JP4043089B2 - Plasma processing equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a plasma processing apparatus suitable for performing plasma processing efficiently in high-precision manufacturing processes such as ICs and LCDs, and more particularly to a plasma processing apparatus that generates plasma using an electric field and a magnetic field.
[0002]
[Prior art]
Conventionally, as an example of a plasma processing apparatus used for plasma processing such as CVD, etching, and ashing, a pair of parallel flat plates serving as counter electrodes are provided, and a plasma processing space is formed between the parallel flat plates to form a silicon wafer or the like. A so-called parallel plate type etcher (RIE) that performs an etching process on a substrate of this type and a parallel plate type PCVD that performs a film forming process are known.
FIG. 13 shows a longitudinal cross-sectional structure diagram. In a parallel plate type plasma processing apparatus, a pair of parallel plates are provided in a vacuum chamber, and plasma is generated in a plasma processing space formed between the two plates. Alternatively, a predetermined processing gas or the like is also introduced into the plasma processing space while being introduced. Then, a plasma reaction is performed in the plasma processing space, whereby an etching process or the like is performed on the substrate surface in the plasma processing space.
[0003]
An etcher will be described in detail as an example. This apparatus includes a vacuum chamber in which a vacuum chamber lid 3 is attached on a vacuum chamber main body 2 so as to be openable and closable. Therefore, the horizontally placed cathode portion 12 is provided in the center of the vacuum chamber main body 2, and the upper surface of the cathode portion 12 is formed flat and an insulating film is stretched to form the substrate 1. Can be on board. A cylindrical lower support 12a is vertically provided through the center of the inner bottom of the vacuum chamber main body 2. The cathode portion 12 is fixedly supported at the upper end of the lower support 12a and is constituted by these. The substrate support is implanted in a vacuum chamber and has an upper surface formed so that the substrate can be mounted.
[0004]
An anode portion 11 is suspended from the vacuum chamber lid portion 3 by a cylindrical upper support 11a at a substantially central position in the vacuum chamber lid portion 3 and above the cathode portion 12, and the anode portion 11, the cathode portion 12, When a high frequency is applied by the RF power source 31 with the electrodes facing each other, plasma is generated between the anode portion 11 and the cathode portion 12 under a predetermined vacuum pressure. When a predetermined processing gas is supplied thereto, plasma processing corresponding to the gas state or the like is performed on the substrate 1 placed on the upper surface of the cathode portion 12. Thereby, the anode part 11 forms the plasma processing space 13 between the upper surface of the cathode part 12.
[0005]
The vacuum chamber main body 2 is formed with a suction port 2a penetrating the inside and outside in order to suck out the gas in the vacuum chamber and maintain an appropriate degree of vacuum. A gate valve 4a, a variable valve 4 and a vacuum pump are sequentially formed with respect to the suction port 2a. 5 are connected. The gate valve 4a is a manual valve for partitioning during maintenance or the like, and is opened during normal operation. The variable valve 4 inserted between this and a vacuum pump 5 such as a turbo pump is provided with a motor or the like that variably drives the valve opening, and is controlled by an electric signal to control the flow of fluid that can be remotely controlled. Functions as a variable aperture. When the vacuum pressure in the vacuum chamber is detected by the vacuum pressure gauge 4b attached to the vacuum chamber, and the control signal is generated and output by the PID control circuit 4c based on the difference between the detected value and a predetermined set target value. The throttle amount by the variable valve 4 is variably driven in accordance with this control signal. Such a vacuum pressure gauge 4b is used as a pressure detector, a PID control circuit 4c is used as a pressure control circuit, and a variable valve 4 is used as a pressure control mechanism to automatically control the vacuum pressure in the vacuum chamber to a set pressure. The
[0006]
By the way, as described above, the plasma density is insufficient in the case of generating the plasma only by applying an electric field to the parallel plates sandwiching the plasma space. Therefore, there is an object that generates a high density plasma (HDP) by sealing the plasma by applying a magnetic field. Are known. This is applied to MRIE (magnetron reactive ion etcher) or the like, and increases the proportion of ion species in the plasma component as the plasma density increases. In this type, plasma tends to be unevenly distributed, and when the proportion of ion species increases, damage to the object to be processed tends to increase. Therefore, as described in Japanese Patent Application Laid-Open No. 3-79025, there is an apparatus that tries to prevent damage by making the magnetic field uniform using a planar coil. The treatment is directly exposed. However, there is no mention of other problems such as charge-up of an object to be processed due to the plasma current due to that.
[0007]
On the other hand, in order to reduce damage to the object to be processed by ions and prevent the object to be processed from being directly exposed to the high-density plasma being generated, a plasma processing space and a plasma generation space that communicate with each other are connected to each other. The plasma is designed to increase the proportion of radical species by suppressing the ion species of the plasma component when generating high-density plasma in the plasma generation space and supplying the plasma from there to the plasma processing space. Etching apparatuses are also known. This can be achieved by using ECR (Electron Cyclotron Resonance) using radical flow or a method in which both spaces are separated from each other, such as those described in JP-A-4-81324, ICP (Inductive Coupled Plasma), or the like. This is the same in that a high-density plasma is confined to a plasma generation space adjacent to the plasma processing space by a very strong magnetic field, and further in that the plasma generation space is adjacent to the plasma processing space. It is classified into the thing etc. which confine high-density plasma using the circularly polarized electromagnetic wave from a ring antenna like things.
[0008]
[Problems to be solved by the invention]
However, among these conventional plasma processing apparatuses, those of the above-mentioned ECR type, that is, the method of separating them in terms of distance, implement these mechanisms so that both the plasma processing space and the plasma generation space are kept at an appropriate distance. However, since the ratio of ion species is suppressed more than necessary and radical species increase, the plasma processing efficiency cannot be improved. Moreover, even if the mechanism implementation is devised to bring the ratio of the radical species and ionic species components in the plasma closer to high plasma treatment efficiency, the type and pressure of the active gas, and the material of the workpiece As the ratio changes, the desired ratio itself changes and fluctuates, and it is difficult to realize a mechanism that can variably control the distance between the two spaces. Under this method, the processing efficiency can be improved with an appropriate plasma component ratio. The plasma processing equipment that is good is not fully realized.
[0009]
On the other hand, in the ICP type, when the change in the magnetic field accompanying the time change of the current flowing through the coil accelerates the electrons and the electrons exceed the energy that ionizes the surrounding processing gas, ionization occurs and plasma is generated and formed. Since this ionization mechanism is formed in a converged state depending on the combined magnetic field of the coil, the generation shape of high energy electrons useful for ionization becomes a donut shape. Since this electron energy distribution is almost a Boltzmann distribution, electrons having energy higher than ionization ionize the gas in the plasma space, and electrons lower than that generate radicals. Thus, in ICP plasma, ion formation and radical formation depend on the same plasma forming means, and therefore the density ratio between ions and radicals cannot be arbitrarily set and controlled. Further, TCP plasma (transformed coupled plasma) has almost the same mechanism although the coil shape is different.
[0010]
On the other hand, in the method using circularly polarized electromagnetic waves, even if the use of a strong magnetic field is avoided, a large-diameter single ring antenna is used, so that the uniformity of plasma distribution in the plasma processing space is ensured. In addition, the plasma generation space is broader than that of the plasma processing space, is at least as wide as the workpiece, and communicates at the adjacent surfaces of both spaces in its wide state. .
[0011]
However, if the area of both space communication portions is large, the amount of gas flowing back from the plasma processing space to the plasma generation space increases. This is the same in all cases of the conventional plasma processing apparatus adopting a method in which the plasma processing space and the plasma generation space are separated from each other. Furthermore, this can be said to be almost the same for ECR. In the case of this type, at first glance, unlike the TCP and ICP plasma, the plasma generation space and the plasma processing space are separated from each other, so that both appear to be separated, but the opening diameter at the communicating portion of both spaces is large. The plasma components are not separated as apparent.
[0012]
Such a backflow gas contains a part of components that should be discharged immediately, such as those generated by processing of the object to be processed. The gas to be discharged is violently decomposed and ionized by the high-density plasma when it enters the plasma generation space, so that it can be transformed into an undesired thing that prevents proper processing or contaminates the inside of the device. There are many. Even if it is divided, the plasma components are not clearly separated.
For this reason, even if the uniformity of the plasma distribution can be ensured, it is difficult to provide a high-quality treatment if the undesired gas backflow cannot be prevented.
[0013]
In addition, it is conceivable to install a baffle plate that narrows the communication area at the adjacent surface where both spaces communicate, but in this case, even if the inflow amount decreases, the outflow amount also decreases. Once the gas has entered the plasma generation space, it is difficult to get out, so the ratio of gas that can be altered by high-density plasma increases. For this reason, even if a baffle plate or the like described in JP-A-4-290428 is simply combined, the final effect of preventing gas alteration cannot be expected.
[0014]
Therefore, it is a problem to devise the structure of both spaces so that gas inflow from the plasma processing space to the plasma generation space can be effectively prevented.
However, from the viewpoint of reducing plasma damage and charge-up, the plasma space is separated into the plasma generation space and the plasma processing space, and from the viewpoint of optimizing the ratio of the radical species component to the ion species component in the plasma. We want to maintain the condition that the generation space and the plasma processing space are adjacent to each other.
[0015]
By the way, as the size of a substrate to be subjected to plasma processing increases and becomes larger, a sheet-like process for processing one by one is also common in a plasma processing apparatus. Since the upper surface of the other flat plate is generally covered with the substrate, it is difficult to provide a suction port at the center of the substrate support as before, so in the conventional plasma processing apparatus, the suction port is a vacuum. It is formed in the chamber body part where the substrate support planting site is removed. As the substrate size increases, the parallel plate also increases, and the chamber volume and the suction port are also increased.
[0016]
On the other hand, just because the substrate size has increased, the requirements for processing precision and uniformity have not only relaxed, but the severity has increased. In order to meet this requirement, it is necessary to ensure the uniformity of the plasma state over the entire upper surface of the substrate. However, if the suction port deviates from the center of symmetry, or even if the suction port is dispersed at the symmetrical position, if the piping from each suction port to the vacuum pump is long or short, the flow of plasma or the like is deflected, and the plasma It is difficult to ensure uniformity. For this, a baffle plate may be installed in front of the suction port in the vacuum chamber to equalize the flow before the baffle plate (see 2b in FIG. 13). In addition to the increase, the baffle plate becomes a flow resistance, so that the pressure controllability is lowered. That is, it becomes impossible to quickly control the pressure state of the plasma, and the pressure fluctuation increases. As a result, it becomes difficult to maintain the plasma pressure at a desired setting state.
[0017]
On the other hand, it can be said that reducing the volume of the vacuum chamber is effective for improving the pressure controllability of the plasma. Specifically, it is conceivable that the vacuum chamber is contracted to such a point that the inner wall of the chamber is likely to contact the edge of the parallel plate (see FIG. 14). However, if the chamber volume is simply reduced by such a forcible method, the suction port must be provided directly beside the plasma processing space, so that the plasma flow is severely biased and the plasma uniformity is increased. It can be seriously damaged. In this case, there is no space to provide a baffle plate for buffering, and it becomes difficult to perform the work of attaching a substrate loading / unloading mechanism and the like and the back side of the parallel plate.
[0018]
However, increasing the size of the substrate in addition to the uniformity of the plasma processing is also an important requirement for the plasma processing apparatus. If only one of them is met, the product value of the apparatus cannot be maintained and improved.
Therefore, in order to meet these conflicting demands, it is a further problem to devise a structure capable of controlling the plasma pressure state more uniformly and more quickly.
[0019]
The present invention has been made to solve such a problem, and optimizes the plasma component ratio under the precondition that the plasma space is divided into a plasma generation space and a plasma processing space and these are adjacent to each other.・ Achieving a plasma processing system that supplies high-quality plasma by actively improving controllability and ensuring both plasma distribution uniformity and preventing gas flow from the plasma processing space to the plasma generation space. Objective.
Another object of the present invention is to realize a plasma processing apparatus that is excellent in pressure controllability in addition to supplying uniform and high-quality plasma.
[0020]
[Means for Solving the Problems]
About the 1st thru | or 14th solution means invented in order to solve such a subject, the structure and effect are demonstrated below. The essence of this is to divide the plasma space into a plasma generation space and a plasma processing space and to increase the degree of separation with respect to plasma components in both the divided spaces.
[0021]
[First Solution]
The plasma processing apparatus of the first solving means (as described in claim 1 at the beginning of the application) includes a first mechanism in which a plasma processing space is formed, and is attached to or integrally with the first mechanism. And a second mechanism in which a plasma generation space is formed, wherein the plasma generation space is formed in a distributed manner in the plasma processing apparatus adjacent to and in communication with the plasma processing space. It is characterized by being.
[0022]
[Second Solution]
The plasma processing apparatus of the second solving means (as described in claim 2 at the beginning of the application) is a plasma processing space between a pair of parallel flat plates (including these parallel flat plates) as counter electrodes (within the vacuum chamber). In the plasma processing apparatus in which a plasma generating space adjacent to and communicating with the plasma processing space is formed on one of the pair of parallel flat plates or on an adjacent mechanism portion thereof in a dispersed manner or the like. It is a feature.
[0023]
That is, in the plasma processing apparatus of the first and second solving means, the plasma space is divided into a plasma generation space and a plasma processing space, and the plasma generation space is adjacent to and communicates with the plasma processing space. In the generator, the plasma generation space is formed in a dispersed manner.
[0024]
Here, the above-mentioned “dispersion etc.” means not only the literal dispersion of being scattered in the form of dots, but also the case of being divided so as to be not so close, or in the form of lines or broken lines , Straight / curve shapes, etc., or a mixture of them is distributed in the adjacent part / communication part with the plasma processing space, and annular, circular, polygonal and spiral ones are concentric. Or it is the meaning also applicable when many are arranged non-concentrically or are formed widely alone.
[0025]
In such a plasma processing apparatus of the first and second solutions, by maintaining the conditions of separation of the plasma space and adjacent communication, plasma damage and charge-up can be reduced, and the radical species components in the plasma can be reduced. It meets the basic requirement of optimizing the ratio of ionic species.
[0026]
Moreover, since the plasma generation spaces are formed in a dispersed manner, not only can the demand for ensuring the uniformity of the plasma distribution be met, but also the adjacent surfaces communicating with the plasma processing space and the plasma generation spaces themselves along the surfaces. The cross-sectional area is necessarily smaller than that of the plasma processing space. This is true not only for the entire cross section, but also for the central portion and other partial cross sections. If there is a difference between the areas of the two spaces in this way, the ratio of the area of the communication adjacent surface and the cross-sectional area of the plasma processing space along this is the first ratio, and the area of the communication adjacent surface and the plasma generation space along this area. The first ratio is less than 1 and smaller than the second ratio, where the ratio of the cross-sectional area is the second ratio.
[0027]
When the first ratio is less than 1, the amount of gas flowing from the plasma processing space into the plasma generation space decreases. On the other hand, when the second ratio is 1, the amount of gas flowing out from the plasma generation space to the plasma processing space does not decrease. Further, even when the second ratio is less than 1 and the amount of outflow gas decreases, if the second ratio is greater than the first ratio, the degree of decrease may be small. In any case, the ratio of the gas flowing out from the plasma generation space into the plasma processing space is relatively higher than the ratio of the gas flowing into the plasma generation space from the plasma processing space. This not only suppresses the flow of undesired gas into the plasma generation space, but even when the gas enters the plasma generation space, the gas is quickly discharged into the plasma processing space together with the plasma flow. , Gas alteration due to high-density plasma can be prevented and suppressed.
[0028]
Therefore, according to the present invention, the optimization and controllability of the plasma component ratio is positively enhanced under predetermined preconditions, and the uniformity of the plasma distribution is ensured and the gas flow from the plasma processing space to the plasma generation space is prevented. By responding to both requests, high-quality plasma can be supplied. As a result, a high-quality etching process can be provided.
[0029]
[Third Solution]
The plasma processing apparatus of the third solving means (as described in claim 3 at the beginning of the application) is a plasma processing space between a pair of parallel flat plates (including these parallel flat plates) serving as counter electrodes (in the vacuum chamber). In the plasma processing apparatus, a plasma generation space adjacent to and communicating with the plasma processing space is formed on one of the pair of parallel flat plates or on an adjacent mechanism portion thereof, and the plasma generation space is formed in the plasma generation space. On the other hand, a magnetic circuit is provided, and a magnetic member for the magnetic circuit is arranged (at least partially) at a position surrounded or sandwiched by the plasma generation space.
[0030]
In such a plasma processing apparatus of the third solution, by maintaining the conditions of separation of the plasma space and adjacent communication, plasma damage and charge-up can be reduced, and the radical species components and ion species in the plasma can be reduced. We are responding to the basic request of optimizing the ratio with other ingredients.
Moreover, electrons that contribute to the generation and ionization of plasma are sealed in the plasma generation space by a magnetic circuit, but at least a part of the magnetic member for the magnetic circuit is surrounded or sandwiched by the plasma generation space. The magnetic circuit is localized. If it does so, it will become what the distribution state of the magnetic force line condensed, and a leakage magnetic flux will also decrease.
[0031]
Thereby, electrons are sealed with high accuracy in the plasma generation space. Then, electrons may stray into the plasma processing space, and the low-temperature plasma may be randomly ionized, or on the contrary, undesired processing gas may be mixed into the plasma generation space from the plasma processing space instead of the electrons. Less. That is, uncontrollable mixing is reduced.
As a result, when the plasma having a high ion species ratio is appropriately fed to the plasma processing space and mixed with the plasma having a low ion species ratio, the ion species component ratio in the plasma used for the etching process is set to an appropriate value. Control over a wide range is possible.
[0032]
In addition, the local magnetic circuit easily meets the demand for equalization by parallelization or the like. Moreover, since the magnetic force of the entire magnetic circuit can be weakened by the localization, there is an advantage that a small and simple one can be used for each magnetic member and mounting becomes easy. Furthermore, when combined with the above-described configuration of forming the plasma generation space in a distributed manner, the unwanted gas ionized by the high density plasma backflowing into the plasma generation space is combined with the high density plasma before further transformation. Therefore, a synergistic effect of being pushed back to the plasma processing space quickly can be expected.
[0033]
Therefore, according to the present invention, the optimization and controllability of the plasma component ratio is positively enhanced under predetermined preconditions, and the uniformity of the plasma distribution is ensured and the gas flow from the plasma processing space to the plasma generation space is prevented. By responding to both requests, high-quality plasma can be supplied. As a result, a high-quality plasma treatment can be provided.
[0034]
[Fourth Solution]
The plasma processing apparatus of the fourth solution (as described in claim 4 at the beginning of the application) is a plasma processing space between a pair of parallel flat plates (including these parallel flat plates) serving as counter electrodes (within the vacuum chamber). A plasma generating space adjacent to and communicating with the plasma processing space is formed on one plate of the pair of parallel flat plates or on an adjacent mechanism portion thereof in a dispersed manner, and the like. A magnetic circuit for sealing electrons is attached to the plasma generation space.
[0035]
Such a plasma processing apparatus of the fourth solution means has both functions and effects of the second and third solution means described above.
[0036]
[Fifth Solution]
A plasma processing apparatus of a fifth solution means (as described in claim 5 at the beginning of the application) is the plasma processing apparatus of the fourth solution means, wherein the plasma generation space is formed in a linear shape. It is characterized in that the magnetic members for the magnetic circuit are arranged in a row (a large number) across the plasma generation space (from both sides).
[0037]
In such a plasma processing apparatus of the fifth solving means, compared to the case where the plasma generation spaces are scattered and scattered, a certain amount of capacity is obtained when the plasma generation spaces are dispersed but continuous. Is secured. In particular, when formed in a spiral shape, it also has a unity as a single space. Thereby, even if the plasma generation space is dispersed, the plasma in the space is considerably uniformized. In addition, by forming a multi-circular shape or a multi-rectangular side, or by connecting them partially, it is easy to achieve dispersion that matches the shape of the substrate to be processed while maintaining a unity. In addition, once the shape of the plasma generation space is determined, the magnetic circuit is divided into small pieces and arranged along both sides of the magnetic circuit so that electrons are easily sealed in the plasma generation space. This facilitates the realization of the magnetic circuit.
[0038]
[Sixth Solution]
A plasma processing apparatus of a sixth solution means (as described in claim 6 at the beginning of the application) is the plasma processing apparatus of the third to fifth solution means, wherein the magnetic circuit is a permanent magnet or a direct current. It is formed by an exciting coil.
[0039]
In such a plasma processing apparatus of the sixth solution, a powerful electromagnet is not required, so that mounting design is facilitated, and the apparatus can be miniaturized. In addition to the powerful electromagnet, a large power source for driving is not required, so that the cost is reduced. In particular, permanent magnets can be easily adapted to various shapes by arranging small pieces of the same / similar shape, so that not only cost reduction but also design flexibility is greatly improved.
[0040]
[Seventh Solution]
A plasma processing apparatus of the seventh solution means (as described in claim 7 at the beginning of the application) is the plasma processing apparatus of the first to sixth solution means, and contributes to generation or strengthening of plasma. A first application circuit that applies an electric field or a magnetic field to the plasma processing space and a second application circuit that applies an electric field or a magnetic field that contributes to generation and strengthening of the plasma to the plasma generation space are provided.
[0041]
In the plasma processing apparatus of the seventh solving means, the ratio of the ion species component in the plasma can be variably controlled by changing the output power of the first application circuit, and the output power of the second application circuit. Also, it is possible to variably control the plasma density without changing the ratio of the ion species component in the plasma.
Thereby, the plasma component ratio and the plasma density can be set independently.
[0042]
[Eighth Solution]
The plasma processing apparatus of the eighth solution means (as described in claim 8 at the beginning of the application) is the plasma processing apparatus of the seventh solution means, wherein the first application circuit and the second application circuit Is characterized in that the outputs can be controlled independently of each other.
Here, “independently controllable” means that if the outputs of both circuits can be varied separately, it can be done as such, and does not mean that the contents of control are not related. For example, when a certain coefficient or function is set in advance and both are related by this coefficient or function, each circuit corresponds its output to each control target based on that coefficient or function. Included, independently controllable.
[0043]
In such a plasma processing apparatus of the eighth solving means, the output power of each application circuit is controlled independently. Thereby, the plasma component ratio and the plasma density are set independently. In other words, the ion species concentration and the radical species concentration are controlled and set independently. Therefore, since the processing conditions can be freely selected from a wide setting range, the efficiency and quality of the plasma processing can be further improved.
[0044]
[Ninth Solution]
A ninth plasma processing apparatus (as described in claim 9 at the beginning of the application) is the plasma processing apparatus according to the first to eighth solution, wherein the plasma generation space is the plasma. The area communicating with or opening to the processing space is smaller than the area of the plasma generation space (in a cross section parallel to the pair of parallel plates).
[0045]
In such a plasma processing apparatus of the ninth solving means, the communication portion between the plasma generation space and the plasma processing space is narrowed down, and the first is more than the case where the plasma generation space is simply opened to the plasma processing space. The first ratio described for the second solution is reduced, so that the flow of undesired gas into the plasma generation space is further suppressed. In addition to this, since the plasma generated and expanded in the plasma generation space is sent to the plasma processing space at an appropriate speed according to the area ratio, the velocity component in the vertical direction is added to the plasma, particularly the ion species. You can also
[0046]
[Tenth Solution]
A plasma processing apparatus of a tenth solution means (as described in claim 10 at the beginning of the application) is the plasma processing apparatus of the first to ninth solution means, wherein a plasma gas is introduced into the plasma generation space. The first gas introduction path for introducing the gas and the second gas introduction path for introducing the processing gas into the plasma processing space are individually provided.
[0047]
In the plasma processing apparatus of the tenth solution, the plasma gas is introduced into the plasma generation space via the first gas introduction path, while the processing gas is separately supplied from the second gas generating path. The gas is introduced into the plasma processing space through the gas introduction path. Then, the plasma gas necessary for generating the high-density plasma is separated from the undesired processing gas when entering the high-density plasma, and the processing gas is supplied to the plasma processing without passing through the plasma generation space. It is mixed for the first time. Thus, it is possible to reliably avoid the processing gas being altered by the high-density plasma before being subjected to the plasma processing.
[0048]
[Eleventh Solution]
The plasma processing apparatus of the eleventh solution means (as described in claim 11 at the beginning of the application) is the plasma processing apparatus of the tenth solution means, wherein the reaction gas is introduced into the second gas introduction path. While supplying the gas containing a component, only a non-reactive gas is supplied to the said 1st gas introduction path.
[0049]
In the plasma processing apparatus of the eleventh solution, the processing gas contains a reactive gas component necessary for the etching process, whereas the plasma gas is useful for generating high-density plasma. In addition, only a non-reactive gas that does not undesirably deteriorate even if it becomes a high-density plasma is used.
As a result, it is possible to provide a higher quality plasma than when the reaction gas is supplied via the plasma generation space, and thus the high density plasma and ion species without worrying about the alteration of the reaction gas. Can be produced in any desired amount, eg, in large amounts.
[0050]
[Twelfth Solution]
The plasma processing apparatus of the twelfth solving means (as described in claim 12 at the beginning of the application) is the plasma processing apparatus of the second to eleventh solving means, wherein the pair of parallel plates are used as a reference. The movable wall body having a shape covering the opening portion of the plasma processing space, the movable wall body covering both the position where the movable wall body covers the opening portion and the position where the movable wall body releases the opening portion. A wall drive mechanism for moving the wall forward and backward, and the other flat plate of the pair of parallel flat plates is implanted directly on the inner bottom of the vacuum chamber or indirectly via a support member, and the upper surface is mounted on the substrate. It is characterized by being formed.
[0051]
Here, the “opening portion of the plasma processing space with reference to a pair of parallel plates” means a side portion of a cylindrical space having both parallel plates as both end faces. In addition, “covering the opening” means not covering completely in a sealed manner, but covering at least a gap enough to exhaust plasma or gas that has been processed and maintain the plasma. is there.
[0052]
In such a plasma processing apparatus of the twelfth solution means, a substrate is mounted on the upper surface of the other flat plate in the internal space of the vacuum chamber, and a plasma processing space is formed thereabove. However, since the opening portion of the plasma processing space is covered with the movable wall body, the plasma processing space is generally surrounded by the pair of parallel plates and the movable wall body in the vacuum chamber. Therefore, a part of the space in the vacuum chamber is divided into the plasma processing space, and the pressure states of both are substantially separated. The degree of the separation depends on the size of the gap left from the covering by the movable wall body.
[0053]
Then, when the movable wall body is advanced and retracted by the wall body driving mechanism, the gap changes widely, and the pressure in the plasma processing space quickly approaches the vacuum pressure in the vacuum chamber and increases away from it. It is possible to control the pressure state of the plasma based on the body's advance / retreat drive. In addition, by aligning the shape of the movable wall with the shape of the parallel plate and dispersing the gaps therebetween as uniformly as possible, the deviation in the form of the flow flowing out from the plasma processing space is reduced.
When the substrate is taken in and out of the vacuum chamber, the movable wall body is provided in the vacuum chamber if the movable wall body is moved forward and backward by the wall body driving mechanism to a position where the opening of the plasma processing space is released. There is no inconvenience.
[0054]
As a result, the direct pressure control object is separated from the pressure inside the chamber into a part of the plasma processing space, so that a large volume object with poor responsiveness is narrowed down to a small volume object with excellent responsiveness. Since the shape is almost determined by the movable wall body that is relatively easy to uniformly disperse, such as making it symmetric with respect to the center, with the vacuum chamber wall being out of control by the suction port, pressure control in the plasma processing space It is easy to make the flow state in the plasma processing space uniform at the same time.
Therefore, according to the present invention, it is possible to realize a plasma processing apparatus excellent in pressure controllability in addition to supplying uniform and high-quality plasma.
[0055]
[Thirteenth Solution]
The plasma processing apparatus of the thirteenth solving means is the plasma processing apparatus of the above twelfth solving means (as described in claim 13 at the beginning of the application), wherein the movable wall covers the opening portion. When in the position, it has a shape that creates a gap to be a throttling of the passing fluid with the other flat plate.
[0056]
In the plasma processing apparatus of the thirteenth solving means, in the plasma processing, the processing gas or the like supplied to the plasma processing space from one flat plate side without the substrate is generally not from the same one flat plate side. Flows out from the plasma processing space via a gap on the other flat plate side of the plate.
Thereby, since it becomes easy to align a flow from upper direction to the downward direction, generation | occurrence | production of a backflow and a stay is suppressed.
Therefore, according to the present invention, the uniformity of the plasma state can be further improved.
[0057]
[Fourteenth Solution]
A thirteenth solution plasma processing apparatus (as described in claim 14 at the beginning of the application) is the twelfth and thirteenth solution plasma processing apparatus according to the pressure in the plasma processing space. And pressure control means for controlling the amount of advance and retreat of the movable wall by the wall drive mechanism.
[0058]
In the plasma processing apparatus of the fourteenth solution means, the pressure in the plasma processing space is automatically controlled by the pressure control means so as to be a desired vacuum pressure. In addition, at that time, since the automatic control is performed by controlling the advance / retreat amount of the movable wall body having good pressure controllability with respect to the plasma processing space, the pressure state of the plasma with respect to the set target such as the processing recipe of the plasma processing apparatus Follow quickly and accurately.
As a result, even if finer processing conditions are set than in the prior art, a plasma reaction exactly as set is performed.
Therefore, according to the present invention, more precise plasma processing can be performed on the substrate.
[0059]
DETAILED DESCRIPTION OF THE INVENTION
The plasma processing apparatus of the present invention achieved by such a solution is generally used by being mounted in an appropriate vacuum chamber. For this purpose, each of the mechanical parts such as one of the parallel plates in which the plasma generation space adjacent to the plasma processing space is formed and the adjacent mechanism are required to be easily incorporated into the vacuum chamber and have a degree of vacuum. In many cases, it is attached separately after being formed from the standpoint of balancing with the property, etc., but it is often fixed in close contact, for example, but part or all of them are the same / single member For example, the clad material may be integrally formed by processing or the like.
[0060]
【Example】
A specific configuration of a plasma etching apparatus as an embodiment of the plasma processing apparatus of the present invention will be described with reference to the drawings. FIG. 1 is a longitudinal sectional view of the main part thereof, FIG. 2 is a longitudinal sectional perspective view around the plasma generation chamber, and FIG. 3 is an enlarged view of one plasma generation space therein. FIG. 5 is a cross-sectional view showing a state where the vacuum chamber is mounted.
[0061]
This plasma etching apparatus generally includes a parallel plate portion (first mechanism) for securing a plasma processing space, an adjacent mechanism portion (second mechanism) for securing a plasma generation space and its additional portion, and each plasma. And an application circuit unit for applying an electric field or a magnetic field to the circuit.
The parallel flat plate portion is a pair of parallel flat plates and has a metal anode portion 11 and a cathode portion 12, and the anode portion 11 is disposed on the upper side so that the substrate 1 such as a wafer to be etched can be mounted thereon. A cathode portion 12 serving as a substrate support having an insulating surface on the upper surface is disposed below, and a plasma processing space 13 for the low-temperature plasma 10 is formed between the cathode portions 12. In addition, the anode portion 11 is preliminarily formed with a plurality of communication ports 14 penetrating therethrough and a processing gas supply port 15 as a second gas introduction path opened toward the plasma processing space 13. It has become. In this example, the ratio of the cross-sectional area of the communication port 14 to the effective cross-sectional area of the plasma processing space 13, that is, the first ratio is 0.05. The processing gas B supplied to the plasma processing space 13 through the processing gas supply port 15 is supplied with a reaction gas such as silane gas mixed with an appropriate amount of dilution gas. .
[0062]
The adjacent mechanism portion, that is, the mechanism adjacent to one flat plate 11 of the pair of parallel flat plates mainly includes an insulating plasma generation chamber 21, and the plasma generation chamber 21 serves as a plasma generation space 22. A plurality of (four in the figure) annular grooves are formed by being concentrically engraved. As a result, the plasma generation space 22 is dispersed. The plasma generation chamber 21 is fixed in a state where the opening side (lower surface in the drawing) of the plasma generation space 22 is in close contact with the upper surface of the anode portion 11. At that time, alignment is performed so that the opening of the plasma generation space 22 overlaps the communication port 14 of the anode portion 11. Thereby, the plasma generation space 22 and the plasma processing space 13 are adjacent to each other and communicated with each other. In this example, the ratio between the cross-sectional area of the communication port 14 and the cross-sectional area of the plasma generation space 22, that is, the second ratio is 0.5. As a result, the area where the plasma generation space 22 communicates with the plasma processing space 13 is smaller than the area of the plasma generation space 22 and slightly narrowed. Note that these ratio values can be freely changed as long as the magnitude relationship is not reversed.
[0063]
In the plasma generation chamber 21, a plasma gas supply path 23 as a first gas introduction path is formed in an annular shape further behind the plasma generation space 22, and both are communicated by a large number of small holes or nozzles. The plasma generation space 22 is supplied with a plasma generation gas A containing only a non-reactive gas component such as argon from the bottom (upper in the drawing) to generate a high-density plasma 20, and the plasma processing space 13 through the communication port 14. It is what sends it to.
Furthermore, the back surface (upper surface in the drawing) of the plasma generation space 22 is cut away so that the plasma generation chamber 21 leaves the side wall and the bottom surrounding the plasma generation space 22. And the coil 24 and the permanent magnet piece 25 are cyclically added so as to sandwich both side walls of the plasma generation space 22.
[0064]
The permanent magnet piece 25 has a vertical length substantially equal to that of the plasma generation space 22 and a magnetic pole directed in the direction of the horizontal plasma generation space 22, and a small piece for cutting off the annular undesired induced current. It is formed separately. A large number of permanent magnet pieces 25 are arranged along the side wall of the plasma generation space 22, thereby forming an annular magnetic circuit corresponding to the plasma generation space 22. As a result, the magnetic member 25 for the magnetic circuit is arranged at a place where the thing other than the outermost periphery is sandwiched between the plasma generation spaces 22. For the magnetic force of the magnetic circuit, a strength that can capture electrons with a small mass is sufficient, and a strength that captures even ions with a large mass is not necessary.
[0065]
The cross section of this magnetic circuit will be described in detail (refer to FIG. 3). The magnetic flux lines 26 coming out from the substantially upper half of the vertically long permanent magnet piece 25 draw a substantially concentric circle centered around the upper end of the permanent magnet piece 25. Thus, a magnetic peak is formed with the upper end of the permanent magnet piece 25 as the top. A substantially similar magnetic peak is formed at the lower end of the permanent magnet piece 25. Since the permanent magnet pieces 25 are attached to both sides of the plasma generation space 22, there are four magnetic peaks around the plasma generation space 22. Therefore, a so-called magnetic basin surrounded by magnetic mountains is formed in the plasma generation space 22. Then, electrons are supplemented here. Although described as a potential field wind, since it is actually a vector field, it is complicated to describe accurately. In short, electrons are sealed in a donut shape in the annular plasma generation space 22 as a whole. Note that it is also possible to create four magnetic peaks surrounding the cross section of the plasma generation space 22 by arranging the permanent magnet pieces with the magnetic poles up and down (see FIG. 4). Although not shown, it may be surrounded by five or more magnetic peaks.
[0066]
The application circuit unit is divided into a first application circuit centered on the RF power source 31 and a second application circuit centered on the RF power source 32.
The RF power supply 31 has a variable output power, and applies an alternating electric field to the grounded anode part and generates a bias voltage, so that its output is sent to the cathode part 12 via a blocking capacitor. Be sent. For this, a frequency of 500 KHz to 2 MHz is often used. As a result, the first application circuit applies an electric field that contributes to the enhancement of the low temperature plasma 10 to the plasma processing space 13 to some extent.
[0067]
The RF power source 32 also has a variable output power, and drives both coils 24 sandwiching the plasma generation space 22 to apply an alternating magnetic field to the plasma generation space 22. The maximum output power is large, and the frequency is often set to 13 MHz to 100 MHz. Thus, the second application circuit applies a magnetic field that contributes to generation and strengthening of the high-density plasma 20 to the plasma generation space 22.
[0068]
As for the pressure control means, the variable valve 4 in the conventional apparatus (see FIG. 13) is omitted, and instead, a movable wall body 40 and wall body drive mechanisms 41 to 44 for moving the same up and down are provided (FIG. 13). 5).
[0069]
The movable wall body 40 is made of a metal cylindrical body, and has an inner diameter slightly larger than the outer diameter of the cathode part 12 and is fitted into the inner cavity so that the cathode part 12 can move up and down loosely. When the upper end approaches the anode portion 11, a substantially identical gap is formed at the entire periphery. At that time, the movable wall body 40 is formed to have such a length that the upper portion closes the periphery of the side surface of the plasma processing space 13 and the lower portion reaches a position where the fitting with the cathode portion 12 cannot be removed. Thereby, the movable wall 40 has a shape that covers the opening portion of the plasma processing space 13 that is provided in the vacuum chambers 2 and 3 and is based on the pair of parallel plates 11 and 12. The movable wall 40 is also grounded so as not to be charged up undesirably.
[0070]
The wall body driving mechanism connects the bottom surface of the vacuum chamber main body 2 and the movable wall body 40 at a position where the bellows 41 having airtightness and stretchability do not overlap the suction port 2a, and a ball screw 42 is provided in the bellows 41. It is loosely inserted vertically, and its upper end is connected to the movable wall body 40 to support the movable wall body 40 so as to be movable up and down. Further, the lower end of the ball screw 42 is connected to the rotating shaft of the motor 44 fixed to the vacuum chamber main body 2 by the support 43. When the motor 44 rotates, the ball screw 42 is driven back and forth accordingly, and the movable wall body 40 is driven up and down accordingly, so that the upper side is substantially in contact with the anode unit 11 and the lower side is the upper surface of the cathode unit 12. The movable wall body 40 moves to a lower place. As a result, the wall drive mechanisms 41 to 44 have both an upper position where the movable wall 40 covers the opening of the plasma processing space 13 and a lower position where the movable wall 40 releases the opening of the plasma processing space 13. The movable wall body 40 is moved up and down over the position.
[0071]
Although not shown in the figure, the vacuum pressure gauge 4b is attached to the movable wall 40 so as to directly detect the pressure in the plasma processing space 13, and the detection signal is transmitted through the lumen of the bellows 41 or the like. It can be taken out without breaking the vacuum. Then, the rotation amount and the rotation speed of the motor 44 are controlled by the PID control circuit 4c receiving the detection signal. As a result, the plasma etching apparatus includes pressure control means for controlling the amount of movement of the movable wall body 40 by the wall body driving mechanisms 41 to 44 in accordance with the pressure in the plasma processing space 13.
[0072]
The use mode and operation of the plasma etching apparatus of this embodiment will be described with reference to the drawings. FIG. 5 is a cross-sectional view showing a state in which the main part described above is mounted in a vacuum chamber, FIG. 6 is a graph showing energy distribution of electrons in plasma, and FIG. 7 is a controllable range of ion ratio in plasma. FIG.
[0073]
Prior to use, the cathode portion 12 of the plasma etching apparatus is implanted through the lower support 12a in the center of the box-shaped vacuum chamber main body portion 2 whose top is released. The vacuum chamber main body 2 is attached with the plasma generation chamber 21 and the anode 11 and can be cooled with water. When the vacuum chamber main body 2 is closed, the inside of the vacuum chamber main body 2 as well as the plasma processing space 13 and the plasma generation space 22 are also formed. Sealed. Then, the movable wall body 40 is lowered below the cathode portion 12, and in this state, the horizontal substrate 1 is carried into the vacuum chambers 2 and 3 from the side, and this substrate 1 is placed on the upper surface of the cathode portion 12. Is done. Then, vacuuming by the vacuum pump 5 is performed at the same time as the substrate carry-in port or the like is closed. At this time, since the gate valve 4a remains open and the variable valve 4 does not exist, the vacuum chambers 2 and 3 are quickly evacuated.
[0074]
Then, the motor 44 is rotated to raise the movable wall body 40 to the extent that it does not contact the anode portion 11, and further, the plasma gas A is supplied via the plasma gas supply path 23, and further through the processing gas supply port 15. When the supply of the processing gas B is appropriately started, the pressure in the plasma processing space 13 is appropriately maintained by the throttle portion 49 formed between the upper end of the movable wall body 40 and the lower surface of the anode portion 11. That is, the vacuum pressure in the plasma processing space 13 is detected by the vacuum pressure gauge 4b attached to the movable wall body 40, and a control signal is generated by the PID control circuit 4c based on the difference between this detected value and a predetermined set target value. The motor 44 is rotated in accordance with this control signal and the ball screw 42 is advanced and retracted to move the movable wall 40 up and down.
[0075]
Specifically, when the degree of vacuum in the plasma processing space 13 decreases and the absolute pressure increases too much, the movable wall body 40 is driven so as to descend, and the throttle portion 49 opens and the plasma processing space 13 is opened. The pressure quickly decreases to a predetermined pressure. Conversely, when the degree of vacuum in the plasma processing space 13 increases and the absolute pressure decreases too much, the movable wall body 40 is driven to rise, the throttle 49 is closed and the pressure in the plasma processing space 13 is reduced. It quickly rises to a predetermined pressure.
Thus, the pressure control means using the movable wall body 40 and the wall body drive mechanisms 41 to 44 as pressure control mechanisms are automatically controlled so that the vacuum pressure in the vacuum chamber quickly becomes the set pressure.
[0076]
Further, the throttle 49 is formed so as to expand substantially uniformly around the upper portion of the plasma processing space 13, and depending on the difference between the pressure in the plasma processing space 13 and the pressure in the vacuum chamber outside the plasma processing space 13, where the throttle 49 is located. However, since the flow of the passing fluid such as gas is substantially the same, the gas state in the plasma processing space 13 is almost symmetrical and highly uniform. Further, since such a pressure control state continues even when plasma is formed in the plasma processing space 13, the state of the low temperature plasma 10 in the etching process described below is also almost symmetrical and highly uniform. .
Thus, the preparation for the plasma etching process for the substrate 1 mounted on the cathode portion 12 is completed.
[0077]
Next, when the RF power source 32 is operated, an RF electromagnetic field is applied to the plasma generation space 22 via the coil 24, and the electrons of the plasma gas A are vigorously moved. At this time, the electrons stay in the plasma generation space 22 for a long time by the action of the magnetic circuit by the permanent magnet piece 25, and fly around in the annular space while spirally exciting the plasma gas A. In this way, the high-density plasma 20 is generated, but the electrons sealed in the plasma generation space 22 contain a large amount of electrons having a high energy of 10 to 15 eV or more that greatly contribute to the generation of ion species (FIG. 6A )), The high-density plasma 20 has a high ratio of ionic species components. The high-density plasma 20 expanded in the plasma generation space 22, in particular, the radical species and ionic species components are quickly transferred to the plasma processing space 13 by the expansion pressure.
[0078]
When the RF power source 31 is operated, an RF electric field is also applied to the plasma processing space 13 via the anode part 11 and the cathode part 12. Since there is no magnetic circuit or the like for containing electrons, high-density plasma cannot be produced even when the processing gas B or the like is excited. When only the power from the RF power source 31 is used, the low temperature plasma 10 has few electrons having energy of 10 to 15 eV or more (see the one-dot chain line graph in FIG. 6A), and thus the ratio of the radical species component is high. . However, in the case of the low-temperature plasma 10 in this apparatus, since the above-described high-density plasma 20 is mixed, the ratio of the actual radical species component to the ionic species component is any ratio between the two.
[0079]
When the output of the RF power source 32 is increased, electrons of 10 to 15 eV or more in the plasma generation space 22 increase (see FIG. 6B). And the production amount of the high-density plasma 20 increases. As a result of the mixing, the ratio of the ion species component is raised in the low temperature plasma 10. On the other hand, when the output of the RF power source 32 is lowered, electrons of 10 to 15 eV or more in the plasma generation space 22 are reduced (see FIG. 6C). And the production amount of the high-density plasma 20 decreases. As a result of the mixing, the ratio of the ion species component in the low temperature plasma 10 is lowered.
[0080]
Furthermore, when the output of the RF power supply 32 is slightly lowered while the output of the RF power supply 31 is increased, the following is obtained. First, as the output of the RF power source 31 is increased, the electron density in the plasma processing space 13 shifts to a higher density and higher energy side (see the one-dot chain line in FIG. 6D), and low-temperature plasma in the plasma processing space 13 increases. This increases the radical concentration there, but at the same time increases the ion ratio slightly. Next, as the output of the RF power source 32 is reduced, the electron density in the plasma generation space 22 is shifted to a low density and low energy side (see FIG. 6 (d) two-dot chain line), and the high density plasma in the plasma generation space 22 is slightly increased. decrease. As a result, the radical concentration and the ion ratio are lowered. However, since the high energy component is originally large, the ion ratio is greatly lowered even if the output is slightly reduced. When such a high-density plasma 20 is mixed with the low-temperature plasma 10 in the plasma processing space 13, the increase or decrease in the ion ratio is almost offset, while the radical concentration increases. That is, the plasma concentration of the low temperature plasma 10 is increased without much changing the ratio of the radical species component and the ion species component. Similarly, when the outputs of the RF power sources 31 and 32 are increased or decreased in the opposite direction, the plasma concentration of the low temperature plasma 10 is lowered.
[0081]
In this way, the low temperature plasma 10 is easily variably controlled in the ratio between the radical species component and the ion species component, and the variable range is wide enough to cover almost all conventional models (see FIG. 7). Note that FIG. 7 and FIG. 6 described above are schematic diagrams for explaining qualitative and relative properties). Then, the etching process proceeds efficiently under the optimum conditions for the etching at that time, that is, under conditions that were difficult to set in the prior art (see point a in FIG. 7).
Further, when the optimum condition changes due to a change in the component of the processing gas B, the outputs of the RF power sources 31 and 32 are adjusted as appropriate. Moreover, this adjustment is automatically performed if it is set in advance as a so-called recipe. As a result, the etching process efficiently proceeds again under the optimum conditions (see point b in FIG. 7). Thus, the etching process can always be performed efficiently.
[0082]
In this apparatus, since the cross-sectional area of the plasma generation space 22 is much smaller than the cross-sectional area of the plasma processing space 13 and the first ratio is much smaller than the second ratio, the high-density plasma 20 In addition to being quickly sent out from the plasma generation space 22 to the plasma processing space 13, the amount of gas that flows back into the plasma generation space 22 from the plasma processing space 13 is small so that the processing gas B is directly excited by the high-density plasma 20. It is almost never decomposed or ionized until it is undesired.
[0083]
When the etching process using the high-quality plasma proceeds efficiently in this way, the generation rate of the reaction product generated by the reaction of the low temperature plasma 10 with the substrate 1, that is, the amount of the reaction product generated per unit time increases. If this stays in the vacuum chamber, the quality of the plasma processing may deteriorate due to the reaction between the reaction product and the processing gas, etc., but the range of the gas pressure necessary for the plasma etching processing as described above. Is narrowed down to a minimum space by the anode part 11, the cathode part 12 and the movable wall body 40, and the vacuum chambers 2 and 3 surrounding it are sufficiently sucked and are in a vacuum state. Even if the generation amount of the reaction product increases, the reaction product is quickly exhausted without staying in the plasma processing space 13 for a long time.
Thus, the supply of high-quality plasma from the plasma generation space and the like, and the rapid discharge of reaction products by the movable wall body, etc., are combined, and the plasma etching process with excellent quality and processing speed is continued.
[0084]
Next, a plasma film forming apparatus (CVD) will be described. Basically, the structure may be substantially the same as that described above. The difference is that the cathode and the anode of the counter electrode are switched, and the film is formed. For example, monosilane or other active gas is used as the processing gas B, and the pressure in the plasma processing space is set to be slightly high (the degree of vacuum is low).
Also in this case, the ratio of the radical species component to the ion species component is easily variably controlled in the low temperature plasma 10, and the variable range is wide enough to cover almost all conventional models (FIG. 8). reference).
[0085]
Then, the film formation process proceeds efficiently under the optimum conditions for film formation at that time, that is, under conditions that were difficult to set in the past (see point a in FIG. 8). Further, when the optimum conditions change due to a change in the component of the processing gas B, etc., the film forming process can be carried out efficiently under the optimum conditions at any time by appropriately adjusting the outputs of the RF power sources 31 and 32 (in FIG. 8). The same applies to the point b). Thus, even when various materials such as polysilicon, metals such as aluminum and tungsten, oxide films, and nitride films are to be deposited, the plasma deposition apparatus of the present invention uses ions during plasma deposition. Since the ratio of radicals to radicals can be changed over a wide range, it is possible to freely select and set the optimum deposition conditions according to the film quality to be deposited and other applications, resulting in high production of high-quality films. Done by sex.
[0086]
As described above, these plasma processing apparatuses have a wide controllable range of the ion ratio in the plasma, and cover almost all of the conventional plasma etching apparatus and plasma CVD as well as the gap between them (see FIG. 9). ), And optimal plasma processing conditions can be freely selected and set. As a result, it is possible to efficiently perform a high-quality plasma treatment.
[0087]
Finally, another configuration example of the plasma processing apparatus of the present invention will be described. The plasma processing apparatus shown in FIGS. 10 to 12 is various modifications of the movable wall body 40 in the above-described apparatus. In any case, the movable wall body 40 is raised to open the opening portion of the plasma processing space 13. It is processed into a shape that creates a gap that becomes a constriction of the passing fluid between the cathode portion (substrate support) 12 and the cathode portion (substrate support) 12 when in the covering position. The anode portion 11 has the same outer diameter as the cathode portion 12 and is fitted into the inner cavity of the movable wall body 40.
[0088]
The movable wall body 40a of the first modified example shown in FIG. 10 is formed in a stepped state with the lower part of the lumen widened, and the ball screw 42 and the like are at the lowest end so that they do not interfere with the cathode portion 12. However, while being supported by the ball screw 42, a throttle portion 49a for the fluid is formed by the lower end portion of the small-diameter portion of the lumen and the upper edge portion of the cathode portion 12.
[0089]
The movable wall body 40b of the second modification shown in FIG. 11 has a large number of perforations 49b formed at a height corresponding to the upper edge of the cathode portion 12, and is dispersed at the openings 49b. A diaphragm is formed.
[0090]
The movable wall body 40c of the third modified example shown in FIG. 12 is such that the angled portion of the plasma processing space 13 is reduced by further rounding the side surface 49c of the movable wall body, thereby opening the opening. This is intended to mitigate the influence of non-uniformity that may reach the inside of the plasma processing space 13 due to a rapid change in the flow near 49b.
[0091]
【The invention's effect】
As is clear from the above description, in the plasma processing apparatus of the first and second solving means of the present invention, the ion species is contained in the plasma generation space by changing the cross-sectional area ratio between the plasma generation space and the plasma processing space. By making it possible to avoid stopping for a long time, both the request to optimize and control the plasma component ratio positively, ensure the uniformity of plasma distribution, and prevent gas flow from the plasma processing space to the plasma generation space As a result, there is an advantageous effect that a plasma processing apparatus that supplies high-quality plasma can be realized.
[0092]
In the plasma processing apparatus of the third solving means of the present invention, since the electrons are surely sealed in the plasma generation space, the optimization and controllability of the plasma component ratio is positively improved and the plasma is improved. Responding to both demands of ensuring uniformity of distribution and preventing gas flow from the plasma processing space to the plasma generation space, the result was that it was possible to realize a plasma processing apparatus that supplies high-quality plasma. Play.
[0093]
Furthermore, in the plasma processing apparatus of the fourth solution of the present invention, the cross-sectional area ratio between the plasma generation space and the plasma processing space is changed so that the ion species do not stop in the plasma generation space for a long time. In addition, by ensuring that electrons are sealed in the plasma generation space, the optimization and controllability of the plasma component ratio is positively improved, and the uniformity of the plasma distribution is ensured and the plasma processing space is transferred to the plasma generation space. As a result, there is an advantageous effect that a plasma processing apparatus that supplies high-quality plasma can be realized.
[0094]
Further, in the plasma processing apparatus of the fifth solution of the present invention, the generated plasma is made uniform and the design and manufacture of the magnetic circuit can be facilitated by dispersing while keeping the unit. There is an advantageous effect that it was possible.
[0095]
Furthermore, in the plasma processing apparatus according to the sixth solution of the present invention, since a strong electromagnet is not required, it is possible to achieve design simplification, apparatus miniaturization, and cost reduction. There is a great effect.
[0096]
In the plasma processing apparatuses of the seventh and eighth solving means of the present invention, the plasma component ratio and the plasma concentration can be set independently, thereby further improving the efficiency of the plasma processing. There is an advantageous effect that it was possible.
[0097]
In the plasma processing apparatus of the ninth solving means of the present invention, the area ratio when the plasma generation space is viewed from the plasma processing space is smaller than when the plasma generation space is simply opened to the plasma processing space. As a result, it is possible to further suppress the inflow of undesired gas into the plasma generation space, and to add the velocity component in the vertical direction to the ion species. Yes.
[0098]
In the plasma processing apparatus of the tenth solving means of the present invention, the processing gas is supplied to the plasma processing without being passed through the plasma generation space, so that the processing gas is supplied to the plasma processing. There is an advantageous effect that it has been possible to reliably avoid the alteration by the high density plasma before.
[0099]
Further, in the plasma processing apparatus of the eleventh solution of the present invention, it is possible to provide a higher quality plasma by preventing the reactive gas from being directly exposed to the high density plasma. Further, there is an advantageous effect that ionic species can be generated arbitrarily.
[0100]
In the plasma processing apparatus of the twelfth solving means of the present invention, the pressure control object is narrowed from the large volume chamber internal pressure to the small volume plasma processing space, while the flow form is the suction of the vacuum chamber wall. By relying on a movable wall body that is easy to disperse uniformly without being controlled by the mouth, it is possible to realize a plasma processing apparatus with excellent pressure controllability in addition to supplying uniform and high-quality plasma. There is an advantageous effect that it was made.
[0101]
Moreover, in the plasma processing apparatus of the thirteenth solving means of the present invention, since the flows are aligned in one direction, there is an advantageous effect that the plasma uniformity can be further improved.
[0102]
In the plasma processing apparatus of the fourteenth solving means of the present invention, automatic control is performed by controlling the amount of advance and retreat of the movable wall body with good pressure controllability with respect to the plasma processing space. There is an advantageous effect that it has become possible to apply a more precise plasma treatment to the substrate.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view of a main part of a plasma etching apparatus as an embodiment of a plasma processing apparatus of the present invention.
FIG. 2 is a longitudinal sectional perspective view around the plasma generation space.
FIG. 3 is an enlarged view of one of the plasma generation spaces.
FIG. 4 shows a modification of the magnetic circuit.
FIG. 5 is a cross-sectional view showing a mounting state in a vacuum chamber.
FIG. 6 is an energy distribution of electrons in plasma.
FIG. 7 shows a controllable range of the ion ratio in the plasma etcher.
FIG. 8 shows a controllable range of the ion ratio in plasma CVD.
FIG. 9 shows a controllable range of the ion ratio in plasma.
FIG. 10 is a first modification of the movable wall body.
FIG. 11 is a second modification of the movable wall body.
FIG. 12 is a third modification of the movable wall body.
FIG. 13 shows a conventional plasma processing apparatus.
FIG. 14 is a predicted structural view when the chamber is reduced.
[Explanation of symbols]
1 Substrate (processed object, wafer)
2 Vacuum chamber body (vacuum chamber)
2a Suction port
2b baffle plate
3 Vacuum chamber lid (vacuum chamber)
4 Variable valves (variable throttle, pressure control mechanism, pressure control means)
4a Gate valve (gate valve)
4b Vacuum pressure gauge (pressure detector, pressure control means)
4c PID control circuit (pressure control circuit, pressure control means)
5 Vacuum pump
10 Low temperature plasma
11 Anode section (one of parallel plates, first application circuit, first mechanism)
11a Upper support
12 Cathode (the other of the parallel plates, the first application circuit, the first mechanism, the substrate support)
12a Lower support
13 Plasma processing space
14 Communication port
15 Processing gas supply port (second gas introduction path)
20 High density plasma
21 Plasma generation chamber (adjacent mechanism, second mechanism)
22 Plasma generation space
23 Gas supply path for plasma (first gas introduction path)
24 Coil (second application circuit)
25 Permanent magnet piece (magnetic member for magnetic circuit)
26 Magnetic flux lines (magnetic circuit)
31 RF power supply (first application circuit)
32 RF power supply (second application circuit)
40, 40a, 40b, 40c Movable wall (variable aperture)
41 Bellows (bellows, wall drive mechanism)
42 Ball screw (advance / retreat drive shaft, wall drive mechanism)
43 Support (support, wall drive mechanism)
44 Motor (electric motor, wall drive mechanism)
49, 49a Aperture part
49b opening
49c Inside the movable wall

Claims (6)

A first mechanism formed with a plasma processing space; and a second mechanism attached to the first mechanism and formed with a plasma generation space, wherein the plasma generation space is adjacent to the plasma processing space; In the plasma processing apparatus in communication,
In the first mechanism, the plasma processing space is formed between a pair of parallel flat plates serving as counter electrodes,
In the second mechanism, the plasma generation space is annularly formed in an adjacent mechanism portion of one flat plate of the pair of parallel flat plates to form a dispersed space , and in the one flat plate A cross-sectional area communicating with or opening the plasma processing space is smaller than a cross-sectional area of the plasma generation space;
A first RF power source that applies high-frequency power to the pair of parallel plates in order to apply an alternating electric field that contributes to plasma enhancement in the plasma processing space between the pair of parallel plates;
A coil whose output is controllable independently of the first RF power source, and is arranged across the plasma generation space in order to apply an alternating magnetic field that contributes to the generation and strengthening of plasma to the plasma generation space And a second RF power source for applying high-frequency power to the plasma processing apparatus.   The plasma processing apparatus according to claim 1, further comprising a magnetic circuit made of a magnetic member arranged with the plasma generation space interposed therebetween.   The plasma processing apparatus according to claim 2, wherein the magnetic member is a permanent magnet or a DC exciting coil.   The first gas introduction path for introducing a plasma gas into the plasma generation space and the second gas introduction path for introducing a processing gas into the plasma processing space are individually provided. The plasma processing apparatus according to any one of 1 to 3.   5. The plasma processing according to claim 4, wherein a gas containing a reactive gas component is supplied to the second gas introduction path and only a non-reactive gas is supplied to the first gas introduction path. apparatus.   6. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus is either a deposition processing apparatus or an etching processing apparatus.

Images