JP3856526B2

JP3856526B2 - Steam cleaning equipment

Info

Publication number: JP3856526B2
Application number: JP14497597A
Authority: JP
Inventors: 哲夫塚田; 功塚田
Original assignee: 株式会社ツカダファイネス
Priority date: 1997-06-03
Filing date: 1997-06-03
Publication date: 2006-12-13
Anticipated expiration: 2017-06-03
Also published as: JPH10328630A

Description

【０００１】
【発明の属する技術分野】
本発明は、電子部品、機械部品、プリント配線基板などのワークを洗浄するための蒸気洗浄装置に関するものである。さらに詳しくは、高沸点の洗浄剤の使用に適した蒸気洗浄装置に関するものである。
【０００２】
【従来の技術】
従来、電子部品、機械部品、プリント配線基板などのワークを洗浄するための洗浄剤としては、フッ素系や塩素系の有機溶剤が用いられている。しかし、かかるハロゲン系有機溶剤は環境や生体に悪影響があるとして使用の全廃が予定されている。そこで、ハロゲン系有機溶剤に代えて、シリコン系、炭化水素系、あるいはアルコール系などの高沸点の溶剤が洗浄剤として用いられつつあるが、これらの洗浄剤は沸点が１００℃から２００℃もあるため、それを用いて常圧下で蒸気洗浄を行おうとすると、蒸気温度が高いので、ワークの熱変形や熱変質などの問題が発生する。
【０００３】
そこで、前記のような高沸点溶剤を用いたときの洗浄方法として減圧下で蒸気洗浄が注目されている。そのための洗浄装置としては、従来、図３に示す構成を有するものがある。この蒸気洗浄装置には、蒸気発生槽２Ｂと、この蒸気発生槽２Ｂに対して凝縮器３Ｂを介して接続する減圧機構４Ｂと、蒸気発生槽２Ｂで発生した洗浄剤蒸気が蒸気供給経路５Ｂを介して供給される洗浄槽６Ｂと、この洗浄槽６Ｂに凝縮器８Ｂを介して接続する真空引き機構１０Ｂとが構成されている。従って、蒸気発生槽２Ｂでは減圧機構４Ｂによって減圧下で洗浄剤蒸気を発生させる一方、真空引き機構１０Ｂで洗浄槽６Ｂを減圧し、蒸気発生槽２Ｂから洗浄剤蒸気を蒸気供給経路５Ｂを介して洗浄槽６Ｂ内に導入すれば、ワークを洗浄剤蒸気で洗浄できる。このように、洗浄剤蒸気をあくまで減圧下で発生させるので、常圧下での蒸気洗浄と比較して洗浄剤およびワークを低い温度で扱うことができる。しかも、減圧下で洗浄剤を扱うので、蒸気洗浄装置から洗浄剤が漏れないという利点もある。
【０００４】
【発明が解決しようとする課題】
しかしながら、従来の蒸気洗浄装置では、洗浄槽６Ｂ内に洗浄液が凝縮すると、それを液状のままでは排出することができないため、洗浄槽６Ｂ内でワークを乾燥させる際には真空引き機構１０Ｂによって洗浄槽６Ｂ内を真空引きし、長い時間をかけて洗浄槽６Ｂ内の洗浄液を蒸気として排出せざるを得ない。また、真空引き機構１０Ｂは凝縮器８Ｂを介して洗浄槽６Ｂ内を真空引きするため、凝縮器６に洗浄液が溜まると、真空引き機構１０Ｂでいくら洗浄槽６Ｂ内を真空にしようにも、凝縮器８に溜まった洗浄液が蒸気となって排出されるまで洗浄槽６Ｂ内の真空度が上がらない。それ故、従来の蒸気洗浄装置では、洗浄槽６Ｂ内でワークを乾燥させるには長時間を要するという問題点がある。
【０００５】
そこで、本発明の課題は、蒸気洗浄を行った洗浄槽内でワークの乾燥を短時間で行うことのできる蒸気洗浄装置を提供することにある。
【０００６】
【課題を解決するための手段】
上記課題を解決するために、本発明に係る蒸気洗浄装置では、蒸気発生槽と、該蒸気発生槽に対して凝縮器を介して接続する減圧機構と、前記蒸気発生槽で発生した洗浄剤蒸気が蒸気供給経路を介して供給される洗浄槽と、該洗浄槽に接続して該洗浄槽内に溜まった洗浄液を排出するための洗浄液排出経路と、前記凝縮器を介さずに前記洗浄槽内を真空引き可能な真空引き機構と、前記蒸気供給経路の途中位置で、前記蒸気発生槽が前記洗浄槽に接続した状態と前記凝縮器の方に接続した状態との切り換えを行い、前記洗浄槽が前記凝縮器の方に接続する状態への切り換えが不能な三方コックとを有することを特徴とする。本発明では、洗浄槽内に溜まった洗浄液を排出するための洗浄液排出経路が構成されているため、蒸気洗浄が終わった後に、洗浄槽内で凝縮した洗浄液を液状のままで排出することができる。それ故、本発明によれば、蒸気洗浄を行った洗浄槽内でのワークに対する真空乾燥を短時間に行うことができる。また、蒸気発生槽が洗浄槽に接続した状態と凝縮器に接続した状態との切り換えを行い、洗浄槽が凝縮器の方に接続する状態への切り換えが不能な三方コックを用いたため、操作ミスがあっても洗浄槽と凝縮器とが接続する状態があり得ないので、凝縮器に溜まっていた洗浄液が洗浄槽内のワークを濡らすということがない。
【０００７】
本発明において、前記洗浄液排出経路には、冷却器を介して液送機構が接続し、前記真空引き機構は、前記冷却器を介さずに前記洗浄槽内を真空引き可能であることが好ましい。このように構成すると、蒸気洗浄が終わった後に、洗浄槽内で凝縮した洗浄液を液送機構により洗浄液排出経路を介して液状のままで排出することができる。また、洗浄槽に対しては冷却器を介さずに真空引き可能な真空引き機構が構成されているため、冷却器に洗浄液が溜まっていても、真空引き機構は洗浄槽内を直接、真空引きするので、蒸気洗浄を行った洗浄槽内でワークの乾燥を短時間で行うことができる。また、本発明では、前記洗浄液排出経路には、ドレン液受器を介して液送機構が接続していることが好ましい。
【０００８】
このように、本発明に係る蒸気洗浄装置は、減圧下で溶剤蒸気を発生させるので、洗浄剤およびワークを低い温度で扱うことができるとともに、減圧下で洗浄剤を扱うので、蒸気洗浄装置から洗浄剤が漏れないという利点に加えて、蒸気洗浄を行った洗浄槽内でワークの乾燥を短時間で行うことができることから、シリコン系洗浄剤、炭化水素系洗浄剤、またはアルコール系洗浄など、沸点が１００℃から２００℃までの範囲にある高沸点の溶剤を洗浄剤として用いるのに適している。
【００１０】
【発明の実施の形態】
以下、図面を参照して本発明の実施の形態を説明する。
【００１１】
（蒸気洗浄装置１の基本的な構成）
図１は、本発明を適用した蒸気洗浄装置１の基本的な構成を示すブロック図である。
【００１２】
図１に示すように、本形態を適用した蒸気洗浄装置１は、蒸気発生槽２Ａと、この蒸気発生槽２Ａに対して凝縮器３Ａを介して接続する減圧機構４Ａと、蒸気発生槽２Ａで発生した洗浄剤蒸気が蒸気供給経路５Ａを介して供給される洗浄槽６Ａと、該洗浄槽６Ａに接続して該洗浄槽６Ａ内に溜まった洗浄液を排出するための洗浄液排出経路７Ａと、この洗浄液排出経路７Ａに冷却器８Ａを介して接続する液送機構９Ａと、洗浄槽６Ａ内を冷却器８Ａを介さずに真空引き可能な真空引き機構１０Ａとが構成されている。また、本形態の蒸気洗浄装置１には、蒸気発生槽２Ａが洗浄槽６Ａに蒸気供給経路５Ａを介して接続した状態と凝縮器３Ａの方に接続した状態との切り換えを行う切換機構１１Ａとして、蒸気供給経路５Ａの途中位置で、蒸気発生槽２Ａが洗浄槽６Ａに蒸気供給経路５Ａを介して接続した状態と凝縮器３Ａの方に接続した状態との切り換えを行い、洗浄槽６Ａが凝縮器３Ａの方に接続する状態への切り換えが不能な三方コック１１が用いられている。
【００１３】
このように構成した蒸気洗浄装置１では、蒸気発生槽２Ａにおいて、そこに貯留した洗浄液を加熱しながら槽内を減圧機構４Ａにより減圧し、洗浄剤蒸気を発生させる。このとき、蒸気発生槽２Ａから発生した洗浄剤蒸気は凝縮器３Ａでトラップされ、減圧機構４Ａには到達しない。一方、洗浄槽６Ａではそこにワークを入れた後、バルブＡＶ９を開にし、真空引き機構１０Ａにより洗浄槽６Ａ内を減圧状態にする。この状態で、三方コック１１を操作して、蒸気発生槽２Ａが洗浄槽６Ａに蒸気供給経路５Ａを介して接続する状態とした後、バルブＡＶ５を開にし、蒸気発生槽２Ａの洗浄剤蒸気を洗浄槽６Ａ内に導入する。
【００１４】
その結果、洗浄槽６Ａ内では洗浄剤蒸気がワークに触れてワークを洗浄し、凝縮する。このとき凝縮した洗浄剤を洗浄液排出経路７Ａを介して冷却器８Ａに排出しながらワークを洗浄する。
【００１５】
このようにして洗浄を終えた後は、それまでは開状態にあったバルブＡＶ５、ＡＶ７を閉にし、洗浄槽６Ａと蒸気発生槽２Ａおよび冷却器８Ａとを遮断した後、冷却器８Ａ内を真空開放し、冷却器８Ａ内に溜まった洗浄液を液送機構９Ａによって冷却器８Ａから排出する。
【００１６】
併せて、バルブＡＶ５、ＡＶ７が閉にされて洗浄槽６Ａが蒸気発生槽２Ａおよび冷却器８Ａと遮断された後には、真空引き機構１０Ａによって洗浄槽６Ａ内を直接、真空引きする。そして、ワークに付着した洗浄液を乾燥、除去する。
【００１７】
このように、本形態の蒸気洗浄装置１では、洗浄槽６Ａ内で洗浄剤蒸気でワークを洗浄し、この時にワークに触れて凝縮した洗浄剤を冷却器８Ａ内に排出しながら洗浄を行うため、洗浄槽６Ａ内には洗浄剤がほとんど残らない。また、洗浄後、洗浄槽６Ａが蒸気発生槽２Ａおよび冷却器８Ａと完全に遮断された後、冷却器８Ａから液送機構９Ａにより洗浄液が排出されるとともに、ワークを真空乾燥する際、真空引き機構１０Ａは、洗浄槽６Ａに対して冷却器８Ａを介さずに接続しているため、冷却器８Ａ内に洗浄液が溜まっていても、真空引き機構１０Ａは洗浄槽６Ａ内を直接、真空引きする。それ故、本発明によれば、蒸気洗浄を行った洗浄槽６Ａ内でワークの乾燥を短時間で行うことができる。また、本形態に係る蒸気洗浄装置１は、減圧下で溶剤蒸気を発生させるので、洗浄剤およびワークを低い温度で扱うことができるとともに、減圧下で洗浄剤を扱うので、蒸気洗浄装置１から洗浄剤が漏れない。よって、シリコン系洗浄剤、炭化水素系洗浄剤、またはアルコール系洗浄など、沸点が１００℃から２００℃までの範囲にある高沸点の溶剤を洗浄剤として用いるのに適している。
【００１８】
また、本形態では、蒸気発生槽２Ａが洗浄槽６Ａに接続した状態と凝縮器３Ａの方に接続した状態との切り換えを行うのに、洗浄槽６Ａと凝縮器３Ａの方とが接続する状態への切り換えが不能な三方コック１１を用いている。このため、操作ミスがあっても洗浄槽６Ａと凝縮器３Ａとが接続する状態があり得ないので、凝縮器３Ａに溜まっていた洗浄液が洗浄槽６Ａに入ってワークを濡らすということがない。
【００１９】
【実施例】
図２は、本発明を適用した蒸気洗浄装置の実施例を示す説明図である。この図において、実線、点線、一点鎖線、および二点鎖線で表してあるのは、それぞれ、洗浄液系統（洗浄剤蒸気系統）、熱媒油系統、排気系統、および冷却水系統である。また、蒸気洗浄装置１には手動ボールバルブ、エアー駆動自動ボールバルブ、真空ポンプ、液送ポンプ、ストレーナ、温度センサなどが構成されているので、主要なものについては個々、説明するが、機能が自明のものについてはそれぞれに符合ＧＶ、ＡＶ、ＶＰ、Ｐ、ＳＴ、ＴＨを付してその説明を省略する。
【００２０】
図２において、本例の蒸気洗浄装置１には、熱媒油器５０から熱媒送液用ポンプ５１で熱媒油が供給、循環される加熱コイルを内蔵の真空再生器２（蒸気発生槽２Ａ）と、この真空再生器２に対して二次熱交換器３（凝縮器３Ａ）を介して接続する第１の液封式の真空ポンプ４（減圧機構４Ａ）とが構成され、真空再生器２内では、そこに貯留されている洗浄液から減圧下で洗浄剤蒸気を発生させる。洗浄剤としては、シリコン系洗浄剤、炭化水素系洗浄剤、またはアルコール系洗浄など、沸点が１００℃から２００℃までの範囲にある高沸点の溶剤などである。真空再生器２は、その内部圧力が真空計２０１および真空圧力スイッチ２０２で監視される。洗浄剤はリサイクルしながら使用されるため、真空再生器２は蒸気洗浄の際に洗浄剤蒸気を発生させるための蒸気発生槽２Ａとして用いられるだけでなく、使用済みの洗浄剤を再生する蒸留器としても用いられる。従って、真空再生器２の底部分には廃液管２０３が接続され、再生を行った際に残った残滓は、廃液送液用ポンプ２０４によって廃液器２０５に送られる。
【００２１】
蒸気発生槽２Ａの上面部には蒸気供給管５（蒸気供給経路５Ａ）が接続されている。この蒸気供給管５は、先端が蒸気洗浄・乾燥槽６（洗浄槽６Ａ）に接続され、蒸気発生槽２Ａ内で発生させた洗浄剤蒸気を蒸気洗浄・乾燥槽６内に供給する。
【００２２】
蒸気供給管５の途中位置には三方コック１１（切換機構１１Ａ）を介して減圧管２１が接続され、この減圧管２１は一時熱交換器３１を経て前記の二次熱交換器３および第１の液封式の真空ポンプ４に接続されている。三方コック１１は、真空再生器２が蒸気洗浄・乾燥槽６に蒸気供給管５を介して接続した状態と二次熱交換器３の方に接続した状態との切り換えを行い、蒸気洗浄・乾燥槽６が二次熱交換器３の方に接続する状態への切り換えは不能である。
【００２３】
一次熱交換器３１は、使用済みの洗浄液を一時的に貯留しておくバッファ槽４１から真空再生器２への洗浄液の補給管４２の途中に介挿され、この補給管４２を通して真空再生器２に補給される洗浄液と、真空再生器２から減圧管２１を通って二次熱交換器３に向かう洗浄剤蒸気との間で熱交換を行う。従って、蒸気発生槽２Ａから減圧管２１を通ってきた洗浄剤蒸気は、一次熱交換器３１で冷却された後、二次熱交換器３で完全に凝縮し、再生液タンク４３に貯留されることになる。なお、再生液タンク４３には、本例の蒸気洗浄装置１に付随する浸漬洗浄槽（図示せず。）や超音波洗浄槽（図示せず。）などで使用された処理済みの洗浄液も第２の液封式の真空ポンプ４４によって送られてくる。また、再生液タンク４３でオーバーフローした洗浄液は前記の浸漬・超音波蒸気洗浄槽で使用された後、再生処理が行われ、しかる後にバッファ槽４１に回収される。このバッファ槽４１には必要に応じて新液の補給も行われる。
【００２４】
本例では、蒸気洗浄・乾燥槽６の底部分に洗浄液排出管７（洗浄液排出経路７Ａ）が接続され、この洗浄液排出管７の途中位置にはドレイン液受器８（冷却器８Ａ）、バルブＡＶ１６、および液送ポンプ９（液送機構９Ａ）が介挿されている。この洗浄液排出管７を通る洗浄液は、蒸気洗浄・乾燥槽６内で凝縮した使用済の洗浄液であり、回収管７１を通して前記のバッファ槽４１に回収される。
【００２５】
蒸気洗浄・乾燥槽６に対しては真空引き用配管７２が接続され、この真空引き用配管７２の途中位置には、蒸気洗浄・乾燥槽６内を前記のドレイン液受器８を介さずに真空引きするブースタポンプ１６および第３の液封式の真空ポンプ１７からなる２段の真空引き機構１０Ａが構成されている。なお、真空引き配管７２と減圧管２１とは第１の連結管７３で接続されているので、それに介挿されているバルブＡＶ１０、ＡＶ１５を開とすれば、第１の液封式の真空ポンプ４をも用いて、蒸気洗浄・乾燥槽６内を前記のドレイン液受器８を介さずに真空引きすることもできる。このように、２つの液封式の真空ポンプ４、１７で蒸気洗浄・乾燥槽６の真空引きをする際でも、三方コック１１は、蒸気洗浄・乾燥槽６を二次熱交換器３および液封式の真空ポンプ４、１７の方に接続することがないので、蒸気洗浄・乾燥槽６の真空引きが二次熱交換器３を介して行われることはない。すなわち、本例ではいずれの場合でも、蒸気洗浄・乾燥槽６内の真空引きは、ドレイン液受器８や二次熱交換器３を介さずに行うのである。
【００２６】
ブースタポンプ１６および第３の液封式の真空ポンプ１７はいずれも、洗浄を終えた後、蒸気洗浄・乾燥槽６内でワークを真空乾燥するためのもので、蒸気洗浄・乾燥槽６内から蒸気として引いた洗浄液は再生液タンク４３内に貯留される。なお、蒸気洗浄・乾燥槽６では真空計６０１および真空圧力スイッチ６０２によって真空度の監視が行われる。
【００２７】
バッファ槽４１に対しては排気管４７が接続され、この排気管４７には排気ブロア４８および防火ダンパ４９が構成されている。再生液タンク４３にも排気管４７が接続され、この排気管４７には排気ブロア４８との間にミストトラップ４６も構成されている。
【００２８】
このように構成した本例の蒸気洗浄装置１では、真空再生器２において、そこに貯留した洗浄液を加熱しながら槽内を第１の液封式の真空ポンプ４により減圧し、洗浄剤蒸気を発生する。一方、蒸気洗浄・乾燥槽６内にはワークを入れた後、バルブＡＶ９を開にし、ブースタポンプ１６および第３の液封式の真空ポンプ１７により蒸気洗浄・乾燥槽６内を減圧状態にする。この状態で、三方コック１１を操作して、真空再生器２が蒸気洗浄・乾燥槽６に蒸気供給管５を介して接続する状態とした後、バルブＡＶ５を開にし、真空再生器２の洗浄剤蒸気を蒸気洗浄・乾燥槽６内に導入する。
【００２９】
その結果、蒸気洗浄・乾燥槽６内では洗浄剤蒸気がワークに触れてワークを洗浄し、凝縮する。このときバルブＡＶ６、ＡＶ７を開にし、凝縮した洗浄剤を洗浄液排出管７を介してドレン液受器８に排出しながらワークを洗浄する。
【００３０】
このようにして洗浄を終えた後は、バルブＡＶ５、ＡＶ６、ＡＶ７を閉にし、かつ、三方コック１１を操作して真空再生器２が二次熱交換器３および第１の液封式の真空ポンプ４の側に接続する状態に切り換えて、蒸気洗浄・乾燥槽６をドレン液受器８および真空再生器２と遮断した後、ドレン液受器８内を真空開放し、ドレン液受器８内に溜まった洗浄液を液送ポンプ９によってドレン液受器８から排出する。
【００３１】
また、バルブＡＶ５、ＡＶ６、ＡＶ７が閉にされて蒸気洗浄・乾燥槽６がドレン液受器８および真空再生器２と遮断された後、ブースタポンプ１６および第３の液封式の真空ポンプ１７からなる２段の真空引き機構１０Ａによって蒸気洗浄・乾燥槽６内を直接、真空引きする。そして、ワークに付着した洗浄液を乾燥、除去する。
【００３２】
このように、本例の蒸気洗浄装置１では、蒸気洗浄・乾燥槽６内で洗浄剤蒸気でワークを洗浄し、この時にワークに触れて凝縮した洗浄剤をドレン液受器８に排出しながら洗浄を行うため、蒸気洗浄・乾燥槽６内には洗浄剤がほとんど残らない。また、洗浄後、蒸気洗浄・乾燥槽６が真空再生器２やドレン液受器８と完全に遮断された後、ドレン液受器８から液送ポンプ９により洗浄液が排出される一方、ワークを真空乾燥する際には、真空引き機構１０Ａが蒸気洗浄・乾燥槽６に対してドレン液受器８を介さずに接続しているため、ドレン液受器８内に洗浄液が溜まっていても、真空引き機構１０Ａは蒸気洗浄・乾燥槽６内を直接、真空引きする。それ故、本例によれば、蒸気洗浄を行った蒸気洗浄・乾燥槽６内でワークの乾燥を短時間で行うことができる。また、本例に係る蒸気洗浄装置１は、減圧下で溶剤蒸気を発生させるので、洗浄剤およびワークを低い温度で扱うことができるとともに、減圧下で洗浄剤を扱うので、蒸気洗浄装置１から洗浄剤が漏れない。よって、シリコン系洗浄剤、炭化水素系洗浄剤、またはアルコール系洗浄など、沸点が１００℃から２００℃までの範囲にある高沸点の溶剤を洗浄剤として用いるのに適している。
【００３３】
しかも、三方コック１１で操作ミスがあっても蒸気洗浄・乾燥槽６と二次熱交換器３の方とが接続ことがあり得ないので、二次熱交換器３の方に溜まっていた洗浄液が蒸気洗浄・乾燥槽６内のワークを濡らすということがない。
【００３４】
【発明の効果】
以上説明したように、本発明に係る蒸気洗浄装置では、洗浄槽内に溜まった洗浄液を液送機構によって洗浄液排出経路および冷却器を通して洗浄槽内に凝縮した洗浄液を排出することができる。また、ワークを真空乾燥させるための真空引き機構は、洗浄槽に対して冷却器を介さずに接続しているため、冷却器に洗浄液が溜まっていても、真空引き機構は洗浄槽内を直接、真空引きする。それ故、本発明によれば、蒸気洗浄を行った洗浄槽内でワークの乾燥を短時間で行うことができる。
【図面の簡単な説明】
【図１】本発明を適用した蒸気洗浄装置の構成を示す説明図である。
【図２】本発明の実施例に係る蒸気洗浄装置の構成を示す説明図である。
【図３】従来の蒸気洗浄装置の構成を示す説明図である。
【符号の説明】
１蒸気洗浄装置
２真空再生器
２Ａ蒸気発生槽
３二次熱交換器
３Ａ凝縮器
４第１の液封式の真空ポンプ
４Ａ減圧機構４
５蒸気供給管
５Ａ蒸気供給経路
６蒸気洗浄・乾燥槽
６Ａ洗浄槽
７洗浄液排出管
７Ａ洗浄液排出経路
８ドレイン液受器
８Ａ冷却器
９液送ポンプ
９Ａ液送機構
１０Ａ真空引き機構
１１三方コック
１１Ａ切換機構
１６ブースタポンプ
１７第３の液封式の真空ポンプ
２１減圧管
７２真空引き用配管[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a steam cleaning apparatus for cleaning a workpiece such as an electronic component, a mechanical component, or a printed wiring board. More specifically, the present invention relates to a steam cleaning apparatus suitable for use with a high boiling point cleaning agent.
[0002]
[Prior art]
Conventionally, fluorine-based or chlorine-based organic solvents have been used as cleaning agents for cleaning workpieces such as electronic components, mechanical components, and printed wiring boards. However, such halogen-based organic solvents are scheduled to be completely abandoned because they have adverse effects on the environment and living organisms. Therefore, instead of halogen-based organic solvents, high-boiling solvents such as silicon-based, hydrocarbon-based, or alcohol-based solvents are being used as cleaning agents, but these cleaning agents have boiling points of 100 ° C to 200 ° C. For this reason, when steam cleaning is performed under normal pressure using the same, the steam temperature is high, which causes problems such as thermal deformation and thermal alteration of the workpiece.
[0003]
Thus, steam cleaning under reduced pressure has attracted attention as a cleaning method when using the high boiling point solvent as described above. As a cleaning apparatus for that purpose, there is a conventional cleaning apparatus having the configuration shown in FIG. The steam cleaning device includes a steam generation tank 2B, a decompression mechanism 4B connected to the steam generation tank 2B via a condenser 3B, and a cleaning agent vapor generated in the steam generation tank 2B through the steam supply path 5B. And a vacuum evacuation mechanism 10B connected to the cleaning tank 6B via a condenser 8B. Therefore, in the steam generation tank 2B, the cleaning agent vapor is generated under reduced pressure by the decompression mechanism 4B, while the cleaning tank 6B is decompressed by the evacuation mechanism 10B, and the cleaning agent vapor is supplied from the steam generation tank 2B through the steam supply path 5B. If it introduce | transduces in the washing tank 6B, a workpiece | work can be wash | cleaned with cleaning agent vapor | steam. In this way, since the cleaning agent vapor is generated only under reduced pressure, it is possible to handle the cleaning agent and the workpiece at a lower temperature compared with the steam cleaning under normal pressure. Moreover, since the cleaning agent is handled under reduced pressure, there is an advantage that the cleaning agent does not leak from the steam cleaning device.
[0004]
[Problems to be solved by the invention]
However, in the conventional steam cleaning apparatus, when the cleaning liquid is condensed in the cleaning tank 6B, it cannot be discharged in a liquid state. Therefore, when the work is dried in the cleaning tank 6B, the cleaning is performed by the vacuuming mechanism 10B. The inside of the tank 6B is evacuated, and the cleaning liquid in the cleaning tank 6B must be discharged as steam over a long time. Further, since the evacuation mechanism 10B evacuates the cleaning tank 6B via the condenser 8B, when the cleaning liquid accumulates in the condenser 6, the evacuation mechanism 10B condenses no matter how much the cleaning tank 6B is evacuated. The degree of vacuum in the cleaning tank 6B does not increase until the cleaning liquid accumulated in the vessel 8 is discharged as vapor. Therefore, the conventional steam cleaning apparatus has a problem that it takes a long time to dry the workpiece in the cleaning tank 6B.
[0005]
Then, the subject of this invention is providing the steam cleaning apparatus which can dry a workpiece | work within the washing tank which performed steam cleaning in a short time.
[0006]
[Means for Solving the Problems]
In order to solve the above problems, in the steam cleaning apparatus according to the present invention, a steam generation tank, a decompression mechanism connected to the steam generation tank via a condenser, and a cleaning agent vapor generated in the steam generation tank. Is supplied via a vapor supply path, a cleaning liquid discharge path for discharging the cleaning liquid connected to the cleaning tank and accumulated in the cleaning tank, and the cleaning tank without passing through the condenser. And a switching mechanism between the state where the steam generation tank is connected to the cleaning tank and the state where the steam generation tank is connected to the condenser at a position midway in the steam supply path, and the cleaning tank Has a three-way cock that cannot be switched to a state of being connected to the condenser . In the present invention, since the cleaning liquid discharge path for discharging the cleaning liquid accumulated in the cleaning tank is configured, the cleaning liquid condensed in the cleaning tank can be discharged in a liquid state after the vapor cleaning is completed. . Therefore, according to the present invention, it is possible to perform vacuum drying on the workpiece in the cleaning tank subjected to the steam cleaning in a short time. In addition, the steam generation tank is switched between the state connected to the cleaning tank and the state connected to the condenser, and a three-way cock that cannot be switched to the state where the cleaning tank is connected to the condenser is used. Even if there is, there is no state where the cleaning tank and the condenser are connected, so that the cleaning liquid accumulated in the condenser does not wet the work in the cleaning tank.
[0007]
In the present invention , it is preferable that a liquid feeding mechanism is connected to the cleaning liquid discharge path via a cooler, and the vacuuming mechanism is capable of evacuating the cleaning tank without passing through the cooler. If comprised in this way, after completion | finish of vapor | steam washing | cleaning, the washing | cleaning liquid condensed in the washing tank can be discharged | emitted with liquid state via a washing | cleaning liquid discharge path with a liquid feeding mechanism. In addition, since a vacuuming mechanism that can be evacuated without using a cooler is configured for the cleaning tank, even if cleaning liquid is accumulated in the cooler, the vacuuming mechanism directly evacuates the cleaning tank. Therefore, the workpiece can be dried in a short time in the cleaning tank that has been subjected to the steam cleaning. In the present invention, it is preferable that a liquid feed mechanism is connected to the cleaning liquid discharge path via a drain liquid receiver.
[0008]
Thus, since the steam cleaning apparatus according to the present invention generates solvent vapor under reduced pressure, the cleaning agent and workpiece can be handled at a low temperature, and the cleaning agent is handled under reduced pressure. In addition to the advantage that the cleaning agent does not leak, the workpiece can be dried in a short time in the cleaning tank where steam cleaning has been performed, so silicon-based cleaning agents, hydrocarbon-based cleaning agents, or alcohol-based cleaning, etc. A high boiling point solvent having a boiling point in the range of 100 ° C. to 200 ° C. is suitable for use as a cleaning agent.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0011]
(Basic configuration of the steam cleaning device 1)
FIG. 1 is a block diagram showing a basic configuration of a steam cleaning apparatus 1 to which the present invention is applied.
[0012]
As shown in FIG. 1, a steam cleaning apparatus 1 to which this embodiment is applied includes a steam generation tank 2A, a decompression mechanism 4A connected to the steam generation tank 2A via a condenser 3A, and a steam generation tank 2A. A cleaning tank 6A to which the generated cleaning agent vapor is supplied via the steam supply path 5A, a cleaning liquid discharge path 7A for discharging the cleaning liquid connected to the cleaning tank 6A and accumulated in the cleaning tank 6A, A liquid feeding mechanism 9A connected to the cleaning liquid discharge path 7A via a cooler 8A and a vacuuming mechanism 10A capable of evacuating the cleaning tank 6A without using the cooler 8A are configured. Further, the steam cleaning apparatus 1 of the present embodiment includes a switching mechanism 11A that switches between a state where the steam generation tank 2A is connected to the cleaning tank 6A via the steam supply path 5A and a state where the steam generation tank 2A is connected to the condenser 3A. In the middle of the steam supply path 5A, the steam generation tank 2A is switched between the state connected to the cleaning tank 6A via the steam supply path 5A and the state connected to the condenser 3A, and the cleaning tank 6A is condensed. A three-way cock 11 that cannot be switched to a state of being connected to the container 3A is used.
[0013]
In the steam cleaning apparatus 1 configured as described above, in the steam generation tank 2A, while the cleaning liquid stored therein is heated, the inside of the tank is decompressed by the decompression mechanism 4A to generate the cleaning agent vapor. At this time, the cleaning agent vapor generated from the vapor generation tank 2A is trapped by the condenser 3A and does not reach the decompression mechanism 4A. On the other hand, in the cleaning tank 6A, after a work is put therein, the valve AV9 is opened, and the inside of the cleaning tank 6A is decompressed by the vacuuming mechanism 10A. In this state, the three-way cock 11 is operated so that the steam generation tank 2A is connected to the cleaning tank 6A via the steam supply path 5A, and then the valve AV5 is opened to supply the cleaning agent vapor in the steam generation tank 2A. It introduce | transduces in 6A of washing tanks.
[0014]
As a result, in the cleaning tank 6A, the cleaning agent vapor touches the workpiece to clean and condense the workpiece. At this time, the work is cleaned while discharging the condensed cleaning agent to the cooler 8A through the cleaning liquid discharge path 7A.
[0015]
After the cleaning is completed in this way, the valves AV5 and AV7, which have been open until then, are closed, the cleaning tank 6A, the steam generation tank 2A and the cooler 8A are shut off, and the inside of the cooler 8A is then closed. The vacuum is released, and the cleaning liquid accumulated in the cooler 8A is discharged from the cooler 8A by the liquid feeding mechanism 9A.
[0016]
In addition, after the valves AV5 and AV7 are closed and the cleaning tank 6A is disconnected from the steam generation tank 2A and the cooler 8A, the inside of the cleaning tank 6A is directly evacuated by the vacuuming mechanism 10A. Then, the cleaning liquid adhering to the workpiece is dried and removed.
[0017]
Thus, in the steam cleaning apparatus 1 of the present embodiment, the workpiece is cleaned with the cleaning agent vapor in the cleaning tank 6A, and cleaning is performed while discharging the cleaning agent condensed by touching the workpiece into the cooler 8A at this time. The cleaning agent hardly remains in the cleaning tank 6A. Further, after cleaning, the cleaning tank 6A is completely shut off from the steam generation tank 2A and the cooler 8A, and then the cleaning liquid is discharged from the cooler 8A by the liquid feeding mechanism 9A. Since the mechanism 10A is connected to the cleaning tank 6A without passing through the cooler 8A, the vacuuming mechanism 10A directly evacuates the cleaning tank 6A even if the cleaning liquid is accumulated in the cooler 8A. . Therefore, according to the present invention, the workpiece can be dried in a short time in the cleaning tank 6A that has been subjected to the steam cleaning. Moreover, since the steam cleaning apparatus 1 according to the present embodiment generates solvent vapor under reduced pressure, the cleaning agent and workpiece can be handled at a low temperature, and the cleaning agent is handled under reduced pressure. The cleaning agent does not leak. Therefore, a high-boiling solvent having a boiling point in the range of 100 ° C. to 200 ° C., such as a silicon-based cleaning agent, a hydrocarbon-based cleaning agent, or an alcohol-based cleaning, is suitable for use as the cleaning agent.
[0018]
In this embodiment, the state where the cleaning tank 6A and the condenser 3A are connected to switch the state where the steam generation tank 2A is connected to the cleaning tank 6A and the state where it is connected to the condenser 3A. A three-way cock 11 that cannot be switched to is used. For this reason, even if there is an operation mistake, there is no state where the cleaning tank 6A and the condenser 3A are connected, so that the cleaning liquid accumulated in the condenser 3A does not enter the cleaning tank 6A and wet the workpiece.
[0019]
【Example】
FIG. 2 is an explanatory view showing an embodiment of a steam cleaning apparatus to which the present invention is applied. In this figure, what is represented by a solid line, a dotted line, a one-dot chain line, and a two-dot chain line are a cleaning liquid system (cleaning agent steam system), a heat transfer oil system, an exhaust system, and a cooling water system, respectively. The steam cleaning device 1 includes a manual ball valve, an air-driven automatic ball valve, a vacuum pump, a liquid feed pump, a strainer, a temperature sensor, and the like. Self-explanatory items are denoted by reference numerals GV, AV, VP, P, ST, and TH, respectively, and description thereof is omitted.
[0020]
In FIG. 2, the steam cleaning device 1 of this example is supplied with a heat transfer fluid pump 50 for heat transfer fluid from a heat transfer device 50, and a heat recirculation pump 51 has a built-in vacuum regenerator 2 (a steam generation tank). 2A) and a first liquid-sealed vacuum pump 4 (decompression mechanism 4A) connected to the vacuum regenerator 2 via a secondary heat exchanger 3 (condenser 3A). In the vessel 2, cleaning agent vapor is generated under reduced pressure from the cleaning liquid stored therein. Examples of the cleaning agent include a high-boiling solvent having a boiling point in the range of 100 ° C. to 200 ° C., such as a silicon-based cleaning agent, a hydrocarbon-based cleaning agent, or an alcohol-based cleaning. The internal pressure of the vacuum regenerator 2 is monitored by a vacuum gauge 201 and a vacuum pressure switch 202. Since the cleaning agent is used while being recycled, the vacuum regenerator 2 is not only used as a steam generating tank 2A for generating the cleaning agent vapor at the time of the steam cleaning, but also a distiller for regenerating the used cleaning agent. Also used as Accordingly, the waste liquid pipe 203 is connected to the bottom portion of the vacuum regenerator 2, and the residue remaining after the regeneration is sent to the waste liquid container 205 by the waste liquid feed pump 204.
[0021]
A steam supply pipe 5 (steam supply path 5A) is connected to the upper surface portion of the steam generation tank 2A. This steam supply pipe 5 is connected at its tip to a steam cleaning / drying tank 6 (cleaning tank 6A), and supplies the cleaning agent vapor generated in the steam generating tank 2A into the steam cleaning / drying tank 6.
[0022]
A decompression pipe 21 is connected to a midway position of the steam supply pipe 5 via a three-way cock 11 (switching mechanism 11A). The decompression pipe 21 passes through the temporary heat exchanger 31 and the secondary heat exchanger 3 and the first heat exchange pipe 31. The liquid ring vacuum pump 4 is connected. The three-way cock 11 switches between a state in which the vacuum regenerator 2 is connected to the steam cleaning / drying tank 6 via the steam supply pipe 5 and a state in which the vacuum regenerator 2 is connected to the secondary heat exchanger 3 to perform steam cleaning / drying. Switching to the state in which the tank 6 is connected to the secondary heat exchanger 3 is impossible.
[0023]
The primary heat exchanger 31 is inserted in the middle of the supply pipe 42 for the cleaning liquid from the buffer tank 41 for temporarily storing the used cleaning liquid to the vacuum regenerator 2, and the vacuum regenerator 2 passes through the supply pipe 42. Heat exchange is performed between the cleaning liquid replenished in the vacuum cleaner 2 and the cleaning agent vapor traveling from the vacuum regenerator 2 through the pressure reducing tube 21 toward the secondary heat exchanger 3. Accordingly, the cleaning agent vapor that has passed through the pressure reducing pipe 21 from the vapor generation tank 2 </ b> A is cooled by the primary heat exchanger 31, completely condensed by the secondary heat exchanger 3, and stored in the regenerated liquid tank 43. It will be. The regenerated liquid tank 43 also contains a treated cleaning liquid used in an immersion cleaning tank (not shown) or an ultrasonic cleaning tank (not shown) associated with the steam cleaning apparatus 1 of this example. 2 is sent by a liquid ring vacuum pump 44. The cleaning liquid overflowed in the regenerating liquid tank 43 is used in the immersion / ultrasonic vapor cleaning tank, and then regenerated, and then recovered in the buffer tank 41. The buffer tank 41 is also replenished with a new solution as necessary.
[0024]
In this example, a cleaning liquid discharge pipe 7 (cleaning liquid discharge path 7A) is connected to the bottom portion of the steam cleaning / drying tank 6, and a drain liquid receiver 8 (cooler 8A), a valve is provided in the middle of the cleaning liquid discharge pipe 7. AV16 and the liquid feed pump 9 (liquid feed mechanism 9A) are inserted. The cleaning liquid passing through the cleaning liquid discharge pipe 7 is a used cleaning liquid condensed in the steam cleaning / drying tank 6, and is recovered in the buffer tank 41 through the recovery pipe 71.
[0025]
A vacuum suction pipe 72 is connected to the steam cleaning / drying tank 6, and the steam cleaning / drying tank 6 is not routed through the drain liquid receiver 8 in the middle of the vacuum suction pipe 72. A two-stage evacuation mechanism 10A comprising a booster pump 16 for evacuation and a third liquid ring vacuum pump 17 is configured. Since the vacuuming pipe 72 and the decompression pipe 21 are connected by the first connecting pipe 73, the first liquid ring vacuum pump can be obtained by opening the valves AV10 and AV15 inserted therein. 4 can also be used to evacuate the steam cleaning / drying tank 6 without using the drain liquid receiver 8. As described above, even when the vacuum cleaning / drying tank 6 is evacuated by the two liquid-sealed vacuum pumps 4, 17, the three-way cock 11 uses the steam cleaning / drying tank 6 as the secondary heat exchanger 3 and the liquid. Since it is not connected to the sealed vacuum pumps 4 and 17, the steam cleaning / drying tank 6 is not evacuated via the secondary heat exchanger 3. In other words, in any case, the vacuum cleaning / drying tank 6 is evacuated without using the drain liquid receiver 8 or the secondary heat exchanger 3 in any case.
[0026]
Both the booster pump 16 and the third liquid-sealed vacuum pump 17 are for vacuum-drying the workpiece in the steam cleaning / drying tank 6 after the cleaning is completed. The cleaning liquid drawn as vapor is stored in the regenerated liquid tank 43. In the steam cleaning / drying tank 6, the degree of vacuum is monitored by a vacuum gauge 601 and a vacuum pressure switch 602.
[0027]
An exhaust pipe 47 is connected to the buffer tank 41, and an exhaust blower 48 and a fireproof damper 49 are configured in the exhaust pipe 47. An exhaust pipe 47 is also connected to the regeneration liquid tank 43, and a mist trap 46 is also formed between the exhaust pipe 47 and the exhaust blower 48.
[0028]
In the steam cleaning apparatus 1 of this example configured as described above, in the vacuum regenerator 2, the inside of the tank is depressurized by the first liquid-sealed vacuum pump 4 while heating the cleaning liquid stored therein, and the cleaning agent vapor is generated. appear. On the other hand, after the work is put in the steam cleaning / drying tank 6, the valve AV9 is opened, and the steam cleaning / drying tank 6 is decompressed by the booster pump 16 and the third liquid ring vacuum pump 17. . In this state, the three-way cock 11 is operated so that the vacuum regenerator 2 is connected to the steam cleaning / drying tank 6 via the steam supply pipe 5, and then the valve AV5 is opened to clean the vacuum regenerator 2. The agent vapor is introduced into the steam cleaning / drying tank 6.
[0029]
As a result, in the steam cleaning / drying tank 6, the cleaning agent vapor touches the workpiece to clean the workpiece and condense. At this time, the valves AV6 and AV7 are opened, and the work is cleaned while discharging the condensed cleaning agent to the drain liquid receiver 8 through the cleaning liquid discharge pipe 7.
[0030]
After the cleaning is completed in this manner, the valves AV5, AV6, AV7 are closed, and the three-way cock 11 is operated to cause the vacuum regenerator 2 to operate the secondary heat exchanger 3 and the first liquid-sealed vacuum. After switching to the state of connection to the pump 4 side and shutting off the steam cleaning / drying tank 6 from the drain liquid receiver 8 and the vacuum regenerator 2, the drain liquid receiver 8 is evacuated to open the drain liquid receiver 8. The cleaning liquid accumulated in the inside is discharged from the drain liquid receiver 8 by the liquid feed pump 9.
[0031]
Further, after the valves AV5, AV6 and AV7 are closed and the steam cleaning / drying tank 6 is disconnected from the drain liquid receiver 8 and the vacuum regenerator 2, the booster pump 16 and the third liquid ring vacuum pump 17 are provided. The steam cleaning / drying tank 6 is directly evacuated by the two-stage evacuation mechanism 10A. Then, the cleaning liquid adhering to the workpiece is dried and removed.
[0032]
Thus, in the steam cleaning apparatus 1 of this example, the workpiece is cleaned with the cleaning agent vapor in the steam cleaning / drying tank 6, and at this time, the cleaning agent condensed by touching the workpiece is discharged to the drain liquid receiver 8. Since cleaning is performed, almost no cleaning agent remains in the steam cleaning / drying tank 6. After the cleaning, the steam cleaning / drying tank 6 is completely disconnected from the vacuum regenerator 2 and the drain liquid receiver 8, and then the cleaning liquid is discharged from the drain liquid receiver 8 by the liquid feed pump 9, while When vacuum drying is performed, the vacuum suction mechanism 10A is connected to the steam cleaning / drying tank 6 without the drain liquid receiver 8, so that even if the cleaning liquid is accumulated in the drain liquid receiver 8, The evacuation mechanism 10A evacuates the inside of the steam cleaning / drying tank 6 directly. Therefore, according to this example, the work can be dried in a short time in the steam cleaning / drying tank 6 subjected to the steam cleaning. Moreover, since the steam cleaning apparatus 1 according to this example generates solvent vapor under reduced pressure, the cleaning agent and the workpiece can be handled at a low temperature, and the cleaning agent is handled under reduced pressure. The cleaning agent does not leak. Therefore, a high-boiling solvent having a boiling point in the range of 100 ° C. to 200 ° C., such as a silicon-based cleaning agent, a hydrocarbon-based cleaning agent, or an alcohol-based cleaning, is suitable for use as the cleaning agent.
[0033]
Moreover, even if there is an operation mistake in the three-way cock 11, the steam cleaning / drying tank 6 and the secondary heat exchanger 3 cannot be connected to each other, so the cleaning liquid accumulated in the secondary heat exchanger 3 Does not wet the work in the steam cleaning / drying tank 6.
[0034]
【The invention's effect】
As described above, in the steam cleaning apparatus according to the present invention, the cleaning liquid accumulated in the cleaning tank can be discharged into the cleaning tank through the cleaning liquid discharge path and the cooler by the liquid feeding mechanism. In addition, since the vacuuming mechanism for vacuum drying the workpiece is connected to the cleaning tank without a cooler, the vacuuming mechanism is directly connected to the cleaning tank even if cleaning liquid is collected in the cooler. Evacuate. Therefore, according to the present invention, it is possible to dry the workpiece in a short time in the cleaning tank in which the steam cleaning is performed.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram showing a configuration of a steam cleaning apparatus to which the present invention is applied.
FIG. 2 is an explanatory diagram showing a configuration of a steam cleaning apparatus according to an embodiment of the present invention.
FIG. 3 is an explanatory view showing a configuration of a conventional steam cleaning apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Steam cleaning apparatus 2 Vacuum regenerator 2A Steam generation tank 3 Secondary heat exchanger 3A Condenser 4 1st liquid seal type vacuum pump 4A Pressure reduction mechanism 4
5 Steam supply pipe 5A Steam supply path 6 Steam cleaning / drying tank 6A Cleaning tank 7 Cleaning liquid discharge pipe 7A Cleaning liquid discharge path 8 Drain liquid receiver 8A Cooler 9 Liquid feed pump 9A Liquid feed mechanism 10A Vacuum pulling mechanism 11 Three-way cock 11A Switching Mechanism 16 Booster pump 17 Third liquid-sealed vacuum pump 21 Pressure reducing pipe 72 Vacuum evacuation pipe

Claims

A steam generation tank, a decompression mechanism connected to the steam generation tank via a condenser, a cleaning tank in which the cleaning agent vapor generated in the steam generation tank is supplied via a steam supply path, and the cleaning tank A cleaning liquid discharge path for discharging the cleaning liquid accumulated in the cleaning tank by being connected to the vacuum chamber, a evacuation mechanism capable of evacuating the cleaning tank without going through the condenser, and an intermediate position of the vapor supply path The steam generation tank is switched between the state connected to the cleaning tank and the state connected to the condenser, and the switching to the state where the cleaning tank is connected to the condenser is impossible. A steam cleaning apparatus comprising a cock .

In claim 1, a liquid feed mechanism is connected to the cleaning liquid discharge path via a cooler,
The steam cleaning apparatus according to claim 1, wherein the vacuuming mechanism can vacuum the inside of the cleaning tank without using the cooler.

2. The vapor cleaning apparatus according to claim 1, wherein a liquid feed mechanism is connected to the cleaning liquid discharge path via a drain liquid receiver.

The cleaning agent according to any one of claims 1 to 3, wherein the cleaning agent has one or more boiling points selected from the group consisting of a silicon-based cleaning agent, a hydrocarbon-based cleaning agent, and an alcohol-based cleaning agent from 100 ° C. A steam cleaning apparatus characterized by being a high boiling point solvent in a range up to 200 ° C.