JP4057697B2 - Color filter substrate and liquid crystal display device using the same - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a color filter. In particular, the present invention is used for a liquid crystal display surface of a liquid crystal display device, and when any color filter is applied on an upper side of a lower formation element, it is not affected by the lower formation element. Further, the present invention relates to a color filter in which each shape of the outermost black matrix constituting the management mark and the filter forming portion is improved.
[0002]
[Prior art]
Generally, a color filter used for a liquid crystal display surface of a liquid crystal display device is configured by sequentially applying a black matrix material or a color filter material to a color filter substrate, and when applying the color filter material sequentially, When a uniform coating film cannot be formed and an undesirable stripe or uneven thickness occurs in the coating film, when this color filter is used in a liquid crystal display device, a display image on the liquid crystal display surface is deteriorated.
[0003]
By the way, this kind of known color filter uses a black matrix material to form a black pattern composed of a shading part for separating each pixel and a management mark such as an alignment mark, and a red filter material and a green filter material. A filter pattern composed of a red filter, a green filter, and a blue filter is formed using a blue filter material, and a protective film pattern is formed using a protective material. The order of formation of these patterns is that the black pattern by the black matrix material is the first, and the filter pattern by the red filter material, the green filter material, and the blue filter material is successively used by using the black pattern obtained at this time. In general, the protective film pattern is formed lastly.
[0004]
In addition, this type of known color filter uses a photolithography means when forming each pattern. In this photolithography means, in order to form each pattern, a coating film is first formed over the entire surface, and then the coating film is patterned to obtain a predetermined pattern. When formed, the coating film is naturally affected by the underlayer. That is, if the coating film over the entire surface is a layer (first layer) formed first, the underlying layer is a color filter substrate (glass substrate), but the layer over which the entire coating film is formed (second layer). Layer), the underlying layer has a pattern of the first layer. Similarly, if the coating film over the entire surface is the third layer (third layer), the underlying layer is the second layer. Become a pattern.
[0005]
In this case, the pattern (black pattern) by the first layer in this kind of known color filter is regularly and independently formed with the light shielding portion that is regularly and continuously formed as described above. Since it consists of management marks and the like, it is difficult to form uniform color filter films over the entire surface during the filter pattern application process.
[0006]
As this kind of known color filter forming means, a photolithography means is often used when applying a filter pattern, and a spin coating means is often used in the filter pattern applying step by this photolithography means. This spin coating means is more susceptible to the shape of the underlayer than other means when forming the color filter, and in particular, the shape of the underlayer is irregular and seems to be formed independently. In particular, the influence of the shape of the underlayer is particularly great.
[0007]
Here, FIGS. 6A, 6B, and 6C are configuration diagrams showing various examples of management marks (alignment marks) used in this kind of known color filter.
[0008]
6A to 6C, 61 is a substantially cross-shaped management mark, 62 is a square-shaped management mark, 63 is a small square-shaped management mark, and 64 is a protection pattern.
[0009]
As shown in FIG. 6A, the substantially cross-shaped management mark 61 is formed by combining two rod-shaped portions into a cross shape, and each rod-shaped portion has a width of 100 μm or more. Yes. As shown in FIG. 6B, the square management mark 62 has a vertical width and a horizontal width of 1000 μm or more. Further, as shown in FIG. 6C, the small square management mark 63 has a configuration in which two bar-shaped protection patterns 64 are arranged in parallel on both sides in the lateral direction. It arrange | positions between the two rod-shaped protection patterns 64, and the width | variety of the protection pattern 64 has a dimension of 100 micrometers or more.
[0010]
[Problems to be solved by the invention]
By the way, this kind of known color filter is a small square alignment mark having a substantially cross-shaped alignment mark 61, a square alignment mark 62, and a protective pattern 64 as described above as a management mark (alignment mark). 63, and after forming the alignment marks 61, 62, 63, 64 having such a shape, when each color filter material is applied to the entire surface of the color filter substrate by spin coating means, each alignment mark 61, There is a problem that streaks and thickness unevenness starting from the corner portions 62 and 64 (so-called right-angle portions) are generated.
[0011]
At this time, the streak and the thickness unevenness are caused by a subtle partial film thickness difference of each color filter coating film based on the film thickness of the alignment marks 61, 62, 64 of the underlayer. After patterning the film, it will be observed in the same way, and when a color filter with such streaks and uneven thickness is used to assemble a liquid crystal display element, uneven display will occur on the liquid crystal display surface. It is observed as a display failure state.
[0012]
To deal with such streaks and unevenness of thickness, it can be solved to some extent by changing the process conditions such as adjusting the spin rotation speed in the spin coating means. Is accompanied by a change in characteristics such as pixel level difference and chromaticity, which causes another problem that it is very difficult to find optimum process conditions.
[0013]
However, in this type of known color filter, when chromium (Cr) is used as the black matrix material and the alignment marks 61, 62, and 64 of the underlayer and the light shielding portion are formed, the alignment marks 61 and 62 that become the underlayer are used. 64 and the light-shielding portion are extremely thin (0.1 to 0.2 μm), so that even if the color filter coating films are formed on the alignment marks 61, 62, 64, streaks and thickness unevenness occur. However, when chromium (Cr) is used as the black matrix material, not only the manufacturing cost increases, but also there are new problems such as a reflection component of incident light incident on the liquid crystal display surface degrading the image display quality. is doing.
[0014]
When designing the pattern of the color filter substrate, if management marks such as alignment marks are provided only on the outer periphery of the color filter forming portion, each color filter coating film starting from the management mark such as the alignment mark is used. The stripes and thickness unevenness do not reach the color filter forming portion and are not affected by the shape of the alignment marks 61, 62, 64 of the underlayer. Therefore, it is difficult to arbitrarily select the installation positions of the management marks such as the alignment marks 61, 62, and 64 on the color filter substrate, and a plurality of color filter substrates can be selected from one color filter substrate. When cutting out one color filter, each color filter is aligned. You need to install a management marks such as at sign 61, 62, 64 is there, but can not be selectively placed only on the outer periphery of the color filter formation section.
[0015]
The present invention solves these problems, and its purpose is to constitute the alignment mark (corresponding to the management mark, which will be referred to as the management mark in the following description) , the installation position, and each color. It is an object of the present invention to provide a color filter substrate and a liquid crystal display device using the color filter substrate capable of forming each color filter coating film which does not cause streak or thickness unevenness at all times regardless of the filter coating film coating means.
[0016]
[Means for Solving the Problems]
In order to achieve the above object, a color filter substrate according to the present invention has a matrix-shaped light-shielding portion and an alignment mark on a substrate, and a color filter is applied and formed on the substrate by spin coating. , alignment marks, together are formed on the outside of the matrix-shaped light shielding portions, comprising means each corner of the alignment mark is formed in an arc shape.
[0017]
According to the above means, each corner of the management mark formed on the color filter substrate and each corner of the outermost light-shielding portion are formed in an arc shape. When each color filter coating film is formed on the light-shielding part, no streak or thickness unevenness starting from each corner of the management mark and each corner of the outermost light-shielding part is produced, and in good condition A color filter having each color filter is obtained. When this color filter is used for a liquid crystal display surface, a liquid crystal display device in which display unevenness does not occur and display defects do not occur is obtained.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
In an embodiment of the present invention, the color filter substrate has a matrix-shaped light-shielding portion and an alignment mark on the substrate, and the color filter is applied and formed on the substrate by spin coating. , together they are formed on the outside of the matrix-shaped light shielding portion, in which each corner of the alignment mark is formed in an arc shape.
[0019]
In a preferred example of the embodiment of the present invention, the color filter has a matrix-shaped light shielding portion and a management mark formed of a black matrix material.
[0020]
In one embodiment of the present invention, the color filter is such that the management mark has a rod-shaped portion, the width of the rod-shaped portion is L, and the radius of curvature of the arc-shaped portion at the tip of the rod-shaped portion is R. It is configured to satisfy ≧ 100 μm and R ≧ L / 2.
[0021]
In another one of the embodiments of the present invention, the color filter has an overall management mark having a quadrangular shape, the width of the quadrangular shape is L, and the arc-shaped portion of each corner portion of the quadrangular shape. When the radius of curvature is R, L ≧ 1000 μm and R ≧ L / 20 are satisfied.
[0022]
In a specific usage example of the embodiment of the present invention, the color filter is used for a liquid crystal display surface of a liquid crystal display device.
[0023]
According to these embodiments of the present invention, each corner of the management mark installed on the color filter substrate and each corner of the outermost light shielding portion are formed in an arc shape. Therefore, the thickness of the outermost light shielding portion constituting the management mark and the filter forming portion is slightly thick, and even when some of the management marks are not located on the outer periphery of the filter forming portion, When each color filter coating film is formed on the management mark and on the outermost light-shielding portion, stripes and thickness irregularities starting from the corners of the management mark and the outermost light-shielding portion Thus, it is possible to obtain a color filter in a good state in which no streak or thickness unevenness occurs in each color filter.
[0024]
When such a color filter is used for the liquid crystal display surface, a liquid crystal display device that does not cause display unevenness and does not cause display defects can be obtained.
[0025]
【Example】
Embodiments of the present invention will be described below with reference to the drawings.
[0026]
FIG. 1 is a top view showing a configuration of an embodiment of a color filter according to the present invention.
[0027]
In FIG. 1, 1 is a color filter substrate, 2 is a filter forming portion, and 3 is a management mark.
[0028]
The color filter substrate 1 has a rectangular shape, and the four filter forming portions 2 regularly arranged on one surface thereof, and the total arranged so as to be adjacent to the four sides of each filter forming portion 2, respectively. Sixteen management marks 3 and three management marks 3 arranged at the upper end, the lower end, and the center of the color filter substrate 1 along the vertical center line are formed. . In this case, each of the management marks 3 arranged so as to be adjacent to the four sides of each filter forming unit 2 is used when the installation position of the exposure mask is determined when each color filter coating film is exposed with the exposure mask. The management marks 3 arranged along the vertical center line of the color filter substrate 1 are used when the color filter substrate 1 is cut to form individual color filters. It is.
[0029]
FIGS. 2A, 2B, and 2C are a configuration diagram showing various examples of the management mark 3 used in the embodiment of FIG. 1 and an enlarged configuration diagram of a round portion.
[0030]
2A to 2C, 3 ₁ is a substantially cross-shaped management mark, 3 ₂ is a square-shaped management mark, 3 ₃ is a small square-shaped management mark, 4 ₁ and 4 ₂ are bar-shaped. It is a protection pattern.
[0031]
Then, as illustrated in FIG. 2 (a), the management mark 3 ₁ substantially cross-shaped, which corresponds to the management marks 61 of generally cruciform shown in FIG. 6 (a), 2 present The rod-shaped portions are combined in a cross shape, the width L of each rod-shaped portion is 100 μm or more, and the curvature radius R of the arc-shaped portion at the tip of each rod-shaped portion is the width L of 100 μm. When R = L / 2 = 50 μm and the width L exceeds 100 μm, the radius of curvature R corresponding to the width L is formed from the relationship of R = L / 2.
[0032]
Further, as shown in FIG. 2 (b), the management mark 3 ₂ squares type, which corresponds to the management mark 62 square type shown in FIG. 6 (b), the vertical width L and The transverse width L is a dimension of 1000 μm or more, and the radius of curvature R of the arc-shaped portion at each corner is R = L / 20 = 50 μm when the width L is 1000 μm, and the width L is 1000 μm. In the case of exceeding R, the curvature radius R corresponding to the width L is formed from the relationship of R = L / 20.
[0033]
Furthermore, as shown in FIG. 2 (c), the protective pattern 4 _1, 4 ₂ small square end management marks 3 ₃ and two rod-like, the management of the small square end shown in FIG. 6 (c) This corresponds to the combination of the mark 63 and the two bar-shaped protective patterns 64, and the width L of the _two bar-shaped protective patterns 4 ₁ , 4 ₂ is 100 μm or more, and each bar-shaped protective pattern The radius of curvature R of the arcuate portions at the tips of the patterns 4 ₁ and 4 ₂ is R = L / 2 = 50 μm when the width L is 100 μm, and R = L / 2 when the width L exceeds 100 μm. From the relationship, it is formed so as to have a curvature radius R corresponding to the width L thereof.
[0034]
In addition to this, although not shown in FIG. 1, each filter forming unit 2 includes a black matrix (light-shielding part) formed of a black matrix material and a non-light-shielding part corresponding to the matrix interval of the black matrix, as will be described later. Are provided with a red filter, a green filter, and a blue filter that are regularly provided in order, and each corner of the outermost black matrix is formed in an arc shape having a radius of curvature R. The radius of curvature R at that time is configured so that R = 50 μm or more.
[0035]
Thus, according to the color filter of the present embodiment, each corner of the management mark 3 (3 ₁ , 3 ₂ , 3 ₃ ) formed on the color filter substrate 1 and each corner of the outermost black matrix. Since each part is formed in an arc shape having a curvature radius R of 50 μm or more, each color filter coating film is formed on the management mark 3 (3 ₁ , 3 ₂ , 3 ₃ ) and on the outermost black matrix. Occasionally, streaks and thickness unevenness starting from each corner of the management mark 3 (3 ₁ , 3 ₂ , 3 ₃ ) and each corner of the outermost black matrix do not occur, and the state is good. A color filter provided with each color filter can be obtained.
[0036]
FIG. 3 is a top view showing the configuration of another embodiment of the color filter according to the present invention.
[0037]
In FIG. 3, the same components as those shown in FIG.
[0038]
In this embodiment, one filter forming unit 2 is installed on one color filter substrate 1, and four management marks 3 are installed so as to be adjacent to the four sides of the filter forming unit 2, respectively. is there. In this case, each of the management marks 3 installed so as to be adjacent to each of the four sides of the filter forming unit 2 is used to determine the position of the exposure mask when the color filter coating film is exposed with the exposure mask. It is used. Further, since the color filter substrate 1 does not need to be cut, the management mark 3 arranged and formed along the vertical center line of the color filter substrate 1 is not installed.
[0039]
In the other embodiment shown in FIG. 3, as the management mark 3, a substantially cross-shaped management mark 3 ₁ , a square-shaped management mark 3 ₂ , a small square-shaped management mark 3 _3, and two of them are used. Since each corner of the black matrix on the outermost periphery of the filter forming portion 2 is formed in an arc shape using any _one of the rod-shaped protective patterns 4 ₁ , 4 ₂ , the same as in the embodiment shown in FIG. In addition, when each color filter coating film is formed on the management mark 3 (3 ₁ , 3 ₂ , 3 ₃ ) and on the outermost black matrix, the management mark 3 (3 ₁ , 3 ₂ , 3 ₃ ) There is no streaking or uneven thickness starting from each corner and each corner of the outermost black matrix, and a color filter having each color filter in a good state can be obtained.
[0040]
4 (a), (b), (c), (d), (e) and FIGS. 5 (a), (b), (c), (d) show the production of the color filter according to the present invention. Sectional drawing which shows an example of a process is shown.
[0041]
4A to 4E and 5A to 5D, 5 is a black matrix, 5A is a black matrix coating film, 6 ₁ and 6 ₂ are exposure masks, and 7 ₁ and 7 ₂ are for exposure. UV, 8R is a red filter, 8RA is a red filter coating layer, 8B is a blue filter, 8G is a green filter, 9 is a protective film, 10 is an indium tin oxide (ITO) layer, and the others are shown in FIG. The same reference numerals are given to the same components as the components.
[0042]
The manufacturing process of the color filter according to the present invention will be described with reference to FIGS. 4 (a) to 4 (e) and FIGS. 5 (a) to 5 (d).
[0043]
Prior to the description, FIGS. 4A to 4C relate to a first photolithography process for forming a black matrix, and FIGS. 4D to 4E and 5A are FIG. 5B relates to a third photographic processing step for forming a green filter and a fourth photographic processing step for forming a blue filter. FIG. 5C relates to a fifth photolithography process for forming a protective film, and FIG. 5D illustrates an ITO sputtering process for forming an indium tin oxide (ITO) film. It is concerned.
[0044]
First, as shown in FIG. 4A, a black matrix material resist is applied to one surface of the color filter substrate 1 to form a black matrix (black) coating layer 5A.
[0045]
Next, as shown in FIG. 4 (b), and close to the upper surface of the black matrix coating layer 5A by placing an exposure mask ₆₁ is irradiated with exposure UV 7 ₁ over the exposure mask _61, a black matrix The coating layer 5A is exposed (exposure 1). At this time, exposure mask _61, a black matrix and management mark 3 in the filter forming portion 2 has a respective aperture, such as are formed simultaneously. The shape of the opening is such that the corners of the outermost black matrix in the filter forming portion 2 are formed in an arc shape, and the substantially cross-shaped management mark 3 ₁ and the square-shaped management mark 3 _2. , like any of the protection pattern 4 _1, 4 ₂ small square end management marks 3 ₃ and two rod-shaped is formed, is used.
[0046]
Next, as shown in FIG. 4C, the exposed black matrix coating layer 5A is developed with a developer (development 1), the unexposed portion of the black matrix coating layer 5A is removed, and the black matrix 5 and the management layer are removed. Mark 3 is formed.
[0047]
Subsequently, as shown in FIG. 4D, a red filter material resist is coated on the black matrix 5 and the management mark 3 to form a red filter coating layer 8RA.
[0048]
Next, as shown in FIG. 4 (e), in proximity to the upper surface of the red filter coating layer 8RA placing an exposure mask 6 ₂ was irradiated for exposure UV 7 ₂ from above exposure mask 6 _2, red filter The coating layer 8RA is exposed (exposure 2). At this time, the exposure mask 6 ₂ has openings in the red filter forming portions between the black matrices 5, and the arrangement position of the exposure mask 6 ₂ is determined by the already formed management mark 3. .
[0049]
Next, as shown in FIG. 5A, the exposed red filter coating layer 8RA is developed with a developer (development 2), and the unexposed portion of the red filter coating layer 8RA is removed to form a red filter 8R. .
[0050]
Subsequently, as shown in FIG. 5B, the green filter 8G and the blue filter 8B are sequentially formed through the same process as the process of forming the red filter 8R.
[0051]
Next, as shown in FIG. 5C, a protective material is applied on the formed red filter 8R, green filter 8G, and blue filter 8B to form a protective film 9.
[0052]
Thereafter, as shown in FIG. 5D, indium tin oxide (ITO) is sputtered on the formed protective film 9 to form a transparent ITO film 10, and the color filter is completed.
[0053]
In each of the above embodiments, four or one filter forming units 2 are provided on the color filter substrate 1. However, the number of filter forming units 2 according to the present invention is four or one. The number of filter forming units 2 may be set according to the shape and size of the color filter substrate 1.
[0054]
In each of the above embodiments, the management mark 3 is installed so as to be adjacent to each side of the filter forming portion 2 in the color filter substrate 1 and along the vertical center line of the color filter substrate 1. Although the example in which the management mark 3 is installed has been described, the installation position of the management mark 3 according to the present invention is not limited to the above-described location, and several management marks 3 are attached to the filter forming unit 2. The management mark 3 may be installed along the horizontal center line of the color filter substrate 1.
[0055]
Furthermore, in each of the above-described embodiments, the example in which the management mark 3 is formed of the black matrix material has been described. However, the formation material of the management mark 3 according to the present invention is not limited to the black matrix material, Other materials such as each color filter material and each color phosphor material may be used as long as they have a light shielding property.
[0056]
In addition, in each of the above embodiments, even if a black matrix material or a resin black matrix material made of metal chromium (Cr) is used as a material for forming the management mark 3, the required effect can be achieved. It is.
[0057]
【The invention's effect】
As described above, according to the present invention, each corner of the management mark installed on the color filter substrate and each corner of the outermost light shielding portion are arcuate, and the radius of curvature of the arcuate portion is set. Since R is formed to be 50 μm or more, the thickness of the outermost light shielding part constituting the management mark and the filter forming part is slightly thick, and the installation positions of several management marks are the filter formation. Even when it is not the outer periphery of the part, when each color filter coating film is formed on the management mark and the outermost light shielding part, the corners of the management mark and the outermost light shielding part There is an effect that a streak or thickness unevenness starting from each corner is not generated, and a color filter in a good state can be obtained without causing streak or thickness unevenness in each color filter.
[0058]
When such a color filter is used for the liquid crystal display surface, there is an effect that a liquid crystal display device that does not cause display unevenness and does not cause display defects can be obtained.
[Brief description of the drawings]
FIG. 1 is a top view showing a configuration of an embodiment of a color filter according to the present invention.
2 is a configuration diagram showing various examples of management marks used in the color filter of the embodiment of FIG. 1. FIG.
FIG. 3 is a top view showing a configuration of another embodiment of a color filter according to the present invention.
FIG. 4 is a cross-sectional view showing an example of a first half part in a manufacturing process of a color filter according to the present invention.
FIG. 5 is a cross-sectional view showing an example of the latter half of the color filter manufacturing process according to the present invention.
FIG. 6 is a configuration diagram showing various examples of management marks used for known color filters.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Color filter substrate 2 Filter formation part 3 Management mark 3 _{1 About} cross-shaped management mark 3 ₂ Square-shaped management mark 3 ₃ Small square-shaped management mark 4 ₁ , 4 ₂ Bar-shaped protection pattern 5 Black matrix 5A Black matrix coating film 6 ₁ , 6 ₂ Exposure mask 7 ₁ , 7 ₂ Exposure ultraviolet ray 8R Red filter 8RA Red filter coating layer 8B Blue filter 8G Green filter 9 Protective film 10 Indium tin oxide (ITO) film

Claims (5)

  A color filter substrate having a matrix-shaped light-shielding portion and an alignment mark on the substrate, and applying and forming a color filter on the substrate by spin coating, wherein the alignment mark is the matrix-shaped light-shielding portion A color filter substrate, wherein each corner of the alignment mark is formed in an arc shape.   The color filter substrate according to claim 1, wherein the matrix-shaped light shielding portion and the alignment mark are formed by a black pattern.   The color filter substrate according to claim 1, wherein the color filter includes a red filter, a blue filter, and a green filter.   The alignment mark has a rod-shaped portion, and when the width of the rod-shaped portion is L and the curvature radius of the arc-shaped portion at the tip of the rod-shaped portion is R, L ≧ 100 μm and R ≧ L / 2 are satisfied. The color filter substrate according to claim 1, wherein the color filter substrate is configured.   The alignment mark as a whole has a quadrangular shape, where L = 1000 μm, R ≧ L / 20, where L is the width of the quadrangular shape and R is the radius of curvature of the arc-shaped portion of each corner of the quadrangular shape. The color filter substrate according to claim 1, wherein the color filter substrate is configured to satisfy the above.

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