JP3728315B2 - 電子ビーム露光装置、電子ビーム露光方法、および、デバイス製造方法 - Google Patents

電子ビーム露光装置、電子ビーム露光方法、および、デバイス製造方法 Download PDF

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JP3728315B2
JP3728315B2 JP2003417979A JP2003417979A JP3728315B2 JP 3728315 B2 JP3728315 B2 JP 3728315B2 JP 2003417979 A JP2003417979 A JP 2003417979A JP 2003417979 A JP2003417979 A JP 2003417979A JP 3728315 B2 JP3728315 B2 JP 3728315B2
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electron
optical system
electron beam
electron optical
beam exposure
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JP2004153294A (ja
JP2004153294A5 (https=
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真人 村木
進 後藤
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Canon Inc
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Canon Inc
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  • Electron Beam Exposure (AREA)
JP2003417979A 2003-12-16 2003-12-16 電子ビーム露光装置、電子ビーム露光方法、および、デバイス製造方法 Expired - Fee Related JP3728315B2 (ja)

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JP2003417979A JP3728315B2 (ja) 2003-12-16 2003-12-16 電子ビーム露光装置、電子ビーム露光方法、および、デバイス製造方法

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JP2003417979A JP3728315B2 (ja) 2003-12-16 2003-12-16 電子ビーム露光装置、電子ビーム露光方法、および、デバイス製造方法

Related Parent Applications (1)

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JP04587896A Division JP3647128B2 (ja) 1996-03-04 1996-03-04 電子ビーム露光装置とその露光方法

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JP2004153294A JP2004153294A (ja) 2004-05-27
JP2004153294A5 JP2004153294A5 (https=) 2005-07-07
JP3728315B2 true JP3728315B2 (ja) 2005-12-21

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5175713B2 (ja) * 2007-03-02 2013-04-03 株式会社アドバンテスト マルチコラム電子ビーム露光用マスク、マルチコラム電子ビーム露光用マスクを用いた電子ビーム露光装置及び露光方法
JP6080540B2 (ja) * 2012-12-26 2017-02-15 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置
WO2016145458A1 (en) * 2015-03-10 2016-09-15 Hermes Microvision Inc. Apparatus of plural charged-particle beams

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JP2004153294A (ja) 2004-05-27

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