JP3997303B2 - 平滑性を損なわない基板および基板表面の改質方法 - Google Patents
平滑性を損なわない基板および基板表面の改質方法 Download PDFInfo
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- JP3997303B2 JP3997303B2 JP2003291198A JP2003291198A JP3997303B2 JP 3997303 B2 JP3997303 B2 JP 3997303B2 JP 2003291198 A JP2003291198 A JP 2003291198A JP 2003291198 A JP2003291198 A JP 2003291198A JP 3997303 B2 JP3997303 B2 JP 3997303B2
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- Prior art keywords
- substrate
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- silane compound
- mica
- substrate surface
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- 239000000758 substrate Substances 0.000 title claims description 65
- 238000002715 modification method Methods 0.000 title claims description 6
- 229910000077 silane Inorganic materials 0.000 claims description 27
- -1 silane compound Chemical class 0.000 claims description 23
- 239000010445 mica Substances 0.000 claims description 17
- 229910052618 mica group Inorganic materials 0.000 claims description 17
- 229910010272 inorganic material Inorganic materials 0.000 claims description 15
- 239000011147 inorganic material Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 8
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 8
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 7
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 4
- 239000005416 organic matter Substances 0.000 claims description 4
- 230000035484 reaction time Effects 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 238000003776 cleavage reaction Methods 0.000 claims description 2
- 230000007017 scission Effects 0.000 claims description 2
- 238000012986 modification Methods 0.000 description 10
- 230000004048 modification Effects 0.000 description 10
- 102000004169 proteins and genes Human genes 0.000 description 10
- 108090000623 proteins and genes Proteins 0.000 description 10
- 239000011368 organic material Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000000089 atomic force micrograph Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical group CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003100 immobilizing effect Effects 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 238000005442 molecular electronic Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
Description
DNA等を観察するための基板表面の改質方法としては、ガラス、雲母、シリコンウェハー等の無機材質基板の表面を3-aminopropyltriethoxysilaneによって修飾し、基板表面にアミノ基を共有結合させる方法(非特許文献1)、マグネシウムイオンにより基板表面を処理する方法(非特許文献2)、基板表面をポリマーコートする方法(非特許文献3)などがあった。
(実施例)
以下に本発明を図面に基づいて詳しく説明する。
Claims (4)
- 有機物を評価・観察・利用するための平滑表面を有する無機材質からなる基板であって、この基板は雲母を劈開して得られ、また基板表面は、一般式[I]で表されるシラン化合物によって被覆されていることを特徴とする基板。
ただし、Xはメチル基であり、R1, R2, R3の置換基の1つはメトキシ基もしくはエトキシ基もしくはクロロ基を表し、残りの2つはメトキシ基、エトキシ基、クロロ基、メチル基のいずれかで且つ同一種の重複を許した任意の組み合わせを表す。 - 平滑表面を有する雲母からなる基板上で有機物を評価・観察・利用するための表面改質方法において、前記雲母を窒素雰囲気下で劈開した後に、一般式[I]で表されるシラン化合物の蒸気に劈開面を接触させることを特徴とする平滑性を損なわない基板表面の改質方法。
ただし、Xはメチル基であり、R1, R2, R3の置換基の1つはメトキシ基もしくはエトキシ基もしくはクロロ基を表し、残りの2つはメトキシ基、エトキシ基、クロロ基、メチル基のいずれかで且つ同一種の重複を許した任意の組み合わせを表す。 - 前記シラン化合物がメチルトリメトキシシランであることを特徴とする請求項2記載の平滑性を損なわない基板表面の改質方法。
- 前記無機材質基板と前記シラン化合物の蒸気との接触条件が、シラン化合物量が反応容器容積の0.000001%以上0.1%以下、反応温度が4℃以上60℃以下、反応時間が1時間以上1週間以下であることを特徴とする請求項2記載の平滑性を損なわない基板表面の改質方法。
Priority Applications (1)
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JP2003291198A JP3997303B2 (ja) | 2003-08-11 | 2003-08-11 | 平滑性を損なわない基板および基板表面の改質方法 |
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JP2003291198A JP3997303B2 (ja) | 2003-08-11 | 2003-08-11 | 平滑性を損なわない基板および基板表面の改質方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005060759A JP2005060759A (ja) | 2005-03-10 |
JP3997303B2 true JP3997303B2 (ja) | 2007-10-24 |
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JP2003291198A Expired - Lifetime JP3997303B2 (ja) | 2003-08-11 | 2003-08-11 | 平滑性を損なわない基板および基板表面の改質方法 |
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JP (1) | JP3997303B2 (ja) |
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2003
- 2003-08-11 JP JP2003291198A patent/JP3997303B2/ja not_active Expired - Lifetime
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