JP4120943B2 - Lighting equipment for tunnels or roads - Google Patents
Lighting equipment for tunnels or roads Download PDFInfo
- Publication number
- JP4120943B2 JP4120943B2 JP2004242575A JP2004242575A JP4120943B2 JP 4120943 B2 JP4120943 B2 JP 4120943B2 JP 2004242575 A JP2004242575 A JP 2004242575A JP 2004242575 A JP2004242575 A JP 2004242575A JP 4120943 B2 JP4120943 B2 JP 4120943B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- layer
- lighting device
- photocatalyst
- tunnel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011941 photocatalyst Substances 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 36
- 239000006059 cover glass Substances 0.000 claims description 29
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 230000001443 photoexcitation Effects 0.000 claims description 10
- 229920001296 polysiloxane Polymers 0.000 claims description 10
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 7
- 239000000356 contaminant Substances 0.000 claims description 5
- 238000005286 illumination Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910006404 SnO 2 Inorganic materials 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 229910001887 tin oxide Inorganic materials 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 56
- 239000010410 layer Substances 0.000 description 21
- 239000011521 glass Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 9
- 238000006460 hydrolysis reaction Methods 0.000 description 9
- 239000010936 titanium Substances 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 239000008199 coating composition Substances 0.000 description 5
- 238000002485 combustion reaction Methods 0.000 description 5
- 230000018044 dehydration Effects 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- XGZNHFPFJRZBBT-UHFFFAOYSA-N ethanol;titanium Chemical compound [Ti].CCO.CCO.CCO.CCO XGZNHFPFJRZBBT-UHFFFAOYSA-N 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000012643 polycondensation polymerization Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- -1 titanium alkoxide Chemical class 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000033228 biological regulation Effects 0.000 description 3
- 239000013522 chelant Substances 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000001699 photocatalysis Effects 0.000 description 3
- 150000003609 titanium compounds Chemical class 0.000 description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052961 molybdenite Inorganic materials 0.000 description 2
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 2
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000004447 silicone coating Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 2
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- JRGQKLFZSNYTDX-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOCC1CO1 JRGQKLFZSNYTDX-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- XKQXZSHRPUFBSW-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propan-1-amine Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCN XKQXZSHRPUFBSW-UHFFFAOYSA-N 0.000 description 1
- LQMCVFDSKWCIGP-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propane-1-thiol Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCS LQMCVFDSKWCIGP-UHFFFAOYSA-N 0.000 description 1
- WALYBSCHCQWCPC-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C WALYBSCHCQWCPC-UHFFFAOYSA-N 0.000 description 1
- CJUFQURUUZMUOG-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropane-1-thiol Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCS CJUFQURUUZMUOG-UHFFFAOYSA-N 0.000 description 1
- CHPNMYQJQQGAJS-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropyl 2-methylprop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOC(=O)C(C)=C CHPNMYQJQQGAJS-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- RCZPHVPIOWNERS-UHFFFAOYSA-N CCCO[Ti] Chemical compound CCCO[Ti] RCZPHVPIOWNERS-UHFFFAOYSA-N 0.000 description 1
- 229910002370 SrTiO3 Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- INNSZZHSFSFSGS-UHFFFAOYSA-N acetic acid;titanium Chemical compound [Ti].CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O INNSZZHSFSFSGS-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- UWMGVIKSCFGFDR-UHFFFAOYSA-N benzyl(dibromo)silane Chemical compound Br[SiH](Br)CC1=CC=CC=C1 UWMGVIKSCFGFDR-UHFFFAOYSA-N 0.000 description 1
- VQPFDLRNOCQMSN-UHFFFAOYSA-N bromosilane Chemical compound Br[SiH3] VQPFDLRNOCQMSN-UHFFFAOYSA-N 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- LILGYOCNANBWTO-UHFFFAOYSA-N decyl-tri(propan-2-yloxy)silane Chemical compound CCCCCCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C LILGYOCNANBWTO-UHFFFAOYSA-N 0.000 description 1
- AGUMJWWZSTXCAM-UHFFFAOYSA-N decyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CCCCCCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C AGUMJWWZSTXCAM-UHFFFAOYSA-N 0.000 description 1
- LIQOCGKQCFXKLF-UHFFFAOYSA-N dibromo(dimethyl)silane Chemical compound C[Si](C)(Br)Br LIQOCGKQCFXKLF-UHFFFAOYSA-N 0.000 description 1
- DBUGVTOEUNNUHR-UHFFFAOYSA-N dibromo(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Br)(Br)C1=CC=CC=C1 DBUGVTOEUNNUHR-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- VGWJKDPTLUDSJT-UHFFFAOYSA-N diethyl dimethyl silicate Chemical compound CCO[Si](OC)(OC)OCC VGWJKDPTLUDSJT-UHFFFAOYSA-N 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 1
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- ZVQNVYMTWXEMSF-UHFFFAOYSA-N ethyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](CC)(OC(C)(C)C)OC(C)(C)C ZVQNVYMTWXEMSF-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- DPTKSEHTOJHGOV-UHFFFAOYSA-N hexyl-tri(propan-2-yloxy)silane Chemical compound CCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C DPTKSEHTOJHGOV-UHFFFAOYSA-N 0.000 description 1
- QECCXOBPOBIUMS-UHFFFAOYSA-N hexyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C QECCXOBPOBIUMS-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- ZEIWWVGGEOHESL-UHFFFAOYSA-N methanol;titanium Chemical compound [Ti].OC.OC.OC.OC ZEIWWVGGEOHESL-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 1
- AHQDZKRRVNGIQL-UHFFFAOYSA-N methyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C)(OC(C)(C)C)OC(C)(C)C AHQDZKRRVNGIQL-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- IHVVJLCVJNNCDK-UHFFFAOYSA-N octadecyl-tri(propan-2-yloxy)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C IHVVJLCVJNNCDK-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- VPLNCHFJAOKWBT-UHFFFAOYSA-N phenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C1=CC=CC=C1 VPLNCHFJAOKWBT-UHFFFAOYSA-N 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- ZMYXZXUHYAGGKG-UHFFFAOYSA-N propoxysilane Chemical compound CCCO[SiH3] ZMYXZXUHYAGGKG-UHFFFAOYSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- PCADGSDEFOMDNL-UHFFFAOYSA-N tri(propan-2-yloxy)-(3,3,3-trifluoropropyl)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCC(F)(F)F PCADGSDEFOMDNL-UHFFFAOYSA-N 0.000 description 1
- MQVCTPXBBSKLFS-UHFFFAOYSA-N tri(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](OC(C)C)(OC(C)C)OC(C)C MQVCTPXBBSKLFS-UHFFFAOYSA-N 0.000 description 1
- MLZOPJVPCGTFGS-UHFFFAOYSA-N tribromo(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Br)(Br)Br MLZOPJVPCGTFGS-UHFFFAOYSA-N 0.000 description 1
- LYZDWEPTQWHDLZ-UHFFFAOYSA-N tribromo(decyl)silane Chemical compound CCCCCCCCCC[Si](Br)(Br)Br LYZDWEPTQWHDLZ-UHFFFAOYSA-N 0.000 description 1
- BZAROSBWJASVBU-UHFFFAOYSA-N tribromo(ethenyl)silane Chemical compound Br[Si](Br)(Br)C=C BZAROSBWJASVBU-UHFFFAOYSA-N 0.000 description 1
- VRUFDMFAHKOFOT-UHFFFAOYSA-N tribromo(hexyl)silane Chemical compound CCCCCC[Si](Br)(Br)Br VRUFDMFAHKOFOT-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- RCEOWKUMFSNHFM-UHFFFAOYSA-N tribromo(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Br)(Br)Br RCEOWKUMFSNHFM-UHFFFAOYSA-N 0.000 description 1
- HPTIEXHGTPSFDC-UHFFFAOYSA-N tribromo(phenyl)silane Chemical compound Br[Si](Br)(Br)C1=CC=CC=C1 HPTIEXHGTPSFDC-UHFFFAOYSA-N 0.000 description 1
- RWRKNKVDHIEKHS-UHFFFAOYSA-N tribromo(propyl)silane Chemical compound CCC[Si](Br)(Br)Br RWRKNKVDHIEKHS-UHFFFAOYSA-N 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- HLWCOIUDOLYBGD-UHFFFAOYSA-N trichloro(decyl)silane Chemical compound CCCCCCCCCC[Si](Cl)(Cl)Cl HLWCOIUDOLYBGD-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- LFXJGGDONSCPOF-UHFFFAOYSA-N trichloro(hexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)Cl LFXJGGDONSCPOF-UHFFFAOYSA-N 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- JIOBRIJHDZBWDE-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-(3,3,3-trifluoropropyl)silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCC(F)(F)F JIOBRIJHDZBWDE-UHFFFAOYSA-N 0.000 description 1
- WUSDGIZCXCUHAI-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCOCC1CO1 WUSDGIZCXCUHAI-UHFFFAOYSA-N 0.000 description 1
- RXKYGZRLZACSIK-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C RXKYGZRLZACSIK-UHFFFAOYSA-N 0.000 description 1
- KGOOITCIBGXHJO-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-phenylsilane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C1=CC=CC=C1 KGOOITCIBGXHJO-UHFFFAOYSA-N 0.000 description 1
- DIZPPYBTFPZSGK-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-propylsilane Chemical compound CCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C DIZPPYBTFPZSGK-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Landscapes
- Laminated Bodies (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Catalysts (AREA)
- Surface Treatment Of Glass (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
本発明は、カバーガラスの清掃の容易なトンネル用又は道路用の照明装置に関する。 The present invention relates to a lighting device for a tunnel or road that can easily clean a cover glass.
トンネルや道路用照明装置のカバーガラスは排気ガス中の燃焼生成物や路面から舞い上がった煤塵によって汚れる。汚れに伴い照明装置の光出力は低下する。そこで、定期的に又は必要に応じてカバーガラスを清掃しなければならない。 The cover glass of a tunnel or road lighting device is contaminated by combustion products in exhaust gas and dust rising from the road surface. The light output of the lighting device decreases with the contamination. Therefore, the cover glass must be cleaned periodically or as necessary.
トンネルや道路用照明装置の清掃は交通規制を必要とすることが多く、円滑な道路交通を阻害する。特に、トンネル内では、照明装置の清掃のために交通規制をすることは困難であるだけでなく、かなりの危険を伴うので、充分な頻度で清掃を実施することができない。また、清掃は高所作業となり、作業に時間を要するので、交通規制の時間も長くなる傾向がある。
本発明の目的は、実質的に交通規制を行うことなく、或いは最小限の交通規制によりカバーガラスの清掃を可能とするトンネル用又は道路用の照明装置を提供することにある。 An object of the present invention is to provide a lighting device for tunnels or roads that allows the cover glass to be cleaned without substantially restricting traffic or with minimal traffic restrictions.
本発明者は、光触媒を光励起すると光触媒の表面が高度に親水化されることを発見した。驚ろくべきことに、光触媒性チタニアを紫外線で光励起したところ、水との接触角が10゜以下、より詳しくは5゜以下、特に約0゜になる程度に表面が高度に親水化されることが発見された。 The inventor has discovered that photoexcitation of the photocatalyst results in a highly hydrophilic surface of the photocatalyst. Surprisingly, when photocatalytic titania is photoexcited with ultraviolet rays, the surface becomes highly hydrophilic so that the contact angle with water is 10 ° or less, more specifically 5 ° or less, especially about 0 °. Was discovered.
本発明は斯る発見に基づくもので、本発明によれば、トンネル又は道路用照明装置のカバーガラスの表面は半導体光触媒を含む透明層で被覆され、光触媒を光励起することにより光触媒層の表面は親水化される。このように親水化された表面には、排気ガス中の燃焼生成物のような疎水性の物質は付着しにくい。また、必要に応じて光触媒層の表面に水を供給すると、表面に付着した汚染物質は水により容易に洗い流される。 The present invention is based on such a discovery. According to the present invention, the surface of the cover glass of the tunnel or road lighting device is coated with a transparent layer containing a semiconductor photocatalyst, and the surface of the photocatalyst layer is formed by photoexcitation of the photocatalyst. Hydrophilized. Hydrophobic substances such as combustion products in the exhaust gas are unlikely to adhere to the hydrophilic surface. Further, when water is supplied to the surface of the photocatalyst layer as necessary, contaminants attached to the surface are easily washed away with water.
好ましくは、光触媒の光励起は照明装置自身から放射される光により行われる。好ましい実施態様においては、清掃はカバーガラスに水を噴射することにより行い、水の噴射は好ましくは走行中の作業車から行う。本発明の上記特徴や効果、ならびに、他の特徴や利点は、以下の実施例の記載に従い明らかとなろう。 Preferably, photoexcitation of the photocatalyst is performed by light emitted from the illumination device itself. In a preferred embodiment, the cleaning is performed by spraying water onto the cover glass, and the water spray is preferably performed from a traveling work vehicle. The above features and advantages of the present invention, as well as other features and advantages, will be apparent from the description of the following examples.
本発明によれば、トンネル・道路用照明装置のカバーガラスの清掃頻度を大幅に低減することができ、トンネル・道路用照明装置のメンテナンスを最小限にすることができる。また、トンネル・道路用照明装置の清掃は走行中の作業車から水を噴射するだけで行うことができるので、交通規制を最小限にすることができる。 ADVANTAGE OF THE INVENTION According to this invention, the cleaning frequency of the cover glass of the tunnel and road illuminating device can be reduced significantly, and the maintenance of the tunnel and road illuminating device can be minimized. In addition, since the tunnel / road lighting device can be cleaned simply by spraying water from a traveling work vehicle, traffic regulation can be minimized.
トンネル用照明装置の場合について説明するに、照明装置はトンネル構造に応じて埋込型或いは直付型にすることができる。図1に示した例では、照明装置10は埋込型になっており、トンネルのコンクリート壁12に埋設されたハウジング14を有する。光源16はカバーガラス18によって覆われている。光源16としては、低圧ナトリウムランプ、高圧ナトリウムランプ、蛍光灯、水銀灯、蛍光水銀灯、その他の電灯を使用することができる。
In the case of a tunnel illumination device, the illumination device can be embedded or directly attached depending on the tunnel structure. In the example shown in FIG. 1, the
本発明に従い、カバーガラス18の表面は光触媒を含む透明層20によって被覆され、光触媒は光源16から放射される光によって光励起される。光励起に伴い、光触媒層20の表面は、水との接触角が10゜以下、特に約0゜になる程度に親水化される。
According to the present invention, the surface of the
光触媒としては、TiO2、ZnO、SnO2、SrTiO3、WO3、Bi2O3、Fe2O3、CdTe、MoS2、CdS、又はそれらの混合物を使用することができ、光源16の種類に応じ、光源からの光によって光励起されるようなバンドギャップエネルギを持ったものを選ぶことができる。例えば、光源16が波長589nmの低圧ナトリウムランプの場合には、CdTe又はMoS2を使用することができる。光源16が波長413nm以下の紫外線を含む場合にはルチル型TiO2、波長387nm以下の紫外線を含む場合にはアナターゼ型TiO2又はZnO、波長344nm以下の紫外線を含む場合にはSnO2を使用するのが好ましい。
As the photocatalyst, TiO2, ZnO, SnO2, SrTiO3, WO3, Bi2O3, Fe2O3, CdTe, MoS2, CdS, or a mixture thereof can be used. Those having such band gap energy can be selected. For example, when the
光触媒層20の膜厚は0.2μm以下にするのが好ましい。このようにすれば、充分な透明性を確保することができ、かつ、光の干渉による発色を防止することができる。
The film thickness of the
光触媒層20は、光触媒の粒子を含有するゾルをカバーガラス18に塗布し、ガラスの軟化点以下の温度で焼結することにより形成することができる。この場合には、ガラス中のナトリウムのようなアルカリ網目修飾イオンがガラスから光触媒層中に拡散するのを防止するため、カバーガラス18の表面を予めシリカ等の中間層で被覆しておくのが好ましい。また、光触媒がTiO2の場合には、光触媒層20にはSiO2若しくはSnO2を配合するのが好ましい。このようにすれば、光励起時には水との接触角が0゜になる程度に光触媒層20の表面を超親水化することができる。
The
或いは、光触媒層20は、無定形の光触媒前駆体の薄膜をカバーガラス18の表面に形成し、無定形薄膜を加熱して結晶化させて光活性のある光触媒に変換することにより形成してもよい。例えば、光触媒がTiO2の場合には、カバーガラス18の表面に無定形チタニアの薄膜を形成し、次いで400℃以上かつガラスの軟化点以下の温度で焼成することにより無定形チタニアを結晶性チタニア(アナターゼ又はルチル)に相変化させることができる。このように形成された光触媒層20は、光励起時には水との接触角が0゜になる程度に超親水化される。
Alternatively, the
無定形チタニアは、チタンのアルコキシド(例えば、テトラエトキシチタン、テトライソプロポキシチタン、テトラn−プロポキシチタン、テトラブトキシチタン、テトラメトキシチタン)に塩酸又はエチルアミンのような加水分解抑制剤を添加し、エタノールやプロパノールのようなアルコールで希釈した後、部分的に加水分解を進行させながら又は完全に加水分解を進行させた後、混合物をスプレーコーティング、フローコーティング、スピンコーティング、ディップコーティング、ロールコーティングその他のコーティング法により、カバーガラス18の表面に塗布し、常温から200℃の温度で乾燥させることにより形成することができる。乾燥により、チタンのアルコキシドの加水分解が完遂して水酸化チタンが生成し、水酸化チタンの脱水縮重合により無定形チタニアの層が基材の表面に形成される。チタンのアルコキシドに代えて、チタンのキレート又はチタンのアセテートのような他の有機チタン化合物を用いてもよい。
Amorphous titania is obtained by adding a hydrolysis inhibitor such as hydrochloric acid or ethylamine to titanium alkoxide (for example, tetraethoxy titanium, tetraisopropoxy titanium, tetra n-propoxy titanium, tetrabutoxy titanium, tetramethoxy titanium), and ethanol. After dilution with alcohol such as propanol or propanol, with partial or full hydrolysis, the mixture is spray coated, flow coated, spin coated, dip coated, roll coated and other coatings It can be formed by applying to the surface of the
或いは、無定形チタニアは、無機チタン化合物、例えば、TiCl4又はTi(SO4)2の酸性水溶液をスプレーコーティング、フローコーティング、スピンコーティング、ディップコーティング、ロールコーティングにより、カバーガラス18の表面に塗布し、次いで無機チタン化合物を約100℃〜200℃の温度で乾燥させて加水分解と脱水縮重合に付すことにより形成することができる。
Alternatively, amorphous titania is applied to the surface of the
光励起時に水との接触角が0゜になる程度の超親水性を呈する光触媒層20を形成する他の好ましいやり方は、未硬化の若しくは部分的に硬化したシリコーン(オルガノポリシロキサン)又はシリコーンの前駆体からなる塗膜形成要素に光触媒の粒子を分散させてなる塗料用組成物を用いることである。この塗料用組成物をカバーガラス18の表面に塗布し、塗膜形成要素を硬化させた後、光触媒を光励起すると、シリコーン分子のケイ素原子に結合した有機基は光触媒の光触媒作用により水酸基に置換され、光触媒層20の表面は超親水化される。
Another preferred way of forming the
この塗料用組成物の塗膜形成要素としては、メチルトリクロルシラン、メチルトリブロムシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリイソプロポキシシラン、メチルトリt−ブトキシシラン;エチルトリクロルシラン、エチルトリブロムシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、エチルトリイソプロポキシシラン、エチルトリt−ブトキシシラン;n−プロピルトリクロルシラン、n−プロピルトリブロムシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、n−プロピルトリイソプロポキシシラン、n−プロピルトリt−ブトキシシラン;n−ヘキシルトリクロルシラン、n−ヘキシルトリブロムシラン、n−ヘキシルトリメトキシシラン、n−ヘキシルトリエトキシシラン、n−ヘキシルトリイソプロポキシシラン、n−ヘキシルトリt−ブトキシシラン;n−デシルトリクロルシラン、n−デシルトリブロムシラン、n−デシルトリメトキシシラン、n−デシルトリエトキシシラン、n−デシルトリイソプロポキシシラン、n−デシルトリt−ブトキシシラン;n−オクタデシルトリクロルシラン、n−オクタデシルトリブロムシラン、n−オクタデシルトリメトキシシラン、n−オクタデシルトリエトキシシラン、n−オクタデシルトリイソプロポキシシラン、n−オクタデシルトリt−ブトキシシラン;フェニルトリクロルシラン、フェニルトリブロムシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、フェニルトリイソプロポキシシラン、フェニルトリt−ブトキシシラン;テトラクロルシラン、テトラブロムシラン、テトラメトキシシラン、テトラエトキシシラン、テトラブトキ
シシラン、ジメトキシジエトキシシラン;ジメチルジクロルシラン、ジメチルジブロムシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン;ジフェニルジクロルシラン、ジフェニルジブロムシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン;フェニルメチルジクロルシラン、フェニルメチルジブロムシラン、フェニルメチルジメトキシシラン、フェニルメチルジエトキシシラン;トリクロルヒドロシラン、トリブロムヒドロシラン、トリメトキシヒドロシラン、トリエトキシヒドロシラン、トリイソプロポキシヒドロシラン、トリt−ブトキシヒドロシラン;ビニルトリクロルシラン、ビニルトリブロムシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリイソプロポキシシラン、ビニルトリt−ブトキシシラン;トリフルオロプロピルトリクロルシラン、トリフルオロプロピルトリブロムシラン、トリフルオロプロピルトリメトキシシラン、トリフルオロプロピルトリエトキシシラン、トリフルオロプロピルトリイソプロポキシシラン、トリフルオロプロピルトリt−ブトキシシラン;γ−グリシドキシプロピルメチルジメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−グリシドキシプロピルトリイソプロポキシシラン、γ−グリシドキシプロピルトリt−ブトキシシラン;γ−メタアクリロキシプロピルメチルジメトキシシラン、γ−メタアクリロキシプロピルメチルジエトキシシラン、γ−メタアクリロキシプロピルトリメトキシシラン、γ−メタアクリロキシプロピルトリエトキシシラン、γ−メタアクリロキシプロピルトリイソプロポキシシラン、γ−メタアクリロキシプロピルトリt−ブトキシシラン;γ−アミノプロピルメチルジメトキシシラン、γ−アミノプロピルメチルジエトキシシラン、γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、γ−アミノプロピルトリイソプロポキシシラン、γ−アミノプロピルトリt−ブトキシシラン;γ−メルカプトプロピルメチルジメトキシシラン、γ−メルカプトプロピルメチルジエトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−メルカプトプロピルトリエトキシシラン、γ−メルカプトプロピルトリイソプロポキシシラン、γ−メルカプトプロピルトリt−ブトキシシラン;β−(3、4−エポキシシクロヘキシル)エチルトリメトキシシラン、β−(3、4−エポキシシクロヘキシル)エチルトリエトキシシラン;および、それらの部分加水分解物;およびそれらの混合物を使用することができる。
The coating film forming element of this coating composition includes methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltrichlorosilane. Bromosilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane; n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxy Silane, n-propyltriisopropoxysilane, n-propyltri-t-butoxysilane; n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyl Riethoxysilane, n-hexyltriisopropoxysilane, n-hexyltri-t-butoxysilane; n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyl Triisopropoxysilane, n-decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n- Octadecyltri-t-butoxysilane; phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxy Silane: Tetrachlorosilane, Tetrabromosilane, Tetramethoxysilane, Tetraethoxysilane, Tetrabutoxysilane, Dimethoxydiethoxysilane; Dimethyldichlorosilane, Dimethyldibromosilane, Dimethyldimethoxysilane, Dimethyldiethoxysilane; Diphenyldichlorosilane , Diphenyldibromosilane, diphenyldimethoxysilane, diphenyldiethoxysilane; phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane; trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, trimethyl Ethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane; vinyltrichlorosilane, vinyl Tribromosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltri-t-butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, trifluoropropyltri Ethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane; γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane , Γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriisopropoxysilane, γ-glycidoxypropyltri-t-butoxysilane; Liloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ -Methacryloxypropyltri-t-butoxysilane; gamma-aminopropylmethyldimethoxysilane, gamma-aminopropylmethyldiethoxysilane, gamma-aminopropyltrimethoxysilane, gamma-aminopropyltriethoxysilane, gamma-aminopropyltriisosilane Propoxysilane, γ-aminopropyltri-t-butoxysilane; γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ -Mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ) Ethyltriethoxysilane; and partial hydrolysates thereof; and mixtures thereof.
このようにカバーガラス18の表面に形成された光触媒層20は、光源16を点灯すると、光源自体から放射される光によって光励起される。或いは、道路照明装置のように太陽光が当たる条件では、光触媒層20は日中は太陽光により光励起される。光励起に伴い、光触媒層20の表面は、水との接触角が10゜以下、特に約0゜になる程度に親水化される。カーボンブラックやディーゼルパーティキュレートのような燃焼生成物は基本的に疎水性であるから、超親水化されたカバーガラス18の表面に付着しにくい。同様に、泥や土のような無機物質の水との接触角は20゜から50゜であるので、水との接触角が約0゜になる程度に超親水化されたカバーガラス18の表面には付着しにくい。従って、カバーガラス18の表面は長期間にわたり清浄に維持されるので、清掃の頻度を大幅に低減することができる。
Thus, when the
カバーガラス18の表面が汚染物質で汚れた場合には、必要に応じてカバーガラス18の表面に水を供給すれば、表面に付着した汚染物質は水により容易に洗い流される。超親水化された表面の水に対する親和力は、燃焼生成物のような疎水性物質に対する親和力よりも大きいので、カバーガラス18の表面に水を供給すれば、燃焼生成物のような疎水性物質は表面から釈放され、水によって簡単に洗い流される。カバーガラス18の清掃は低速又は高速で走行中の作業車から水を噴射することにより行うのが好ましい。このようにすれば、交通規制を最小限にすることができる。或いは、トンネルの壁や照明装置の近傍などに散水装置を設置し、随時カバーガラス18に散水してもよい。
When the surface of the
実施例1 エタノールの溶媒86重量部に、テトラエトキシシランSi(OC2H5)4(和光純薬)6重量部と純水6重量部とテトラエトキシシランの加水分解抑制剤として36%塩酸2重量部を加えて混合し、シリカコーティング溶液を調整した。混合により溶液は発熱するので、混合液を約1時間放置冷却した。この溶液をフローコーティング法により10cm四角のソーダライムガラス板の表面に塗布し、80℃の温度で乾燥させた。乾燥に伴い、テトラエトキシシランは加水分解を受けて先ずシラノールSi(OH)4になり、続いてシラノールの脱水縮重合により無定形シリカの薄膜がガラス板の表面に形成された。 Example 1 To 86 parts by weight of ethanol solvent, 6 parts by weight of tetraethoxysilane Si (OC2H5) 4 (Wako Pure Chemical), 6 parts by weight of pure water, and 2 parts by weight of 36% hydrochloric acid as a hydrolysis inhibitor for tetraethoxysilane were added. In addition, mixing was performed to prepare a silica coating solution. Since the solution generated heat by mixing, the mixture was allowed to cool for about 1 hour. This solution was applied to the surface of a 10 cm square soda lime glass plate by a flow coating method and dried at a temperature of 80 ° C. With drying, tetraethoxysilane was first hydrolyzed to silanol Si (OH) 4, and then an amorphous silica thin film was formed on the surface of the glass plate by dehydration condensation polymerization of silanol.
次に、テトラエトキシチタンTi(OC2H5)4(Merck)1重量部とエタノール9重量部との混合物に加水分解抑制剤として36%塩酸を0.1重量部添加してチタニアコーティング溶液を調整し、この溶液を前記ガラス板の表面に乾燥空気中でフローコーティング法により塗布した。塗布量はチタニアに換算して45μg/cm2とした。テトラエトキシチタンの加水分解速度は極めて早いので、塗布の段階でテトラエトキシチタンの一部は加水分解され、水酸化チタンTi(OH)4が生成し始めた。 Next, 0.1 part by weight of 36% hydrochloric acid as a hydrolysis inhibitor was added to a mixture of 1 part by weight of tetraethoxytitanium Ti (OC2H5) 4 (Merck) and 9 parts by weight of ethanol to prepare a titania coating solution. This solution was applied to the surface of the glass plate by a flow coating method in dry air. The coating amount was 45 μg / cm 2 in terms of titania. Since the hydrolysis rate of tetraethoxytitanium is extremely fast, a part of tetraethoxytitanium was hydrolyzed at the application stage, and titanium hydroxide Ti (OH) 4 began to be produced.
次に、このガラス板を1〜10分間約150℃の温度に保持することにより、テトラエトキシチタンの加水分解を完了させると共に、生成した水酸化チタンを脱水縮重合に付し、無定形チタニアを生成させた。こうして、無定形シリカの上に無定形チタニアがコーティングされたガラス板を得た。このガラス板を500℃の温度で焼成して、無定形チタニアをアナターゼ型チタニアに変換させた。 Next, the glass plate is kept at a temperature of about 150 ° C. for 1 to 10 minutes to complete the hydrolysis of tetraethoxytitanium, and the produced titanium hydroxide is subjected to dehydration condensation polymerization to form amorphous titania. Generated. Thus, a glass plate in which amorphous titania was coated on amorphous silica was obtained. This glass plate was baked at a temperature of 500 ° C. to convert amorphous titania into anatase titania.
この試料を数日間暗所に放置した後、20Wのブラックライトブルー(BLB)蛍光灯(三共電気、FL20BLB)を用いて試料の表面に0.5mW/cm2の紫外線照度(アナターゼ型チタニアのバンドギャップエネルギより高いエネルギの紫外線の照度)で約1時間紫外線を照射し、#1試料を得た。比較のため、チタニアのコーティングを施さないガラス板を準備し、#2試料とした。 After leaving this sample in a dark place for several days, using a 20 W black light blue (BLB) fluorescent lamp (Sankyo Electric, FL20BLB), an ultraviolet illuminance of 0.5 mW / cm2 on the surface of the sample (the band gap of anatase titania) A sample of # 1 was obtained by irradiating with ultraviolet rays for about 1 hour at an illuminance of ultraviolet rays with energy higher than energy. For comparison, a glass plate without a titania coating was prepared and used as a sample # 2.
#1試料と#2試料の水との接触角を接触角測定器(協和界面科学社製、形式CA-X150)により測定した。この接触角測定器の低角度側検出限界は1゜であった。接触角は、マイクロシリンジから試料表面に水滴を滴下した後30秒後に測定した。#1試料の表面の水に対する測定器の読みは0゜であり、超親水性を示した。これに対し、#2試料の水との接触角は30〜40゜であった。 The contact angle between the # 1 sample and the water of the # 2 sample was measured with a contact angle measuring device (manufactured by Kyowa Interface Science Co., Ltd., model CA-X150). The detection limit of the low angle side of this contact angle measuring device was 1 °. The contact angle was measured 30 seconds after a water droplet was dropped from the microsyringe onto the sample surface. The reading of the measuring instrument relative to the water on the surface of the # 1 sample was 0 °, indicating super hydrophilicity. In contrast, the contact angle of the # 2 sample with water was 30 to 40 °.
このガラス板の表面にオレイン酸を塗布し、ガラス板表面を水平姿勢に保持しながらガラス板を水槽に満たした水の中に浸漬したところ、オレイン酸は丸まって油滴となり、ガラス板の表面から釈放されて浮上した。 When oleic acid was applied to the surface of this glass plate and the glass plate was immersed in water filled in a water tank while maintaining the glass plate surface in a horizontal position, the oleic acid curled up into oil droplets, and the surface of the glass plate Was released from and surfaced.
実施例2 10cm四角のソーダライムガラス板の表面にチタンキレート含有液を塗布し、チタンキレートを加水分解と脱水縮重合に付すことにより、無定形チタニアをガラス板の表面に形成した。このガラス板を500℃の温度で焼成して、アナターゼ型チタニア結晶からなる表面層を形成した。表面層の膜厚は7nmであった。得られた試料の表面にBLB蛍光灯を用いて0.5mW/cm2の照度で約1時間紫外線を照射した。この試料の表面の水との接触角を接触角測定器(ERMA社製、形式G-I-1000、低角度側検出限界3゜)で測定したところ、接触角の読みは3゜未満であった。 Example 2 An amorphous titania was formed on the surface of a glass plate by applying a titanium chelate-containing liquid to the surface of a 10 cm square soda lime glass plate and subjecting the titanium chelate to hydrolysis and dehydration condensation polymerization. This glass plate was baked at a temperature of 500 ° C. to form a surface layer made of anatase-type titania crystals. The film thickness of the surface layer was 7 nm. The surface of the obtained sample was irradiated with ultraviolet rays at an illuminance of 0.5 mW / cm @ 2 for about 1 hour using a BLB fluorescent lamp. When the contact angle between the surface of the sample and water was measured with a contact angle measuring device (ERMA, model G-I-1000, low angle side detection limit 3 °), the contact angle reading was less than 3 °.
実施例3 この実施例では基材として10cm四角のアルミニウム基板を使用した。基板の表面を平滑化するため、予めシリコーン層で被覆した。このため、日本合成ゴムの塗料用組成物“グラスカ”のA液(シリカゾル)とB液(トリメトキシメチルシラン)を、 A液とB液との重量比が3:1になるように混合し、この混合液をアルミニウム基板に塗布し、150℃の温度で硬化させ、膜厚3μmのシリコーンのベースコートで被覆された複数のアルミニウム基板(#1試料)を得た。 Example 3 In this example, a 10 cm square aluminum substrate was used as a base material. In order to smooth the surface of the substrate, it was previously coated with a silicone layer. For this reason, the liquid A (silica sol) and the liquid B (trimethoxymethylsilane) of the paint composition “Glaska” of Japanese synthetic rubber are mixed so that the weight ratio of the liquid A and the liquid B is 3: 1. The mixed solution was applied to an aluminum substrate and cured at a temperature of 150 ° C. to obtain a plurality of aluminum substrates (# 1 sample) covered with a 3 μm-thick silicone base coat.
次に、チタニア含有塗料により#1試料を被覆した。より詳しくは、アナターゼ型チタニアゾル(日産化学、TA-15)と前記“グラスカ”のA液(シリカゾル)を混合し、エタノールで希釈後、更に“グラスカ”の上記B液を添加し、チタニア含有塗料用組成物を調整した。この塗料用組成物の組成は、シリカ39重量部、トリメトキシメチルシラン97重量部、チタニア87重量部であった。この塗料用組成物を#1試料の表面に塗布し、150℃の温度で硬化させ、アナターゼ型チタニア粒子がシリコーン塗膜中に分散されたトップコートを形成し、#2試料を得た。 The # 1 sample was then coated with a titania-containing paint. More specifically, anatase-type titania sol (Nissan Chemical, TA-15) and the above-mentioned “Glaska” solution A (silica sol) are mixed, diluted with ethanol, and further added with the above-mentioned “Glaska” solution B. The composition for preparation was prepared. The composition of this coating composition was 39 parts by weight of silica, 97 parts by weight of trimethoxymethylsilane, and 87 parts by weight of titania. This coating composition was applied to the surface of sample # 1 and cured at a temperature of 150 ° C. to form a topcoat in which anatase-type titania particles were dispersed in a silicone coating film, thereby obtaining sample # 2.
次に、#2試料にBLB蛍光灯を用いて0.5mW/cm2の照度で5日間紫外線を照射し、#3試料を得た。この試料の表面の水との接触角を接触角測定器(ERMA社製)で測定したところ、接触角の読みは3゜未満であった。紫外線照射前の#2試料の接触角を測定したところ、70゜であった。#1試料の接触角を測定したところ、90゜であった。更に、#1試料に#2試料と同じ条件で5日間紫外線を照射し、接触角を測定したところ、接触角は85゜であった。 Next, the # 2 sample was irradiated with ultraviolet rays at an illuminance of 0.5 mW / cm @ 2 using a BLB fluorescent lamp for 5 days to obtain a # 3 sample. When the contact angle between the surface of the sample and water was measured with a contact angle measuring device (manufactured by ERMA), the reading of the contact angle was less than 3 °. The contact angle of sample # 2 before UV irradiation was measured and found to be 70 °. The contact angle of # 1 sample was measured and found to be 90 °. Furthermore, the # 1 sample was irradiated with ultraviolet rays for 5 days under the same conditions as the # 2 sample, and the contact angle was measured. The contact angle was 85 °.
このことから、シリコーンに光触媒を含有させ、光触媒を光励起した場合には、シリコーン塗膜が高度に親水化されることが分かる。シリコーンの分子のケイ素原子に結合した有機基が光触媒作用によって水酸基に置換され、親水性のシリコーン誘導体が表面に形成されているものと考えられる。 From this, it can be seen that when the photocatalyst is contained in silicone and the photocatalyst is photoexcited, the silicone coating is highly hydrophilized. It is considered that the organic group bonded to the silicon atom of the silicone molecule is replaced with a hydroxyl group by photocatalysis and a hydrophilic silicone derivative is formed on the surface.
10: トンネル用照明装置
18: カバーガラス
20: 光触媒含有層
10: Tunnel lighting device 18: Cover glass 20: Photocatalyst containing layer
Claims (5)
前記光触媒を照明装置自身から放射される光により光励起することにより前記層の表面を水との接触角が10°以下の親水性を呈するように親水化し、前記層の表面に水を供給することにより前記層の表面に付着した汚染物質を洗い流すことを可能とするトンネル用又は道路用の照明装置。 The surface of the cover glass of the tunnel or road lighting device is coated with a transparent layer in which a semiconductor photocatalyst made of TiO 2 is dispersed in silicone,
The surface of the layer is hydrophilized so that the contact angle with water is 10 ° or less by photoexcitation of the photocatalyst with light emitted from the lighting device itself, and water is supplied to the surface of the layer. A lighting device for tunnels or roads that makes it possible to wash away contaminants adhering to the surface of the layer.
前記光触媒を照明装置自身から放射される光により光励起することにより前記層の表面を水との接触角が10°以下の親水性を呈するように親水化し、前記層の表面に水を供給することにより前記層の表面に付着した汚染物質を洗い流すことを可能とするトンネル用又は道路用の照明装置。 The surface of the cover glass of the tunnel or road illumination device is covered with a transparent layer containing a semiconductor photocatalyst that is TiO 2 and silica (SiO 2 ) or tin oxide (SnO 2 ),
The surface of the layer is hydrophilized so that the contact angle with water is 10 ° or less by photoexcitation of the photocatalyst with light emitted from the lighting device itself, and water is supplied to the surface of the layer. A lighting device for tunnels or roads that makes it possible to wash away contaminants adhering to the surface of the layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004242575A JP4120943B2 (en) | 1995-06-14 | 2004-08-23 | Lighting equipment for tunnels or roads |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18201995 | 1995-06-14 | ||
JP20501995 | 1995-07-08 | ||
JP35464995 | 1995-12-22 | ||
JP2004242575A JP4120943B2 (en) | 1995-06-14 | 2004-08-23 | Lighting equipment for tunnels or roads |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000395532A Division JP2001243820A (en) | 1995-06-14 | 2000-12-26 | Lighting system for tunnel or road |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005007396A JP2005007396A (en) | 2005-01-13 |
JP4120943B2 true JP4120943B2 (en) | 2008-07-16 |
Family
ID=27470281
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8115679A Pending JPH09231819A (en) | 1995-06-14 | 1996-04-12 | Cleaning method and dirt preventing method for lighting system for tunnel or road |
JP8155997A Pending JPH09229493A (en) | 1995-06-14 | 1996-05-28 | Transparent cover of solar energy collector and method of cleaning same |
JP08168644A Expired - Lifetime JP3129194B2 (en) | 1995-06-14 | 1996-06-06 | Antifouling crystallized glass |
JP2000395532A Pending JP2001243820A (en) | 1995-06-14 | 2000-12-26 | Lighting system for tunnel or road |
JP2004242575A Expired - Lifetime JP4120943B2 (en) | 1995-06-14 | 2004-08-23 | Lighting equipment for tunnels or roads |
Family Applications Before (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8115679A Pending JPH09231819A (en) | 1995-06-14 | 1996-04-12 | Cleaning method and dirt preventing method for lighting system for tunnel or road |
JP8155997A Pending JPH09229493A (en) | 1995-06-14 | 1996-05-28 | Transparent cover of solar energy collector and method of cleaning same |
JP08168644A Expired - Lifetime JP3129194B2 (en) | 1995-06-14 | 1996-06-06 | Antifouling crystallized glass |
JP2000395532A Pending JP2001243820A (en) | 1995-06-14 | 2000-12-26 | Lighting system for tunnel or road |
Country Status (1)
Country | Link |
---|---|
JP (5) | JPH09231819A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3401383B2 (en) * | 1996-03-14 | 2003-04-28 | 東芝ライテック株式会社 | Lighting equipment |
JPH11116805A (en) * | 1997-10-15 | 1999-04-27 | Dainippon Ink & Chem Inc | Curable composition |
JPWO2002053369A1 (en) * | 2000-12-28 | 2004-04-30 | 旭硝子株式会社 | Antifouling transparent laminate, method of manufacturing the same, translucent cover for lighting device, and lighting device |
US20080264411A1 (en) * | 2007-04-26 | 2008-10-30 | Beranek Gerald D | Solar Collector with Hydrophilic Photocatalytic Coated Protective Pane |
KR100973171B1 (en) * | 2008-08-29 | 2010-07-30 | 에이컴조명 주식회사 | Anti-fouling Street Light |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62292626A (en) * | 1986-06-09 | 1987-12-19 | Seiko Epson Corp | Production of glass |
JPH01231926A (en) * | 1988-03-14 | 1989-09-18 | Hitachi Ltd | Air cleaner |
JPH01234729A (en) * | 1988-03-14 | 1989-09-20 | Hitachi Ltd | Air conditioner |
JPH01275447A (en) * | 1988-04-27 | 1989-11-06 | Ube Nitto Kasei Co Ltd | Production of titania-silica glass by sol-gel process |
JPH06278241A (en) * | 1992-09-22 | 1994-10-04 | Takenaka Komuten Co Ltd | Building material |
JPH06157045A (en) * | 1992-11-18 | 1994-06-03 | Pola Chem Ind Inc | Production of rutile-type titania-silica glass |
JPH0751646A (en) * | 1993-08-12 | 1995-02-28 | Ishihara Sangyo Kaisha Ltd | Method for cleaning off contaminant on solid matter surface |
-
1996
- 1996-04-12 JP JP8115679A patent/JPH09231819A/en active Pending
- 1996-05-28 JP JP8155997A patent/JPH09229493A/en active Pending
- 1996-06-06 JP JP08168644A patent/JP3129194B2/en not_active Expired - Lifetime
-
2000
- 2000-12-26 JP JP2000395532A patent/JP2001243820A/en active Pending
-
2004
- 2004-08-23 JP JP2004242575A patent/JP4120943B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH09231819A (en) | 1997-09-05 |
JPH09226054A (en) | 1997-09-02 |
JP2005007396A (en) | 2005-01-13 |
JPH09229493A (en) | 1997-09-05 |
JP3129194B2 (en) | 2001-01-29 |
JP2001243820A (en) | 2001-09-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3760509B2 (en) | Greenhouse ceiling and its condensation prevention method | |
JP2865065B2 (en) | Composite with hydrophilic surface | |
JP4120943B2 (en) | Lighting equipment for tunnels or roads | |
JPH0983005A (en) | Solar battery with self-cleaning cover | |
JP3704817B2 (en) | Toilet bowl | |
JPH0978791A (en) | Water repellent pollution resistant outer wall and method for preventing water repellent pollution | |
JP3124491B2 (en) | How to clean sound insulation walls | |
JP3191259B2 (en) | Method of making substrate surface hydrophilic | |
JP3744061B2 (en) | Permeable pavement material | |
JP3643290B2 (en) | Sound insulation wall | |
JP3115534B2 (en) | Inner wall of antifouling tunnel, antifouling method and cleaning method | |
JP3648848B2 (en) | Road marking with excellent visibility, its construction method and self-cleaning method | |
JP3534072B2 (en) | Bathroom components | |
JP3379581B2 (en) | Building exterior walls and structural elements for building exterior walls | |
JPH0956788A (en) | Cleaning method for bath room members | |
JP3707130B2 (en) | Refrigerated showcase | |
JP2001049827A (en) | Building exterior wall, building exterior wall structure element and building exterior wall coating material | |
JP3882227B2 (en) | Highly cleanable design member and method for cleaning design member | |
JPH0960067A (en) | Water equipment member having high drainage ability method for promoting water drainage and drying of water equipment member and method for preventing water scale | |
JPH09271731A (en) | Removing method of objective material | |
JP2004003335A (en) | Member for bathroom | |
JPH1085100A (en) | Anti-clouding heat-insulated showcase | |
JPH0975243A (en) | Stainproof plate | |
JPH0956742A (en) | Goggles with defogging function | |
JP2001112851A (en) | Member for bathroom |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070601 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070725 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070809 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080107 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080307 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20080307 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080404 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080417 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110509 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110509 Year of fee payment: 3 |
|
S201 | Request for registration of exclusive licence |
Free format text: JAPANESE INTERMEDIATE CODE: R314201 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110509 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120509 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120509 Year of fee payment: 4 |
|
S211 | Written request for registration of transfer of exclusive licence |
Free format text: JAPANESE INTERMEDIATE CODE: R314211 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120509 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130509 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130509 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140509 Year of fee payment: 6 |
|
EXPY | Cancellation because of completion of term |