JP4074426B2 - Semiconductor module manufacturing method - Google Patents

Semiconductor module manufacturing method Download PDF

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Publication number
JP4074426B2
JP4074426B2 JP2000204985A JP2000204985A JP4074426B2 JP 4074426 B2 JP4074426 B2 JP 4074426B2 JP 2000204985 A JP2000204985 A JP 2000204985A JP 2000204985 A JP2000204985 A JP 2000204985A JP 4074426 B2 JP4074426 B2 JP 4074426B2
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Prior art keywords
wire
bonding
semiconductor chip
cut
semiconductor module
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JP2002026058A (en
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浩一 鶴迫
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
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    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
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Description

【0001】
【発明の属する技術分野】
本発明は、半導体モジュールの製造におけるウェッジワイヤボンドに関する。
【0002】
【従来の技術】
半導体モジュールの製造では、半導体モジュールケースのケース電極と、ケース内の基板上に載置された半導体チップのボンディングパッドとを電気的に接続するのに、一般的に導電ワイヤ(例えば、アルミワイヤ)の超音波接合等によるボンディングが行われていた。図7は、半導体チップ82と、ケース電極84とがワイヤ86により電気的に接続された半導体モジュール100を示す。ボンディングは、ボンディング部70のワイヤガイド74がワイヤ86を供給し、所望の位置において、ウェッジボンドツール76がワイヤ86を超音波接合等によって固定することにより行われる。図7に示す半導体チップ82とケース電極との電気的接続は、以下のようにして得られる。まず最初に半導体チップ82上のボンディングパッドの位置Eに、ウェッジボンドツール76がワイヤ86をボンディングする(ファーストボンディング)。続いてボンディング部70は、ワイヤガイド74からワイヤ86を供給しながらケース電極84上に移動し、ケース電極84の位置Fでウェッジボンドツール76がワイヤ86をボンディングする(セカンドボンディング)。その後ボンディング部70は、不要なワイヤ(残余ワイヤ)を切断するためワイヤの供給方向(図面右方向)に移動する。これは、カッター78がウェッジボンドツール76の左側に位置しているため、そのままではカッター78が残余ワイヤを切断できないからである。この動作は「シフトバック」と呼ばれる。ボンディング70が移動した結果、残余ワイヤがカッター78で切断され、1ボンディング動作が終了する。
【0003】
ボンディング部70は、その構造上、基板に平行な水平方向に所定の幅を有する。したがって、ボンディング部70がシフトバックするためには、セカンドボンディング位置Fからケース内壁88までの距離L(シフトバックスペースL)が、少なくともボンディング部70の幅以上の大きさを備える必要がある。シフトバックスペースLは、例えば約10mmであった。このように、従来、半導体チップ82上のボンディングパッドにファーストボンディングを行い、その後ケース電極84にセカンドボンディングを行う際には、比較的大きなシフトバックスペースが必要となり、半導体モジュールケースの小型化を妨げていた。
【0004】
このシフトバックスペースLを削減するために、ファーストボンディングをケース電極84上の位置Fで行い、セカンドボンディングを半導体チップ82上の位置Eで行う方法がある。この方法に用いられるボンディング部は、図7のボンディング部70と対称に構成される。すなわちワイヤ86は、ケース電極84から半導体チップ82の方向(図面左方向)に供給する必要があるので、ワイヤガイド74およびクランパ72はウェッジボンドツール76の左側に位置し、カッター78は右側に位置する。ファーストボンディングではシフトバックが不要であることを考慮すると、このようなボンディング部によれば、距離Lは、ウェッジボンドツール76およびカッター78の幅相当の長さ(例えば、約3mm)確保されていればよいことになり、半導体モジュールの小型化が実現できる。
【0005】
【発明が解決しようとする課題】
ファーストボンディングをケース電極84上の位置Fで行い、セカンドボンディングを半導体チップ82上の位置Eで行う方法では、セカンドボンディング後にワイヤをカットする必要がある。このワイヤカットは半導体チップ82上で行われることになるため、半導体チップ82はワイヤカット直後にカッター78から衝撃を受け、その結果表面にはカッター傷、ワイヤ押さえ傷等の傷が残される。このような傷は半導体チップ82の特性に悪影響を与えるおそれが大きく、その半導体モジュールが組み込まれる装置、例えばパワーモジュールの性能をも左右することになる。
【0006】
本発明の目的は、ファーストボンディングをケース電極上で行い、セカンドボンディングを半導体チップで行う際に、半導体チップに衝撃、傷等を与えることなくワイヤボンディングを実現する半導体モジュール製造方法を提供することである。
【0007】
【課題を解決するための手段】
本発明の半導体モジュール製造方法は、半導体チップとケースのケース電極とがボンディングされたワイヤにより電気的に接続されている半導体モジュールの製造方法であって、前記ケース電極にワイヤをファーストボンディングするステップと、前記ファーストボンディングするステップに続いて、前記半導体チップに前記ワイヤをセカンドボンディングするステップと、前記ケース電極と前記半導体チップとの間のワイヤ以外の残余ワイヤをカッターにより前記半導体チップ近傍の空中でハーフカットするステップと、ハーフカットされた前記ワイヤをクランパにより固定した上で引きちぎるステップとを含む半導体モジュール製造方法であり、これにより上記目的が達成される。
【0008】
前記ワイヤを引きちぎる前記ステップは、ハーフカットされた前記ワイヤを水平方向または斜め上方に引きちぎることにより行われてもよい。
【0009】
前記ワイヤを引きちぎる前記ステップは、前記セカンドボンディングの後新たに次のファーストボンディングを行う際に、前記残余ワイヤを前記次のファーストボンディングするステップを行う位置の方向に引くことにより行われてもよい。
【0012】
【発明の実施の形態】
以下、添付の図面を参照して、本発明の実施の形態を説明する。
【0013】
図1は、本発明による半導体モジュール製造工程により製造された半導体モジュール10を示す。半導体モジュール10では、半導体チップ12とケースのケース電極14とがボンディングされたワイヤ16により電気的に接続されている。なお、半導体モジュール10には、すでに半導体チップ12を載置する基板が設けられ、その上に半導体チップ12が設けられているとする。また、ワイヤ16は半導体チップ12上に設けられたボンディングパッド(図示せず)にボンディングされるとする。半導体モジュール10は、最初のボンディング(ファーストボンディング)をケース電極14上の位置Aで行い、2回目のボンディング(セカンドボンディング)を半導体チップ12で行う。その結果、位置Aからケース内壁(または端子)18までの距離dが、例えば約3mmにできる。したがって、ファーストボンディングを半導体チップ12上で、セカンドボンディングをケース電極14上で行う場合の距離dが例えば約10mmであるのと比較して、半導体モジュール10の大幅な小型化が実現される。
【0014】
本発明の主要な特徴は、セカンドボンディング後のワイヤカットを半導体チップ12に接触して行うのではなく、その近傍の空中において行うことである。具体的には、ワイヤカットは、まず半導体チップ12およびケース電極14間のワイヤ16以外の残余ワイヤのほぼ半分をカッター(図5のカッター28)により切断する(残余ワイヤをハーフカットする)。その後クランパ(図6のクランパ22)でワイヤを固定した上でボンディング部(図6のボンディング部20)のワイヤ供給方向側の水平または斜め上方への移動により引っ張り、そのハーフカットされた部分において残余ワイヤを引きちぎる。また、別のワイヤカットの例は、半導体チップ12近傍の空中において、残余ワイヤをボンディング部に設けられたはさみで切断する。このように残余ワイヤをカットすることで、半導体チップ12に衝撃および傷を与えることなく、残余ワイヤを切断できる。
【0015】
図2は、ファーストボンディングを行うボンディング部20を示す。ボンディング部20は、クランパ22と、ワイヤガイド24と、ウェッジボンドツール26と、カッター28とを含む。ワイヤガイド24は、例えばアルミワイヤ等の導電性のワイヤ16を供給する。クランパ22は、必要に応じてワイヤガイド24により供給される導電ワイヤ16を固定する。ウェッジボンドツール26は、ワイヤガイド24により供給されたワイヤ16を超音波接合等により所望の部位に固定する。カッター28は、不要となった部分のワイヤ16を切断する際に使用される。図2では、ウェッジボンドツール26は、ワイヤガイド24から供給されたワイヤ16を、ケース電極14上の位置Aにおいてファーストボンディングする例が示されている。
【0016】
本実施の形態では、ファーストボンディングをケース電極14上の位置Aで行い、セカンドボンディングをケース電極14の図面左方向の半導体チップ12(図1)で行う。したがって、ワイヤ16を図面左方向に提供する必要上、クランパ22およびワイヤガイド24がウェッジボンドツール26の左側に、カッター28は右側に位置する。このようなボンディング部20でファーストボンディングを行うので、ケース電極14上の位置Aからケース内壁18までの距離は、実質的にウェッジボンドツール26およびカッター28の幅相当の長さ(例えば、約3mm)確保されていればよい。
【0017】
図3は、ケース電極14へワイヤ16をボンディングした後のボンディング部20を示す。ケース電極14へワイヤ16をボンディングした後、ボンディング部20は、ワイヤガイド24からワイヤ16を供給しながら、例えば上方に移動する。単に基板に垂直な上方向(図面上方向)への移動なので、ケース電極14のボンディング位置Aからケース内壁18までの距離dは、ボンディング時に確保されていた距離d(図2)である。なお、この移動は特に図面上方向に限らず、例えば図面の左上方向から左方向であってもよい。
【0018】
図4は、セカンドボンディングを行うボンディング部20を示す。ボンディング部20は、図3に示す位置から、半導体チップ12上の所望の位置B(例えば、半導体チップ12上の所望のボンディングパッドの位置)までワイヤガイド24からワイヤ16を供給しながら移動し、ウェッジボンドツール26が、その位置Bでワイヤ16をセカンドボンディングする。ファーストボンディングと同様、セカンドボンディングもワイヤ16を超音波接合等で固定することにより行われる。以上のようにして、ファーストボンディングおよびセカンドボンディングまでの工程が終了する。
【0019】
図5は、セカンドボンディング後の、ワイヤハーフカットを行うボンディング部20を示す。セカンドボンディング終了後は、ケース電極14(図4)と半導体チップ12間のワイヤのみを残すために、ワイヤ16を切断する必要がある。しかしボンディング部20では、カッター78がウェッジボンドツール76の右側に位置しているため、そのままではカッター28がワイヤ16を切断できない。そこでボンディング部20は、ワイヤガイド24から再びワイヤ56を供給しながら、ワイヤ供給方向側の水平または斜め上方(図面左方向または左上方向)に移動する。このワイヤ56は、ケース電極14(図4)と半導体チップ12間のワイヤ以外の不要なワイヤであり、本明細書では「残余ワイヤ」と呼ぶ。ボンディング部20は、ワイヤガイド24のワイヤ供給口と位置Bとの間にカッター28が動作できる程度の間隔が空くまで移動する。図5からも明らかなように、ワイヤ供給口は半導体チップ12上には存在しないので、位置Bからワイヤ供給口に至るまでの残余ワイヤ56は、半導体チップ12近傍の空中を横切る。ボンディング部20の移動後、残余ワイヤ56の供給が止められ、カッター28は下方向へ移動して、半導体チップ12近傍の空中の位置Cで残余ワイヤ56をハーフカットする。この「ハーフカット」とは、ワイヤを完全に切断する(フルカットする)のではなく、その途中、例えば残余ワイヤ56のほぼ中心まで残余ワイヤ56を切断することをいう。ハーフカットは、図6を参照して説明するように、残余ワイヤ56を位置Cで引きちぎりを容易にするために切り込みを入れ、かつ引きちぎられる個所を細線化する意義がある。半導体チップ12近傍の空中でハーフカットを行うことにより、半導体チップ12にはまったく傷がつかないことに加え、ボンディング位置Bからの余分なワイヤの長さを十分短くできる。
【0020】
図6は、ワイヤハーフカット後、残余ワイヤ56を引きちぎった状態を示す。ハーフカットの終了後、ワイヤガイド24はワイヤの供給を止め、クランパ22はワイヤを固定する。その後ボンディング部20は、図面左方向、すなわちチップと平行な方向、または斜め上(図面左上)方向へ移動する。ワイヤの供給がなく、かつ残余ワイヤ56(図5)が位置B(図5)でボンディングされているので、残余ワイヤ56(図5)は引っ張られ、ハーフカットされた位置Cで残余ワイヤ56−1および56−2にちぎられる。この残余ワイヤ56−2は位置Bに接続されており、十分短いことが好ましい。上述したボンディング部20の移動により、ウェッジボンドツール26のワイヤに近い先端と、残余ワイヤ56(図5)とが位置Dで接触することがある。この場合もボンディング部20が半導体チップ12(図5)と平行な水平方向、または斜め上方向(図面左上方向)へ移動すればよい。水平方向(図面左方向)へさらに移動することにより、位置B(図5)と位置Dとの間で残余ワイヤ56(図5)は引っ張られ、位置Cにおいてちぎられる。
【0021】
なおボンディング部20の移動方向は、上述したチップと平行な方向、または斜め上方向に限られず、いずれの方向でもよい。例えば、製造プロセスにおいてしばしば見られるような、複数のケース電極14(図4)と1つ以上の半導体チップ12とをワイヤで接続するために、ファーストボンディング、セカンドボンディング、ハーフカット、引きちぎり動作を複数回繰り返す場合を考える。このような場合には、ハーフカット後に、次に行うべきファーストボンディングの位置にボンディング部20を移動させると、引きちぎり動作と同時に次のファーストボンディングをすぐに実行でき、また一連の工程をスムーズに進行できる。よって半導体モジュールを効率よく製造できる。
【0022】
これまでの説明では、半導体チップ12に傷をつけないようにするために、空中でのハーフカット動作および引きちぎり動作を採用した。しかし、これら以外の動作によっても、半導体チップ12に傷をつけないようにできる。例えば、図5において、カッター28に代えてはさみ(図示せず)を設け、半導体チップ近傍の空中で残余ワイヤ56を切断させる動作である。はさみであれば、半導体チップ12に傷をつけることなく、しかもハーフカット動作および引きちぎり動作の2工程を経ずに1工程で済むため、高速かつ簡単に半導体モジュールを製造できる。はさみは、二枚の刃ではさんでワイヤを切断するものであれば、どのような形状であってもよい。
【0023】
【発明の効果】
以上説明した工程からなる方法によれば、ケース電極上の位置でファーストボンディングし、半導体チップ上の位置でセカンドボンディングする際、残余ワイヤをカッターにより半導体チップ近傍の空中でハーフカットし、さらにその部分で残余ワイヤをクランパにより固定した上で引きちぎる。これにより、シフトバックスペースを除去した、小型で、かつ半導体チップの表面にワイヤカット傷のない半導体モジュールを製造できる。
【0024】
また、ハーフカットが半導体チップ近傍の空中で行われるため、半導体チップ上のボンディング位置から引きちぎり位置までのワイヤの長さを十分短くできる。
【0025】
ワイヤを引きちぎる方向を次のファーストボンディングするステップを行う位置の方向にすれば、引きちぎり動作と同時に次のファーストボンディングをすぐに実行でき、一連の工程をスムーズに進行できる。よって半導体モジュールを効率よく製造できる。
【図面の簡単な説明】
【図1】 本発明による半導体モジュール製造工程により製造された半導体モジュールを示す。
【図2】 ファーストボンディングを行うボンディング部を示す。
【図3】 ケース電極へワイヤをボンディングした後のボンディング部を示す。
【図4】 セカンドボンディングを行うボンディング部を示す。
【図5】 セカンドボンディング後の、ワイヤハーフカットを行うボンディング部を示す。
【図6】 ワイヤハーフカット後、残余ワイヤ56を引きちぎった状態を示す。
【図7】 半導体チップとケース電極とがワイヤにより電気的に接続された半導体モジュールを示す。
【符号の説明】
12 半導体チップ、16 ワイヤ、20 ボンディング部、24 ワイヤガイド、26 ウェッジボンドツール、28 カッター、56 残余ワイヤ
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to wedge wire bonds in the manufacture of semiconductor modules.
[0002]
[Prior art]
In the manufacture of a semiconductor module, a conductive wire (eg, an aluminum wire) is generally used to electrically connect a case electrode of a semiconductor module case and a bonding pad of a semiconductor chip placed on a substrate in the case. Bonding by ultrasonic bonding or the like has been performed. FIG. 7 shows a semiconductor module 100 in which a semiconductor chip 82 and a case electrode 84 are electrically connected by a wire 86. Bonding is performed by the wire guide 74 of the bonding unit 70 supplying the wire 86 and the wedge bond tool 76 fixing the wire 86 by ultrasonic bonding or the like at a desired position. The electrical connection between the semiconductor chip 82 and the case electrode shown in FIG. 7 is obtained as follows. First, the wedge bond tool 76 bonds the wire 86 to the position E of the bonding pad on the semiconductor chip 82 (first bonding). Subsequently, the bonding unit 70 moves onto the case electrode 84 while supplying the wire 86 from the wire guide 74, and the wedge bond tool 76 bonds the wire 86 at the position F of the case electrode 84 (second bonding). Thereafter, the bonding unit 70 moves in the wire supply direction (right direction in the drawing) in order to cut unnecessary wires (remaining wires). This is because the cutter 78 is positioned on the left side of the wedge bond tool 76, so that the cutter 78 cannot cut the remaining wire as it is. This operation is called “shift back”. As a result of the movement of the bonding 70, the remaining wire is cut by the cutter 78, and one bonding operation is completed.
[0003]
The bonding portion 70 has a predetermined width in the horizontal direction parallel to the substrate due to its structure. Therefore, in order for the bonding part 70 to shift back, the distance L (shift back space L) from the second bonding position F to the case inner wall 88 needs to be at least as large as the width of the bonding part 70. The shift back space L was about 10 mm, for example. Thus, conventionally, when first bonding is performed on the bonding pad on the semiconductor chip 82 and then second bonding is performed on the case electrode 84, a relatively large shift back space is required, which hinders miniaturization of the semiconductor module case. It was.
[0004]
In order to reduce the shift back space L, there is a method in which the first bonding is performed at the position F on the case electrode 84 and the second bonding is performed at the position E on the semiconductor chip 82. The bonding part used in this method is configured symmetrically with the bonding part 70 of FIG. That is, since the wire 86 needs to be supplied from the case electrode 84 in the direction of the semiconductor chip 82 (left direction in the drawing), the wire guide 74 and the clamper 72 are located on the left side of the wedge bond tool 76 and the cutter 78 is located on the right side. To do. Considering that shift back is unnecessary in the first bonding, according to such a bonding portion, the distance L is secured to a length (for example, about 3 mm) corresponding to the width of the wedge bond tool 76 and the cutter 78. Therefore, the semiconductor module can be downsized.
[0005]
[Problems to be solved by the invention]
In the method in which the first bonding is performed at the position F on the case electrode 84 and the second bonding is performed at the position E on the semiconductor chip 82, it is necessary to cut the wire after the second bonding. Since this wire cutting is performed on the semiconductor chip 82, the semiconductor chip 82 receives an impact from the cutter 78 immediately after the wire cutting, and as a result, scratches such as cutter scratches and wire pressing scratches remain on the surface. Such a flaw has a large possibility of adversely affecting the characteristics of the semiconductor chip 82, and also affects the performance of a device in which the semiconductor module is incorporated, for example, a power module.
[0006]
An object of the present invention is to provide a semiconductor module manufacturing method that realizes wire bonding without giving impact, scratches, etc. to a semiconductor chip when first bonding is performed on a case electrode and second bonding is performed on a semiconductor chip. is there.
[0007]
[Means for Solving the Problems]
The semiconductor module manufacturing method of the present invention is a method of manufacturing a semiconductor module in which a semiconductor chip and a case electrode of a case are electrically connected by a bonded wire, the step of first bonding the wire to the case electrode; Subsequently to the first bonding step, the step of second bonding the wire to the semiconductor chip, and the remaining wire other than the wire between the case electrode and the semiconductor chip are half- cut in the air near the semiconductor chip by a cutter. A semiconductor module manufacturing method including a step of cutting, and a step of fixing the half-cut wire with a clamper and then tearing the wire, whereby the above object is achieved.
[0008]
The step of tearing the wire may be performed by tearing the half-cut wire horizontally or diagonally upward.
[0009]
The step of tearing the wire may be performed by pulling the remaining wire in the direction of the position where the next first bonding step is performed when the next first bonding is newly performed after the second bonding.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the accompanying drawings.
[0013]
FIG. 1 shows a semiconductor module 10 manufactured by a semiconductor module manufacturing process according to the present invention. In the semiconductor module 10, the semiconductor chip 12 and the case electrode 14 of the case are electrically connected by a bonded wire 16. It is assumed that the semiconductor module 10 is already provided with a substrate on which the semiconductor chip 12 is placed, and the semiconductor chip 12 is provided thereon. The wire 16 is bonded to a bonding pad (not shown) provided on the semiconductor chip 12. The semiconductor module 10 performs the first bonding (first bonding) at the position A on the case electrode 14 and performs the second bonding (second bonding) with the semiconductor chip 12. As a result, the distance d from the position A to the case inner wall (or terminal) 18 can be set to about 3 mm, for example. Therefore, the semiconductor module 10 can be significantly reduced in size compared to the distance d when the first bonding is performed on the semiconductor chip 12 and the second bonding is performed on the case electrode 14, for example, about 10 mm.
[0014]
The main feature of the present invention is that the wire cutting after the second bonding is not performed in contact with the semiconductor chip 12 but in the air in the vicinity thereof. Specifically, in the wire cutting, first, almost half of the remaining wire other than the wire 16 between the semiconductor chip 12 and the case electrode 14 is cut by a cutter (cutter 28 in FIG. 5) (the remaining wire is half-cut). Thereafter, the wire is fixed by a clamper (clamper 22 in FIG. 6) and then pulled by moving the bonding part (bonding part 20 in FIG. 6) horizontally or obliquely upward in the wire supply direction side, and the remaining part is left in the half-cut portion. Tear the wire. In another example of wire cutting, the remaining wires are cut with scissors provided in the bonding portion in the air near the semiconductor chip 12. By cutting the remaining wire in this way, the remaining wire can be cut without giving an impact and a scratch to the semiconductor chip 12.
[0015]
FIG. 2 shows the bonding unit 20 that performs first bonding. The bonding unit 20 includes a clamper 22, a wire guide 24, a wedge bond tool 26, and a cutter 28. The wire guide 24 supplies a conductive wire 16 such as an aluminum wire. The clamper 22 fixes the conductive wire 16 supplied by the wire guide 24 as necessary. The wedge bond tool 26 fixes the wire 16 supplied by the wire guide 24 to a desired site by ultrasonic bonding or the like. The cutter 28 is used when cutting the wire 16 in a portion that is no longer needed. FIG. 2 shows an example in which the wedge bond tool 26 first bonds the wire 16 supplied from the wire guide 24 at the position A on the case electrode 14.
[0016]
In the present embodiment, the first bonding is performed at the position A on the case electrode 14 and the second bonding is performed on the semiconductor chip 12 (FIG. 1) on the left side of the case electrode 14 in the drawing. Therefore, the clamper 22 and the wire guide 24 are located on the left side of the wedge bond tool 26 and the cutter 28 is located on the right side in order to provide the wire 16 in the left direction of the drawing. Since the first bonding is performed by such a bonding portion 20, the distance from the position A on the case electrode 14 to the case inner wall 18 is substantially a length corresponding to the width of the wedge bond tool 26 and the cutter 28 (for example, about 3 mm). ) As long as it is secured.
[0017]
FIG. 3 shows the bonding portion 20 after the wire 16 is bonded to the case electrode 14. After bonding the wire 16 to the case electrode 14, the bonding unit 20 moves, for example, upward while supplying the wire 16 from the wire guide 24. The distance d from the bonding position A of the case electrode 14 to the case inner wall 18 is simply the distance d (FIG. 2) ensured at the time of bonding because the movement is simply upward (vertical in the drawing) perpendicular to the substrate. Note that this movement is not limited to the upward direction in the drawing, and may be from the upper left direction to the left direction in the drawing, for example.
[0018]
FIG. 4 shows the bonding unit 20 that performs second bonding. The bonding unit 20 moves from the position shown in FIG. 3 to a desired position B on the semiconductor chip 12 (for example, a desired bonding pad position on the semiconductor chip 12) while supplying the wire 16 from the wire guide 24, The wedge bond tool 26 second bonds the wire 16 at the position B. Similar to the first bonding, the second bonding is performed by fixing the wire 16 by ultrasonic bonding or the like. As described above, the processes up to the first bonding and the second bonding are completed.
[0019]
FIG. 5 shows the bonding part 20 that performs wire half-cut after the second bonding. After the second bonding is completed, it is necessary to cut the wire 16 in order to leave only the wire between the case electrode 14 (FIG. 4) and the semiconductor chip 12. However, since the cutter 78 is located on the right side of the wedge bond tool 76 in the bonding unit 20, the cutter 28 cannot cut the wire 16 as it is. Accordingly, the bonding unit 20 moves horizontally or obliquely upward (left or upper left in the drawing) on the wire supply direction side while supplying the wire 56 from the wire guide 24 again. The wire 56 is an unnecessary wire other than the wire between the case electrode 14 (FIG. 4) and the semiconductor chip 12, and is referred to as “residual wire” in this specification. The bonding unit 20 moves until there is an interval that allows the cutter 28 to operate between the wire supply port of the wire guide 24 and the position B. As apparent from FIG. 5, since the wire supply port does not exist on the semiconductor chip 12, the remaining wire 56 from the position B to the wire supply port crosses the air in the vicinity of the semiconductor chip 12. After the bonding unit 20 is moved, the supply of the remaining wire 56 is stopped, and the cutter 28 moves downward to half-cut the remaining wire 56 at a position C in the air near the semiconductor chip 12. This “half cut” does not completely cut (full cut) the wire but cuts the remaining wire 56 to the middle of the remaining wire 56, for example. As will be described with reference to FIG. 6, the half cut has a significance of making a cut in order to make the residual wire 56 easy to tear at the position C and thinning a portion to be torn. By performing half-cutting in the air near the semiconductor chip 12, the semiconductor chip 12 is not damaged at all, and the length of the extra wire from the bonding position B can be sufficiently shortened.
[0020]
FIG. 6 shows a state in which the remaining wire 56 is torn after the wire half cut. After the half cut is completed, the wire guide 24 stops supplying the wire, and the clamper 22 fixes the wire. Thereafter, the bonding unit 20 moves in the left direction of the drawing, that is, in a direction parallel to the chip, or in a diagonally upward (upper left side of the drawing) direction. Since there is no supply of wire and the remaining wire 56 (FIG. 5) is bonded at the position B (FIG. 5), the remaining wire 56 (FIG. 5) is pulled, and the remaining wire 56− at the half-cut position C−. 1 and 56-2. The remaining wire 56-2 is connected to the position B and is preferably sufficiently short. Due to the movement of the bonding part 20 described above, the tip of the wedge bond tool 26 close to the wire and the remaining wire 56 (FIG. 5) may come into contact with each other at the position D. Also in this case, the bonding part 20 may be moved in a horizontal direction parallel to the semiconductor chip 12 (FIG. 5) or in an obliquely upward direction (upper left direction in the drawing). By further moving in the horizontal direction (left direction in the drawing), the remaining wire 56 (FIG. 5) is pulled between the position B (FIG. 5) and the position D and broken at the position C.
[0021]
The moving direction of the bonding unit 20 is not limited to the direction parallel to the above-described chip or the obliquely upward direction, and may be any direction. For example, in order to connect a plurality of case electrodes 14 (FIG. 4) and one or more semiconductor chips 12 with wires as often seen in a manufacturing process, first bonding, second bonding, half-cutting, and tearing operations are performed. Consider the case of repeating multiple times. In such a case, after the half cut, if the bonding unit 20 is moved to the position of the first bonding to be performed next, the next first bonding can be performed immediately at the same time as the tearing operation, and the series of processes can be performed smoothly. Can progress. Therefore, a semiconductor module can be manufactured efficiently.
[0022]
In the description so far, the half-cut operation and the tearing operation in the air have been adopted so as not to damage the semiconductor chip 12. However, it is possible to prevent the semiconductor chip 12 from being damaged by other operations. For example, in FIG. 5, scissors (not shown) are provided in place of the cutter 28, and the remaining wire 56 is cut in the air near the semiconductor chip. If the scissors are used, the semiconductor chip 12 can be manufactured at high speed and easily because the semiconductor chip 12 is not damaged and the two steps of the half-cut operation and the tearing operation are not required. The scissors may have any shape as long as the wire is cut between two blades.
[0023]
【The invention's effect】
According to the method comprising the steps described above, when first bonding is performed at the position on the case electrode and second bonding is performed at the position on the semiconductor chip, the remaining wire is half-cut in the air near the semiconductor chip by a cutter , After fixing the remaining wire with a clamper, tear it off. As a result, it is possible to manufacture a semiconductor module that is small and has no wire-cut scratches on the surface of the semiconductor chip, with the shift back space removed.
[0024]
Further, since the half cut is performed in the air in the vicinity of the semiconductor chip, the length of the wire from the bonding position on the semiconductor chip to the tearing position can be sufficiently shortened.
[0025]
If the direction tearing away the wires in the direction of the position where the step of the next first bonding, tear operation at the same time can do the following first bonding immediately can proceed a series of steps smoothly. Therefore, a semiconductor module can be manufactured efficiently.
[Brief description of the drawings]
FIG. 1 shows a semiconductor module manufactured by a semiconductor module manufacturing process according to the present invention.
FIG. 2 shows a bonding part that performs first bonding.
FIG. 3 shows a bonding portion after a wire is bonded to a case electrode.
FIG. 4 shows a bonding part for performing second bonding.
FIG. 5 shows a bonding part that performs wire half-cut after second bonding.
FIG. 6 shows a state where the remaining wire 56 is torn after the wire half cut.
FIG. 7 shows a semiconductor module in which a semiconductor chip and a case electrode are electrically connected by a wire.
[Explanation of symbols]
12 Semiconductor chip, 16 wires, 20 Bonding part, 24 Wire guide, 26 Wedge bond tool, 28 Cutter, 56 Residual wire

Claims (3)

半導体チップとケースのケース電極とがボンディングされたワイヤにより電気的に接続されている半導体モジュールの製造方法であって、
前記ケース電極にワイヤをファーストボンディングするステップと、
前記ファーストボンディングするステップに続いて、前記半導体チップに前記ワイヤをセカンドボンディングするステップと、
前記ケース電極と前記半導体チップとの間のワイヤ以外の残余ワイヤを、カッターにより前記半導体チップ近傍の空中でハーフカットするステップと、
ハーフカットされた前記ワイヤを、クランパにより固定した上で引きちぎるステップとを含む半導体モジュール製造方法。
A semiconductor module manufacturing method in which a semiconductor chip and a case electrode of a case are electrically connected by a bonded wire,
First bonding a wire to the case electrode;
Following the first bonding step, second bonding the wire to the semiconductor chip;
The remaining wire other than the wire between the case electrode and the semiconductor chip is half-cut in the air near the semiconductor chip by a cutter , and
A method of manufacturing a semiconductor module , comprising: fixing the half-cut wire by a clamper and then tearing the wire.
前記ワイヤを引きちぎる前記ステップは、ハーフカットされた前記ワイヤを水平方向または斜め上方に引きちぎるステップである、請求項1に記載の半導体モジュール製造方法。 The method of manufacturing a semiconductor module according to claim 1, wherein the step of tearing the wire is a step of tearing the half-cut wire in a horizontal direction or obliquely upward. 前記ワイヤを引きちぎる前記ステップは、前記セカンドボンディングの後新たに次のファーストボンディングを行う際に、前記残余ワイヤを前記次のファーストボンディングするステップを行う位置の方向に引くことにより行われる、請求項に記載の半導体モジュール製造方法。Wherein the step of tearing off the wire, when performing new next first bonding after said second bonding is performed by subtracting the residual wire in the direction of the position where the step of the next first bonding claim 1 A method for producing a semiconductor module according to claim 1.
JP2000204985A 2000-07-06 2000-07-06 Semiconductor module manufacturing method Expired - Lifetime JP4074426B2 (en)

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