JP4097580B2 - 磁束照射装置 - Google Patents
磁束照射装置 Download PDFInfo
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- JP4097580B2 JP4097580B2 JP2003289534A JP2003289534A JP4097580B2 JP 4097580 B2 JP4097580 B2 JP 4097580B2 JP 2003289534 A JP2003289534 A JP 2003289534A JP 2003289534 A JP2003289534 A JP 2003289534A JP 4097580 B2 JP4097580 B2 JP 4097580B2
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- Prior art keywords
- magnetic flux
- coil assembly
- flux irradiation
- power supply
- low
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Description
2,2A 磁束照射ガン
3 高周波電源装置
4 接続配線
5 電源
7,7A 体腔内挿入部
8,8A 体外把手部
10,10A コイルアッセンブリー
10a,10Aa コイル(磁束出力端)
10b,10Ab 給電路
11,11A,13,13A ハウジング
14,14A 電流増幅トランス
16,17 冷却水配管
20 チューブ
21 E字状コア(磁心)
22 1次巻線
23 切欠筒体(2次巻線)
31,32 チューブ
34 トロイダルコア(磁心)
35 1次巻線
37,38 金属製筒体(2次巻線)
Claims (5)
- 生体内の要加熱局所に導入配置した感磁発熱体を発熱させるために、生体の開口部から体腔内に挿入して体腔内から交番磁束照射を行うための磁束照射装置であって、磁束出力端として機能させる低巻数のコイルと往復の電路を備えた低インダクタンスの給電路とを連ねて接続したコイルアッセンブリーを配して体腔内挿入部を構成すると共に、この体腔内挿入部にこれを体外から取り扱うための体外把手部を連設一体化して構成した体内挿入形式の磁束照射ガンと、該磁束照射ガンに高周波交流を送給する高周波電源装置と、前記コイルアッセンブリーと高周波電源装置の間に設けられ、高周波電源装置からの高周波交流を低電圧大電流に変換してコイルアッセンブリーに送給する電流増幅トランスを備えており、該電流増幅トランスを前記磁束照射ガンの前記体外把手部に配すると共に、前記コイルアッセンブリーを前記電流増幅トランスに、該電流増幅トランスの2次側と前記コイルアッセンブリーとが連なる閉回路が形成されるように接続していることを特徴とする磁束照射装置。
- 前記磁束照射ガンにおいて、前記コイルアッセンブリーを構成する低インダクタンスの給電路はパラレル又はペアツイスト給電路であり、前記電流増幅トランスの2次巻線は、C字状断面の切欠筒体で構成されていることを特徴とする請求項1記載の磁束照射装置。
- 前記磁束照射ガンにおいて、前記コイルアッセンブリーを構成する低インダクタンスの給電路は同軸給電路であり、前記電流増幅トランスは、その1次巻線がトロイダル形式で巻成されたものであり、2次巻線が、2体の金属製筒体を前記トロイダル形式の1次巻線の内周側と外周側とに振り分け配置して構成した同軸形式のものであることを特徴とする請求項1記載の磁束照射装置。
- 前記磁束照射ガンは、少なくとも前記コイルアッセンブリーが、絶縁材料製のハウジングに収容されていることを特徴とする請求項1から3のいずれか1項記載の磁束照射装置。
- 前記磁束照射ガンの、少なくとも前記コイルアッセンブリーには、絶縁材料による被覆が施されていることを特徴とする請求項1から4のいずれか1項記載の磁束照射装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003289534A JP4097580B2 (ja) | 2003-08-08 | 2003-08-08 | 磁束照射装置 |
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JP2003289534A JP4097580B2 (ja) | 2003-08-08 | 2003-08-08 | 磁束照射装置 |
Publications (2)
Publication Number | Publication Date |
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JP2005058298A JP2005058298A (ja) | 2005-03-10 |
JP4097580B2 true JP4097580B2 (ja) | 2008-06-11 |
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JP2003289534A Expired - Fee Related JP4097580B2 (ja) | 2003-08-08 | 2003-08-08 | 磁束照射装置 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10342989B2 (en) | 2013-09-20 | 2019-07-09 | Dai-Ichi High Frequency Co., Ltd. | Magnetic flux irradiation devices and components |
US10500409B2 (en) | 2015-03-02 | 2019-12-10 | KAIO Therapy, LLC | Systems and methods for providing alternating magnetic field therapy |
US10576297B2 (en) | 2013-09-20 | 2020-03-03 | Dai-Ichi High Frequency Co., Ltd. | Magnetic flux irradiation devices and components |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101582988B1 (ko) * | 2013-09-30 | 2016-01-06 | (주)휴먼드림 | 전립선 고주파 치료기 |
-
2003
- 2003-08-08 JP JP2003289534A patent/JP4097580B2/ja not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10342989B2 (en) | 2013-09-20 | 2019-07-09 | Dai-Ichi High Frequency Co., Ltd. | Magnetic flux irradiation devices and components |
US10576297B2 (en) | 2013-09-20 | 2020-03-03 | Dai-Ichi High Frequency Co., Ltd. | Magnetic flux irradiation devices and components |
US10500409B2 (en) | 2015-03-02 | 2019-12-10 | KAIO Therapy, LLC | Systems and methods for providing alternating magnetic field therapy |
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Publication number | Publication date |
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JP2005058298A (ja) | 2005-03-10 |
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