JP4185380B2

JP4185380B2 - Lens polishing equipment

Info

Publication number: JP4185380B2
Application number: JP2003047286A
Authority: JP
Inventors: 洋黒澤
Original assignee: Topcon Corp
Current assignee: Topcon Corp
Priority date: 2003-02-25
Filing date: 2003-02-25
Publication date: 2008-11-26
Anticipated expiration: 2023-02-25
Also published as: JP2004255492A

Description

【０００１】
【発明の属する技術分野】
本発明は、レンズ研磨装置の改良に関し、例えば圧力条件に敏感な素材の研磨に好適なレンズ研磨装置に関する。
【０００２】
【従来技術】
従来から、各種のレンズおよび研磨工具を保持する構成に関しては、以下のような機構が採用されてきた。
【０００３】
(１)．伝統的な光学レンズ研磨機
図６と図７に伝統的な光学レンズ研磨機５０の主要部の一例を示す。
【０００４】
回転する下側の回転軸５２に凸面研磨工具５４（又は凸レンズ）を装着し、横方向に揺動する上側のジグ５６に凹レンズ５８（又は凹面研磨工具）を装着する。凸面研磨工具５４は、ネジもしくはコレットチャックで回転軸５２に固定装着される。ジグ５６は、カンザシ６０と呼ばれる棒状部材に回転・傾斜自由に保持される。カンザシ６０は、球面加工された軸端６０ａを有し、ジグ５６の背面に設けた穴５６ａに挿入されて自在継手５５を構成するものである。
【０００５】
レンズ５８と研磨工具５４を加圧する場合は、カンザシ６０の軸上に錘６２を付加して調整するが、減圧する場合は、カンザシ６０に連結された揺動アーム６４上後方に張り出した減圧棒６６に錘６８を付加して調整する。錘６８を数種類組み合わせて加減圧の調整をするが、加重を精密に設定するには無理がある。一般的にレンズ５８を高精度に仕上げる際には加重を減じ、研磨工具５４（ピッチ）の変形、摩擦熱発生、砥粒過干渉等を低減・抑制し、形状精度・表面あらさを改善する。
【０００６】
また、この種の研磨機では、研磨工具とレンズ間の高さ方向の相対的変位Ｙ（カンザシの高さ方向変位）は、カンザシ６０を保持しているアーム６４後方の縦方向回転軸６９の回転により吸収する構造となっている。
【０００７】
研磨進行中は、レンズと研磨工具の表面状態や相互間の潤滑状態が変化する。これに伴い、摩擦力の変動に起因して微妙な脈動が生じ、これがアーム部で増幅回帰されることによりビビリを起こしやすい。
【０００８】
(２)．近代的な光学レンズ研磨機
図８に近代的なレンズ研磨機７０の主要部の一例を示す。
【０００９】
揺動アーム８４に加減圧調整用のエアシリンダ８２が接続されている。エアシリンダ８２は、加圧調整用のレギュレータ８６と減圧調整用のレギュレータ８８を備えている。
【００１０】
レンズ７８と研磨工具７４との間の加減圧をエアシリンダ８２が行う。加減圧用の各レギュレータ８６，８８を調整することにより、研磨圧力は自在に調整可能である。ただし、空気圧を絞込み過ぎるとシリンダ８２内部の機械的摩擦の影響が増大するため、低圧力側での微調整は困難である。
【００１１】
研磨工具７４とレンズ７８間の高さ方向の相対的変位（カンザシ８０の高さ方向変位）は、（１）と同様にカンザシ８０を保持しているアーム８４後方の縦方向回転軸８９の回転により吸収する構造としている。
【００１２】
研磨進行中は、レンズ７８と研磨工具７４の表面状態や相互間の潤滑状態が変化する。これに伴う摩擦力の変動に起因して微妙な脈動が生じ、これがアーム８４の中間に接続したエアシリンダ８２により吸収されている。
【００１３】
(３)．多軸ＮＣ非球面レンズ研磨装機
図９は、黒田精工製の多軸ＮＣ非球面レンズ研磨装置９０の概要である。構成は一見複雑だが、注目すべき部分は研磨工具９４の加減圧装置９９である。研磨工具９４は回転・傾斜自由に駆動モータ（図示せず）のスピンドル９５の先端部に装着されている。駆動モータ自身は静圧エアスライド９６上のガイドブロックに固定されており、ｚ方向に滑動自由に保持されている。このガイドブロック側面の一方から上方にワイヤ（図示せず）が張り出し、対辺の錘（図示せず）によりカウンターバランスが取られている。このカウンターバランスによりガイドブロック部に接続する全加重を相殺すれば、研磨圧力は極微小量に調整できる。
【００１４】
また、この研磨装置９０では、レンズ９８と研磨工具９４間の高さ方向の相対的変位（カンザシの高さ方向変位）はｚ軸のＮＣサーボにより制御される。さらに研磨進行中のレンズ９８および研磨工具９４の表面状態と潤滑状態の変化にともなう摩擦力の変動に起因する微妙な脈動は、静圧エアスライド９６が加工部上方に位置するために直ちに吸収される。
【００１５】
【発明が解決しようとする課題】
前項（１）に記載の伝統的レンズ研磨機５０の場合、研磨圧力は任意の加重を有する複数種の錘６２，６８の付加により調整されるので、低圧側での微調整は本質的に困難である。また、研磨工具５４とレンズ５８間の高さ方向の相対的変位Ｙ（マクロな振動）は、カンザシ６０を保持するアーム６４後方の縦方向回転軸６９の回転により吸収する構造としている。一方、研磨進行中には、試料および工具表面状態・潤滑状態の変化が起こり、この現象にともなう摩擦力の変動＝周期的脈動（ミクロな振動）は長いアーム６４に伝わり増幅されて、研磨面に回帰される結果、形状精度、表面粗さを劣化させる等の不都合があった。
【００１６】
また、前項（２）に記載の近代的レンズ研磨機７０の場合、研磨圧力の調整はエアシリンダ８２に供給する空気圧をレギュレータ８６，８８で任意に調整できるので、その微調整は容易であるが、空気圧を絞込み過ぎるとシリンダ８２内部の機械的摩擦の影響が相対的に増大し、低圧力側での微調整は困難である。
【００１７】
また、前項（３）に記載の多軸ＮＣ非球面レンズ研磨機９０の場合、装置構成は複雑化する。
【００１８】
本発明は上記の事情に鑑みて発明されたものであって、その第1の目的は、軽微な研磨圧力の付加を容易とし、圧力条件に敏感な素材の研磨に適合したレンズ研磨装置を提供することである。
【００１９】
第２の目的は、研磨工具とレンズ間の高さ方向の相対的変位（マクロな振動）および摩擦力の変動に起因する微妙な脈動（ミクロな振動）を吸収し、これらの増幅が起こりにくいレンズ研磨装置を提供することである。
【００２０】
第３の目的は、簡素なユニットとして構成し、容易に装着可能とする事で、一般に普及している多様なレンズ研磨装置にも適用可能な吸収機構ユニットを提供することである。
【００２１】
なお、加圧シリンダ等によりワークに加圧する圧力を制御したり、ワークと工具の相対位置を制御してワークに加圧する圧力を制御する研磨装置や、ＮＣ制御による研磨装置が知られている（特許文献１等参照）。
【００２２】
【特許文献１】
特開２００１−３８５９５号公報
【００２３】
【特許文献２】
特開２００２−１７８２５２号公報
【００２４】
【特許文献３】
特開２００２−１７８２５１号公報
【００２５】
【特許文献４】
特開平１０−３４５１１号公報
【００２６】
【課題を解決するための手段】
上記目的を達成するための手段を例示すると、以下のとおりである。
【００２７】
例えば、本願の請求項１に記載のレンズ研磨装置は、レンズ及び研磨工具に所望の圧力を加える加圧手段と、レンズ及び研磨工具の少なくとも一方に揺動運動を与える揺動機構を有するレンズ研磨装置において、揺動機構が第１方向（Ｘ）に揺動するアームを有し、レンズ及び研磨工具の相対運動に従動する従動部材が、揺動機構のアームの先端付近に設けられており、吸収機構が、従動部材に接続されていて、従動部材の第２方向（Ｙ）の変動を吸収する構成にしたことを特徴とする。
【００２８】
また、請求項２に記載のレンズ研磨装置は、吸収機構が、カンザシとこれを保持するリニアガイドで構成されていることを特徴とする。
【００２９】
また、請求項３に記載のレンズ研磨装置は、吸収機構が、自己潤滑性を有する樹脂材球体とこれを内面に保持する円筒状部材で構成されていることを特徴とする。
【００３０】
また、請求項４に記載のレンズ研磨装置は、吸収機構が、自己潤滑性を有するリング状部材とこの周囲を保持する円筒状部材で構成されていることを特徴とする。
【００３１】
また、請求項５に記載のレンズ研磨装置は、回転軸と、回転軸に対応する従動部材との間に、研磨工具とレンズを配置して、研磨工具によりレンズを研磨する構成のレンズ研磨装置において、従動部材を第１方向（Ｘ）に揺動させるための揺動機構を設け、揺動機構と従動部材との間にガイドと運動部材を設け、ガイドと運動部材が第２方向（Ｙ）に相対的に移動可能に構成されていることを特徴とする。
【００３２】
また、請求項６に記載のレンズ研磨装置は、運動部材に錘を取り付けるための取付部材を設け、錘により研磨工具とレンズの間の圧力が調節可能に構成されていることを特徴とする。
【００３３】
また、請求項７に記載のレンズ研磨装置は、レンズ及び研磨工具のいずれか一方の高さ方向の変位と、これらの間の研磨圧力の変動に起因する脈動を、ガイド及び運動部材が吸収することを特徴とする。
【００３４】
また、請求項８に記載のレンズ研磨装置は、運動部材がカンザシで構成され、ガイドがカンザシをガイドするためのリニアガイドで構成されていることを特徴とする。
【００３５】
また、請求項９に記載のレンズ研磨装置は、運動部材が自己潤滑性を有する樹脂材球体で構成され、ガイドが樹脂材球体を収容するための円筒状部材で構成されていることを特徴とする。
【００３６】
また、請求項１０に記載のレンズ研磨装置は、運動部材が自己潤滑性を有するリング状部材で構成され、ガイドがリング状部材の外周に接続する円筒状部材で構成されていることを特徴とする。
【００３７】
また、請求項１１に記載のレンズ研磨装置は、円筒状部材の上方から錘が着脱自在に構成されていることを特徴とする。
【００３８】
また、請求項１２に記載の吸収機構装置は、レンズ及び研磨工具に所望の圧力を加える加圧手段と、レンズ及び研磨工具の少なくとも一方に揺動運動を与える揺動機構を有するレンズ研磨装置用の吸収機構ユニットにおいて、レンズ及び研磨工具の相対運動に従動する従動部材と、従動部材に接続されていて、従動部材のリニア運動に連動してリニア運動をする運動部材と、運動部材のリニア運動を案内するガイドとを備えることを特徴とする。
【００３９】
以上の構成により、研磨工具（ピッチ）の変形および摩擦熱発生を低減させ、形状精度を向上させるとともに、砥粒過干渉を抑制し、表面あらさ・表面欠陥を低減させる。また、ビビリを原因とするフチダレを防止し、形状精度向上を図る。周期的な砥粒過干渉の抑制により、この効果によっても表面あらさ・表面欠陥を低減させる。
【００４０】
【発明の実施の形態】
本発明において、レンズ及び研磨工具に所望の圧力を加える加圧手段は、以下に示す実施例においては、錘として示されているが、他の種々の加圧手段も利用可能である。
【００４１】
揺動機構は、以下に示す実施例においては、クランク軸を含むものとして示されているが、他の種々の形式の揺動機構も利用可能である。また、レンズ及び研磨工具の一方だけでなく両方に揺動運動を与えても良い。
【００４２】
アームは、以下に示す実施例においては、板状のものや棒状のものが示されているが、これらに種々の部材を付加してアームとして構成しても良いし、又はこれら以外の部材でアームを構成しても良い。
【００４３】
第１方向（ｘ）と第２方向（ｙ）は、以下に示す実施例においては、それぞれ水平方向と鉛直方向として示されているが、他の種々の方向も利用可能である。
【００４４】
吸収機構は、以下に示す実施例においては、カンザシとこれを保持するリニアガイドや、自己潤滑性を有する樹脂材球体とこれを内面に保持する円筒状部材や、自己潤滑性を有するリング状部材とこの周囲を保持する円筒状部材で構成されているが、他の種々形状の運動部材とこれを案内するガイドも利用可能である。
【００４５】
【実施例】
図１は、本発明によるレンズ研磨装置の１つの実施例を示す。図２は図１のレンズ研磨装置の上面図である。
【００４６】
レンズ研磨装置１０１は、フレーム構造１３の上に、回転数可変の回転軸３を有している。凸面研磨工具１は、基板１ａとその表面に貼り付けられたポリシャ材１ｂとを有している。凸面研磨工具１は、基板１ａの背面に設けられたネジ２によって回転軸３上に装着されている。
【００４７】
凸面研磨工具１の上面には凹レンズ４が接触している。凹レンズ４は、接着剤５により、従動部材としてのジグ６に貼り付いている。
【００４８】
ジグ６の背面にはザグリ穴６ａが形成されている。ザグリ穴６ａには、カンザシ７が鉛直に挿入される。カンザシ７は、外形の円筒度・表面あらさを適切に仕上げ、表面処理によりＨＲｃ５５以上に硬化したものである。ザグリ穴６ａにカンザシ７を挿入する事で、一種の自在継ぎ手１０２が構成される。ジグ６はカンザシ７に対して回転・傾斜自由である。カンザシ７の上部には、取付部材としてのネジ９ａが設けられている。ネジ９ａにより、微量の錘９が固定され、さらに状況により微量の調整用分銅１０も載せられる。これらの加重はカンザシ７先端の球面加工部７ａに加えられる。
【００４９】
カンザシ７の周囲には、ころがり軸受けの一種であるリニアガイドブッシュ８が相対移動可能に設けられている。カンザシ７は運動部材としてリニアガイドブッシュ８により上下方向（鉛直方向）ｙの直線運動および回転自由に保持され案内されている。カンザシ７とリニアガイドブッシュ８により吸収機構１００が形成される。
【００５０】
リニアガイドブッシュ８は長い基板１１の先端に固定されている。この基板１１の下面には、ガイドブロック１２ａが取り付けられている。研磨装置フレーム構造１３上部には、ガイドブロック１２ａに対応する直線ガイドレール１２ｂが設けられている。直線ガイドレール１２ｂとガイドブロック１２ａとの摺動により、基板１１は、水平方向ｘに直線運動自在に構成されている。
【００５１】
基板１１の基端には、レール１２ｂと直角配置で、自己潤滑性を有する２枚の樹脂板１４が平行に配置されている。この近傍には回転数可変で鉛直方向に軸心を有する回転軸１５がある。回転軸１５には水平方向に伸びた板１６が接続されている。板１６上には位置決め可能なピン１７が２枚の平行樹脂板１４の間に位置するように適切な方法で固定され、一種のクランク軸が形成されている。すなわち、ピン１７は２枚の平行樹脂板１４の間に挿入されて、ピン１７の位置決めでクランクの振り幅ａを設定し、基板１１およびカンザシ７が振幅ａでｘ方向に往復直線運動を行う。なお、基板１１、ブロック１２ａ、レール１２ｂ、樹脂版１４、回転軸１５、板１６、ピン１７、等で揺動機構１０３が構成されている。
【００５２】
カンザシ７の往復直線運動にともなうレンズ４の縦方向ｙの変位ｂは、カンザシ７とリニアガイドブッシュ８との間の直線運動自在な保持構造により吸収され、研磨面の摺動にともなう傾きは、カンザシ先端球面加工部７ａとジグ６背面のザグリ穴６ａで構成される自在継ぎ手１０２により吸収されるため、両者はスムーズに往復揺動を行う。ここに研磨工具１側の回転が加わり、レンズ研磨装置としての運動が実現される。
【００５３】
一般的なレンズ研磨装置と比較した場合、カンザシ７に直接微量の錘１０が付加できるので軽量範囲で微妙な加圧調整が可能である。このため、研磨工具１（ピッチ）の変形および摩擦熱発生を低減させ、形状精度を向上させるとともに、砥粒過干渉を抑制し、表面あらさ・表面欠陥を低減させる事ができる。とりわけ、ＣａＦ₂材等、圧力条件に敏感な素材の研磨には好適である。
【００５４】
また、研磨の進行中に起こるレンズ４および研磨工具１の表面状態・相互間の潤滑状態の変化から摩擦力の変動が起こり、微小な脈動が生じても直ちにリニアガイドブッシュ８付近で吸収されるため基板１１（アーム部分ともいう）で増幅回帰することが無い。このため、ビビリを原因とするフチダレを防止できる等、形状精度向上の他、周期的な砥粒過干渉を抑制でき、この効果によっても表面あらさ・表面欠陥を低減させる事ができる。
【００５５】
この実施例では、上側配置を凹レンズ、下側配置を凸面研磨工具としたが、上側配置を凸レンズ、下側配置を凹面研磨工具としても良く、また、上側配置を凹面研磨工具、下側配置を凸レンズとしても良い。特に一般的なレンズ研磨装置では、上側配置を凸レンズとした場合に曲率半径１００ｍｍ程度でも難しいとされるが、本発明のレンズ研磨装置によれば、この場合でもビビリが起こりにくく、さらに曲率半径５０ｍｍ程度までの凸レンズ研磨が可能である。
【００５６】
図３は、本発明によるレンズ研磨装置の別の実施例を示す。なお、上記実施例中の部材と同一の部材には同一の符号を付し、その説明を省略する。また、揺動機構は図１と図２で示したものと同様のものを利用できるため、図示が省略されている。
【００５７】
レンズ研磨装置１０４は、フレーム構造１３の上に、回転数可変の回転軸３を有している。回転軸３上には、レンズ接着ジグ２０が背面のネジ２０ａにて装着されており、その表面に凸レンズ１８が接着剤１９により貼り付けられている。
【００５８】
凹面研磨工具２２は、基板２２ｂとその下面に貼り付けられたポリシャ材２２ｃ（ピッチ、ポリウレタン等）とを有している。凹面研磨工具２２は、従動部材として凸レンズ１８の上面に接触している。
【００５９】
凹面研磨工具２２の背面中心には、状況により研磨装置１０４の下軸側に装着可能とするための取付部材としてのネジ２２ａが設けられており、この部分に微量の錘２３を固定すれば、適切に加重が調整できる。
【００６０】
ネジ２２ａの先端部分には、自己潤滑性を有する樹脂性球状キャップ材２４が運動部材として装着されている。キャップ材２４の周囲には、円筒状部材２５が移動可能に設けられている。円筒状部材２５は、前記記載の往復直線運動を行う基板１１先端に取り付け、グリースを塗布してガイドとして構成したものである。
【００６１】
キャップ材２４を円筒状部材２５の内部に挿入すれば、一種の自在継ぎ手１０５が構成され、回転・傾斜およびｘ方向の直線運動が自由に接続される。なお、自在継ぎ手１０５は、本発明の吸収機構としても機能する。円筒状部材２５はその外周部の円筒部材２６により直線運動が自由に保持され案内されているが、円筒状部材２５上部に固定した止め輪２５ａにより下方に抜け落ちる事は無い。この構成により、レンズ１９および研磨工具２２の着脱が容易となる。また、円筒状部材２６に代えて、リニアガイドブッシュを用いても良い。
【００６２】
円筒状部材２５のｘ方向の往復直線運動にともなうレンズ１８と研磨工具２２間の縦方向ｙの変位ｂおよび研磨面の摺動にともなう傾きは、樹脂性球状キャップ材２４と円筒状部材２５内面とで構成される直線運動・傾斜が自由な保持構造（吸収機構）により吸収されるので、両者はスムーズに往復揺動を行う。ここにレンズ１８側の回転が加わり、レンズ研磨装置としての運動が実現される。
【００６３】
一般的なレンズ研磨装置と比較した場合、研磨工具２１に直接微量の錘２３が付加できるので軽量範囲で微妙な加圧調整が可能である。このため、研磨工具２２（ピッチ）の変形および摩擦熱発生を低減させ、形状精度を向上させるとともに、砥粒過干渉を抑制し、表面あらさ・表面欠陥を低減させる事ができる。とりわけ、ＣａＦ₂材等、圧力条件に敏感な素材の研磨には好適である。
【００６４】
また、研磨の進行中に起こるレンズ１９および研磨工具２２の表面状態とこれら相互間の潤滑状態の変化から摩擦力の変動が起こり、微小な脈動が生じても直ちに樹脂性球状キャップ材２４と円筒状部材２５内面で構成された吸収機構としての自在継ぎ手部１０５で吸収されるためアーム部分１１で増幅回帰することが無い。このため、ビビリを原因とするフチダレを防止できる等、形状精度向上の他、周期的な砥粒過干渉を抑制でき、この効果によっても表面あらさ・表面欠陥を低減させる事ができる。
【００６５】
この実施例では、上側配置を凹面研磨工具、下側配置を凸レンズとしたが、上側配置を凸レンズ、下側配置を凹面研磨工具としても良く、また、上側配置を凹レンズ、下側配置を凸面研磨工具としても良い。
【００６６】
図４は、本発明によるレンズ研磨装置の更に別の実施例を示す。なお、上記実施例中の部材と同一の部材には同一の符号を付し、その説明を省略する。また、揺動機構は図１と図２で示したものと同様のものを利用できるため、図示が省略されている。
【００６７】
レンズ研磨装置１０７は、フレーム構造１３の上に、回転数可変の回転軸３を有している。凸面研磨工具１は、基板１ａとその表面に貼り付けられたポリシャ材１ｂ（ピッチ，ポリウレタン等）とを有している。凸面研磨工具１は、基板１ａの背面に設けられたネジ２によって回転軸３に装着されている。
【００６８】
凸面研磨工具１の上面には、凹レンズ４が接触している。凹レンズ４は、接着剤５により、本発明の従動部材としてのジグ２７に貼り付けられている。
【００６９】
ジグ２７の側面、もしくは背面には、自己潤滑性を有するリング状部材２８が運動部材として固定されている。リング状部材２８は、その外周をガイドとしての円筒状部材３０で保持され案内されている。円筒状部材３０は、部材３１を介してｘ方向に往復直線運動を行う基板１１に接続される。リング状部材２８と円筒状部材３０により一種の自在継ぎ手１０８が構成され、回転・傾斜および直線運動が自由に行われる。なお、自在継ぎ手１０８は、本発明の吸収機構としても機能する。
【００７０】
研磨工具２７の背面には、状況により研磨装置下軸側に装着可能とするためのネジ（図示せず）が設けられている。このネジを微量の錘２９を取り付けるための取付部材として利用すれば、適切に加重が調整できる。
【００７１】
円環状部材３０のｘ方向の往復直線運動にともなうレンズ４と研磨工具１間の縦方向ｙの変位ｂおよび研磨面の摺動にともなう傾きは、リング状部材２８と円筒状部材３０内面との直線運動・傾斜が自由な保持構造（吸収機構）により吸収されるので、両者はスムーズに往復揺動を行う。ここに研磨工具１側の回転が加わり、レンズ研磨装置としての運動が実現される。
【００７２】
一般的なレンズ研磨装置と比較した場合、研磨工具１に直接微量の錘２９が付加できるので軽量範囲で微妙な加圧調整が可能である。このため、研磨工具１（ピッチ）の変形および摩擦熱発生を低減させ、形状精度を向上させるとともに、砥粒過干渉を抑制し、表面あらさ・表面欠陥を低減させる事ができる。とりわけ、ＣａＦ₂材等、圧力条件に敏感な素材の研磨には好適である。
【００７３】
また、研磨の進行中に起こるレンズ４および研磨工具１の表面状態とこれら相互間の潤滑状態の変化から摩擦力の変動が起こり、微小な脈動が生じても直ちにリング状部材２８と円筒状部材３０内面で構成された吸収機構としての自在継ぎ手部１０８で吸収されるためアーム部分１１で増幅回帰することが無い。このため、ビビリを原因とするフチダレを防止できる等、形状精度向上の他、周期的な砥粒過干渉を抑制でき、この効果によっても表面あらさ・表面欠陥を低減させる事ができる。
【００７４】
この実施例では、上側配置を凹レンズ、下側配置を凸面研磨工具としたが、上側配置を凸レンズ、下側配置を凹面研磨工具としても良く、また、上側配置を凹面研磨工具、下側配置を凸レンズとしても良い。
【００７５】
図５は、図１と図２に示したレンズ研磨装置の揺動機構１０３を一般的な揺動機構１１１に変更したレンズ研磨装置の実施例を示す。
【００７６】
研磨装置１１０の揺動アーム３２から張り出した部材３３の下部３４にねじ込まれたボルト（図示せず）の突き出し量を調整し、アーム３２が水平状態を保持するように調整する。突き出たボルト先端部は揺動機構１１１の下側の基部３５に当たり、縦方向回転軸３６の周りでアームの下向き動作は阻止されるが、上向きには動作可能でレンズおよび研磨工具の着脱は容易である。なお、揺動アーム３２、部材３３、ボルト、基部３５、縦方向回転軸３６等により揺動機構１１１が構成されている。
【００７７】
通常、アーム３２先端部にはカンザシ７を挿入する程度の小さい穴を有する部材が設けられるが、ここではリニアガイドブッシュ８の外径を挿入できる程度の部材３７が設けられる。図１に示したカンザシまわりの構成を部材３７に組み込むことにより、ほぼ同様の動作が実現し、一般的な揺動機構を有するレンズ研磨装置でも同等の効果が得られる。
【００７８】
【発明の効果】
本発明によれば、軽微な研磨圧力の付加が容易であり、ＣａＦ₂材のように圧力条件に敏感な素材を研磨できる。研磨工具とレンズ間の高さ方向の相対的変位（マクロな振動）および摩擦力の変動に起因する微妙な脈動（ミクロな振動）の増幅が起こりにくいため、研磨工具（ピッチ）の変形および摩擦熱発生を低減でき、形状精度が向上するとともに、砥粒過干渉を抑制し、表面あらさ・表面欠陥を低減できる。また、ビビリを原因とするフチダレを防止でき、形状精度向上を図ることができる。周期的な砥粒過干渉の抑制により、この効果によっても表面あらさ・表面欠陥を低減できる。また、装置構成を簡素にできる。
【００７９】
なお、本発明は図示された実施例に限定されない。例えば、揺動機構に運動部材を取り付け、従動部材にガイドを取り付けて、レンズ研磨装置を構成しても良い。
【図面の簡単な説明】
【図１】本発明によるレンズ研磨装置の１つの実施例を示す。
【図２】図１のレンズ研磨装置の上面図である。
【図３】本発明によるレンズ研磨装置の別の実施例を示す。
【図４】本発明によるレンズ研磨装置の更に別の実施例を示す。
【図５】図１と図２に示したレンズ研磨装置の揺動機構を一般的な揺動機構に変更したレンズ研磨装置の例である。
【図６】伝統的な光学レンズ研磨機の主要部の一例を示す。
【図７】伝統的な光学レンズ研磨機の主要部の一例を示す。
【図８】近代的なレンズ研磨装置の主要部の一例を示す。
【図９】黒田精工製の多軸ＮＣ非球面レンズ研磨装置の概要である。
【符号の説明】
１、２２研磨工具
１ａ基板
１ｂポリシャ材
２、９ａ、２０ａネジ
３、１９回転軸
４凹レンズ
５、１９接着剤
６、２０、２７ジグ
６ａザグリ穴
７カンザシ
７ａ球面加工部
８リニアガイドブッシュ
９、２３、２９錘
１０調整用分銅
１１基板
１２ａガイドブロック
１２ｂ直線ガイドレール
１３フレーム構造
１４樹脂板
１６板
１７ピン
１８凸レンズ材
２８リング状部材
３０円筒状部材
３１部材
３２揺動アーム
３３部材
３４下部
３５基部
３６縦方向回転軸
１００吸収機構
１０１、１０４、１０７、１１０レンズ研磨装置
１０８自在継ぎ手
１０３、１１１揺動機構
ａ，ｂ振幅[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an improvement of a lens polishing apparatus, for example, a lens polishing apparatus suitable for polishing a material sensitive to pressure conditions.
[0002]
[Prior art]
Conventionally, the following mechanism has been adopted for the configuration for holding various lenses and polishing tools.
[0003]
(1). Traditional Optical Lens Polishing Machine FIGS. 6 and 7 show an example of the main part of a traditional optical lens polishing machine 50. FIG.
[0004]
A convex polishing tool 54 (or convex lens) is mounted on the rotating shaft 52 on the lower side, and a concave lens 58 (or concave polishing tool) is mounted on the upper jig 56 that swings in the lateral direction. The convex polishing tool 54 is fixedly mounted on the rotary shaft 52 with a screw or a collet chuck. The jig 56 is held by a rod-like member called a Kanzashi 60 so as to freely rotate and tilt. The Kanzashi 60 has a spherically processed shaft end 60 a and is inserted into a hole 56 a provided on the back surface of the jig 56 to constitute a universal joint 55.
[0005]
When pressure is applied to the lens 58 and the polishing tool 54, adjustment is performed by adding a weight 62 on the axis of the Kanzashi 60. However, when the pressure is reduced, a pressure reducing bar protruding rearwardly on the swing arm 64 connected to the Kanzashi 60. Adjustment is made by adding a weight 68 to 66. Although the pressure is adjusted by combining several types of weights 68, it is impossible to set the weight accurately. In general, when the lens 58 is finished with high accuracy, the load is reduced to reduce / suppress deformation of the polishing tool 54 (pitch), frictional heat generation, excessive interference with abrasive grains, etc., and improve shape accuracy and surface roughness.
[0006]
Further, in this type of polishing machine, the relative displacement Y in the height direction between the polishing tool and the lens (displacement in the height direction of the Kanzashi) is caused by the longitudinal rotation shaft 69 behind the arm 64 holding the Kanzashi 60. It is structured to absorb by rotation.
[0007]
While polishing is in progress, the surface condition of the lens and the polishing tool and the lubrication state between them change. Along with this, subtle pulsations occur due to the fluctuation of the frictional force, and this is easily amplified and regressed at the arm portion, and thus chatter is likely to occur.
[0008]
(2). Modern Optical Lens Polishing Machine FIG. 8 shows an example of a main part of a modern lens polishing machine 70.
[0009]
An air cylinder 82 for adjusting pressure increase / decrease is connected to the swing arm 84. The air cylinder 82 includes a pressure adjusting regulator 86 and a pressure reducing regulator 88.
[0010]
The air cylinder 82 performs pressure increase / decrease between the lens 78 and the polishing tool 74. By adjusting the regulators 86 and 88 for pressure increase / decrease, the polishing pressure can be freely adjusted. However, if the air pressure is excessively reduced, the influence of mechanical friction inside the cylinder 82 increases, so fine adjustment on the low pressure side is difficult.
[0011]
The relative displacement in the height direction between the polishing tool 74 and the lens 78 (the displacement in the height direction of the Kanzashi 80) is the rotation of the longitudinal rotation shaft 89 behind the arm 84 holding the Kanzashi 80, as in (1). It has a structure that absorbs.
[0012]
While the polishing is in progress, the surface state of the lens 78 and the polishing tool 74 and the lubrication state between them change. A slight pulsation occurs due to the fluctuation of the frictional force accompanying this, and this is absorbed by the air cylinder 82 connected in the middle of the arm 84.
[0013]
(3). Multi-axis NC Aspheric Lens Polishing Machine FIG. 9 is an outline of a multi-axis NC aspheric lens polishing apparatus 90 manufactured by Kuroda Seiko. Although the structure is complicated at first glance, the notable part is the pressure-intensifying device 99 of the polishing tool 94. The polishing tool 94 is mounted on the tip of a spindle 95 of a drive motor (not shown) so as to freely rotate and tilt. The drive motor itself is fixed to a guide block on the static pressure air slide 96 and is slidably held in the z direction. A wire (not shown) projects upward from one of the side surfaces of the guide block and is counterbalanced by a weight (not shown) on the opposite side. If the total weight connected to the guide block portion is offset by this counter balance, the polishing pressure can be adjusted to a very small amount.
[0014]
Further, in the polishing apparatus 90, the relative displacement in the height direction between the lens 98 and the polishing tool 94 (the height displacement of the Kanzashi) is controlled by the z-axis NC servo. Further, the fine pulsation caused by the fluctuation of the frictional force due to the change in the surface state and the lubrication state of the lens 98 and the polishing tool 94 during the polishing is immediately absorbed because the static pressure air slide 96 is positioned above the processing portion. The
[0015]
[Problems to be solved by the invention]
In the case of the traditional lens polishing machine 50 described in the preceding item (1), the polishing pressure is adjusted by adding a plurality of types of weights 62 and 68 having arbitrary weights, so that fine adjustment on the low pressure side is essentially difficult. It is. Further, the relative displacement Y (macro vibration) in the height direction between the polishing tool 54 and the lens 58 is absorbed by the rotation of the vertical rotation shaft 69 behind the arm 64 that holds the Kanzashi 60. On the other hand, while the polishing is in progress, the sample surface and the tool surface state / lubrication state change, and the frictional force fluctuation associated with this phenomenon = periodic pulsation (micro vibration) is transmitted to the long arm 64 and amplified. As a result, the shape accuracy and the surface roughness are degraded.
[0016]
In the case of the modern lens polishing machine 70 described in the preceding item (2), the air pressure supplied to the air cylinder 82 can be arbitrarily adjusted by the regulators 86 and 88 to adjust the polishing pressure. If the air pressure is reduced too much, the influence of mechanical friction inside the cylinder 82 is relatively increased, and fine adjustment on the low pressure side is difficult.
[0017]
Further, in the case of the multi-axis NC aspherical lens polisher 90 described in the preceding item (3), the apparatus configuration is complicated.
[0018]
The present invention has been invented in view of the above circumstances, and a first object of the present invention is to provide a lens polishing apparatus that facilitates the application of a slight polishing pressure and is suitable for polishing a material sensitive to pressure conditions. Is to provide.
[0019]
The second purpose is to absorb the relative displacement (macro vibration) in the height direction between the polishing tool and the lens and the fine pulsation (micro vibration) caused by the fluctuation of the frictional force, and these amplifications are unlikely to occur. A lens polishing apparatus is provided.
[0020]
A third object is to provide an absorption mechanism unit that can be applied to various commonly used lens polishing apparatuses by being configured as a simple unit and being easily mountable.
[0021]
A polishing apparatus that controls the pressure applied to the workpiece by a pressure cylinder or the like, or a pressure that is applied to the workpiece by controlling the relative position between the workpiece and the tool, and an NC-controlled polishing apparatus are known ( (See Patent Document 1).
[0022]
[Patent Document 1]
Japanese Patent Laid-Open No. 2001-38595
[Patent Document 2]
Japanese Patent Laid-Open No. 2002-178252
[Patent Document 3]
JP 2002-178251A [0025]
[Patent Document 4]
Japanese Patent Laid-Open No. 10-34511
[Means for Solving the Problems]
Examples of means for achieving the above object are as follows.
[0027]
For example, a lens polishing apparatus according to claim 1 of the present application includes a pressing unit that applies a desired pressure to the lens and the polishing tool, and a lens polishing that includes a swinging mechanism that swings at least one of the lens and the polishing tool. In the apparatus, the swing mechanism has an arm that swings in the first direction (X), and a driven member that follows the relative movement of the lens and the polishing tool is provided near the tip of the arm of the swing mechanism, The absorption mechanism is connected to the driven member and is configured to absorb the fluctuation in the second direction (Y) of the driven member.
[0028]
The lens polishing apparatus according to claim 2 is characterized in that the absorption mechanism is constituted by a kanzashi and a linear guide for holding the same.
[0029]
The lens polishing apparatus according to claim 3 is characterized in that the absorption mechanism includes a resin material sphere having self-lubricating property and a cylindrical member that holds the resin material sphere on the inner surface.
[0030]
The lens polishing apparatus according to claim 4 is characterized in that the absorption mechanism is composed of a ring-shaped member having self-lubricating property and a cylindrical member holding the periphery thereof.
[0031]
The lens polishing apparatus according to claim 5 is configured to dispose a polishing tool and a lens between a rotating shaft and a driven member corresponding to the rotating shaft and polish the lens with the polishing tool. , A swing mechanism for swinging the driven member in the first direction (X) is provided, a guide and a motion member are provided between the swing mechanism and the driven member, and the guide and the motion member are in the second direction (Y ) To be relatively movable.
[0032]
The lens polishing apparatus according to claim 6 is characterized in that an attachment member for attaching a weight to the moving member is provided, and the pressure between the polishing tool and the lens can be adjusted by the weight.
[0033]
In the lens polishing apparatus according to claim 7, the guide and the moving member absorb the pulsation caused by the displacement in the height direction of one of the lens and the polishing tool and the fluctuation of the polishing pressure between them. It is characterized by that.
[0034]
The lens polishing apparatus according to claim 8 is characterized in that the moving member is formed by a Kanzashi and the guide is formed by a linear guide for guiding the Kanzashi.
[0035]
The lens polishing apparatus according to claim 9 is characterized in that the moving member is composed of a resin material sphere having self-lubricating properties, and the guide is composed of a cylindrical member for accommodating the resin material sphere. To do.
[0036]
The lens polishing apparatus according to claim 10 is characterized in that the moving member is composed of a ring-shaped member having self-lubricating properties, and the guide is composed of a cylindrical member connected to the outer periphery of the ring-shaped member. To do.
[0037]
The lens polishing apparatus according to claim 11 is characterized in that a weight is detachable from above the cylindrical member.
[0038]
The absorption mechanism device according to claim 12 is for a lens polishing apparatus having a pressurizing means for applying a desired pressure to the lens and the polishing tool, and a swinging mechanism for swinging at least one of the lens and the polishing tool. In this absorption mechanism unit, a driven member that follows the relative movement of the lens and the polishing tool, a moving member that is connected to the driven member and linearly moves in conjunction with the linear movement of the driven member, and a linear movement of the moving member And a guide for guiding.
[0039]
With the above configuration, deformation of the polishing tool (pitch) and generation of frictional heat are reduced, shape accuracy is improved, abrasive excessive interference is suppressed, and surface roughness and surface defects are reduced. In addition, it prevents fraying caused by chatter and improves shape accuracy. By suppressing periodic abrasive grain excessive interference, this effect also reduces surface roughness and surface defects.
[0040]
DETAILED DESCRIPTION OF THE INVENTION
In the present invention, the pressurizing means for applying a desired pressure to the lens and the polishing tool is shown as a weight in the following embodiments, but various other pressurizing means can also be used.
[0041]
In the embodiments described below, the swing mechanism is shown as including a crankshaft, but various other types of swing mechanisms can also be used. Further, not only one of the lens and the polishing tool but also both may be given a swinging motion.
[0042]
In the embodiments shown below, the arm is shown in the form of a plate or a rod, but various members may be added to the arm to form an arm, or other members may be used. An arm may be configured.
[0043]
The first direction (x) and the second direction (y) are shown as a horizontal direction and a vertical direction, respectively, in the following embodiments, but various other directions can be used.
[0044]
In the embodiment shown below, the absorption mechanism is a Kanzashi and a linear guide for holding the same, a resin material sphere having a self-lubricating property, a cylindrical member for holding it on the inner surface, and a ring-shaped member having a self-lubricating property. However, other various shapes of motion members and guides for guiding them can also be used.
[0045]
【Example】
FIG. 1 shows one embodiment of a lens polishing apparatus according to the present invention. FIG. 2 is a top view of the lens polishing apparatus of FIG.
[0046]
The lens polishing apparatus 101 has a rotating shaft 3 with a variable number of rotations on a frame structure 13. The convex polishing tool 1 includes a substrate 1a and a polisher material 1b attached to the surface thereof. The convex polishing tool 1 is mounted on the rotary shaft 3 by screws 2 provided on the back surface of the substrate 1a.
[0047]
A concave lens 4 is in contact with the upper surface of the convex polishing tool 1. The concave lens 4 is attached to a jig 6 as a driven member by an adhesive 5.
[0048]
A counterbored hole 6 a is formed on the back surface of the jig 6. Kanzashi 7 is vertically inserted into the counterbore 6a. Kanzashi 7 is one that has been appropriately finished in cylindricity and surface roughness of the outer shape and hardened to HRc 55 or higher by surface treatment. A kind of universal joint 102 is formed by inserting the Kanzashi 7 into the counterbore 6a. The jig 6 is free to rotate and tilt with respect to the Kanzashi 7. A screw 9 a as an attachment member is provided on the upper part of the Kanzashi 7. A small amount of weight 9 is fixed by the screw 9a, and a small amount of adjustment weight 10 is also placed depending on the situation. These weights are applied to the spherical processed portion 7a at the tip of the Kanzashi 7.
[0049]
A linear guide bush 8 which is a kind of rolling bearing is provided around the Kanzashi 7 so as to be relatively movable. The Kanzashi 7 is held and guided by a linear guide bush 8 as a movement member so as to be freely linearly moved and rotated in the vertical direction (vertical direction) y. The absorption mechanism 100 is formed by the kanji 7 and the linear guide bush 8.
[0050]
The linear guide bush 8 is fixed to the tip of the long substrate 11. A guide block 12 a is attached to the lower surface of the substrate 11. A linear guide rail 12b corresponding to the guide block 12a is provided on the upper part of the polishing apparatus frame structure 13. The substrate 11 is configured to be linearly movable in the horizontal direction x by sliding between the linear guide rail 12b and the guide block 12a.
[0051]
At the base end of the substrate 11, two resin plates 14 having self-lubricating properties are arranged in parallel with the rails 12b. In the vicinity thereof, there is a rotating shaft 15 having a variable rotational speed and having an axis in the vertical direction. A plate 16 extending in the horizontal direction is connected to the rotating shaft 15. A pin 17 that can be positioned is fixed on the plate 16 by an appropriate method so as to be positioned between the two parallel resin plates 14 to form a kind of crankshaft. That is, the pin 17 is inserted between the two parallel resin plates 14, the crank swing width a is set by positioning the pin 17, and the substrate 11 and the Kanzashi 7 reciprocate linearly in the x direction with the amplitude a. . The swing mechanism 103 is constituted by the substrate 11, the block 12a, the rail 12b, the resin plate 14, the rotating shaft 15, the plate 16, the pins 17, and the like.
[0052]
The displacement b in the longitudinal direction y of the lens 4 due to the reciprocating linear motion of the kanzashi 7 is absorbed by the linearly movable holding structure between the kanzashi 7 and the linear guide bush 8, and the inclination due to the sliding of the polishing surface is Since they are absorbed by the universal joint 102 constituted by the cantilever tip spherical surface processing portion 7a and the counterbore hole 6a on the back surface of the jig 6, both of them smoothly reciprocate. Here, rotation on the polishing tool 1 side is added, and movement as a lens polishing apparatus is realized.
[0053]
Compared with a general lens polishing apparatus, a small amount of weight 10 can be directly added to the Kanzashi 7, so that fine pressure adjustment can be made within a light weight range. Therefore, deformation of the polishing tool 1 (pitch) and generation of frictional heat can be reduced, shape accuracy can be improved, abrasive excessive interference can be suppressed, and surface roughness and surface defects can be reduced. In particular, it is suitable for polishing a material sensitive to pressure conditions such as a CaF ₂ material.
[0054]
In addition, the frictional force fluctuates due to changes in the surface state of the lens 4 and the polishing tool 1 and the lubricating state between the polishing tool 1 during the polishing, and even if a minute pulsation occurs, it is immediately absorbed near the linear guide bush 8. Therefore, there is no amplification return on the substrate 11 (also referred to as an arm portion). For this reason, in addition to improving the shape accuracy, such as prevention of fraying due to chatter, periodic abrasive excessive interference can be suppressed, and this effect can also reduce surface roughness and surface defects.
[0055]
In this embodiment, the upper arrangement is a concave lens and the lower arrangement is a convex polishing tool, but the upper arrangement may be a convex lens and the lower arrangement may be a concave polishing tool, and the upper arrangement is a concave polishing tool and the lower arrangement is It may be a convex lens. In particular, in a general lens polishing apparatus, it is difficult even when the radius of curvature is about 100 mm when the upper arrangement is a convex lens. However, according to the lens polishing apparatus of the present invention, chatter is unlikely to occur, and the radius of curvature is 50 mm. A convex lens can be polished to the extent possible.
[0056]
FIG. 3 shows another embodiment of the lens polishing apparatus according to the present invention. In addition, the same code | symbol is attached | subjected to the member same as the member in the said Example, and the description is abbreviate | omitted. Further, since the swing mechanism similar to that shown in FIGS. 1 and 2 can be used, the illustration is omitted.
[0057]
The lens polishing apparatus 104 has a rotating shaft 3 having a variable rotational speed on the frame structure 13. A lens bonding jig 20 is mounted on the rotating shaft 3 with a screw 20a on the back surface, and a convex lens 18 is attached to the surface with an adhesive 19.
[0058]
The concave polishing tool 22 has a substrate 22b and a polisher material 22c (pitch, polyurethane, etc.) affixed to the lower surface thereof. The concave polishing tool 22 is in contact with the upper surface of the convex lens 18 as a driven member.
[0059]
At the center of the back surface of the concave polishing tool 22, a screw 22a is provided as an attachment member that can be mounted on the lower shaft side of the polishing apparatus 104 depending on the situation. If a small amount of weight 23 is fixed to this part, The weight can be adjusted appropriately.
[0060]
A resin spherical cap material 24 having self-lubricating property is attached to the tip portion of the screw 22a as a motion member. A cylindrical member 25 is movably provided around the cap member 24. The cylindrical member 25 is attached to the tip of the substrate 11 that performs the reciprocating linear motion described above, and is configured as a guide by applying grease.
[0061]
If the cap member 24 is inserted into the cylindrical member 25, a kind of universal joint 105 is formed, and rotation / inclination and linear motion in the x direction are freely connected. The universal joint 105 also functions as an absorption mechanism of the present invention. The cylindrical member 25 is linearly held and guided freely by the cylindrical member 26 on the outer peripheral portion thereof, but does not fall down downward by a retaining ring 25a fixed to the upper part of the cylindrical member 25. With this configuration, the lens 19 and the polishing tool 22 can be easily attached and detached. Further, instead of the cylindrical member 26, a linear guide bush may be used.
[0062]
The displacement b in the longitudinal direction y between the lens 18 and the polishing tool 22 accompanying the reciprocating linear movement of the cylindrical member 25 in the x direction and the inclination caused by the sliding of the polishing surface are the resin spherical cap material 24 and the inner surface of the cylindrical member 25. Are absorbed by a free holding structure (absorption mechanism), so that they both reciprocate smoothly. Here, rotation on the lens 18 side is added, and movement as a lens polishing apparatus is realized.
[0063]
Compared with a general lens polishing apparatus, a minute amount of weight 23 can be added directly to the polishing tool 21, so that fine pressure adjustment is possible within a light weight range. For this reason, deformation of the polishing tool 22 (pitch) and generation of frictional heat can be reduced, the shape accuracy can be improved, abrasive excessive interference can be suppressed, and surface roughness and surface defects can be reduced. In particular, it is suitable for polishing a material sensitive to pressure conditions such as a CaF ₂ material.
[0064]
In addition, the frictional force fluctuates due to changes in the surface state of the lens 19 and the polishing tool 22 that occur during the polishing and the lubrication state between them. Since it is absorbed by the universal joint portion 105 as an absorption mechanism constituted by the inner surface of the shaped member 25, there is no amplification return at the arm portion 11. For this reason, in addition to improving the shape accuracy, such as prevention of fraying due to chatter, periodic abrasive excessive interference can be suppressed, and this effect can also reduce surface roughness and surface defects.
[0065]
In this embodiment, the upper arrangement is a concave polishing tool and the lower arrangement is a convex lens, but the upper arrangement may be a convex lens and the lower arrangement may be a concave polishing tool, or the upper arrangement is a concave lens and the lower arrangement is convex polishing. It may be a tool.
[0066]
FIG. 4 shows still another embodiment of the lens polishing apparatus according to the present invention. In addition, the same code | symbol is attached | subjected to the member same as the member in the said Example, and the description is abbreviate | omitted. Further, since the swing mechanism similar to that shown in FIGS. 1 and 2 can be used, the illustration is omitted.
[0067]
The lens polishing apparatus 107 has a rotating shaft 3 with a variable number of rotations on the frame structure 13. The convex polishing tool 1 includes a substrate 1a and a polisher material 1b (pitch, polyurethane, etc.) attached to the surface thereof. The convex polishing tool 1 is attached to the rotary shaft 3 by a screw 2 provided on the back surface of the substrate 1a.
[0068]
A concave lens 4 is in contact with the upper surface of the convex polishing tool 1. The concave lens 4 is attached to a jig 27 as a driven member of the present invention by an adhesive 5.
[0069]
A ring-shaped member 28 having self-lubricating properties is fixed as a motion member on the side surface or the back surface of the jig 27. The ring-shaped member 28 is held and guided by a cylindrical member 30 serving as a guide on the outer periphery thereof. The cylindrical member 30 is connected to the substrate 11 that performs a reciprocating linear motion in the x direction via the member 31. The ring-shaped member 28 and the cylindrical member 30 constitute a kind of universal joint 108, and the rotation / tilting and linear motion are freely performed. The universal joint 108 also functions as an absorption mechanism of the present invention.
[0070]
A screw (not shown) is provided on the back surface of the polishing tool 27 so as to be attachable to the lower shaft side of the polishing apparatus depending on the situation. If this screw is used as an attachment member for attaching a small amount of weight 29, the weight can be adjusted appropriately.
[0071]
The displacement b in the longitudinal direction y between the lens 4 and the polishing tool 1 accompanying the reciprocating linear movement of the annular member 30 in the x direction and the inclination caused by the sliding of the polishing surface are between the ring-shaped member 28 and the inner surface of the cylindrical member 30. Since the linear movement / tilt is absorbed by a free holding structure (absorption mechanism), the two reciprocate smoothly. Here, rotation on the polishing tool 1 side is added, and movement as a lens polishing apparatus is realized.
[0072]
Compared with a general lens polishing apparatus, a minute amount of weight 29 can be directly added to the polishing tool 1, so that fine pressure adjustment can be made within a light weight range. Therefore, deformation of the polishing tool 1 (pitch) and generation of frictional heat can be reduced, shape accuracy can be improved, abrasive excessive interference can be suppressed, and surface roughness and surface defects can be reduced. In particular, it is suitable for polishing a material sensitive to pressure conditions such as a CaF ₂ material.
[0073]
In addition, even if minute pulsation occurs due to a change in frictional force due to changes in the surface state of the lens 4 and the polishing tool 1 and the lubrication state between them, which occurs during the progress of polishing, a ring-shaped member 28 and a cylindrical member are immediately generated. The arm portion 11 does not perform amplification regression because it is absorbed by the universal joint portion 108 as an absorption mechanism constituted by the 30 inner surface. For this reason, in addition to improving the shape accuracy, such as prevention of fraying caused by chatter, periodic abrasive excessive interference can be suppressed, and this effect can also reduce surface roughness and surface defects.
[0074]
In this embodiment, the upper arrangement is a concave lens and the lower arrangement is a convex polishing tool, but the upper arrangement may be a convex lens and the lower arrangement may be a concave polishing tool, and the upper arrangement may be a concave polishing tool and the lower arrangement. It may be a convex lens.
[0075]
Figure 5 shows an embodiment of a lens polishing apparatus have changed the swing mechanism 103 of the lens polishing apparatus shown in FIGS. 1 and 2 in common swing mechanism 111.
[0076]
The amount of protrusion of a bolt (not shown) screwed into the lower part 34 of the member 33 protruding from the swing arm 32 of the polishing apparatus 110 is adjusted so that the arm 32 is maintained in a horizontal state. The protruding bolt tip hits the lower base 35 of the swinging mechanism 111 and prevents the arm from moving downward around the vertical rotation shaft 36, but it can be moved upward and the lens and polishing tool can be easily attached and detached. It is. The swinging mechanism 111 is constituted by the swinging arm 32, the member 33, the bolt, the base 35, the vertical rotation shaft 36, and the like.
[0077]
Usually, a member having a hole small enough to insert the Kanzashi 7 is provided at the tip of the arm 32, but here, a member 37 capable of inserting the outer diameter of the linear guide bush 8 is provided. 1 is incorporated in the member 37, substantially the same operation is realized, and the same effect can be obtained even with a lens polishing apparatus having a general swinging mechanism.
[0078]
【The invention's effect】
According to the present invention, it is easy to apply a slight polishing pressure, and a material sensitive to pressure conditions such as a CaF ₂ material can be polished. Deformation and friction of the polishing tool (pitch) because the relative displacement (macro-vibration) in the height direction between the polishing tool and the lens and subtle pulsation (micro-vibration) due to fluctuations in friction force are unlikely to occur. Heat generation can be reduced, shape accuracy can be improved, abrasive excessive interference can be suppressed, and surface roughness and surface defects can be reduced. In addition, the edge caused by chatter can be prevented, and the shape accuracy can be improved. By suppressing periodic excessive interference with abrasive grains, surface roughness and surface defects can be reduced also by this effect. In addition, the apparatus configuration can be simplified.
[0079]
Note that the present invention is not limited to the illustrated embodiment. For example, the lens polishing apparatus may be configured by attaching a motion member to the swing mechanism and attaching a guide to the driven member.
[Brief description of the drawings]
FIG. 1 shows one embodiment of a lens polishing apparatus according to the present invention.
2 is a top view of the lens polishing apparatus of FIG. 1. FIG.
FIG. 3 shows another embodiment of the lens polishing apparatus according to the present invention.
FIG. 4 shows still another embodiment of a lens polishing apparatus according to the present invention.
FIG. 5 is an example of a lens polishing apparatus in which the swing mechanism of the lens polishing apparatus shown in FIGS. 1 and 2 is changed to a general swing mechanism.
FIG. 6 shows an example of the main part of a traditional optical lens polisher.
FIG. 7 shows an example of the main part of a traditional optical lens polisher.
FIG. 8 shows an example of a main part of a modern lens polishing apparatus.
FIG. 9 is an outline of a multi-axis NC aspheric lens polishing apparatus manufactured by Kuroda Seiko.
[Explanation of symbols]
1, 22 Polishing tool 1a Substrate 1b Polisher material 2, 9a, 20a Screw 3, 19 Rotating shaft 4 Concave lens 5, 19 Adhesive 6, 20, 27 Jig 6a Counterbore 7 Kanzashi 7a Spherical surface processing part 8 Linear guide bushes 9, 23 29 Weight 10 Adjustment weight 11 Substrate 12a Guide block 12b Linear guide rail 13 Frame structure 14 Resin plate 16 Plate 17 Pin 18 Convex lens material 28 Ring-shaped member 30 Cylindrical member 31 Member 32 Swing arm 33 Member 34 Lower part 35 Base 36 Vertical rotating shaft 100 Absorption mechanism 101, 104, 107, 110 Lens polishing device 108 Universal joint 103, 111 Oscillation mechanism a, b Amplitude

Claims

In a lens polishing apparatus having pressurizing means for applying a desired pressure to the lens and the polishing tool, and a swinging mechanism that swings at least one of the lens and the polishing tool.
The swing mechanism has a substrate that swings in the first direction (x), an absorption mechanism is provided at the tip of the substrate, a guide block (12a) is attached to the lower surface of the substrate, and the guide block (12a ), Linear guide rails (12b) are provided, and the substrate (11) is linearly movable in the horizontal direction (x) by sliding between the linear guide rails (12b) and the guide blocks (12a). Is composed of
A driven member that follows the relative movement of the lens and the polishing tool is provided near the tip of the substrate of the swing mechanism,
The absorption mechanism is connected to the driven member and absorbs fluctuations in the second direction (y) of the driven member;
The pressure applied to the lens can be adjusted by weights (9, 23, 29) provided on the driven member as pressurizing means in a form without the biasing force of the spring,
The pressure applied to the lens is not affected by the swing of the substrate (11) of the swing mechanism in the first direction (x), and the pressure applied to the lens is also affected by the fluctuation of the driven member in the second direction (y). A lens polishing apparatus characterized by being configured not to be performed.

The lens polishing apparatus according to claim 1, wherein the absorption mechanism is composed of a Kanzashi and a linear guide for guiding the Kanzashi.

2. The lens polishing apparatus according to claim 1, wherein the absorption mechanism is composed of a resin material sphere having self-lubricating properties and a cylindrical member that guides the same on the inner surface.

The lens polishing apparatus according to claim 1, wherein the absorption mechanism includes a ring-shaped member having self-lubricating properties and a cylindrical member that guides the absorbing member on the inner surface.

In a lens polishing apparatus configured to polish a lens with a polishing tool by disposing a polishing tool and a lens between a rotating shaft and a driven member corresponding to the rotating shaft,
A swing mechanism for swinging the driven member in the first direction (X) is provided, a guide and a motion member are provided between the swing mechanism and the driven member, and the guide and the motion member are in the second direction (Y). It is configured to be relatively movable,
The pressure applied to the lens can be adjusted by the weights (9, 23, 29) provided on the driven member as pressurizing means without the biasing force of the spring, and the substrate of the swing mechanism ( 11) The pressure applied to the lens is not affected by the swing in the first direction (x) of 11), and the pressure applied to the lens is not affected by the fluctuation of (y) in the second direction of the driven member.
An absorption mechanism is provided at the tip of the substrate, a guide block (12a) is attached to the lower surface of the substrate, a linear guide rail (12b) is provided corresponding to the guide block (12a), and a linear guide is provided. The lens polishing apparatus, wherein the substrate (11) is configured to be linearly movable in the horizontal direction (x) by sliding between the rail (12b) and the guide block (12a).

The lens polishing apparatus according to claim 5, wherein an attachment member for attaching a weight to the moving member is provided, and the pressure between the polishing tool and the lens is adjustable by the weight.

7. The guide and the moving member absorb the pulsation caused by the displacement in the height direction of one of the lens and the polishing tool and the fluctuation of the polishing pressure between them. Lens polishing device.

The lens polishing apparatus according to any one of claims 5 to 7, wherein the moving member is configured by a Kanzashi, and the guide is configured by a linear guide for guiding the Kanzashi.

The moving member is made of a resin material sphere having self-lubricating properties, and the guide is made of a cylindrical member for accommodating the resin material sphere. Lens polishing equipment.

The moving member is formed of a ring-shaped member having self-lubricating properties, and the guide is formed of a cylindrical member connected to the outer periphery of the ring-shaped member. Lens polishing equipment.

The lens polishing apparatus according to claim 10, wherein a weight is configured to be detachable from above the cylindrical member.

The substrate of the swing mechanism is reciprocated linearly in the first direction (x) with the amplitude (a) of the crank by the rotation of the rotating shaft (15) having a variable axis and having a vertical axis. The lens polishing apparatus according to any one of claims 1 to 11.

In a lens polishing apparatus having pressurizing means for applying a desired pressure to the lens and the polishing tool, and a swinging mechanism that swings at least one of the lens and the polishing tool.
The swing mechanism has a substrate swinging in the first direction (x);
A driven member that follows the relative movement of the lens and the polishing tool is provided near the tip of the substrate of the swing mechanism,
The absorption mechanism is connected to the driven member and absorbs fluctuations in the second direction (y) of the driven member;
The pressurizing means has a member that can be finely adjusted without the biasing force of the spring,
The absorption mechanism is a driven member that follows the relative movement of the lens and the polishing tool;
A motion member connected to the driven member and performing a linear motion in conjunction with the linear motion of the driven member;
A guide for guiding the linear motion of the moving member;
A lens polishing apparatus comprising:

In a lens polishing apparatus having pressurizing means for applying a desired pressure to the lens and the polishing tool, and a swinging mechanism that swings at least one of the lens and the polishing tool.
The swing mechanism has an arm swinging in the first direction (x);
A driven member that follows the relative movement of the lens and the polishing tool is provided near the tip of the arm of the swing mechanism,
The absorption mechanism is connected to the driven member and absorbs fluctuations in the second direction (y) of the driven member;
The pressurizing means has a member that can be finely adjusted without the biasing force of the spring,
A lens polishing apparatus characterized in that the absorption mechanism is composed of a kanzashi and a linear guide for guiding it.

In a lens polishing apparatus having pressurizing means for applying a desired pressure to the lens and the polishing tool, and a swinging mechanism that swings at least one of the lens and the polishing tool.
The swing mechanism has a substrate swinging in the first direction (x);
A driven member that follows the relative movement of the lens and the polishing tool is provided near the tip of the substrate of the swing mechanism,
The absorption mechanism is connected to the driven member and absorbs fluctuations in the second direction (y) of the driven member;
The pressurizing means has a member that can be finely adjusted without the biasing force of the spring,
A lens polishing apparatus, wherein the absorption mechanism is composed of a resin material sphere having self-lubricating properties and a cylindrical member for guiding the sphere on the inner surface.

In a lens polishing apparatus having pressurizing means for applying a desired pressure to the lens and the polishing tool, and a swinging mechanism that swings at least one of the lens and the polishing tool.
The swing mechanism has a substrate swinging in the first direction (x);
A driven member that follows the relative movement of the lens and the polishing tool is provided near the tip of the substrate of the swing mechanism,
The absorption mechanism is connected to the driven member and absorbs fluctuations in the second direction (y) of the driven member;
The pressurizing means has a member that can be finely adjusted without the biasing force of the spring,
A lens polishing apparatus, wherein the absorption mechanism is composed of a ring-shaped member having self-lubricating properties and a cylindrical member that guides the absorbing member on the inner surface.

In a lens polishing apparatus configured to polish a lens with a polishing tool by disposing a polishing tool and a lens between a rotating shaft and a driven member corresponding to the rotating shaft,
A swing mechanism for swinging the driven member in the first direction (X) is provided, a guide and a motion member are provided between the swing mechanism and the driven member, and the guide and the motion member are in the second direction (Y). It is configured to be relatively movable,
An attachment member for attaching a weight to the moving member is provided, and the pressure between the polishing tool and the lens is adjustable by the weight without the biasing force of the spring.
The guide and the moving member are configured to absorb the pulsation caused by the displacement in the height direction of one of the lens and the polishing tool and the fluctuation of the polishing pressure between them,
A lens polishing apparatus, characterized in that the moving member is composed of Kanzashi and the guide is composed of a linear guide for guiding Kanzashi.

In a lens polishing apparatus configured to polish a lens with a polishing tool by disposing a polishing tool and a lens between a rotating shaft and a driven member corresponding to the rotating shaft,
A swing mechanism for swinging the driven member in the first direction (X) is provided, a guide and a motion member are provided between the swing mechanism and the driven member, and the guide and the motion member are in the second direction (Y). It is configured to be relatively movable,
An attachment member for attaching a weight to the moving member is provided, and the pressure between the polishing tool and the lens is adjustable by the weight without the biasing force of the spring.
The guide and the moving member are configured to absorb the pulsation caused by the displacement in the height direction of one of the lens and the polishing tool and the fluctuation of the polishing pressure between them,
A lens polishing apparatus, wherein the moving member is formed of a resin material sphere having self-lubricating properties, and the guide is formed of a cylindrical member for receiving the resin material sphere.

In a lens polishing apparatus configured to polish a lens with a polishing tool by disposing a polishing tool and a lens between a rotating shaft and a driven member corresponding to the rotating shaft,
A swing mechanism for swinging the driven member in the first direction (X) is provided, a guide and a motion member are provided between the swing mechanism and the driven member, and the guide and the motion member are in the second direction (Y). It is configured to be relatively movable,
An attachment member for attaching a weight to the moving member is provided, and the pressure between the polishing tool and the lens is adjustable by the weight without the biasing force of the spring.
The guide and the moving member are configured to absorb the pulsation caused by the displacement in the height direction of one of the lens and the polishing tool and the fluctuation of the polishing pressure between them,
A lens polishing apparatus, wherein the moving member is composed of a self-lubricating ring-shaped member, and the guide is composed of a cylindrical member connected to the outer periphery of the ring-shaped member.

The lens polishing apparatus according to claim 19, wherein a weight is configured to be detachable from above the cylindrical member.