JP4160229B2 - Microlens manufacturing method and manufacturing apparatus - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a technique for simultaneously manufacturing a plurality of microlenses.
[0002]
[Prior art]
With the widespread use of digital cameras and digital video cameras, the density of CCD (Charge Coupled Device) imaging devices (hereinafter abbreviated as “CCD”) is rapidly increasing in response to the demand for higher image quality. . In a CCD, it is well known that an improvement in light utilization efficiency leads to an improvement in the S / N ratio and contributes to an improvement in image quality. As a means for this, microlenses are arranged in a matrix on the light receiving surface of the CCD. A configuration that increases the light use efficiency of each pixel of the CCD is employed.
[0003]
Typical examples of microlens manufacturing methods are ion diffusion and etching, but apart from this, microlenses are manufactured by laser CVD (Chemical Vapor Deposition). Technologies have been developed (see Japanese Patent Publication No. 1-2241503, Japanese Patent Publication No. 2-6902, Japanese Patent Publication No. 2-6903, etc.). FIG. 8 shows an example of this, and a quartz substrate is installed in the reaction cell 3 by using the carbon dioxide laser 1 as an excitation light source, filling the reaction cell 3 with a mixed gas of monosilane, nitric oxide, and ammonia as material gases. A microlens is formed by condensing and irradiating the laser beam from the carbon dioxide laser 1 on the film formation substrate 5 with the condenser lens 7. In the figure, reference numeral 9 is an entrance window, 11 is a substrate support member, 13 is a gas supply channel, 15 is an exhaust channel, 17 is a pump, and 19 is an exclusion device.
[0004]
As described above, in the laser CVD method, since a laser is used as a light source, light energy can be concentrated in a very small area by a condensing element, so that a minute lens film can be formed in a non-contact manner. There is a feature that can be done. The condensed light energy has a Gaussian energy distribution having an optical axis as a peak, and the film formation speed is proportional to the irradiation energy, so that a film having a curvature can be formed. Moreover, efficient film formation is possible by selecting and using the reaction gas excited with respect to the wavelength of the light source to be used. Furthermore, by using a mixture of reactive gases such as monosilane, nitric oxide, and ammonia, it is possible to form a film having a light transmission property such as SiON and SiO ₂ and having a lens function for refracting and condensing light. This has been confirmed by experiments.
[0005]
[Problems to be solved by the invention]
With the recent popularization of digital image equipment and the development of demand specifications, the number of pixels required for CCDs has increased, and in recent years, the number has exceeded 1 million and the density has been increased. Along with the miniaturization of pixels, it has become difficult to make a one-to-one correspondence between pixels and lenses in a conventional microlens manufacturing method using a mask process.
[0006]
In the mask process, since a method of transferring the mask shape at an equal magnification is common, it is necessary to refine the mask pattern. The method generally used to transfer the mask pattern to the resist material is the proximity exposure method. When the mask pattern having a fine opening is transferred to the resist, the mask pattern is obtained by optical diffraction at the edge portion. Since the spatial resolution of the image deteriorates, the transfer accuracy also deteriorates. As the transfer pattern becomes finer, the mask thickness and the aspect ratio of the transfer pattern become higher, resulting in problems such as deterioration in exposure transfer performance. This imposes restrictions on the lens specifications (thickness and diameter) that can be manufactured. ing.
[0007]
In addition, there is a technique for forming a lens-like surface shape by surface tension by heat-liquefying the thermosoftening member, but it becomes difficult for the surface tension to function well, and the lens shape is affected by the wettability of the interface with the substrate. Since it changes, it becomes difficult to ensure the uniformity of the lens shape.
[0008]
On the other hand, when the laser CVD method is used, a laser beam is focused on the substrate and a lens-shaped transmission film is formed on the substrate by vapor phase growth. There is no problem associated with the transfer of the mask pattern. However, in the configuration as shown in FIG. 8, a large number of lens groups cannot be formed immediately from one laser beam. There are still challenges. By manufacturing a single lens by irradiating a predetermined position on the surface of the film formation substrate with a laser beam, a microlens exceeding 1 million pixels is manufactured by moving the beam or the position of the substrate to manufacture the next lens. Unrealistic.
[0009]
The present invention has been made to cope with such a point, and an object thereof is to provide a method and an apparatus for efficiently manufacturing a plurality of microlenses having an arbitrary arrangement simultaneously using a laser CVD method. .
[0010]
[Means for Solving the Problems]
That is, in the method for manufacturing a microlens according to the first aspect of the present invention, a substrate is installed in a reaction cell having an incident window that transmits a laser beam, and a predetermined reactive gas is filled in the reaction cell in which the substrate is installed. The laser beam is emitted from a light source, the laser beam from the light source is expanded to a wide beam, and the wide beam is provided at a plurality of circular light passing portions and a light reflecting portion provided at a place other than the light passing portion. Are divided into a plurality of beams by a screen original plate, and the divided beams are reduced and projected onto the substrate in a reaction cell, and the irradiation surfaces of the plurality of beams reduced and projected onto the substrate are projected onto the irradiation surfaces. A lens film is formed by vapor deposition of a reactive gas.
[0011]
According to the first aspect of the present invention, a plurality of beams having an arbitrary arrangement are generated from a single laser beam by a screen original and are reduced and projected onto a substrate in a reaction cell filled with a reactive gas. As a result, vapor phase growth by a reactive gas occurs where each beam on the substrate is irradiated, and a plurality of microlenses corresponding to the number and arrangement of beams from the screen plate are simultaneously formed on the substrate.
[0012]
According to a second aspect of the present invention, in the method of manufacturing a microlens according to the first aspect, the method includes a step of cooling the screen original plate.
[0013]
In the invention of claim 2, the screen original heated by the laser beam irradiation is cooled, so that the thermal deformation of the screen original due to the continuous irradiation of the beam is suppressed even when the manufacturing process is repeated. Generation of distortion of the shape and arrangement of the microlenses to be formed is suppressed.
[0014]
According to a third aspect of the present invention, in the method for manufacturing a microlens according to the first aspect, the substrate in the reaction cell is heated to a set temperature lower than a starting point of vapor deposition of the reactive gas before beam irradiation. It has the process.
[0015]
In the invention of claim 3, the irradiation energy of the beam necessary for generating the lens film can be reduced, the cost of the laser apparatus can be reduced, and the thermal damage of the apparatus due to the laser beam is suppressed.
[0016]
According to a fourth aspect of the present invention, in the method of manufacturing a microlens according to the first aspect, the method includes a step of adjusting a lens shape by etching a lens film generated on the substrate.
[0017]
In the invention of claim 4, the lens film formed by vapor phase growth has a hemispherical shape, and the lens performance is improved.
[0018]
Apparatus for manufacturing a micro lens of the invention of claim 5 includes a light source for emitting a laser beam, a beam expander for expanding the beam from the light source into wide beam, other than the light passing portion of the plurality of circular and light passing portion A screen original plate for dividing the wide beam from the beam expander into a plurality of beams, and a reduction projection optical system for reducing and projecting the plurality of beams from the screen original plate, A reaction cell having an incident window through which a plurality of beams reduced and projected from the reduction projection optical system pass, and a substrate that supports the substrate at the imaging positions of the plurality of beams from the reduction projection optical system in the reaction cell Supporting means; means for supplying a reactive gas that forms a lens film by vapor deposition with beam irradiation energy in the reaction cell; and a method for exhausting the gas in the reaction cell. Characterized by including and.
[0019]
In the invention of claim 5, the substrate on which the microlens is formed on the surface is arranged by the substrate support means at a predetermined position facing the incident window in the reaction cell, and the reaction is performed in the reaction cell by the means for supplying the reactive gas. Filled with sex gas. A thin beam of one diameter is emitted from the light source, expanded to a wide beam by a beam expander, divided into a plurality of beams by a screen original plate having a size corresponding to the wide beam diameter, and a reduced projection optical system and an incident beam A reduced gas is projected onto the substrate in the reaction cell through the window, and a reactive gas is vapor-phase grown at the irradiation point of each beam to form a plurality of microlenses on the substrate simultaneously. After the film formation is completed, the reactive gas is exhausted from the reaction cell, and the substrate on which the microlens is formed is taken out.
[0020]
According to a sixth aspect of the invention, in the microlens manufacturing apparatus according to the fifth aspect, the apparatus further comprises a cooling means for cooling the screen original plate.
[0021]
In the invention of claim 6, the screen original plate receiving the irradiation energy of the beam is cooled by air cooling or water cooling, preferably before and after the beam is incident on the screen plate in order to eliminate the influence of the air cooling or water cooling on the lens film formation. Is done. By cooling the screen original plate, thermal deformation of the screen plate is avoided, and it is possible to manufacture a product without distortion in the shape and arrangement of the lens film even by continuous irradiation of the beam.
[0022]
According to a seventh aspect of the invention, in the microlens manufacturing apparatus according to the fifth aspect of the invention, the microlens manufacturing apparatus further comprises a heating means for heating the substrate installed in the reaction cell.
[0023]
In the invention of claim 7, by preheating the substrate by the heating means, it is possible to reduce the beam energy necessary for generating the lens film, and as a result, it is possible to reduce the cost of the laser device, and the device using the laser beam. Component damage is reduced.
[0024]
The invention of claim 8 is the microlens manufacturing apparatus of claim 7, further comprising a control means for controlling the heating temperature by the heating means to be equal to or lower than the temperature at which the reactive gas starts vapor phase growth. To do.
[0025]
In the invention of claim 8, the problem that the reactive gas vapor-phase grows with thermal energy other than the irradiation of the beam is avoided, and the film formation of the microlens corresponding to the beam from the screen original is reliably performed.
[0026]
According to a ninth aspect of the present invention, there is provided the microlens manufacturing apparatus according to the fifth aspect, further comprising means for etching a lens film formed on the substrate by vapor deposition of the reactive gas.
[0027]
In the invention of claim 9, by performing the etching process, the shape of the lens film formed by vapor phase growth becomes hemispherical, and the lens performance is improved.
[0028]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, the same code | symbol is attached | subjected and demonstrated about the part which is common in a prior art example.
[0029]
FIG. 1 shows a first embodiment of a microlens manufacturing apparatus according to the present invention. Compared with the conventional apparatus configuration shown in FIG. 8, a beam expander 21 and a screen original plate are used in place of the condenser lens 7. 23 and a reduction projection optical system 25 are installed.
[0030]
That is, in FIG. 1, a beam expander 21 that expands the beam diameter from the carbon dioxide laser 1 used as a light source is arranged, and a screen having a plurality of circular aperture patterns as shown in FIG. An original projection 23 and a reduction projection optical system 25 that forms an image of a circular opening pattern of the screen original plate 23 at a predetermined position in the reaction cell 3 are arranged perpendicular to the optical axis. The reaction cell 3 includes an incident window 9 perpendicular to the optical axis, and a deposition substrate 5 such as a quartz substrate that forms a microlens on the surface at the imaging position of the beam transmitted through the incident window 9 inside the reaction cell 3. Is placed perpendicular to the beam by the substrate support member 11. The reaction cell 3 is connected to a gas supply channel 13 for supplying a material gas and a purge gas, and an exhaust channel 15 for exhausting the gas in the reaction cell 3. A pump 17 is connected to the exhaust passage 15 and is connected to an excluding device 19 that processes exhaust gas. The valve of the gas supply channel 13, the beam alignment optical system, the beam power monitor, the beam stabilizer, and the like are omitted here.
[0031]
In FIG. 2, the screen original plate 23 is made of a light transmissive member 23b, and a plurality of circular light openings 23a are formed by providing a light reflecting portion 23c on the surface. These light openings 23a are formed corresponding to, for example, the number and arrangement of CCD pixels.
[0032]
Next, the operation of the present embodiment will be described.
A beam emitted from the carbon dioxide laser 1 serving as a light source is expanded by a beam expander 21 and applied to a screen original plate 23. As shown in FIG. 2, the screen original plate 23 is formed with a plurality of circular light openings 23a, and the irradiated beam passes through each light opening 23a and becomes a plurality of radiation beams. The radiation beam group emitted from the screen original plate 23 in this way is reduced by the reduction projection optical system 25 and irradiated as a multi-spot on the film formation substrate 5 in the reaction cell 3 through the incident window 9. That is, the circular opening pattern formed on the screen original plate 23 is reduced and projected onto the film formation substrate 5 in the reaction cell 3 through the reduction projection optical system 25.
[0033]
In the reaction cell 3, a film formation substrate 5 such as a quartz substrate for forming a microlens is installed at a predetermined position by a substrate support member 11, and a film is formed from the gas supply channel 13 before the laser beam irradiation. A reactive gas in which monosilane, nitric oxide and ammonia gas are mixed is supplied. After the reactive gas is filled in the reaction cell 3, the radiation beam group from the screen original plate 23 is reduced by the reduction projection optical system 25 and irradiated onto the film formation substrate 5 as a multi-spot as described above. A lens-like film is vapor-phase-grown by thermal energy in each multi-spot irradiation region on the film substrate 5, and a plurality of microlenses are simultaneously formed on the film-forming substrate 5.
[0034]
When supplying the material gas to the reaction cell 3, the internal pressure of the reaction cell 3 is set lower than the atmospheric pressure by the pump 17. This increases the mean free path of gas, increases the gas supply rate to the vapor phase growth region, and increases the film growth rate. In addition, the refractive index of the vapor-grown film can be controlled by changing the mixing ratio of the material gases. Ammonia gas is not necessary when an amorphous silicon dioxide film is formed.
[0035]
After the film formation process by the beam is completed, the reactive gas in the reaction cell 3 is exhausted by the pump 17 through the exhaust passage 15 and sent to the exclusion device 19. Next, after the valve on the discharge side of the reaction cell 3 is closed and a gas such as nitrogen is supplied from the supply flow path 13 and purged, the film formation substrate 5 having a plurality of microlenses formed on the surface is formed in the reaction cell 3. Taken from. The microlens formed on the film formation substrate 5 is subjected to an etching process using, for example, buffered hydrofluoric acid, so that the lens shape is adjusted.
[0036]
FIG. 3 shows a cross-sectional shape of a plurality of microlenses formed on the film formation substrate 5, and the lens shape has a correlation with the intensity distribution of the irradiation beam, and is in the shape of a hanger. The composition of the film is N-rich as it is closer to the optical axis of the lens, and O-rich as it is farther from the optical axis. The etching rate of wet etching using buffered hydrofluoric acid is faster when it is rich in O. Therefore, when etching is performed after film formation, the peripheral portion of the lens has a higher etch rate, and the peripheral portion is selectively etched. As a result, the lens having the shape of a hanger as shown in FIG. 3 has a shape close to a hemisphere as shown in FIG. 4, and the light collecting performance is improved.
[0037]
Here, when the light source is a carbon dioxide laser, ZnS is suitable as an optical member in addition to ZnSe, and can be used for the beam expander 21 and the reduction projection optical system 25. In addition, the continuous wave type light source has a more stable film growth and a smooth surface than the case where the pulsed wave type is used. Further, when a carbon dioxide laser is used as the light source, the oscillation wavelength is preferably 10.6 μm. Although the film can be formed even if the oscillation wavelength is selected to be 10.2 μm, in this case, the photoexcitation reaction of the material gas becomes more active than the case where the wavelength is 10.6 μm. Even in the region, the reaction proceeds to generate fine particles, which may adhere to the surface of the lens film. On the other hand, when the oscillation wavelength is 10.6 μm, the film growth by the thermal energy on the surface of the film formation substrate 5 becomes more dominant than the photoexcitation reaction of the material gas. Therefore, the surface of the obtained film becomes smooth and a suitable lens element can be obtained.
[0038]
Further, in the present embodiment, the size of the usable screen original plate 23 is increased by expanding the beam diameter emitted from the carbon dioxide laser 1 by the beam expander 21. The emission beam diameter from the normal carbon dioxide laser 1 is about several millimeters, and it is difficult to accurately produce a fine screen original 23 having a circular aperture group corresponding to, for example, a CCD pixel pattern within this range. However, by expanding the beam diameter incident on the screen original plate 23 by the beam expander 21 as in this embodiment, the size of the screen original plate can be increased, and the manufacturing tolerance can be reduced. Further, by expanding the beam diameter by the beam expander 21, the light intensity distribution in the beam cross section becomes gentle, so that the beam passing through the opening at the center portion of the screen original plate 23 and the beam passing through the opening at the end portion can be reduced. The advantage that the difference in light intensity is reduced, and the in-plane difference in the light intensity of the multi-spots projected on the film formation substrate 5 disposed in the reaction cell 3 through the reduction projection optical system 25 can be reduced. Have
[0039]
As is clear from the above description, according to the present embodiment, an arbitrary number and arrangement of laser beams can be irradiated onto the film formation substrate 5, and an arbitrary arrangement can be formed using the laser CVD method. A plurality of microlenses can be efficiently produced at the same time.
[0040]
In addition, the microlens manufacturing method according to the present embodiment can achieve a level of miniaturization and high density that is difficult with the conventional manufacturing method. Furthermore, the use of a partially coherent irradiation beam has the potential to further increase the image resolution during reduced projection exposure. Compared with the mask pattern transfer method of the conventional manufacturing method, there is no problem of disturbance of the transfer image of the mask pattern due to the proximity exposure, and it is excellent in that the accuracy of the screen original plate corresponding to the mask can be relaxed. Compared to the conventional ion diffusion method, the film formation time by the laser CVD method is considerably shorter than the ion diffusion time, which is excellent in terms of throughput efficiency. In addition, if a large number of microlenses are manufactured on a single quartz substrate at a time by increasing the size of the screen original plate and the substrate wafer, then the mass productivity is further improved.
[0041]
FIG. 5 shows a second embodiment of the microlens manufacturing apparatus of the present invention. Compared to the first embodiment shown in FIG. 1, the auxiliary for heating the film formation substrate 5 to the set temperature T1. A heating device 31 is added. The auxiliary heating device 31 is installed on the back side of the beam irradiation surface of the film formation substrate 5, and the heating temperature is controlled to a set temperature T1 that is equal to or lower than the reaction start temperature T2.
[0042]
In this configuration, as shown in FIG. 6, the film formation substrate 5 is preheated by the auxiliary heating device 31 to a set temperature T1 lower than the reaction start temperature T2 of the material gas. Since the vapor phase growth of the reactive gas by thermal excitation does not occur below the threshold value, even if the deposition substrate 5 is heated to a set temperature that does not exceed the threshold value, until the energy by the laser beam irradiation is added. Film growth does not begin. That is, in the present embodiment, after increasing the irradiation surface of the film formation substrate 5 to the set temperature T1, a system for forming a lens film by irradiating the film formation substrate 5 with a beam in the same manner as in the first embodiment. It is.
[0043]
In the present embodiment, by preheating the film formation substrate 5, the required light source power is reduced as compared with a system that raises the irradiation surface of the film formation substrate 5 from room temperature to the reaction start temperature T2 only by laser beam irradiation. This can reduce the cost of the laser device. Further, thermal damage to the optical system and the screen original plate can be reduced. Furthermore, by controlling so that the heating temperature of the auxiliary heating device 31 does not exceed the reaction start temperature T2, it is possible to prevent the reaction of the material gas from starting on the heating surface that is not irradiated with the beam.
[0044]
FIG. 7 shows a third embodiment of the microlens manufacturing apparatus of the present invention. Compared with the second embodiment shown in FIG. 5, a cooling device 33 for cooling the screen original plate 23 is added. ing.
[0045]
When the screen original plate 23 is heated by continuous laser irradiation, the shape and arrangement of the openings of the screen original plate 23 are distorted due to thermal expansion, and the individual shape and arrangement of the microlens as a reduced projection image may be distorted. There is. The cooling device 33 is provided to prevent thermal deformation of the screen original plate 23 due to laser irradiation. There are two types of cooling methods, air cooling and water cooling. In the case of air cooling, if the wave front of the irradiation beam is disturbed by air convection around the screen original plate 23 during film formation, the imaging performance deteriorates. Cooling is preferably performed before and after exposure. Although the film growth rate depends on the irradiation beam power, it is about 1 μm / second, which is faster than normal photo-CVD. Therefore, since the exposure time is short, the loss of running time is not a problem even if the above method is adopted. Even in the case of the water cooling method, it is preferable that there is no cooling water around the screen original plate 23 at the time of exposure, and a step of cooling and drying the screen original plate 23 before and after exposure can be taken.
[0046]
As is clear from the above description, in the present embodiment, the temperature rise of the screen original plate 23 due to continuous laser irradiation can be suppressed to prevent thermal deformation, and a desired microlens array can always be manufactured with high accuracy. can do.
[0047]
【The invention's effect】
As described above, according to the inventions of claims 1 and 5, a screen having a wide beam and having a plurality of circular openings and light reflecting portions provided at locations other than the light passage portions. By dividing the original beam into multiple beams and projecting them in a reduced scale on the substrate and vapor-depositing the lens film, a plurality of microlenses having an arbitrary arrangement can be efficiently and simultaneously manufactured using the laser CVD method. Can be manufactured.
[0048]
According to the inventions of claims 2 and 6, by cooling the screen original plate, it is possible to prevent thermal deformation of the screen original plate due to irradiation of the laser beam, and the shape change and arrangement of the microlens due to the thermal deformation of the screen original plate. The occurrence of deviation can be prevented. Therefore, it is possible to always manufacture a microphone lens having a uniform quality even by continuous irradiation with a laser beam.
[0049]
According to the third, seventh and eighth aspects of the invention, the laser power can be lowered by preheating the substrate before the beam irradiation, so that the apparatus cost can be reduced and the apparatus component laser can be used. Damage can be reduced and the life of the apparatus can be extended.
[0050]
Further, according to the inventions of claims 4 and 9, the microlens shape can be made hemispherical by etching the microlens formed by vapor phase growth, and the condensing performance of the lens is improved. can do.
[Brief description of the drawings]
FIG. 1 is a diagram showing a schematic configuration of a microlens manufacturing apparatus according to a first embodiment of the present invention.
FIG. 2 is a diagram schematically showing an example of a screen original plate.
FIG. 3 is a cross-sectional view showing the shape of a plurality of microlenses formed on a substrate.
FIG. 4 is a cross-sectional view showing a shape after etching of a plurality of microlenses formed on a substrate.
FIG. 5 is a diagram showing a schematic configuration of a microlens manufacturing apparatus according to a second embodiment of the present invention.
FIG. 6 is a diagram showing a temperature change due to preheating of a substrate and laser irradiation.
FIG. 7 is a diagram showing a schematic configuration of a microlens manufacturing apparatus according to a third embodiment of the present invention.
FIG. 8 is a view showing a conventional example of a microlens manufacturing apparatus using a laser CVD method.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Carbon dioxide laser 3 Reaction cell 5 Film-forming substrate 9 Incident window 11 Substrate support member 21 Beam expander 23 Screen master 25 Reduction projection optical system 31 Auxiliary heating device 33 Cooling device

Claims (9)

Placing the substrate in a reaction cell having an entrance window that transmits the laser beam;
Filling a reaction cell in which the substrate is installed with a predetermined reactive gas,
Fire a laser beam from a light source,
Expanding the laser beam from the light source to a wide beam;
The wide beam is divided into a plurality of beams by a screen original plate having a plurality of circular light passage portions and a light reflection portion provided at a place other than the light passage portions ,
Reducing and projecting the plurality of divided beams onto the substrate in a reaction cell;
A method of manufacturing a microlens, wherein a lens film is generated by vapor growth of the reactive gas on each irradiation surface of a plurality of beams projected and reduced on the substrate.   2. The method of manufacturing a microlens according to claim 1, further comprising a step of cooling the screen original plate.   2. The method for manufacturing a microlens according to claim 1, further comprising a step of heating the substrate in the reaction cell to a set temperature lower than a starting point of vapor deposition of the reactive gas before beam irradiation. A method for manufacturing a microlens.   2. The method of manufacturing a microlens according to claim 1, further comprising a step of adjusting a lens shape by etching a lens film generated on the substrate. A light source that emits a laser beam;
A beam expander that expands the beam from the light source into a wide beam;
A screen original plate having a plurality of circular light passing portions and a light reflecting portion provided at a place other than the light passing portions, and dividing a wide beam from the beam expander into a plurality of beams;
A reduction projection optical system for reducing and projecting a plurality of beams from the screen original;
A reaction cell having an entrance window through which a plurality of beams reduced and projected from the reduction projection optical system is transmitted;
Substrate support means for supporting the substrate at the imaging positions of a plurality of beams from the reduced projection optical system in the reaction cell;
Means for supplying a reactive gas for generating a lens film by vapor phase growth by beam irradiation energy in the reaction cell;
And a means for exhausting the gas in the reaction cell.   6. The microlens manufacturing apparatus according to claim 5, further comprising a cooling unit that cools the screen original plate.   6. The microlens manufacturing apparatus according to claim 5, further comprising heating means for heating the substrate installed in the reaction cell.   8. The microlens manufacturing apparatus according to claim 7, further comprising control means for controlling a heating temperature by the heating means to be equal to or lower than a temperature at which the reactive gas starts vapor phase growth. .   6. The microlens manufacturing apparatus according to claim 5, further comprising means for etching a lens film formed on a substrate by vapor deposition of the reactive gas.

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