JP3826376B2 - Wax processing equipment for skis - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention mainly relates to a wax processing apparatus used when wax is applied to a skiing surface such as a ski or a snowboard, and the wax enters even the details (small gaps) of the skiing surface such as a ski or snowboard. Further, the present invention relates to a wax processing apparatus for skis and the like which is devised so that the wax is well adapted to the running surface, and these processes can be performed easily and in a short time.
[0002]
[Prior art]
Conventionally, in order to apply a wax to a sliding surface such as a ski, it is generally performed to apply wax by heating the sliding surface such as a wax and a ski. And as what can perform this to some extent automatically, there exist a waxing apparatus as described in Unexamined-Japanese-Patent No. 11-425, and a heater apparatus used for it, for example.
[0003]
[Problems to be solved by the invention]
However, in the conventional means, when the wax is put into the details of the sliding surface such as skis (for example, smaller recesses or minute gaps on the sliding surface), the smaller the details, the smaller the details. There was a problem that it was difficult for wax to get in because of some air.
[0004]
[Means for Solving the Problems]
Therefore, the present invention eliminates the above-mentioned difficulties and makes it possible for the wax to penetrate into the details of the running surface such as skis and snowboards, so that the wax is well adapted to the running surface. It was created to provide a wax processing apparatus that can be processed more easily and in a short time, and that has a simple structure, is suitable for mass production, is easy to handle, and is relatively economical.
[0005]
Therefore, the wax processing apparatus S according to claim 1 is a wax processing apparatus used when wax is applied to the skiing surface of the ski board 20 or the snowboard, and can accommodate the ski board 20 or the like. A decompression vessel A provided with an openable / closable hatch 2, pressure regulation means for regulating the pressure in the decompression chamber 3 provided in the decompression vessel A, and temperature regulation means for regulating the temperature in the decompression chamber 3 The pressure adjusting means and the temperature adjusting means are configured to be controlled by the control box 8.
[0006]
Further, in the wax processing apparatus S according to claim 2, the temperature adjusting means includes a plurality of heaters 5 disposed in the upper part of the decompression chamber 3 and a protection functioning as a shielding plate disposed below the heater 5. The protection body 6 is constituted by a body 6 and adopts a means for forming the protection body 6 so as to prevent contact with the heater 5 such as a ski .
[0007]
Furthermore, in the wax processing apparatus S according to claim 3, the rack B formed by providing the support body 11 having a plurality of support arms 12 on which the ski 20 is placed on the base 10 with the wheels 13 is provided. A means for forming and configuring the rack B to be freely housed in the decompression chamber 3 from the hatch 2 was adopted.
[0008]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described based on illustrated examples as follows.
In the figure, S mainly indicates details of the sliding surface (for example, minute recesses, minute gaps on the sliding surface, or molecules of the ski plate 20 material) when wax is applied to the sliding surface of the ski 20 or snowboard. The wax processing apparatus of the present invention is configured such that the wax enters (including the space of the level), the wax is well adapted (ripened) to the running surface, and these processes can be performed easily and in a short time. The wax processing apparatus S can accommodate the ski 20 or the like, and has a substantially cylindrical container-like decompression container A provided with openable / closable hatches 2 at both ends (or one end) thereof, and the decompression container A. A pressure adjusting means capable of adjusting the pressure in the decompression chamber 3; and a temperature adjusting means capable of adjusting the temperature in the decompression chamber 3. The pressure adjusting means and the temperature adjusting means are controlled by a control box. Automatically (or manually) by those configured to be able to control.
[0009]
That is, the inside of the decompression chamber 3 can be appropriately decompressed (including a vacuum state) by the pressure regulation means, and the inside of the decompression chamber 3 can be suitably heated by the temperature regulation means. The skis 20 and the like, which are preliminarily coated with wax on the sliding surface and are accommodated in the decompression chamber 3 with the sliding surface facing upward, are subjected to details of the sliding surface (for example, smaller concave portions of the sliding surface) by decompression and heating. And fine air gaps), and the wax enters the details. Thus, the wax becomes more familiar with the sliding surface than the conventional means.
[0010]
The decompression container A is formed, for example, with a substantially cylindrical container base 1 that is set to be longer than the length of the ski 20 or the like, and the hatch 2 is formed to be openable and closable at the left and right ends of the container base 1. Further, a plurality of confirmation window portions 4 are arranged in the longitudinal direction of the container base 1 so that the wax treatment state of the ski 20 in the decompression chamber 3 can be easily visually recognized from the outside. .
[0011]
It should be noted that the specific configuration, shape, dimensions, material, number, arrangement state of the decompression vessel A, the specific configuration, shape, dimensions, material of the container base 1, the specific configuration, shape, dimensions, material, number of the hatch 2 The arrangement position, the specific configuration, shape and dimensions of the decompression chamber 3, the specific configuration, shape, dimensions, material, number, arrangement position, etc. of the confirmation window 4 are limited to those shown in the illustrated example. It can be freely set and changed as appropriate.
[0012]
The temperature adjusting means capable of appropriately controlling (for example, heating) the temperature in the decompression chamber 3 includes, for example, a plurality of heaters 5 arranged along the longitudinal direction in the upper part of the decompression chamber 3 and below the heaters 5. It is comprised by the protector 6 which served as the shielding board (or reflecting plate) distribute | arranged. That is, it is configured so that the skis 20 and the like do not come into contact with the heater 5 when the skis 20 and the like are taken in and out of the decompression chamber 3, so that the heater 5 can be prevented from being damaged. Further, the heat from the heater 5 is not directly transmitted to the uppermost ski 20 in the decompression chamber 3 but is reflected on the inner peripheral wall of the decompression chamber 3 so that the plurality of skis 20 in the decompression chamber 3 is reflected. It is configured so that heat is uniformly transmitted to the surface.
[0013]
In addition, the specific configuration of the temperature adjusting means, the specific configuration of the heater 5, the shape, dimensions, material, arrangement position, number, the specific mounting means in the decompression chamber 3, the specific configuration, shape of the protector 6, The dimensions, material, location, specific mounting means in the decompression chamber 3 and the like are not limited to those shown in the drawings, and can be set and changed as appropriate.
[0014]
A pressure adjusting means capable of freely controlling the pressure in the decompression chamber 3 as appropriate (for example, decompression or in a vacuum state) is disposed, for example, on the upper portion of the container base 1 and communicated with the decompression chamber 3 through a pipe or the like as appropriate. The pressure reducing pump 7 (for example, a vacuum pump) is used. That is, the pressure (atmospheric pressure) in the decompression chamber 3 can be freely controlled by the operation of the decompression pump 7.
[0015]
In addition, the specific configuration of the pressure adjusting means, the specific configuration of the decompression pump 7, the shape, the dimensions, the arrangement position, the number, the specific mounting means to the decompression container A, etc. are limited to those in the illustrated example. It can be freely set and changed as appropriate.
[0016]
The control box 8 that can automatically control the pressure adjusting means and the temperature adjusting means is fixed to the upper part of the decompression vessel A, for example, and controls the operating state of the decompression pump 7 on the basis of the time axis, and the heater 5. ON, OFF, current control, etc. can be freely set and changed. Moreover, the control box 8 is linked to a pressure sensor (not shown) or a temperature sensor (not shown) provided in the decompression chamber 3 of the decompression vessel A, and more accurate control of pressure and temperature is possible. It is comprised so that.
[0017]
The specific configuration, arrangement position, specific arrangement, number and position of the pressure sensor, the specific configuration, arrangement position and number of the temperature sensor are limited to those in the illustrated example. Can be freely set and changed without any problem.
[0018]
B in the drawing can support the plurality of skis 20 so that the sliding surface faces upward, and can smoothly accommodate the plurality of supported skis 20 from the hatch 2 of the decompression vessel A into the decompression chamber 3 ( Alternatively, the rack B can be smoothly taken out from the decompression chamber 3 to the outside of the decompression container A. The rack B includes, for example, a substantially elongated rectangular frame-shaped base 10 and a longitudinal direction of the base 10. A pair of supports 11 fixed to the upper ends of both ends and four wheels 13 respectively attached to the left and right lower ends of the longitudinal direction of the base 10 are provided, and each of the supports 11 has a plurality of supporting the skis 20. Support arms 12 are arranged along the vertical direction. That is, a plurality of skis 20 can be supported by spanning the skis 20 between the pair of support arms 12, and the plurality of skis 20 can be subjected to wax treatment at one time. The decompression chamber 3 can be stably accommodated. In addition, the left and right wheels 13 are arranged in a substantially C-shape so that the lower side is opened (see FIG. 2), and the rack B itself is considered to be stably accommodated in the decompression chamber 3.
By the way, the rack B in the illustrated example is an example when the binding is not attached to the ski 20, and in the case of the ski 20 with the binding attached, the number that can be accommodated at one time is reduced.
[0019]
The specific configuration, shape, dimensions, and material of the rack B, the specific configuration, shape, dimensions, and material of the base 10, the specific configuration, shape, dimensions, material, number, placement position, and support of the support 11 The specific configuration, shape, dimensions, number, arrangement position of the arm 12, the specific configuration, shape, dimensions, material, number, arrangement position, etc. of the wheel 13 are not limited to those shown in the drawings, etc. It can be set and changed freely.
[0020]
The wax processing apparatus S of the present invention is configured as described above. Next, an example of its use will be described. First, wax is applied to the running surface of the ski 20. Then, the plurality of skis 20 are supported horizontally on the support arms 12 of the rack B so that the sliding surface is on the top. Next, the rack B is accommodated from the hatch 2 into the decompression chamber 3 of the decompression container A, and the hatch 2 is closed. Then, a current is supplied to the heater 5 by the control box 8 to heat the inside of the decompression chamber 3, and in addition, the decompression pump 7 is operated to decompress the inside of the decompression chamber 3. It should be noted that adjustment of heating timing, temperature change in the decompression chamber 3, decompression timing, change in pressure in the decompression chamber 3, and the like can be freely set as appropriate, and fine adjustment can be performed by the control box 8. That is, according to the material of the ski board 20, the material of wax, snow quality, etc., it adjusts suitably so that optimal sliding performance may be obtained.
[0021]
【The invention's effect】
Therefore, according to the wax processing apparatus S of the first aspect, the wax processing apparatus is used when wax is applied to the sliding surface of the ski board 20 or the snow board, and the ski board 20 can be accommodated and opened and closed. A decompression vessel A provided with a free hatch 2, pressure regulation means for regulating the pressure in the decompression chamber 3 provided in the decompression vessel A, and temperature regulation means for regulating the temperature in the decompression chamber 3 are provided. Since the pressure adjusting means and the temperature adjusting means can be controlled by the control box 8, the inside of the decompression chamber 3 can be appropriately reduced by the pressure adjusting means, and the inside of the decompression chamber 3 is appropriately heated by the temperature adjusting means. Will be able to. Therefore, in the ski 20 or the like that is preliminarily coated with wax on the sliding surface and is accommodated in the decompression chamber 3 with the sliding surface facing upward, the skiing is performed by decompression and heating in the decompression chamber 3. Air in the details of the surface (for example, smaller recesses on the sliding surface, minute gaps, etc.) can easily escape and wax can easily enter the details. That is, the wax becomes familiar with the sliding surface. As a result, the skiing performance of the ski 20 or the like is further improved.
Moreover, these processes can be performed more easily and in a short time. In addition, the configuration of the wax processing apparatus S itself is simple and compact, suitable for mass production, and can be provided at a relatively low cost. Thus, an economical wax processing apparatus S is obtained.
Further, the control box 8 makes it possible to control the pressure adjusting means and the temperature adjusting means simply, accurately and finely, and the wax processing apparatus S is extremely easy to handle.
[0022]
According to the wax processing apparatus S of the second aspect, the temperature adjusting means includes a plurality of heaters 5 disposed in the upper part of the decompression chamber 3 and a protective body serving also as a shielding plate disposed below the heater 5. 6 and this protector 6 is formed so as to prevent the ski 5 from coming into contact with the heater 5, so that the heater 5 can be damaged by putting the ski 20 into and out of the decompression chamber 3. The protector 6 can surely prevent the heat, and the heat from the heater 5 is uniformly transmitted to the plurality of skis 20 in the decompression chamber 3.
[0023]
Furthermore, according to the wax processing apparatus S of the third aspect, the rack B is formed by providing the support body 11 having the plurality of support arms 12 on which the ski 20 is placed on the upper part of the base 10 with the wheels 13. Since the rack B is configured to be freely housed in the decompression chamber 3 from the hatch 2, the plurality of skis 20 can be waxed at a time, and the plurality of skis 20 are attached to the decompression chamber 3. It can be accommodated easily and stably inside.
[Brief description of the drawings]
FIG. 1 is a front view illustrating a wax processing apparatus of the present invention.
FIG. 2 is a longitudinal side view illustrating a wax processing apparatus of the present invention.
FIG. 3 is a partially omitted vertical front view illustrating a wax lighting device of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS S Wax processing apparatus A Depressurization container 1 Container base 2 Hatch 3 Decompression chamber 4 Confirmation window part 5 Heater 6 Protection body 7 Decompression pump 8 Control box B Rack 10 Base 11 Support body 12 Support arm 13 Wheel 20 Ski board

Claims (3)

A wax processing device used when wax is applied to a skiing surface such as a ski or snowboard, and a decompression container that can accommodate a ski and the like and is provided with an openable / closable hatch, and provided in the decompression container The pressure adjusting means for adjusting the pressure in the reduced pressure chamber and the temperature adjusting means for adjusting the temperature in the reduced pressure chamber are configured so that the pressure adjusting means and the temperature adjusting means can be controlled by a control box. Wax processing equipment for skis. The temperature adjusting means is composed of a plurality of heaters disposed in the upper part of the decompression chamber and a protector that also serves as a shielding plate disposed below the heater, and the protector provides contact with a heater such as a ski. 2. The wax treatment apparatus for skis and the like according to claim 1, wherein the wax treatment apparatus is formed so as to prevent it . A rack is formed by providing a support body having a plurality of support arms on which a ski is placed on an upper part of a wheeled base, and the rack is configured to be housed in a decompression chamber from a hatch. A wax processing apparatus for a ski or the like according to claim 1 or 2.

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