JP4129670B2 - Photosensitive printing master - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a photosensitive printing original plate used for producing a relief plate for printing.
[0002]
[Prior art]
Usually, the photosensitive printing original plate used for the relief plate for printing consists of a support body layer, the photosensitive resin composition layer, a coating layer, and a cover film, and removes a cover film and uses it at the time of use.
[0003]
The photosensitive printing original plate from which the cover film has been removed is irradiated with actinic rays through a negative film (or positive film) having a transparent image portion to cure the photosensitive resin layer in the exposed portion, and then the photosensitive resin in the non-exposed portion. It is widely known to produce a relief plate for printing by dissolving and removing a layer with a suitable solvent.
[0004]
Recently, a demand for a photosensitive printing original plate used for a printing relief plate has progressed in the direction of reproducing a finer pattern, and a printing relief having a fine line width of about 30 μm is required. However, a relief printing plate using a photosensitive resin composition cannot sufficiently meet this requirement, and a photosensitive printing original plate capable of reproducing a fine pattern by plate making and printing has not been obtained.
[0005]
[Problems to be solved by the invention]
An object of the present invention is to solve the above-mentioned problems, and an object of the present invention is to provide a photosensitive printing original plate excellent in reproducibility of a fine pattern during plate making and printing.
[0006]
[Means for Solving the Problems]
As a result of intensive studies to solve the above problems, the present inventors have found that the anti-adhesion layer of the photosensitive printing original plate is involved in the reproducibility in plate making and printing of fine patterns. The invention has been completed. That is, the present invention is (1) a photosensitive printing original plate for producing a relief using a negative film or a positive film having at least a support, a photosensitive resin layer, an anti-adhesion layer and a cover film, wherein the anti-adhesion layer comprises A light absorber containing a benzophenone or benzotriazole structure that absorbs ultraviolet light of 360 nm having an average molecular weight of 10,000 or more having absorption in the active light region of the photosensitive resin layer , and having a light transmittance of 360 nm. It is a photosensitive printing original plate characterized by being 70% to 90% with respect to the light .
[0007]
DETAILED DESCRIPTION OF THE INVENTION
The coating layer characteristic of the present invention is a layer provided to prevent adhesion of the negative to the photosensitive resin layer, and is sometimes referred to as a slip coat layer, a release layer, an anti-adhesion layer, or the like. Examples of the constituent material include polyamide, polyvinyl alcohol and derivatives thereof, and cellulose polymer. These may be used alone or in combination of two or more. In addition to the above components, general coating layers contain inorganic fine particles such as silica, organic fine particles obtained by three-dimensional internal crosslinking of polystyrene and acrylic monomers, surfactants, polyhydric alcohols, etc. as necessary. Has been.
[0008]
The light absorber contained in the coating layer used in the present invention has a molecular weight of 1,000 or more, preferably 5,000 or more, and more preferably 10,000 or more. If the molecular weight is less than 1,000, the light absorber moves to the photosensitive resin layer, and the actinic ray absorptivity of the coating layer is lowered, which is not preferable.
As a light absorber having a molecular weight of 1,000 or more, a material that is compatible and dispersed in the coating layer constituent is preferable. For example, a particulate light absorber obtained by emulsion polymerization of a radically polymerizable ultraviolet absorber having a radically polymerizable compound such as acrylic acid ester and styrene and a benzophenone skeleton or benzotriazole skeleton. Alternatively, a light absorber obtained by grafting a benzophenone or benzotriazole compound via an epoxy compound to polyvinyl alcohol, cellulose polymer or the like. Or, a benzophenone-based or benzotriazole-based light absorber through diisocyanate may be mentioned as an oligomer having a molecular weight of 1,000 or more which is compatible with the composition of the coating layer and has active hydrogen at the molecular end, but is particularly limited thereto. It is not a thing.
[0009]
The actinic ray transmittance of the coating layer of the present invention is 50% to 99%, preferably 70 to 95%, more preferably 80 to 90% with respect to light having a wavelength of 360 nm. If it is less than 50%, the amount of actinic rays reaching the photosensitive resin composition layer is too small, and the reproducibility of the relief is lowered. If it exceeds 99%, the actinic rays pass and the fine pattern cannot be reproduced.
[0010]
The thickness of the coating layer is 0.1 to 10 μm, preferably 0.1 to 2 μm, particularly preferably 0.1 to 1 μm. If the thickness is less than 0.1 μm, adhesion with the negative will occur, and if it exceeds 10 μm, the resolution of the relief will decrease, which is not preferable.
[0011]
The photosensitive resin layer in the present invention is a layer of a composition containing at least a known soluble synthetic polymer compound, a photopolymerizable unsaturated compound (hereinafter also referred to as a crosslinking agent) and a photopolymerization initiator. In addition, additives such as plasticizers, thermal polymerization inhibitors, dyes, pigments, ultraviolet absorbers, fragrances or antioxidants may be included.
[0012]
In the present invention, a known soluble synthetic polymer compound can be used as the soluble synthetic polymer compound. For example, polyether amide (for example, JP-A-55-79437), polyether ester amide (for example, JP-A-58-113537, etc.), tertiary nitrogen-containing polyamide (for example, JP-A-50-76055, etc.) , An ammonium salt type tertiary nitrogen atom-containing polyamide (for example, JP-A-53-36555), an addition polymer of an amide compound having at least one amide bond and an organic diisocyanate compound (for example, JP-A-58-140737) ), An addition polymer of a diamine having no amide bond and an organic diisocyanate compound (for example, JP-A-4-97154, etc.), among which a tertiary nitrogen atom-containing polyamide and an ammonium salt type tertiary nitrogen atom are included. Polyamide is preferred.
[0013]
Further, the photopolymerizable unsaturated compound preferably used is a ring-opening addition reaction product of polyglycidyl ether of polyhydric alcohol with methacrylic acid and acrylic acid, and as the polyhydric alcohol, dipentaerythritol, Examples include pentaerythritol, trimethylolpropane, glycerin, ethylene glycol, diethylene glycol, triethylene glycol, and ethylene oxide adducts of phthalic acid. Among them, trimethylolpropane is preferable.
[0014]
Examples of photoinitiators include benzophenones, benzoins, acetophenones, benzyls, benzoin alkyl ethers, benzyl alkyl ketals, anthraquinones, thioxanthones, and the like. Specifically, benzophenone, chlorobenzophenone, benzoin, acetophenone, benzyl, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, benzyl diethyl ketal, benzyl diisopropyl ketal, anthraquinone, 2-ethylanthraquinone Examples include 2-methylanthraquinone, 2-allyl anthraquinone, 2-chloroanthraquinone, thioxanthone, and 2-chlorothioxanthone.
[0015]
In the present invention, the cover film is provided to protect the photosensitive resin layer during storage and handling of the original, and is removed (peeled) before being irradiated with actinic rays. As a constituent material of the cover film, polyamide; polyvinyl alcohol; copolymer of ethylene and vinyl acetate; amphoteric interpolymer; cellulose polymer such as hydroxyalkyl cellulose and cellulose acetate; polybutyral; Here, the amphoteric interpolymers are those described in US Pat. No. 4,293,635. The material may be used alone or in combination of two or more. Also, self-oxidizing compounds such as nitrocellulose and nitroglycerin; non-self-oxidizing polymers such as alkyl cellulose (eg ethyl cellulose), polyacrylic acid and alkali metal salts thereof; polyacetal; polyimide; polycarbonate; polyester; Polyalkylene such as polybutylene; polyphenylene ether; polyethylene oxide; polylactone and combinations thereof can also be used.
The thickness of the cover film is preferably 10 to 300 μm, particularly preferably 10 to 200 μm.
[0016]
Examples of the support used in the present invention include a plastic film such as a polyester film, a metal plate such as iron, stainless steel, and aluminum, and a metal-deposited film. The thickness of the support can be appropriately selected according to the application. Further, in order to improve the adhesion between the support and the photosensitive resin layer as necessary, a known adhesive conventionally used for this kind of purpose may be provided on the surface.
[0017]
The method for producing the photosensitive printing original plate of the present invention is not particularly limited. Generally, a photosensitive resin layer is formed on a support by coating, spray coating, or the like, or a commercially available photosensitive printing plate is used. One laminate is made by peeling off the protective film, and separately from this, the two layers obtained in this way are applied to the base film (cover film) by coating, spray coating, etc. The body is produced by laminating using a heat press machine or the like. The lamination conditions are such that the temperature is room temperature to 150 ° C., preferably 50 to 120 ° C., and the pressure is 20 to 200 kgf / cm ² , preferably 50 to 150 kgf / cm ² . A sheet-like material having a desired thickness can be obtained by any known method such as the photosensitive resin of the present invention, such as hot pressing, casting, melt extrusion, and solution casting.
[0018]
In the photosensitive resin original plate of the present invention, a negative film or a positive film having a transparent image portion is closely overlapped on the photosensitive layer, and exposure is performed by irradiating actinic rays from above to expose the exposed portion. And insolubilize. As the actinic ray, a light source such as a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, a xenon lamp, or a chemical lamp having a wavelength of generally 300 to 400 nm can be used.
[0019]
After exposure, an appropriate solvent, preferably water, particularly neutral water, is used as a solvent to dissolve and remove the non-exposed portion, whereby development is performed quickly and a printing plate (relief plate) is obtained. As the developing method, it is preferable to use a spray developing device, a brush developing device, or the like.
[0020]
EXAMPLES Next, although an Example demonstrates this invention concretely, this invention is not limited to these Examples. In the examples, “parts” means “parts by weight”.
[0021]
Example 1
ε-Caprolactam 55.0 parts, N, N′-bis (γ-aminopropyl) piperazine adipate 40.0 parts, 1,3-bisaminomethylcyclohexane adipate 7.5 parts and water 100 parts are placed in a reactor. After sufficient nitrogen substitution, the mixture was sealed and gradually heated. When the internal pressure reached 10 kg / cm ² , the water in the reactor was gradually distilled out to return to normal pressure in 1 hour, and then reacted at normal pressure for 1.0 hour. The maximum polymerization temperature was 220 ° C. The obtained polymer obtained a transparent light yellow polyamide having a melting point of 140 ° C. and a specific viscosity of 2.00.
[0022]
50.0 parts of the obtained polyamide, 5.0 parts of N-ethyltoluenesulfonic acid amide, 0.03 part of 1,4-naphthoquinone, 50.0 parts of methanol, and 10 parts of water were placed in a heated tumbler with stirring. After mixing at 60 ° C. for 2 hours to completely dissolve the polymer, 40.6 parts of an acrylic acid adduct of bisphenol A diglycidyl ester, 2.9 parts of methacrylic acid, 0.1 part of hydroquinone monomethyl ether, ammonium sulfite 0 .3 parts, 0.1 part of oxalic acid and 1.0 part of benzyl dimethyl ketal were added and dissolved for 30 minutes. Next, the temperature was gradually raised to distill methanol and water, and the mixture was concentrated until the temperature in the kettle reached 110 ° C. At this stage, a fluid and viscous photosensitive resin was obtained.
[0023]
Next, a polyester film having a total thickness of 270 μm was prepared by providing an adhesive layer of 20 μm on a 250 μm polyethylene terephthalate support.
[0024]
The adhesive layer was a polyester urethane adhesive, and the composition solution for the adhesive layer was adjusted as follows. 80 parts by weight of polyester resin “Byron RV-200” manufactured by Toyobo Co., Ltd. was dissolved in 1940 parts by weight of a mixed solvent of toluene / methyl ethyl ketone = 80/20 (weight ratio) at 80 ° C. After cooling, 20 parts by weight of “Desmodur HL” of isocyanurate type polyisocyanate made by Sumitomo Bayer Urethane Co., Ltd. using hexamethylene diisocyanate and toluene diisocyanate as isocyanurate type polyisocyanate, triethylenediamine 0 as a curing catalyst 0.06 part by weight was added and stirred for 10 minutes.
[0025]
The support having the adhesive layer provided thereon was coated with the adhesive layer composition solution thus obtained on a polyethylene terephthalate film having a thickness of 250 μm and dried at 120 ° C. for 3 minutes. Got.
On the adhesive layer of this support, the above photosensitive resin group was cast to form a photosensitive layer.
[0026]
On the other hand, polyester film (original fabric is E5000 made by Toyobo Co., Ltd., thickness 125 μm, polyvinyl alcohol (Nippon Gosei Chemical Co., Ltd. Gohsenol GH-23) / UV absorbing emulsion (Shin Nakamura Chemical Co., Ltd.) New coat UVA-204W: average molecular weight of about 100,000) / pure water = 4.4 parts / 3.3 parts / 92.3 parts of an aqueous solution was applied with a bar coater # 8 at 100 ° C., 3 The coating layer was dried for 5 minutes to form a coating layer having a thickness of 0.5 μm after drying, and the light transmittance at a wavelength of 360 nm of the coating layer was 80%. The polyester film having a thickness of 125 μm having this coating layer was laminated to the photosensitive layer so that the coating layer side was in contact with the photosensitive layer. The laminate was laminated on the photosensitive layer with a netter to obtain a sheet-like laminate having a total thickness of 1075 μm and a photosensitive layer thickness of 680 μm, and this laminate was solidified into a plate shape under storage at 30 ° C. After 24 hours, this laminate was obtained. Was heated at 103 ° C. for 3 minutes and stored for 7 days or longer to obtain a photosensitive resin original plate (raw plate).
[0027]
The reproducibility evaluation of the fine white pattern was performed as follows. A 125 μm polyester film was peeled off, a test negative film was vacuum-contacted, and a sample exposed for 10 minutes using an A2 size printer (Mitsubishi Chemical Lamp) manufactured by JEOL Ltd. was prepared. Next, a tap water was used as a developer, and a relief image could be obtained by developing at 25 ° C. for 2 minutes using a brush-type washer (140 μm φ nylon brush, JW-A2-PD type manufactured by JEOL Ltd.). . Further, after drying with warm air at 70 ° C. for 10 minutes, a relief plate was obtained by exposing for 3 minutes with an A2 size printer manufactured by JEOL Ltd.
As a result of evaluating the reproducibility of the white pattern of the obtained photosensitive printing original plate, the width of the relief recess is also reproduced to be 30 μm with respect to the light shielding pattern having a slit width of 30 μm, and the negative film pattern is faithfully reproduced. The result was reproduced.
Next, using this relief plate, the printability of a 30 μm blank pattern was evaluated. Evaluation was performed with a black ink (T & K UV Best Cure No5 BF Black) using a seal printer P-20 manufactured by Sanjo Kikai Seisakusho, and the 30 μm blank pattern was sharp without ink filling. A finished print was obtained.
[0028]
Comparative Example 1
In Example 1, a photosensitive printing original plate was obtained in the same manner as in Example 1 except that the ultraviolet absorbing emulsion in the coating layer was not added.
As a result of evaluating the reproducibility of the white pattern of the obtained photosensitive printing original plate, the width of the relief recess was 20 μm with respect to the light shielding pattern having a slit width of 30 μm, and the negative film pattern was not reproduced. Next, using this relief plate, printability was evaluated in the same manner as in Example 1.
In addition, the printed material also had a sharp print-up due to the ink adhering to the portion that should be whitened.
[0029]
Comparative Example 2
Polyester film (original fabric is E5000 manufactured by Toyobo Co., Ltd., 125 μm thick) and polyvinyl alcohol (GOHSENOL GH-23 manufactured by Nippon Synthetic Chemical Industry) / UV absorber having a molecular weight of 323 (RUVA-93 manufactured by Otsuka Chemical) / pure water = 4 An aqueous solution added at a ratio of 7 parts / 0.6 parts / 95 parts was applied with a bar coater # 8 and dried at 100 ° C. for 3 minutes to form a coating layer having a thickness of 0.5 μm after drying. The light transmittance of the coating layer at a wavelength of 360 nm was 80%. Thereafter, a photosensitive printing original plate was obtained in the same manner as in Example 1. As a result of evaluating the reproducibility of the fine hollow pattern of the obtained photosensitive resin laminate, the width of the relief recess was 20 μm with respect to the light shielding pattern having a slit width of 30 μm, and the pattern of the negative film was not reproduced. Next, using this relief plate, printability was evaluated in the same manner as in Example 1.
In addition, the printed material also had a sharp print-up due to the ink adhering to the portion that should be whitened.
[0030]
【The invention's effect】
As described above, according to the photosensitive printing original plate having such a configuration, a fine white pattern can be reproduced with a relief or printed matter, and a printing plate capable of high-quality printing can be obtained, which contributes to the industry. That's big.

Claims (1)

A photosensitive printing original plate for producing a relief using a negative film or a positive film having at least a support, a photosensitive resin layer, an anti-adhesion layer and a cover film, wherein the anti-adhesion layer is an actinic ray of the photosensitive resin layer A light absorber containing a benzophenone or benzotriazole structure that absorbs ultraviolet light of 360 nm having an average molecular weight of 10,000 or more having absorption in the region , and having a light transmittance of 70% to light having a wavelength of 360 nm A photosensitive printing original plate characterized by being 90% .