JP3559076B2 - Sulfuric acid distillation apparatus and sulfuric acid distillation method - Google Patents

Sulfuric acid distillation apparatus and sulfuric acid distillation method Download PDF

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JP3559076B2
JP3559076B2 JP25652794A JP25652794A JP3559076B2 JP 3559076 B2 JP3559076 B2 JP 3559076B2 JP 25652794 A JP25652794 A JP 25652794A JP 25652794 A JP25652794 A JP 25652794A JP 3559076 B2 JP3559076 B2 JP 3559076B2
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sulfuric acid
distillation
boiling
waste liquid
boiling point
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JPH08119608A (en
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大介 足立
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Fujitsu Ltd
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Fujitsu Ltd
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Description

【0001】
【産業上の利用分野】
本発明は洗浄処理の終わった硫酸を再生して使用する硫酸蒸留装置に関する。研磨などの表面処理の終わった各種の基板には脱脂や酸洗浄などの洗浄処理が施されているが、酸洗浄として硫酸(HSO)が一般に使用されている。
【0002】
例えば、半導体集積回路が形成されているシリコン(Si ) は引上げ法( チョクラルスキー法) などで形成した単結晶インゴットを約500 μm の厚さにスライスした後、研磨して平滑なウェーハを形成し、次に、濃硫酸に過酸化水素(H)を添加した酸化剤を用いて洗浄し、ウェーハ表面に付着している汚染物質や研磨剤などを溶解除去する処理が行われている。
【0003】
このようにして処理の終わった硫酸はそのまゝ捨てる場合もあるが、高濃度の硫酸が主成分であることから、公害防止と経済的な面から、蒸留して再生する処理が行われている。
【0004】
【従来の技術】
図2は従来の硫酸蒸留装置の構成を示す断面図であって、低沸点蒸留塔1と高沸点蒸留塔2の二つから形成されている。
【0005】
以下、Si ウェーハの洗浄に用いた硫酸廃液の場合について説明すると、硫酸廃液は低沸点蒸留塔1のフラスコ2に設けてある注入口3より第1のコック4を経てフラスコ2に注入し、第1のヒータ5により加熱するよう構成されており、また、第1のフラスコ2の上部にある第1の蒸留塔6には冷却用の第1のコンデンサ7と第1の受け皿8と第1の導出管9と第1の受け器10が設けられている。
【0006】
また、高沸点蒸留塔2は低沸点蒸留塔1と第2のコック12を介して連結管13により連結しており、第2の蒸留塔14には同様に冷却用の第2のコンデンサ15と第2の受け皿16と第2の導出管17と第2の受け器18が設けられている。
【0007】
また、第2のフラスコ19には第3のコック20を介して排出口21があり、また、第2のヒータ22により加熱できるよう構成されている。
そして、蒸留手順としては、まず、第一のコック4を開けて注入口3より硫酸廃液24を注入し、第1のコンデンサに冷却水25を供給して循環させてある状態で100 ℃以上にまで加熱し、硫酸廃液24に含まれている水(低沸点溶液)を蒸留して第1の受け器10に溜めて分離する。
【0008】
このようにして、硫酸廃液24に含まれている水分を除去した後は、第2のコック12を開け、連結管13により硫酸廃液24を第1のフラスコ2より第2のフラスコ19に移し、第2のコンデンサ15を冷却水27で冷却している状態で第2のヒータ22により硫酸廃液24を硫酸の沸点以上の温度(例えば360 ℃)に加熱することにより硫酸を蒸留して第2の受け器18に溜めて分離する。
【0009】
そして、第2のフラスコ19の底部には高沸点の硫酸塩が残留するが、これは第3のコック20を開けて排出口21より分離している。
このように従来は二段蒸留法により硫酸廃液の再生が行われていた。
【0010】
【発明が解決しようとする課題】
先に記したように従来の硫酸廃液の再生には二段蒸留法が使用されている。
然し、二個のヒータを使用するなど経済的に問題がある。そこで、単一蒸留により硫酸を再生させることが課題である。
【0011】
【課題を解決するための手段】
上記の課題は硫酸蒸留領域が、蒸留する硫酸原液を入れた容器を加熱して硫酸を含む原液成分を気化させる手段と、
原液の沸騰により蒸留領域への原液の混入を防ぐ手段と、
硫酸蒸気を液化して目標濃度の硫酸を得ると共に、目標濃度以下の硫酸を原液に還流させる手段とを備え、
また、低沸点成分の蒸留領域が水を主体とする源液中の低沸点成分を液化する手段とを少なくとも備え、
硫酸蒸留領域と硫酸よりも低沸点成分の蒸留領域とを単一蒸留塔で一体化して硫酸蒸留装置を形成することにより解決することができる。
【0012】
【作用】
本発明は単一蒸留法で硫酸廃液を再生する方法として硫酸廃液を入れたフラスコの近くに硫酸蒸留領域を設け、一方、低沸点成分(水分)の蒸留領域をこれと離して設けることにより単一蒸留を実現するものである。
【0013】
こゝで、硫酸は340 ℃で分解する強酸であるが、共沸混合物であるために一定の沸点を示さず、例えば、市販の濃硫酸の濃度は97%であり、加熱すると約290 ℃から三酸化硫黄(SO)を放出して分解を始め、沸点は315 ℃から338 ℃に上昇して濃度が98.3%に上昇すると云う性質がある。
【0014】
このように硫酸はSO−HO系から構成されており、この系の中にはHSO以外にHSO−HO(沸点290 ℃),HSO−2HO(沸点167 ℃)が存在し、それぞれその温度で蒸留される。そのため、濃HSOを得るためには少なくとも300 ℃以上に加熱する必要がある。
【0015】
然し、この加熱過程においてHSO−HOやHSO−2HOなどの水加物が蒸留してくるので、HSO組成のものを得ようとする場合は、他の水加物は蒸留液の受け器には行かないようにすると共に、この水加物の脱水を進行させ、最終的にはHSOにして蒸留させる必要がある。
【0016】
また、硫酸廃液を300 ℃以上にまで加熱する場合には沸騰により廃液が蒸留領域まで飛散して蒸留液に混入する恐れがあり、これらを考慮して単一蒸留塔を形成する必要がある。
【0017】
【実施例】
図1は本発明に係る単一蒸留方式をとる硫酸蒸留装置の断面図である。
すなわち、硫酸蒸留装置は総て石英からなり、蒸留を行うフラスコ30には蒸留塔31と硫酸廃液24を供給する注入口32があり、また、硫酸水加物を還流する還流管33を備えて構成されている。
【0018】
こゝで、蒸留塔31は硫酸蒸留領域34と低沸点成分蒸留領域35とからなり、硫酸蒸留領域には第1のコンデンサ36と第1の温度計37と第2の温度計38があり、硫酸蒸留時の蒸気温度を計測する。
【0019】
また、第1のコンデンサ36の下には第1の受け皿40があり、第1の導出管41を経て硫酸受け器42がある。また、第1の導出管41の途中には第1のコック43、また、還流管33には第2のコック44がある。
【0020】
次に、低沸点成分蒸留領域35には第2のコンデンサ45があり、この下には第2の受け器46がある。
また、フラスコ30の下には第3のコック48を経て廃液を取り出す排出口49があり、また、フラスコ30の下部を覆ってヒータ50が設けられている。
【0021】
なお、蒸留塔31の硫酸蒸留領域34の下には多孔質のフィルタ52があり、沸騰した硫酸廃液の飛沫が硫酸蒸留領域34に侵入して第1の受け皿40に溜まるのを防いでいる。
【0022】
こゝで、この蒸留装置の動作手順としては、注入口32に繋がる第4のコック51を開けて硫酸廃液24をフラスコ30に注入した後、第4のコック51を閉じ、ヒータ50に通電して廃液24を加熱する。
【0023】
なお、硫酸蒸留領域34の第1のコンデンサ36には水の沸点以上で硫酸2水加物の沸点(167 ℃)以下の温度の冷媒を循環しておく。また、低沸点成分蒸留領域35の第2のコンデンサ45には水を循環しておく。
【0024】
このような状態で、硫酸廃液24の温度が100 ℃に達すると、低沸点成分すなわち水は沸騰を始め、水蒸気はフイルタ52と第1のコンデンサ36を通り、低沸点成分蒸留領域35に達し、第2のコンデンサ45において冷却されて水となり、第2の受け器46に溜まる。
【0025】
次に、硫酸廃液24の内で遊離水が蒸発して無くなると、液温は167 ℃に上がって硫酸2水加物(HSO−2HO)の蒸発が始まるが、この際に第1のコンデンサ36に流れる冷媒として例えば沸点が215 ℃の弗素系不活性有機溶剤( 品名フロリナートFC−70,3M社製)を150 ℃に保持して循環させておくと、硫酸二水加物は蒸留されて第1の受け皿40に溜まるが、第1の導出管41にある第1のコック43を閉じ、還流管33にある第2のコック44を開けておくことによりフラスコ30に還流され、これが繰り返されるが、この際の硫酸二水加物の蒸気温度と蒸留後の蒸気温度は第1の温度計37と第2の温度計38で測定しておく。
【0026】
こゝで、還流が繰り返される過程で水は次第に除去されることから、硫酸二水加物の平衡はずれて硫酸一水加物(HSO−HO)に変わり、硫酸廃液24の温度は290 ℃に上がって硫酸一水加物の蒸発が始まり、第1のコンデンサ36で冷却されて第1の受け皿40に溜まるが、従来と同様に第1のコック43は閉じ、第2のコック44は開いておき、硫酸一水加物はフラスコ30に還流させておく。
【0027】
このようにして還流を続けると、硫酸一水加物の平衡は次第にずれて硫酸廃液24の温度が上昇して第1の温度計の測定温度が300 ℃を超えると、この蒸気は硫酸無水物の含有量が増していることを意味しているので、第1のコック43を開け、第2のコック44を閉じて硫酸を第1の導出管41を通して硫酸受け器42に溜めてゆく。
【0028】
なお、このようにして蒸留を続ける場合にフラスコ30の底部に残っているものは高沸点の硫酸塩であるから、定期的に第3のコック48を開けて排出口49から除去する。
【0029】
このような方法をとることにより、濃硫酸の再生が可能である。
【0030】
【発明の効果】
本発明の実施により従来よりも少ない電力で濃硫酸を再生させ繰り返し洗浄に使用することができる。
【図面の簡単な説明】
【図1】本発明に係る硫酸蒸留装置の構成を示す断面図である。
【図2】従来の硫酸蒸留装置の構成を示す断面図である。
【符号の説明】
24 硫酸廃液
30 フラスコ
31 蒸留塔
33 還流管
34 硫酸蒸留領域
35 低沸点成分蒸留領域
36 第1のコンデンサ
37 第1の温度計
38 第2の温度計
40 第1の受け皿
41 第1の導出管
42 硫酸受け器
43 第1のコック
44 第2のコック
[0001]
[Industrial applications]
The present invention relates to a sulfuric acid distillation apparatus that regenerates and uses sulfuric acid after washing treatment. Various substrates after surface treatment such as polishing are subjected to cleaning treatment such as degreasing and acid cleaning, and sulfuric acid (H 2 SO 4 ) is generally used for acid cleaning.
[0002]
For example, for silicon (Si) on which a semiconductor integrated circuit is formed, a single crystal ingot formed by a pulling method (Czochralski method) or the like is sliced to a thickness of about 500 μm, and then polished to form a smooth wafer. Then, cleaning is performed using an oxidizing agent obtained by adding hydrogen peroxide (H 2 O 2 ) to concentrated sulfuric acid, and a process of dissolving and removing contaminants and abrasives attached to the wafer surface is performed. I have.
[0003]
Sulfuric acid that has been treated in this way may be discarded as it is, but since it has a high concentration of sulfuric acid as the main component, it is subjected to distillation and regeneration to prevent pollution and economical aspects. I have.
[0004]
[Prior art]
FIG. 2 is a cross-sectional view showing the configuration of a conventional sulfuric acid distillation apparatus, which is composed of two parts, a low boiling point distillation column 1 and a high boiling point distillation column 2.
[0005]
Hereinafter, the case of the sulfuric acid waste liquid used for cleaning the Si wafer will be described. The sulfuric acid waste liquid is injected into the flask 2 through the inlet 3 provided in the flask 2 of the low boiling point distillation tower 1 through the first cock 4, The first distillation column 6 at the top of the first flask 2 is provided with a first condenser 7 for cooling, a first tray 8, and a first pan 5. An outlet tube 9 and a first receiver 10 are provided.
[0006]
Further, the high-boiling point distillation column 2 is connected to the low-boiling point distillation column 1 via a second cock 12 by a connecting pipe 13, and the second distillation column 14 is similarly connected to a second condenser 15 for cooling. A second tray 16, a second outlet pipe 17, and a second receiver 18 are provided.
[0007]
The second flask 19 has a discharge port 21 through a third cock 20, and is configured to be heated by a second heater 22.
Then, as a distillation procedure, first, the first cock 4 is opened, the sulfuric acid waste liquid 24 is injected from the injection port 3, and the cooling water 25 is supplied to the first condenser and circulated to 100 ° C. or higher. The water (low boiling point solution) contained in the sulfuric acid waste liquid 24 is distilled and collected in the first receiver 10 to be separated.
[0008]
After removing the water contained in the sulfuric acid waste liquid 24 in this way, the second cock 12 is opened, and the sulfuric acid waste liquid 24 is transferred from the first flask 2 to the second flask 19 by the connecting pipe 13. While the second condenser 15 is being cooled by the cooling water 27, the sulfuric acid waste liquid 24 is heated by the second heater 22 to a temperature (for example, 360 ° C.) higher than the boiling point of sulfuric acid, thereby distilling sulfuric acid. It is stored in the receiver 18 and separated.
[0009]
The high boiling point sulfate remains at the bottom of the second flask 19, which is separated from the outlet 21 by opening the third cock 20.
As described above, conventionally, the sulfuric acid waste liquid has been regenerated by the two-stage distillation method.
[0010]
[Problems to be solved by the invention]
As described above, a two-stage distillation method is used for the conventional regeneration of sulfuric acid waste liquid.
However, there is an economical problem such as using two heaters. Therefore, the problem is to regenerate sulfuric acid by single distillation.
[0011]
[Means for Solving the Problems]
The above-mentioned problem is that a sulfuric acid distillation region heats a container containing a sulfuric acid stock solution to be distilled to vaporize a stock solution component containing sulfuric acid,
Means for preventing the undiluted solution from being mixed into the distillation region by boiling the undiluted solution;
Means for liquefying the sulfuric acid vapor to obtain sulfuric acid of a target concentration, and means for refluxing sulfuric acid of a target concentration or less to a stock solution,
Further, at least a means for liquefying the low-boiling component in the source solution whose main component is water is a distillation region of the low-boiling component,
The problem can be solved by forming a sulfuric acid distillation apparatus by integrating a sulfuric acid distillation region and a distillation region with a component having a boiling point lower than that of sulfuric acid with a single distillation column.
[0012]
[Action]
The present invention provides a method of regenerating a sulfuric acid waste liquid by a simple distillation method by providing a sulfuric acid distillation area near a flask containing the sulfuric acid waste liquid, while providing a distillation area for low-boiling components (water) at a distance from the flask. It realizes one distillation.
[0013]
Here, sulfuric acid is a strong acid that decomposes at 340 ° C., but does not show a constant boiling point because it is an azeotrope. For example, the concentration of commercially available concentrated sulfuric acid is 97%, and when heated, it is reduced from about 290 ° C. It decomposes by releasing sulfur trioxide (SO 3 ), and has a property that the boiling point increases from 315 ° C. to 338 ° C. and the concentration increases to 98.3%.
[0014]
Thus sulfuric acid is composed of SO 3 -H 2 O system, H 2 SO 4 -H 2 O ( boiling point 290 ° C.) in addition to H 2 SO 4 is in this system, H 2 SO 4 -2H 2 O (boiling point 167 ° C.) is present and each is distilled at that temperature. Therefore, in order to obtain concentrated H 2 SO 4 , it is necessary to heat to at least 300 ° C. or higher.
[0015]
However, in this heating process, hydrates such as H 2 SO 4 —H 2 O and H 2 SO 4 -2H 2 O are distilled. Therefore, when trying to obtain a H 2 SO 4 composition, It is necessary to keep other hydrates from going to the distillate receiver and to proceed with the dehydration of this hydrate and eventually to H 2 SO 4 for distillation.
[0016]
When the sulfuric acid waste liquid is heated to 300 ° C. or higher, the waste liquid may be scattered to the distillation region due to boiling and mixed into the distillate, and it is necessary to form a single distillation column in consideration of these.
[0017]
【Example】
FIG. 1 is a sectional view of a single distillation type sulfuric acid distillation apparatus according to the present invention.
That is, the sulfuric acid distillation apparatus is made entirely of quartz, the distillation flask 30 has a distillation column 31, an inlet 32 for supplying the sulfuric acid waste liquid 24, and a reflux pipe 33 for refluxing the sulfuric acid hydrate. It is configured.
[0018]
Here, the distillation column 31 includes a sulfuric acid distillation region 34 and a low-boiling-point component distillation region 35, and the sulfuric acid distillation region includes a first condenser 36, a first thermometer 37, and a second thermometer 38, Measure the steam temperature during sulfuric acid distillation.
[0019]
A first tray 40 is provided below the first condenser 36, and a sulfuric acid receiver 42 is provided through a first outlet pipe 41. In addition, a first cock 43 is provided in the middle of the first outlet pipe 41, and a second cock 44 is provided in the return pipe 33.
[0020]
Next, there is a second condenser 45 in the low boiling point distillation region 35, and a second receiver 46 below the second condenser 45.
Further, a discharge port 49 for taking out a waste liquid through the third cock 48 is provided below the flask 30, and a heater 50 is provided so as to cover a lower portion of the flask 30.
[0021]
Note that a porous filter 52 is provided below the sulfuric acid distillation region 34 of the distillation tower 31 to prevent splashes of boiling sulfuric acid waste liquid from entering the sulfuric acid distillation region 34 and accumulating in the first tray 40.
[0022]
Here, the operation procedure of this distillation apparatus is as follows. After opening the fourth cock 51 connected to the inlet 32 and injecting the sulfuric acid waste liquid 24 into the flask 30, the fourth cock 51 is closed, and the heater 50 is energized. To heat the waste liquid 24.
[0023]
A refrigerant having a temperature equal to or higher than the boiling point of water and equal to or lower than the boiling point of sulfuric acid dihydrate (167 ° C.) is circulated through the first condenser 36 in the sulfuric acid distillation area 34. In addition, water is circulated through the second condenser 45 in the low-boiling-point distillation area 35.
[0024]
In such a state, when the temperature of the sulfuric acid waste liquid 24 reaches 100 ° C., the low-boiling component, that is, water starts to boil, and the steam passes through the filter 52 and the first condenser 36 and reaches the low-boiling component distillation region 35. The water is cooled in the second condenser 45 and becomes water and accumulates in the second receiver 46.
[0025]
Next, when free water evaporates and disappears in the sulfuric acid waste liquid 24, the liquid temperature rises to 167 ° C. and evaporation of sulfuric acid dihydrate (H 2 SO 4 -2H 2 O) starts. As a refrigerant flowing through the first condenser 36, for example, a fluorine-based inert organic solvent having a boiling point of 215 ° C. (product name: Fluorinert FC-70, manufactured by 3M Company) is kept at 150 ° C. and circulated. Is distilled and accumulates in the first tray 40, but is returned to the flask 30 by closing the first cock 43 in the first outlet pipe 41 and opening the second cock 44 in the reflux pipe 33. This is repeated, but the steam temperature of the dihydrated sulfuric acid and the steam temperature after the distillation are measured by the first thermometer 37 and the second thermometer 38 in advance.
[0026]
Here, since water is gradually removed in the process of repeating the reflux, the equilibrium of the sulfated dihydrate is displaced to change to the sulfated monohydrate (H 2 SO 4 —H 2 O). The temperature rises to 290 ° C., and evaporation of the sulfuric acid monohydrate starts, and is cooled by the first condenser 36 and accumulated in the first pan 40. However, the first cock 43 is closed and the second The cock 44 is opened, and the sulfuric acid monohydrate is refluxed to the flask 30.
[0027]
When the reflux is continued in this manner, the equilibrium of the sulfuric acid monohydrate gradually shifts, and the temperature of the sulfuric acid waste liquid 24 rises. When the temperature measured by the first thermometer exceeds 300 ° C., the steam is converted into sulfuric anhydride. Therefore, the first cock 43 is opened, the second cock 44 is closed, and the sulfuric acid is accumulated in the sulfuric acid receiver 42 through the first outlet pipe 41.
[0028]
When the distillation is continued in this way, since the sulfate remaining at the bottom of the flask 30 is a high-boiling sulfate, the third cock 48 is periodically opened and removed from the outlet 49.
[0029]
By taking such a method, regeneration of concentrated sulfuric acid is possible.
[0030]
【The invention's effect】
By implementing the present invention, concentrated sulfuric acid can be regenerated with less power than before and used repeatedly.
[Brief description of the drawings]
FIG. 1 is a sectional view showing a configuration of a sulfuric acid distillation apparatus according to the present invention.
FIG. 2 is a cross-sectional view showing a configuration of a conventional sulfuric acid distillation apparatus.
[Explanation of symbols]
24 Sulfuric acid waste liquid 30 Flask 31 Distillation tower 33 Reflux pipe 34 Sulfuric acid distillation area 35 Low boiling point component distillation area 36 First condenser 37 First thermometer 38 Second thermometer 40 First pan 41 First outlet pipe 42 Sulfuric acid receiver 43 First cock 44 Second cock

Claims (2)

硫酸廃液を蒸留して硫酸を得る装置が、
硫酸蒸留領域と該硫酸よりも低沸点成分の蒸留領域とが単一蒸留塔で一体化して形成されてなり、前記硫酸蒸留領域が、
原液を入れた容器を加熱して硫酸を含む原液成分を蒸発させる手段と、
原液の沸騰により蒸留領域への原液成分の混入を防ぐ手段と、
硫酸蒸気を液化して目標濃度の硫酸を得ると共に、目標濃度以下の硫酸を原液に還流させる手段と、
を備え、また、低沸点成分の蒸留領域が、
水を主体とする源液中の低沸点成分を蒸留する手段とを少なくとも備えてなることを特徴する硫酸蒸留装置。
A device that obtains sulfuric acid by distilling sulfuric acid waste liquid,
A sulfuric acid distillation region and a distillation region of a component having a lower boiling point than the sulfuric acid are formed integrally by a single distillation column, and the sulfuric acid distillation region is
Means for heating the container containing the undiluted solution to evaporate the undiluted component containing sulfuric acid;
Means for preventing undiluted components from being mixed into the distillation zone by boiling the undiluted solution;
Means for liquefying the sulfuric acid vapor to obtain sulfuric acid of a target concentration, and for refluxing sulfuric acid of a target concentration or less to a stock solution
And the distillation region of low-boiling components is
Means for distilling low-boiling components in a source liquid mainly composed of water.
原液を加熱して水を主成分とする低沸点成分を蒸留する工程と、
硫酸二水化物の沸点以下の温度に保持した冷媒により、原液より蒸発してくる硫酸水加物を蒸留して後に原液に還流して硫酸濃度を高めた後、該高濃度の硫酸を採取する工程と、
を含むことを特徴とする硫酸蒸留方法。
A step of heating the undiluted solution to distill a low-boiling component containing water as a main component,
After the sulfuric acid hydrate evaporating from the undiluted solution is distilled by a refrigerant maintained at a temperature equal to or lower than the boiling point of sulfuric acid dihydrate, the sulfuric acid hydrate is refluxed to the undiluted solution to increase the sulfuric acid concentration. Process and
A sulfuric acid distillation method comprising:
JP25652794A 1994-10-21 1994-10-21 Sulfuric acid distillation apparatus and sulfuric acid distillation method Expired - Lifetime JP3559076B2 (en)

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JP3507317B2 (en) 1996-12-20 2004-03-15 富士通株式会社 Distillation apparatus and distillation method
JP2003019401A (en) * 2001-07-09 2003-01-21 Airaa Chino:Kk Distillation apparatus
JP2009172468A (en) * 2008-01-22 2009-08-06 Tosei Electric Corp Regeneration apparatus of cleaning solvent, and distilling regeneration method of cleaning solvent
CN104085861B (en) * 2014-07-11 2016-04-13 昆山明宽环保节能科技有限公司 A kind of device of reclaim(ed) sulfuric acid from Graphene acid-bearing wastewater and corresponding technique thereof
US11400388B2 (en) 2017-04-03 2022-08-02 Ecodyst, Inc. Large scale standalone chillers, all-in-one rotary evaporators and related methods
USD903727S1 (en) 2018-02-19 2020-12-01 Ecodyst, Inc. Large scale chiller
CN114712878B (en) * 2022-04-14 2023-11-14 衡阳市建衡实业有限公司 Distillation method for preparing high-purity sulfuric acid

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