JP3813135B2 - Wire bonding method - Google Patents
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- JP3813135B2 JP3813135B2 JP2003115123A JP2003115123A JP3813135B2 JP 3813135 B2 JP3813135 B2 JP 3813135B2 JP 2003115123 A JP2003115123 A JP 2003115123A JP 2003115123 A JP2003115123 A JP 2003115123A JP 3813135 B2 JP3813135 B2 JP 3813135B2
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- 238000000034 method Methods 0.000 title claims abstract description 28
- 230000000630 rising effect Effects 0.000 description 4
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Abstract
Description
【0001】
【発明の属する技術分野】
本発明は、第1ボンディング点と第2ボンディング点との間をワイヤで接続するワイヤボンディング方法に係り、特にワイヤループ形成方法に関する。
【0002】
【従来の技術】
半導体装置の小型化、軽量化、高性能の要求に応じるものに、複数個のダイ(半導体チップ)を積層させたスタックドパッケージがある。スタックドパッケージは、複数個のダイを積層させているので、積層されたダイの高さが必然的に高くなる。このようなスタックドパッケージにおけるダイのバンプ電極と回路基板の配線間をワイヤで接続して多層ワイヤループを形成するワイヤボンディング方法として次の2つの方法が知られている。
【0003】
第1の方法は、ダイのバンプ電極を第1ボンディング点としてワイヤの先端に形成されたボールをボンディングし、ワイヤを回路基板の配線の方向にルーピングして該配線を第2ボンディング点としてワイヤをボンディングする。第2の方法は、予めダイのバンプ電極上にバンプを形成しておき、回路基板の配線を第1ボンディング点としてワイヤの先端に形成されたボールをボンディングし、ワイヤをダイのバンプ電極の方向にルーピングしてバンプ電極上のバンプを第2ボンディング点としてワイヤをボンディングする。(例えば特許文献1及び2参照)
【0004】
【特許文献1】
特開平11−204720公報
【特許文献2】
特開2000−307057公報
【0005】
【発明が解決しようとする課題】
ダイのバンプ電極を第1ボンディング点とし、回路基板の配線を第2ボンディング点とする第1の方法は、バンプ電極よりワイヤが立ち上がるので、ダイのエッジにワイヤが接触しにくい。回路基板の配線を第1ボンディング点とし、ダイのバンプ電極を第2ボンディング点とする第2の方法は、バンプ電極に対してワイヤが斜めに接続されるので、ダイのエッジにワイヤが接触し易くなる。しかし、多層ワイヤループ形成においては、生産性の向上及び半導体装置の小型化等により第1の方法と第2の方法を組み合わせた方法又は第2の方法のみを採用することが行われている。
【0006】
上記従来技術の前記第2の方法は、多層ワイヤループを単に連続した曲線形状に形成したのみであるので、特に配線(第1ボンディング点)とバンプ電極(第2ボンディング点)との平面距離(上面から見た平面的距離)が例えば0.3mm程度で、かつ積層されたダイの高さ(配線からバンプ電極までの高さ)が例えば1.0mm程度の場合には、ダイのエッジに接触し易いという問題があった。またワイヤループは隣接するワイヤループとの接触を避けるために膨らませており、また膨らませない場合も単なる連続した曲線であるので、ワイヤの腰が弱く、後工程の樹脂封止によって多層ワイヤループが変形するという問題があった。
【0007】
本発明の課題は、ダイのエッジとのクリアランスを十分に確保でき、また積層されたダイの多層ワイヤループ上で隣接するワイヤループにショートすることなく形成できると共に、ワイヤの腰が強くて変形しにくいワイヤボンディング方法を提供することにある。
【0008】
【課題を解決するための手段】
上記課題を解決するための本発明の第1の手段は、第1ボンディング点と第2ボンディング点との間をワイヤで接続するワイヤボンディング方法において、
第1ボンディング点にワイヤを接続する工程と、
次にキャピラリを少し上昇させ、続いて第2ボンディング点と反対方向に僅かに移動させる第1のリバース動作を行う工程と、
次にキャピラリを上昇させ、続いて第2ボンディング点と反対方向に移動させる第2のリバース動作を行う工程と、
次にキャピラリを上昇させ、続いて第2ボンディング点と反対方向で斜め下方に移動させる第3のリバース動作を行う工程と、
次にクランパが閉じ、キャピラリを第2ボンディング点の反対の方向に水平移動させる工程と、
次にクランパが開き、キャピラリを第2ボンディング点の方向に僅かに戻して水平移動する工程と、
次にキャピラリを第1ボンディング点のほぼ上方まで上昇させてワイヤを繰り出し、第2ボンディング点の方向に移動させてワイヤを第2ボンディング点に接続する工程とを行うことを特徴とする。
【0009】
【発明の実施の形態】
本発明のワイヤボンディング方法を図1及び図2により説明する。図2に示すように、セラミック基板やプリント基板等又はリードフレームよりなる回路基板1上には、積層されて厚さの厚いダイ2がマウントされている。本実施の形態は、回路基板1の配線又はリード等の第1ボンディング点Aに第1ボンディングを行い、ダイ2の第2ボンディング点Kに第2ボンディングを行って第1ボンディング点Aと第2ボンディング点K間をワイヤ3により電気的に接続する。4はバンプを示し、ワイヤ3を接続する前に予め公知のワイヤボンディング方法によってダイ2のバンプ電極上に形成されている。
【0010】
まず、図1(a)に示すように、ワイヤ3をクランプするクランパ(図示せず)は開状態で、キャピラリ5が下降して第1ボンディング点Aにワイヤ先端に形成されたボールをボンディングした後、キャピラリ5はB点まで上昇してワイヤ3を繰り出す。次に図1(b)に示すように、キャピラリ5を第2ボンディング点Kと反対方向のC点まで水平移動させる第1のリバース動作を行う。この図1(a)から(b)の工程により、ワイヤ3の部分に屈折部61が付けられる。またA点からC点までの工程で繰り出されたワイヤ3は、図2に示すネック高さ部71となる。
【0011】
次に図1(c)に示すように、キャピラリ5はD点まで上昇してワイヤ3を繰り出す。その後、図1(d)に示すように、キャピラリ5を再び第2ボンディング点Kと反対方向のE点まで水平移動させる第2のリバース動作を行う。この図1(c)から(d)の工程により、ワイヤ3の部分に屈折部62が付けられる。またC点からE点までの工程で繰り出されたワイヤ3は、図2に示すほぼ垂直に伸びた垂直ワイヤ部72となる。
【0012】
次に図1(e)に示すように、キャピラリ5はダイ2より高いF点まで上昇してワイヤ3を繰り出す。その後、図1(f)に示すように、キャピラリ5を第2ボンディング点Kと反対方向でかつ斜め下方のG点まで移動させる第3のリバース動作を行う。ここで、キャピラリ5を斜め下方に移動させるのは、後記する屈折部63に強い癖を付けることにある。
【0013】
前記G点でクランパは閉じ、図1(g)に示すように、キャピラリ5は再び第2ボンディング点Kの反対の方向のH点まで水平移動する。この図1(e)から(g)の工程により、ワイヤ3の部分に屈折部63が付けられる。またE点からG点までの工程で繰り出されたワイヤ3は、図2に示す上昇傾斜部73となる。このように、G点からH点まではクランパは閉じて水平移動するので、この動作によって屈折部62と屈折部63間の上昇傾斜部73は膨らむことがなく強い屈折部63が付き、また屈折部63の位置が安定すると共に、形状保持力が高いワイヤループ形状が形成される。
【0014】
次に前記H点でクランパは開き、図1(h)に示すように、キャピラリ5はG点とH点のほぼ中間のI点まで第2ボンディング点Kの方向に水平移動する。このようにキャピラリ5をH点よりI点まで戻すのは、前記したように強い屈折部63が形成されているので、キャピラリ5をH点より上昇させてワイヤ3を繰り出すと、屈折部63がキャピラリ5の下端のホールエッジ部に引っ掛かってワイヤ3が正常に繰り出されない虞がある。前記した戻し工程を行うと、屈折部63がキャピラリ5の下端のホールエッジ部より離れる。
【0015】
次に図1(i)に示すように、キャピラリ5は第1ボンディング点Aのほぼ上方のJ点まで上昇して図2に示す下降傾斜部74分だけワイヤ3を繰り出す。その後は従来と同様に、クランパ(図示せず)は閉じ、図2に示すように、キャピラリ5は円弧運動又は円弧運動後に下降して第2ボンディング点Kに位置し、ワイヤ3をバンプ4上に第2ボンディングする。なお、J点から第2ボンディング点Kまでの動作は、本発明の要旨と直接関係はないので、前記した円弧動作を行わせても、またはその他の種々の動作を行わせても良いことは言うまでもない。
【0016】
このように、第1ボンディング点Aよりほぼ垂直に立ち上がった垂直ワイヤ部72が形成され、また上昇傾斜部73と下降傾斜部74とで山形形状に形成され、かつ第2ボンディング点K直前の屈折部63は、前記した方法によって強い屈折に形成されているので、ダイ2のエッジとのクリアランスを確保でき、ダイ2エッジショートを回避できる。またワイヤ3の腰が強く形成されるので、多層ワイヤループにおいても隣接するワイヤループとの干渉を防止できると共に、樹脂封止等の外力によってワイヤループが変形しにくい。本実施の形態は、特に第1ボンディング点Aと第2ボンディング点Kとの平面距離(上面から見た平面的距離)が短く、かつ第1ボンディング点Aから第2ボンディング点Kまでの高さが高い場合には効果的である。
【0017】
【発明の効果】
本発明は、第1ボンディング点にワイヤを接続する工程と、次にキャピラリを少し上昇させ、続いて第2ボンディング点と反対方向に僅かに移動させる第1のリバース動作を行う工程と、次にキャピラリを上昇させ、続いて第2ボンディング点と反対方向に移動させる第2のリバース動作を行う工程と、次にキャピラリを上昇させ、続いて第2ボンディング点と反対方向で斜め下方にに移動させる第3のリバース動作を行う工程と、次にクランパが閉じ、キャピラリを第2ボンディング点の反対の方向に水平移動させる工程と、次にクランパが開き、キャピラリを第2ボンディング点の方向に僅かに戻して水平移動する工程と、次にキャピラリを第1ボンディング点のほぼ上方まで上昇させてワイヤを繰り出し、第2ボンディング点の方向に移動させてワイヤを第2ボンディング点に接続する工程とを行うので、ダイのエッジとのクリアランスを十分に確保でき、また積層されたダイの多層ワイヤループ上で隣接するワイヤループにショートすることなく形成できると共に、ワイヤの腰が強くて変形しにくい。
【図面の簡単な説明】
【図1】本発明ワイヤボンディング方法の一実施の形態を示す工程図である。
【図2】図1の工程で得られたワイヤループ形状の一例を示す正面図である。
【符号の説明】
A 第1ボンディング点
K 第2ボンディング点
1 回路基板
2 ダイ
3 ワイヤ
4 バンプ
5 キャピラリ
61、62、63 屈折部
71 ネック高さ部
72 垂直ワイヤ部
73 上昇傾斜部
74 下降傾斜部[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a wire bonding method in which a wire is connected between a first bonding point and a second bonding point, and more particularly to a wire loop forming method.
[0002]
[Prior art]
A stacked package in which a plurality of dies (semiconductor chips) are stacked is one that meets the demands for smaller, lighter, and higher performance semiconductor devices. In the stacked package, since a plurality of dies are stacked, the height of the stacked dies is inevitably increased. The following two methods are known as wire bonding methods for forming a multilayer wire loop by connecting the bump electrodes of the die and the wiring of the circuit board in such a stacked package with wires.
[0003]
The first method is to bond the ball formed at the tip of the wire with the bump electrode of the die as the first bonding point, loop the wire in the direction of the wiring on the circuit board, and use the wire as the second bonding point. Bond. In the second method, bumps are formed in advance on the bump electrodes of the die, balls formed at the tips of the wires are bonded using the wiring on the circuit board as the first bonding points, and the wires are directed to the bump electrodes of the die. The wire is bonded using the bump on the bump electrode as a second bonding point. (For example, see Patent Documents 1 and 2)
[0004]
[Patent Document 1]
Japanese Patent Laid-Open No. 11-204720 [Patent Document 2]
Japanese Patent Laid-Open No. 2000-307057
[Problems to be solved by the invention]
In the first method in which the bump electrode of the die is used as the first bonding point and the wiring on the circuit board is used as the second bonding point, the wire rises from the bump electrode, so that the wire is difficult to contact the edge of the die. In the second method in which the wiring of the circuit board is the first bonding point and the bump electrode of the die is the second bonding point, the wire is obliquely connected to the bump electrode, so that the wire contacts the edge of the die. It becomes easy. However, in the formation of a multilayer wire loop, a method combining the first method and the second method or only the second method is employed for improving productivity and downsizing the semiconductor device.
[0006]
In the second method of the above-described prior art, the multilayer wire loop is simply formed in a continuous curved shape, and in particular, the planar distance between the wiring (first bonding point) and the bump electrode (second bonding point) ( When the planar distance (viewed from the top surface) is about 0.3 mm, for example, and the height of the stacked dies (height from the wiring to the bump electrode) is about 1.0 mm, for example, contact the edge of the die. There was a problem that it was easy to do. In addition, the wire loop is inflated to avoid contact with the adjacent wire loop, and when it does not inflate, it is just a continuous curve, so the wire is weak and the multilayer wire loop is deformed by resin sealing in the subsequent process There was a problem to do.
[0007]
The object of the present invention is to ensure sufficient clearance from the die edge, and can be formed on the multilayered wire loop of the stacked die without short-circuiting to the adjacent wire loop, and the wire waist is strong and deformed. It is to provide a difficult wire bonding method.
[0008]
[Means for Solving the Problems]
The first means of the present invention for solving the above problem is a wire bonding method for connecting a first bonding point and a second bonding point with a wire.
Connecting a wire to the first bonding point;
Next, a step of performing a first reverse operation in which the capillary is slightly raised and subsequently moved slightly in the direction opposite to the second bonding point;
Next, performing a second reverse operation for raising the capillary and subsequently moving it in the direction opposite to the second bonding point;
Next, performing a third reverse operation in which the capillary is raised and subsequently moved obliquely downward in the opposite direction to the second bonding point;
Next, the clamper is closed and the capillary is moved horizontally in the direction opposite to the second bonding point;
Next, the clamper is opened and the capillary is slightly moved back in the direction of the second bonding point and moved horizontally,
Next, the step of raising the capillary to substantially above the first bonding point to pay out the wire and moving it toward the second bonding point to connect the wire to the second bonding point is performed.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
The wire bonding method of the present invention will be described with reference to FIGS. As shown in FIG. 2, a
[0010]
First, as shown in FIG. 1A, a clamper (not shown) for clamping the
[0011]
Next, as shown in FIG.1 (c), the
[0012]
Next, as shown in FIG. 1 (e), the
[0013]
The clamper closes at the point G, and the
[0014]
Next, the clamper opens at the point H, and the
[0015]
Next, as shown in FIG. 1 (i), the
[0016]
In this way, the
[0017]
【The invention's effect】
The present invention includes a step of connecting a wire to the first bonding point, a step of performing a first reverse operation in which the capillary is then lifted slightly, and then moved slightly in a direction opposite to the second bonding point, A step of performing a second reverse operation in which the capillary is raised and subsequently moved in the direction opposite to the second bonding point; and then the capillary is raised and subsequently moved obliquely downward in the direction opposite to the second bonding point Performing a third reverse operation, then closing the clamper and horizontally moving the capillary in the direction opposite the second bonding point, and then opening the clamper and slightly moving the capillary in the direction of the second bonding point. The process of returning and horizontally moving, and then raising the capillary to almost above the first bonding point and feeding the wire in the direction of the second bonding point And connecting the wire to the second bonding point to ensure sufficient clearance from the die edge and without shorting to adjacent wire loops on the stacked die multilayer wire loop It can be formed and the wire is strong and difficult to deform.
[Brief description of the drawings]
FIG. 1 is a process diagram showing an embodiment of a wire bonding method of the present invention.
FIG. 2 is a front view showing an example of a wire loop shape obtained in the step of FIG.
[Explanation of symbols]
A 1st bonding point K 2nd bonding point 1
Claims (1)
第1ボンディング点にワイヤを接続する工程と、
次にキャピラリを少し上昇させ、続いて第2ボンディング点と反対方向に僅かに移動させる第1のリバース動作を行う工程と、
次にキャピラリを上昇させ、続いて第2ボンディング点と反対方向に移動させる第2のリバース動作を行う工程と、
次にキャピラリを上昇させ、続いて第2ボンディング点と反対方向で斜め下方に移動させる第3のリバース動作を行う工程と、
次にクランパが閉じ、キャピラリを第2ボンディング点の反対の方向に水平移動させる工程と、
次にクランパが開き、キャピラリを第2ボンディング点の方向に僅かに戻して水平移動する工程と、
次にキャピラリを第1ボンディング点のほぼ上方まで上昇させてワイヤを繰り出し、第2ボンディング点の方向に移動させてワイヤを第2ボンディング点に接続する工程とを行うことを特徴とするワイヤボンディング方法。In the wire bonding method of connecting the first bonding point and the second bonding point with a wire,
Connecting a wire to the first bonding point;
Next, a step of performing a first reverse operation in which the capillary is slightly raised and subsequently moved slightly in the direction opposite to the second bonding point;
Next, performing a second reverse operation for raising the capillary and subsequently moving it in the direction opposite to the second bonding point;
Next, performing a third reverse operation in which the capillary is raised and subsequently moved obliquely downward in the opposite direction to the second bonding point;
Next, the clamper is closed and the capillary is moved horizontally in the direction opposite to the second bonding point;
Next, the clamper is opened and the capillary is slightly moved back in the direction of the second bonding point and moved horizontally,
Next, a step of raising the capillary to substantially above the first bonding point to pay out the wire and moving it toward the second bonding point to connect the wire to the second bonding point is performed. .
Priority Applications (3)
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JP2003115123A JP3813135B2 (en) | 2003-04-21 | 2003-04-21 | Wire bonding method |
TW093103738A TW200428543A (en) | 2003-04-21 | 2004-02-17 | Wire bonding method |
KR1020040016335A KR100598822B1 (en) | 2003-04-21 | 2004-03-11 | Wire bonding method |
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JP2003115123A JP3813135B2 (en) | 2003-04-21 | 2003-04-21 | Wire bonding method |
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JP3813135B2 true JP3813135B2 (en) | 2006-08-23 |
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KR (1) | KR100598822B1 (en) |
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JP4881620B2 (en) * | 2006-01-06 | 2012-02-22 | ルネサスエレクトロニクス株式会社 | Semiconductor device and manufacturing method thereof |
WO2009117170A1 (en) * | 2008-03-17 | 2009-09-24 | Kulicke And Soffa Industries, Inc. | Wire payout measurement and calibration techniques for a wire bonding machine |
JP5266371B2 (en) * | 2011-08-04 | 2013-08-21 | ルネサスエレクトロニクス株式会社 | Semiconductor device and manufacturing method thereof |
JP6644352B2 (en) * | 2017-09-27 | 2020-02-12 | 日亜化学工業株式会社 | Semiconductor device and manufacturing method thereof |
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2003
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2004
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KR100598822B1 (en) | 2006-07-11 |
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TW200428543A (en) | 2004-12-16 |
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