JP4201583B2 - Substrate storage container - Google Patents

Substrate storage container Download PDF

Info

Publication number
JP4201583B2
JP4201583B2 JP2002344954A JP2002344954A JP4201583B2 JP 4201583 B2 JP4201583 B2 JP 4201583B2 JP 2002344954 A JP2002344954 A JP 2002344954A JP 2002344954 A JP2002344954 A JP 2002344954A JP 4201583 B2 JP4201583 B2 JP 4201583B2
Authority
JP
Japan
Prior art keywords
cylinder
gas
check valve
valve
storage container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2002344954A
Other languages
Japanese (ja)
Other versions
JP2004179449A (en
Inventor
敦 角
順也 戸田
孝行 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Polymer Co Ltd
Original Assignee
Shin Etsu Polymer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2002344954A priority Critical patent/JP4201583B2/en
Application filed by Shin Etsu Polymer Co Ltd filed Critical Shin Etsu Polymer Co Ltd
Priority to DE60332644T priority patent/DE60332644D1/en
Priority to PCT/JP2003/012612 priority patent/WO2004038789A1/en
Priority to EP20030748661 priority patent/EP1555689B1/en
Priority to US10/496,932 priority patent/US7455180B2/en
Priority to KR1020047017214A priority patent/KR100607302B1/en
Priority to TW92128740A priority patent/TWI289534B/en
Publication of JP2004179449A publication Critical patent/JP2004179449A/en
Priority to US12/021,719 priority patent/US7658289B2/en
Priority to US12/034,040 priority patent/US7658290B2/en
Application granted granted Critical
Publication of JP4201583B2 publication Critical patent/JP4201583B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Description

【0001】
【発明が属する技術分野】
本発明は、半導体ウェーハやフォトマスクガラス等の基板を収納し、ガスパージ可能な基板収納容器に関し、特には基板収納容器の内外に対する気体の通過を制御するガスパージ用のバルブ体を備えた基板収納容器に関するものである。
【0002】
【従来の技術】
近年、半導体業界では、DRAM(Dynamic Random Access Memory)に代表されるように、半導体部品のコスト削減によるシェア争いが激化しており、これに伴い半導体製造のコストを削減するための生産システムの見直し、あるいは半導体部品の製造に使用される基板の大口径化(例えば、半導体ウェーハの場合300mmあるいはそれ以上)が実施されるようになってきている。
【0003】
半導体生産システムは、半導体製造工場全体を高度にクリーンな状態(例えば、クリーン度10以下)に維持して半導体部品を製造するという従来の方法から、基板の複数の処理工程を別々に区画して、こうして小さく区画された各内部空間を高度にクリーンな環境とし、各処理工程間の基板の受け渡しを基板収納容器を使用して行う方法に移行してきている。このような方法によれば、クリーンルーム建設の為の設備コストや設備維持の為のランニングコストを著しく削減することができ、しかも半導体の部品製造の歩留向上も可能である。
【0004】
こうした局所にクリーンな環境に区画されて分離されている半導体工場で使用される基板収納容器には、SEMI規格(E19、E47.1、E62、E63等)で定められていて、半導体製造工場内を自動機で搬送可能な搬送手段や自動機での蓋体の取り付け取り外しが可能なFIMS対応のものが備え付けられている。また、収納する基板を汚染しないように、高い密封性が求められたり、容器内部を清浄な状態にするため、容器内部からの揮発性ガスの発生の少ないクリーンな原材料を使用して形成することが求められている。
【0005】
しかしながら、昨今の半導体部品に形成される電子回路の最小線幅は益々低ピッチ化(0.10μm以下)の方向にあり、一部又は複数の半導体製造工程において収納容器に収納された基板表面の自然酸化膜の形成や有機汚染を防止するため、基板収納容器の内部空間を窒素等の不活性ガスあるいは水分を除去したドライエアで置換(ガスパージ)しておくことが有効であることが解ってきた。
この点に鑑み、基板収納容器の一部を開口させてフィルタを取り付けたり、開口の周縁部にチェックバルブ等のバルブを取り付けてガスパージする技術が提案されている。(特許文献1、2参照)
【0006】
【特許文献1】
特開平11−191587号公報(頁3−頁4、図1)
【特許文献2】
特表2002−521189号公報(頁11−18、図2)
【0007】
【発明が解決しようとする課題】
従来の基板収納容器は、以上のように構成されているので、以下のような問題点がある。ガスパージ用の開口にバルブを取り付ける場合、バルブを取り付ける係止構造が実に複雑になるという問題がある。さらに、通常のバルブの場合、中空部に狭い開口が設けられこれを閉鎖する開閉弁が開口部に設けられるテーパー部と接触してシールを行う構造になっているが、繰り返し使用するときに位置ずれし易く、シールが不完全になり易く漏れが生じやすいといった問題があった。
【0008】
本発明は、上記した問題に鑑みてなされたものであり、繰り返し使用してもバルブが安定的に作動可能で、パージの効果を長時間維持することができるともに、簡単な構造で取り付け取り外しができ、比較的短時間で効率よくガスパージを行えるガスパージ用バルブを備えた基板収納容器を提供することを目的とする。
【0009】
【課題を解決するための手段】
本発明においては上記課題を解決するため、基板を収納する容器本体と、この容器本体の開口を開閉する蓋体と、これら容器本体と蓋体の少なくとも一方の貫通孔に取り付けられて容器本体に対する気体の流通を制御するバルブ体とを備え、貫通孔の周囲にリブを形成したものであって、
バルブ体は、貫通孔に嵌められて外周面のフランジを貫通孔周囲のリブに接触させる有底円筒形の固定筒と、貫通孔に嵌められて固定筒に着脱自在に螺子嵌めされ、外周面のフランジを貫通孔の開口周縁に接触させる円筒形の保持筒と、この保持筒の内側壁に保持される通気性の中蓋筒と、固定筒と保持筒に隙間を介して内蔵される逆止弁と、この逆止弁を移動可能に支持する弾性支持部材とを含み、固定筒の内側壁と逆止弁の外側壁との間に、気体の通路となる隙間を形成し、中蓋筒の内面に第一の係合部を形成し、逆止弁には、固定筒の周縁あるいは中蓋筒の開口端部と接触し、かつ弾性支持部材に押される方向の接触部分に潰されてシールを形成するシール部材を装着するとともに、中蓋筒の第一の係合部と係合する第二の係合部を形成し、
気体の圧力により逆止弁が第一、第二の係合部に制御されて移動する際にシールを解除し、固定筒の内側壁と逆止弁の外側壁との間の隙間を介して気体を流通可能としたことを特徴としている。
なお、保持筒と中蓋筒との間にフィルタを備えることができる。
【0010】
また、逆止弁の作動時に位置ずれを防止する為に逆止弁に設けられる第二の係合部と、逆止弁に相対する中蓋筒の内面に設けられる第一の係合部とは、互いに係合可能な形状で有れば良く、円筒形の突起とこれが嵌り込む円筒形状の凹部とか、傾斜側面を有する円錐状や角錐状の突起とこれらが嵌り込む傾斜側壁を有する凹部などの組合わせとして設けることができる。
【0011】
ここで、特許請求の範囲における容器本体には、単数複数の半導体ウェーハやフォトマスクガラス等の基板が適宜収納される。この容器本体の開口は、正面、上面、底面、側面の何れでも良い。気体は、窒素などの不活性ガスやドライエアーが主であるが、何らこれに限定されるものではない。また、バルブ体は、単数複数何れでも良いし、容器本体と蓋体の貫通孔にそれぞれ設けても良く、蓋体の貫通孔に設けても良い。
【0012】
【発明の実施の形態】
以下、図面を使って本発明の好ましい実施形態を説明する。本発明の実施形態の基板収納容器は、図1〜図7に示すように、一端に開口を有し1又は複数枚の基板Wを水平状態の向きで垂直方向に整列させて、収納する容器本体と、容器本体の開口を着脱自在に閉鎖する蓋体10と、容器本体1の底部に配置されて容器本体1に対する気体の流通を制御する少なくとも1対のバルブ体20とを備え、この複数のバルブ体20のうち一方をガス導入バルブ20A、他方をガス排気バルブ20Bとして設けている。このとき導入バルブと排出バルブは、収納する基板が容器本体1底面に投影される領域の外側に設けるのが好ましい。
【0013】
容器本体1としては、図1に示すように、例えば炭素繊維や導電性ポリマーなどが添加され導電性が付与されたポリカーボネート樹脂を使用して一端が開口したフロントオープンボックスタイプとして形成される。容器本体1内部の相対する側壁には、基板Wの側部周縁を支持する支持部材が垂直方向に一定間隔で設けられている。この容器本体1の底部には、基板収納容器の種類を外部から検知したり、加工装置に搭載されるときの位置決めと固定を行う部材を備え略Y字形に形成されるボトムプレート2が取り付け部材を介して装着されている。ボトムプレート2には、識別用の部材を取り付ける複数の貫通孔と、位置決め部材3、容器本体1を固定するためのクランプ穴が形成されている。
【0014】
容器本体1の天井には略正方形をした天板部と天板部と垂直方向に延びる支柱部及びその先端の取り付け部とを有するロボティックハンドル6が着脱自在に装着され、このハンドル6がOHT(オーバーヘッドホイストトランスファー)と呼ばれる自動の天井搬送機に保持され、工程内及び工程間の搬送に使用される。また、容器本体1の開口正面には、蓋体10嵌合用のリム部7が一体に形成され、このリム部7内面の上下面には、蓋体10係止用の係止溝8が複数形成されている。容器本体1の外側壁には、手動にてハンドリングするときに使用される把持ハンドル9が着脱自在に装着される。
【0015】
蓋体10は図1に示すように、四隅が丸く湾曲した略矩形に形成され、内部には図示しない係止機構が配置されていて、この係止機構の先端の係止爪が蓋体10の周壁に設けられた出没穴から突出されてリム部7の係止溝8に嵌入し、容器本体1と蓋体10とを嵌合させて開口部を閉鎖する。蓋体10の周壁には容器本体1との間にシールを形成するエンドレス形状のガスケット部材13が取り付けられている。また、蓋体10の裏面には容器本体1に収納された基板Wを所定のピッチで上下方向に水平に整列させて接触し支持するフロントリテーナ12が装着される。
【0016】
なお、容器本体1、ボトムプレート2、ロボティックハンドル6、1対の把持ハンドル9、蓋体10は、ポリカーボネート、ポリエーテルエーテルケトン、ポリエーテルイミド、環状オレフィン樹脂(COP)などの熱可塑性樹脂、あるいはこれらの熱可塑性樹脂に導電性を付与したものから形成される。
【0017】
各バルブ体20は、図3に示すように、貫通孔4及びその周縁のリブ5に下方から嵌入されて気体を流通させる固定筒21と、貫通孔4にシール用のシール部材30を介して上方から嵌入されて固定筒21に上方から着脱自在に螺嵌される保持筒25と、保持筒25の内周壁に取り付けられ、保持筒25との間にフィルタ36を保持する中蓋筒34とこれら固定筒21と保持筒25との間に内蔵され中蓋部材の開口一端と接触する逆止弁31と、この逆止弁31を一方から押圧して変形させる弾性部材33とからなる。
逆止弁31は、固定筒21から保持筒25にかけて気体が一方向に流れるように制御している。
【0018】
固定筒21は、例えばポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン等の熱可塑性樹脂を使用して基本的には、一端に開口を有する有底円筒形に形成され、内周面には取り付け用の螺子溝22が螺刻形成されている。この固定筒21の底部中心には、気体流通用の丸い通気口23が形成され、底部の外周面には半径外方向に伸びるリング状のフランジ24が周設されており、リブ5の開口周縁部に接触する。
【0019】
保持筒25は、例えばポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン等の熱可塑性樹脂を使用して基本的には、一端(底部側)に開口を有する円筒形に形成され、開口と相対する他端(上面側)には、気体流通用の複数の通気口23を区画する区画リブ26が格子状又は放射状に配設されていて、この区画リブ26の裏面には、フィルタ36を収納する収納部が形成される。また、保持筒25の上部外周面には、半径外方向に伸びるリング状のフランジ28が周設され、このフランジ28が貫通孔4の開口周縁に接触する。
【0020】
保持筒25の外周面には、取付用の螺子溝29が螺刻形成され、この螺子溝29が固定筒21の螺子溝22と螺合する。保持筒25の外周面と貫通孔4の周面との間に介在されるシール部材30は、容器本体1に対する外気の侵入や容器本体1からの気体の漏れを有効に防止する。
【0021】
逆止弁31は、熱可塑性樹脂を使用して断面コの字形の平面略円形に形成され、固定筒21の内底面に嵌入搭載されて、丸い通気口23を被覆し、保持筒25の内周面との間に気体の流路となる僅かな隙間32を形成している。逆止弁31の中央部には、位置ずれ防止用の第二の係合部となる凹部又は、円周状リブが形成されている。この逆止弁31の材料としては、ポリエチレンやポリプロピレン、ポリカーボネート、環状ポリオレフィン樹脂あるいは熱可塑性ポリエステル系エラストマー等の各種熱可塑性エラストマー材料があげあれる。逆止弁31の固定筒21の開口周縁部あるいは中蓋の開口端部と接触する部分には、これらによって押圧可能なシール部材37、38が装着されている。シール部材37、38は、フッ素ゴム、NBRゴム、ウレタンゴム、EPDMゴム、シリコーンゴム等の材料から形成される。またこれらの材料からなる芯材部の表面にフッ素シリコーンを被覆したり、コーティングしたりしても良い。
【0022】
逆止弁31は、バルブ体20がガス導入バルブ20Aとして利用されるときには、固定筒21の通気口23を被覆するように弾性部材33に押圧されるが、バルブ体20がガス排気バルブ20Bとして利用される場合には、弾性変形部材と上下逆に配置され、弾性変形部材によって中蓋部材の開口端部に接触するように押圧されている。
【0023】
弾性部材33は、SUSなどの金属スプリングや樹脂製のスプリングを用いることができる。また、弾性部材33は各種ゴムや熱可塑性エラストマー樹脂等から形成される板バネを使用することもできる。その他、弾力性を有する合成樹脂の発泡体、各種ゴムや熱可塑性エラストマーからなる支柱部材を用いることもできる。ここで金属部品を使用するときには、表面を樹脂でコーティングする事が好ましい。
【0024】
中蓋筒34は、例えばポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン等の熱可塑性樹脂を使用して基本的には、一端(底部側)に開口を有する円筒形に形成され、開口と相対する他端(上面側)には、気体流通用の複数の通気口23を区画する区画リブ26が格子状又は放射状に配設されていて、この区画リブ26の上面には、フィルタ36が搭載保持される。中蓋筒34は、保持筒25の内部上方との間にシールを確保するシール部材30を備えている。中蓋筒34の内面中央には、逆止弁31を組み立てるときや逆止弁31が可動するときの位置ずれを防止する第一の係合部39となる円筒状の突起が突出形成されていて、バルブ体20表面に設けられる第二の係合部40である凹部と嵌合する。このように、逆止弁31の可動時の位置を制御する機構を設けたので、繰り返し使用しても逆止弁31の作動が安定化して、逆止弁31が作動の途中で引っかかったりしてバルブが開き放しになったり、気体の流路を塞いで気体の置換が上手くできないという事故を防止できる。
【0025】
フィルタ36は、四フッ化エチレン、ポリエステル繊維、フッ素樹脂等からなる多孔質膜、ガラス繊維等からなる分子濾過フィルタ36、活性炭繊維等の濾材に化学吸着剤を担持させたケミカルフィルタ36から選択されてなり、これらが保持筒25の段差27と中蓋筒34の区画リブ26との間に狭持された状態で、単数、複数枚挿入され、中蓋筒34の通気口23を被覆する。これらのフィルタ36の表面と裏面には、ポリエチレンやポリプロピレン等からなり、円周状の枠体とを連結する格子状のリブとして形成される。同種類のフィルタ36を使用しても良いが、異なる性質のフィルタ36を組み合わせるとパーティクルの他有機物汚染を防止できて好ましい。
【0026】
上記構成において、バルブ体20をガス導入バルブ20Aとして利用する場合、不活性ガスやドライエアからなる気体が外部から供給されないときは、中蓋筒34の開口周端部に保持されている弾性部材33が弾性力によって略平板状の逆止弁31を固定筒21の内定面に押しつけるようになるが、逆止弁31の固定筒21の内底面と相対する表面には、シール部材37としてOリングが突出するように備えられていて、これらの接触部でシールを形成している。ここで、Oリングを接触する平面で潰しているので、確実にシール可能である。
【0027】
これに対し、加工装置の気体導入部からバルブ体20に不活性ガスやドライエアからなる気体が供給されるときには、噴出する気体の圧力によって逆止弁31が保持筒25の方向に押し圧されるので、固定筒21の開口のシールが解除されて気体をバルブ体20内部を通って基板収納容器内部へ流通可能となる。すなわち、気体は、固定筒21の通気口23と逆止弁31との隙間32、逆止弁31と保持筒25との隙間32を介して、中蓋筒34の中空部へ侵入し中蓋筒34と保持筒25に狭持されたフィルタ36を介して基板収納容器内部へと流入する。
【0028】
また、バルブ体20がガス排気バルブ20Bとして利用される場合には、弾性部材33が弾性力によって逆止弁31を中蓋筒34の開口端部に押しつけられる。このとき、バルブ体20の開口端部と相対する側の側壁に断面L字状をしたシール部材38が備えられていて、中蓋筒34の開口端部と面接触してシールを安定的に形成する。したがって、基板収納容器の外部から内部に気体等が流入したり、基板収納容器の内部から外部へ気体が漏れるのが有効に防止される。
【0029】
これに対し、基板収納容器の内部に気体が充満してくると、充満する気体の圧力によって逆止弁31が固定筒21の方向に押圧されるので、中蓋筒34と逆止弁31との間のシールが解除されて気体をバルブ体20内部を通って基板収納容器外部へ排気可能となる。すなわち、気体は、基板収納容器内部から中蓋筒34と保持筒25に狭持されたフィルタ36を介して中蓋筒34の中空部へ侵入し、逆止弁31と保持筒25との隙間32Aを通って、逆止弁31との隙間32を通って固定筒21の通気口23から基板収納容器の外部(加工装置の排気ノズル部)へと排気される。この時、排気用のノズル部を減圧しておくとより効率よく気体の置換が可能となる。
【0030】
本発明の実施形態では、バルブ体20のシール形成シール部材37、38を保持する面と垂直方向に押圧しているので、導入バルブとして用いても排気バルブとして用いてもそれぞれ確実にシールを形成することができる。したがって基板収納容器内部に置換された気体の保持時間が長くなり、ガスパージの効果がより長く持続される。また、バルブ体20に収納される逆止弁31の外周側の複数の通気用の隙間32を通って気体が置換されるので、従来例のように中央1箇所の狭い内部空間を通って置換される場合に比べて、より効率よく気体の置換が行えるので、生産性が向上する。
【0031】
本発明のバルブ体20付き基板収納容器は、蓋体10開閉装置(ロードポート又は蓋体オープナ)に載置されたときに気体の置換が行う事もできるし、ストッカでの保管中や工程内やストッカへの搬送途中に行うこともできる。このとき装置側には図8、図9に示したような給気ノズル部と排気ノズル部とそれぞれの気体の流路を備えた気体パージ用治具72を設けておき、その上に基板収納容器をセットすることで気体の置換を行うことができる。前記治具72の表面には、基板収納容器を位置決めピン73がY字状に3箇所設けられておくことが好ましい。バルブ体20と対面する位置には少なくとも1対の給気ノズル部70と排気ノズル部71が円筒形状の突起としてバルブ体20と相対する位置に形成されていて、治具72の内部には給気流路74と排気流路75とが形成されていて、それぞれ気体供給源や排気装置へと連通している。なお、給気ノズル部70と排気ノズル部71は、移動可動に設けておき、治具の表面を使用前は平面状にしておき、基板収納容器が載置され後に、給気ノズル部70と排気ノズル部71のそれぞれを、バルブ体20A、20Bに接近させるようにしても良い。また、給気ノズル部70と排気ノズル部71の突起周辺には、パージする気体の漏れを防止するシール形成手段を設けておくことが好ましい。
【0032】
図10、図11は、本発明のバルブ体20の別の実施形態を表す断面図であり、この場合はガス導入側の逆止弁31とガス排気側の逆止弁31とを兼用化可能な構造としてたものである。バルブ体20は、中央の円板部分と周縁部のシール部材37、38保持部とからなり、中央部には、中蓋筒34の中央に設けられる第一の係合部39と嵌合可能な第二の係合部40が形成されている。シール部材保持部41及び/又は第二の係合部40である凹部は、円板部分の両面に設けておき、導入バルブとして使用するときと、排気バルブとして使用するときとで、バルブ体20組立時の挿入方向を変えて、シールが必要な箇所にシール部材37、38を挿入することが可能となる。この場合使用する部品の共通化を行ったので、組み立て作業や管理の効率化が可能となる。
【0033】
次に兼用化についてさらに詳細を説明する。図10は本実施形態のバルブ体20をガス導入バルブ20Aとして使用する場合を表す断面図であり、図11は、本実施形態のバルブ体20をガス排気バルブ20Bとして使用する場合を表す断面図である。この場合、逆止弁20の上下を逆さまにして固定筒21と中蓋筒34の間に組み込み、これに合わせて弾性部材33の設置位置すなわち逆止弁のシール方向を変えることで、ガス導入バルブとガス排気バルブとを兼用化することができる。逆止弁の兼用化は本実施形態に止まらず、逆止弁31の上下両面にシール部材保持部41を設けておき、そこに必要に応じてシール部材を取り付けても良いし、逆止弁31の上下両面に中蓋筒34の第一の係合部39と嵌合可能な第二の係合部40となる凹部と弾性部材33収納部を設けて於いても良い。この場合、逆止弁31を兼用化しても逆止弁31の向きは変えずに、弾性部材の取り付け位置を替えるだけでそのまま使用できる。
【0034】
本発明のバルブ体20を設ける位置及び個数は、特に限定されるものでなく、開口側とリア側にそれぞれ2個のバルブ体20を設けても良いし、開口部に1対のバルブ体20を設けたり、リア側に1対のバルブ体20を設けたりしても良い。
【0035】
中蓋筒に設けられる第一の係合部39は、上記実施形態で示した突起の他、溝部や周囲をリブで囲まれた凹部として形成しても良く、この場合逆止弁には、前記溝部や凹部と係合する突起部を第二の係合部40として形成してこれらを係合させると良い。
【0036】
【発明の効果】
以上のように本発明によれば、逆止弁の可動時の位置ずれ防止用の係合部を設けたので、繰り返し使用しても、安定して気体を置換することができるという効果がある。また、バルブ体に収納される逆止弁の外側の通気用の隙間を通過して気体が置換されるので、従来例のように中央一箇所の狭い内部空間を通過して置換される場合に比べ、より効率良く気体の置換を行うことができ、生産性の向上を図ることができる。さらに、面押圧で確実にシールを形成しているので、置換した気体の漏れを防いで長時間の維持を図ることができる。
【0037】
【実施例】
上記した図4,図6に示した1対のバルブ体を取り付けた本発明の基板収納容器を窒素ガスで置換したときの酸素濃度と、このような低酸素の状態を維持できる保持時間の測定を行った。その結果は、窒素ガスを20L/分の割合で供給していくと、酸素濃度を10ppm以下に低下させるのに約15分で可能であった。また、この状態で窒素ガスの供給を止めて、基板収納容器を放置しておくときの酸素濃度の変化を調べると酸素濃度が1%まで上昇するのに約5時間を要しており、このように基板を加工途中で一時保管するときなど低酸素状態を一定の時間維持できるので、基板の汚染や表面の酸化を抑制することができる。
比較のため従来技術で取り上げたバルブ付きの基板収納容器を使用した場合、酸素濃度が10ppmから1%まで上昇するのに約70分しか要さなかった。なお、測定は基板収納容器に2箇所の貫通穴部を設けて、2箇所の貫通穴を結ぶように測定用の配管経路を作成し、配管経路の途中に酸素濃度計を設置して酸素濃度の測定を1分毎に行った。貫通穴の周囲を密閉したのち、基板収納容器内部に導入バルブを介して窒素ガスを一定速度で供給した。また、酸素濃度は東レエンジニアリング社製の酸素濃度計(測定レンジ0.1ppm〜100VOL%)を使用した。
【図面の簡単な説明】
【図1】本発明に係わる基板収納容器の実施形態を表す分解斜視図。
【図2】本発明に係わる基板収納容器の実施形態における容器本体を表す底面図。
【図3】本発明に係わる基板収納容器の実施形態におけるバルブ体を示す分解斜視図。
【図4】本発明に係わる基板収納容器の実施形態におけるガス導入バルブを表す断面説明図。
【図5】図4のガス導入バルブに気体が供給される状態を表す断面説明図。
【図6】本発明に係わる基板収納容器の実施形態におけるガス排気バルブを表す断面説明図。
【図7】図6のガス排気バルブから気体が排気される状態を表す断面説明図。
【図8】本発明に係わる基板収納容器にガス置換をするためのガス給排気治具を表す平面図。
【図9】図8に示した治具を表す側面図。
【図10】本発明に係わる基板収納容器の別の実施形態におけるガス導入バルブを表す断面説明図。
【図11】本発明に係わる基板収納容器の別の実施形態におけるガス排気バルブを表す断面説明図。
【符号の説明】
1 容器本体
4 貫通孔
5 リブ
10 蓋体
20 バルブ体
20A ガス導入バルブ
20B ガス排気バルブ
21 固定筒
22 螺子溝
23 通気口
24 フランジ
25 保持筒
28 フランジ
29 螺子溝
30 シール部材
31 逆止弁
32 隙間
32A 隙間
33 弾性部材
34 中蓋筒
36 フィルタ
37 シール部材
38 シール部材
39 第一の係合部
40 第一の係合部
41 シール部材保持部
70 給気ノズル部
71 排気ノズル部
W 基板
[0001]
[Technical field to which the invention belongs]
The present invention relates to a substrate storage container that can store a substrate such as a semiconductor wafer or a photomask glass and can perform gas purge, and more particularly, to a substrate storage container that includes a gas purging valve body that controls the passage of gas to the inside and outside of the substrate storage container. It is about.
[0002]
[Prior art]
In recent years, as represented by DRAM (Dynamic Random Access Memory) in the semiconductor industry, competition for shares due to cost reduction of semiconductor components has intensified, and accordingly, review of production systems to reduce the cost of semiconductor manufacturing Alternatively, an increase in the diameter of a substrate used for manufacturing a semiconductor component (for example, 300 mm or more in the case of a semiconductor wafer) has been implemented.
[0003]
In the semiconductor production system, a plurality of substrate processing steps are divided separately from the conventional method of manufacturing a semiconductor component while maintaining the entire semiconductor manufacturing factory in a highly clean state (for example, a cleanness of 10 or less). As a result, the internal space thus partitioned is made into a highly clean environment, and a method of transferring a substrate between processing steps using a substrate storage container has been shifted. According to such a method, the equipment cost for constructing the clean room and the running cost for maintaining the equipment can be remarkably reduced, and the yield of semiconductor component manufacturing can be improved.
[0004]
Substrate storage containers used in semiconductor factories that are partitioned and separated in such a locally clean environment are defined by SEMI standards (E19, E47.1, E62, E63, etc.) Is provided with a FIMS-compatible device capable of transporting the lid with an automatic machine and capable of attaching and removing the lid with the automatic machine. In addition, in order to prevent contamination of the substrate to be stored, high sealing performance is required, or in order to clean the inside of the container, it must be formed using clean raw materials that generate little volatile gas from the inside of the container. Is required.
[0005]
However, the minimum line width of electronic circuits formed in recent semiconductor components is increasingly in the direction of decreasing pitch (0.10 μm or less), and the surface of a substrate stored in a storage container in a part or a plurality of semiconductor manufacturing processes. In order to prevent the formation of natural oxide film and organic contamination, it has been found effective to replace the internal space of the substrate storage container with an inert gas such as nitrogen or dry air from which moisture has been removed (gas purge). .
In view of this point, a technique has been proposed in which a part of the substrate storage container is opened to attach a filter, or a valve such as a check valve is attached to the periphery of the opening to perform gas purging. (See Patent Documents 1 and 2)
[0006]
[Patent Document 1]
Japanese Patent Laid-Open No. 11-191487 (page 3 to page 4, FIG. 1)
[Patent Document 2]
Japanese translation of PCT publication No. 2002-521189 (page 11-18, FIG. 2)
[0007]
[Problems to be solved by the invention]
Since the conventional substrate storage container is configured as described above, it has the following problems. When a valve is attached to the opening for gas purge, there is a problem that a locking structure for attaching the valve is actually complicated. Furthermore, in the case of a normal valve, a narrow opening is provided in the hollow portion, and an on-off valve that closes the opening is in contact with a tapered portion provided in the opening portion to perform sealing. There is a problem in that it easily shifts, the seal tends to be incomplete, and leakage tends to occur.
[0008]
The present invention has been made in view of the above-described problems. The valve can be stably operated even after repeated use, and the purge effect can be maintained for a long time. An object of the present invention is to provide a substrate storage container including a gas purge valve that can perform gas purge efficiently in a relatively short time.
[0009]
[Means for Solving the Problems]
In the present invention, in order to solve the above-described problem, a container main body that accommodates a substrate, a lid that opens and closes an opening of the container main body, and is attached to at least one through-hole of the container main body and the lid body and A valve body for controlling the flow of gas, and formed ribs around the through hole,
The valve body is fitted into the through-hole and has a bottomed cylindrical fixed cylinder that contacts the flange on the outer peripheral surface with the rib around the through-hole, and is fitted into the through-hole and is detachably screwed into the fixed cylinder. A cylindrical holding cylinder that contacts the peripheral edge of the opening of the through hole, a breathable inner lid cylinder that is held on the inner wall of the holding cylinder, and a reverse that is built into the fixed cylinder and the holding cylinder via a gap. A check valve and an elastic support member that movably supports the check valve. A gap serving as a gas passage is formed between the inner wall of the fixed cylinder and the outer wall of the check valve. A first engagement portion is formed on the inner surface of the cylinder, and the check valve is crushed by a contact portion in a direction in which it is in contact with the peripheral edge of the fixed cylinder or the open end of the inner lid cylinder and is pressed by the elastic support member. A seal member that forms a seal is mounted and a second engagement portion that engages with the first engagement portion of the inner lid cylinder is formed. And,
When the check valve moves under the control of the first and second engaging portions by the pressure of the gas, the seal is released, and through the gap between the inner wall of the fixed cylinder and the outer wall of the check valve It is characterized by allowing gas to flow.
A filter can be provided between the holding cylinder and the inner lid cylinder.
[0010]
A second engagement portion provided in the check valve to prevent displacement when the check valve is operated; and a first engagement portion provided on the inner surface of the inner lid cylinder facing the check valve; Need only be in a shape that can be engaged with each other, such as a cylindrical projection and a cylindrical recess into which it fits, a conical or pyramidal projection having an inclined side surface, and a recess having an inclined side wall into which these fit. Can be provided as a combination.
[0011]
Here, the container body in the claims appropriately accommodates a plurality of substrates such as semiconductor wafers and photomask glass. The opening of the container body may be any of the front, top, bottom and side surfaces. The gas is mainly an inert gas such as nitrogen or dry air, but is not limited to this. In addition, the valve body may be a single or a plurality of valve bodies, may be provided in the through holes of the container main body and the lid body, or may be provided in the through holes of the lid body.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. As shown in FIGS. 1 to 7, the substrate storage container according to the embodiment of the present invention has an opening at one end, and stores one or a plurality of substrates W by aligning them vertically in the horizontal direction. A plurality of main bodies, a lid body 10 that detachably closes the opening of the container body, and at least one pair of valve bodies 20 that are disposed at the bottom of the container body 1 and that control the flow of gas to the container body 1. One of the valve bodies 20 is provided as a gas introduction valve 20A and the other as a gas exhaust valve 20B. At this time, the introduction valve and the discharge valve are preferably provided outside the region where the substrate to be stored is projected onto the bottom surface of the container body 1.
[0013]
As shown in FIG. 1, the container body 1 is formed as a front open box type having one end opened using, for example, a polycarbonate resin to which carbon fiber, a conductive polymer, or the like is added to impart conductivity. Support members that support the peripheral edges of the side of the substrate W are provided at regular intervals on the opposing side walls inside the container body 1. At the bottom of the container body 1, a bottom plate 2 formed in a substantially Y shape is provided with a member for detecting the type of the substrate storage container from the outside and positioning and fixing when mounted on a processing apparatus. It is mounted through. The bottom plate 2 is formed with a plurality of through holes for attaching an identification member, a positioning member 3, and a clamp hole for fixing the container body 1.
[0014]
A robotic handle 6 having a substantially square top plate portion, a column portion extending perpendicularly to the top plate portion, and an attachment portion at the tip thereof is detachably mounted on the ceiling of the container body 1, and this handle 6 is attached to the OHT. It is held by an automatic ceiling transport machine called (overhead hoist transfer) and used for transport within and between processes. Further, a rim portion 7 for fitting the lid body 10 is integrally formed on the front surface of the opening of the container body 1, and a plurality of locking grooves 8 for locking the lid body 10 are formed on the upper and lower surfaces of the inner surface of the rim portion 7. Is formed. A grip handle 9 used for manual handling is detachably attached to the outer wall of the container body 1.
[0015]
As shown in FIG. 1, the lid body 10 is formed in a substantially rectangular shape with four rounded corners, and a locking mechanism (not shown) is arranged inside. The locking claw at the tip of the locking mechanism is a lid body 10. It protrudes from the intrusion hole provided in the peripheral wall of the rim, and is fitted into the locking groove 8 of the rim portion 7, and the container body 1 and the lid body 10 are fitted to close the opening. An endless gasket member 13 that forms a seal with the container body 1 is attached to the peripheral wall of the lid 10. Further, a front retainer 12 is mounted on the back surface of the lid 10 for supporting the substrate W accommodated in the container main body 1 by aligning it horizontally in the vertical direction at a predetermined pitch.
[0016]
The container body 1, the bottom plate 2, the robotic handle 6, the pair of grip handles 9, and the lid body 10 are made of a thermoplastic resin such as polycarbonate, polyetheretherketone, polyetherimide, or cyclic olefin resin (COP), Or it forms from what provided electroconductivity to these thermoplastic resins.
[0017]
As shown in FIG. 3, each valve body 20 is inserted into the through-hole 4 and the peripheral rib 5 from below so as to circulate gas, and the through-hole 4 via a seal member 30 for sealing. A holding cylinder 25 that is inserted from above and is detachably screwed into the fixed cylinder 21 from above, and an inner lid cylinder 34 that is attached to the inner peripheral wall of the holding cylinder 25 and holds the filter 36 between the holding cylinder 25 and A check valve 31 is provided between the fixed cylinder 21 and the holding cylinder 25 and comes into contact with one end of the opening of the inner lid member, and an elastic member 33 that presses and deforms the check valve 31 from one side.
The check valve 31 controls the gas to flow in one direction from the fixed cylinder 21 to the holding cylinder 25.
[0018]
The fixed cylinder 21 is basically formed in a bottomed cylindrical shape having an opening at one end, for example, using a thermoplastic resin such as polycarbonate, polyetherimide, polyetheretherketone, etc., and is attached to the inner peripheral surface. The screw groove 22 is formed by threading. A round air vent 23 for gas flow is formed in the center of the bottom of the fixed cylinder 21, and a ring-shaped flange 24 extending radially outward is provided on the outer peripheral surface of the bottom, and the opening periphery of the rib 5 is provided. Touch the part.
[0019]
The holding cylinder 25 is basically formed in a cylindrical shape having an opening at one end (bottom side) using, for example, a thermoplastic resin such as polycarbonate, polyetherimide, polyetheretherketone, etc. At the end (upper surface side), partition ribs 26 for partitioning a plurality of gas flow vents 23 are arranged in a lattice shape or a radial shape, and a housing for storing the filter 36 is placed on the back surface of the partition ribs 26. Part is formed. Further, a ring-shaped flange 28 extending in the radially outward direction is provided around the upper outer peripheral surface of the holding cylinder 25, and this flange 28 contacts the opening periphery of the through hole 4.
[0020]
A screw groove 29 for attachment is formed on the outer peripheral surface of the holding cylinder 25, and the screw groove 29 is screwed with the screw groove 22 of the fixed cylinder 21. The seal member 30 interposed between the outer peripheral surface of the holding cylinder 25 and the peripheral surface of the through-hole 4 effectively prevents intrusion of outside air into the container main body 1 and gas leakage from the container main body 1.
[0021]
The check valve 31 is formed in a substantially circular plane with a U-shaped cross section using a thermoplastic resin, is fitted and mounted on the inner bottom surface of the fixed cylinder 21, covers the round vent 23, and A slight gap 32 is formed between the peripheral surface and a gas flow path. In the central portion of the check valve 31, a concave portion or a circumferential rib serving as a second engagement portion for preventing displacement is formed. Examples of the material of the check valve 31 include various thermoplastic elastomer materials such as polyethylene, polypropylene, polycarbonate, cyclic polyolefin resin, and thermoplastic polyester elastomer. Seal members 37, 38 that can be pressed by these are attached to the peripheral portion of the fixed cylinder 21 of the check valve 31 or the portion that contacts the open end of the inner lid. The seal members 37 and 38 are made of a material such as fluorine rubber, NBR rubber, urethane rubber, EPDM rubber, or silicone rubber. Further, the surface of the core portion made of these materials may be coated with fluorosilicone or may be coated.
[0022]
When the valve body 20 is used as the gas introduction valve 20A, the check valve 31 is pressed by the elastic member 33 so as to cover the vent 23 of the fixed cylinder 21, but the valve body 20 is used as the gas exhaust valve 20B. When used, it is disposed upside down with respect to the elastic deformation member, and is pressed by the elastic deformation member so as to come into contact with the opening end of the inner lid member.
[0023]
The elastic member 33 can be a metal spring such as SUS or a resin spring. Further, the elastic member 33 can be a leaf spring formed of various rubbers, thermoplastic elastomer resins, or the like. In addition, a support made of a synthetic resin foam having elasticity, various rubbers, or a thermoplastic elastomer can be used. When using a metal part here, it is preferable to coat the surface with resin.
[0024]
The inner lid cylinder 34 is basically formed in a cylindrical shape having an opening at one end (bottom side) using, for example, a thermoplastic resin such as polycarbonate, polyetherimide, polyetheretherketone, and is opposed to the opening. On the other end (upper surface side), partition ribs 26 for partitioning a plurality of gas flow vents 23 are arranged in a lattice shape or radially, and a filter 36 is mounted and held on the upper surface of the partition ribs 26. Is done. The inner lid cylinder 34 includes a seal member 30 that secures a seal with the upper part of the holding cylinder 25. At the center of the inner surface of the inner lid cylinder 34, a cylindrical protrusion is formed as a first engaging portion 39 that prevents a displacement when the check valve 31 is assembled or when the check valve 31 is movable. Thus, the second engaging portion 40 provided on the surface of the valve body 20 is engaged with the concave portion. As described above, since the mechanism for controlling the position of the check valve 31 when it is moved is provided, the operation of the check valve 31 is stabilized even if it is repeatedly used, and the check valve 31 is caught during the operation. Thus, it is possible to prevent accidents in which the valve is left open or the gas passage is blocked and the gas cannot be replaced successfully.
[0025]
The filter 36 is selected from a porous membrane made of tetrafluoroethylene, polyester fiber, fluorine resin, etc., a molecular filtration filter 36 made of glass fiber, etc., or a chemical filter 36 in which a chemical adsorbent is supported on a filter medium such as activated carbon fiber. In a state where these are sandwiched between the step 27 of the holding cylinder 25 and the partition rib 26 of the inner lid cylinder 34, a single or a plurality of them are inserted to cover the vent hole 23 of the inner lid cylinder 34. The front and back surfaces of these filters 36 are made of polyethylene, polypropylene, or the like, and are formed as grid-like ribs that connect a circumferential frame. The same type of filter 36 may be used, but it is preferable to combine the filters 36 having different properties, in order to prevent contamination of organic matters in addition to particles.
[0026]
In the above configuration, when the valve body 20 is used as the gas introduction valve 20A, the elastic member 33 held at the opening peripheral end portion of the inner lid cylinder 34 when an inert gas or a gas composed of dry air is not supplied from the outside. The substantially flat check valve 31 is pressed against the inner fixed surface of the fixed cylinder 21 by the elastic force, but an O-ring is provided as a seal member 37 on the surface of the check valve 31 facing the inner bottom surface of the fixed cylinder 21. Are provided so as to protrude, and these contact portions form a seal. Here, since the O-ring is crushed by the plane in contact with it, it can be reliably sealed.
[0027]
On the other hand, when the gas which consists of inert gas or dry air is supplied to the valve body 20 from the gas introduction part of a processing apparatus, the check valve 31 is pressed in the direction of the holding | maintenance cylinder 25 with the pressure of the gas to eject. Therefore, the seal of the opening of the fixed cylinder 21 is released, and the gas can flow through the valve body 20 and into the substrate storage container. That is, the gas enters the hollow portion of the inner lid cylinder 34 through the gap 32 between the vent 23 of the fixed cylinder 21 and the check valve 31 and the gap 32 between the check valve 31 and the holding cylinder 25. It flows into the substrate storage container through a filter 36 held between the cylinder 34 and the holding cylinder 25.
[0028]
When the valve body 20 is used as the gas exhaust valve 20 </ b> B, the elastic member 33 presses the check valve 31 against the opening end of the inner lid cylinder 34 by the elastic force. At this time, a sealing member 38 having an L-shaped cross section is provided on the side wall facing the opening end of the valve body 20, and the seal is stably brought into surface contact with the opening end of the inner lid cylinder 34. Form. Therefore, it is possible to effectively prevent gas or the like from flowing into the inside from the outside of the substrate storage container or gas from leaking from the inside to the outside of the substrate storage container.
[0029]
On the other hand, when the gas is filled in the substrate storage container, the check valve 31 is pressed in the direction of the fixed cylinder 21 by the pressure of the gas to be filled, so that the inner lid cylinder 34 and the check valve 31 The seal between the two is released, and the gas can be exhausted through the valve body 20 to the outside of the substrate storage container. That is, the gas enters the hollow portion of the inner lid cylinder 34 from the inside of the substrate storage container through the filter 36 sandwiched between the inner lid cylinder 34 and the holding cylinder 25, and the gap between the check valve 31 and the holding cylinder 25. The gas is exhausted from the vent 23 of the fixed cylinder 21 to the outside of the substrate storage container (exhaust nozzle portion of the processing apparatus) through the gap 32 with the check valve 31 through 32A. At this time, if the pressure of the exhaust nozzle is reduced, the gas can be replaced more efficiently.
[0030]
In the embodiment of the present invention, since the pressure is pressed in the direction perpendicular to the surface of the valve body 20 that holds the seal-forming seal members 37 and 38, a seal is reliably formed regardless of whether it is used as an introduction valve or an exhaust valve. can do. Therefore, the holding time of the gas substituted in the substrate storage container is prolonged, and the effect of the gas purge is maintained for a longer time. Further, since the gas is replaced through the plurality of ventilation gaps 32 on the outer peripheral side of the check valve 31 accommodated in the valve body 20, the replacement is performed through a narrow inner space at one central position as in the conventional example. Compared with the case where the gas is replaced, the gas can be replaced more efficiently, so that productivity is improved.
[0031]
The substrate storage container with the valve body 20 of the present invention can be replaced with gas when placed on the lid body 10 opening / closing device (load port or lid body opener), stored in the stocker or in the process. It can also be performed during transport to the stocker. At this time, a gas purging jig 72 having an air supply nozzle portion and an exhaust nozzle portion and respective gas flow paths as shown in FIGS. 8 and 9 is provided on the apparatus side, and a substrate is accommodated thereon. Gas replacement can be performed by setting the container. On the surface of the jig 72, it is preferable that three positioning pins 73 for the substrate storage container are provided in a Y shape. At least one pair of air supply nozzle portion 70 and exhaust nozzle portion 71 are formed as cylindrical protrusions at a position facing the valve body 20 at a position facing the valve body 20. An air channel 74 and an exhaust channel 75 are formed and communicate with a gas supply source and an exhaust device, respectively. The air supply nozzle unit 70 and the exhaust nozzle unit 71 are provided so as to be movable, the surface of the jig is made flat before use, and after the substrate storage container is placed, You may make it each of the exhaust nozzle part 71 approach valve body 20A, 20B. In addition, it is preferable to provide seal forming means for preventing leakage of the purged gas around the projections of the supply nozzle unit 70 and the exhaust nozzle unit 71.
[0032]
10 and 11 are cross-sectional views showing another embodiment of the valve body 20 of the present invention. In this case, the check valve 31 on the gas introduction side and the check valve 31 on the gas exhaust side can be combined. It is a simple structure. The valve body 20 includes a central disc portion and peripheral seal members 37 and 38, and the center portion can be fitted with a first engagement portion 39 provided at the center of the inner lid tube 34. A second engaging portion 40 is formed. The recesses that are the seal member holding portion 41 and / or the second engaging portion 40 are provided on both surfaces of the disk portion, and the valve body 20 is used when used as an introduction valve and when used as an exhaust valve. By changing the insertion direction at the time of assembly, the seal members 37 and 38 can be inserted at locations where sealing is required. In this case, since the parts to be used are made common, the assembly work and the management can be made more efficient.
[0033]
Next, the details of the dual use will be described. FIG. 10 is a cross-sectional view illustrating a case where the valve body 20 of the present embodiment is used as the gas introduction valve 20A, and FIG. 11 is a cross-sectional view illustrating a case where the valve body 20 of the present embodiment is used as the gas exhaust valve 20B. It is. In this case, the check valve 20 is turned upside down and incorporated between the fixed cylinder 21 and the inner lid cylinder 34, and the installation position of the elastic member 33, that is, the sealing direction of the check valve is changed accordingly, thereby introducing gas. The valve and the gas exhaust valve can be used in common. The use of the check valve is not limited to this embodiment. Seal member holding portions 41 may be provided on both the upper and lower surfaces of the check valve 31, and a seal member may be attached to the check valve 31 as necessary. A concave portion serving as a second engaging portion 40 that can be fitted to the first engaging portion 39 of the inner lid cylinder 34 and an elastic member 33 accommodating portion may be provided on both upper and lower surfaces of the inner cover cylinder 34. In this case, even if the check valve 31 is shared, the direction of the check valve 31 is not changed, and the check valve 31 can be used as it is by changing the mounting position of the elastic member.
[0034]
The position and number of the valve bodies 20 according to the present invention are not particularly limited. Two valve bodies 20 may be provided on each of the opening side and the rear side, or a pair of valve bodies 20 may be provided in the opening. Or a pair of valve bodies 20 on the rear side.
[0035]
The first engagement portion 39 provided on the inner lid tube may be formed as a recess surrounded by ribs in addition to the protrusions shown in the above embodiment. It is good to form the projection part engaged with the said groove part or a recessed part as the 2nd engaging part 40, and to engage these.
[0036]
【The invention's effect】
As described above, according to the present invention, since the engagement portion for preventing the displacement when the check valve is movable is provided, there is an effect that the gas can be stably replaced even if it is repeatedly used. . Also, since the gas is replaced through the ventilation gap outside the check valve housed in the valve body, when the gas is replaced through a narrow inner space in the center as in the conventional example, In comparison, gas replacement can be performed more efficiently, and productivity can be improved. Furthermore, since the seal is reliably formed by the surface pressing, the replacement gas can be prevented from leaking and maintained for a long time.
[0037]
【Example】
Measurement of the oxygen concentration when the substrate storage container of the present invention to which the pair of valve bodies shown in FIGS. 4 and 6 is attached is replaced with nitrogen gas, and the holding time capable of maintaining such a low oxygen state. Went. As a result, when nitrogen gas was supplied at a rate of 20 L / min, it was possible to reduce the oxygen concentration to 10 ppm or less in about 15 minutes. Further, when the supply of nitrogen gas is stopped in this state and the change in the oxygen concentration when the substrate storage container is left unchecked, it takes about 5 hours for the oxygen concentration to rise to 1%. Thus, since the low oxygen state can be maintained for a certain time, such as when the substrate is temporarily stored during processing, contamination of the substrate and oxidation of the surface can be suppressed.
For comparison, when the substrate storage container with a valve taken up in the prior art was used, it took only about 70 minutes for the oxygen concentration to rise from 10 ppm to 1%. For measurement, two through-holes are provided in the substrate storage container, a pipe line for measurement is created so as to connect the two through-holes, and an oxygen concentration meter is installed in the middle of the pipe path. Was measured every minute. After sealing the periphery of the through hole, nitrogen gas was supplied into the substrate storage container through the introduction valve at a constant rate. Moreover, the oxygen concentration used the oxygen concentration meter by the Toray Engineering company (measurement range 0.1ppm-100VOL%).
[Brief description of the drawings]
FIG. 1 is an exploded perspective view showing an embodiment of a substrate storage container according to the present invention.
FIG. 2 is a bottom view showing a container body in an embodiment of a substrate storage container according to the present invention.
FIG. 3 is an exploded perspective view showing a valve body in the embodiment of the substrate storage container according to the present invention.
FIG. 4 is an explanatory cross-sectional view showing a gas introduction valve in an embodiment of a substrate storage container according to the present invention.
5 is a cross-sectional explanatory diagram illustrating a state in which gas is supplied to the gas introduction valve of FIG.
FIG. 6 is an explanatory cross-sectional view showing a gas exhaust valve in an embodiment of a substrate storage container according to the present invention.
7 is a cross-sectional explanatory diagram illustrating a state in which gas is exhausted from the gas exhaust valve of FIG. 6;
FIG. 8 is a plan view showing a gas supply / exhaust jig for replacing gas in a substrate storage container according to the present invention.
9 is a side view showing the jig shown in FIG. 8. FIG.
FIG. 10 is an explanatory cross-sectional view showing a gas introduction valve in another embodiment of a substrate storage container according to the present invention.
FIG. 11 is an explanatory cross-sectional view showing a gas exhaust valve in another embodiment of a substrate storage container according to the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Container body 4 Through-hole 5 Rib 10 Lid body 20 Valve body 20A Gas introduction valve 20B Gas exhaust valve 21 Fixed cylinder 22 Screw groove 23 Vent 24 Flange 25 Holding cylinder 28 Flange 29 Screw groove 30 Seal member 31 Check valve 32 Crevice 32A Clearance 33 Elastic member 34 Inner lid cylinder 36 Filter 37 Seal member 38 Seal member 39 First engagement portion 40 First engagement portion 41 Seal member holding portion 70 Air supply nozzle portion 71 Exhaust nozzle portion W Substrate

Claims (2)

基板を収納する容器本体と、この容器本体の開口を開閉する蓋体と、これら容器本体と蓋体の少なくとも一方の貫通孔に取り付けられて容器本体に対する気体の流通を制御するバルブ体とを備え、貫通孔の周囲にリブを形成した基板収納容器であって、
バルブ体は、貫通孔に嵌められて外周面のフランジを貫通孔周囲のリブに接触させる有底円筒形の固定筒と、貫通孔に嵌められて固定筒に着脱自在に螺子嵌めされ、外周面のフランジを貫通孔の開口周縁に接触させる円筒形の保持筒と、この保持筒の内側壁に保持される通気性の中蓋筒と、固定筒と保持筒に隙間を介して内蔵される逆止弁と、この逆止弁を移動可能に支持する弾性支持部材とを含み、固定筒の内側壁と逆止弁の外側壁との間に、気体の通路となる隙間を形成し、中蓋筒の内面に第一の係合部を形成し、逆止弁には、固定筒の周縁あるいは中蓋筒の開口端部と接触し、かつ弾性支持部材に押される方向の接触部分に潰されてシールを形成するシール部材を装着するとともに、中蓋筒の第一の係合部と係合する第二の係合部を形成し、
気体の圧力により逆止弁が第一、第二の係合部に制御されて移動する際にシールを解除し、固定筒の内側壁と逆止弁の外側壁との間の隙間を介して気体を流通可能としたことを特徴とする基板収納容器。
A container body for storing the substrate; a lid body for opening and closing the opening of the container body; and a valve body attached to at least one through hole of the container body and the lid body to control the flow of gas to the container body. A substrate storage container in which a rib is formed around the through-hole ,
The valve body is fitted into the through-hole and has a bottomed cylindrical fixed cylinder that contacts the flange on the outer peripheral surface with the rib around the through-hole, and is fitted into the through-hole and is detachably screwed into the fixed cylinder. A cylindrical holding cylinder that contacts the peripheral edge of the opening of the through hole, a breathable inner lid cylinder that is held on the inner wall of the holding cylinder, and a reverse that is built into the fixed cylinder and the holding cylinder via a gap. A check valve and an elastic support member that movably supports the check valve. A gap serving as a gas passage is formed between the inner wall of the fixed cylinder and the outer wall of the check valve. A first engagement portion is formed on the inner surface of the cylinder, and the check valve is crushed by a contact portion in a direction in which it is in contact with the peripheral edge of the fixed cylinder or the open end of the inner lid cylinder and is pressed by the elastic support member. A seal member that forms a seal is mounted and a second engagement portion that engages with the first engagement portion of the inner lid cylinder is formed. And,
When the check valve moves under the control of the first and second engaging portions by the pressure of the gas, the seal is released, and through the gap between the inner wall of the fixed cylinder and the outer wall of the check valve A substrate storage container characterized in that gas can be circulated .
保持筒と中蓋筒との間にフィルタを備えた請求項1記載の基板収納容器。The substrate storage container according to claim 1 , further comprising a filter between the holding cylinder and the inner lid cylinder .
JP2002344954A 2002-10-25 2002-11-28 Substrate storage container Expired - Lifetime JP4201583B2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2002344954A JP4201583B2 (en) 2002-11-28 2002-11-28 Substrate storage container
PCT/JP2003/012612 WO2004038789A1 (en) 2002-10-25 2003-10-01 Substrate storage container
EP20030748661 EP1555689B1 (en) 2002-10-25 2003-10-01 Substrate storage container
US10/496,932 US7455180B2 (en) 2002-10-25 2003-10-01 Substrate storage container
DE60332644T DE60332644D1 (en) 2002-10-25 2003-10-01 SUBSTRATE STORAGE CONTAINER
KR1020047017214A KR100607302B1 (en) 2002-10-25 2003-10-01 Substrate storage container
TW92128740A TWI289534B (en) 2002-10-25 2003-10-16 Substrate storage container
US12/021,719 US7658289B2 (en) 2002-10-25 2008-01-29 Substrate storage container
US12/034,040 US7658290B2 (en) 2002-10-25 2008-02-20 Substrate storage container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002344954A JP4201583B2 (en) 2002-11-28 2002-11-28 Substrate storage container

Publications (2)

Publication Number Publication Date
JP2004179449A JP2004179449A (en) 2004-06-24
JP4201583B2 true JP4201583B2 (en) 2008-12-24

Family

ID=32706255

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002344954A Expired - Lifetime JP4201583B2 (en) 2002-10-25 2002-11-28 Substrate storage container

Country Status (1)

Country Link
JP (1) JP4201583B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170038846A (en) 2014-07-25 2017-04-07 신에츠 폴리머 가부시키가이샤 Substrate storage container
KR20170084122A (en) 2014-11-12 2017-07-19 미라이얼 가부시키가이샤 Gas purge filter
KR20200121795A (en) 2018-02-19 2020-10-26 미라이얼 가부시키가이샤 Port for gas purge

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5160541B2 (en) * 2006-06-19 2013-03-13 インテグリス・インコーポレーテッド System for purging reticle storage
JP4800155B2 (en) * 2006-09-04 2011-10-26 信越ポリマー株式会社 Substrate storage container and check valve
JP4973875B2 (en) 2007-07-31 2012-07-11 信越化学工業株式会社 Synthetic quartz glass substrate storage case for photomask
JP4859065B2 (en) * 2007-10-23 2012-01-18 信越ポリマー株式会社 Substrate storage container
JP4895222B2 (en) * 2008-03-31 2012-03-14 信越ポリマー株式会社 Substrate storage container
JP5251243B2 (en) * 2008-05-12 2013-07-31 信越半導体株式会社 Vapor growth apparatus and vapor growth method of silicon epitaxial film
JP4898740B2 (en) * 2008-05-12 2012-03-21 信越ポリマー株式会社 Valve mechanism and substrate storage container
JP5887719B2 (en) * 2011-05-31 2016-03-16 シンフォニアテクノロジー株式会社 Purge device, load port, bottom purge nozzle body, bottom purge unit
TWI610864B (en) 2012-11-20 2018-01-11 恩特葛瑞斯股份有限公司 Substrate container with purge ports
KR102162366B1 (en) 2014-01-21 2020-10-06 우범제 Apparatus for removing fume
WO2015129122A1 (en) * 2014-02-27 2015-09-03 村田機械株式会社 Purging apparatus and purging method
JP6327374B2 (en) * 2017-02-21 2018-05-23 シンフォニアテクノロジー株式会社 Purge nozzle unit, load port
US11209093B2 (en) 2017-07-14 2021-12-28 Shin-Etsu Polymer Co., Ltd. Substrate storage container
JP7125000B2 (en) 2018-03-13 2022-08-24 信越ポリマー株式会社 Substrate storage container
JP7147116B2 (en) 2018-03-28 2022-10-05 信越ポリマー株式会社 Substrate storage container
JP6519897B2 (en) * 2018-04-10 2019-05-29 シンフォニアテクノロジー株式会社 Purge nozzle unit, load port
WO2020065968A1 (en) 2018-09-28 2020-04-02 ミライアル株式会社 Substrate accommodation container
JP2022088280A (en) 2020-12-02 2022-06-14 信越ポリマー株式会社 Substrate storage container

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170038846A (en) 2014-07-25 2017-04-07 신에츠 폴리머 가부시키가이샤 Substrate storage container
US10312122B2 (en) 2014-07-25 2019-06-04 Shin-Etsu Polymer Co., Ltd. Substrate storage container
KR20170084122A (en) 2014-11-12 2017-07-19 미라이얼 가부시키가이샤 Gas purge filter
US10453723B2 (en) 2014-11-12 2019-10-22 Miraial Co., Ltd. Gas purge filter
KR20200121795A (en) 2018-02-19 2020-10-26 미라이얼 가부시키가이샤 Port for gas purge
US11448330B2 (en) 2018-02-19 2022-09-20 Miraial Co., Ltd. Gas purge port

Also Published As

Publication number Publication date
JP2004179449A (en) 2004-06-24

Similar Documents

Publication Publication Date Title
JP4201583B2 (en) Substrate storage container
US7455180B2 (en) Substrate storage container
JP4204302B2 (en) Storage container
US11869787B2 (en) Substrate container valve assemblies
CN107004623B (en) Filter for gas cleaning
JP4895222B2 (en) Substrate storage container
JP4898740B2 (en) Valve mechanism and substrate storage container
JP3960787B2 (en) Precision substrate storage container
TW201909318A (en) Substrate storage container
JP6590728B2 (en) Substrate storage container valve
JP7147116B2 (en) Substrate storage container
KR102524025B1 (en) Port for gas purge
TWM532450U (en) Wafer shipper
US20220199439A1 (en) Substrate storage container and filter unit
JP7125000B2 (en) Substrate storage container
JP2019021735A (en) Substrate housing container
CN116134256A (en) Substrate container
JP2004103937A (en) Substrate container

Legal Events

Date Code Title Description
RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20050127

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050210

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080624

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080730

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20081007

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20081007

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4201583

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111017

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111017

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111017

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20141017

Year of fee payment: 6

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term