JP3530361B2 - Developing device - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing device for supplying a developing solution to a photosensitive film on a substrate to carry out a developing process.

[0002]

2. Description of the Related Art A developing device is used for developing a photosensitive film formed on a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, a substrate for an optical disk and the like.

For example, a rotary developing device is provided with a rotation holding portion for holding a substrate horizontally and rotating it about a vertical axis, and a developing solution discharge nozzle for supplying a developing solution to the surface of the substrate. The developer discharge nozzle is attached to the tip of a nozzle arm that is rotatably provided in a horizontal plane, and can move between a position above the substrate and a standby position.

During the developing process, the developing solution discharge nozzle moves from the standby position to above the substrate, and then the developing solution is supplied to the photosensitive film on the substrate. The supplied developing solution is spread on the entire surface of the substrate by the rotation of the substrate and comes into contact with the photosensitive film. The photosensitive film is developed by allowing the substrate to stand for a certain period of time while the developer is held on the substrate (liquid puddle) due to surface tension. When the supply of the developing solution is completed, the developing solution discharge nozzle is moved to the standby position retracted from above the substrate by the rotation of the nozzle arm.

[0005]

However, in the above-described conventional rotary developing device, the photosensitive film on the substrate is greatly impacted by the rotating substrate being hit by the developing solution at the start of discharge. Bubbles may be generated in the developer due to the impact, and minute bubbles remaining on the surface of the photosensitive film may cause development defects. Further, the photosensitive film may be damaged by the impact of the developing solution at the start of ejection.

Therefore, the developing solution is supplied onto the substrate by linearly moving the developing solution ejection nozzle from one end to the other end on the substrate while ejecting the developing solution from the developing solution ejection nozzle having the slit-shaped ejection port. A developing method is proposed. According to this developing method, the developing solution is uniformly supplied onto the substrate without impact on the photosensitive film on the substrate.

However, it is difficult for the developer discharge nozzle having the slit-shaped discharge port to secure uniform discharge over the entire area of the slit-shaped discharge port. If the developer is supplied onto the substrate in a state where the uniformity of discharge is not sufficient, there may occur a phenomenon where the developer does not get on the substrate (a liquid running-out phenomenon), or after the developer once gets on the substrate. The phenomenon that the developer repels temporarily (liquid repelling phenomenon) easily occurs.
As a result, the uniformity of development on the surface of the substrate may be deteriorated, the uniformity of the pattern line width after development may be reduced, and defective development may occur.

An object of the present invention is to provide a developing device capable of performing uniform developing processing.

[0009]

Means for Solving the Problems and Effects of the Invention A developing device according to the first invention is a substrate holding means for holding a substrate in a horizontal posture, a developing solution discharge nozzle having a discharge port for discharging a developing solution, A moving means for moving the developing solution discharge nozzle relative to the substrate held in a stationary state by the substrate holding means, and a part forward of the discharging port of the developing solution discharge nozzle in the moving direction of the developing solution discharge nozzle. The surface has water repellency, and the surface on the rear side of the ejection port has hydrophilicity.

In the developing device according to the first aspect of the invention, the developing solution discharge nozzle moves relative to the substrate held by the substrate holding means in a stationary state. In this case, since the surface in front of the ejection opening of the developing solution ejection nozzle has water repellency in the moving direction of the developing solution ejection nozzle, the developing solution crawls to the surface in front of the ejection opening of the developing solution ejection nozzle. The phenomenon is suppressed. As a result, the entrapment of minute bubbles due to the vibration of the liquid surface of the developing solution on the front surface of the developing solution discharge nozzle is prevented, and the development defect due to the entrainment of minute bubbles is prevented.

Further, since the surface of the developing solution discharge nozzle on the rear side of the discharge port is hydrophilic, a sufficient liquid pool is formed on the rear side of the developing solution discharge nozzle. Thereby, even if there is some variation in the ejection of the developing solution from the ejection port of the developing solution ejecting nozzle, the supply of the developing solution onto the substrate is made uniform, and the phenomenon of liquid shortage and liquid repelling phenomenon is suppressed.

As a result, the line width uniformity of the development pattern is improved, development defects are prevented from occurring, and uniform development processing is performed.

A developing device according to a second aspect of the invention is the developing device according to the first aspect of the invention, in which the ejection port is a slit-shaped ejection port. In this case, the developing solution is simultaneously supplied to the area of constant width.

In the developing device according to the third invention, in the structure of the developing device according to the second invention, the moving means linearly moves the developing solution discharge nozzle in a direction substantially perpendicular to the slit discharge port. Is.

In this case, since the slit-shaped discharge port of the developer discharge nozzle scans the substrate linearly, the developer can be uniformly supplied to a large area on the substrate.

The developing device according to a fourth aspect of the invention is the first and second developing devices.
Alternatively, in the configuration of the developing device according to the third aspect, the developing solution discharge nozzle has a flat bottom surface provided with a discharge port, and the moving means is the surface of the substrate held stationary by the substrate holding means. On the other hand, the developing solution discharge nozzle is moved relative to the substrate so that the bottom surface of the developing solution discharge nozzle is kept parallel.

In this case, a minute space sandwiched by planes parallel to each other is formed between the surface of the substrate and the bottom surface of the developer discharge nozzle, and the developer is supplied to the minute space from the discharge port of the developer discharge nozzle. To be done. As a result, the developer quickly fills this minute space by the capillary phenomenon.

Therefore, even if the discharge of the developer from the discharge port of the developer discharge nozzle varies, the developer filled in the minute space uniformizes the supply of the developer onto the substrate and the liquid runs out. Phenomenon and liquid repelling phenomenon are sufficiently suppressed.

As a result, the line width uniformity of the development pattern is further improved, development defects are sufficiently prevented, and a more uniform development process is performed.

A developing device according to a fifth aspect of the invention is the developing device according to the fourth aspect of the invention, in which the discharge port is provided in front of the center of the bottom surface in the moving direction of the developer discharge nozzle. is there.

In this case, since the length of the bottom surface on the rear side of the discharge port in the moving direction of the developer discharge nozzle is longer than the length of the bottom surface on the front side, the development discharged from the discharge port of the developer discharge nozzle. When the liquid is filled in the minute space formed by the bottom surface of the developing solution discharge nozzle and the surface of the substrate, the developing solution is strongly attracted to the rear side of the discharge port due to the surface tension.

As a result, more developer is supplied to the rear side than the front side of the discharge port, and the flow of the developer toward the rear side of the discharge port becomes stronger. As a result, the leading of the developing solution is prevented, the turbulence of the developing solution near the outlet of the discharge port is reduced, and it is possible to uniformly supply the developing solution onto the substrate.

[0023]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a plan view of a developing device according to an embodiment of the present invention, and FIG. 2 is a main part X of the developing device of FIG.
-X-ray sectional view, FIG. 3 shows YY of the main part of the developing device of FIG.
It is a line sectional view.

As shown in FIGS. 2 and 3, the developing device includes a substrate holder 1 for holding the substrate 100 in a horizontal posture by suction.
Equipped with. The substrate holding unit 1 is fixed to the tip of the rotary shaft 3 of the motor 2 and is configured to be rotatable around a vertical axis. A circular inner cup 4 is provided around the substrate holder 1 so as to surround the substrate 100 so as to be vertically movable. A square outer cup 5 is provided around the inner cup 4.

As shown in FIG. 1, standby pots 6 and 7 are arranged on both sides of the outer cup 5, respectively.
A guide rail 8 is provided on one side of the one side.
Further, the nozzle arm 9 is provided so as to be movable in the scanning direction A and the opposite direction along the guide rail 8 by the arm driving unit 10. A pure water discharge nozzle 12 for discharging pure water is provided on the other side of the outer cup 5 so as to be rotatable in the direction of arrow R.

On the nozzle arm 9, a developing solution discharge nozzle 11 having a slit-shaped discharge port 15 at its lower end is attached vertically to the guide rail 8. As a result, the developer discharge nozzle 11 moves from the position of the standby pot 6 to the substrate 100.
It can be moved linearly in parallel along the scanning direction A to the position of the standby pot 7 passing above.

As shown in FIG. 2, the developing solution discharge nozzle 11
A developing solution is supplied to the developing solution by the developing solution supply system 12. The control unit 13 controls the rotation operation of the motor 2, the scanning of the developing solution discharge nozzle 11 by the arm driving unit 10, and the discharge of the developing solution from the developing solution discharge nozzle 11.

In this embodiment, the substrate holding unit 1 corresponds to the substrate holding means, and the arm driving unit 10 corresponds to the moving means.

FIG. 4 is a sectional view of the developing solution discharge nozzle 11. FIG. 5 is a bottom view of the developer discharge nozzle 11.

Nozzle body 16 of developer discharge nozzle 11
Has a planar bottom surface 17. The nozzle body 16 is made of a relatively hard hydrophilic material such as stainless steel, quartz glass, Pyrex glass, and ceramics (for example, alumina, SiC, αC). The nozzle body 16 is provided with a slit-shaped discharge port 15 extending vertically downward and opening at a bottom surface 17.

In the scanning direction A, a region of the bottom surface 17 of the nozzle body 16 on the front side of the slit-shaped discharge port 15 and the outer wall surface 18 on the front side are made of PVC (polyvinyl chloride),
It is coated with a resin-based water repellent material layer 20 such as PPS (polyphenylene sulfide) or PTFE (polytetrafluoroethylene). In this embodiment, PVC
A water repellent material layer 20 made of is used. In the scanning direction A, the hydrophilic material is exposed in the region on the bottom surface 17 of the nozzle body 16 behind the slit-shaped ejection port 15 and on the outer wall surface 19 on the rear side.

As shown in FIG. 5, the slit-shaped discharge port 15
Are arranged perpendicular to the scanning direction A of the developing solution discharge nozzle 11. The slit width t of the slit-shaped discharge port 15 is 0.05 to
It is 1.0 mm, and in this embodiment is 0.1 mm. Further, the discharge width L of the slit-shaped discharge port 15 is set to be equal to or larger than the diameter of the substrate 100 to be processed, and when processing the substrate 100 having a diameter of 8 inches, it is 210 mm in this embodiment. Is set to.

The slit-shaped discharge port 15 is provided in front of the center of the bottom surface 17 in the scanning direction A of the developing solution discharge nozzle 11. The length a of the bottom surface 17 on the front side of the slit-shaped ejection port 15 (hereinafter referred to as the front bottom surface 17a) is set to 0.5 to 2 mm, and in this embodiment, 1 mm.
Is set to. Further, the length b of the bottom surface 17 on the rear side of the slit-shaped ejection port 15 (hereinafter referred to as the rear side bottom surface 17b) is set to 1 to 5 mm, and is set to 3 mm in this embodiment.

The developing solution discharge nozzle 11 is scanned in the scanning direction A so that the bottom surface 17 is kept parallel to the surface of the substrate 100. The distance between the slit-shaped ejection port 15 and the surface of the substrate 100 is 0.2 to 5 mm, more preferably 0.
It is 5 to 2 mm, and is 1 mm in this embodiment.

Next, referring to FIGS. 6 and 7, FIG.
The operation of the developing device will be described. Substrate 1 during development processing
00 is held stationary by the substrate holding unit 1.

During standby, the developing solution discharge nozzle 11 stands by at the position P0 in the standby pot 6. During the developing process, the developing solution discharge nozzle 11 moves up, then moves in the scanning direction A, and moves down at the scanning start position P1 in the outer cup 5.

After that, the developing solution discharge nozzle 11 starts scanning from the scanning start position P1 at a predetermined scanning speed. At this point, the developer is not yet discharged from the developer discharge nozzle 11. In this embodiment, the scanning speed is 10 to 500 m.
m / sec.

After the scanning of the developing solution discharge nozzle 11 is started, the slit-shaped discharging port 15 of the developing solution discharge nozzle 11 is placed on the substrate 100.
Before reaching the top, the developing solution discharge nozzle 11 starts discharging the developing solution at a predetermined flow rate at the discharging start position P2.
In this embodiment, the flow rate of the developing solution is 1.5 L / min.

The developing solution discharge nozzle 11 discharges the developing solution from the discharge start position P2 on the substrate 100 in the scanning direction A.
To a straight line (see FIG. 7). As a result, the substrate 1
The developing solution is continuously supplied to the entire surface of No. 00. The supplied developing solution is held on the substrate 100 by the surface tension.

After the developing solution discharge nozzle 11 has passed over the substrate 100, the discharging of the developing solution by the developing solution discharge nozzle 11 is stopped at the discharging stop position P3 deviated from the substrate 100. Then, when the developing solution discharge nozzle 11 reaches the scanning stop position P4 in the outer cup 5, the developing solution discharge nozzle 1
Stop the scan of 1.

After that, the developing solution discharge nozzle 11 ascends at the scanning stop position P4 and then moves to the position P of the other standby pot 7.
It moves to 5 and descends into the standby pot 7.

The state in which the developing solution is supplied onto the substrate 100 is maintained for a certain period of time to proceed with the development. At this time, the substrate holding unit 1 may be rotationally driven by the motor 2 to rotate the substrate 100. After that, while supplying pure water onto the substrate 100 by the pure water discharge nozzle 12, the developing solution on the substrate 100 is shaken off by rotating the substrate 100 at high speed, and the substrate 100 is dried to complete the developing process.

FIG. 8 is a front view showing the discharge state of the developing solution from the developing solution discharge nozzle 11. Immediately after the developing solution is ejected, the developing solution oozes out in a droplet form from the slit-shaped ejection port 15 as shown in FIG. When a certain period of time has passed from the discharge of the developing solution, as shown in FIG. 8B, the droplet-shaped developing solution is connected and the developing solution is formed in a strip shape along the slit-shaped discharge port 15.

At the above-mentioned scanning start position P1, the scanning speed reaches a predetermined speed from the start of the scanning of the developing solution discharge nozzle 11 to the end edge of the substrate 100, and as shown in FIG. It is set so that the time required for the developer in the liquid discharge port 15 to become a band shape is secured. For example, the scanning start position P1 is set to a position separated from the edge of the substrate 100 by about 10 to 100 mm in the direction opposite to the scanning direction A. In this embodiment, the scanning start position P1 is set at a position 50 mm away from the edge of the substrate 100.

Further, the discharge start position P2 depends on the scanning speed of the developer discharge nozzle 11 and the discharge flow rate of the developer.
It is set so as to secure a time for the developing solution discharge state to become a belt-like shape before the developing solution discharge nozzle 11 reaches the edge of the substrate 100.

As the scanning speed becomes faster, the time required for the developing solution discharge nozzle 11 to reach the edge of the substrate 100 from the scanning start position P1 becomes shorter, so that the discharging start position P2 approaches the scanning start position P1. For example, the scanning speed is 100m
In the case of m / sec, the discharge of the developing solution is started 0.3 seconds after the scanning start time, and in the case of the scanning speed of 30 mm / sec, the developing solution discharge is started 1.3 seconds after the scanning start time. .

When the discharge flow rate of the developing solution is high,
Since the discharge state of the developing solution becomes a band shape in a short time, the discharge start position P2 is brought close to the edge of the substrate 100. For example, the discharge flow rate of the developing solution is 1.5 L / min, and the scanning speed is 70 m.
When m / sec, the developing solution discharge nozzle 11 is set to the substrate 100.
0.1 to 1.0 seconds (eg 0.2 seconds) to reach the edge of
Before, the discharge of the developing solution is started.

In order to reduce the wasteful consumption of the developing solution, the discharging start position P2 is within a range in which the developing solution discharging state becomes a band until the developing solution discharging nozzle 11 reaches the edge of the substrate 100. Is preferably close to the edge of the substrate 100.

FIG. 9 is a sectional view showing the scanning of the developing solution discharge nozzle 11 on the substrate 100. As described above, since the region on the bottom surface 17 of the nozzle body 16 on the front side of the slit-shaped discharge port 15 and the outer wall surface 18 are coated with the water-repellent material layer 20, the slit-shaped discharge of the developer discharge nozzle 11 is performed. The phenomenon that the developing solution precedes the front side of the outlet 15 and the phenomenon that the developing solution crawls to the outer wall surface 18 on the front side of the developing solution discharge nozzle 11 is suppressed. As a result, the entrapment of minute bubbles due to the vibration of the liquid surface of the developer on the outer wall surface 18 of the developer discharge nozzle 11 is prevented. Therefore,
It is possible to prevent development defects from being caused by the trapping of minute bubbles.

Further, since the area of the bottom surface 17 of the developer discharge nozzle 11 on the rear side of the slit-shaped discharge port 15 and the outer wall surface 19 are made of a hydrophilic material, the protection on the rear side of the slit-shaped discharge port 15 is performed. The liquid property becomes good, and a sufficient liquid pool is formed between the rear bottom surface 17b of the developer discharge nozzle 11 and the surface of the substrate 100. As a result, even if the uniformity of the discharge of the developing solution from the slit-shaped discharge port 15 is not good, the liquid-runout phenomenon or the liquid-repelling phenomenon may occur on the rear side of the slit-shaped discharge port 15 of the developer solution discharge nozzle 11. Absent.

As a result, the line width uniformity of the development pattern is improved and the development failure is prevented.

Further, as described above, the developing solution discharge nozzle 1
1 moves in the scanning direction A so that the bottom surface 17 is kept parallel to the surface of the substrate 100. In this case, the substrate 1
00 and the bottom surface 17 of the developer discharge nozzle 11 form a minute space sandwiched by mutually parallel planes, and the developer is supplied from the slit-shaped discharge port 15 to this minute space. The developing solution quickly fills this minute space due to the capillary phenomenon.

Therefore, even if there is some variation in the discharge of the developing solution from the slit-shaped discharge port 15, the developing solution filled in the minute space makes the supply of the developing solution on the substrate 100 more uniform, Sufficient liquid drainage and liquid splashing can be suppressed. As a result, the line width uniformity of the development pattern is further improved, and the development failure is sufficiently prevented.

In addition, since the nozzle body 16 is made of a relatively hard hydrophilic material, high processing accuracy can be obtained and it is resistant to changes over time. Therefore, good ejection uniformity can be stably obtained.

FIGS. 10A to 10F are views showing the temporal change of the state of the developing solution when the developing solution discharge nozzle 11 of this embodiment is moved in the scanning direction A, and FIGS.
(F) shows the developing solution discharge nozzle 11a of the comparative example in the scanning direction A.
It is a figure which shows the time change of the state of the developing solution when it is made to move to FIG. 10 and 11 are obtained by simulation by numerical calculation. In the developing solution discharge nozzle 11a of the comparative example, the slit-shaped discharge port 15 is provided on the rear side of the center of the bottom surface of the developing solution discharge nozzle 11a in the scanning direction A.

As shown in FIGS. 10 (a) to 10 (f), in the developing solution discharge nozzle 11 of the present embodiment, a large amount of the developing solution is located on the rear side of the slit-shaped discharge port 15 in the scanning direction A. The liquid is supplied, and good liquid filling is performed on the rear side of the slit-shaped discharge port 15.

As shown in FIGS. 11A to 11F, in the developing solution discharge nozzle 11a of the comparative example, a large amount of the developing solution is supplied to the front side of the slit-shaped discharge port 15 in the scanning direction A. As a result, the amount of the developer on the rear side of the slit-shaped ejection port 15 becomes insufficient. As a result, the phenomenon of liquid shortage is likely to occur.

FIG. 12 shows the developing solution discharge nozzle 11 of this embodiment.
Showing a fluid velocity vector in the case where is moved in the scanning direction A, and FIG. 13 is a developing solution discharge nozzle 11a of a comparative example.
FIG. 6 is a diagram showing a fluid velocity vector in the case where is moved in scanning direction A. 12 and 13 are obtained by simulation by numerical calculation.

As shown in FIG. 12, in the developing solution discharge nozzle 11 of this embodiment, the backward flow of the slit-shaped discharge port 15 is strong as a whole. On the other hand, as shown in FIG. 13, in the developer discharge nozzle 11a of the comparative example, the front flow becomes strong and the rear flow becomes weak due to the surface tension of the bottom surface 17 on the front side of the slit-shaped discharge port 15. There is. As a result, the turbulence of the flow is increased near the outlet of the slit-shaped discharge port 15.

As described above, in the developer discharge nozzle 11 of this embodiment, the length of the rear side bottom surface 17b is the front side bottom surface 17.
Since it is longer than the length of a, the developer is more strongly attracted to the space between the rear bottom surface 17b and the surface of the substrate 100 by surface tension. Thereby, the slit-shaped discharge port 15
A large amount of the developing solution is supplied to the rear side of the front side of, and the flow of the developing solution to the rear side of the slit-shaped ejection port 15 becomes strong. As a result, the generation of minute bubbles due to the advance of the developing solution is prevented, the turbulence of the flow of the developing solution near the outlet of the slit-shaped ejection port 15 is reduced, and the uniform developing solution is supplied onto the substrate 100. It will be possible.

Further, in the developing device of this embodiment, the discharge of the developing solution is started before the developing solution discharge nozzle 11 reaches the stationary substrate 100, so that the developing solution at the start of the discharge impacts the substrate 100. Is avoided. Thereby, generation of bubbles in the developing solution is suppressed and development defects are prevented.

Further, the developing solution in the vicinity of the slit-shaped ejection port 15 which comes into contact with air during the movement of the developing solution ejection nozzle 11 is discarded to the outside of the substrate 100, and the developing solution ejection nozzle 11 is replaced by the substrate 10.
When the temperature reaches 0, a new developing solution is supplied from the developing solution discharge nozzle 11 onto the stationary substrate 100. As a result, it is possible to prevent development defects from being generated by the deteriorated developer, and to prevent particles of the dried developer from adhering to the surface of the photosensitive film on the substrate 100.

Further, on the substrate 100 on which the developing solution discharge nozzle 11 is stationary, the slit-shaped discharge port 15 and the upper surface of the substrate 100 are moved in parallel linearly in the horizontal direction,
Since the strip-shaped developer formed in the slit-shaped ejection port 15 continuously contacts the surface of the substrate 100, the developer is uniformly supplied to the entire surface of the substrate 100 without being impacted on the surface of the substrate 100.

Further, the developing solution discharge nozzle 11 is provided on the substrate 100.
Since the supply of the developing solution is continued until the developer passes above, the adverse effect on the developing solution in the puddle due to the impact when the discharge is stopped is prevented. As a result, the occurrence of development defects is suppressed, and the line width uniformity of the photosensitive film pattern after development is improved.

Further, the developing solution discharge nozzle 11 is provided on the substrate 100.
Since the discharge of the developing solution is stopped after passing over, it is possible to prevent the photosensitive film on the substrate 100 from being impacted by the dripping of the developing solution when the discharging is stopped. Therefore, the occurrence of development defects and the deterioration of the line width uniformity of the photosensitive film pattern are prevented.

In this embodiment, the developing solution discharge nozzle 1
The nozzle body 16 of No. 1 is formed of a hydrophilic material, and the water repellent material layer 20 is coated on the area of the bottom surface 17 of the nozzle body 16 on the front side of the slit-shaped ejection port 15 and the outer wall surface 18. The water repellency treatment may be performed on the region of the bottom surface 17 of the nozzle body portion 16 on the front side of the slit-shaped ejection port 15 and the outer wall surface 18 by another method. Also,
The nozzle main body 16 is formed of another material, and a region on the front side of the bottom surface 17 of the nozzle main body 16 on the front side of the slit-shaped ejection port 15 and the outer wall surface 18 are subjected to a water-repellent treatment so that the bottom surface 17
The area on the rear side of the slit-shaped ejection port 15 and the outer wall surface 19 may be subjected to hydrophilic treatment.

FIG. 14 is a sectional view of a developing solution discharge nozzle according to another embodiment of the present invention. The nozzle body 26 of the developer discharge nozzle 21 of FIG. 14 includes an outer wall surface 28 on the front side, an inclined surface 29 on the front side, an outer wall surface 30 on the rear side, and an inclined surface 31 on the rear side in the scanning direction A. The nozzle body 26 is made of stainless steel, quartz glass, Pyrex glass, ceramics (eg, alumina, SiC, αC).
Is formed of a relatively hard hydrophilic material such as. The nozzle body portion 26 is provided with a slit-shaped discharge port 25 extending vertically downward and opening at a boundary portion between the front side inclined surface 29 and the rear side inclined surface 31.

The outer wall surface 28 on the front side and the inclined surface 29 on the front side of the nozzle body 26 are made of PVC, PPS, PTFE.
And a resin-based water-repellent material layer 32. In this embodiment, the water repellent material layer 32 made of PVC is used.

The slit-shaped discharge port 25 is arranged perpendicular to the scanning direction A of the developing solution discharge nozzle 21. The slit width and the discharge width of the slit-shaped discharge port 25 are similar to those of the slit-shaped discharge port 15 shown in FIG.

Also in the developing solution discharge nozzle 21 of the present embodiment, the inclined surface 29 and the outer wall surface 28 of the nozzle body 26 on the front side of the slit-shaped discharge port 25 have the water repellent material layer 32.
Since it is coated with, the developer discharge nozzle 21
Of the developing solution to the front side of the slit-shaped discharge port 25, and the inclined surface 29 on the front side of the developing solution discharge nozzle 21.
The phenomenon in which the developing solution crawls up is suppressed. Thereby,
It is possible to prevent fine air bubbles from being caught by the vibration of the liquid surface of the developer on the inclined surface 29 and the outer wall surface 28 of the developer discharge nozzle 21. Therefore, it is possible to prevent the occurrence of development defects due to the trapping of minute bubbles.

Further, the inclined surface 31 and the outer wall surface 30 on the rear side of the slit-shaped discharge port 25 of the developer discharge nozzle 21.
Is formed of a hydrophilic material, the liquid retaining property on the rear side of the slit-shaped ejection port 25 is good, and the space between the inclined surface 31 on the rear side of the developing solution ejection nozzle 21 and the surface of the substrate 100 is sufficient. A puddle is formed. Thereby,
Even when the uniformity of the discharge of the developing solution from the slit-shaped discharge port 25 is not good, the liquid run-out phenomenon or the liquid repelling phenomenon does not occur on the rear side of the slit-shaped discharge port 25 of the developer solution discharge nozzle 21.

As a result, the line width uniformity of the development pattern is improved and the development failure is prevented.

In addition, since the nozzle body 26 is made of a relatively hard hydrophilic material, high processing accuracy can be obtained and it is resistant to changes with time. Therefore, good ejection uniformity can be stably obtained.

In this embodiment, the developing solution discharge nozzle 2
The nozzle body 26 of No. 1 is formed of a hydrophilic material, and the outer wall surface 28 and the inclined surface 29 on the front side of the nozzle body 26 are coated with the water-repellent material layer 32. The outer wall surface 28 and the inclined surface 29 may be subjected to water repellency treatment by another method. In addition, the nozzle body 26 is formed of another material, the front outer wall surface 28 and the inclined surface 29 of the nozzle body 26 are subjected to water repellent treatment, and the rear outer wall surface 30 and the inclined surface 31 are subjected to hydrophilic treatment. May be performed.

[Brief description of drawings]

FIG. 1 is a plan view of a developing device according to an embodiment of the present invention.

FIG. 2 is a sectional view taken along line XX of the main part of the developing device in FIG.

FIG. 3 is a sectional view taken along line YY of the main part of the developing device in FIG.

FIG. 4 is a sectional view of a developer discharge nozzle.

FIG. 5 is a bottom view of a developer discharge nozzle.

FIG. 6 is a diagram for explaining the operation of the developing device in FIG.

FIG. 7 is a plan view showing scanning of a developing solution discharge nozzle on a substrate.

FIG. 8 is a front view showing a discharge state of a developing solution from a developing solution discharge nozzle.

FIG. 9 is a cross-sectional view showing scanning of a developing solution discharge nozzle on a substrate.

FIG. 10 is a diagram showing simulation results of temporal changes in the state of the developing solution when the developing solution discharge nozzle of the example is moved in the scanning direction.

FIG. 11 is a diagram showing a simulation result of a temporal change in the state of the developer when the developer discharge nozzle of the comparative example is moved in the scanning direction.

FIG. 12 is a diagram showing a simulation result of a fluid velocity vector when the developing solution discharge nozzle of the embodiment is moved in the scanning direction.

FIG. 13 is a diagram showing a simulation result of a fluid velocity vector when a developing solution discharge nozzle of a comparative example is moved in the scanning direction.

FIG. 14 is a sectional view of a developing solution discharge nozzle according to another embodiment of the present invention.

[Explanation of symbols]

1 Substrate holder 4 inner cup 5 outer cup 8 guide rails 9 nozzle arm 10 Nozzle drive 11,21 Developer nozzle 12 Developer supply system 13 Control unit 15,25 slit-shaped outlet 16,26 Nozzle body 17 Bottom 17a Front bottom surface 17b Rear bottom 18, 19, 28, 30 Outer wall surface 20, 32 Water repellent material layer 29,31 inclined surface

─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Seiichiro Okuda, 322 Hazushi, Furukawa-cho, Fushimi-ku, Kyoto Dai Nippon Screen Mfg. Co., Ltd., Rakusai Plant (72) Katsuji Yoshioka, 322, Fukumi-ku, Fushimi-ku, Kyoto Nippon Screen Mfg. Co., Ltd. Rakusai Plant (56) References JP-A-7-326554 (JP, A) JP-A-5-261330 (JP, A) JP-A-7-37788 (JP, A) (58) Fields investigated (Int.Cl. ⁷ , DB name) H01L 21/027 B05C 5/02 G03F 7/30 502

Claims (5)

(57) [Claims] 1. A substrate holding means for holding a substrate in a horizontal position, a developing solution discharge nozzle having a discharge port for discharging a developing solution, and the developing solution for a substrate held stationary by the substrate holding means. A moving means for relatively moving the discharge nozzle, wherein a surface of the developer discharge nozzle in front of the discharge port in the moving direction of the developer discharge nozzle has water repellency, A developing device having a rear surface having hydrophilicity. 2. The developing device according to claim 1, wherein the discharge port is a slit-shaped discharge port. 3. The developing device according to claim 2, wherein the moving unit linearly moves the developing solution discharge nozzle in a direction substantially perpendicular to the slit discharge port. 4. The developing solution discharge nozzle has a planar bottom surface provided with the discharge port, and the moving means is configured to move the substrate with respect to a surface of a substrate held stationary by the substrate holding means. 4. The developing device according to claim 1, wherein the developing solution discharge nozzle is moved relative to the substrate so that the bottom surface of the developing solution discharge nozzle is kept in parallel. 5. The developing device according to claim 4, wherein the discharge port is provided in front of the center of the bottom surface in the moving direction of the developing solution discharge nozzle.