JP3751678B2 - Manufacturing method of high frequency discharge gas laser oscillator - Google Patents

Manufacturing method of high frequency discharge gas laser oscillator Download PDF

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Publication number
JP3751678B2
JP3751678B2 JP08523296A JP8523296A JP3751678B2 JP 3751678 B2 JP3751678 B2 JP 3751678B2 JP 08523296 A JP08523296 A JP 08523296A JP 8523296 A JP8523296 A JP 8523296A JP 3751678 B2 JP3751678 B2 JP 3751678B2
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Prior art keywords
laser oscillator
high frequency
gas
discharge
parts
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JPH09283819A (en
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俊郎 小泉
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Amada Co Ltd
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Amada Co Ltd
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Description

【0001】
【発明の属する技術分野】
この発明は、レーザビームを発振せしめる高周波放電ガスレーザ発振器に関する。
【0002】
【従来の技術】
従来の高周波放電ガスレーザ発振器101は、図4に示されているように、真空気密容器103と光共振器105を備えている。前記真空気密容器103の上方には高周波電源107が設けられている。また、前記真空気密容器103内の上部には相対向した放電電極109A,109Bが設けられていると共に、真空気密容器103内の下部には送風器111が設けられている。前記高周波電源107は放電電極109A,109Bに接続されている。前記真空気密容器103の図4において例えば右側には電源装置113が配置されている。この電源装置113はDC電源115と制御部117とからなっている。DC電源115と前記高周波電源107とはケーブル119で接続されている。
【0003】
上記構成により、電源装置115の制御部117でDC電源115を制御せしめて高周波電源107から放電電極109A,109Bに電力を供給すると、放電電極109Aと109Bとの間に高周波放電が行われる。また、送風器111を作動せしめて放電電極109Aと109Bとの間に放電方向と直交したガス流方向に炭酸ガスを含むガスを流すことによって光共振器105でレーザビームが発生し、図4において点線で示したごとくレーザビームが発振されることになる。
【0004】
【発明が解決しようとする課題】
ところで、上述した従来の高周波放電ガスレーザ発振器101は1対の放電電極109A,109Bとそれに電力を供給する容量を持った高周波電源107が1ケ、DC電源115が1ケ、ガスを強制送風するための送風器111が1ケ、および図示省略の熱交換器が1ケの組合せで構成されている。
【0005】
そのために、異なる仕様、能力のレーザ発振器101を得るためには、放電電極109A,109B,高周波電源107,送風器111などの各構成要素をその目的に合わせて開発・設計している。それによってレーザ発振器101の形状、形態が変わり、開発、設計に時間がかかると共に、開発費がかさむ。また、レーザ発振器101の形状が変われば、加工機への取り付け法、レーザビームの位置などが変るため、加工機の設計も個々に実施する必要がある。
【0006】
この発明の目的は、一種類の加工機に加工用途に応じて異なる仕様のレーザ発振器を任意で選択できると共に、同一形状でレーザビーム位置も変らず得られるようにした高周波放電ガスレーザ発振器を提供することにある。
【0007】
【課題を解決するための手段】
上記目的を達成するために請求項1によるこの発明の高周波放電ガスレーザ発振器の製造方法は、炭酸ガスを含むガスを高周波放電によって励起し、その放電方向と光軸方向、ガス流方向が互いに直交する高周波放電ガスレーザ発振器の製造方法において、ガス放電のための電極、この電極に電力を供給するための電源、およびガスを強制循環するための送風器をそれぞれ複数個に分割した分割部品として構成し、発振器を構成する主要部品である熱交換器、真空気密容器、真空排気ポンプおよび光共振器をそれぞれ同一形状の共通部品として構成し、さらに、前記分割部品を任意の個数取り付け可能な構造とし、出力仕様に応じて前記分割部品の使用個数を選択し、この選択した個数の前記分割部品と、前記同一形状の共通部品とを取り付けて構成ることを特徴とするものである。
【0008】
したがって、電極、電源および送風器をそれぞれ複数個に分割した分割部品として構成し、発振器を構成する主要部品である熱交換器、真空気密容器、真空排気ポンプおよび光共振器をそれぞれ同一形状の共通部品として構成し、出力仕様に応じて前記分割部品の使用個数を選択し、この選択した個数の前記分割部品と、前記同一形状の共通部品とを取り付けて高周波放電ガスレーザ発振器を構成することによって、一種類の加工機に加工用途に応じて異なる仕様の発振器が任意で選択される。
【0009】
【発明の実施の形態】
以下、この発明の実施の形態の例を図面に基いて詳細に説明する。
【0010】
図1を参照するに、高周波放電ガスレーザ発振器1は真空気密容器3と光共振器5を備えており、この光共振器5の左右にはミラー7が設けられている。前記真空気密容器3の上面における光共振器5には図1において左右方向へ6ケの高周波電源9A,9B,9C,9D,9Eおよび9Fが設けられているる
また、前記真空気密容器3内の上部に高電圧放電電極11A,11B,11C,11D,11Eおよび11Fが設けられていると共に、この高電圧放電電極11A〜11Fに対向して高電圧放電電極11A〜11Fの下方には低電圧(グランド)電極13A,13Bが設けられている。前記真空気密容器3内の下部には送風器15A,15B,15C,15Dが設けられている。前記高周波電源9A〜9Fは高電圧放電電極11A〜11Fにそれぞれ接続されている。
【0011】
前記真空気密容器3の図1において例えば右側には電源装置17が配置されている。この電源装置17はDC/DCコンバータ19A,19B,19C,19D,19E,19Fと、制御部21とからなっている。前記DC/DCコンバータ19A〜19Fは高周波電源9A〜9Fにそれぞれ接続されている。なお、図示省略の熱交換器、真空排気ポンプは当然のことながら備えているものである。
【0012】
上記構成により、電源装置17の制御部21でDC/DCコンバータ19A〜19Fを制御せしめて高周波電源9A〜9Fから高電圧放電電極11A〜11F,低電圧電極13A,13Bに電力を供給すると、高電圧放電電極11A〜11Fと低電圧電極13A,13Bとの間に高周波放電が行われる。また、送風器15A〜15Fを作動せしめて高電圧放電電極11A〜11Fと低電圧電極13A,13Dとの間に放電方向と直交したガス流方向に炭酸ガスを含むガスを流すことによって、光共振器5でレーザビームが発生し、図1において点線で示したごとく右側ミラー7からレーザビームが発振されることになる。なお、図1における高周波放電ガスレーザ発振器1は3kw用のものである。
図2および図3には高周波放電ガスレーザ発振器の2kw,1kw用のものが示されている。図2および図3において、図1における部品と同じ部品には同一の符号を符し、重複する部分の説明を省略する。
【0013】
図2において、前記真空気密容器3、光共振器5,低電圧電極13A,13B,電源装置17および制御部21は図1におけるそれぞれのものと共通し、同一形状のものを使用している。しかも、高周波電源は同一形状の4個の9A,9B,9C,9D,高電圧放電極は同一形状の4個の11A,11B,11C,11D,送風器は同一形状の3個の15A,15,15C,また、DC/DCコンバータは同一形状の4個の19A,19B,19C,19Dを使用したものであり、図1の同様の作用並びに効果を奏する。なお、高電圧放電電極11A〜11Dの長さは図1のものより長いものである。
【0014】
図3においても同様で、真空気密容器3、光共振器5,低電圧電極13A,13B,電源装置17および制御部21は図1におけるそれぞれのものと共通し、同一形状のものを使用している。しかも、高周波電源は同一形状の2個の9A,9B,高電圧放電極は同一形状の2個の11A,11B,送風器は同一形状の2個の15A,15B,また、DC/DCコンバータは同一形状の2個の19A,19Bを使用したものであり、図1の同様の作用並びに効果を奏する。なお、高電圧放電電極11A,11Bの長さは図2のものより長いものである。
【0015】
前記高電圧放電電極11A〜11F,高周波電源9A〜9F,送風器15A〜15DおよびDC/DCコンバータ19A〜19Dのように複数個に分割構造とし、真空気密容器3,光共振器5,電源装置17,熱交換器,真空排気ポンプ、フレームなどを同一形状の構造で共通化せしめる。そして、分割構造の数の組み合わせで、出力仕様の異なるレーサ発振器1を得ることができる。例えば図1,図2および図3に示したように、3,2,1kwのレーザ発振器1が同一構造になる。
【0016】
したがって、レーザ発振器1の形状、ビーム位置、加工機への取り付け位置関係が、1,2,3kwのレーザ発振器1で同一となる。一種類の加工機に加工用途に応じて異なる仕様のレーザ発振器1を任意で選択できる。
【0017】
なお、この発明は、前述した実施の形態の例に限定されることなく、適宜な変更を行うことにより、その他の態様で実施し得るものである。
【0018】
【発明の効果】
以上のごとき実施の形態の例から理解されるように、請求項1の発明によれば、電極、電源および送風器をそれぞれ複数個に分割した分割部品として構成し、発振器を構成する主要部品である熱交換器、真空気密容器、真空排気ポンプおよび光共振器をそれぞれ同一形状の共通部品として構成し、出力仕様に応じて前記分割部品の使用個数を選択し、この選択した個数の前記分割部品と、前記同一形状の共通部品とを取り付けて高周波放電ガスレーザ発振器を構成するので、一種類の加工機に加工用途に応じて異なる仕様のレーザ発振器を任意で選択できると共に、同一形状でレーザビーム位置も変らず得られる
【図面の簡単な説明】
【図1】この発明の一実施の形態の例を示す高周波放電ガスレーザ発振器の正面図である。
【図2】この発明の他の例の高周波放電ガスレーザ発振器の正面図である。
【図3】この発明の別の例の高周波放電ガスレーザ発振器の正面図である。
【図4】従来の高周波放電ガスレーザ発振器の正面図である。
【符号の説明】
1 高周波放電ガスレーザ発振器
3 真空気密容器
5 光共振器
7 ミラー
9A〜9F 高周波電源
11A〜11F 高電圧放電電極
13A,13B 低電圧電極
15A〜15D 送風器
17 電源装置
19A〜19F DC/DCコンバータ
21 制御部
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a high-frequency discharge gas laser oscillator that oscillates a laser beam.
[0002]
[Prior art]
As shown in FIG. 4, the conventional high-frequency discharge gas laser oscillator 101 includes a vacuum hermetic container 103 and an optical resonator 105. A high frequency power source 107 is provided above the vacuum hermetic container 103. Discharge electrodes 109A and 109B facing each other are provided in the upper portion of the vacuum hermetic vessel 103, and a blower 111 is provided in the lower portion of the vacuum hermetic vessel 103. The high frequency power source 107 is connected to the discharge electrodes 109A and 109B. In FIG. 4 of the vacuum hermetic container 103, for example, a power supply device 113 is arranged on the right side. The power supply device 113 includes a DC power supply 115 and a control unit 117. A DC power source 115 and the high frequency power source 107 are connected by a cable 119.
[0003]
With the above configuration, when the control unit 117 of the power supply device 115 controls the DC power source 115 to supply power from the high frequency power source 107 to the discharge electrodes 109A and 109B, high frequency discharge is performed between the discharge electrodes 109A and 109B. Further, a laser beam is generated in the optical resonator 105 by operating the blower 111 and flowing a gas containing carbon dioxide gas between the discharge electrodes 109A and 109B in a gas flow direction orthogonal to the discharge direction. As shown by the dotted line, the laser beam is oscillated.
[0004]
[Problems to be solved by the invention]
By the way, in the conventional high frequency discharge gas laser oscillator 101 described above, a pair of discharge electrodes 109A and 109B and one high frequency power source 107 having a capacity for supplying electric power thereto, one DC power source 115 and one forcibly blowing gas. The air blower 111 is composed of one piece and the heat exchanger (not shown) is composed of one piece.
[0005]
Therefore, in order to obtain the laser oscillator 101 having different specifications and capabilities, each component such as the discharge electrodes 109A and 109B, the high-frequency power source 107, and the blower 111 is developed and designed according to the purpose. As a result, the shape and form of the laser oscillator 101 change, which takes time for development and design, and increases development costs. Further, if the shape of the laser oscillator 101 changes, the attachment method to the processing machine, the position of the laser beam, and the like change, so that it is necessary to individually design the processing machine.
[0006]
An object of the present invention is to provide a high-frequency discharge gas laser oscillator in which a laser oscillator having different specifications can be arbitrarily selected for one type of processing machine, and the laser beam position can be obtained with the same shape without changing. There is.
[0007]
[Means for Solving the Problems]
In order to achieve the above object, a method of manufacturing a high frequency discharge gas laser oscillator according to claim 1 of the present invention excites a gas containing carbon dioxide gas by high frequency discharge, and the discharge direction, the optical axis direction, and the gas flow direction are orthogonal to each other. In the method of manufacturing a high frequency discharge gas laser oscillator , an electrode for gas discharge, a power source for supplying electric power to the electrode, and a blower for forcibly circulating gas are each configured as a divided part. The heat exchanger, the vacuum hermetic container, the vacuum pump and the optical resonator, which are the main parts constituting the oscillator, are configured as common parts of the same shape , and the divided parts can be attached to any number of parts, select use a number of the divided parts in accordance with the output specification, Installing and the divided parts of the selected number, and the common parts of the same shape Those characterized that you configuration Te.
[0008]
Therefore, the electrode, power supply, and blower are each divided into multiple parts, and the heat exchanger, vacuum hermetic container, vacuum pump, and optical resonator, which are the main parts that make up the oscillator, are all in the same shape . By configuring as a part, selecting the number of the divided parts used according to the output specification, and configuring the high frequency discharge gas laser oscillator by attaching the selected number of the divided parts and the common part of the same shape , An oscillator having different specifications is arbitrarily selected for one type of processing machine depending on the processing application.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an example of an embodiment of the present invention will be described in detail with reference to the drawings.
[0010]
Referring to FIG. 1, the high frequency discharge gas laser oscillator 1 includes a vacuum hermetic container 3 and an optical resonator 5, and mirrors 7 are provided on the left and right sides of the optical resonator 5. The optical resonator 5 on the upper surface of the vacuum hermetic container 3 is provided with six high frequency power supplies 9A, 9B, 9C, 9D, 9E and 9F in the left-right direction in FIG. Are provided with high voltage discharge electrodes 11A, 11B, 11C, 11D, 11E and 11F, and a low voltage is provided below the high voltage discharge electrodes 11A to 11F so as to face the high voltage discharge electrodes 11A to 11F. (Ground) electrodes 13A and 13B are provided. Blowers 15 </ b> A, 15 </ b> B, 15 </ b> C, and 15 </ b> D are provided in the lower part of the vacuum hermetic container 3. The high frequency power supplies 9A to 9F are connected to high voltage discharge electrodes 11A to 11F, respectively.
[0011]
A power supply device 17 is arranged on the right side of the vacuum hermetic container 3 in FIG. The power supply device 17 includes DC / DC converters 19A, 19B, 19C, 19D, 19E, 19F and a control unit 21. The DC / DC converters 19A to 19F are connected to high frequency power supplies 9A to 9F, respectively. Of course, a heat exchanger and a vacuum exhaust pump (not shown) are provided.
[0012]
With the above configuration, when the control unit 21 of the power supply device 17 controls the DC / DC converters 19A to 19F to supply power from the high frequency power supplies 9A to 9F to the high voltage discharge electrodes 11A to 11F and the low voltage electrodes 13A and 13B, High frequency discharge is performed between the voltage discharge electrodes 11A to 11F and the low voltage electrodes 13A and 13B. Further, by operating the blowers 15A to 15F and causing a gas containing carbon dioxide gas to flow between the high voltage discharge electrodes 11A to 11F and the low voltage electrodes 13A and 13D in a gas flow direction orthogonal to the discharge direction, optical resonance is caused. A laser beam is generated by the device 5, and the laser beam is oscillated from the right mirror 7 as shown by a dotted line in FIG. The high frequency discharge gas laser oscillator 1 in FIG. 1 is for 3 kW.
2 and 3 show high-frequency discharge gas laser oscillators for 2 kW and 1 kW. 2 and 3, the same parts as those in FIG. 1 are denoted by the same reference numerals, and the description of the overlapping parts is omitted.
[0013]
In FIG. 2, the vacuum hermetic vessel 3, the optical resonator 5, the low voltage electrodes 13A and 13B, the power supply device 17 and the control unit 21 are the same as those shown in FIG. In addition, the high-frequency power source has four 9A, 9B, 9C, 9D having the same shape, the high-voltage discharge electrode has four 11A, 11B, 11C, 11D having the same shape, and the blower has three 15A, 15 having the same shape. 15C and four DC / DC converters using four 19A, 19B, 19C, and 19D having the same shape, and exhibit the same operations and effects as in FIG. Note that the length of the high voltage discharge electrodes 11A to 11D is longer than that of FIG.
[0014]
The same applies to FIG. 3, and the vacuum hermetic vessel 3, the optical resonator 5, the low voltage electrodes 13A and 13B, the power supply device 17 and the control unit 21 are the same as those in FIG. Yes. Moreover, the high-frequency power source is two 9A, 9B of the same shape, the high voltage discharge electrode is two 11A, 11B of the same shape, the blower is two 15A, 15B of the same shape, and the DC / DC converter is Two pieces 19A and 19B having the same shape are used, and the same operations and effects as in FIG. 1 are exhibited. Note that the length of the high voltage discharge electrodes 11A and 11B is longer than that of FIG.
[0015]
The high voltage discharge electrodes 11A to 11F, the high frequency power supplies 9A to 9F, the blowers 15A to 15D, and the DC / DC converters 19A to 19D are divided into a plurality of divided structures, a vacuum hermetic container 3, an optical resonator 5, and a power supply device. 17, heat exchanger, vacuum pump, frame etc. are made common with the same shape structure. The laser oscillator 1 having different output specifications can be obtained by combining the number of divided structures. For example, as shown in FIGS. 1, 2 and 3, the laser oscillator 1 of 3, 2, 1 kW has the same structure.
[0016]
Therefore, the shape, beam position, and mounting position relationship of the laser oscillator 1 to the processing machine are the same in the 1, 2, 3 kw laser oscillator 1. A laser oscillator 1 with different specifications can be arbitrarily selected for one type of processing machine depending on the processing application.
[0017]
In addition, this invention is not limited to the example of embodiment mentioned above, It can implement in another aspect by making an appropriate change.
[0018]
【The invention's effect】
As can be understood from the example of the embodiment as described above, according to the invention of claim 1, the electrode, the power source, and the blower are each divided into a plurality of divided parts, and the main parts constituting the oscillator are there heat exchanger, the vacuum airtight container, constitutes a vacuum exhaust pump and the optical resonator as a common part of each identical shape, then choose to use the number of the divided parts in accordance with the output specification, the divided parts of the selected number Since the high frequency discharge gas laser oscillator is configured by attaching the same shape and the common parts, a laser oscillator having different specifications can be arbitrarily selected for one type of processing machine according to the processing application, and the laser beam position can be set in the same shape. Can be obtained .
[Brief description of the drawings]
FIG. 1 is a front view of a high-frequency discharge gas laser oscillator showing an example of an embodiment of the present invention.
FIG. 2 is a front view of a high-frequency discharge gas laser oscillator according to another example of the present invention.
FIG. 3 is a front view of a high-frequency discharge gas laser oscillator of another example of the present invention.
FIG. 4 is a front view of a conventional high-frequency discharge gas laser oscillator.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 High frequency discharge gas laser oscillator 3 Vacuum-tight container 5 Optical resonator 7 Mirror 9A-9F High frequency power supply 11A-11F High voltage discharge electrode 13A, 13B Low voltage electrode 15A-15D Blower 17 Power supply device 19A-19F DC / DC converter 21 Control Part

Claims (1)

炭酸ガスを含むガスを高周波放電によって励起し、その放電方向と光軸方向、ガス流方向が互いに直交する高周波放電ガスレーザ発振器の製造方法において、
ガス放電のための電極、この電極に電力を供給するための電源、およびガスを強制循環するための送風器をそれぞれ複数個に分割した分割部品として構成し、発振器を構成する主要部品である熱交換器、真空気密容器、真空排気ポンプおよび光共振器をそれぞれ同一形状の共通部品として構成し、さらに、前記分割部品を任意の個数取り付け可能な構造とし、
出力仕様に応じて前記分割部品の使用個数を選択し、この選択した個数の前記分割部品と、前記同一形状の共通部品とを取り付けて構成ることを特徴とする高周波放電ガスレーザ発振器の製造方法
In a method of manufacturing a high frequency discharge gas laser oscillator in which a gas containing carbon dioxide gas is excited by high frequency discharge, the discharge direction and the optical axis direction, and the gas flow direction are orthogonal to each other.
The electrode for gas discharge, the power source for supplying power to the electrode, and the blower for forcibly circulating the gas are divided into a plurality of divided parts, which are the main parts constituting the oscillator. A heat exchanger, a vacuum hermetic container, an evacuation pump and an optical resonator are configured as common parts of the same shape, respectively , and further, a structure in which an arbitrary number of the divided parts can be attached,
Select use a number of the divided parts in accordance with the output specification, and the divided parts of the selected number, the manufacturing method of the common parts and the high-frequency discharge gas laser oscillator characterized that you configured by attaching a of the same shape .
JP08523296A 1996-04-08 1996-04-08 Manufacturing method of high frequency discharge gas laser oscillator Expired - Fee Related JP3751678B2 (en)

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Application Number Priority Date Filing Date Title
JP08523296A JP3751678B2 (en) 1996-04-08 1996-04-08 Manufacturing method of high frequency discharge gas laser oscillator

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JPH09283819A JPH09283819A (en) 1997-10-31
JP3751678B2 true JP3751678B2 (en) 2006-03-01

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CN102969645B (en) * 2012-11-21 2015-07-15 中国科学院光电研究院 Flow guide device for dual-electrode discharge cavity, discharge cavity employing same, and excimer laser

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