JP4082619B2 - 光反応性薄膜加工法並びに光反応性薄膜加工装置 - Google Patents
光反応性薄膜加工法並びに光反応性薄膜加工装置 Download PDFInfo
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- JP4082619B2 JP4082619B2 JP2005089637A JP2005089637A JP4082619B2 JP 4082619 B2 JP4082619 B2 JP 4082619B2 JP 2005089637 A JP2005089637 A JP 2005089637A JP 2005089637 A JP2005089637 A JP 2005089637A JP 4082619 B2 JP4082619 B2 JP 4082619B2
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- 239000010409 thin film Substances 0.000 title claims description 155
- 238000003672 processing method Methods 0.000 title claims description 28
- 239000000523 sample Substances 0.000 claims description 84
- 230000010287 polarization Effects 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 35
- 230000005672 electromagnetic field Effects 0.000 claims description 32
- 239000011521 glass Substances 0.000 claims description 25
- 230000003287 optical effect Effects 0.000 claims description 24
- 230000000704 physical effect Effects 0.000 claims description 15
- 238000003754 machining Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 238000011065 in-situ storage Methods 0.000 claims description 5
- 230000002452 interceptive effect Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 claims 1
- 230000001276 controlling effect Effects 0.000 description 10
- 230000007246 mechanism Effects 0.000 description 9
- 239000000987 azo dye Substances 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 3
- 230000005641 tunneling Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- IQFVPQOLBLOTPF-HKXUKFGYSA-L congo red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(/N=N/C3=CC=C(C=C3)C3=CC=C(C=C3)/N=N/C3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-HKXUKFGYSA-L 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005089637A JP4082619B2 (ja) | 2004-03-27 | 2005-03-25 | 光反応性薄膜加工法並びに光反応性薄膜加工装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004127363 | 2004-03-27 | ||
| JP2005089637A JP4082619B2 (ja) | 2004-03-27 | 2005-03-25 | 光反応性薄膜加工法並びに光反応性薄膜加工装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005313315A JP2005313315A (ja) | 2005-11-10 |
| JP2005313315A5 JP2005313315A5 (enExample) | 2007-08-16 |
| JP4082619B2 true JP4082619B2 (ja) | 2008-04-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005089637A Expired - Fee Related JP4082619B2 (ja) | 2004-03-27 | 2005-03-25 | 光反応性薄膜加工法並びに光反応性薄膜加工装置 |
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| JP (1) | JP4082619B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007322497A (ja) * | 2006-05-30 | 2007-12-13 | Olympus Corp | 光学系、ホログラフィックメモリー、ホログラフィック記録媒体 |
| CN117990653A (zh) * | 2024-02-04 | 2024-05-07 | 安徽大学 | 一种基于倏逝波的金纳米颗粒聚集动力检测系统及方法 |
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2005
- 2005-03-25 JP JP2005089637A patent/JP4082619B2/ja not_active Expired - Fee Related
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| Publication number | Publication date |
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| JP2005313315A (ja) | 2005-11-10 |
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