JP3880727B2

JP3880727B2 - TEM cell

Info

Publication number: JP3880727B2
Application number: JP21333198A
Authority: JP
Inventors: 在▲フーン▼ 尹; 光胤趙
Original assignee: Electronics and Telecommunications Research Institute ETRI
Current assignee: Electronics and Telecommunications Research Institute ETRI
Priority date: 1997-11-29
Filing date: 1998-07-28
Publication date: 2007-02-14
Anticipated expiration: 2018-07-28
Also published as: JPH11174102A; KR100243090B1; KR19990043772A

Description

【０００１】
【発明の属する技術分野】
本発明は、電磁波耐性（ＥＭＳ）、電磁波障害（ＥＭＩ）等測定、アンテナ矯正等において必要な標準電磁波（平面波）を発生させるＹ型ＴＥＭセルに関する。
【０００２】
【従来の技術】
一般に、従来ＴＥＭ(transverse electromagnetic)セルの施設ではクローフォードＴＥＭセル（ＣｒａｗｆｏｒｄＴＥＭｃｅｌｌ）、ＧＴＥＭセル（Ｇｉｇａ−ＨｅｒｔｚＴＥＭｃｅｌｌ）、ＴＴＥＭセル（ＴｒｉｐｌｅＴＥＭｃｅｌｌ）、ＷＴＥＭセル（ＷｉｒｅＴＥＭｃｅｌｌ）、改良型ＧＴＥＭセル、自動測定用ＴＥＭセル、６端子ＴＥＭセル等種類が多いがこれらは大きく２種類に区分することができる。
【０００３】
すなわち、ＧＴＥＭセル（Ｇｉｇａ−ＨｅｒｔｚＴＥＭｃｅｌｌ）、ＴＴＥＭセル（ＴｒｉｐｌｅＴＥＭｃｅｌｌ）、ＷＴＥＭセル（ＷｉｒｅＴＥＭｃｅｌｌ）、改良型ＧＴＥＭセル等のように片面に入出力端子が存在する“一端ＴＥＭセル”と、クローフォードＴＥＭセル、非対称型ＴＥＭセル、自動測定用ＴＥＭセル、６端子ＴＥＭセルのように両面に入出力端子が存在する“両端ＴＥＭセル”に区分することができる。上記２種類とも電磁波障害測定、電磁波耐性測定、アンテナ矯正等に活用されるが、前者は遠域場に対する試験のみ可能であり、後者は遠域場のみならず近域場試験においても支援することができ、これらは互いに相違するものと見られる。
【０００４】
両端ＴＥＭセルは更に２種類に区分が可能である。すなわち、クローフォードＴＥＭセル、非対称型ＴＥＭセル、可変インピ−ダンス電磁波発生装置のように垂直分極のみ支援されるＴＥＭセルと、６端子ＴＥＭセル、自動測定用ＴＥＭセル、回転用円筒ＴＥＭセルのように垂直水平分極とも支援されるＴＥＭセルとに区分が可能である。
【０００５】
これらは、また、更に自動測定用ＴＥＭセル、回転型円筒ＴＥＭセルのように機械的に回転させるＴＥＭセルと、６端子ＴＥＭセルのように内部導体の給電選択により分極を調節する、すなわち電気的に調節するＴＥＭセルとに区分が可能である。後者は垂直・水平分極に対してのみ調節可能な反面、前者は任意の分極を調節することができる。しかし、後者は前者よりも構造が簡単であり製作も容易である。電気的に垂直・水平分極を調節することができる一端ＴＥＭセルにはＴＴＥＭセルがある。これは、両端ＴＥＭセル構造に変更が可能であるため、これらの中に包含してその特性を比較して見ると、次のとおりである。
【０００６】
６端子ＴＥＭセルは均一場領域が基準施設に比して大変広く確保することができ、電磁波の均一度が非常に良い反面、入力電力の有用度が落ちる問題点を有する。一方、ＴＴＥＭセルは均一場領域が狭く、電磁波の均一度が低いという特性を有している反面、６端子ＴＥＭセルより入力電力の有用度が高いという特性がある。
【０００７】
更に、これらはともに最大の均一度を提供するためには外部導体断面の構造を正四角形に維持しなければならない。このため、携帯ホーン、ダイーポール及びモノポ−ルアンテナを有する無線機器、各種コンピュータ機器、冷蔵庫のように幅が狭く高さが高い各種電気電子製品に対する電磁波耐性、電磁波障害等測定時、既存の施設は試験領域の空間活用度が低いためより大きい施設が必要となる問題点を有する。
【０００８】
両端ＴＥＭセルの大きさは可用周波数と反比例的関係がある。このため試験領域の空間活用度が低ければ可用周波数帯域がその程度狭くなるという問題点を有する。更に、ペイジャー、携帯ホーン等をはじめ無線機器感度及び矯正測定のようにすべての製品に対して測定をしなければならない場合、多量の施設の確保が必要であり非常に広い作業空間が必要であるという問題点がある。
【０００９】
【発明が解決しようとする課題】
したがって、本発明は上記の問題点が解消されるように垂直分極の標準電磁波を発生するため２個の内部導体を設け、水平分極の場合１個の内部導体を設け、垂直／水平分極ともに高い均一度を有するようにし、試験空間の活用を最適化したＹ型ＴＥＭセルを提供することにその目的がある。
【００１０】
上記の目的を達成するための本発明は、内部導体が上下側面ともに３個で構成され、被試験体を固定させながら回転テーブルのように回転させることができるように被試験体支持台が設けられた試験領域と、３個のＮ型コネクターが装着された同軸コネクター継ぎ目領域と、上記試験領域両端に上記同軸コネクターが装着されるように繋ぐテーパ領域から構成されることを特徴とする。
【００１１】
【発明の実施の形態】
以下に、添付した図面を参照して本発明を説明すると次のとおりである。
【００１２】
図１乃至図４は本発明によるＹ型ＴＥＭセルの構成図である。
【００１３】
図２及び図３に図示されたように本発明の構造を大きく区分すると、被調査体が置かれる試験領域１、テーパ領域２と、同軸ケーブルコネクターと本体が連結される同軸コネクター繋ぎ目領域３、及び伝達された電磁波を縦断する縦断領域に区分することができる。このとき、試験領域１は左端第１Ｎ型コネクター５と右端第１Ｎ型コネクター８が連結された第１内部導体１１、左端第２Ｎ型コネクター６と右端第２Ｎ型コネクター９が連結された第２内部導体１２、左端第３Ｎ型コネクター７と右端第３Ｎ型コネクター１０が連結された第３内部導体１３、中心第３外部導体１６、門２０（図１）、被調査体の状態を観察するための遮蔽窓２１（図１）、被調査体が固定配置される支持台４及び本体全体を支え移動自在になるように設計された支持台１９から構成される。
【００１４】
図４に図示された本発明の側断面図では、第２内部導体１２と第３内部導体１３が中心第３外部導体１６内に上下壁近くに設置され、より広い均一場領域を確保し、第１内部導体１１も外部導体の壁近くに設置され、より広い均一場領域を確保する。しかし、内部導体が外部導体壁に近寄れば近寄るほど均一場領域が広くなるが、反面、電磁波の均一度が悪くなる特性がある。
【００１５】
更に、第１，２及び３内部導体構造はすべて一般同軸ケーブルの特性インピーダンス（主に、５０オーム）で整合させなければならないため、第１，２及び３内部導体１１，１２及び１３の位置が固定されると、内部導体の幅が決定されなければならない。また、給電方式により５０オームの特性インピーダンスを有する構造が変更されるため、上記モデルにおいては第２，３内部導体１２及び１３は第１内部導体１１とは異なり反対位相の奇数モード（ｏｄｄｍｏｄｅ）給電（入力電圧の大きさが同じで１８０度位相差をもつように給電）により特性インピーダンス整合構造を決定する。
【００１６】
また、試験領域１に設置された被試験体支持台４は円板支持板２４上に円板２２を分離設置して回転可能にし、被試験体が円板２２上に設置されたとき円滑な回転をさせるためこれらの間にベアリング２３を設置する。被試験体支持台４、円板支持台２４及び円板２２は内部標準電磁波の歪曲を最小化させるためテフロンのように非導電体であり誘電率が低い材料で形成する。ベアリング２３は非導電体であるセラミックのように硬い材料で形成し、被試験体の回転状態及び位置把握が容易になるように目盛りをつける。
【００１７】
同軸コネクター繋ぎ目領域３には、同軸ケーブルと本体を連結するため第１外部導体１４を設置する。第１外部導体１４内部に第４内部導体２５を設置しテーパ領域２端の内部導体と連結し、その間に誘電体２６を挿入し固定させた。これらの構造は、すべてインピーダンス整合が維持されるように設計する。
【００１８】
テーパ領域２は、第２外部導体１５と第１，２，３内部導体１１，１２及び１３から構成され、被試験体領域の大きさを維持させるためテーパされた領域である。また、テーパ領域２は電磁波の歪曲がない範囲内で短く維持する。何故ならば、長くなると有効長さが増加して共振周波数が低くなるためである。
【００１９】
図５乃至図８はＴＥＭセルの電界値偏差分布図であり、図５は従来ＴＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図である。図６は従来６端子ＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図である。図７は本発明によるＹ型ＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図である
図８は本発明によるＹ型ＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図である。各図それぞれの右側の結果は水平偏波造成結果であり、左側は垂直偏波造成結果である。図５乃至図８は中心地点においての等方性電界プローブを利用して測定された結果に対して正規化した電界分布図を示し、本発明によるＹ型ＴＥＭセルの均一場領域が大きいことが判る。
【００２０】
特に、図８は、高さが高く幅が狭い被試験体に対する電磁波耐性及び障害測定のためのＹ型ＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図であり、従来ＴＴＥＭセル及び６端子ＴＥＭセルにおいて断面構造が正四角を維持できない場合に内部電磁波の均一度が低い特性を表すのとは異なり、本発明によるＹ型ＴＥＭセルは垂直及び水平分極ともに均一度が非常に安定していることが判る。このとき、均一場領域の大きさは０．３３ｍｘ０．４６７ｍであり、総入射電力が２Ｗａｔｔのとき中心から垂直電界が６．１１Ｖ／ｍ、水平電界は９．１４Ｖ／ｍと測定された。上記測定結果本発明によるＹ型ＴＥＭセルは冷蔵庫、コンピュータ、携帯ホーンのように幅が狭く高さが高い一般被試験体に対する電磁波障害及び耐性測定等に適している。
【００２１】
下記「表１」は１．２ｍｘ１．２ｍの従来ＴＥＭセル及びＹ型ＴＥＭセルの均一場領域大きさ及び２Ｗａｔｔ入力時中心においての電界強度を示している。
【００２２】

「表１」において従来ＴＴＥＭセルの均一場領域の大きさは０．２４ｍｘ０．２４ｍであり、既存の６端子ＴＥＭセルは０．３２５ｘ０．３２５ｍで、本発明によるＹ型ＴＥＭセルは０．３ｍｘ０．３３ｍであることが判った。本発明によるＹ型ＴＥＭセルは６端子ＴＥＭセルより均一場領域が僅か小さい、しかし従来ＴＴＥＭセルより広いことが判った。更に、「表１」においてのように同一の入射電力（２Ｗａｔｔ）を維持させたときの均一場領域中心における電界値は６端子ＴＥＭセルが最も低い反面、本発明によるＹ型ＴＥＭセルが最も高いことが判った。すなわち、Ｙ型ＴＥＭセルは低い電力で高い電磁波を発生させることができる。
【００２３】
【発明の効果】
上述したように本発明によるＹ型ＴＥＭセルは入射電力の有用度を高め、小さい入射電力でも高い標準電磁波発生が可能であり、電磁波の均一度を高め精密な電磁波耐性、電磁波障害及び矯正、受信機感度測定が可能になり、それのみならず携帯ホーンをはじめとするダイポール及びモノポールアンテナを有する無線機、各種コンピュータ機器、冷蔵庫等のように幅が狭く高さが高い各種電気、電子製品に対する空間活用が高い電磁波耐性、電磁波障害測定にも試験空間の活用度を高めるモデル製作が可能である。
【００２４】
試験領域の空間活用度を高める技術は周波数特性の面から見て非常に重要である。何故ならば、試験領域の断面が小さくなればなるほど遮断周波数が高くなり、可用周波数帯域を高めることができるためである。結局、Ｙ型ＴＥＭセルは既存施設に比して可用周波数帯域を相当上昇させる効果を有する。
【図面の簡単な説明】
【図１】本発明によるＹ型ＴＥＭセルの斜視図。
【図２】本発明によるＹ型ＴＥＭセルの正断面図。
【図３】本発明によるＹ型ＴＥＭセルの平断面図。
【図４】本発明によるＹ型ＴＥＭセルの側断面図。
【図５】従来ＴＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図。
【図６】従来６端子ＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図。
【図７】本発明によるＹ型ＴＥＭセルの１．２ｍｘ１．２ｍ断面大きさを有する５０オームの電界値偏差分布図。
【図８】半発明によるＹ型ＴＥＭセルの１．２ｍｘ１．６ｍ断面大きさを有する５０オームの電界値偏差分布図。
【符号の説明】
１：試験領域２：テーパ領域
３：同軸コネクター繋ぎ目領域４：被試験体支持台
５：左端第１Ｎ型コネクター６：左端第２Ｎ型コネクター
７：左端第３Ｎ型コネクター８：右端第１Ｎ型コネクター
９：右端第２Ｎ型コネクター１０：右端第３Ｎ型コネクター
１１：第１内部導体１２：第２内部導体
１３：第３内部導体１４：左端第１外部導体
１５：左端第２外部導体１６：中心第３外部導体
１７：右端第１外部導体１８：右端第２外部導体
１９：支持台２０：門
２１：遮蔽窓２２：円板
２３：ベアリング２４：円板支持板
２５：第４内部導体２６：誘電体[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a Y-type TEM cell that generates standard electromagnetic waves (plane waves) necessary for electromagnetic wave resistance (EMS), electromagnetic wave interference (EMI) measurement, antenna correction, and the like.
[0002]
[Prior art]
Generally, in a facility of a conventional TEM (transverse electromagnetic) cell, Crawford TEM cell (Crawford TEM cell), GTEM cell (Giga-Hertz TEM cell), TTEM cell (Triple TEM cell), WTEM cell (Wire TEM cell), improved type There are many types such as GTEM cell, TEM cell for automatic measurement, and 6-terminal TEM cell, but these can be roughly divided into two types.
[0003]
That is, “one-end TEM cell” having an input / output terminal on one side like a GTEM cell (Giga-Hertz TEM cell), a TTEM cell (Triple TEM cell), a WTEM cell (Wire TEM cell), an improved GTEM cell, etc. , Crawford TEM cells, asymmetrical TEM cells, automatic measurement TEM cells, and 6-terminal TEM cells can be divided into “both-end TEM cells” having input / output terminals on both sides. Both types are used for electromagnetic interference measurement, electromagnetic wave immunity measurement, antenna correction, etc. The former can only be used for far field tests, and the latter should support not only far field but also near field tests. And they appear to be different from each other.
[0004]
Both-end TEM cells can be further divided into two types. That is, like a Crawford TEM cell, an asymmetric TEM cell, a TEM cell that supports only vertical polarization, such as a variable impedance electromagnetic wave generator, a 6-terminal TEM cell, an automatic measurement TEM cell, and a rotating cylindrical TEM cell It can be divided into TEM cells that are also supported by vertical and horizontal polarization.
[0005]
They also adjust the polarization by selecting the power supply of the inner conductor, such as a TEM cell for automatic measurement such as a TEM cell for automatic measurement, a rotating cylindrical TEM cell, and a 6-terminal TEM cell. Can be divided into TEM cells to be adjusted. The latter can be adjusted only for vertical and horizontal polarization, while the former can adjust any polarization. However, the latter has a simpler structure and is easier to manufacture than the former. One-end TEM cells that can electrically adjust vertical and horizontal polarization include a TTEM cell. Since this can be changed to the double-ended TEM cell structure, it is as follows when it is included in these to compare the characteristics.
[0006]
The 6-terminal TEM cell can ensure a uniform field area very widely compared to the standard facility, and the uniformity of electromagnetic waves is very good, but the usefulness of input power is reduced. On the other hand, the TTEM cell has the characteristics that the uniform field region is narrow and the electromagnetic wave uniformity is low, but the input power is more useful than the 6-terminal TEM cell.
[0007]
Furthermore, both of these must maintain the structure of the outer conductor cross-section as a regular square in order to provide maximum uniformity. Therefore, existing facilities are tested when measuring electromagnetic wave resistance, electromagnetic interference, etc. for various electronic devices such as portable devices, wireless devices with dipoles and monopole antennas, various computer devices, and refrigerators with narrow width and high height. There is a problem that a larger facility is required because the space utilization of the area is low.
[0008]
The size of the both-end TEM cell is inversely related to the usable frequency. For this reason, if the space utilization of the test area is low, there is a problem that the available frequency band becomes narrow to that extent. In addition, if all products must be measured, such as the sensitivity and correction of wireless devices such as pagers and portable horns, it is necessary to secure a large amount of facilities and a very large work space is required. There is a problem.
[0009]
[Problems to be solved by the invention]
Therefore, the present invention provides two internal conductors to generate vertical polarized standard electromagnetic waves so as to eliminate the above-mentioned problems, and in the case of horizontal polarization, one internal conductor is provided, and both vertical / horizontal polarization is high. The purpose is to provide a Y-type TEM cell that has uniformity and that optimizes the utilization of the test space.
[0010]
In order to achieve the above object, the present invention provides a device under test base that is configured with three inner conductors on both the upper and lower sides and can be rotated like a turntable while the device under test is fixed. The test area is composed of a joint area where the three N-type connectors are attached, and a taper area where the coaxial connectors are attached to both ends of the test area.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described with reference to the accompanying drawings.
[0012]
1 to 4 are configuration diagrams of a Y-type TEM cell according to the present invention.
[0013]
As shown in FIGS. 2 and 3, the structure of the present invention is roughly divided into a test area 1 where a test object is placed, a taper area 2, and a coaxial connector joint area 3 where a coaxial cable connector and a main body are connected. , And the transmitted electromagnetic wave can be divided into longitudinal regions that longitudinally intersect. At this time, the test area 1 includes a first inner conductor 11 to which the left end first N-type connector 5 and the right end first N-type connector 8 are connected, and a second inner part to which the left end second N-type connector 6 and the right end second N-type connector 9 are connected. For observing the state of the conductor 12, the third inner conductor 13, the center third outer conductor 16, the gate 20 (FIG. 1), the left third N-type connector 7 and the right third N-type connector 10 connected, The shielding window 21 (FIG. 1), the support base 4 on which the object to be examined is fixedly arranged, and the support base 19 designed to support and move the entire main body are configured.
[0014]
In the side sectional view of the present invention shown in FIG. 4, the second inner conductor 12 and the third inner conductor 13 are installed near the upper and lower walls in the central third outer conductor 16 to ensure a wider uniform field region, The first inner conductor 11 is also installed near the wall of the outer conductor to ensure a wider uniform field region. However, the closer the inner conductor is to the outer conductor wall, the wider the uniform field region, but on the other hand, there is a characteristic that the uniformity of the electromagnetic wave is worsened.
[0015]
Furthermore, since the first, second and third inner conductor structures must all be matched with the characteristic impedance of the general coaxial cable (mainly 50 ohms), the positions of the first, second and third

inner conductors

11, 12 and 13 are Once fixed, the width of the inner conductor must be determined. In addition, since the structure having a characteristic impedance of 50 ohms is changed depending on the feeding method, in the above model, the second and third

inner conductors

12 and 13 are different from the first inner conductor 11 in the odd phase (odd mode). The characteristic impedance matching structure is determined by feeding (feeding so that the input voltage has the same magnitude and a phase difference of 180 degrees).
[0016]
In addition, the DUT support base 4 installed in the test area 1 can be rotated by separating and installing the disc 22 on the disc support plate 24, and smooth when the DUT is installed on the disc 22. A bearing 23 is installed between them for rotation. The DUT 4, the disk support 24 and the disk 22 are made of a non-conductive material having a low dielectric constant, such as Teflon, in order to minimize distortion of the internal standard electromagnetic wave. The bearing 23 is formed of a hard material such as ceramic which is a non-conductive material, and is calibrated so that the rotational state and position of the device under test can be easily grasped.
[0017]
A first outer conductor 14 is installed in the coaxial connector joint region 3 to connect the coaxial cable and the main body. A fourth inner conductor 25 was installed inside the first outer conductor 14 and connected to the inner conductor at the end of the taper region 2, and a dielectric 26 was inserted and fixed therebetween. These structures are all designed so that impedance matching is maintained.
[0018]
The tapered region 2 is composed of a second outer conductor 15 and first, second, and third

inner conductors

11, 12, and 13, and is a tapered region for maintaining the size of the device under test region. Further, the tapered region 2 is kept short within a range where there is no electromagnetic wave distortion. This is because as the length increases, the effective length increases and the resonance frequency decreases.
[0019]
5 to 8 are electric field value deviation distribution diagrams of the TEM cell, and FIG. 5 is an electric field value deviation distribution diagram of 50 ohms having a 1.2 mx 1.2 m cross-sectional size of the conventional TEM cell. FIG. 6 is a 50 ohm electric field value deviation distribution diagram of a conventional 6-terminal TEM cell having a 1.2 mx 1.2 m cross-sectional size. 7 is a 50 ohm electric field value deviation distribution diagram having a 1.2 mx 1.2 m cross-sectional size of a Y-type TEM cell according to the present invention. FIG. 8 is a 1.2 mx 1.2 m cross-sectional size of a Y-type TEM cell according to the present invention. It is an electric field value deviation distribution map of 50 ohms. The results on the right side of each figure are the results of horizontal polarization creation, and the results on the left are the results of vertical polarization creation. FIG. 5 to FIG. 8 show electric field distribution diagrams normalized with respect to the results measured using the isotropic electric field probe at the central point, and the uniform field region of the Y-type TEM cell according to the present invention is large. I understand.
[0020]
In particular, FIG. 8 is a 50 ohm electric field value deviation distribution diagram having a 1.2 mx 1.2 m cross-sectional size of a Y-type TEM cell for measuring electromagnetic wave immunity and damage to a test object having a high height and a narrow width. Unlike the conventional TEM cell and 6-terminal TEM cell, where the cross-sectional structure cannot maintain a regular square, the Y-type TEM cell according to the present invention is uniform in both vertical and horizontal polarization. Can be seen to be very stable. At this time, the size of the uniform field region was 0.33 mx 0.467 m, and when the total incident power was 2 Watts, the vertical electric field was measured from the center to 6.11 V / m, and the horizontal electric field was measured to be 9.14 V / m. Results of Measurement The Y-type TEM cell according to the present invention is suitable for measuring electromagnetic interference and resistance against a general test object having a narrow width and a high height such as a refrigerator, a computer, and a portable horn.
[0021]
“Table 1” below shows the uniform field region size and the electric field strength at the center at the time of 2 Watt input of the conventional TEM cell of 1.2 mx 1.2 m and the Y-type TEM cell.
[0022]

In Table 1, the size of the uniform field region of the conventional TTEM cell is 0.24 mx 0.24 m, the existing 6-terminal TEM cell is 0.325 x 0.325 m, and the Y-type TEM cell according to the present invention is 0.3 mx 0. It was found to be 33m. It has been found that the Y-type TEM cell according to the present invention has a slightly smaller uniform field region than the 6-terminal TEM cell, but wider than the conventional TTEM cell. Further, as shown in “Table 1”, the electric field value at the center of the uniform field region when the same incident power (2 Watt) is maintained is the lowest in the 6-terminal TEM cell, whereas the Y-type TEM cell according to the present invention is the highest. I found out. That is, the Y-type TEM cell can generate high electromagnetic waves with low power.
[0023]
【The invention's effect】
As described above, the Y-type TEM cell according to the present invention increases the usefulness of incident power, can generate a high standard electromagnetic wave even with a small incident power, increases the uniformity of the electromagnetic wave, and precise electromagnetic wave resistance, electromagnetic wave interference and correction, reception. Sensitivity can be measured, but not only for radios with dipoles and monopole antennas such as portable horns, various computer equipment, refrigerators, etc. It is possible to produce a model that increases the degree of utilization of the test space for electromagnetic wave resistance and electromagnetic interference measurement with high space utilization.
[0024]
A technique for increasing the space utilization of the test area is very important from the viewpoint of frequency characteristics. This is because the cut-off frequency becomes higher as the cross section of the test area becomes smaller, and the usable frequency band can be increased. Eventually, the Y-type TEM cell has the effect of significantly increasing the available frequency band compared to existing facilities.
[Brief description of the drawings]
FIG. 1 is a perspective view of a Y-type TEM cell according to the present invention.
FIG. 2 is a front sectional view of a Y-type TEM cell according to the present invention.
FIG. 3 is a plan sectional view of a Y-type TEM cell according to the present invention.
FIG. 4 is a side sectional view of a Y-type TEM cell according to the present invention.
FIG. 5 is a 50 ohm electric field value deviation distribution diagram having a 1.2 mx 1.2 m cross-sectional size of a conventional TTEM cell.
FIG. 6 is a distribution diagram of electric field value deviation of 50 ohms having a 1.2 mx 1.2 m cross-sectional size of a conventional 6-terminal TEM cell.
7 is a 50 ohm electric field value deviation distribution diagram having a 1.2 mx 1.2 m cross-sectional size of a Y-type TEM cell according to the present invention. FIG.
FIG. 8 is an electric field value deviation distribution diagram of 50 ohms having a 1.2 mx 1.6 m cross-sectional size of a Y-type TEM cell according to the semi-invention.
[Explanation of symbols]
1: Test area 2: Tapered area 3: Coaxial connector joint area 4: DUT support base 5: Left first N-type connector 6: Left second N-type connector 7: Left third N-type connector 8: Right first N-type connector 9: Right end second N-type connector 10: Right end third N-type connector 11: First inner conductor 12: Second inner conductor 13: Third inner conductor 14: Left end first outer conductor 15: Left end second outer conductor 16: Center first 3 outer conductor 17: right end first outer conductor 18: right end second outer conductor 19: support base 20: gate 21: shielding window 22: disc 23: bearing 24: disc support plate 25: fourth inner conductor 26: dielectric body

Claims

An outer wall having an upper wall surface, a lower wall surface and a side wall surface, first, second and third inner conductors arranged in an inner space surrounded by these wall surfaces, and a device under test for mounting a device under test A test area for containing and testing the test object ;
A coaxial connector seam region disposed on each side of the test region and comprising three coaxial cable connectors for connecting the first, second and third inner conductors and a coaxial cable ;
A tapered region connecting both ends of the test region and the coaxial connector joint region;
Said second internal conductors, near the upper wall surface of said outer wall, said third inner conductor near the lower wall surface of the outer wall, is arranged respectively Rutotomoni, the said second internal conductor 3 The internal conductors of the first and second main surfaces are opposed to each other to form a space for accommodating the device under test. The first internal conductor is disposed near one of the side wall surfaces, and the second and second Facing the space between the three inner conductors, and its main plane is oriented to be orthogonal to the main planes of the second and third inner conductors,
The device under test support base is disposed between the second inner conductor and the third inner conductor,
A main plane of the first inner conductor, the distance between the side walls facing each other across a space for accommodating the test object is between the lower wall opposite from the main plane of the second inner conductor smaller than the distance, and, TEM cell, wherein less than the distance to the upper wall surface opposite from the main plane of the third inner conductor.

2. The test object support base according to claim 1, wherein the test object support base is a disk for supporting and rotating the test object, a disk support plate disposed under the disk, the disk and the disk. A TEM cell comprising a bearing disposed between a support plate and the bearing for facilitating the rotation.