JP3582017B2 - Polishing composition and plastic polishing composition - Google Patents

Polishing composition and plastic polishing composition Download PDF

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Publication number
JP3582017B2
JP3582017B2 JP15489493A JP15489493A JP3582017B2 JP 3582017 B2 JP3582017 B2 JP 3582017B2 JP 15489493 A JP15489493 A JP 15489493A JP 15489493 A JP15489493 A JP 15489493A JP 3582017 B2 JP3582017 B2 JP 3582017B2
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Prior art keywords
polishing
polishing composition
plastic
alumina sol
glycols
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JP15489493A
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Japanese (ja)
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JPH0711239A (en
Inventor
一志 児玉
寛人 北野
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Fujimi Inc
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Fujimi Inc
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Description

【0001】
【産業上の利用分野】
この発明はプラスチック製品や金属材料等を迅速に研磨する従来品より改良された研磨用組成物に関する。
【0002】
【従来の技術】
一般に使用されるプラスチック製品や金属材料の研磨用組成物は、研磨材、例えば酸化セリウム、酸化アルミニウム、酸化ジルコニウム、酸化スズ、二酸化ケイ素、二酸化チタン、二酸化クロムを水でスラリー状にしたものである。この従来の研磨用組成物をプラスチック製品や金属材料に適用して研磨パッドなどで研磨することが行われている。
しかし、これら従来の研磨用組成物は研磨に手間がかかり、研磨表面を滑らかにし、かつ光沢を良くするためには相当の研磨時間を要する。また、研磨能率を良くするために研磨剤の粒子径を大きくすると深いスクラッチ及びオレンジピール等の表面欠陥を生成する傾向があり、滑らかでそれらの欠点のない高品質な表面を得ることは一層困難であった。
【0003】
上記の従来の研磨用組成物の欠点を解消するために、本出願人は、特公昭53−3518号公報にて次のような合成樹脂成形品の研磨用組成物を開示した。即ち
「 水と、酸化アルミニウム、酸化セリウム等の研磨用剤及びポリ塩化アルミニウム、硝酸セリウム、硝酸アルミニウム、臭化アルミニウム等の酸性化合物からなる合成樹脂成形品の研磨用組成物。」である。
更に、本出願人は特公平2−23589号公報にて、メモリーハードディスク等の金属材料を研磨する際も硝酸アルミニウム等が研磨促進効果を奏することを開示した。
これらの研磨用組成物は合成樹脂成形品やメモリーハードディスクの研磨用として優れたものであるが、更にこれらの研磨用組成物より優れたものの開発が要望されていた。
【0004】
【発明が解決しようとする課題】
本発明は、プラスチック製品や金属材料の研磨用として優れた研磨用組成物を提供することを目的とする。
【0005】
【課題を解決するための手段】
本発明者らは、さらに前述の研磨用組成物を改良すべく鋭意研究した結果、開発されたものであり、本発明は、水と、酸化アルミニウムの研磨剤、及び研磨促進剤からなり、前記研磨促進剤が、硝酸アルミニウムとグリコール類及びアルミナゾルのうち、2種以上を混合して用いることを特徴とする研磨用組成物であり、前記研磨促進剤が硝酸アルミニウム5〜100g/l,グリコール類50〜400g/l及びアルミナゾルが5〜50g/lの割合で添加されているものであり、さらに上述の研磨用組成物に、シリコーン消泡剤1〜10g/lが添加されていることを特徴とする研磨用組成物である。
【0006】
【作用】
本発明は、前述の如く、水と、酸化アルミニウムの研磨剤、及び研磨促進剤からなるので、研磨速度は著しく増加し、さらに良好な研磨表面を生成し、スクラッチ及びオレンジピール等が生じない。
【0007】
本発明において、研磨用組成物の各構成要素を限定した理由について、次に述べる。
(1)酸化アルミニウムの研磨剤
研磨剤としての酸化アルミニウムは通常水性スラリーとして使用するので通常微粒子であることが好ましくその粒子の大きさは平均粒子径で0.1〜10μm,好ましくは0.1〜3μmである。
そのスラリー濃度は通常1〜50重量%好ましくは5〜30重量%の研磨剤を含有することが望ましい。
(2)研磨促進剤
a.硝酸アルミニウム:5〜100g/l
硝酸アルミニウムは上述の研磨剤の研磨速度を増進するのに効果があり、5g/l未満では多少効果はあるが実用的でなく、100g/lを越えて含有させてもその効果は横ばいであり、経済的でないからその量を5〜100g/lとした。
【0008】
b.グリコール類:50〜400g/l
グリコール類としては、プロピレングリコール重合物、エチレングリコール重合物が挙げられ、具体的には、プロピレングリコール、エチレングリコール、ジプロピレングリコール、ポリプロピレングリコール、ジエチレングリコール、ポリエチレングリコール等が挙げられ、特にプロピレングリコール、エチレングリコールが好ましい。
グリコール類は研磨能率の向上と研磨面の良質化のために有効な作用をなすものであり、50g/l未満ではその効果が少なく、400g/lを越えた場合、粘度が高すぎて、研磨中に被研磨物に滑りを生じ、効果が少なくなるのでその量を50〜400g/lとした。
c.アルミナゾル:5〜50g/l
アルミナゾルは化学式Al2 O3 ・nH2 O(n=1〜2)にて一般的に表されるが、これはスラリーの粘度をあげて、研磨剤を浮遊させる役目や研磨能率の向上を果たすものであり、そのための添加量は5〜50g/lが望ましい結果を得ている。
【0009】
(3)シリコーン消泡剤:1〜10g/l
また、本研磨用組成物においては、グリコール類やアルミナゾルを使用するために泡が生ずるのでシリコーン消泡剤を添加し消泡することが望ましく、その量は1〜10g/lが有効であることが判った。
本発明の研磨用組成物が適用できるプラスチック製品としてはプラスチックレンズ、プラスチック製ディスク基板、風防ガラス、医療用品、食器、ラジオ部品、機械部品(小型歯車、ベアリング)、ボタン、キャップ、キャビネット、化粧板、眼鏡枠、プラスチック製安全ガラスなどの各種がある。
また、金属材料として代表的なものとして、メモリーハードディスクに使用されるアルミニウム、ニッケル・リンメッキ基板、半導体部品、機械部品等の各種があり、これらの精密研磨加工に適用できる。
【0010】
【実施例】
次に本発明の一実施例について述べる。
平均粒子径1.3μmの酸化アルミニウムを190g/lの割合に水と配合し、硝酸アルミニウム,プロピレングリコール及びアルミナゾルを添加し表1に示すような組成の研磨用組成物,試料N0.1〜9を調製した。
なお、本発明である試料N0.5〜N0.9にはシリコーン消泡剤を夫々5g/lを添加した。
【0011】
次に、これらの研磨用組成物を用いて研磨有効度を次のような研磨テストにより評価した。
アリルジグリルコールカーボネート樹脂(CR−39)70mmφのレンズ試料をコバーン505型非球面レンズ研磨機を用いて、研磨パッドとして、プラスチックレンズ用植毛布にて、研磨圧力240g/cm2 ,研磨時間5分,研磨温度13±1℃,スラリー供給量2リットル/分の割合で循環する研磨条件にて研磨した。
その結果の研磨能率(g/5分)並びに表面粗度Ra(nm)を組成と共に表1に示す。
【0012】
【表1】

Figure 0003582017
【0013】
表1に示すように、試料N0.1の酸化アルミニウム単独の場合や試料N0.2〜4の硝酸アルミニウム、プロピレングリコール、アルミナゾルを夫々単独で添加した場合に比して、試料N0.5〜9の組合わせの研磨用組成物は研磨能率及び表面粗度共に良好である。
特に試料N0.8と試料N0.9は従来品と比して、研磨能率が非常に高く、なおかつ表面粗度等の研磨面品質に優れている。
本発明は、その要旨を超えない限り以上の実施例に限定されるものではない。
【0014】
【発明の効果】
この研磨用組成物によれば、優れた研磨成績を示し研磨加工面に表面欠陥を発生させることなく著しく研磨能率を向上せしめことができる。[0001]
[Industrial applications]
The present invention relates to an improved polishing composition for rapidly polishing plastic products, metal materials, and the like, compared to conventional products.
[0002]
[Prior art]
Polishing compositions for commonly used plastic products and metal materials are abrasives such as cerium oxide, aluminum oxide, zirconium oxide, tin oxide, silicon dioxide, titanium dioxide, chromium dioxide slurried with water. . This conventional polishing composition is applied to a plastic product or a metal material and polished with a polishing pad or the like.
However, these conventional polishing compositions require much time for polishing, and require a considerable polishing time in order to smooth the polished surface and improve the gloss. In addition, when the particle size of the abrasive is increased to improve the polishing efficiency, there is a tendency to generate surface defects such as deep scratches and orange peel, and it is more difficult to obtain a smooth, high-quality surface free of those defects. Met.
[0003]
In order to solve the above-mentioned drawbacks of the conventional polishing composition , the present applicant has disclosed the following polishing composition for a synthetic resin molded article in Japanese Patent Publication No. 53-3518. That is, it is "a polishing composition for a synthetic resin molded article comprising water, a polishing agent such as aluminum oxide and cerium oxide, and an acidic compound such as polyaluminum chloride, cerium nitrate, aluminum nitrate, and aluminum bromide."
Furthermore, the present applicant has disclosed in Japanese Patent Publication No. 23589/1990 that aluminum nitrate and the like also have a polishing promoting effect when polishing a metal material such as a memory hard disk.
These polishing compositions are excellent for polishing synthetic resin molded articles and memory hard disks, and there has been a demand for the development of a polishing composition superior to these polishing compositions.
[0004]
[Problems to be solved by the invention]
An object of the present invention is to provide an excellent polishing composition for polishing plastic products and metal materials.
[0005]
[Means for Solving the Problems]
The present inventors have further developed as a result of intensive studies to improve the above-mentioned polishing composition, and the present invention comprises water, an aluminum oxide abrasive, and a polishing accelerator, A polishing composition, wherein the polishing accelerator is a mixture of aluminum nitrate and two or more of glycols and alumina sol, wherein the polishing promoter is aluminum nitrate 5 to 100 g / l, glycols 50 to 400 g / l and alumina sol are added at a ratio of 5 to 50 g / l, and the above-mentioned polishing composition further contains 1 to 10 g / l of a silicone antifoaming agent. It is a polishing composition.
[0006]
[Action]
As described above, the present invention comprises water, an aluminum oxide abrasive, and a polishing accelerator, so that the polishing rate is significantly increased, a more excellent polished surface is formed, and scratches and orange peels do not occur.
[0007]
In the present invention, the reasons for limiting each component of the polishing composition will be described below.
(1) Abrasive of Aluminum Oxide Aluminum oxide as an abrasive is usually used as an aqueous slurry, so it is usually preferably fine particles, and the size of the particles is 0.1 to 10 μm in average particle diameter, preferably 0.1 to 0.1 μm. 33 μm.
It is desirable that the slurry concentration usually contains 1 to 50% by weight, preferably 5 to 30% by weight of an abrasive.
(2) Polishing accelerator a. Aluminum nitrate: 5 to 100 g / l
Aluminum nitrate is effective in increasing the polishing rate of the above-mentioned abrasive, and if it is less than 5 g / l, it has some effect but is not practical. Even if it contains more than 100 g / l, the effect is flat. The amount was 5 to 100 g / l because it was not economical.
[0008]
b. Glycols: 50 to 400 g / l
Examples of the glycols include propylene glycol polymers and ethylene glycol polymers, and specific examples include propylene glycol, ethylene glycol, dipropylene glycol, polypropylene glycol, diethylene glycol, and polyethylene glycol. Glycols are preferred.
Glycols are effective for improving the polishing efficiency and improving the quality of the polished surface. If the amount is less than 50 g / l, the effect is small. If the amount exceeds 400 g / l, the viscosity is too high. Since the object to be polished slips in the medium and the effect is reduced, the amount is set to 50 to 400 g / l.
c. Alumina sol: 5 to 50 g / l
Alumina sol is generally represented by the chemical formula Al2O3.nH2O (n = 1 to 2), which serves to increase the viscosity of the slurry, to suspend the abrasive, and to improve the polishing efficiency. A desirable result is obtained when the amount of addition is 5 to 50 g / l.
[0009]
(3) Silicone defoamer: 1 to 10 g / l
In addition, in the polishing composition, since foams are generated due to the use of glycols and alumina sol, it is desirable to add a silicone antifoaming agent to defoam, and the amount is preferably 1 to 10 g / l. I understood.
Plastic products to which the polishing composition of the present invention can be applied include plastic lenses, plastic disc substrates, windshields, medical supplies, tableware, radio parts, mechanical parts (small gears, bearings), buttons, caps, cabinets, decorative boards. , Eyeglass frames, plastic safety glass, etc.
Typical examples of metal materials include aluminum, nickel-phosphorus-plated substrates, semiconductor components, mechanical components, and the like used for memory hard disks, which can be applied to precision polishing.
[0010]
【Example】
Next, an embodiment of the present invention will be described.
Aluminum oxide having an average particle diameter of 1.3 μm is mixed with water at a rate of 190 g / l, aluminum nitrate, propylene glycol and alumina sol are added, and a polishing composition having a composition as shown in Table 1 is prepared. Was prepared.
In addition, each of the samples N0.5 to N0.9 of the present invention was added with 5 g / l of a silicone antifoaming agent.
[0011]
Next, the polishing effectiveness was evaluated by the following polishing test using these polishing compositions.
A lens sample of allyl digrill coal carbonate resin (CR-39) having a diameter of 70 mm was used as a polishing pad with a flocking cloth for a plastic lens as a polishing pad using a Coburn 505 type aspheric lens polishing machine at a polishing pressure of 240 g / cm 2 and a polishing time of 5 minutes. The polishing was performed under the polishing conditions of circulating at a polishing temperature of 13 ± 1 ° C. and a slurry supply rate of 2 L / min.
Table 1 shows the resulting polishing efficiency (g / 5 minutes) and the surface roughness Ra (nm) together with the composition.
[0012]
[Table 1]
Figure 0003582017
[0013]
As shown in Table 1, the samples N0.5 to N9 were compared with the samples of sample N0.1 using only aluminum oxide and the samples N0.2 to N4 in which aluminum nitrate, propylene glycol, and alumina sol were each added alone. The polishing composition of the combination is good in both polishing efficiency and surface roughness.
In particular, Sample N0.8 and Sample N0.9 have extremely high polishing efficiency and excellent polished surface quality such as surface roughness as compared with conventional products.
The present invention is not limited to the above embodiments unless it exceeds the gist.
[0014]
【The invention's effect】
According to this polishing composition, excellent polishing results are exhibited, and the polishing efficiency can be significantly improved without generating surface defects on the polished surface.

Claims (9)

水と、酸化アルミニウムの研磨剤、及び研磨促進剤からなり、前記研磨促進剤が、硝酸アルミニウムとグリコール類及びアルミナゾルからなることを特徴とする研磨用組成物。A polishing composition comprising water, an aluminum oxide abrasive, and a polishing accelerator, wherein the polishing accelerator comprises aluminum nitrate, glycols, and alumina sol. 前記研磨促進剤のうち、硝酸アルミニウムについては5〜100g/l、グリコール類については50〜400g/l及びアルミナゾルについては5〜50g/lの添加割合であることを特徴とする請求項1に記載の研磨用組成物。2. The polishing accelerator according to claim 1, wherein the polishing accelerator has an addition ratio of 5 to 100 g / l for aluminum nitrate, 50 to 400 g / l for glycols, and 5 to 50 g / l for alumina sol. Polishing composition. シリコーン消泡剤1〜10g/lが、さらに添加されていることを特徴とする請求項1または2に記載の研磨用組成物。3. The polishing composition according to claim 1, wherein 1 to 10 g / l of a silicone antifoaming agent is further added. 水と、酸化アルミニウムの研磨剤、及び研磨促進剤からなり、前記研磨促進剤が、硝酸アルミニウムとグリコール類及びアルミナゾルのうち、2種以上を混合して用いることを特徴とするプラスチック研磨用組成物。A plastic polishing composition comprising water, an aluminum oxide abrasive, and a polishing accelerator, wherein the polishing accelerator is a mixture of two or more of aluminum nitrate, glycols, and alumina sol. . 前記研磨促進剤のうち、硝酸アルミニウムについては5〜100g/l、グリコール類については50〜400g/l及びアルミナゾルについては5〜50g/lの添加割合であることを特徴とする請求項4に記載のプラスチック研磨用組成物。5. The polishing accelerator according to claim 4, wherein the addition ratio of aluminum nitrate is 5 to 100 g / l, that of glycols is 50 to 400 g / l, and that of alumina sol is 5 to 50 g / l. Polishing composition for plastics. シリコーン消泡剤1〜10g/lが、さらに添加されていることを特徴とする請求項4または5に記載のプラスチック研磨用組成物。The composition for polishing plastic according to claim 4 or 5, wherein 1 to 10 g / l of a silicone antifoaming agent is further added. 前記研磨促進剤が、硝酸アルミニウム及びグリコール類からなることを特徴とする請求項4に記載のプラスチック研磨用組成物。The plastic polishing composition according to claim 4, wherein the polishing accelerator comprises aluminum nitrate and glycols. 前記研磨促進剤が、硝酸アルミニウム及びアルミナゾルからなることを特徴とする請求項4に記載のプラスチック研磨用組成物。The plastic polishing composition according to claim 4, wherein the polishing accelerator comprises aluminum nitrate and alumina sol. 前記研磨促進剤が、グリコール類及びアルミナゾルからなることを特徴とする請求項4に記載のプラスチック研磨用組成物。The plastic polishing composition according to claim 4, wherein the polishing accelerator comprises a glycol and an alumina sol.
JP15489493A 1993-06-25 1993-06-25 Polishing composition and plastic polishing composition Expired - Lifetime JP3582017B2 (en)

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KR100761649B1 (en) * 1999-05-19 2007-09-27 제일모직주식회사 Composition for polishing
KR100466422B1 (en) * 2000-04-18 2005-01-13 제일모직주식회사 Composition for chemical mechanical polishing
AU2001269436A1 (en) * 2000-07-05 2002-01-14 Showa Denko K K Polishing composition and magnetic recording disk substrate polished with the polishing composition
JP4219722B2 (en) 2003-03-31 2009-02-04 株式会社フジミインコーポレーテッド Polishing composition
WO2004104122A2 (en) * 2003-05-26 2004-12-02 Showa Denko K.K. Polishing composition for magnetic disks comprising a surface cleaning agent and polishing method
JP2006036864A (en) * 2004-07-23 2006-02-09 Fujimi Inc Composition for polishing and polishing method by using the same
KR101267971B1 (en) 2005-08-31 2013-05-27 가부시키가이샤 후지미인코퍼레이티드 Polishing Composition and Polishing Method
KR20150007277A (en) * 2012-04-10 2015-01-20 아사히 가라스 가부시키가이샤 Method for polishing glass substrate
WO2020122191A1 (en) 2018-12-14 2020-06-18 株式会社フジミインコーポレーテッド Polishing composition and method for polishing synthetic resin

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