JP3705722B2 - Surface wave device - Google Patents

Surface wave device Download PDF

Info

Publication number
JP3705722B2
JP3705722B2 JP29857799A JP29857799A JP3705722B2 JP 3705722 B2 JP3705722 B2 JP 3705722B2 JP 29857799 A JP29857799 A JP 29857799A JP 29857799 A JP29857799 A JP 29857799A JP 3705722 B2 JP3705722 B2 JP 3705722B2
Authority
JP
Japan
Prior art keywords
face
wave device
piezoelectric substrate
reflection
idt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP29857799A
Other languages
Japanese (ja)
Other versions
JP2001119266A (en
Inventor
孝雄 向井
道雄 門田
秀哉 堀内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP29857799A priority Critical patent/JP3705722B2/en
Priority to SG200005833A priority patent/SG87183A1/en
Priority to TW089121180A priority patent/TW486864B/en
Priority to EP00402866A priority patent/EP1094602A3/en
Priority to KR1020000061578A priority patent/KR100811451B1/en
Priority to US09/692,668 priority patent/US6731044B1/en
Publication of JP2001119266A publication Critical patent/JP2001119266A/en
Application granted granted Critical
Publication of JP3705722B2 publication Critical patent/JP3705722B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/25Constructional features of resonators using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02637Details concerning reflective or coupling arrays
    • H03H9/02669Edge reflection structures, i.e. resonating structures without metallic reflectors, e.g. Bleustein-Gulyaev-Shimizu [BGS], shear horizontal [SH], shear transverse [ST], Love waves devices
    • H03H9/02677Edge reflection structures, i.e. resonating structures without metallic reflectors, e.g. Bleustein-Gulyaev-Shimizu [BGS], shear horizontal [SH], shear transverse [ST], Love waves devices having specially shaped edges, e.g. stepped, U-shaped edges
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02637Details concerning reflective or coupling arrays
    • H03H9/02669Edge reflection structures, i.e. resonating structures without metallic reflectors, e.g. Bleustein-Gulyaev-Shimizu [BGS], shear horizontal [SH], shear transverse [ST], Love waves devices

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、SHタイプの表面波を利用した端面反射型の表面波装置に関する。
【0002】
【従来の技術】
従来より、SHタイプの表面波を利用した端面反射型の表面波装置が知られている。SHタイプの表面波とは、BGS波やラブ波等のように変位が表面波伝搬方向と垂直で基板表面と平行な成分を主成分とする表面波をいう。このような端面反射型の表面波装置として、バルク波を抑制するために、あるい製造を容易とするために、基板端面に段差あるいは基板に溝を設け、基板端面の上部側端面または溝の内面を反射端面とした構造のものがある(特開平4−82315号公報、特開平7−263998号公報参照)。例えば、特開平4−82315号公報では、基板端面であって表面からSH波のエネルギーの80%が集中する厚み以上の厚みを隔てた高さ位置に段差を設けることにより、SH波の共振に対してバルク波共振の影響を遮断でき、バルク波共振に基づく不要スプリアスが効果的に抑圧されるとされている。
【0003】
【発明が解決しようとする課題】
しかしながら、上記のように反射端面の高さを所定の高さ以上に設定した場合にも、所望の共振特性や通過帯域特性が得られないことがあった。すなわち、上記従来のように段差または溝により反射端面を形成した表面波装置において、その反射端面の高さを適切な値に設定した場合にも、基板端面と反射端面の距離が大きくなると、通過帯域内にリップルが生じる等の問題があった。また、反射端面の高さを大きくしていくと同様に通過帯域内にリップルが生じるという問題があった。
【0004】
そこで、本発明の目的は、バルク波によるリップルを低減して、所望の共振特性、通過帯域特性を確実に得ることができる表面波装置を提供することにある。
【0005】
【課題を解決するための手段】
上記目的を達成するために、本発明は、圧電基板と、前記圧電基板上に形成されたIDTとを備え、前記IDTの外側の前記圧電基板の上面側に表面波を反射させるための反射端面を構成する溝または段差を設けた表面波装置において、前記表面波装置が端面反射型の縦結合共振子型フィルタ、横結合共振子型フィルタ、ラダー型フィルタであり、表面波の波長をλとしたときに、前記圧電基板の端面と前記反射端面との距離Lを8λ以下に設定し、かつ前記反射端面の高さHを2λ〜4λに設定したことを特徴とする。
【0006】
【課題を解決するための手段】
上記目的を達成するために、本発明は、圧電基板と、前記圧電基板上に形成されたIDTとを備え、前記IDTの外側の前記圧電基板の上面側に表面波を反射させるための反射端面を構成する溝または段差を設けた表面波装置において、前記表面波装置が端面反射型の表面波フィルタであり、表面波の波長をλとしたときに、前記圧電基板の端面と前記反射端面との距離Lを8λ以下に設定し、かつ前記反射端面の高さHを2λ〜4λに設定したことを特徴とする。
【0007】
なお、本発明における表面波装置は、表面波共振子、縦結合共振子型フィルタ、横結合共振子型フィルタ、ラダー型フィルタ等のSH波の表面波を利用した装置一般を含むものであり、1つ以上の任意の数のインターデジタルトランスデューサ(IDT)が圧電基板上に設けられ、少なくとも1つのIDTの少なくとも一方側に表面波を反射させるための反射端面を形成した構成を有するものである。
【0008】
また、本発明に係る通信機装置は上記の特徴を有する表面波装置を備えて構成される。これにより、特性が良好な通信機装置を得ることができる。
【0009】
【発明の実施の形態】
本発明の第1実施形態に係る表面波装置の構成を図1〜図2を参照して説明する。図1は外観斜視図、図2は断面図である。なお、以下の図においてIDTの電極指の幅を広い幅で図示しているが、実際の製品においては電極指の幅は非常に細いものとなっている。
本実施形態の表面波装置は、端面反射型の縦結合共振子型表面波フィルタであり、平面形状が矩形の圧電基板2を備えている。圧電基板2は、例えば、チタン酸ジルコン酸鉛系セラミックス等の圧電セラミックス、またはLiNbO3、LiTaO3等の圧電単結晶により構成されている。圧電基板2は対向する端面21,22を有し、両端面21,22の内側の上面(一方主面)側に両端面21,22と平行に溝23,24がそれぞれ形成され、この溝23,24の内側の面23a,24aが表面波を反射させるための反射端面として機能するように構成されている。
【0010】
圧電基板2の上面の溝23,24の間には2つのIDT3,4が形成されている。IDT3は一対の櫛歯電極3a,3bからなり、櫛歯電極3a,3bはそれぞれ複数本の電極指を有し、櫛歯電極3aの電極指と櫛歯電極3bの電極指とは互いに間挿し合うように配置されている。同様に、IDT4は一対の櫛歯電極4a,4bからなり、櫛歯電極4a,4bは櫛歯電極3a,3bと同様に構成されている。各電極指は溝23,24と平行に配置され、IDT3,4の最も外側の電極指3c,4cはその外側端縁が反射端面23a,24aに接して配置され、表面波の波長をλとしたとき、IDT3,4の最も外側の電極指の幅は略λ/8とされ、他の電極指の幅はすべて略λ/4とされている。
【0011】
この構成おいて、一方のIDTに入力電圧を印加すると、SH波の表面波が励振され、励振された表面波は反射端面23a,24aを結ぶ方向に伝搬し、端面23a,24aで反射されてさらに基本波と高次モードの波とが結合し、定在波が端面23a,24a間に発生する。この定在波に基づく出力は、他方のIDTで取り出され、SH波の表面波を利用した縦結合共振子型フィルタとして動作する。
【0012】
そして、この表面波装置では、反射端面23a,24aから基板端面21,22までのそれぞれの距離Lを8λ以下となるように形成している。また、反射端面23a,24aの高さすなわち溝23,24の深さHを2λ〜4λの範囲となるように形成している。
【0013】
次に、本発明の第2実施形態に係る表面波装置の構成を図3に示す。本実施形態の表面波装置は、基板端面に段差を設けて反射端面を形成したものである。すなわち、この表面波装置では、圧電基板2の対向2端面21,22に段差25,26がそれぞれ形成されている。段差25,26は圧電基板2の上面側を矩形状に切り欠くように形成され、段差25,26よりも上方側の端面21a,22aを反射端面としている。この反射端面21a,22aの構成以外のIDTを構成する部分については、第1実施形態の構成と同様であり、その説明を省略する。
【0014】
この表面波装置では、反射端面21a,22aから基板端面21,22までのそれぞれの距離Lを8λ以下となるように形成し、反射端面21a,22aの高さすなわち段差25,26の圧電基板2上面からの距離Hを2λ〜4λの範囲となるように形成している。
【0015】
上記第1及び第2実施形態の表面波装置は、以下のように製造される。まず、圧電母基板に上記表面波装置を構成するIDTを多数形成する。次に、圧電母基板の上面側に反射端面を形成するための溝(図1及び図2における23,24)をダイサー等を用いて形成する。この溝の形成はIDTの最も外側の電極指3c,4cが所定の幅となるように、溝の内面にチッピング等が発生しないように精度よく行われる。この溝の側面の一方側が上記反射端面21a,22a,23a,24aとなっており、この溝の深さ(反射端面の高さ)は2λ〜4λの範囲に設定される。次に、溝の外側または溝内をダイサー等を用いて切断して個々の表面波装置に分離する。このときの切断面が上記圧電基板2の端面21,22となり、この切断面が各溝の内側の面から8λ以下に設定される。すなわち、上記溝の外側を切断すれば、第1実施形態の表面波装置となり、上記溝内を切断すれば第2実施形態の表面波装置となり基板端面に段差が形成される。このように、反射端面となる溝を形成した後反射端面とは異なる位置で圧電基板2を切断することにより、チッピング等のない精度の高い反射端面を形成している。
【0016】
次に、基板端面と反射端面の距離L、及び反射端面の高さHの限定理由を実験結果に基づいて説明する。なお、このような表面波装置において、切断分離前の状態すなわち上記距離Lを実質的に無限大とした場合(実際には上記距離Lを500λ以上とした場合)、基板端面でのバルク波の反射は起こらないので、リップルや挿入損失は最も小さくなる。また、挿入損失−周波数特性における帯域内リップルは帯域内GDT偏差に対応しており、帯域内リップルをGDT偏差で評価した。
図4は、上記第1及び第2実施形態の表面波装置において、圧電母基板を切断する前を基準としたときの切断後の上記距離Lと通過帯域内のGDT偏差の変化量の関係を示す図である。なお、IDT3,4の電極指の総対数を34対、表面波の波長λを20μm、反射端面の高さHを3λとして構成した中心周波数190MHz、通過帯域幅5MHzの携帯電話の1stIF用のフィルタである。図4に示すように、帯域内GDT偏差は基板端面と反射端面との距離Lが8λを境界として大きく変化し、距離Lが8λ以下でGDT偏差の変化量は小さく、距離Lが8λ以上でGDT偏差の変化量は大きくなっている。すなわち、距離Lを8λ以下に設定すれば、通過帯域内リップルを低減することができる。
【0017】
なお、反射端面にチッピング等が生じないように、つまり精度の高い反射端面を形成するために段差は必要であり、距離Lはλ/10以上に設定するのが好ましい。
【0018】
図5は、上記実施形態の表面波装置で反射端面の高さHと帯域内GDT偏差及び最小挿入損失の関係を示す図である。なお、基板端面と反射端面との距離Lをλとしたときのデータである。図5に示すように、帯域内GDT偏差は反射端面の高さHが2λ〜4λの範囲で小さくなっており使用レベルである0.125μs以下となり、反射端面の高さHが2λより小さくなると、表面波エネルギーを反射しきれず、最小挿入損失が大きくなっている。すなわち、反射端面の高さHを2λ〜4λの範囲に設定すれば、通過帯域内リップル及び挿入損失を低減することができ、良好な通過帯域特性を得ることができる。
【0019】
なお、上記実施形態では縦結合共振子型フィルタの構成を例にとって説明したが、表面波装置としては、横結合共振子型フィルタ、ラダー型フィルタまたは表面波共振子であってもよい。また、反射端面をIDTの両側に形成したものに限定されるものではなく、表面波装置を構成するIDTの片側に反射端面を設けIDTの他方側に反射器を設けた構成であってもよい。例えば、複数の表面波共振子を同一圧電基板上に多数配置してラダー型フィルタを構成する場合、反射端面による端面反射と反射器による反射とを利用した構成が採用される。
【0020】
次に、本発明の第3実施形態に係る通信機装置の構成を図6に示す。この通信機装置は、送信用フィルタTX及び受信用フィルタRXからなるデュプレクサDPXのアンテナ端にアンテナANTが接続され、送信用フィルタTXの入力端に送信回路が接続され、受信用フィルタRXの出力端に受信回路が接続されて構成されている。送信回路からの送信信号は送信用フィルタTXを通してアンテナANTから発信される。また、アンテナANTで受信された受信信号は受信用フィルタRXを通して受信回路に入力される。
【0021】
ここに、受信用フィルタRX、受信回路の1stIF用フィルタ、通信機装置の各種段間用フィルタまたは発振用素子として、本発明に係る表面波装置を採用することができる。本発明に係る表面波装置を用いることにより、特性が良好な通信機装置を得ることができる。
【0022】
【発明の効果】
以上説明したように、本発明に係る表面波装置によれば、基板端面と反射端面の距離を8λ以下とすることにより、バルク波によって生じる通過帯域内のリップルを低減することができ、所望の共振特性または通過帯域特性を得ることができる。さらに、反射端面の高さを2λ〜4λの範囲内に設定することにより、通過帯域内のリップルを低減でき、所望の共振特性または通過帯域特性を得ることができる。
【0023】
また、本発明に係る表面波装置を実装することにより、特性が良好な通信機装置を得ることができる。
【図面の簡単な説明】
【図1】第1実施形態に係る表面波装置の斜視図である。
【図2】第1実施形態に係る表面波装置の断面図である。
【図3】第2実施形態に係る表面波装置の断面図である。
【図4】基板端面と反射端面との距離と帯域内GDT偏差の変化量の関係を示す図である。
【図5】反射端面の高さと帯域内特性(GDT偏差、挿入損失)の関係を示す図である。
【図6】第3実施形態に係る通信機装置のブロック図である。
【符号の説明】
2 圧電基板
21,22 基板端面
21a,22a 反射端面
23,24 溝
23a,24a 反射端面
3,4 IDT
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an end surface reflection type surface acoustic wave device using an SH type surface acoustic wave.
[0002]
[Prior art]
Conventionally, an end surface reflection type surface wave device using an SH type surface wave is known. The SH type surface wave is a surface wave whose main component is a component whose displacement is perpendicular to the surface wave propagation direction and parallel to the substrate surface, such as a BGS wave or a Love wave. As such an end surface reflection type surface wave device, in order to suppress bulk waves or to facilitate manufacture, a step or a groove is provided in the substrate end surface, and the upper end surface of the substrate end surface or the groove There is a structure having an inner surface as a reflection end face (see Japanese Patent Laid-Open Nos. 4-82315 and 7-263998). For example, in Japanese Patent Laid-Open No. 4-82315, the resonance of the SH wave is achieved by providing a step at a height position that is more than the thickness at which 80% of the SH wave energy is concentrated from the surface of the substrate. On the other hand, the influence of bulk wave resonance can be cut off, and unnecessary spurious based on bulk wave resonance is effectively suppressed.
[0003]
[Problems to be solved by the invention]
However, even when the height of the reflection end face is set to a predetermined height or more as described above, desired resonance characteristics and passband characteristics may not be obtained. That is, in a surface acoustic wave device in which a reflection end face is formed by steps or grooves as in the conventional case, even if the height of the reflection end face is set to an appropriate value, if the distance between the substrate end face and the reflection end face increases, the surface wave device passes. There were problems such as ripples in the band. Further, when the height of the reflection end face is increased, there is a problem that ripples are generated in the passband.
[0004]
SUMMARY OF THE INVENTION An object of the present invention is to provide a surface wave device that can reliably obtain desired resonance characteristics and passband characteristics by reducing ripples caused by bulk waves.
[0005]
[Means for Solving the Problems]
In order to achieve the above object, the present invention comprises a piezoelectric substrate and an IDT formed on the piezoelectric substrate, and a reflection end surface for reflecting surface waves on the upper surface side of the piezoelectric substrate outside the IDT. In the surface wave device provided with a groove or a step forming the surface wave device, the surface wave device is an end face reflection type longitudinally coupled resonator type filter, laterally coupled resonator type filter, ladder type filter , and the wavelength of the surface wave is λ The distance L between the end face of the piezoelectric substrate and the reflection end face is set to 8λ or less, and the height H of the reflection end face is set to 2λ to 4λ.
[0006]
[Means for Solving the Problems]
In order to achieve the above object, the present invention comprises a piezoelectric substrate and an IDT formed on the piezoelectric substrate, and a reflection end surface for reflecting surface waves on the upper surface side of the piezoelectric substrate outside the IDT. In the surface wave device provided with a groove or a step, the surface wave device is an end surface reflection type surface wave filter, and when the wavelength of the surface wave is λ, the end surface of the piezoelectric substrate and the reflection end surface The distance L is set to 8λ or less , and the height H of the reflection end face is set to 2λ to 4λ .
[0007]
The surface acoustic wave device in the present invention includes general devices using surface waves of SH waves such as surface acoustic wave resonators, longitudinally coupled resonator type filters, laterally coupled resonator type filters, ladder type filters, etc. One or more arbitrary numbers of interdigital transducers (IDT) are provided on a piezoelectric substrate, and a reflection end face for reflecting a surface wave is formed on at least one side of at least one IDT.
[0008]
The communication device according to the present invention includes a surface acoustic wave device having the above characteristics. Thereby, a communication apparatus with good characteristics can be obtained.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
The configuration of the surface acoustic wave device according to the first embodiment of the present invention will be described with reference to FIGS. 1 is an external perspective view, and FIG. 2 is a cross-sectional view. In the following drawings, the width of the electrode finger of the IDT is shown as being wide, but in an actual product, the width of the electrode finger is very thin.
The surface acoustic wave device of this embodiment is an end face reflection type longitudinally coupled resonator surface acoustic wave filter, and includes a piezoelectric substrate 2 having a rectangular planar shape. The piezoelectric substrate 2 is made of, for example, piezoelectric ceramics such as lead zirconate titanate-based ceramics or piezoelectric single crystals such as LiNbO3 and LiTaO3. The piezoelectric substrate 2 has opposing end surfaces 21 and 22, and grooves 23 and 24 are formed in parallel with the both end surfaces 21 and 22 on the inner upper surface (one main surface) side of the both end surfaces 21 and 22, respectively. , 24 are configured so that the inner surfaces 23a, 24a function as reflection end surfaces for reflecting surface waves.
[0010]
Two IDTs 3 and 4 are formed between the grooves 23 and 24 on the upper surface of the piezoelectric substrate 2. The IDT 3 includes a pair of comb electrodes 3a and 3b. Each of the comb electrodes 3a and 3b has a plurality of electrode fingers, and the electrode fingers of the comb electrode 3a and the electrode fingers of the comb electrode 3b are inserted into each other. It is arranged to fit. Similarly, the IDT 4 includes a pair of comb electrodes 4a and 4b, and the comb electrodes 4a and 4b are configured similarly to the comb electrodes 3a and 3b. The electrode fingers are arranged in parallel with the grooves 23 and 24, and the outermost electrode fingers 3c and 4c of the IDTs 3 and 4 are arranged so that the outer edges thereof are in contact with the reflection end faces 23a and 24a. In this case, the outermost electrode fingers of the IDTs 3 and 4 have a width of approximately λ / 8, and the other electrode fingers have a width of approximately λ / 4.
[0011]
In this configuration, when an input voltage is applied to one IDT, the surface wave of the SH wave is excited, the excited surface wave propagates in the direction connecting the reflection end faces 23a and 24a, and is reflected by the end faces 23a and 24a. Further, the fundamental wave and the higher-order mode wave are combined, and a standing wave is generated between the end faces 23a and 24a. The output based on this standing wave is taken out by the other IDT and operates as a longitudinally coupled resonator type filter using the surface wave of the SH wave.
[0012]
In this surface acoustic wave device, each distance L from the reflection end faces 23a, 24a to the substrate end faces 21, 22 is formed to be 8λ or less. Further, the reflection end faces 23a and 24a, that is, the depths H of the grooves 23 and 24 are formed to be in the range of 2λ to 4λ.
[0013]
Next, FIG. 3 shows a configuration of a surface acoustic wave device according to the second embodiment of the present invention. In the surface acoustic wave device of this embodiment, a reflection end surface is formed by providing a step on a substrate end surface. That is, in this surface acoustic wave device, steps 25 and 26 are formed on the two opposing end surfaces 21 and 22 of the piezoelectric substrate 2, respectively. The steps 25 and 26 are formed so that the upper surface side of the piezoelectric substrate 2 is cut out in a rectangular shape, and the end surfaces 21a and 22a above the steps 25 and 26 are used as reflection end surfaces. The portions constituting the IDT other than the configurations of the reflection end faces 21a and 22a are the same as the configuration of the first embodiment, and the description thereof is omitted.
[0014]
In this surface wave device, each distance L from the reflection end faces 21a, 22a to the substrate end faces 21, 22 is formed to be 8λ or less, and the height of the reflection end faces 21a, 22a, that is, the piezoelectric substrate 2 of the steps 25, 26 is formed. The distance H from the upper surface is formed to be in the range of 2λ to 4λ.
[0015]
The surface acoustic wave devices of the first and second embodiments are manufactured as follows. First, a large number of IDTs constituting the surface wave device are formed on a piezoelectric mother substrate. Next, grooves (23 and 24 in FIGS. 1 and 2) for forming a reflection end face are formed on the upper surface side of the piezoelectric mother substrate using a dicer or the like. The groove is formed with high accuracy so that no chipping or the like occurs on the inner surface of the groove so that the outermost electrode fingers 3c and 4c of the IDT have a predetermined width. One side of the side surface of the groove is the reflection end face 21a, 22a, 23a, 24a, and the depth of the groove (the height of the reflection end face) is set in the range of 2λ to 4λ. Next, the outside of the groove or the inside of the groove is cut using a dicer or the like, and separated into individual surface wave devices. The cut surfaces at this time become the end surfaces 21 and 22 of the piezoelectric substrate 2, and the cut surfaces are set to 8λ or less from the inner surface of each groove. That is, if the outside of the groove is cut, the surface wave device of the first embodiment is obtained, and if the inside of the groove is cut, the surface wave device of the second embodiment is obtained, and a step is formed on the substrate end face. Thus, after forming the groove | channel which becomes a reflective end surface, the reflective end surface with high precision without chipping etc. is formed by cut | disconnecting the piezoelectric substrate 2 in a position different from a reflective end surface.
[0016]
Next, the reasons for limiting the distance L between the substrate end surface and the reflection end surface and the height H of the reflection end surface will be described based on experimental results. In such a surface wave device, the state before cutting and separation, that is, when the distance L is substantially infinite (actually when the distance L is 500λ or more), the bulk wave at the substrate end face Since no reflection occurs, ripple and insertion loss are minimized. Further, the in-band ripple in the insertion loss-frequency characteristic corresponds to the in-band GDT deviation, and the in-band ripple was evaluated by the GDT deviation.
FIG. 4 shows the relationship between the distance L after cutting and the amount of change in GDT deviation in the passband when the piezoelectric substrate is cut before, in the surface acoustic wave devices of the first and second embodiments. FIG. A filter for 1st IF of a mobile phone having a center frequency of 190 MHz and a passband width of 5 MHz, in which the total number of electrode fingers of IDT 3 and 4 is 34 pairs, the wavelength λ of the surface wave is 20 μm, and the height H of the reflection end face is 3λ. It is. As shown in FIG. 4, the in-band GDT deviation greatly changes when the distance L between the substrate end face and the reflecting end face is 8λ, the change in the GDT deviation is small when the distance L is 8λ or less, and the distance L is 8λ or more. The amount of change in GDT deviation is large. That is, if the distance L is set to 8λ or less, the ripple in the passband can be reduced.
[0017]
In order to prevent chipping or the like from occurring on the reflection end face, that is, to form a highly accurate reflection end face, a step is necessary, and the distance L is preferably set to λ / 10 or more.
[0018]
FIG. 5 is a diagram showing the relationship between the height H of the reflection end face, the in-band GDT deviation, and the minimum insertion loss in the surface acoustic wave device of the above embodiment. The data is when the distance L between the substrate end face and the reflection end face is λ. As shown in FIG. 5, the in-band GDT deviation is small when the reflection end face height H is in the range of 2λ to 4λ and is less than 0.125 μs, which is the use level, and when the reflection end face height H is less than 2λ. The surface wave energy cannot be reflected and the minimum insertion loss is large. That is, if the height H of the reflection end face is set in the range of 2λ to 4λ, the ripple in the passband and the insertion loss can be reduced, and good passband characteristics can be obtained.
[0019]
In the above embodiment, the configuration of the longitudinally coupled resonator type filter has been described as an example. However, the surface acoustic wave device may be a laterally coupled resonator type filter, a ladder type filter, or a surface acoustic wave resonator. Further, the reflection end face is not limited to the one formed on both sides of the IDT, and the reflection end face may be provided on one side of the IDT constituting the surface wave device and the reflector may be provided on the other side of the IDT. . For example, when a ladder type filter is configured by arranging a plurality of surface wave resonators on the same piezoelectric substrate, a configuration using end surface reflection by a reflection end surface and reflection by a reflector is employed.
[0020]
Next, the configuration of a communication device according to the third embodiment of the present invention is shown in FIG. In this communication apparatus, an antenna ANT is connected to an antenna end of a duplexer DPX including a transmission filter TX and a reception filter RX, a transmission circuit is connected to an input end of the transmission filter TX, and an output end of the reception filter RX. The receiver circuit is connected to the receiver. A transmission signal from the transmission circuit is transmitted from the antenna ANT through the transmission filter TX. A reception signal received by the antenna ANT is input to the reception circuit through the reception filter RX.
[0021]
Here, the surface acoustic wave device according to the present invention can be employed as the reception filter RX, the 1st IF filter of the reception circuit, the various interstage filters of the communication device, or the oscillation element. By using the surface acoustic wave device according to the present invention, a communication device having good characteristics can be obtained.
[0022]
【The invention's effect】
As described above, according to the surface acoustic wave device of the present invention, by setting the distance between the substrate end surface and the reflection end surface to 8λ or less, ripples in the passband caused by bulk waves can be reduced, Resonance characteristics or passband characteristics can be obtained. Furthermore, by setting the height of the reflection end face within a range of 2λ to 4λ, ripples in the passband can be reduced, and desired resonance characteristics or passband characteristics can be obtained.
[0023]
In addition, by mounting the surface acoustic wave device according to the present invention, a communication device having good characteristics can be obtained.
[Brief description of the drawings]
FIG. 1 is a perspective view of a surface acoustic wave device according to a first embodiment.
FIG. 2 is a cross-sectional view of the surface acoustic wave device according to the first embodiment.
FIG. 3 is a cross-sectional view of a surface acoustic wave device according to a second embodiment.
FIG. 4 is a diagram illustrating a relationship between a distance between a substrate end surface and a reflection end surface and an amount of change in an in-band GDT deviation.
FIG. 5 is a diagram showing the relationship between the height of a reflection end face and in-band characteristics (GDT deviation, insertion loss).
FIG. 6 is a block diagram of a communication device according to a third embodiment.
[Explanation of symbols]
2 Piezoelectric substrates 21 and 22 Substrate end surfaces 21a and 22a Reflective end surfaces 23 and 24 Grooves 23a and 24a Reflective end surfaces 3 and 4 IDT

Claims (4)

圧電基板と、前記圧電基板上に形成されたIDTとを備え、前記IDTの外側の前記圧電基板の上面側に表面波を反射させるための反射端面を構成する溝または段差を設けた表面波装置において、
前記表面波装置が端面反射型の縦結合共振子型フィルタであり、
表面波の波長をλとしたときに、前記圧電基板の端面と前記反射端面との距離Lを8λ以下に設定し、かつ前記反射端面の高さHを2λ〜4λに設定したことを特徴とする表面波装置。
A surface acoustic wave device comprising: a piezoelectric substrate; and an IDT formed on the piezoelectric substrate, wherein a groove or a step forming a reflection end surface for reflecting a surface wave on the upper surface side of the piezoelectric substrate outside the IDT is provided. In
The surface acoustic wave device is an end face reflection type longitudinally coupled resonator type filter ,
When the wavelength of the surface wave is λ, the distance L between the end face of the piezoelectric substrate and the reflecting end face is set to 8λ or less, and the height H of the reflecting end face is set to 2λ to 4λ. Surface wave device.
圧電基板と、前記圧電基板上に形成されたIDTとを備え、前記IDTの外側の前記圧電基板の上面側に表面波を反射させるための反射端面を構成する溝または段差を設けた表面波装置において、
前記表面波装置が端面反射型の横結合共振子型フィルタであり、
表面波の波長をλとしたときに、前記圧電基板の端面と前記反射端面との距離Lを8λ以下に設定し、かつ前記反射端面の高さHを2λ〜4λに設定したことを特徴とする表面波装置
A surface acoustic wave device comprising: a piezoelectric substrate; and an IDT formed on the piezoelectric substrate, wherein a groove or a step forming a reflection end surface for reflecting a surface wave on the upper surface side of the piezoelectric substrate outside the IDT is provided. In
The surface acoustic wave device is an end face reflection type laterally coupled resonator type filter,
When the wavelength of the surface wave is λ, the distance L between the end face of the piezoelectric substrate and the reflecting end face is set to 8λ or less, and the height H of the reflecting end face is set to 2λ to 4λ. Surface wave device .
圧電基板と、前記圧電基板上に形成されたIDTとを備え、前記IDTの外側の前記圧電基板の上面側に表面波を反射させるための反射端面を構成する溝または段差を設けた表面波装置において、
前記表面波装置が端面反射型のラダー型フィルタであり、
表面波の波長をλとしたときに、前記圧電基板の端面と前記反射端面との距離Lを8λ以下に設定し、かつ前記反射端面の高さHを2λ〜4λに設定したことを特徴とする表面波装置
A surface acoustic wave device comprising: a piezoelectric substrate; and an IDT formed on the piezoelectric substrate, wherein a groove or a step forming a reflection end surface for reflecting a surface wave on the upper surface side of the piezoelectric substrate outside the IDT is provided. In
The surface wave device is an end surface reflection type ladder filter,
When the wavelength of the surface wave is λ, the distance L between the end face of the piezoelectric substrate and the reflecting end face is set to 8λ or less, and the height H of the reflecting end face is set to 2λ to 4λ. Surface wave device .
請求項1ないし請求項に記載の表面波装置を備えたことを特徴とする通信機装置。Communication apparatus characterized by comprising a surface acoustic wave device as claimed in claims 1 to 3.
JP29857799A 1999-10-20 1999-10-20 Surface wave device Expired - Fee Related JP3705722B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP29857799A JP3705722B2 (en) 1999-10-20 1999-10-20 Surface wave device
SG200005833A SG87183A1 (en) 1999-10-20 2000-10-11 Surface acoustic wave device
TW089121180A TW486864B (en) 1999-10-20 2000-10-11 Surface acoustic wave device
EP00402866A EP1094602A3 (en) 1999-10-20 2000-10-17 Surface acoustic wave device
KR1020000061578A KR100811451B1 (en) 1999-10-20 2000-10-19 Surface Acoustic Wave Device
US09/692,668 US6731044B1 (en) 1999-10-20 2000-10-20 Surface acoustic wave device having an interdigital transducer provided on a main region of a piezoelectric substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29857799A JP3705722B2 (en) 1999-10-20 1999-10-20 Surface wave device

Publications (2)

Publication Number Publication Date
JP2001119266A JP2001119266A (en) 2001-04-27
JP3705722B2 true JP3705722B2 (en) 2005-10-12

Family

ID=17861553

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29857799A Expired - Fee Related JP3705722B2 (en) 1999-10-20 1999-10-20 Surface wave device

Country Status (6)

Country Link
US (1) US6731044B1 (en)
EP (1) EP1094602A3 (en)
JP (1) JP3705722B2 (en)
KR (1) KR100811451B1 (en)
SG (1) SG87183A1 (en)
TW (1) TW486864B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4174661B2 (en) * 2001-01-10 2008-11-05 セイコーエプソン株式会社 Surface acoustic wave device and manufacturing method thereof
US6839450B2 (en) 2001-04-26 2005-01-04 Hewlett-Packard Development Company, L.P. Detecting halftone modulations embedded in an image
JP3969311B2 (en) * 2003-01-20 2007-09-05 株式会社村田製作所 Edge reflection type surface acoustic wave device
JP5956901B2 (en) * 2011-12-22 2016-07-27 日本無線株式会社 Device measurement device
JP7037333B2 (en) * 2017-11-13 2022-03-16 太陽誘電株式会社 Elastic wave devices and their manufacturing methods, filters and multiplexers
EP3830956A2 (en) * 2018-07-27 2021-06-09 Frec|N|Sys Resonant cavity surface acoustic wave (saw) filters
KR20220095695A (en) * 2020-12-30 2022-07-07 (주) 와이팜 Surface acoustic wave resonator and surface acoustic wave filter

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2266395B1 (en) * 1974-03-26 1980-10-31 Thomson Csf
GB1513466A (en) * 1975-09-19 1978-06-07 Mullard Ltd Acoustic surface wave devices
JPH0821830B2 (en) * 1990-07-24 1996-03-04 株式会社村田製作所 Surface wave device
US5220234A (en) * 1992-03-02 1993-06-15 Hewlett-Packard Company Shear transverse wave device having selective trapping of wave energy
JPH07106911A (en) * 1993-10-06 1995-04-21 Sanyo Electric Co Ltd Surface acoustic wave resonator/filter
US5793146A (en) * 1993-11-12 1998-08-11 Rf Monolithics, Inc. Surface acoustic wave transducer having selected reflectivity
JPH07142904A (en) 1993-11-15 1995-06-02 Matsushita Electric Ind Co Ltd Dielectric laminated filter
JP3206285B2 (en) 1994-03-25 2001-09-10 株式会社村田製作所 Edge reflection type surface acoustic wave resonator
JPH07297074A (en) 1994-04-27 1995-11-10 Matsushita Electric Ind Co Ltd Multilayered ceramic electronic component
US5793147A (en) * 1994-05-30 1998-08-11 Murata Manufacturing Co., Ltd. Surface wave resonator having single component including a plurality of resonant units
JP3435868B2 (en) * 1995-01-13 2003-08-11 株式会社村田製作所 Edge reflection type surface acoustic wave device and method of manufacturing the same
JPH08204498A (en) * 1995-01-24 1996-08-09 Murata Mfg Co Ltd End face reflection type surface acoustic wave device
JPH0969751A (en) * 1995-08-30 1997-03-11 Murata Mfg Co Ltd Surface acoustic wave filter
JPH09190947A (en) 1996-01-11 1997-07-22 Murata Mfg Co Ltd Laminated ceramic electronic component
JPH09294045A (en) * 1996-04-26 1997-11-11 Murata Mfg Co Ltd End face reflection type surface wave resonator
US6003370A (en) * 1996-05-30 1999-12-21 Minolta Co., Ltd. Elastic surface wave gyroscope
EP1326333B1 (en) * 1997-02-12 2008-08-20 Oki Electric Industry Co., Ltd. Surface-acoustic-wave filters with poles of attenuation created by impedance circuits
TW404091B (en) * 1997-05-16 2000-09-01 Murata Manufacturing Co Ladder filter having edge-reflection type resonators
JPH11136083A (en) * 1997-08-27 1999-05-21 Murata Mfg Co Ltd Surface wave device
JP2000278091A (en) * 1999-03-19 2000-10-06 Murata Mfg Co Ltd End face reflection type surface wave device
US6246150B1 (en) * 1999-10-28 2001-06-12 Kabushiki Kaisha Toshiba Surface acoustic wave device
US6242844B1 (en) * 1999-12-28 2001-06-05 Cts Corporation Wide-band single-phase unidirectional transducer
US6650206B2 (en) * 2000-09-13 2003-11-18 Matsushita Electric Industrial Co., Ltd. Surface acoustic wave filter and communication apparatus with the same

Also Published As

Publication number Publication date
SG87183A1 (en) 2002-03-19
KR20010051135A (en) 2001-06-25
KR100811451B1 (en) 2008-03-10
EP1094602A2 (en) 2001-04-25
JP2001119266A (en) 2001-04-27
EP1094602A3 (en) 2005-05-25
TW486864B (en) 2002-05-11
US6731044B1 (en) 2004-05-04

Similar Documents

Publication Publication Date Title
US7659653B2 (en) Acoustic wave device and filter
JPH08265087A (en) Surface acoustic wave filter
KR100290803B1 (en) Surface acoustic wave device
US6346864B1 (en) Saw resonator filter and duplexer utilizing SH waves, substrate edge reflection, and sub-interdigital transducer portions
JP3391309B2 (en) Surface wave device and communication device
US6873226B2 (en) Edge-reflection surface acoustic wave filter
EP0854571A2 (en) Surface acoustic wave filter
KR100317162B1 (en) Transversely Coupled Resonator Type Surface Wave Filter And Longitudinally Coupled Resonator Type Surface Wave Filter
US20030214372A1 (en) Surface acoustic wave device
KR100352393B1 (en) Surface acoustic wave device
JP3705722B2 (en) Surface wave device
KR100656672B1 (en) Surface Acoustic Wave Device and Communication Apparatus
US5760664A (en) Acoustic wave filter with double reflective gratings and method for producing the same
US5909158A (en) Surface acoustic wave resonator filter with longitudinally coupled resonators having specific resonance frequency placements
KR100599244B1 (en) Edge reflection type surface acoustic wave filter
KR100650533B1 (en) Surface acoustic wave filter
US6310524B1 (en) Edge reflection type longitudinally coupled saw resonator filter
JP2002185284A (en) Surface acoustic wave filter
JP3435641B2 (en) Edge reflection type surface acoustic wave filter
WO2022091582A1 (en) Elastic wave filter
JPH10145183A (en) Surface acoustic wave filter
JP2002290196A (en) Vertical coupling dual-mode surface acoustic wave filter

Legal Events

Date Code Title Description
A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20050726

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080805

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090805

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090805

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100805

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100805

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110805

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120805

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120805

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130805

Year of fee payment: 8

LAPS Cancellation because of no payment of annual fees