light from the protection member 15 is prevented from returning to the laser light source 1 and damaging the laser light source 1, and the reflected light reflected from the surface of the workpiece 2 is reflected by the protection member 15 again. This is for avoiding multiple machining of the workpiece. The protective member 15 is installed so as to incline upward from the upstream side to the downstream side of the liquid flow 23. The protection member 15 has a disk shape, and a rotation shaft 35 extending perpendicularly to the protection member 15 is fixed at the center thereof. The rotating shaft 35 is connected to a moving mechanism 16 having a motor (not shown) and the like. By driving the moving mechanism 16, the protection member 15 and the rotating shaft 35 rotate integrally. ing.

本実施形態に係るレーザ加工装置は、保護部材15の被加工物2を向く表面に付着した加工屑等を除去するための円筒部材(清浄化手段)37を備えている。この円筒部材37は、その外周面が保護部材15の被加工物側の表面に接触するように配置されている。また、円筒部材37は、レンズ10からのレーザ光の照射及び液体の流れ23を妨げないような位置に設置されている。すなわち、円筒部材37は、液体の流れ23よりも上方に位置し、さらに、回転軸35に関してレーザ光の照射位置と略対称となる位置に配置されている。円筒部材37は、例えば、ポリビニルアルコール(PVA)などの材料から構成される。円筒部材37は、図示しない駆動源によりその軸心周りに回転可能に構成されている。この円筒部材37は、保護部材15との接触部において、円筒部材37の外周面と保護部材15の表面とが互いに反対方向に動くような方向に回転する。   The laser processing apparatus according to the present embodiment includes a cylindrical member (cleaning means) 37 for removing processing debris and the like attached to the surface of the protection member 15 facing the workpiece 2. The cylindrical member 37 is disposed so that the outer peripheral surface thereof is in contact with the surface of the protection member 15 on the workpiece side. Further, the cylindrical member 37 is installed at a position that does not interfere with the laser light irradiation from the lens 10 and the liquid flow 23. That is, the cylindrical member 37 is positioned above the liquid flow 23 and is further disposed at a position that is substantially symmetric with respect to the irradiation position of the laser beam with respect to the rotation shaft 35. The cylindrical member 37 is made of a material such as polyvinyl alcohol (PVA). The cylindrical member 37 is configured to be rotatable around its axis by a drive source (not shown). The cylindrical member 37 rotates in a direction in which the outer peripheral surface of the cylindrical member 37 and the surface of the protective member 15 move in opposite directions at the contact portion with the protective member 15.

このような構成において、保護部材15の表面に付着した加工屑や気泡は、保護部材15の回転(移動)に伴い、レーザ光の照射位置から円筒部材37が配置される位置まで移動される。そして、回転する円筒部材37により保護部材15の表面に付着した加工屑などが除去される。これにより、レーザ光が照射される保護部材15の部位は、常に清浄に維持され、レンズ10から照射されたレーザ光を良好に透過させることができる。このように、保護部材15が回転しながら連続的に清浄化されることにより、レーザ光を常に良好に被加工物に照射することができる。したがって、信頼度が向上すると共に、連続したレーザ加工を安定して行うことが可能となる。   In such a configuration, the processing waste and bubbles adhering to the surface of the protection member 15 are moved from the irradiation position of the laser light to the position where the cylindrical member 37 is disposed as the protection member 15 rotates (moves). And the processing waste adhering to the surface of the protection member 15 is removed by the rotating cylindrical member 37. Thereby, the site | part of the protection member 15 irradiated with a laser beam is always maintained clean, and can transmit the laser beam irradiated from the lens 10 satisfactorily. In this way, by continuously cleaning the protective member 15 while rotating, it is possible to always irradiate the workpiece with the laser beam satisfactorily. Therefore, reliability can be improved and continuous laser processing can be stably performed.

本発明の第1の実施形態に係るレーザ加工装置の全体構成を示す模式図である。1 is a schematic diagram illustrating an overall configuration of a laser processing apparatus according to a first embodiment of the present invention. 本発明の第2の実施形態に係るレーザ加工装置の全体構成を示す模式図である。It is a schematic diagram which shows the whole structure of the laser processing apparatus which concerns on the 2nd Embodiment of this invention.

符号の説明Explanation of symbols

1 レーザ光源
2 被加工物
3 保持部
4 容器
5 レーザ導波手段
8 反射鏡
9 鏡筒
10 レンズ(レーザ光出射部)
12 水平移動機構(相対移動機構)
13 液体
14 垂直移動機構(相対移動機構)
15 保護部材
16 移動機構
17 基台
20 給液口
21 排液口
22 高圧液供給源
23 液体の流れ
30 光ファイバ
31 芯材
32 被覆部
35 回転軸
37 円筒部材(清浄化部材)
DESCRIPTION OF SYMBOLS 1 Laser light source 2 Work piece 3 Holding part 4 Container 5 Laser waveguide means 8 Reflective mirror 9 Lens barrel 10 Lens (laser beam emitting part)
12 Horizontal movement mechanism (relative movement mechanism)
13 Liquid 14 Vertical movement mechanism (relative movement mechanism)
DESCRIPTION OF SYMBOLS 15 Protection member 16 Movement mechanism 17 Base 20 Liquid supply port 21 Drainage port 22 High pressure liquid supply source 23 Liquid flow 30 Optical fiber 31 Core material 32 Covering part 35 Rotating shaft 37 Cylindrical member (cleaning member)

Claims (8)

レーザ光を発生させるレーザ光源と、
被加工物を保持する保持部と、
前記被加工物と前記保持部とを液中に浸漬させる容器と、
レーザ光を前記レーザ光源から前記被加工物まで導くレーザ導波手段と、
前記レーザ導波手段のレーザ光出射部と前記被加工物との間に配置された保護部材と
レーザ光を横切る方向に前記保護部材を移動させる移動機構とを備え、
前記保護部材はレーザ光を透過させる材料から構成されることを特徴とするレーザ加工装置。
A laser light source for generating laser light;
A holding part for holding a workpiece;
A container for immersing the workpiece and the holding part in a liquid;
Laser waveguide means for guiding laser light from the laser light source to the workpiece;
A protective member disposed between the laser beam emitting portion of the laser waveguide means and the workpiece ;
A moving mechanism for moving the protective member in a direction crossing the laser beam ,
The laser processing apparatus, wherein the protective member is made of a material that transmits laser light.
前記被加工物と前記保護部材との間に液体の流れを発生させる液流れ発生機構を更に備えたことを特徴とする請求項1に記載のレーザ加工装置。  The laser processing apparatus according to claim 1, further comprising a liquid flow generation mechanism that generates a liquid flow between the workpiece and the protection member. 前記移動機構は、前記保護部材をその中心部周りに回転させることを特徴とする請求項1または2に記載のレーザ加工装置。  The laser processing apparatus according to claim 1, wherein the moving mechanism rotates the protection member around a central portion thereof. 前記保護部材の前記被加工物に面した表面を清浄にする清浄化手段を、レーザ光の照射を妨げない位置に設けたことを特徴とする請求項1乃至3のいずれか一項に記載のレーザ加工装置。  The cleaning means for cleaning the surface of the protection member facing the workpiece is provided at a position that does not interfere with laser light irradiation. Laser processing equipment. 被加工物を保持部により保持して前記被加工物を液中に浸漬させ、
レーザ導波手段のレーザ光出射部を前記被加工物に対向するように液中に配置し、
レーザ光を透過させる材料から構成された保護部材を前記レーザ光出射部と前記被加工物との間に配置し、
レーザ光を横切る方向に前記保護部材を移動させながら、レーザ光を前記レーザ導波手段を介して前記レーザ光出射部から液中の前記被加工物に照射することを特徴とするレーザ加工方法。
Hold the workpiece by the holding part and immerse the workpiece in the liquid,
The laser light emitting part of the laser waveguide means is disposed in the liquid so as to face the workpiece,
A protective member made of a material that transmits laser light is disposed between the laser light emitting portion and the workpiece,
A laser processing method, comprising: irradiating the workpiece in liquid from the laser light emitting portion through the laser waveguide means while moving the protective member in a direction crossing the laser light.
前記被加工物と前記保護部材との間に液体の流れを発生させながら、レーザ光を前記被加工物に照射することを特徴とする請求項5に記載のレーザ加工方法。  The laser processing method according to claim 5, wherein the workpiece is irradiated with laser light while generating a liquid flow between the workpiece and the protective member. 前記保護部材をその中心部周りに回転させながら、レーザ光を前記被加工物に照射することを特徴とする請求項5または6に記載のレーザ加工方法。  7. The laser processing method according to claim 5, wherein the workpiece is irradiated with laser light while rotating the protective member around a central portion thereof. レーザ光の照射を妨げない位置で、前記保護部材の前記被加工物に面した表面を清浄にしながら、レーザ光を前記被加工物に照射することを特徴とする請求項5乃至7のいずれか一項に記載のレーザ加工方法。  The laser beam is irradiated to the workpiece while cleaning the surface of the protective member facing the workpiece at a position that does not interfere with the laser beam irradiation. The laser processing method according to one item.
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