JP3779023B2 - Processing solution heating device for development processing apparatus - Google Patents

Processing solution heating device for development processing apparatus Download PDF

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JP3779023B2
JP3779023B2 JP04339597A JP4339597A JP3779023B2 JP 3779023 B2 JP3779023 B2 JP 3779023B2 JP 04339597 A JP04339597 A JP 04339597A JP 4339597 A JP4339597 A JP 4339597A JP 3779023 B2 JP3779023 B2 JP 3779023B2
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processing
tank
film
processing liquid
circulation
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JPH10239813A (en
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善文 中村
浩史 上野
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Noritsu Koki Co Ltd
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Noritsu Koki Co Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、写真感光材料を現像するための処理液を収容する処理タンクと、前記処理タンクの上部と連通しているサブタンクと、前記サブタンクと前記処理タンクの下部とを連結する循環流路とを備えた現像処理装置のための処理液加熱装置に関する。
【0002】
【従来の技術】
フィルム、印画紙などの感光材料を現像処理するための現像処理装置では、現像、定着、水洗などの処理槽に現像液、定着液、水洗水などの各処理液が充填されており、これらの処理液の温度を管理するため、処理液加熱装置が用いられている。従来、処理液加熱装置は、処理タンクの上部と連通しているサブタンクに沈められるカートリッジ式ヒータによって構成されており、このヒータによって加熱されたサブタンクの処理液を循環流路を介して処理タンクに流すことによって処理タンク内の処理液の温度を管理するようになっている。
【0003】
さらに、特開平5−080479号公報による処理液加熱装置は、熱源である円柱状のヒータを中心として処理液流通管が互いに等間隔でかつヒータから等しい距離をもって配置した状態で成形型内に設置し、その後成形型内へ熱伝導ブロックとなる溶融金属を充填することによって製作される。このように製作された処理液加熱装置の処理液流通管を対応する循環路に装着することにより、循環路を流れる処理液は処理液流通管の領域で加熱され、その熱エネルギーを処理タンクへ運び込むことによって処理タンク内の処理液の温度が管理される。
【0004】
【発明が解決しようとする課題】
前者の処理液加熱装置に比べ後者の装置では、サブタンクからカートリッジ式ヒータを収容するスペースを省略でき、サブタンクからの処理液の蒸発量を減少できるとともに処理液に対する熱伝導が穏やかに行われるという利点が得られるが、熱源としてのヒータと熱伝導ブロックを共鋳込みにより一体成型しているので、ヒータの故障や経時劣化が生じても、ヒータだけを交換するわけにはいかないという欠点がある。さらに、ヒータを熱伝導ブロックのための成形型内に配置する際、複雑な姿勢をとることは困難である。
本発明の目的は、製作が容易で、熱源の交換が可能な、循環流路に装着されるタイプの処理液加熱装置を提供することである。
【0005】
【課題を解決するための手段】
上記目的を達成するために、本発明による現像処理装置のための処理液加熱装置は、サブタンクと処理タンクの下部とを連結する循環流路に接続される流入口と流出口とを有する処理液流通管と、前記処理液流通管を熱伝導可能に同芯状に包み込んだ状態で鋳込み成型された熱伝導体と、前記処理液流通管に沿って延びるように前記熱伝導体の外面に設けられた溝内に交換可能に挿入されている熱源部材とを備えている。
【0006】
この構成では、処理液流通管を流れる循環途中の処理液を熱伝導体を介して加熱する熱源部材が熱伝導体の外面に取り付けられているので、熱源部材の保守点検が容易となる。
【0007】
熱伝導体への熱源部材の固定と、熱伝導体と熱源部材との間の熱伝達とを向上させるために、熱伝導体の外面に処理液流通管に沿って延びる溝を設け、この溝内に熱源部材を挿入して交換可能に固定される。溝内に熱源部材を挿入することにより、この処理液加熱装置の外観がすっきりするともに、熱源部材と熱伝導体との接触面積も拡大され、熱伝達効率がよくなる。
理液流通管と熱伝導体との間の優れた熱伝達を得るために、熱伝導体は処理液流通管を包み込んだ状態で鋳込み成型されている
【0008】
所定長さにわたって、例えば、その流入口領域から流出口領域までにわたって処理液流通管を包み込んでいる熱伝導体に対してできるだけ一様に熱を与え、結果的に処理液流通管に一様な熱分布が生じさせるための、本発明によって提案される1つの好適な形態は、熱源部材を収容する溝を処理液流通管を巻き込むように熱伝導体の外面に螺旋状に形成し、熱源部材と処理液流通管との位置関係がコイルバネとその中心軸のような位置関係にすることである。これにより、処理液流通管は、例えば、その流入口領域から流出口領域までにわたって全周囲から実質的に均等に加熱されることになり、局部的な高温加熱により処理液の劣化が防止される。
【0009】
発明のその他の特徴及び利点は、以下図面を用いた発明の実施の形態の説明で明らかになるだろう。
【0010】
【発明の実施の形態】
図1には、本発明による処理液加熱装置を搭載した現像処理装置1の全体構成図が示されている。この現像処理装置1には、先端にリーダを接続した写真感光材料としてのフィルム2を装填するフィルム挿入部3と、フィルム挿入部3から繰り出されるフィルム2を現像処理するフィルム現像部4と、現像処理後のフィルム2を乾燥するフィルム乾燥部5と、乾燥後のフィルム2を一時的に保存するフィルム受け部6とが備えられている。
【0011】
フィルム挿入部3には、搬送ローラ3aと、パトローネ7から引き出し終えたフィルム2の後端を切断するフィルムカッタ3bと、フィルムカッタ3bの一方の刃をスライド移動させるフィルム切断用ソレノイド3cと、フィルム2を搬送ローラ3aに圧着するための遊転ローラ3eと、遊転ローラ3eを上下に移動させて、フィルム2を搬送ローラ3aに圧着する状態と圧着を開放する状態とに切換える圧着ソレノイド3dとが備えられている。パトローネ7から引き出されたフィルム2は、搬送ローラ3aと遊転ローラ3eとに挟持された状態で搬送され、フィルム現像部4に送り込まれる。
【0012】
フィルム現像部4には、現像,漂白,定着等の現像処理を順次行うため現像液、漂白液、定着液、安定液などの処理液が各別に充填された7つの隔室を形成する現像処理タンク40と、フィルム現像部4内でフィルム2を搬送する搬送ローラユニット4bとが備えられている。
【0013】
フィルム現像部4のフィルム搬送径路下流側に位置するフィルム乾燥部5には、図1に示すように、フィルム2を乾燥するための乾燥ヒータ5aと、温風をフィルム搬送径路に向けて送る乾燥ファン5bと、フィルム乾燥部5内の気温を測定する温度センサ5cとが備えられており、フィルム2はフィルム乾燥部5内において、搬送されながら徐々に乾燥されて行き、フィルム受け部6に送り出される。
【0014】
図2は、フィルム現像部4だけを抜き出して図示している。フィルム現像部4の入口部には光センサー10が設けられており、これによりフィルム挿入部3から送り込まれてきたフィルム2が検知される。光センサー10は、制御装置100と接続している。現像処理タンク40は、7つの隔室41〜47を形成しているが、フィルム2の搬入方向の順で、1番目の深い漕となっているのが現像液用隔室41で、次が漂白液用隔室42で、続く2つが定着液用隔室43、44であり、3つの浅い漕となっているのが安定液用隔室45〜47である。各隔室は深さが異なるものがあるが、実質的には同様な構造をもっており、図3には現像液用隔室41の縦断面図が示されており、図4には、図面の大きさの問題から、現像液用隔室41及びこれに隣り合う漂白液用隔室42だけの平面図が示されている。
【0015】
現像液用隔室41の上側領域の側方にサブタンク41aが設けられている。このサブタンク41aの内部には、現像液の温度を検出する温度センサ12、オーバーフロー管14、現像液の液面レベルを検出する液面センサー15、そしてフィルタ16が備えられている。図2と3で模式的に示しているが、サブタンク41aには補充管70が接続されており、現像液の性能を一定に保つために適時補充ポンプ71を動作させ、補充タンク72から補充液をサブタンク41aに供給する。
【0016】
隔室41の上側領域とサブタンク41aの上側領域はカスケード接続により流通可能となっている。さらに、フィルタ16は円筒状であり、その中心孔には多数のスリット17aを設けたパイプ17が差し込まれており、濾過した液がこのスリット17aを通り抜け、パイプ17内を流れるが、このパイプ17の下端部と隔室41の底部とが循環流路51によって接続されており、この循環流路51中には循環ポンプ61と処理液加熱装置80が備えられている。つまり、現像液用隔室41の上部から、サブタンク41a、フィルタ16、循環ポンプ61と処理液加熱装置80を備えた循環流路51を経て、現像液用隔室41の底部に至る循環ラインが形成され、これにより現像液用隔室41内で処理液(ここでは現像液)の循環と加熱が行われる。このようなサブタンク及び循環ラインの構成は、その他の隔室にとっても同様であり、ここでは隔室毎のその説明は省略する。
【0017】
この実施の形態では、処理液加熱装置80はサブタンク41aと循環ポンプ61との間に装着されているが、循環ポンプ61と現像液用隔室41との間に装着されてもよく、重要なことは、処理液加熱装置80が循環流路51に装着されていることである。このことによって、循環流路51を循環ポンプ61によって強制的に流される処理液が加熱されるので、サブタンク41a内に装着されたカートリッジヒータによって処理液を加熱する場合に生じる処理液の局部的な加熱を避けることができる。
【0018】
処理液加熱装置80は、図5と6に示すように、処理液が流れるパイプ状の処理液流通管81と、この処理液流通管81と同芯に配置された実質的に円筒状の熱伝導体82を備えている。処理液流通管81は、熱伝導体82の製作時に、熱伝導体82の成形型内の中心に設置され、その後成形型内へ溶融金属、例えばアルミ、を充填することによって、処理液流通管81と熱伝導体82の一体的な構造体が得られる。
【0019】
熱伝導体82の外周面には、螺旋状に溝82aが設けられており、この螺旋溝82aに屈曲性を有する熱源部材83がぴったりと挿入されている。その際、溝82の断面と熱源部材83の断面をほぼ一致させると、大きな接触面積が得られ、熱源部材83から熱伝導体82への熱伝達が向上する。この熱源部材83は、電気抵抗式のヒータであり、その端子部83aに給電することにより、熱を発する。さらに熱伝導体82の端部の一部は平坦加工されており、その面取り部には安全サーモセンサー84が取り付けられる。
【0020】
安全サーモセンサー84や温度センサ12の検出信号は制御装置100に送られており、この制御装置100は、図示されていないドライバを介して、処理液の温度調整や熱源部材83の加熱防止の目的のために熱源部材83の端子部83aに供給される駆動電力を制御する。
【0021】
処理液流通管81の流入口81aと流出口81bを、所望の位置で切断されている循環流路51の切断口に接続することで、この処理液加熱装置80の循環流路51への装着は完了する。ある程度の長さにわたって処理液を加熱するために、処理液流通管81を包み込んでいる熱伝導体82の長さを十分にとるとともに、ほぼ熱伝導体82の全長にわたって、熱源部材83を巻き付けることにより、処理液流通管81に対してできるだけ一様にかつ確実に熱を与える。
【0022】
熱源部材83は螺旋溝82aにきつく挿入することにより、しっかりした熱伝導体82に対する保持力が得られるが、もちろん、クランプ式のカバー等を用いて、さらに確実に固定するようにしてもよいが、熱源部材83の交換などの保守点検作業の簡便さを考慮するべきである。
【0023】
熱源部材83の熱伝導体82外面への巻き付け形態は、上述した形態に限定されるわけではなく、例えば、図7と図8に示すように、熱伝導体82の外周面に軸方向に沿って設けられた直線溝82aに熱源部材83を蛇行状に巻き付けていくような形態を採用することも可能である。
【0024】
さらに、図9と図10には、円筒形状の熱源部材83が熱伝導体82を外嵌している形態の処理液加熱装置80が示されている。ここでは、最初の実施の形態でも同様であるが、安全サーモセンサー84を熱伝導体82の外周面に形成された面取り部に設けることに代えて、安全サーモセンサー84を熱伝導体82の端面に設けることにより、熱伝導体82の外周面全体を熱源部材83で覆うことも可能である。この形態では、処理液流通管81と熱伝導体82と熱源部材83が同芯配置されていることが特徴的である。
【図面の簡単な説明】
【図1】本発明による処理液加熱装置を搭載した現像処理装置の全体構成図
【図2】図1の現像処理装置のフィルム現像部の概略断面図
【図3】現像処理タンクの断面図
【図4】図3のIV−IV線に沿った断面図
【図5】本発明による処理液加熱装置の1つの実施形態を示す斜視図
【図6】図5の処理液加熱装置の一部を示す縦断面図
【図7】本発明による処理液加熱装置の他の実施形態を示す斜視図
【図8】図7の処理液加熱装置の一部を示す縦断面図
【図9】本発明による処理液加熱装置のさらに別な実施形態を示す斜視図
【図10】図9の処理液加熱装置の一部を示す縦断面図
【符号の説明】
41a サブタンク
41 処理タンク
51 循環流路
80 処理液加熱装置
81 処理液流通管
81a 流入口
81b 流出口
82 熱伝導体
83 熱源部材
[0001]
BACKGROUND OF THE INVENTION
The present invention provides a processing tank for storing a processing solution for developing a photographic photosensitive material, a sub-tank communicating with the upper portion of the processing tank, and a circulation flow path connecting the sub-tank and the lower portion of the processing tank. The present invention relates to a processing solution heating apparatus for a development processing apparatus including
[0002]
[Prior art]
In a development processing apparatus for developing photosensitive materials such as film and photographic paper, processing baths such as developing solution, fixing solution and washing water are filled in processing tanks such as developing, fixing and washing. In order to manage the temperature of the processing liquid, a processing liquid heating apparatus is used. 2. Description of the Related Art Conventionally, a processing liquid heating apparatus is configured by a cartridge heater that is submerged in a sub tank communicating with an upper portion of a processing tank, and the processing liquid in the sub tank heated by the heater is transferred to the processing tank through a circulation channel. The temperature of the processing liquid in the processing tank is managed by flowing it.
[0003]
Furthermore, the processing liquid heating apparatus according to Japanese Patent Laid-Open No. 5-080479 is installed in the mold with the processing liquid circulation pipes arranged at equal intervals and at equal distances from the heater around a cylindrical heater as a heat source. Then, it is manufactured by filling molten metal that becomes a heat conduction block into the mold. By installing the processing liquid circulation pipe of the processing liquid heating apparatus thus manufactured in the corresponding circulation path, the processing liquid flowing through the circulation path is heated in the region of the processing liquid circulation pipe, and the thermal energy is transferred to the processing tank. By carrying in, the temperature of the processing liquid in the processing tank is controlled.
[0004]
[Problems to be solved by the invention]
Compared to the former processing liquid heating apparatus, the latter apparatus can omit the space for accommodating the cartridge heater from the sub tank, and can reduce the evaporation amount of the processing liquid from the sub tank, and can conduct heat to the processing liquid gently. However, since the heater as the heat source and the heat conduction block are integrally formed by co-casting, there is a drawback that the heater alone cannot be replaced even if the heater fails or deteriorates with time. Furthermore, it is difficult to take a complicated posture when placing the heater in the mold for the heat conduction block.
An object of the present invention is to provide a treatment liquid heating apparatus of a type that is easily mounted and that can be exchanged for a heat source and that is mounted on a circulation channel.
[0005]
[Means for Solving the Problems]
In order to achieve the above object, a processing liquid heating apparatus for a development processing apparatus according to the present invention includes a processing liquid having an inlet and an outlet connected to a circulation channel connecting a sub tank and a lower part of the processing tank. and flow tube, provided on the outer surface of the treatment liquid and the thermal conductor molded cast in a state wrapped distribution pipe to enable heat conduction coaxially, the heat conductor so as to extend along the processing liquid flow pipe And a heat source member inserted in the groove so as to be replaceable .
[0006]
In this configuration, since the heat source member that heats the processing liquid flowing through the processing liquid circulation pipe via the heat conductor is attached to the outer surface of the heat conductor, maintenance inspection of the heat source member is facilitated.
[0007]
In order to improve the fixation of the heat source member to the heat conductor and the heat transfer between the heat conductor and the heat source member, a groove extending along the treatment liquid circulation pipe is provided on the outer surface of the heat conductor, and this groove The heat source member is inserted into the inside and fixed in a replaceable manner. By inserting the heat source member into the groove, the appearance of the treatment liquid heating device is made clear, and the contact area between the heat source member and the heat conductor is enlarged, so that the heat transfer efficiency is improved.
To obtain a good heat transfer between the treatment liquid circulation pipe and the heat conductor, the heat conductor is molded cast in a state wrapped processing solution circulation pipe.
[0008]
For a predetermined length, for example, heat is applied as uniformly as possible to the heat conductor enclosing the processing liquid distribution pipe from its inlet region to its outlet region, and as a result, the processing liquid distribution tube is uniformly distributed. One preferred form proposed by the present invention for generating heat distribution is to form a groove accommodating the heat source member in a spiral shape on the outer surface of the heat conductor so as to enclose the treatment liquid flow pipe, And the processing liquid flow pipe are in a positional relationship such as a coil spring and its central axis. As a result, the processing liquid circulation pipe is heated substantially uniformly from the entire periphery from the inlet region to the outlet region, for example, and deterioration of the processing solution is prevented by local high-temperature heating. .
[0009]
Other features and advantages of the present invention will become apparent from the following description of embodiments of the present invention using the drawings.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is an overall configuration diagram of a development processing apparatus 1 equipped with a processing liquid heating apparatus according to the present invention. The development processing apparatus 1 includes a film insertion unit 3 for loading a film 2 as a photographic material having a reader connected to the tip, a film development unit 4 for developing the film 2 fed out from the film insertion unit 3, and a development. A film drying unit 5 for drying the processed film 2 and a film receiving unit 6 for temporarily storing the dried film 2 are provided.
[0011]
The film insertion unit 3 includes a transport roller 3a, a film cutter 3b that cuts the rear end of the film 2 that has been pulled out from the cartridge 7, a film cutting solenoid 3c that slides one blade of the film cutter 3b, and a film An idler roller 3e for crimping the roller 2 to the conveying roller 3a, and a crimping solenoid 3d for moving the idler roller 3e up and down to switch between the state in which the film 2 is crimped to the conveyor roller 3a and the state in which the crimping is released. Is provided. The film 2 drawn out from the cartridge 7 is transported while being sandwiched between the transport roller 3 a and the idle roller 3 e and fed into the film developing unit 4.
[0012]
In the film developing section 4, development processing such as development, bleaching, fixing, and the like is performed in order to form seven compartments filled with processing solutions such as a developing solution, a bleaching solution, a fixing solution, and a stabilizing solution. A tank 40 and a transport roller unit 4 b that transports the film 2 in the film developing unit 4 are provided.
[0013]
As shown in FIG. 1, a drying heater 5a for drying the film 2 and drying for sending warm air toward the film conveying path are provided in the film drying unit 5 located on the downstream side of the film developing path of the film developing unit 4. A fan 5b and a temperature sensor 5c for measuring the air temperature in the film drying unit 5 are provided. The film 2 is gradually dried while being transported in the film drying unit 5 and sent to the film receiving unit 6. It is.
[0014]
FIG. 2 shows only the film developing unit 4 extracted. An optical sensor 10 is provided at the entrance of the film developing unit 4, whereby the film 2 sent from the film insertion unit 3 is detected. The optical sensor 10 is connected to the control device 100. The development processing tank 40 forms seven compartments 41 to 47. The first deep ridge in the order of the film 2 loading direction is the developer compartment 41, and the next is In the bleaching solution compartment 42, the next two are fixing solution compartments 43 and 44, and the three shallow bottles are the stabilizing solution compartments 45 to 47. Each compartment has a different depth, but has substantially the same structure. FIG. 3 shows a vertical sectional view of the developer compartment 41, and FIG. Due to the size problem, a plan view of only the developer compartment 41 and the bleaching solution compartment 42 adjacent thereto is shown.
[0015]
A sub tank 41 a is provided on the side of the upper region of the developer compartment 41. Inside the sub tank 41a, a temperature sensor 12 for detecting the temperature of the developer, an overflow pipe 14, a liquid level sensor 15 for detecting the level of the developer, and a filter 16 are provided. As schematically shown in FIGS. 2 and 3, a replenishment pipe 70 is connected to the sub tank 41a, and a replenishment pump 71 is operated in a timely manner in order to keep the performance of the developer constant. Is supplied to the sub tank 41a.
[0016]
The upper region of the compartment 41 and the upper region of the sub tank 41a can be circulated by cascade connection. Further, the filter 16 has a cylindrical shape, and a pipe 17 provided with a large number of slits 17a is inserted into the center hole thereof. The filtered liquid passes through the slit 17a and flows through the pipe 17, and the pipe 17 Is connected to the bottom of the compartment 41 by a circulation channel 51, and a circulation pump 61 and a treatment liquid heating device 80 are provided in the circulation channel 51. That is, there is a circulation line from the upper part of the developer compartment 41 to the bottom of the developer compartment 41 through the circulation channel 51 including the sub tank 41a, the filter 16, the circulation pump 61, and the treatment liquid heating device 80. Thus, the processing solution (here, the developing solution) is circulated and heated in the developing solution compartment 41. Such a configuration of the sub-tank and the circulation line is the same for the other compartments, and the description for each compartment is omitted here.
[0017]
In this embodiment, the processing liquid heating device 80 is mounted between the sub tank 41a and the circulation pump 61, but it may be mounted between the circulation pump 61 and the developer compartment 41, which is important. This means that the treatment liquid heating device 80 is mounted on the circulation flow path 51. As a result, the processing liquid that is forced to flow through the circulation flow path 51 by the circulation pump 61 is heated, so that local processing liquid generated when the processing liquid is heated by the cartridge heater mounted in the sub tank 41a. Heating can be avoided.
[0018]
Treatment liquid heating apparatus 80, as shown in FIG. 5 and 6, a pipe-like processing liquid circulation pipe 81 of the processing liquid flows, substantially cylindrical disposed coaxially with the treatment liquid circulation pipe 81 A heat conductor 82 is provided. The processing liquid distribution pipe 81 is installed at the center of the mold of the heat conductor 82 when the heat conductor 82 is manufactured, and then the processing mold distribution pipe 81 is filled with a molten metal such as aluminum. An integral structure of 81 and heat conductor 82 is obtained.
[0019]
A groove 82a is provided in a spiral shape on the outer peripheral surface of the heat conductor 82, and a heat source member 83 having flexibility is inserted into the spiral groove 82a. At this time, when the cross section of the groove 82 and the cross section of the heat source member 83 are substantially matched, a large contact area is obtained, and heat transfer from the heat source member 83 to the heat conductor 82 is improved. The heat source member 83 is an electric resistance heater, and generates heat by supplying power to the terminal portion 83a. Further, a part of the end portion of the heat conductor 82 is flattened, and a safety thermosensor 84 is attached to the chamfered portion.
[0020]
Detection signals from the safety thermosensor 84 and the temperature sensor 12 are sent to the control device 100. The control device 100 is used to adjust the temperature of the processing liquid and prevent the heat source member 83 from being heated via a driver (not shown). Therefore, the driving power supplied to the terminal portion 83a of the heat source member 83 is controlled.
[0021]
By attaching the inflow port 81a and the outflow port 81b of the treatment liquid circulation pipe 81 to the cut opening of the circulation flow path 51 cut at a desired position, the treatment liquid heating device 80 is attached to the circulation flow path 51. Is completed. In order to heat the treatment liquid over a certain length, the heat conductor 82 enclosing the treatment liquid flow pipe 81 is sufficiently long, and the heat source member 83 is wound over almost the entire length of the heat conductor 82. Thus, heat is applied to the processing liquid circulation pipe 81 as uniformly and reliably as possible.
[0022]
By firmly inserting the heat source member 83 into the spiral groove 82a, a firm holding force for the heat conductor 82 can be obtained, but of course, it may be more securely fixed using a clamp type cover or the like. The simplicity of maintenance and inspection work such as replacement of the heat source member 83 should be taken into consideration.
[0023]
The form of winding the heat source member 83 around the outer surface of the heat conductor 82 is not limited to the above-described form. For example, as shown in FIGS. It is also possible to adopt a form in which the heat source member 83 is wound in a meandering manner in the linear groove 82a provided in the above manner.
[0024]
Further, FIG. 9 and FIG. 10 show a treatment liquid heating device 80 in a form in which a cylindrical heat source member 83 has a heat conductor 82 fitted thereon. Here, the same applies to the first embodiment, but instead of providing the safety thermosensor 84 in the chamfered portion formed on the outer peripheral surface of the heat conductor 82, the safety thermosensor 84 is attached to the end face of the heat conductor 82. It is possible to cover the entire outer peripheral surface of the heat conductor 82 with the heat source member 83. This embodiment is characterized in that the treatment liquid circulation pipe 81, the heat conductor 82, and the heat source member 83 are arranged concentrically.
[Brief description of the drawings]
FIG. 1 is an overall configuration diagram of a development processing apparatus equipped with a processing solution heating apparatus according to the present invention. FIG. 2 is a schematic cross-sectional view of a film developing unit of the development processing apparatus of FIG. 4 is a cross-sectional view taken along line IV-IV in FIG. 3. FIG. 5 is a perspective view showing one embodiment of the processing liquid heating apparatus according to the present invention. FIG. 7 is a perspective view showing another embodiment of the processing liquid heating apparatus according to the present invention. FIG. 8 is a vertical sectional view showing a part of the processing liquid heating apparatus in FIG. 7. FIG. FIG. 10 is a perspective view showing still another embodiment of the treatment liquid heating apparatus. FIG. 10 is a longitudinal sectional view showing a part of the treatment liquid heating apparatus in FIG.
41a Sub tank 41 Processing tank 51 Circulation flow path 80 Processing liquid heating device 81 Processing liquid circulation pipe 81a Inlet 81b Outlet 82 Heat conductor 83 Heat source member

Claims (2)

写真感光材料を現像するための処理液を収容する処理タンクと、前記処理タンクの上部と連通しているサブタンクと、前記サブタンクと前記処理タンクの下部とを連結する循環流路とを備えた現像処理装置のための処理液加熱装置において、
前記循環流路に接続される流入口と流出口とを有する処理液流通管と、前記処理液流通管を熱伝導可能に同芯状に包み込んだ状態で鋳込み成型された熱伝導体と、前記処理液流通管に沿って延びるように前記熱伝導体の外面に設けられた溝内に交換可能に挿入されている熱源部材とを備えていることを特徴とする現像処理装置のための処理液加熱装置。
Development comprising a processing tank for storing a processing solution for developing a photographic photosensitive material, a sub-tank communicating with the upper part of the processing tank, and a circulation channel connecting the sub-tank and the lower part of the processing tank In a processing liquid heating apparatus for a processing apparatus,
Said inlet being connected to the circulation flow path and a treatment liquid flow pipe having an outlet, a heat conductor of the treatment liquid circulation pipe is cast molded in a state wrapped in thermally conductively coaxially, the And a heat source member inserted in a groove provided on the outer surface of the heat conductor so as to extend along the treatment liquid circulation pipe. Heating device.
前記溝が前記処理液流通管を巻き込むように螺旋状に延びていることを特徴とする請求項に記載の現像処理装置のための処理液加熱装置。The processing liquid heating apparatus for a development processing apparatus according to claim 1 , wherein the groove extends spirally so as to entrain the processing liquid flow pipe.
JP04339597A 1997-02-27 1997-02-27 Processing solution heating device for development processing apparatus Expired - Fee Related JP3779023B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04339597A JP3779023B2 (en) 1997-02-27 1997-02-27 Processing solution heating device for development processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04339597A JP3779023B2 (en) 1997-02-27 1997-02-27 Processing solution heating device for development processing apparatus

Publications (2)

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JPH10239813A JPH10239813A (en) 1998-09-11
JP3779023B2 true JP3779023B2 (en) 2006-05-24

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