JP4198806B2 - Rotating shaft for silicon single crystal pulling device - Google Patents

Rotating shaft for silicon single crystal pulling device Download PDF

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Publication number
JP4198806B2
JP4198806B2 JP37609598A JP37609598A JP4198806B2 JP 4198806 B2 JP4198806 B2 JP 4198806B2 JP 37609598 A JP37609598 A JP 37609598A JP 37609598 A JP37609598 A JP 37609598A JP 4198806 B2 JP4198806 B2 JP 4198806B2
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Prior art keywords
single crystal
rotating shaft
silicon single
crystal pulling
crucible
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Expired - Lifetime
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JP37609598A
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JP2000169294A (en
Inventor
正弘 安田
浩二 加藤
俊 高木
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Ibiden Co Ltd
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Ibiden Co Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、シリコン単結晶引き上げ装置を構成するための部材に関し、特に、シリコン材料を溶融するためのルツボを回転および上下移動させるためのシリコン単結晶引き上げ装置用の回転軸に関するものである。
【0002】
【従来の技術】
シリコン単結晶引き上げ装置は所謂チョクラルスキー法と称される方法により、雰囲気ガスの存在下で、ルツボ内のシリコン融液からシリコン単結晶を引き上げるもので、例えば、特公昭57−15079号公報にて示されているような「単結晶引上装置」として知られている。この公報に示された装置は、図2に示すように、「炉体容器1内にその下方より回転軸2が導入され、その回転軸2の端面上に受け皿3を介してルツボ4が配される。又該ルツボ4の周りに発熱体5と保温筒6が配され、ルツボ4内でシリコンが溶融され融液7を得る。一方炉体容器1の上方には上下に滑動する回転軸9が設けられている。該回転軸9の遊端にシリコンの種結晶8を取付け、回転軸9を種結晶8がルツボ4内の融液7に触れている状態より上方に移動させて、種結晶8の下に続くシリコン単結晶10を得る。単結晶を育成する際、不必要な反応生成ガスが、単結晶10及び融液7の液面で反応しないように、これを排除する必要がある。このためにアルゴン等の不活性ガスを雰囲気ガスとして、炉体容器1の上方より単結晶及び液面に供給し、炉体容器下部より排出する」というものである(上記公報の第2欄)。
【0003】
ところで、以上述べた単結晶製造装置において、回転軸2,9は単にルツボを支えて回転および上下移動させるだけでなく、万が一回転軸2,9が破損した場合にはルツボが落下することにより、最悪の場合、溶融したシリコンが冷却層の隔壁を破壊し水蒸気爆発を起こすという危険性がある。従って、以上のような回転軸を構成するための材料としては、黒鉛材が通常用いられている。
【0004】
【発明が解決しようとする課題】
しかしながら、最近のシリコン単結晶の大口径化に伴い、石英ルツボ及び黒鉛ルツボが大型化し、前記石英ルツボに収容するシリコン原料の重量は16インチφウェハの場合、500kgにもおよぶ。従って、回転軸に対する応力も増大し、強度的に問題があった。
【0005】
回転軸の強度をアップさせるには、回転軸の径を太くする方法もあるが、前記回転軸の径を太くすると、そこから奪われる熱量が大きくなり、結果としてルツボ内のシリコン融液の温度分布が均一でなくなり、回転軸より奪われた熱を補うために周囲のヒータ20からの熱量を多く供給する必要があり、そのためにルツボ10及びヒータ20の寿命が短くなるといった問題や熱効率が悪くなる問題もある。また、シリコン融液内の温度分布が不均一であると、引き上げたシリコン単結晶の品質に悪影響を及ぼす。
【0006】
そこで、本発明者等はこの種のシリコン単結晶引上げ装置用の回転軸について、前述した問題を解決するにはどうしたらよいかについて種々検討を重ねてきた結果、本発明を完成したのである。
【0007】
【課題を解決するための手段】
以上の課題を解決するために、請求項1に係る発明の採った手段は、以下の実施形態の説明中において使用する符号を付して説明すると、「リコン材料を溶融するためのルツボ10の下部に配置されて、前記ルツボ10を回転および上下移動させるためのシリコン単結晶引き上げ装置用の回転軸60であって、黒鉛から成る回転軸本体に嵌着もしくは埋設してなる環状のC/Cコンポジット61を有し、前記回転軸本体及び前記環状のC/Cコンポジット61は一部もしくは全面に熱分解炭素が含浸されるとともに、熱分解炭素被膜が形成されたことを特徴とするシリコン単結晶引き上げ装置用の回転軸60」である。
【0008】
すなわち、請求項1の発明に係るシリコン単結晶引き上げ装置用の回転軸60は、図1に示すように、密閉本体50内のルツボ10の下部に配置されて、前記ルツボ10を回転および上下移動させるものであり、図3に示すように軸本体に環状のC/Cコンポジット61を嵌着または埋設して形成したものである。
【0009】
このシリコン単結晶引き上げ装置用の回転軸60に嵌着したC/Cコンポジット61は、高強度であり、次のようにして形成される。まず、炭素繊維を、1軸配向あるいは複数軸配向させて筒状素材としておいて、これに樹脂を含浸させて、これを炭化するのである。含浸に用いる樹脂としては、フェノール、フラン等の樹脂の他、タール・ピッチ等がある。
【0010】
請求項1に記載のシリコン単結晶引き上げ装置用の回転軸は、黒鉛からなる回転軸本体に嵌着してなる環状のC/Cコンポシット61を有することにより、C/Cコンポシット61が中心軸に対し円周方向に存在するので、強度が大幅にアップする。したがって、極力強度を持たせた上で、径を細くすることが可能となり、シリコン融液の熱が奪われるのを最小にとどめることができる。
【0011】
さらに、回転軸本体及び環状のC/Cコンポジット61一部もしくは全面に熱分解炭素含浸されるとともに熱分解炭素被膜形成されたことを内容とする。このような構成とする理由は、前記熱分解炭素被膜によって、シリコン単結晶引き上げ時に発生するSiOガスやSi蒸気がC/Cコンポジット基材に接触することはなく、従って基材中のC(炭素)と反応することを防止し珪化及びSi浸透による強度の低下を防止出来る。
【0012】
【発明の実施の形態】
次に本発明を、図面に示した実施の形態について説明すると、図1には、本発明に係るシリコン単結晶引き上げ装置用の回転軸60が適用されるシリコン単結晶引き上げ装置100の縦断面図が示してある。
このシリコン単結晶引き上げ装置100は、その密閉本体50内に、シリコンを溶融させるためのルツボ10を回転軸60にて回転および上下移動可能に収納したものである。
【0013】
シリコン単結晶引き上げ装置用の回転軸60は、図3に示すように黒鉛から成る回転軸本体に嵌着してなる環状のC/Cコンポジット61を有するものである。あるいは、回転軸60は、図3に示すように黒鉛から成る回転軸本体に埋設してなる環状のC/Cコンポジット61を有するものである。さらに、回転軸本体及び該本体に嵌着された環状のC/Cコンポジット61一部もしくは全面に熱分解炭素含浸されるとともに熱分解炭素被膜が形成してある。これらのC/Cコンポジットおよび熱分解炭素被膜は、以下の実施例にて示すように製造または形成されるものである。
【0014】
参考例1】
まず、炭素繊維で編んだ布を用いてワインディング法により環状に形成し、この炭素繊維素材に、フェノール樹脂を含浸して硬化後に900℃で焼成した。さらにフェノール樹脂含浸、硬化、焼成を2回繰り返しこれを黒鉛化して環状のC/Cコンポジットを得た。
【0015】
得られた環状のC/Cコンポジットを黒鉛を加工して得られた32インチφルツボ用の回転軸に嵌着した。
【0016】
【実施例
参考例1と同様な方法によって環状のC/Cコンポジットを形成した。
【0017】
得られた環状のC/CコンポジットをCVD炉に入れて1400℃に加熱するとともに、水素ガスをキャリアとしてメタンガスを炉内に連続的に供給した。これにより機材の表面全体に表面から30μmの深さまで熱分解炭素が含浸され、さらに表面に厚さ約50μmの熱分解炭素被膜が形成された。得られた環状のC/Cコンポジットを黒鉛を加工して得られた32インチφルツボ用回転軸に嵌着した。
【0018】
【発明の効果】
以上詳述した通り、本発明においては、上記実施形態において例示した如く、「シリコン単結晶引き上げ装置100を構成するシリコン材料を溶融するためのルツボ10の下部に配置されて、ルツボ10を回転および上下移動させるためのシリコン単結晶引き上げ装置用の回転軸60であって、黒鉛から成る回転軸本体に嵌着または配設してなる環状のC/Cコンポジット61を有し、さらには、回転軸本体及びC/Cコンポジットの一部もしくは、全面に熱分解炭素を含浸するとともに熱分解炭素被膜を形成したこと」にその構成上の特徴があり、それにより、高強度で、耐久性の高いシリコン単結晶引き上げ装置用の回転軸を提供することができる。
【図面の簡単な説明】
【図1】本発明に係る回転軸を採用したシリコン単結晶引き上げ装置の縦略断面図である。
【図2】従来のシリコン単結晶引き上げ装置を示す断面図である。
【図3】本発明に係わるシリコン単結晶引き上げ装置用の回転軸の拡大断面図である。
【符号の説明】
100 シリコン単結晶引き上げ装置
10 ルツボ
11 石英ルツボ
20 ヒータ
30 保温筒
40 断熱材
50 密閉本体
60 回転軸
61 C/Cコンポジット
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a member for constituting the silicon single crystal pulling apparatus, in particular, it relates to the rotation axis of the silicon single crystal pulling apparatus for rotating and vertically moving a crucible for melting divorced material .
[0002]
[Prior art]
A silicon single crystal pulling apparatus pulls up a silicon single crystal from a silicon melt in a crucible in the presence of an atmospheric gas by a so-called Czochralski method. For example, Japanese Patent Publication No. 57-15079 discloses. Is known as a “single crystal pulling device”. As shown in FIG. 2, the apparatus disclosed in this publication is “a rotating shaft 2 is introduced into a furnace body container 1 from below, and a crucible 4 is disposed on an end surface of the rotating shaft 2 via a tray 3. A heating element 5 and a heat insulating cylinder 6 are arranged around the crucible 4, and silicon is melted in the crucible 4 to obtain a melt 7. On the other hand, a rotating shaft that slides up and down above the furnace body container 1. A silicon seed crystal 8 is attached to the free end of the rotating shaft 9, and the rotating shaft 9 is moved upward from a state where the seed crystal 8 is in contact with the melt 7 in the crucible 4. The silicon single crystal 10 that follows the seed crystal 8 is obtained, and it is necessary to eliminate this so that unnecessary reaction product gas does not react on the liquid surface of the single crystal 10 and the melt 7 when the single crystal is grown. For this purpose, an inert gas such as argon is used as the atmosphere gas, and a single crystal is formed from above the furnace vessel 1. Is supplied to the beauty liquid surface, is that discharged from the furnace vessel bottom "(column 2 of the above publication).
[0003]
By the way, in the single crystal manufacturing apparatus described above, the rotating shafts 2 and 9 not only rotate and move up and down while supporting the crucible, but if the rotating shafts 2 and 9 are damaged, the crucible falls, In the worst case, there is a risk that the molten silicon will destroy the partition walls of the cooling layer and cause a steam explosion. Therefore, a graphite material is usually used as a material for constituting the rotating shaft as described above.
[0004]
[Problems to be solved by the invention]
However, with the recent increase in diameter of silicon single crystals, quartz crucibles and graphite crucibles have become larger, and the weight of silicon raw material contained in the quartz crucible reaches as much as 500 kg in the case of a 16-inch φ wafer. Accordingly, the stress on the rotating shaft also increases, and there is a problem in strength.
[0005]
To increase the strength of the rotating shaft, there is a method of increasing the diameter of the rotating shaft, but if the diameter of the rotating shaft is increased, the amount of heat taken away from it increases, resulting in the temperature of the silicon melt in the crucible. distribution becomes non-uniform, it is necessary to increase supply amount of heat from the heater motor 2 0 around to make up for deprived the rotation axis heat problem life of the crucible 10 and the heater motor 2 0 Therefore is shortened There is also a problem that the thermal efficiency becomes worse. Further, if the temperature distribution in the silicon melt is not uniform, the quality of the pulled silicon single crystal is adversely affected.
[0006]
Therefore, the present inventors have completed the present invention as a result of various studies on how to solve the above-described problems with respect to the rotating shaft for this type of silicon single crystal pulling apparatus.
[0007]
[Means for Solving the Problems]
In order to solve the above problems, the means adopted the invention according to Motomeko 1 is explained with reference numeral used in the description of the following embodiments, a crucible for melting "divorced material 10 is a rotary shaft 60 for a silicon single crystal pulling device, which is disposed at the lower part of the rotary shaft 10 and rotates and moves the crucible 10 up and down, and is an annular C that is fitted or embedded in a rotary shaft body made of graphite. silicon / C-composite 61 possess, said that with some rotation axis body and said annular C / C composite 61 or the entire surface pyrolytic carbon is impregnated, characterized in that the pyrolytic carbon film is formed This is a rotating shaft 60 "for a single crystal pulling apparatus.
[0008]
That is, the rotary shaft 60 for the silicon single crystal pulling apparatus according to the first aspect of the invention is disposed at the lower part of the crucible 10 in the sealed body 50 as shown in FIG. 1, and rotates and moves the crucible 10 up and down. As shown in FIG. 3, an annular C / C composite 61 is fitted or embedded in the shaft body .
[0009]
The C / C composite 61 fitted to the rotary shaft 60 for the silicon single crystal pulling apparatus has high strength and is formed as follows. First, carbon fibers are uniaxially or multiaxially oriented to form a cylindrical material, which is impregnated with resin and carbonized. Examples of the resin used for impregnation include tar and pitch in addition to resins such as phenol and furan.
[0010]
The rotation shaft of the silicon single crystal pulling apparatus according to claim 1, and more and this having an annular C / C component sit 61 formed by fitting the rotation shaft body consisting of graphite, C / C component Sit 61 Is present in the circumferential direction with respect to the central axis, so that the strength is significantly increased. Therefore, it is possible to reduce the diameter while giving the strength as much as possible, and it is possible to minimize the loss of heat of the silicon melt.
[0011]
Further, the rotary shaft main body and the ring-like C / C composite 61 is the content that some or entire pyrolytic carbon is impregnated with Rutotomoni pyrolytic carbon coating formed. The reason for this configuration is that the pyrolytic carbon film prevents SiO gas or Si vapor generated when pulling up the silicon single crystal from coming into contact with the C / C composite substrate. ) And a decrease in strength due to silicification and Si penetration.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Next, the present invention will be described with reference to the embodiments shown in the drawings. FIG. 1 is a longitudinal sectional view of a silicon single crystal pulling apparatus 100 to which a rotating shaft 60 for a silicon single crystal pulling apparatus according to the present invention is applied. Is shown.
In this silicon single crystal pulling apparatus 100, a crucible 10 for melting silicon is accommodated in a hermetically sealed main body 50 so as to be rotatable and vertically movable by a rotating shaft 60.
[0013]
A rotating shaft 60 for a silicon single crystal pulling apparatus has an annular C / C composite 61 fitted to a rotating shaft body made of graphite as shown in FIG. Or the rotating shaft 60 has the cyclic | annular C / C composite 61 embed | buried under the rotating shaft main body which consists of graphite as shown in FIG. Furthermore, the rotating shaft body and an annular C / C composite 61 is fitted to the body is are partially or entirely pyrolytic carbon is impregnated with Rutotomoni pyrolytic carbon coating is formed. These C / C composites and pyrolytic carbon coatings are manufactured or formed as shown in the following examples.
[0014]
[ Reference Example 1]
First, a cloth knitted with carbon fibers was used to form an annular shape by a winding method, and this carbon fiber material was impregnated with a phenol resin and cured at 900 ° C. after curing. Further, phenol resin impregnation, curing and firing were repeated twice to graphitize to obtain a cyclic C / C composite.
[0015]
The obtained annular C / C composite was fitted to a rotating shaft for a 32 inch φ crucible obtained by processing graphite.
[0016]
[Example 1 ]
A cyclic C / C composite was formed in the same manner as in Reference Example 1.
[0017]
The obtained annular C / C composite was put in a CVD furnace and heated to 1400 ° C., and methane gas was continuously supplied into the furnace using hydrogen gas as a carrier. As a result, the entire surface of the equipment was impregnated with pyrolytic carbon to a depth of 30 μm from the surface, and a pyrolytic carbon coating having a thickness of about 50 μm was formed on the surface. The obtained annular C / C composite was fitted to a rotating shaft for a 32-inch φ crucible obtained by processing graphite.
[0018]
【The invention's effect】
As described above in detail, in the present invention, as exemplified in the above embodiment, “the silicon single crystal pulling apparatus 100 is disposed below the crucible 10 for melting the silicon material, and the crucible 10 is rotated and rotated. A rotary shaft 60 for a silicon single crystal pulling device for moving up and down, and having an annular C / C composite 61 fitted or disposed on a rotary shaft main body made of graphite, Part of the main body and C / C composite or the entire surface is impregnated with pyrolytic carbon and has a pyrolytic carbon coating, ”which has a structural feature, thereby making silicon with high strength and high durability. A rotating shaft for a single crystal pulling apparatus can be provided.
[Brief description of the drawings]
FIG. 1 is a schematic vertical sectional view of a silicon single crystal pulling apparatus employing a rotating shaft according to the present invention.
FIG. 2 is a cross-sectional view showing a conventional silicon single crystal pulling apparatus.
FIG. 3 is an enlarged cross-sectional view of a rotating shaft for a silicon single crystal pulling apparatus according to the present invention.
[Explanation of symbols]
100 Silicon single crystal pulling apparatus 10 Crucible 11 Quartz crucible 20 Heater 30 Insulating tube 40 Insulating material 50 Sealed body 60 Rotating shaft 61 C / C composite

Claims (1)

リコン材料を溶融するためのルツボの下部に配置されて、前記ルツボを回転および上下移動させるためのシリコン単結晶引き上げ装置用の回転軸であって、
黒鉛から成る回転軸本体に嵌着もしくは埋設してなる環状のC/Cコンポジットを有し、
前記回転軸本体及び前記環状のC/Cコンポシットは一部もしくは全面に熱分解炭素が含浸されるとともに、熱分解炭素被膜が形成されたことを特徴とするシリコン単結晶引き上げ装置用の回転軸。
Divorced material is disposed in the lower portion of the crucible for melting, a rotating shaft of the silicon single crystal pulling apparatus for rotating and vertically moving the crucible,
Having an annular C / C composite fitted or embedded in a rotating shaft body made of graphite,
The rotary shaft for a silicon single crystal pulling apparatus, wherein the rotary shaft main body and the annular C / C component are partially or entirely impregnated with pyrolytic carbon and a pyrolytic carbon film is formed. .
JP37609598A 1998-11-30 1998-11-30 Rotating shaft for silicon single crystal pulling device Expired - Lifetime JP4198806B2 (en)

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Application Number Priority Date Filing Date Title
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JP4198806B2 true JP4198806B2 (en) 2008-12-17

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JP5730546B2 (en) * 2010-11-22 2015-06-10 東洋炭素株式会社 Single crystal pulling apparatus and low thermal conductive member used for single crystal pulling apparatus
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