JP4130837B2 - Stage reaction force processing equipment - Google Patents

Stage reaction force processing equipment Download PDF

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JP4130837B2
JP4130837B2 JP2006168070A JP2006168070A JP4130837B2 JP 4130837 B2 JP4130837 B2 JP 4130837B2 JP 2006168070 A JP2006168070 A JP 2006168070A JP 2006168070 A JP2006168070 A JP 2006168070A JP 4130837 B2 JP4130837 B2 JP 4130837B2
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stage
reaction force
underfloor
underfloor structure
floor
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JP2007331079A (en
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真 原田
雄二 小林
達也 小原
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Sumitomo Heavy Industries Ltd
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Sumitomo Heavy Industries Ltd
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Priority to TW096120546A priority patent/TW200803996A/en
Priority to CNA2007101118123A priority patent/CN101090086A/en
Priority to KR1020070059017A priority patent/KR100869921B1/en
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    • G—PHYSICS
    • G12—INSTRUMENT DETAILS
    • G12B—CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G12B5/00—Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/03—Stationary work or tool supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q5/00—Driving or feeding mechanisms; Control arrangements therefor
    • B23Q5/22—Feeding members carrying tools or work
    • B23Q5/28—Electric drives

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Machine Tool Units (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

本発明はステージ用反力処理装置に係り、特にクリーンルームでステージ装置が設置されるよう構成されたステージ用反力処理装置に関する。   The present invention relates to a stage reaction force processing apparatus, and more particularly to a stage reaction force processing apparatus configured to be installed in a clean room.

ステージを精密に移動させるステージ装置は、クリーンルーム内に設置されており、例えば、門型のＹステージがテーブル上に吸着された基板の上方を一定速度で移動するように構成されている（例えば、特許文献１参照）。   A stage device that precisely moves the stage is installed in a clean room, and is configured so that, for example, a gate-shaped Y stage moves at a constant speed above a substrate adsorbed on a table (for example, Patent Document 1).

また、上記Ｙステージは、移動方向（Ｙ方向）と直交する方向（Ｘ方向）に延在しており、テーブル上の基板を跨ぐように両端部が一対のガイド部材により移動可能に支持され、且つ一対のリニアスケール（位置検出器）により移動位置が検出される。そして、Ｙステージの両端は、一対のリニアモータ（駆動手段）により移動方向に駆動される。一対のリニアモータは、床面に固定されたリニアモータ支持部に支持されている。   Further, the Y stage extends in a direction (X direction) orthogonal to the moving direction (Y direction), and both ends are supported by a pair of guide members so as to move across the substrate on the table, The moving position is detected by a pair of linear scales (position detectors). Then, both ends of the Y stage are driven in the moving direction by a pair of linear motors (driving means). The pair of linear motors are supported by linear motor support portions fixed to the floor surface.

そのため、上記ステージ装置では、リニアモータの駆動力によりＹステージを駆動させる際には、その反力がリニアモータ固定子（永久磁石）を支持するリニアモータ支持部に伝わり、リニアモータ支持部を介して床面に逃がすように構成されている。   Therefore, in the above stage device, when the Y stage is driven by the driving force of the linear motor, the reaction force is transmitted to the linear motor support that supports the linear motor stator (permanent magnet), and the linear motor support is interposed. It is configured to escape to the floor.

上記のように構成されたステージ装置が設置されるクリーンルームの床面には、天井に配置されたフィルタを通過した空気流を床下空間に流入させて空気清浄装置に還流させるように構成されている。そして、クリーンルームの床面に設けられた床下凹部には、上記空気流が通過するための空間と、ステージ装置を支持するように鉄骨を組んだ床下構造体が設けられている。
特開２００５−５２８２３号公報 On the floor surface of the clean room where the stage device configured as described above is installed, the air flow that has passed through the filter disposed on the ceiling is introduced into the under-floor space and returned to the air cleaning device. . And in the under floor recessed part provided in the floor surface of the clean room, the space for the said air flow to pass through, and the under floor structure which assembled the steel frame so that a stage apparatus may be supported are provided.
JP 2005-52823 A

しかしながら、従来のステージ用反力処理装置では、ステージ装置のリニアモータ支持部及びテーブルを支持する石定盤が上記床下構造体に支持されているので、例えば、基板の大型化に伴ってＹステージが大型化すると、Ｙステージをより高速で移動させる際には、より大きな駆動力が必要になると共に、その反力も増大することになり、リニアモータ支持部が反力に応じて撓むように動作することになる。   However, in the conventional reaction force processing device for a stage, the linear motor support part of the stage device and the stone surface plate that supports the table are supported by the underfloor structure, so that, for example, as the substrate becomes larger, the Y stage When the size of the Y stage is increased, when the Y stage is moved at a higher speed, a larger driving force is required and the reaction force also increases, and the linear motor support portion operates to bend according to the reaction force. It will be.

また、Ｙステージを駆動する際の反力がリニアモータ固定子を支持するリニアモータ支持部から床下構造体に伝わり、さらに床面上に支持された石定盤にも伝わるため、加工精度が低下するという問題が生じる。   In addition, the reaction force when driving the Y stage is transmitted from the linear motor support that supports the linear motor stator to the underfloor structure, and further to the stone surface plate supported on the floor surface. Problem arises.

そこで、本発明は上記事情に鑑み、上記課題を解決したステージ用反力処理装置を提供することを目的とする。   In view of the above circumstances, an object of the present invention is to provide a stage reaction force processing apparatus that solves the above-described problems.

上記課題を解決するため、本発明は以下のような手段を有する。   In order to solve the above problems, the present invention has the following means.

本発明は、床面に固定された固定台と、該固定台の側方に平行に配置された駆動手段と、該駆動手段を支持する支持部と、前記固定台に移動可能に支持され、前記駆動手段の駆動力により移動するステージと、を備えたステージ装置が設置されるステージ用反力処理装置において、前記固定台を支持する第１の床下構造体と前記支持部を支持する第２の床下構造体とを分離して設けることにより、上記課題を解決するものである。   The present invention is supported by a fixed base fixed to the floor, driving means arranged in parallel to the side of the fixed base, a support portion supporting the driving means, and movably supported by the fixed base, In a reaction force processing apparatus for a stage in which a stage apparatus including a stage that is moved by a driving force of the driving means is installed, a first underfloor structure that supports the fixed base and a second that supports the support section. The above-mentioned problem is solved by providing the underfloor structure separately.

また、本発明は、前記第１の床下構造体と前記第２の床下構造体とを前記床面の下方に収納する床下凹部を設け、前記凹部内で前記第１の床下構造体と前記第２の床下構造体とを所定距離離間させることにより、上記課題を解決するものである。   Further, the present invention provides an underfloor recess for storing the first underfloor structure and the second underfloor structure below the floor surface, and the first underfloor structure and the first underfloor in the recess. The above-mentioned problem is solved by separating the two underfloor structures from each other by a predetermined distance.

また、本発明は、前記床下凹部の内部に前記第１の床下構造体と前記第２の床下構造体との間を非接触とするように形成された非接触空間を設けたことにより、上記課題を解決するものである。   Further, the present invention provides a non-contact space formed so as not to contact between the first under-floor structure and the second under-floor structure inside the under-floor recess, It solves the problem.

また、前記床面には、通気孔を有するグレーチング部材を敷設することが望ましい。   Moreover, it is desirable to lay a grating member having a ventilation hole on the floor surface.

本発明によれば、固定台を支持する第１の床下構造体と支持部を支持する第２の床下構造体とを分離させることにより、駆動手段によりステージを駆動する際の反力の振動が支持部を介して第２の床下構造体に伝播しても第２の床下構造体から直接第１の床下構造体への振動の伝播を防止することができ、駆動手段の反力による振動が第１、第２の床下構造体間で減衰され、ステージに伝播することを防止できる。   According to the present invention, by separating the first underfloor structure that supports the fixed base and the second underfloor structure that supports the support portion, the vibration of the reaction force when the stage is driven by the drive means is generated. Propagation of vibration from the second underfloor structure directly to the first underfloor structure can be prevented even when propagating to the second underfloor structure via the support portion, and vibration due to reaction force of the drive means is prevented. It is attenuated between the first and second underfloor structures and can be prevented from propagating to the stage.

以下、図面を参照して本発明を実施するための最良の形態について説明する。   The best mode for carrying out the present invention will be described below with reference to the drawings.

図１は本発明になるステージ用反力処理装置の一実施例を示す斜視図である。図２は図１に示すステージ用反力処理装置の正面図である。図３は図１に示すステージ用反力処理装置の側面図である。図４は図１に示すステージ用反力処理装置の平面図である。   FIG. 1 is a perspective view showing an embodiment of a reaction force processing apparatus for a stage according to the present invention. 2 is a front view of the stage reaction force processing apparatus shown in FIG. FIG. 3 is a side view of the stage reaction force processing apparatus shown in FIG. 4 is a plan view of the stage reaction force processing apparatus shown in FIG.

図１乃至図４に示されるように、ステージ用反力処理装置１００は、例えば、クリーンルーム内に設けられ、ステージ装置１０の架台１２を支持する第１の床下構造体１１０と、リニアモータ支持部４６を支持する第２の床下構造体１２０とを有する。第１の床下構造体１１０と第２の床下構造体１２０とは、分離して設けられており、所謂縁切り構造と呼ばれる構成になっている。   As shown in FIGS. 1 to 4, the stage reaction force processing apparatus 100 is provided in a clean room, for example, and includes a first underfloor structure 110 that supports the gantry 12 of the stage apparatus 10, and a linear motor support unit. And a second underfloor structure 120 that supports 46. The first underfloor structure 110 and the second underfloor structure 120 are provided separately, and have a so-called edge cutting structure.

また、第１の床下構造体１１０及び第２の床下構造体１２０は、床面１３０のステージ装置１０が設置されるステージ設置部１３２の下方に形成された床下凹部１４０内に収納されている。この床下凹部１４０内では、第１の床下構造体１１０と第２の床下構造体１２０とを所定距離離間させており、第１の床下構造体１１０と第２の床下構造体１２０との間を非接触とする非接触空間１５０が形成されている。   The first underfloor structure 110 and the second underfloor structure 120 are housed in an underfloor recess 140 formed below the stage installation portion 132 where the stage device 10 on the floor surface 130 is installed. In the underfloor recess 140, the first underfloor structure 110 and the second underfloor structure 120 are separated by a predetermined distance, and the first underfloor structure 110 and the second underfloor structure 120 are separated from each other. A non-contact space 150 that is non-contact is formed.

また、床下凹部１４０は、コンクリートにより形成された基礎となる構成のものであり、この基礎上に第１の床下構造体１１０及び第２の床下構造体１２０が固定されている。また、床下構造体１１０，１２０は、図中一点鎖線で示す部分が鉄骨またはコンクリートなどにより形成されており、非接触空間１５０を介して離間しており、互いに干渉しないように設置されている。   The underfloor recess 140 is a structure that is a foundation formed of concrete, and the first underfloor structure 110 and the second underfloor structure 120 are fixed on the foundation. In addition, the underfloor structures 110 and 120 are formed of a steel frame or concrete in a portion indicated by a one-dot chain line in the drawing, are separated via a non-contact space 150, and are installed so as not to interfere with each other.

このように、第１の床下構造体１１０と第２の床下構造体１２０とが分離して設けられているので、ステージ駆動時の反力が第２の床下構造体１２０に伝播された場合でも振動が床面１３０から直接架台１２に伝播されずに第２の床下構造体１２０、床下凹部１４０、第１の床下構造体１１０を介して架台１２に伝わる。そのため、ステージ駆動時の反力は、第２の床下構造体１２０、床下凹部１４０、第１の床下構造体１１０を伝播する過程で減衰される。   As described above, since the first underfloor structure 110 and the second underfloor structure 120 are provided separately, even when the reaction force during stage driving is transmitted to the second underfloor structure 120. The vibration is not propagated directly from the floor surface 130 to the gantry 12 but is transmitted to the gantry 12 via the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110. Therefore, the reaction force at the time of driving the stage is attenuated in the process of propagating through the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110.

また、床面１３０の全面には、グレーチング部材１７０が敷設されている。このグレーチング部材１７０は、複数の通気孔１７２を有する格子状の床部材であり、例えば、鋳物などにより四角形状に形成された格子状ブロックからなる。そして、グレーチング部材１７０は、第２の床下構造体１２０の外側で床下凹部１４０に固定された第３の床下構造体１８０により支持される。尚、第３の床下構造体１８０は、第２の床下構造体１２０の外側に隣接しているが、第２の床下構造体１２０とは分離して設けられている。また、上記グレーチング部材１７０の代わりに通気孔を有するコンクリートパネルを床面１３０に敷設する構成としても良い。   A grating member 170 is laid on the entire surface of the floor 130. The grating member 170 is a lattice-like floor member having a plurality of ventilation holes 172, and is made of, for example, a lattice-like block formed in a square shape by casting or the like. The grating member 170 is supported by the third underfloor structure 180 fixed to the underfloor recess 140 outside the second underfloor structure 120. Note that the third underfloor structure 180 is adjacent to the outside of the second underfloor structure 120, but is provided separately from the second underfloor structure 120. Moreover, it is good also as a structure which lays the concrete panel which has a vent hole on the floor surface 130 instead of the said grating member 170. FIG.

ここで、上記ステージ装置１０の構成について説明する。ステージ装置１０は、ガントリ部を移動させるガントリ移動型ステージであり、コンクリート製の床面に固定された架台１２と、架台１２上に支持された石定盤１４と、石定盤１４上に支持されたワーク載置台１６と、ワーク載置台１６の上方を跨ぐように横架されたＹステージ１８と、Ｙステージ１８の両端部をＹ方向に駆動する一対のリニアモータ（駆動手段）２０とを有する。尚、本実施例において、固定台は、上記架台１２、石定盤１４、ワーク載置台１６により構成されている。   Here, the configuration of the stage apparatus 10 will be described. The stage device 10 is a gantry moving stage that moves a gantry section, and includes a gantry 12 fixed on a concrete floor, a stone surface plate 14 supported on the gantry 12, and a stone surface plate 14 supported. The workpiece mounting table 16, the Y stage 18 laid horizontally across the workpiece mounting table 16, and a pair of linear motors (driving means) 20 that drive both ends of the Y stage 18 in the Y direction. Have. In the present embodiment, the fixed base is composed of the above-described gantry 12, stone surface plate 14, and workpiece mounting table 16.

リニアモータ２０は、Ｙステージ１８の両端部の移動位置を検出するリニアスケールからの位置検出信号に基づいて並進駆動させるように制御される。   The linear motor 20 is controlled to be driven in translation based on a position detection signal from a linear scale that detects the movement positions of both ends of the Y stage 18.

架台１２は、鉄骨を格子状に組み合わせた強固な構成であり、第１の床下構造体１１０に支持されている。また、架台１２の上面に支持された石定盤１４は、コ字状に形成されており、ワーク載置台１６を安定状態に支持する平面部１４ａと、平面部１４ａの両側から上方に起立するガイド部１４ｂ，１４ｃとを有する。また、ワーク載置台１６には、ワークとしての基板（例えば、液晶基板など）を吸着するための真空吸着部（図示せず）が設けられている。   The gantry 12 has a strong configuration in which steel frames are combined in a lattice shape, and is supported by the first underfloor structure 110. Further, the stone surface plate 14 supported on the upper surface of the gantry 12 is formed in a U shape, and rises upward from both sides of the flat surface portion 14a that supports the workpiece mounting table 16 in a stable state. Guide portions 14b and 14c. In addition, the work mounting table 16 is provided with a vacuum suction unit (not shown) for sucking a substrate (for example, a liquid crystal substrate) as a work.

Ｙステージ１８は、ガイド部１４ｂ，１４ｃの上方をＸ方向に延在された横架部（ビーム）３０と、横架部３０の両端に結合されガイド部１４ｂ，１４ｃの側面に外側から対向する一対のスライダ３２とを有する。横架部３０には、ワーク載置台１６に吸着されたワーク（基板）に対して所定の加工を施す加工用治具（図示せず）などが装着される。また、横架部３０及びスライダ３２は、空気圧によりガイド部１４ｂ，１４ｃに対して非接触で移動する静圧空気軸受（静圧パッド）３６，３８を有する。そのため、Ｙステージ１８は、殆ど摩擦のない状態でＹ方向に移動することができる。   The Y stage 18 is coupled to the horizontal portion (beam) 30 extending in the X direction above the guide portions 14b and 14c, and is opposed to the side surfaces of the guide portions 14b and 14c from the outside by being coupled to both ends of the horizontal portion 30. And a pair of sliders 32. A processing jig (not shown) or the like for performing a predetermined processing on the work (substrate) adsorbed on the work mounting table 16 is mounted on the horizontal portion 30. The horizontal portion 30 and the slider 32 have static pressure air bearings (static pressure pads) 36 and 38 that move in a non-contact manner with respect to the guide portions 14b and 14c by air pressure. Therefore, the Y stage 18 can move in the Y direction with almost no friction.

リニアモータ２０は、コ字状に形成された固定子（永久磁石を有する）４０と、固定子４０に側方から挿入された可動子（コイルを有する）４２とから構成されており、微小な隙間を介して非接触状態で可動子４２をＹ方向に移動させるようにコイル印加電圧を制御される。可動子４２は、スライダ３２の側面に結合されており、コイルに電圧が印加されることにより固定子４０との間で発生した推力をスライダ３２に伝達し、スライダ３２をＹ方向に駆動する。その際、固定子４０は、可動子４２を駆動する推力による反力を受けることになる。   The linear motor 20 includes a stator (having a permanent magnet) 40 formed in a U-shape, and a mover (having a coil) 42 inserted into the stator 40 from the side. The coil applied voltage is controlled so as to move the mover 42 in the Y direction in a non-contact state through the gap. The mover 42 is coupled to the side surface of the slider 32 and transmits a thrust generated between the stator 40 and the stator 40 when a voltage is applied to the coil to drive the slider 32 in the Y direction. At that time, the stator 40 receives a reaction force due to the thrust that drives the mover 42.

さらに、ガイド部１４ｂ，１４ｃの外側には、リニアモータ２０の固定子４０を支持するリニアモータ支持部４６が起立している。このリニアモータ支持部４６は、鉄骨を格子状に結合した構成であり、第２の床下構造体１２０に支持された一対の脚部４６ａと、脚部４６ａ間に横架された梁４６ｂとを有する。従って、リニアモータ２０の駆動力によりＹステージ１８をＹ方向に移動させる際に発生する反力は、リニアモータ支持部４６を介して第２の床下構造体１２０に伝達される。   Further, a linear motor support portion 46 that supports the stator 40 of the linear motor 20 stands on the outside of the guide portions 14b and 14c. The linear motor support portion 46 has a structure in which steel frames are coupled in a lattice shape, and includes a pair of leg portions 46a supported by the second underfloor structure 120 and a beam 46b horizontally placed between the leg portions 46a. Have. Accordingly, the reaction force generated when the Y stage 18 is moved in the Y direction by the driving force of the linear motor 20 is transmitted to the second underfloor structure 120 via the linear motor support portion 46.

これにより、リニアモータ２０が受ける反力は、リニアモータ支持部４６から第２の床下構造体１２０、床下凹部１４０、第１の床下構造体１１０に伝播されるが、その過程で殆どの振動が減衰されるため、床面１３０に固定された架台１２に反力による振動が伝わらない。よって、第２の床下構造体１２０、床下凹部１４０、第１の床下構造体１１０を介して石定盤１４及びワーク載置台１６に伝播されるリニアモータ２０の反力は、極めて小さくなっている。   Thereby, the reaction force received by the linear motor 20 is propagated from the linear motor support 46 to the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110. Since the vibration is damped, vibration due to the reaction force is not transmitted to the gantry 12 fixed to the floor surface 130. Therefore, the reaction force of the linear motor 20 transmitted to the stone surface plate 14 and the work table 16 through the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110 is extremely small. .

図５に示されるように、リニアモータ２０は、コ字状に形成された固定子４０の内部にスライダ３２の側面より水平方向に突出する可動子４２が挿入された構成であるので、反力による振動対策として固定子４０の上下内面と可動子４２の上下面との間の隙間Ｓを通常よりも大幅に大きくしてあり、例えばＳ＝７ｍｍ（通常は、１ｍｍ程度）に設定してある。これにより、リニアモータ２０では、反力によってＸ方向への振動が生じても上記隙間Ｓを大きくしてあるので、固定子４０の上下内面が可動子４２の上下面に接触することが防止される。   As shown in FIG. 5, the linear motor 20 has a configuration in which a mover 42 that protrudes in the horizontal direction from the side surface of the slider 32 is inserted into a U-shaped stator 40. As a countermeasure against vibrations, the clearance S between the upper and lower inner surfaces of the stator 40 and the upper and lower surfaces of the mover 42 is significantly larger than usual, for example, S = 7 mm (usually about 1 mm). . As a result, in the linear motor 20, the clearance S is increased even if vibration in the X direction occurs due to the reaction force, so that the upper and lower inner surfaces of the stator 40 are prevented from contacting the upper and lower surfaces of the mover 42. The

上記実施例では、ガントリ型のステージ装置を例に挙げて説明したが、これに限らず、本発明を上記実施例以外のステージ装置（例えば、Ｘステージ及びＹステージを有するステージ装置など）を設置するステージ用反力処理装置にも適用できるのは勿論である。   In the above embodiment, a gantry type stage apparatus has been described as an example. However, the present invention is not limited to this, and the present invention is provided with a stage apparatus other than the above embodiment (for example, a stage apparatus having an X stage and a Y stage). Needless to say, the present invention can also be applied to a stage reaction force processing apparatus.

本発明になるステージ用反力処理装置の一実施例を示す斜視図である。It is a perspective view which shows one Example of the reaction force processing apparatus for stages which becomes this invention. 図１に示すステージ用反力処理装置の正面図である。It is a front view of the reaction force processing apparatus for stages shown in FIG. 図１に示すステージ用反力処理装置の側面図である。It is a side view of the reaction force processing apparatus for stages shown in FIG. 図１に示すステージ用反力処理装置の平面図である。It is a top view of the reaction force processing apparatus for stages shown in FIG. リニアモータの支持構造を拡大して示す正面図である。It is a front view which expands and shows the support structure of a linear motor.

符号の説明Explanation of symbols

１０ ステージ装置
１２ 架台
１４ 石定盤
１６ ワーク載置台
１８ Ｙステージ
２０ リニアモータ
３２ スライダ
４０ 固定子
４２ 可動子
４６ リニアモータ支持部
１００ ステージ用反力処理装置
１１０ 第１の床下構造体
１２０ 第２の床下構造体
１３０ 床面
１４０ 床下凹部
１５０ 非接触空間
１７０ グレーチング部材
１８０ 第３の床下構造体 DESCRIPTION OF SYMBOLS 10 Stage apparatus 12 Base 14 Stone surface plate 16 Work mounting base 18 Y stage 20 Linear motor 32 Slider 40 Stator 42 Movable element 46 Linear motor support part 100 Reaction force processing apparatus 110 for stage 1st underfloor structure 120 2nd Underfloor structure 130 Floor surface 140 Underfloor recess 150 Non-contact space 170 Grating member 180 Third underfloor structure

Claims (4)

床面のステージ設置部に固定された固定台と、該固定台の側方に平行に配置された駆動手段と、該駆動手段を支持する支持部と、前記固定台に移動可能に支持され、前記駆動手段の駆動力により移動するステージと、を備えたステージ装置が設置されるステージ用反力処理装置において、
前記固定台を支持する第１の床下構造体と前記支持部を支持する第２の床下構造体とを分離して設けたことを特徴とするステージ用反力処理装置。 A fixed base fixed to a stage installation part on the floor, driving means arranged in parallel to the side of the fixed base, a support part for supporting the driving means, and supported by the fixed base in a movable manner; In a stage reaction force processing apparatus in which a stage apparatus provided with a stage that moves by the driving force of the driving means is installed,
A reaction force processing apparatus for a stage, wherein a first underfloor structure that supports the fixed base and a second underfloor structure that supports the support portion are provided separately. 前記第１の床下構造体と前記第２の床下構造体とを前記床面の下方に収納する床下凹部を設け、
前記床下凹部内で前記第１の床下構造体と前記第２の床下構造体とを所定距離離間させたことを特徴とする請求項１に記載のステージ用反力処理装置。 Providing an underfloor recess for storing the first underfloor structure and the second underfloor structure below the floor surface;
The reaction force processing apparatus for a stage according to claim 1, wherein the first underfloor structure and the second underfloor structure are separated by a predetermined distance in the underfloor recess. 前記床下凹部の内部に前記第１の床下構造体と前記第２の床下構造体との間を非接触とするように形成された非接触空間を設けたことを特徴とする請求項２に記載のステージ用反力処理装置。   The non-contact space formed so that the space between the first under-floor structure and the second under-floor structure may be non-contact is provided inside the under-floor recess. Stage reaction force processing equipment. 前記床面に通気孔を有するグレーチング部材を敷設したことを特徴とする請求項１乃至３何れかに記載のステージ用反力処理装置。   The reaction force processing apparatus for a stage according to any one of claims 1 to 3, wherein a grating member having a ventilation hole is laid on the floor surface.
JP2006168070A 2006-06-16 2006-06-16 Stage reaction force processing equipment Expired - Fee Related JP4130837B2 (en)

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JP2006168070A JP4130837B2 (en) 2006-06-16 2006-06-16 Stage reaction force processing equipment
TW096120546A TW200803996A (en) 2006-06-16 2007-06-07 Reaction controlling device for stage
CNA2007101118123A CN101090086A (en) 2006-06-16 2007-06-15 Counterforce process device for platform
KR1020070059017A KR100869921B1 (en) 2006-06-16 2007-06-15 Reaction force treating apparatus for stage

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KR20100073540A (en) * 2008-12-23 2010-07-01 주식회사 탑 엔지니어링 Apparatus for offsetting reaction force and paste dispenser having the same
JP5295855B2 (en) * 2009-04-28 2013-09-18 住友重機械工業株式会社 Reaction force processing mechanism
KR101139292B1 (en) * 2010-06-18 2012-04-26 순환엔지니어링 주식회사 Error compensating system using encoder feedback, error mapping and air pressure control
TWI616269B (en) * 2016-08-01 2018-03-01 Reaction force elimination platform device
CN109108672A (en) * 2018-09-20 2019-01-01 苏州泰科贝尔直驱电机有限公司 A kind of double drive gantry structures

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US5874820A (en) 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US5528118A (en) 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JP3363662B2 (en) * 1994-05-19 2003-01-08 キヤノン株式会社 Scanning stage apparatus and exposure apparatus using the same
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TW200803996A (en) 2008-01-16

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