JP3868606B2 - Pattern exposure device for plate-making roll - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a pattern exposure apparatus for a plate-making roll, and more particularly to a pattern exposure apparatus suitable for performing a plurality of exposures on the same plate-making roll.
[0002]
[Prior art]
A printing plate for gravure printing and an embossing plate for embossing are usually formed by forming a concavo-convex structure on the outer surface of a cylindrical plate-making roll. As a method for forming the concavo-convex structure, an engraving method for engraving with an embossing needle or a laser beam and a corrosion method for corroding with an etching solution are widely used. When the latter corrosion method is adopted, exposure using a pattern exposure apparatus is performed. That is, a photosensitive resist layer is coated on the plate-making surface of the plate-making roll (the outer peripheral surface of the roll), a predetermined pattern is baked on the resist layer, development is performed, and then an etching solution is acted on. A process of removing only the damaged portion by corrosion is performed.
[0003]
As a method for baking a pattern on a plate making surface of a plate making roll, a method using a film has been performed for a long time. In this method, a film on which a predetermined pattern is drawn as a binary image is wound around the outer peripheral surface of a plate-making roll coated with a resist layer, and light is irradiated to the film. On the other hand, a method of performing direct exposure by beam scanning without using a film has been actively performed in recent years. In this method, a pattern to be printed is prepared in the form of digital data, and based on this digital data, a beam such as a laser beam is scanned and irradiation / non-irradiation is controlled to draw a desired pattern on the plate-making surface. Become. A pattern exposure apparatus used for direct exposure using such a beam has a mechanism for scanning the beam based on digital pattern data.
[0004]
[Problems to be solved by the invention]
Generally, an uneven structure for expressing a planar two-dimensional pattern is formed on a printing plate for gravure printing or an embossing plate for embossing. However, recently, a proposal has been made to further improve the quality of products by forming a pattern having three-dimensional information as an uneven structure. For example, International Publication No. WO95 / 21060 based on the Patent Cooperation Treaty discloses a technique for expressing an uneven structure of a wood grain conduit groove on a wood grain wallpaper by embossing. According to this method, a conduit groove having a smaller diameter as the deeper part is formed by embossing. In order to create an embossed plate for a conduit groove having such a three-dimensional shape by a corrosion method, multiple patterns are prepared, and multiple exposure is performed by repeating processes such as printing, development, and corrosion for each pattern. There is a need. Therefore, alignment between a plurality of patterns is necessary.
[0005]
When baking the pattern, when the method using the film described above is employed, the pattern can be aligned when the film is wound around the outer peripheral surface of the plate-making roll. That is, when a film on which a second pattern is drawn is wound on a plate-making roll on which a first pattern has already been formed, the film is correctly positioned while grasping the positional relationship between both patterns with the naked eye. It is possible to match. However, when the method of performing direct exposure by beam scanning is employed, it is very difficult to align both patterns with a conventional pattern exposure apparatus. Since the conventional general pattern exposure apparatus originally does not assume a use form in which a plurality of patterns are exposed repeatedly on the same plate-making roll, the position of the plate-making roll at the time of the first exposure In particular, there is no mechanism for accurately aligning (in particular, the rotational position around the axis) and the position of the plate-making roll at the time of the second exposure. That is, when the second pattern is drawn with a beam on the plate-making roll on which the first pattern has already been formed, the first pattern can be confirmed with the naked eye. On the other hand, since the second pattern is a pattern prepared as digital data, the two cannot be aligned with the naked eye.
[0006]
For this reason, when performing multiple exposure using a pattern exposure apparatus that performs direct exposure by beam scanning, a reference line is drawn on the plate-making roll using a writing tool, and the like. Rough alignment is performed. However, when performing multiple exposure on a fine pattern having an order of 10 μm to 100 μm, such as a wood grain conduit groove, sufficient alignment cannot be obtained with such alignment based on the reference line. Of course, depending on the plate-making roll, there is a type in which a key that fits into a key groove provided in the chuck on the pattern exposure apparatus side is formed. If such a plate-making roll is used, the plate-making roll is used. Accurate alignment is possible by attaching the key on the roll side while being fitted in the key groove on the chuck side. However, there are various standards for combinations of keys and key grooves, and in reality, many keyless type plate-making rolls are currently used.
[0007]
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a pattern exposure apparatus for a plate-making roll capable of accurate alignment when performing direct multiple exposure by beam scanning.
[0008]
[Means for Solving the Problems]
(1) In the first aspect of the present invention, a predetermined pattern is formed by irradiating a beam onto a plate-making surface of a plate-making roll to be exposed. Multiple exposure In a pattern exposure apparatus for a plate roll to be made,
A chuck for gripping and fixing the axis of the plate-making roll;
A rotation driving means for rotating the chuck around the axis of the plate-making roll;
An exposure beam irradiating means having a beam generating unit for generating an exposure beam to be irradiated to the plate making surface of the plate making roll, and a beam scanning unit for scanning the generated beam in the axial direction of the plate making roll;
Should be exposed plural Show pattern Multiple sheets Pattern data storage means for storing pattern data;
A rotary encoder that detects the rotational position of the chuck;
Index detecting means for detecting an index provided on the plate-making roll at a predetermined position;
Based on the detection signal of the index detection means and the detection signal of the rotary encoder, a displacement amount detection means for obtaining a rotation angle displacement amount of the index with respect to the reference rotation position of the chuck;
While giving a rotation control signal to the rotation drive means, One sheet of pattern data selected sequentially from multiple sheets of pattern data A control means having a function of giving a pattern drawing signal to the exposure beam irradiation means based on the above, and a function of adjusting the timing of giving the pattern drawing signal according to the rotation angle displacement amount obtained by the displacement amount detection means;
Is provided.
[0009]
(2) According to a second aspect of the present invention, in the pattern exposure apparatus for the plate-making roll according to the first aspect described above,
The index detecting means has a device for optically detecting the intensity of reflected light from a fixed position on the rotational circumferential track surface of the plate making roll.
[0010]
(3) A third aspect of the present invention is the pattern exposure apparatus for the plate-making roll according to the first or second aspect described above,
Store in pattern data storage means For one piece Prepare pattern data in raster data format,
The head of the raster data is started to be supplied to the exposure beam irradiating means at the timing when the rotational position of the chuck indicated by the rotary encoder coincides with the rotational angular displacement obtained by the displacement detecting means.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described based on the illustrated embodiments. FIG. 1 is a block diagram showing a basic configuration of a pattern exposure apparatus for a plate-making roll according to an embodiment of the present invention. This apparatus has a function of exposing a predetermined pattern by irradiating the plate-making surface 110 of the plate-making roll 100 to be exposed. The plate-making surface 110 is usually made of a metal such as copper or iron, and has a surface coated with a photosensitive resist layer (hereinafter simply referred to as a resist layer). This pattern exposure apparatus irradiates the resist layer on the plate-making surface 110 with a beam, and performs an exposure process for forming a pattern including an exposed portion and a non-exposed portion. The plate-making roll 100 for which the exposure processing has been completed is developed in another developing device, and the exposed portion (in the case of a positive resist) or the non-exposed portion (in the case of a negative resist) of the resist layer is removed. become. Thereafter, when a corrosive solution is applied to the plate-making surface 110, the resist layer is removed and the exposed metal surface is corroded and recessed, and a concavo-convex structure corresponding to the exposed pattern is formed.
[0012]
As shown in FIG. 1, the basic components of this pattern exposure apparatus are a chuck 10, a rotation drive means 20, an exposure beam irradiation means 30, a rotary encoder 40, an index detection means 50, and a displacement detection. Means 60, pattern data storage means 70, and control means 80. In FIG. 1, the electric signal transmission path between the components is indicated by a solid arrow, the mechanical power transmission path is indicated by a white thick arrow, and the optical beam or signal transmission path is indicated by a broken line. This is indicated by the arrow.
[0013]
The chuck 10 is a component having a function of gripping and fixing the shaft of the plate-making roll 100, and is provided at both ends of the plate-making roll 100 as shown in the drawing. The plate-making roll 100 is a cylindrical cylinder that is driven to rotate around this axis about a rotation axis A indicated by a one-dot chain line in the figure, and a cylindrical shaft core 120 and a shaft end are provided at both ends thereof. A section 130 is provided. The chuck 10 includes three sets of gripping claws 11, and the shaft end portion 130 can be gripped and fixed by the three sets of gripping claws 11. FIG. 2 is a diagram illustrating a state in which the shaft end portion 130 is fixed by the chuck 10, and corresponds to a diagram of the chuck 10 illustrated in FIG. 1 as viewed from the direction along the rotation axis A. A circle drawn in the center of the figure indicates the position of the shaft end portion 130. The three sets of gripping claws 11 are slidable in the radial direction of the chuck 10, are slid in the center direction, and are fixed with the inner end face in contact with the outer peripheral face of the shaft end portion 130. Thus, the shaft end portion 130 can be firmly held and fixed.
[0014]
However, the illustrated chuck 10 shows an example of a structure of one form of a chuck that is currently generally used, and various other forms of chucks may be used. For example, some plate-making rolls 100 do not have the shaft core portion 120 and the shaft end portion 130, and there is a simple hollow cylindrical cylinder type. For such a type of plate making roll, separately prepared holder parts corresponding to the shaft core 120 and the shaft end 130 are fitted to both ends and then fixed to the chuck 10.
[0015]
The rotation driving means 20 is means for rotating the chuck 10 around the rotation axis A, and in this embodiment, is constituted by a driving device incorporating an electric motor. Based on the rotation control signal C given from the control means 80, the rotation driving means 20 has a function of rotating the chuck 10 at a predetermined rotation speed. In the illustrated example, the power from the rotation driving means 20 is transmitted only to the right chuck 10 of the pair of chucks 10, and the left chuck 10 simply holds and fixes the plate making roll 100. Have only.
[0016]
The exposure beam irradiating means 30 is an exposure beam B that irradiates the plate making surface 110 of the plate making roll 100 (in this example, a laser beam is used, but other charged particles such as an electron beam or an electromagnetic beam are used. A beam generating unit 31 that generates the beam B, and a beam scanning unit 32 that scans the generated beam B in the axial direction of the plate-making roll 100. When the plate making surface 110 is rotated by the rotation driving means 20, the exposure beam B can be scanned in the circumferential direction of the plate making surface 110, but the beam generating unit 31 is moved in the axial direction by the beam scanning unit 32. Then, the exposure beam B can be scanned in the direction of the rotation axis A of the plate-making surface 110. In this way, the exposure beam irradiation unit 30 performs a process of exposing the entire plate-making surface 110 by beam scanning based on the pattern drawing signal S given from the control unit 80. .
[0017]
The rotary encoder 40 has a function of detecting the rotational position of the chuck 10 as an electrical signal. In this example, the rotary encoder 40 has a function of outputting the rotation angle of the chuck 10 on the right side of the drawing as a rotation angle signal θ within a range of 0 ° to 360 °. The rotation angle signal θ indicates the absolute rotation angle position of the chuck 10 on the right side of the drawing, but does not indicate the absolute rotation angle position of the plate making roll 100. This is because the relative rotation angle position between the plate-making roll 100 and the chuck 10 is not always constant, and varies every time the mounting operation to the chuck 10 is performed. That is, as shown in FIG. 2, in the state where the shaft end portion 130 is gripped and fixed by the gripping claws 11, the relative rotational position of the plate making roll 100 and the chuck 10 is fixed, but the gripping claws 11 are loosened, If the plate-making roll 100 is removed from the chuck 10, the relative rotational positional relationship between the two is lost. The index detection means 50 and the displacement amount detection means 60 described below fulfill the function of recording the relative rotational positional relationship between the plate-making roll 100 and the chuck 10.
[0018]
First, the index detection means 50 has a function of detecting the index M provided on the plate making roll 100 at a predetermined position. The index M is a cross-shaped mark formed on the plate-making surface 110 in the illustrated example, but it is provided at an arbitrary position on the plate-making roll 100 as long as it does not interfere with pattern formation. It doesn't matter. Further, the shape of the index M may be an arbitrary shape. When the plate-making roll 100 is driven to rotate, the index M moves on a predetermined circumferential track. The index detecting means 50 may be configured by any means as long as it can detect that the index M has arrived at a predetermined position on the circumferential orbit. In this example, the index detection means 50 is configured by a device that optically detects the intensity of reflected light from a fixed position on the rotational circumferential track surface of the plate-making roll 100. That is, a light beam is irradiated to a predetermined fixed position where the index M arrives due to the rotation of the plate-making roll 100, and the intensity of the reflected light from the fixed position is detected as an electrical signal by the semiconductor photosensitive element. ing. The detection signal D from the index detection unit 50 is given to the displacement amount detection unit 60.
[0019]
Based on the detection signal D given from the index detection means 50 and the rotation angle signal θ given from the rotary encoder 40, the displacement amount detection means 60 calculates the rotation angle displacement amount Δθ of the index M with respect to the reference rotation position of the chuck 10. It has the required function. FIG. 3 is a graph showing the principle of detection of the rotational angle displacement amount Δθ by the displacement amount detection means 60. In the upper part of the graph, the signal waveform of the detection signal D given from the index detection means 50 is shown. That is, when the time axis t is taken on the horizontal axis and the intensity of the signal D is taken on the vertical axis, the intensity of the reflected light decreases when the index M arrives at a predetermined fixed position. You can see that On the other hand, in the lower part of the graph, a scale of 0 ° to 360 °, which is a range to be taken by the rotation angle signal θ given from the rotary encoder 40, is shown on the horizontal axis. When the plate-making roll 100 is rotated, the value of the rotation angle signal θ at that time is given from the rotary encoder 40 in real time. Therefore, the displacement amount detection means 60 is based on the detection signal D given from the index detection means 50 and the rotation angle signal θ given from the rotary encoder 40, and the rotation angle displacement amount of the index M with respect to the reference rotational position of the chuck 10. Δθ can be obtained. In the illustrated example, the rotation position of the chuck 10 when the rotation angle signal θ from the rotary encoder 40 is 0 ° is determined as the reference rotation position, and when the signal strength of the detection signal D becomes the minimum, The value of the given rotation angle signal θ can be directly handled as the rotation angle displacement amount Δθ. Specifically, in the case of the illustrated example, the rotation angle displacement amount Δθ = 120 °.
[0020]
The pattern data storage means 70 stores pattern data indicating a pattern to be exposed on the plate making surface 110. Usually, the pattern data is prepared in the form of raster data composed of a large number of pixels arranged vertically and horizontally, and a pixel value indicating either drawing or non-drawing is defined for each pixel.
[0021]
The control means 80 has a function of giving a rotation control signal C to the rotation driving means 20 and giving a pattern drawing signal S to the exposure beam irradiation means 30 based on this pattern data. The pattern drawing signal S is a signal for instructing the beam generating unit 31 to irradiate / not irradiate the beam and for giving a scanning instruction to the beam scanning unit 32. The control means 80 recognizes the scanning position of the exposure beam B on the plate-making surface 110 in consideration of the rotational speed of the rotation driving means 20 and the scanning speed by the beam scanning section 32, and the pattern in the pattern data storage means 70 is recognized. After referring to the data, it is determined whether the scanning beam B should be irradiated with the exposure beam B or not. The pattern drawing signal S is a signal including a bit string indicating such irradiation / non-irradiation.
[0022]
An important feature of the present invention is that the control unit 80 has a function of adjusting the timing for applying the pattern drawing signal S in accordance with the rotation angle displacement amount Δθ obtained by the displacement amount detection unit 60. Specifically, the rotational position of the chuck 10 indicated by the rotary encoder 40 is prepared as pattern data in the pattern data storage means 70 at a timing when the rotational position of the chuck 10 coincides with the rotational angle displacement amount Δθ obtained by the displacement amount detection means 60. Processing for starting the operation of supplying the head of the raster data to the exposure beam irradiation means 30 is performed. For example, when the rotation angle displacement amount Δθ is 120 ° as in the example shown in the graph of FIG. 3, the rotation angle signal θ given from the rotary encoder 40 is adjusted to the timing when the value becomes 120 °. Thus, the pattern drawing signal S is given to the exposure beam irradiation means 30, and the pattern is drawn on the plate-making surface 110 from a position having a fixed positional relationship with the index M.
[0023]
Since the pattern exposure apparatus according to the present invention has such a function, even when multiple exposure is performed on the plate making roll 100, each pattern is accurately aligned at each exposure. It becomes possible to do. For example, consider a case where a predetermined pattern is exposed on the plate-making surface 110 according to the above-described procedure, and the plate-making roll 100 is once removed from the chuck 10 and mounted again on the chuck 10 for exposure again. Let's try. In this case, the relative rotational positions of the plate-making roll 100 and the chuck 10 are different between the first exposure time and the second exposure time. Nevertheless, since the two pattern exposures are always performed starting from a position having a fixed positional relationship with respect to the same index M, the pattern exposure is formed on the plate-making surface 110 by a total of two pattern exposures. The two patterns are precisely aligned.
[0024]
Here, an application example using the pattern exposure apparatus according to the present invention will be described in the process of manufacturing an embossed product using such multiple exposure. For example, consider a woodgrain wallpaper sheet 200 whose side cross-sectional view is shown in FIG. On the surface of the wallpaper sheet 200, a groove simulating a wood grain conduit groove is formed by embossing. In the illustrated example, the first-stage groove 201 and the second-stage groove 202 are used to simulate the groove. A natural wood conduit groove is formed. Since the pseudo wood conduit groove having such a step structure has a structure close to that of a natural wood grain conduit groove, if it is formed on the surface of the wallpaper sheet 200 or the like, a more natural texture can be expressed. Can do.
[0025]
In order to form a groove having such a step structure on the wallpaper sheet 200, it is necessary to create an embossed plate having a step structure. Several methods are known for creating an embossed plate having a step structure, but the simplest method is a method of repeating a plurality of corrosion steps using a plurality of patterns. For example, if a first pattern P1 (corresponding to a plan view of a wood conduit groove) as shown in the plan view of FIG. 5 is prepared and the plate making surface 110 is corroded based on this pattern P1, the pattern shown in FIG. As shown in the side sectional view, the first step portion 111 can be formed. Subsequently, a second pattern P2 (similar to the first pattern P1 and smaller in area) as shown in the plan view of FIG. 7 is prepared. Based on this pattern P2, FIG. As shown in the side sectional view of FIG. 8, a step structure in which the second step portion 112 is formed on the first step portion 111 can be obtained. it can. If embossing is performed using an embossed plate having a step structure as shown in FIG. 8, a wallpaper sheet 200 as shown in FIG. 4 can be manufactured.
[0026]
However, the pseudo-wooden conduit groove formed on the wallpaper sheet 200 has a relatively small size such as a width of about several tens of μm to 500 μm and a length of about several hundreds of μm to several mm. For this reason, it cannot be used practically unless the alignment error between the two patterns P1 and P2 is at least 500 μm or less. The pattern exposure apparatus according to the present invention sufficiently satisfies such a positioning error condition, and can produce an embossed plate having a practically sufficient positional accuracy.
[0027]
FIG. 9 is a flowchart showing a procedure for creating an embossed plate having a step structure as shown in FIG. 8 by using the pattern exposure apparatus according to the present invention. First, in step S1, n pieces of pattern data are created. For example, in the case of n = 2, two patterns P1 and P2 as shown in FIGS. 5 and 7 (only one conduit groove is shown in the figure, but in practice, a large number of conduit grooves are shown. Are used as raster data and stored in the pattern data storage means 70. Subsequently, in step S <b> 2, an index M is formed at the end of the plate making roll 100. The index M may be formed at the end of the plate-making surface 110 as a scribe line using, for example, the tip of a sharp blade. In step S3, the repetition parameter i = 1 is set, and the steps S4 to S10 are repeated n times.
[0028]
First, in step S <b> 4, a resist layer is coated on the outer peripheral surface of the plate making roll 100. Subsequently, in step S5, the plate making roll 100 is chucked. That is, the shaft end portions 130 on both sides are held and fixed by the chuck 10. At this time, the operator does not need to pay attention to the position of the plate making roll 100 relative to the chuck 10 with respect to the rotation direction. However, it is necessary that the relative positional relationship in the axial direction is always constant. However, in the general chuck 10, the end surface of the gripping claw 11 and the end surface of the shaft core portion 120 are brought into contact with each other so that the positional relationship between the two in the axial direction is always constant. It is sufficient to perform normal chucking work.
[0029]
Subsequently, in step S6, the rotational angle displacement amount Δθ is detected. That is, by rotating the plate-making roll 100, the detection signal D is obtained from the index detection means 50, and the rotation angle signal θ is obtained from the rotary encoder 40, and the rotation is performed based on the principle described in the graph of FIG. Processing for obtaining the angular displacement amount Δθ1 is performed. In step S7, an exposure process for the i-th (i = 1) pattern is performed. That is, the raster data of the first pattern P1 stored in the pattern data storage means 70 is given to the exposure beam irradiation means 30 for exposure, and at this time, at a timing according to the rotation angle displacement amount Δθ1. Raster data will be given.
[0030]
Thus, when the first pattern exposure on the plate-making surface 110 is completed, the plate-making roll 100 is removed from the chuck 10, development is performed on the plate-making roll 100 in step S8, and corrosion is performed on the plate-making roll 100 in step S9. In step S10, the plate making roll 100 is cleaned. As a result, a first step 111 as shown in FIG. 6 is formed on the plate-making surface 110.
[0031]
Subsequently, the process proceeds from step S11 to step S12, the value of parameter i is updated to 2, and then the process returns to step S4 again, and the work of coating the outer peripheral surface of the plate-making roll 100 with a resist layer is performed. In this case, a resist layer is further formed on the plate-making surface 110 on which the step structure as shown in FIG. 6 is formed. In step S5, the plate making roll 100 is chucked. Also at this time, the operator need not pay attention to the relative rotational position of the plate-making roll 100 with respect to the chuck 10. In step S6, a new rotation angle displacement amount Δθ2 is detected, and in step S7, exposure processing of the second pattern is performed. In other words, the raster data of the second pattern P2 stored in the pattern data storage means 70 is given to the exposure beam irradiation means 30 for exposure, and at this time, the new rotation angle detected immediately before is also provided. Raster data is given at a timing according to the displacement amount Δθ2. Therefore, the second pattern is subjected to multiple exposure in a state where the second pattern is accurately aligned with the first pattern.
[0032]
In this way, when the second pattern exposure on the plate-making surface 110 is completed, the plate-making roll 100 is removed from the chuck 10, development is performed on the plate-making roll 100 in step S8, and corrosion is performed on the plate-making roll 100 in step S9. In step S10, the plate making roll 100 is cleaned. As a result, the second step 112 as shown in FIG. 8 is formed on the plate-making surface 110. Finally, the process proceeds from step S11 to step S13, and if necessary post-processing such as sandblasting or chrome plating is performed, the embossing plate creation work is completed.
[0033]
【The invention's effect】
As described above, according to the pattern exposure apparatus for a plate-making roll according to the present invention, since it is possible to perform alignment based on the index on the plate-making roll, even when performing direct multiple exposure by beam scanning. , Accurate alignment becomes possible.
[Brief description of the drawings]
FIG. 1 is a block diagram showing a basic configuration of a pattern exposure apparatus for a plate-making roll according to an embodiment of the present invention.
2 is a view showing a fixed state of the shaft end portion 130 by the chuck 10 in the pattern exposure apparatus shown in FIG. 1, and is a view of the chuck 10 shown in FIG.
3 is a graph showing the principle of detection of the rotational angle displacement amount Δθ by the displacement amount detection means 60 in the pattern exposure apparatus shown in FIG. 1;
FIG. 4 is a side sectional view of a woodgrain wallpaper sheet 200 created using the pattern exposure apparatus according to the present invention.
5 is a plan view of a first pattern P1 used to create an embossed plate used for embossing the wallpaper sheet 200 shown in FIG. 4. FIG.
6 is a side sectional view showing a state where a first step portion 111 is formed on the plate-making surface 110 using the first pattern P1 shown in FIG.
7 is a plan view of a second pattern P2 used to create an embossed plate used for embossing the wallpaper sheet 200 shown in FIG. 4. FIG.
8 is a side sectional view showing a state in which a second stepped portion 112 is formed on the plate-making surface 110 using the second pattern P2 shown in FIG.
FIG. 9 is a flowchart showing a procedure for creating an embossed plate having a step structure as shown in FIG. 8 using the pattern exposure apparatus according to the present invention.
[Explanation of symbols]
10 ... Chuck
11 ... gripping claws
20: Rotation drive means
30: Exposure beam irradiation means
31 ... Beam generator
32 ... Beam scanning section
40. Rotary encoder
50. Indicator detecting means
60: Displacement amount detection means
70: Pattern data storage means
80 ... Control means
100: Plate making roll
110: Plate making surface
111 ... 1st level | step-difference part
112 ... Second step portion
120 ... shaft core part
130 ... shaft end
200 ... Wallpaper sheet
201 ... 1st stage groove
202 ... the second groove
A ... Rotation axis
B ... Beam for exposure
C ... Rotation control signal
D: Indicator detection signal
M ... Indicator
S: Pattern drawing signal
P, P1, P2 ... pattern for exposure
θ ... Rotation angle signal
Δθ: Rotational angular displacement

Claims (3)

A pattern exposure apparatus that performs multiple exposure of a plurality of patterns by irradiating a plate-making surface of a plate-making roll to be exposed with a beam,
A chuck for gripping and fixing the axis of the plate-making roll;
Rotation driving means for rotating the chuck around the axis of the plate-making roll;
An exposure beam irradiating means comprising: a beam generating unit that generates an exposure beam that irradiates the plate-making surface of the plate-making roll; and a beam scanning unit that scans the generated beam in the axial direction of the plate-making roll;
Pattern data storage means for storing a plurality of pattern data indicating a plurality of patterns to be exposed;
A rotary encoder for detecting the rotational position of the chuck;
Index detecting means for detecting an index provided on the plate making roll at a predetermined position;
A displacement amount detection means for obtaining a rotation angle displacement amount of the index with respect to a reference rotation position of the chuck based on a detection signal of the index detection means and a detection signal of the rotary encoder;
A function of giving a rotation control signal to the rotation driving means and giving a pattern drawing signal to the exposure beam irradiating means on the basis of one piece of pattern data sequentially selected from the plurality of pieces of pattern data. Control means having a function of adjusting the timing of applying the pattern drawing signal according to the rotational angle displacement amount obtained by the displacement amount detection means;
A pattern exposure apparatus for a plate-making roll, comprising: The pattern exposure apparatus according to claim 1,
A pattern exposure apparatus for a plate-making roll, wherein the index detection means has a device for optically detecting the intensity of reflected light from a fixed position on the rotational circumferential track surface of the plate-making roll. In the pattern exposure apparatus according to claim 1 or 2,
Prepare the pattern data for each piece stored in the pattern data storage means in the form of raster data,
A plate-making roll characterized in that the start of the raster data is started to be supplied to the exposure beam irradiating means at a timing at which the rotational position of the chuck indicated by the rotary encoder coincides with the rotational angular displacement obtained by the displacement detecting means Pattern exposure equipment.

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