JP4191071B2 - Liquid material vaporizer - Google Patents

Description

  The present invention relates to a liquid material vaporization apparatus used in a film formation process by a MOCVD method using a liquid material in manufacturing a semiconductor or a superconducting material.

  MOCVD (Metal Organic Chemical Vapor Deposition) method is one of the thin film forming methods in the semiconductor device manufacturing process, but it has been actively used in recent years due to its superior film quality, deposition rate, step coverage, etc. compared to sputtering methods. Has been. As a CVD gas supply method used in the MOCVD apparatus, a liquid material in which a liquid organic metal or an organic metal is dissolved in an organic solvent is vaporized immediately before the CVD reactor as a more excellent controllability and stability. A supply method is known (see, for example, Patent Document 1).

  In the liquid material vaporization apparatus using the above-described vaporization method, a liquid material is supplied into a pipe through which a carrier gas flows to form a gas-liquid two-layer flow of the carrier gas and the liquid material, and the gas-liquid two-layer flow Vaporization is performed by spraying the liquid material in a state in the vaporizer.

JP 2002-95955 A

  In forming the gas-liquid two-layer flow, the carrier gas flow rate, the flow rate of the liquid material, the viscosity, the pressure, and the like are intertwined in a complicated manner. Usually, the conditions for a gas-liquid two-layer flow are obtained experimentally, and the apparatus is configured under those conditions. However, in the above-described conventional configuration, it is difficult to stably form a gas-liquid two-layer flow with time, and if the gas is not optimal, the gas and liquid portions are alternately flowed. There is a case. In such a case, pulsation is generated in the form of pulses and pulsation occurs in the vaporization pressure, which adversely affects the film forming process.

The liquid material vaporization apparatus according to the first aspect of the present invention is a gas-liquid mixing in which a liquid material is caused to flow along a wall surface of a flow path through which a carrier gas flows to generate a gas-liquid two-layer flow state of the liquid material and the carrier gas. And a vaporization unit that sprays the liquid material in a gas-liquid two-layer flow state generated in the gas-liquid mixing unit and vaporizes the sprayed liquid material , and the gas-liquid mixing unit has an inner side through which the carrier gas flows A double pipe structure having an outer pipe formed around the pipe and the inner pipe and having a liquid material flowing in the same direction as the carrier gas is provided, and the wall surface extends downstream from the outlet of the double pipe structure. It is provided along .
The invention of claim 2 is the liquid material vaporizer according to claim 1, the helical structure guiding the liquid material to the outlet of the double tube structure is obtained by forming the outer conduit.
According to a third aspect of the present invention, in the liquid material vaporizer according to the first or second aspect , the wall surface forms a tapered pipe having a cross-sectional area that continuously decreases, and the pipe of the pipe The cross-sectional shape of the outlet is the same as the cross-sectional shape of the pipe that guides the liquid material in a gas-liquid two-layer flow state to the vaporization section.
A fourth aspect of the present invention, the liquid material vaporizer according to claim 1, connected obliquely to the flow direction of the carrier gas with respect to the outer pipe, the liquid material supply pipe for supplying a liquid material to the outer pipe Provide a road.

  According to the present invention, since the gas-liquid two-layer flow state of the liquid material supplied to the vaporization unit is stable, stable atomization with little change with time and fluctuation is possible, and the liquid material can be stably vaporized. it can.

  Hereinafter, the best mode for carrying out the present invention will be described with reference to the drawings. FIG. 1 is a block diagram showing a schematic configuration of a liquid material vaporizer. Reference numeral 1 denotes a liquid material supply device for supplying a liquid organic metal, an organic metal solution or the like (hereinafter referred to as a liquid material) to the vaporizer 2, and the supplied liquid material is vaporized by the vaporizer 2 to be a CDV device. Is supplied to a CVD reactor provided in For example, liquid organic metals include organic metals such as Cu and Ta, and organic metal solutions include organic metals such as Ba, Sr, Ti, Pb, and Zr dissolved in an organic solvent.

  The material containers 3A, 3B, 3C provided in the liquid material supply apparatus 1 are filled with liquid materials 4A, 4B, 4C used for MOCVD. For example, in the case of forming a BST film (BaSrTi oxide film), the raw materials Ba, Sr, and Ti dissolved in an organic solvent THF (tetrahydrofuran) are used as the liquid materials 4A, 4B, and 4C. The solvent container 3D is filled with THF as the solvent 4D. The containers 3A to 3D are provided according to the number of raw materials, and are not necessarily four.

  A charge gas line 5 and transfer lines 6A to 6D are connected to the containers 3A to 3D. When charge gas is supplied into the containers 3A to 3D via the charge gas line 5, gas pressure is applied to the liquid surfaces of the liquid materials 4A to 4C and the solvent 4D filled in the containers 3A to 3D, and the liquids Materials 4A-4C and solvent 4D are extruded into transfer lines 6A-6D, respectively.

  The transfer lines 6A to 6D are provided with mass flow meters 8A to 8D and flow control valves 9A to 9D with a shut-off function. The flow rate control valves 9A to 9D are controlled while monitoring the flow rates of the liquid materials 4A to 4C and the solvent 4D with the mass flow meters 8A to 8D, respectively, so that the flow rates of the liquid materials 4A to 4C and the solvent 4D are appropriate. . A pump such as a plunger pump may be used instead of the flow control valves 9A to 9D.

  The liquid materials 4A to 4C and the solvent 4D pushed out to the transfer lines 6A to 6D pass through the mass flow meters 8A to 8D and the flow rate control valves 9A to 9D to the transfer lines 6E provided in the gas-liquid mixing unit 90, respectively. It is transferred and mixed in the transfer line 6E. The carrier gas is supplied from the carrier gas line 7 to the transfer line 6E, and the carrier gas, the liquid materials 4A to 4C, and the solvent 4D are supplied to the vaporizer 2 in a gas-liquid two-layer flow state. The In the gas-liquid two-layer flow state, the liquid material flows along the pipe wall in the pipe, and the central part of the pipe is almost occupied by the flow of the carrier gas. On-off valves V9 and V6 are provided between the gas-liquid mixing unit 90, the carrier gas line 7, and the vaporizer 2, respectively.

  The vaporizer 2 is supplied with a carrier gas via a carrier gas line 7A that bypasses the gas-liquid mixing unit 90, and the vaporized material is sent to the CVD reactor (not shown) by the carrier gas. Note that an inert gas such as nitrogen gas or argon gas is used for the charge gas and the carrier gas. Moreover, it is preferable to reduce the residence amount of the liquid materials 4A to 4C and the solvent 4D in the transfer lines 6A to 6E as much as possible. For example, 1/8 inch piping is used for the transfer lines 6A to 6C.

  FIG. 2 is a cross-sectional view showing a schematic configuration of the vaporizer 2. The vaporizer 2 includes a nozzle unit 20 that sprays the liquid materials 4A to 4C to form a mist, and a vaporization chamber 21 that further vaporizes the liquid material sprayed from the nozzle unit 20. The nozzle unit 20 is provided with a double pipe 200. The liquid materials 4A to 4C in a gas-liquid two-layer flow state introduced from the transfer line 6E and the carrier gas introduced from the carrier gas line 7 are double-layered. Guided to tube 200. This carrier gas is used to atomize the liquid materials 4A to 4C, and will be referred to as atomizing gas below.

  The vaporization chamber 21 is provided with heaters h1 to h6 for heating, and the vaporization chamber 21 is maintained at a temperature higher than the vaporization temperature of the liquid materials 4A to 4C. The liquid materials 4A to 4C sprayed vertically downward from the nozzle unit 20 as indicated by a two-dot chain line 23 are vaporized in the vaporization chamber 21, and then sent to a CVD reactor (not shown) through the discharge port 24. . 22 is a joint for connecting the transfer line 6E to the nozzle part 20 of the vaporizer.

  FIG. 3 is an enlarged view of part A in FIG. 2, and the double pipe 200 described above includes an inner pipe 200 a and an outer pipe 200 b. The gas-liquid two-layer flow of the liquid materials 4A to 4C and the carrier gas flows through the inner pipe 200a, and the atomizing gas (carrier gas) flows through the annular space between the inner pipe 200a and the outer pipe 200b. The outer pipe 200b of the double pipe 200 is fixed to the water cooling block 201 by welding or the like, and a cooling rod 202 is provided around the double pipe 200 in contact with the outer pipe 200b. As shown in FIG. The rod 202 extends to the lower end portion of the double pipe 200.

  A male screw portion 203 is formed on the outer periphery of the cooling rod 202. The cooling rod 202 is fixed to the water cooling block 201 by screwing the male screw portion 203 into the female screw portion 205 formed in the concave portion 204 of the water cooling block 201. To do. As shown in FIG. 2, a cooling water channel 206 is formed in the water cooling block 201, and cooling water supplied from the outside through the cooling water pipe 207 circulates in the cooling water channel 206, thereby cooling the water cooling block 201. Is done. The cooling rod 202 is cooled by the water cooling block 201, and the cooling rod 202 further cools the double pipe 200.

  A casing 208 that covers the periphery of the cooling block 202 is provided on the lower side of the water cooling block 201 in FIG. 2, and a fixing flange 208a is formed at the lower portion of the casing. By fixing the flange 208 a to the vaporizing chamber 21, the nozzle unit 20 is attached to the vaporizing chamber 21. In this embodiment, the water cooling block 201 and the cooling rod 202 are separately formed and screw-fastened. However, they may be integrally formed. The cooling rod 202 is made of a material having excellent thermal conductivity such as copper.

  FIG. 4 is an enlarged view of a portion B in FIG. The front end portion 208b of the casing 208 is formed thin and is joined to the front end portion of the outer pipe 200b by welding or the like. Therefore, the internal space 209 of the casing 208 and the vaporization chamber space 210 are isolated, and the cooling rod 202 is prevented from being corroded by the vaporized gas. The internal space 209 can be evacuated through a pipe 214 as shown in FIG. 2, and the internal space 209 is in a vacuum state to prevent heat from entering the cooling rod 202 from the casing 208 by convection. ing.

  The inner pipe 200a protrudes downward in the drawing from the outer pipe 200b, and further protrudes through a hole formed in the central portion of the orifice member 212. The atomizing gas flowing downward between the inner pipe 200a and the outer pipe 200b is vaporized through a gap formed between the orifice member 212 and the outer pipe 200b, for example, a minute gap of 1 mm or less. It is ejected into the chamber space 210. By this atomizing gas, the liquid materials 4A to 4C are atomized when discharged from the inner pipe 200a, and the atomized liquid materials 4A to 4C are sprayed into the vaporization chamber space 210.

  The orifice member 212 is fixed to the casing front end portion 208b so as to sandwich the sealing material 213 by the nozzle ring 211. The nozzle ring 211 attached to the tip of the casing 208 in the form of a cap nut is formed with a conical vaporizing surface 211a. The nozzle ring 211 prevents the liquid materials 4A to 4C sprayed from the nozzle part 20 from recondensing to the tip part of the nozzle part 20, and via a flange 208a (see FIG. 2) fixed to the vaporizing chamber 21. It is kept at a high temperature by the inflowing heat. As a result, even if the atomized liquid materials 4A to 4C adhere to the vaporization surface 211a, no unvaporized residue is generated.

  The above-described casing 208, nozzle ring 211, pipes 200a and 200b, etc. are formed of SUS or the like in consideration of corrosion or the like. On the other hand, the orifice member 212 and the sealing material 213 are made of a resin having good heat insulation so that the heat intrusion from the nozzle ring 211 to the cooling rod 202 is reduced. In particular, since the orifice member 212 and the sealing material 213 are also required to have corrosion resistance to the liquid materials 4A to 4C, it is desirable to form PTFE (polytetrafluoroethylene) excellent in heat insulation, heat resistance, and chemical resistance. Further, in order to prevent deformation of the orifice member 212 due to high temperature environment or tightening of the nozzle ring 211, it may be formed of PEEK (polyether ether ketone) having higher hardness.

  In the carburetor of the present embodiment, it is preferable to use the inner pipe 200a in a state where the tip of the inner pipe 200a slightly protrudes below the orifice member 212 (h> 0). The hole diameter e of the orifice member 212 is set smaller than the inner diameter of the outer pipe 200b, and the flow velocity Va of the atomized gas blown out from the annular region between the inner pipe 200a and the orifice member 212 is Va = several tens to 300 m. / S.

<< Description of Gas-Liquid Mixing Unit 90 >>
FIG. 5 is a diagram showing the appearance of the gas-liquid mixing unit 90, and ports 91 to 96 are provided. Flow control valves 9A to 9D are connected to the ports 91 to 94, and open / close valves V9 and V6 are connected to the ports 95 and 96, respectively.

  FIG. 6 is a cross-sectional view of the gas-liquid mixing unit 90. A cavity 900 is formed in the body of the gas-liquid mixing unit 90, and this cavity 900 corresponds to the transfer line 6E shown in FIG. The downstream side (the right side in the figure) of the cavity 900 is conical, and a port 96 is provided at the downstream outlet of the cavity 900. Further, four pipe lines 901 to 904 are formed so as to be orthogonal to the cavity 900. These pipes 901 to 904 are connected to ports 91 to 94 as shown in FIG.

  A pipe-like insert 905 having a through hole 905a is inserted into the cavity 900. A nut 906 is fixed to the left end portion of the insert 905, and the insert 905 is mounted in the cavity 900 by fixing the nut 906 to the female screw portion 907 of the gas-liquid mixing portion 90. Reference numeral 910 denotes a seal member. A through hole 908 is formed in the nut 906, a port 95 is fixed at the entrance (left side opening in the figure) of the through hole 908, and an insert 905 is fixed at the outlet side of the through hole 908. As a result, the port 95 and the through hole 905 a formed inside the insert 905 communicate with each other through the through hole 908.

  Further, on the outer periphery of the insert 905, spiral convex portions 905b are formed as shown in the external view of FIG. 7A, and a spiral groove 905c is formed between the convex portions 905b. As shown in FIG. 6, the outer periphery of the convex portion 905 b of the insert 905 inserted into the cavity 900 is in contact with the cavity wall, and a spiral duct 909 is formed between the cavity wall and the insert 905. Each of the ducts 901 to 904 is formed so as to communicate with the spiral duct 909.

  As shown by the arrows in FIG. 6, the liquid materials 4A to 4C and the solvent 4D that have flowed into the spiral conduit 909 from the conduits 901 to 904 are respectively transferred rightward in the figure through the spiral conduit 909. Then, the liquid materials 4A to 4C and the solvent 4D transferred to the tip of the insert 905 flow out from the gap between the insert 905 and the cavity wall to the mixing region 900a of the cavity 900 along the cavity wall.

  On the other hand, the carrier gas flows out along the axis from the through hole 905a of the insert 905 to the mixing region 900a. The wall surface of the mixing region 900 a has a tapered shape that sags toward the downstream, and is smoothly connected to the inner wall of the port 96. As a result, in the mixing region 900a, the liquid materials 4A to 4C and the solvent 4D flow along the wall surface of the cavity 900, and a gas-liquid two-layer flow in which the carrier gas flows through the center of the cavity 900 is efficiently formed. Further, as described above, the inner diameter of the mixing region 900a is gradually reduced and continuously connected to the inner wall of the port 96, thereby preventing the formed gas-liquid two-layer flow from being disturbed. it can.

  As described above, in the present embodiment, the gas-liquid mixing unit 90 has the double tube structure of the cavity 900 and the insert 905 as described above, and the liquid materials 4A to 4C, the solvent 4D, and the carrier gas are supplied along the axial direction. By flowing in parallel, a continuous flow composed of a stable gas-liquid two-layer flow can be formed. Moreover, since the convex part 905b contacts the wall surface of the cavity 900, the gap dimension can be kept uniform, and the stability of the gas-liquid two-layer flow is further increased. As a result, the atomization in the vaporizer 2 is stabilized. The flow rate of the carrier gas flowing out from the insert 905 is about 5 to 10 (m / s) so that a gas-liquid two-layer flow is formed, and is set much lower than the flow rate of the atomizing gas described above. Therefore, atomization does not occur in the outflow part of the double pipe structure.

  In the insert 905, the number of spiral grooves 905c is one, but a plurality of spiral grooves may be used. For example, four grooves are formed, and the liquid materials 4A to 4C and the solvent 4D are allowed to flow into different grooves. Moreover, inserts 920 and 930 as shown in FIGS. 7B and 7C may be used. In the insert 920 in FIG. 7B, a plurality of linear convex portions 920a are formed along the axial direction, and a through hole 920c is formed in the central axis. The liquid materials 4A to 4C and the solvent 4D flow in the axial direction in the groove 920b formed between the convex portions 920a.

  On the other hand, in the insert 930 shown in FIG. 7 (c), grooves are not formed on the outer peripheral surface like the insert 905 and the insert 920, but convex portions 930a and 930b for positioning are formed. A through hole 930 c is formed in the central axis of the insert 930. In the case of the insert 930, the liquid materials 4A to 4C and the solvent 4D flow through the gap between the outer peripheral surface of the insert 930 and the wall surface of the cavity 900 (see FIG. 6). The gap dimension can be adjusted by setting the height dimension of the protrusions 930a and 930b, and the protrusion dimension 930a and 930b can be kept uniform by contacting the wall surface of the cavity 900. In the case of the inserts 905 and 920 as well, the gap dimension between the inserts 905 and 920 and the cavity wall surface can be adjusted by the height dimension of the convex portions 905b and 920a.

  Further, a honeycomb structure 931 as shown in FIG. 8 may be disposed in a gap with the cavity wall of the insert 930. A large number of through holes 931a are formed in the honeycomb structure 931, and a stable gas-liquid two-layer flow is formed by flowing the liquid materials 4A to 4C and the solvent 4D in the through holes 931a in the axial direction.

[First Modification]
FIG. 9 is a view showing a first modification of the gas-liquid mixing unit, and the gas-liquid mixing unit has a cross section. As with the gas-liquid mixing unit 90 shown in FIG. 5, flow control valves 9A to 9D and on-off valves V9 and V6 are attached to the gas-liquid mixing unit 80 shown in FIG. In the gas-liquid mixing unit 80, pipe lines 82 to 86 are formed so as to obliquely intersect the pipe line 81 formed in the longitudinal direction. A port 95 is provided at the inlet of the pipe 81, and a port 96 is provided at the outlet of the pipe 81. Corresponding ports 91 to 94 are provided for the oblique pipelines 82 to 86.

10A is an enlarged view of a portion of the pipe 83, and FIG. 10B is a cross-sectional view taken along the line C-C. The pipe 83 is obliquely connected at an angle θ (<90 degrees) to the pipe 81 into which the carrier gas flows. By the carrier gas flowing from the left to the right through the pipe line, the liquid material 4B that has flowed obliquely from the pipe line 83 into the pipe line 81 in the lower right direction flows smoothly along the wall surface of the pipe line 81 in the right direction. As a result, a stable gas-liquid two-layer flow can be obtained as compared with the case where the liquid material 4B flows perpendicularly (θ = 90 degrees) to the pipe line 81 as in the prior art. Also, as shown in FIG. 10 (b), the opening of the pipe 83 is elliptical and the opening area is larger than the cross-sectional area of the pipe 83, so that the liquid material 4B is likely to be layered and the gas-liquid two layers. The flow condition is more stable. 6 corresponds to the case where the inflow angle θ is approximately 90 degrees.

  By the way, in the conventional liquid material vaporizer, a diaphragm valve is used as the opening / closing valve V6 (see FIG. 1). However, if a device such as a ball valve that has a straight flow path and does not significantly change the flow path shape is used. The adverse effect on the liquid two-layer flow can be reduced.

[Second Modification]
FIG. 11 is a diagram showing a second modification of the gas-liquid mixing unit, and shows the vaporizer 2 and the gas-liquid mixing unit 100. The transfer line 6E for supplying the liquid material in a gas-liquid two-layer flow state to the vaporizer 2 is provided vertically (in the vertical direction in the drawing). A port 106 for discharging the liquid material in a gas-liquid two-layer flow state is vertically provided at the bottom of the gas-liquid mixing unit 100, and this port 106 is transferred via an open / close valve V6 constituted by a ball valve. Connected to line 6A. That is, the transfer line from the gas-liquid mixing unit 100 to the tip of the nozzle unit 20 of the vaporizer 2 is configured linearly in the vertical direction.

  Ports 101 to 104 (see FIG. 12) through which the liquid materials 4A to 4D flow in are provided on the side surface of the gas-liquid mixing unit 100, and a port 105 through which the carrier gas flows in is provided on the top surface. FIG. 12 is a perspective view of the gas-liquid mixing unit 100. Although only the flow rate control valve 9B connected to the port 102 is shown in FIG. 12, the flow rate control valves 9A, 9C, and 9D are also connected to the other ports 101, 103, and 104 in the same manner as the gas-liquid mixing unit 90 described above. ing. The gas-liquid mixing unit 100 has a body 110 and a flange 111 fixed to the upper surface thereof. The ports 101 to 104 and 106 are attached to the body 110, and the port 105 is attached to the flange 111.

  FIG. 13 shows a DD cross section along the ports 101 and 102 of FIG. A cavity 112 having the same shape as the cavity 900 shown in FIG. 6 is vertically formed in the body 110, and an insert 905 is inserted into the cavity 112. As a result, a spiral conduit 909 is formed between the cavity inner wall and the insert 905 as in the case of the gas-liquid mixing unit 90. The upper end of the insert 905 is fixed to the flange 111, and a through hole 905 a formed at the center of the shaft of the insert 905 communicates with the carrier gas port 105 attached to the flange 111.

  In the body 110, a substantially horizontal pipe line 113 that connects the spiral pipe line 909 and the ports 101 to 104 attached to the side surface of the body is formed. The liquid materials 4A to 4C and the solvent 4D that have flowed into the spiral conduit 909 from each conduit 113 move downward in the figure in the spiral conduit 909, along the cavity wall from the gap between the insert 905 and the cavity wall. It flows out to the mixing area 112a. On the other hand, the carrier gas flows downward through the through hole 905a of the insert 905 and flows out from the tip of the insert 905 to the mixing region 112a.

  As a result, a gas-liquid two-layer flow of the liquid material and the carrier gas can be obtained efficiently and stably in the mixing region 112a. And in the 2nd modification, since the gas-liquid 2 laminar flow is formed, and the transfer path | route until it atomizes by the front-end | tip of the nozzle part 20 of the vaporizer | carburetor 2 is comprised linearly, the gas-liquid 2 in the meantime The laminar flow is not disturbed, and atomization and vaporization can be performed stably.

  Note that the inserts 920 and 930 may be used instead of the insert 905 described above. Furthermore, it is good also as a structure as shown in FIG. 14A is a cross-sectional view of the gas-liquid mixing unit 100 similar to that in FIG. 13, and FIG. 14B is a cross-sectional view taken along line EE. The body 110 is formed with a conduit 113 that is horizontal with respect to a hole 115 penetrating vertically. A carrier gas pipe 114 is inserted into the hole 115 with a gap between them, forming a double pipe structure.

  The liquid material supplied to each pipeline 113 flows into the gap between the pipe 114 and the hole 115 from the pipeline 113, moves downward in the figure, and flows out to the mixing region 115a along the wall surface of the hole 115. On the other hand, the carrier gas flows through the pipe 114 downward and flows out from the tip of the pipe 114 to the mixing region 115a of the hole 115. As a result, a gas-liquid two-layer flow of the carrier gas and the liquid material is formed.

In the correspondence between the embodiment described above and the elements of the claims, a double pipe structure is formed by the inserts 905, 920, and 930 and the cavity 900 or 112, and the carburetor 2 includes the vaporizing portion and the spiral groove. 905c constitutes a helical structure. In addition, the present invention is not limited to the above embodiment as long as the characteristics of the present invention are not impaired.

It is a block diagram which shows schematic structure of a liquid material vaporization apparatus. 2 is a cross-sectional view showing a schematic configuration of a vaporizer 2. FIG. It is the A section enlarged view of FIG. It is the B section enlarged view of FIG. It is a figure which shows the external appearance of the gas-liquid mixing part. It is sectional drawing of the gas-liquid mixing part 90. FIG. It is a figure which shows an insert, (a) is an external view of the insert 905, (b) is a perspective view of the insert 920, (c) is a perspective view of the insert 930. It is a figure which shows the honeycomb structure 931. FIG. It is a figure which shows the 1st modification of a gas-liquid mixing part. It is a figure explaining the gas-liquid mixing part 80, (a) is an enlarged view of the part of the pipe line 83, (b) is CC sectional drawing. It is a figure which shows the 2nd modification of a gas-liquid mixing part. 2 is a perspective view showing an appearance of a gas-liquid mixing unit 100. FIG. It is DD sectional drawing of FIG. It is a figure which shows the modification of the gas-liquid mixing part 100, (a) is sectional drawing of the gas-liquid mixing part 100, (b) is EE sectional drawing of (a).

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Liquid material supply apparatus 2 Vaporizer 3A-3D Container 4A-4C Liquid material 4D Solvent 6A-6E Transfer line 7, 7A Carrier gas line 9A-9D Flow control valve 80, 90, 100 Gas-liquid mixing part 81-86,901 -904 Pipe line 91-96, 101-106 Port 114 Pipe 900, 112 Cavity 900a, 112a, 115a Mixing region 905, 920, 930 Insert 905a, 920c, 930c, 931a Through hole 905b, 920a, 930a, 930b Convex part 905c Spiral groove 909 Spiral duct 920b Groove 931 Honeycomb structure

Claims (4)

A gas-liquid mixing unit that causes the liquid material to flow along the wall surface of the flow path through which the carrier gas flows to generate a gas-liquid two-layer flow state of the liquid material and the carrier gas;
A vaporization unit that sprays the liquid material in a gas-liquid two-layer flow state generated in the gas-liquid mixing unit and vaporizes the sprayed liquid material,
The gas-liquid mixing unit includes a double pipe structure having an inner pipe through which a carrier gas flows and an outer pipe formed around the inner pipe and in which the liquid material flows in the same direction as the carrier gas, The liquid material vaporizer characterized by providing the said wall surface along the outflow downstream direction from the outflow port of the said double-pipe structure. The liquid material vaporizer according to claim 1,
A liquid material vaporizer characterized in that a spiral structure for guiding the liquid material to an outlet of the double pipe structure is formed in the outer pipe. In the liquid material vaporizer according to 請 Motomeko 1 or 2,
The wall surface forms a tapered pipe with a cross-sectional area that continuously decreases, and the cross-sectional shape of the pipe outlet of the pipe is a liquid material in a gas-liquid two-layer flow state to the vaporization section A liquid material vaporizer characterized by having the same shape as the cross-sectional shape of the pipe leading to the pipe. The liquid material vaporizer according to claim 1,
An apparatus for vaporizing liquid material, comprising a liquid material supply conduit that is connected obliquely to the outer conduit in the flow direction of the carrier gas and supplies the liquid material to the outer conduit.

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