JP3776878B2 - Electron beam generating filament structure - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an electron beam generating filament structure.
[0002]
[Prior art]
As a sterilization or curing technique, an electron beam irradiation apparatus is known. The electron beam irradiation device is a technique for irradiating a substance floating medium such as air or liquid with an electron beam. Regarding sterilization, the following techniques are known. Increasing amounts of medical physiological substances are introduced into the human body, such as pharmaceuticals and foodstuffs, that are introduced into globally networked markets. In the near-future mass production system that is complexly networked, it is important that the medical physiological substances put into the human body are kept in a sterile state without any gaps in any process of production, management, distribution, and sales. is there. The generation of an electron beam is required to reduce its energy. High energy has a high permeability and has a low probability of passing through a liquid such as drinking water and hitting a life destruction target substance such as bacteria. Low energy rays are scattered in a liquid and most of the energy is used effectively, but the transmission width (range) is short. It is required to irradiate an electron beam to the entire fluid layer having a small thickness and a large fluid cross-sectional area. Scanning electron beam irradiation has a scanning time, and cannot irradiate an electron beam continuously to an arbitrary point.
[0003]
In order to continuously irradiate one point in a long region with a low energy electron beam, it is necessary to widen the beam width. Arranging a large number of filaments in the widening direction is effective for widening the beam lateral width, but causes an electron beam density imbalance in the widening direction. A technique for avoiding such an imbalance in electron beam density is known from the following patent publication.
[0004]
There is a demand for simplification of a holding structure in which a large number of electrode lines are arranged obliquely and a sufficiently strong tension is applied to the electrode lines to hold the electrode lines in the electrode line holder.
[0005]
[Patent Document 1]
JP-A-11-72600 [0006]
[Problems to be solved by the invention]
An object of the present invention is to provide an electron beam generating filament structure that simplifies an oblique arrangement.
[0007]
[Means for Solving the Problems]
Means for solving the problem is expressed as follows. Technical matters appearing in the expression are appended with numbers, symbols, etc. in parentheses (). The numbers, symbols, and the like are technical matters constituting at least one embodiment or a plurality of embodiments of the present invention or a plurality of embodiments, in particular, the embodiments or examples. This corresponds to the reference numbers, reference symbols, and the like attached to the technical matters expressed in the drawings corresponding to. Such reference numbers and reference symbols clarify the correspondence and bridging between the technical matters described in the claims and the technical matters of the embodiments or examples. Such correspondence and bridging does not mean that the technical matters described in the claims are interpreted as being limited to the technical matters of the embodiments or examples.
[0008]
An electron beam generating filament structure according to the present invention includes a first power supply body (2), a second power supply body (3) disposed to face the first power supply body (2), a filament (8), The first filament holder (4, 4 ′ or 4 ″) that supports one end portion of the filament (8) with respect to the first power supply body (2), and the other end portion of the filament (8) is the second. It is comprised from the 2nd filament holder (5, 5 'or 5 ") supported with respect to an electric power supply body (3). The first filament holder (4) has a first fixing surface (9) for fixing one end portion, and the second filament holder (5) has a second fixing surface (11) for fixing the other end portion. ing. The first fixing surface (9) is substantially orthogonal to the tension direction, and the second fixing surface (11) is approximately orthogonal to the tension direction. Such orthogonality improves the properties of the electron beam by structural stabilization of the strong filament.
[0009]
The angle between the first fixing surface (9) and the tension direction is preferably set in the range of 85 to 90 degrees. Naturally, it is preferable that the angle between the second fixing surface (11) and the tension direction is set in a range of 85 degrees to 90 degrees. The filament (8) is tensioned in a tension direction that is oblique to the longitudinal direction in which the first power supply body (2) and the second power supply body (3) extend. It is preferable for widening and uniformization. The angle of the fixing surface with respect to the tension direction is defined, and the electrode structure is stabilized. Stabilization of the electrode structure can extend its life longer and promote homogenization of the electron beam.
[0010]
The second power supply body (3) is preferably substantially or substantially parallel to the first power supply body (2), and is actually arranged in parallel. A first intermediate body (14) interposed between the first filament holder (5 ') and the first power supply body (2), a second filament holder (5') and a second power supply body (3) And a second intermediate body (14) interposed therebetween. The first intermediate body (14) and the first filament holder (5 ') are joined at a first joining surface substantially orthogonal to the tension direction, and the second intermediate body (14) and the second filament holder (5') Are joined at the second joining surface (11 ′) substantially perpendicular to the tension direction. In this embodiment, it is not necessary to deform and process the power supply body.
[0011]
The first fixing surface and the first bonding surface form substantially the same plane, and the second fixing surface and the second bonding surface form substantially the same plane, so that the structure of the electrode is easy. The first power supply body (2) forms a first joint surface, the first joint surface is substantially orthogonal to the tension direction, and the first power supply body (2) and the first filament holder (4) are the first joint surface. The second power supply body (3) forms a second joint surface, the second joint surface is substantially perpendicular to the tension direction, and the second power supply body (3) and the second filament holder (5) are Joining at the second joining surface. Electrode structuring is easier and more stable.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Corresponding to the figure, in the embodiment of the electron beam generating filament structure according to the present invention, the filament is provided together with the power supply body. As shown in FIG. 1, the power supply 1 forms two power supply rods that are arranged to face each other in parallel with the flow direction a of the sterilization treatment target fluid. The power supply rod is composed of a first power supply body 2 and a second power supply body 3 that is long in the flow direction a.
[0013]
The filament holder includes a plurality of (eg, three) first filament holders 4 and a plurality of (eg, three) second filament holders 5. The second power supply body 3 is joined to the opposite side surface 6 of the first power supply body 2 and extends downward (in the direction toward the sterilization target fluid, usually downward in the vertical direction). The second filament holder 5 is joined to the opposite side surface 7 of the second power supply body 3 and extends downward. Each of the plural (e.g., three) filaments 8 is coupled to the first filament holder 4 and the second filament holder 5. The plurality of filaments 8 are arranged parallel to each other and obliquely with respect to the flow direction a.
[0014]
The angle θ between the tension direction of the filament 8 and the flow direction a is preferably set to 45 °. The first filament holder 4 has a first coupling slope 9 that intersects the flow direction a at an angle α. The angle α is preferably set to 45 °. In general, preferably
θ + α = 90
And the filament 8 is advantageously perpendicular to the first coupling ramp 9. The second filament holder 5 has a second coupling slope 11 that intersects the flow direction a at an angle α ′. The angle α ′ is preferably set to 45 °. In general, preferably
θ + α ′ = 90
And the filament 8 is advantageously perpendicular to the second coupling ramp 11.
[0015]
One end portion of the filament 8 or one side portion of the filament 8 is pressed against the first coupling slope 9 by the first presser 12 and joined to the first coupling slope 9 by pressure bonding. It is sandwiched between the first presser 12. The other end portion of the filament 8 or the other side portion of the filament 8 is pressed against the second coupling slope 11 by the second presser 13 and joined to the second coupling slope 11 in a pressure-bonding manner with the second filament holder 5. It is sandwiched between the second presser 13. The three filaments 8 can be electrically continuous with each other.
[0016]
Appropriate tension is applied to the filaments 8 fixed at both ends. The relative elongation and relative twist of the first power supply body 2 and the second power supply body 3 that are thermally bonded to the filament 8 and the filament 8 adversely affect the optimization of the tension. The supporting surfaces or fixing surfaces of the first filament holder 4 and the second filament holder 5 that fix both end portions of the filament 8 are set to approximately 90 ° with respect to the tension direction of the filament 8. The filament 8 is orthogonal to or substantially orthogonal to the fixing surfaces or support surfaces 9 and 11 on both sides.
[0017]
The fixing surfaces or support surfaces 9 and 11 on both sides face each other in parallel or substantially in parallel. Such orthogonality and parallelism can effectively suppress the bending and twisting of the first filament holder 4 and the second filament holder 5. Such suppression can provide an important technique for the stabilization of the electrode structure supporting the filament, and can consequently promote the homogenization of the electron beam density, which can be sterilized or cured. The irradiation efficiency of the ring can be increased and the processing accuracy can be improved.
[0018]
FIG. 2 shows another embodiment of the electron beam generating filament structure according to the present invention. In the present embodiment, a second intermediate body 14 and a second filament holder 5 ′ that are coupled to the opposite side surface 7 of the second power supply body 3 are formed. The second intermediate body 14 does not extend long downward. The second filament holder 5 ′ has a second coupling slope 11 ′ corresponding to the second coupling slope 7 described above. The end portion of the filament 8 is fixed to the second filament holder 5 ′ by a ball-like bulge 15 being pressed against the second coupling slope 11 ′. Such a coupling structure is the same for the other end of the filament 8.
[0019]
FIG. 3 shows still another embodiment of the electron beam generating filament structure according to the present invention. A first notch surface 16 is formed on the first power supply body 2 and the second power supply body 3 on the opposite side surface 6 side of the first power supply body 2 and the opposite side surface 7 side of the second power supply body 3. A second notch surface 17 is formed in each. The first notch surface 16 and the second notch surface 17 are each inclined at an angle of 45 ° with respect to the flow direction a. A first filament holder 4 ″ and a second filament holder 5 ″ corresponding to the second filament holder 5 ′ of the embodiment of FIG. 2 are joined to the first notch surface 16 and the second notch surface 17. . The first filament holder 4 "and the second filament holder 5" are a first coupling surface 9 "and a second coupling surface corresponding to the first coupling slope 9 'and the second coupling slope 11' in the embodiment of FIG. Each 11 ″.
[0020]
Tightening the filament is extremely important for the accuracy of electron beam irradiation. In order to maintain the strong tension and stabilize the heat generation environment, it is important that the tension direction and the tension support surface are orthogonal. The supporting component force of the tension T is represented by sin (θ) T. Here, θ is an angle between the support surface and the tension direction. The supporting force when θ = 30 degrees is half that when θ is 90 degrees. The increase in the support component force when θ is greater than 60 degrees is gradually smaller than the support component force when θ is 60 degrees. In the angle range where θ is close to 90 degrees, in particular, in the angle range between 85 degrees and 95 degrees, there is no great difference in supporting component force. Therefore, the angle range is particularly preferably 85 to 95 degrees.
[0021]
【The invention's effect】
The electron beam generating filament structure according to the present invention is simplified, and as a result, the electron beam density in the widening direction of the electron beam to be widened can be made uniform.
[Brief description of the drawings]
1 (a) and 1 (b) show an embodiment of an electron beam generating filament structure according to the present invention, where FIG. 1 (a) is a plan view and FIG. 1 (b) is a front view. .
FIG. 2 is an oblique projection showing another embodiment of the electron beam generating filament structure according to the present invention.
FIGS. 3 (a) and 3 (b) show still another embodiment of the electron beam generating filament structure according to the present invention, where FIG. 3 (a) is a front view and FIG. 3 (b) is a plan view. FIG.
[Explanation of symbols]
2 ... 1st power supply body 3 ... 2nd power supply body 4, 4 ', 4 "... 1st filament holder 5, 5', 5" ... 2nd filament holder 8 ... Filament 9, 9 ', 9 "... 1st 1 Adhering surface (joint surface)
11, 11 ′, 11 ″... 2nd fixing surface (joint surface)
14 ... 1st body (2nd body)

Claims (6)

A first power supplier;
A second power supply body disposed opposite to the first power supply body;
Filament,
A first filament holder for supporting one end portion of the filament with respect to the first power supply;
A second filament holder configured to support the other end portion of the filament with respect to the second power supply body;
The first power supply body and the second power supply body are arranged in parallel to the flow direction of the sterilization target fluid,
The first filament holder has a first fixing surface for fixing the one end portion;
The second filament holder has a second fixing surface that fixes the other end portion;
Tension is applied to the filament in a tension direction that is oblique to a longitudinal direction in which the first power supply body and the second power supply body extend,
The electron beam generating filament structure in which the first fixing surface is substantially orthogonal to the tension direction, and the second fixing surface is substantially orthogonal to the tension direction. 2. The electron beam generating filament structure according to claim 1, wherein an angle between the first fixing surface and the tension direction is set in a range of 85 degrees to 90 degrees. A first power supplier;
A second power supply body facing the first power supply body and disposed substantially parallel to the first power supply body;
Filament,
A first filament holder for supporting one end portion of the filament with respect to the first power supply;
A second filament holder for supporting the other end portion of the filament with respect to the second power supply body;
A first intermediate body interposed between the first filament holder and the first power supply body;
Constituting a second intermediate body interposed between the second filament holder and the second power supply body;
The first filament holder has a first fixing surface for fixing the one end portion;
The second filament holder has a second fixing surface that fixes the other end portion;
Tension is applied to the filament in a tension direction that is oblique to a longitudinal direction in which the first power supply body and the second power supply body extend,
The first anchoring surface is generally perpendicular to the tension direction, and the second anchoring surface is generally orthogonal to the tension direction;
The first intermediate body and the first filament holder are joined at a first joining surface substantially orthogonal to the tension direction,
The second intermediate body and the second filament holder are joined at a second joining surface that is substantially perpendicular to the tension direction.
Electron beam generating filament structure. The first fixing surface and the first bonding surface form substantially the same plane,
4. The electron beam generating filament structure according to claim 3 , wherein the second fixing surface and the second bonding surface form substantially the same plane. A first power supplier;
A second power supply body facing the first power supply body and disposed substantially parallel to the first power supply body;
Filament,
A first filament holder for supporting one end portion of the filament with respect to the first power supply;
A second filament holder configured to support the other end portion of the filament with respect to the second power supply body;
The first filament holder has a first fixing surface for fixing the one end portion;
The second filament holder has a second fixing surface that fixes the other end portion;
Tension is applied to the filament in a tension direction that is oblique to a longitudinal direction in which the first power supply body and the second power supply body extend,
The first anchoring surface is generally perpendicular to the tension direction, and the second anchoring surface is generally orthogonal to the tension direction;
The first power supply body forms a first joint surface, the first joint surface is substantially perpendicular to the tension direction, and the first power supply body and the first filament holder are joined at the first joint surface. The second power supply body forms a second joint surface, the second joint surface is substantially perpendicular to the tension direction, and the second power supply body and the second filament holder are joined at the second joint surface. Do
Electron beam generating filament structure. The first joint surface and the second joint surface are notched surfaces formed in the first power supply body and the second power supply body, respectively.
The electron beam generating filament structure according to claim 5.

Images