JP3523787B2 - Outdoor building materials with photocatalytic layers - Google Patents

Outdoor building materials with photocatalytic layers

Info

Publication number
JP3523787B2
JP3523787B2 JP19364598A JP19364598A JP3523787B2 JP 3523787 B2 JP3523787 B2 JP 3523787B2 JP 19364598 A JP19364598 A JP 19364598A JP 19364598 A JP19364598 A JP 19364598A JP 3523787 B2 JP3523787 B2 JP 3523787B2
Authority
JP
Japan
Prior art keywords
photocatalyst
layer
organic
base material
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP19364598A
Other languages
Japanese (ja)
Other versions
JP2000006303A (en
Inventor
英夫 福井
信幸 番匠
信之 中田
和夫 相川
年将 米屋
敏次 佐藤
昭 藤嶋
和仁 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Soda Co Ltd
Original Assignee
Nippon Soda Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Soda Co Ltd filed Critical Nippon Soda Co Ltd
Priority to JP19364598A priority Critical patent/JP3523787B2/en
Publication of JP2000006303A publication Critical patent/JP2000006303A/en
Application granted granted Critical
Publication of JP3523787B2 publication Critical patent/JP3523787B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Landscapes

  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Laminated Bodies (AREA)
  • Catalysts (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、抗菌、防黴、防
汚、脱臭、空気浄化などの作用を長期間に亘って発揮で
きる光触媒層を有することにより、屋外での使用に好適
な建築用材料に関する。さらに詳しくは、基材の有機質
表面に耐久性の高い光触媒層を形成でき、それにより、
建築用の外装材各種成形品など、基材の表面部が有機
質からなるために光触媒層を形成しても耐久性の面で問
題があった種々の分野に適用できる技術に関する。
The present invention relates to the antimicrobial, antifungal, anti-fouling, deodorization, by have a photocatalyst layer can be exhibited over a long period of time the effect of such air purification, suitable for outdoor use
Building materials . More specifically, it is possible to form a highly durable photocatalyst layer on the organic surface of the base material, whereby
The present invention relates to a technique that can be applied to various fields such as exterior materials for construction and various molded products that have a problem in durability even if a photocatalyst layer is formed because a surface portion of a substrate is made of an organic material.

【0002】[0002]

【従来の技術】TiO2に代表される光触媒作用を有す
る半導体が、その光触媒作用により抗菌・防黴・防汚・
防臭作用を有することは従来から知られており、最近で
はこれらの作用を利用した様々な材料が研究、開発され
ている。例えば、特開平2−6333号には酸化チタン
の粒子表面に銅、亜鉛等の抗菌性金属を担持させた抗菌
性粉末について開示されており、この粉末を樹脂、ゴ
ム、ガラス等に配合することによって抗菌性組成物が得
られ、また、公知の方法により、電機機器、家具調度
品、室内装飾材、食品等の包装資材などの抗菌性処理の
ほか、環境衛生施設、機器類の抗菌剤として上記粉末を
利用できると教示している。
2. Description of the Related Art Semiconductors having a photocatalytic action represented by TiO 2 are antibacterial, antifungal, antifouling, and antifouling due to the photocatalytic action.
It has been conventionally known that it has a deodorizing effect, and in recent years, various materials utilizing these effects have been researched and developed. For example, Japanese Unexamined Patent Publication (Kokai) No. 2-6333 discloses an antibacterial powder in which antibacterial metal such as copper and zinc is supported on the surface of titanium oxide particles, and this powder should be blended with resin, rubber, glass and the like. An antibacterial composition can be obtained by a known method, and as well as an antibacterial treatment of electric appliances, furniture furniture, upholstery materials, packaging materials such as foods, etc., as an antibacterial agent for environmental hygiene facilities and equipment. It teaches that the above powders can be utilized.

【0003】特開平6−65012号には、銀、銅、亜
鉛、白金等の金属を含有した酸化チタン膜をコンクリー
ト、ガラス、プラスチック、セラミックス、金属等の材
質からなる基板にコーティングすることによって、該基
板において雑菌及び黴の繁殖を防止できる旨が開示され
ている。さらに、国際公開WO96/13327号に
は、ガラス板等の透光性基体上に膜厚0.02〜0.2
μm程度のSiO2薄膜等からなるプレコート薄膜及び
波長550nmの光に対する光直線透過率が50%以上
の膜厚0.1〜5μm程度の酸化チタン薄膜を形成した
酸化チタン光触媒構造体が記載されている。
In Japanese Patent Laid-Open No. 6-65012, a titanium oxide film containing a metal such as silver, copper, zinc or platinum is coated on a substrate made of a material such as concrete, glass, plastic, ceramics or metal. It is disclosed that the substrate can prevent the propagation of germs and mold. Further, in International Publication WO96 / 13327, a film thickness of 0.02 to 0.2 is formed on a translucent substrate such as a glass plate.
Described is a titanium oxide photocatalyst structure formed with a pre-coated thin film made of a SiO 2 thin film having a thickness of about μm and a titanium oxide thin film having a thickness of about 0.1 to 5 μm with a linear light transmittance of 50% or more for light having a wavelength of 550 nm. There is.

【0004】[0004]

【発明が解決しようとする課題】光触媒としては、前記
のように一般に酸化チタンが用いられるが、この酸化チ
タンをコーティングした製品や部品は、屋外などの波長
400nm程度以下の光の存在する環境下で使用した場
合、光触媒作用により空気中の水分が酸化されて発生し
た・OHラジカルや、空気中の酸素が還元されて発生し
たO2 -あるいはHO2・ラジカルなどの活性物質の働き
により、抗菌、防汚、浄化効果など様々な機能を発現す
るため、幅広い分野で用いられつつある。しかし、無機
基材の上に光触媒膜や光触媒粒子を支持して用いる場合
は問題ないが、一部の有機材料を除き、一般に有機基材
の上に光触媒膜や光触媒粒子を支持して用いる場合は、
上記光触媒作用により発生した活性物質が有機基材表面
部を侵すため、様々な問題が発生する。
Titanium oxide is generally used as a photocatalyst as described above, but products and parts coated with this titanium oxide can be used outdoors in an environment where light with a wavelength of about 400 nm or less exists. When used in, the photocatalytic action of active substances such as OH radicals generated by oxidation of water in the air and O 2 - or HO 2 radicals generated by reduction of oxygen in the air causes antibacterial action. Since it exhibits various functions such as antifouling and purification effects, it is being used in a wide range of fields. However, there is no problem when using a photocatalyst film or photocatalyst particles supported on an inorganic substrate, but when some photocatalyst film or photocatalyst particles are generally supported on an organic substrate except some organic materials. Is
Since the active substance generated by the photocatalytic action invades the surface of the organic base material, various problems occur.

【0005】前記国際公開WO96/13327号に記
載の酸化チタン光触媒構造体の場合、ガラス板等の無機
基材を用いるものであるため、SiO2薄膜等のプレコ
ート薄膜がなくても光触媒作用によって無機基材が侵さ
れることはない。この光触媒構造体においては、プレコ
ート薄膜は、酸化チタン薄膜の光触媒活性が基材から拡
散してくるナトリウムなどのアルカリ成分により阻害さ
れるので、この拡散を防止する目的で用いられており、
前記したような光触媒作用により発生する活性物質によ
る侵蝕作用については全く言及されていない。
In the case of the titanium oxide photocatalyst structure described in WO 96/13327, since an inorganic base material such as a glass plate is used, it is possible to use an inorganic material by photocatalytic action without a precoat thin film such as a SiO 2 thin film. The substrate is not attacked. In this photocatalyst structure, the precoat thin film is used for the purpose of preventing this diffusion because the photocatalytic activity of the titanium oxide thin film is inhibited by the alkaline component such as sodium diffusing from the base material.
No mention is made of the erosive action by the active substance generated by the photocatalytic action as described above.

【0006】仮に有機基材上に上記のようなプレコート
薄膜を形成しても、0.02〜0.2μm程度の膜厚で
は、その上に形成される酸化チタン光触媒膜の光触媒作
用で発生した・OHラジカルの透過を防止できず、有機
基材表面部が分解されてしまう。また、光触媒膜形成の
段階で、加熱硬化工程の際の収縮により光触媒膜に多数
の微細な亀裂が生じ、それに追従してプレコート薄膜に
も多数の微細な亀裂が生じてしまう。仮に光触媒膜形成
方法を変えてプレコート薄膜に多数の亀裂が生じないよ
うに形成しても、経時劣化や歪み、突起物の衝突や衝撃
などにより光触媒膜及びプレコート薄膜の一部に欠けを
生じてしまう。このような亀裂や欠けが生じた場合、プ
レコート薄膜の膜厚が多少厚く、例えば標準的な成膜法
であるディップコーティング法で成膜できる1μm程度
であっても、活性物質は有機基材表面部にまで到達し、
その分解を防ぎきれない。
Even if the above-mentioned pre-coated thin film is formed on the organic base material, if the thickness is about 0.02 to 0.2 μm, the photocatalytic action of the titanium oxide photocatalytic film formed on the precoated thin film is generated. -The penetration of OH radicals cannot be prevented and the surface of the organic base material is decomposed. Further, at the stage of forming the photocatalyst film, a large number of fine cracks are generated in the photocatalyst film due to shrinkage during the heat curing step, and a large number of fine cracks are also generated in the precoat thin film following the cracks. Even if the photocatalyst film formation method is changed so that many cracks do not occur in the precoat thin film, the photocatalyst film and the precoat thin film may be partially chipped due to deterioration with time, distortion, projection collision or impact, etc. I will end up. When such cracks or chips occur, even if the thickness of the precoat thin film is a little thick, for example, about 1 μm which can be formed by the dip coating method which is a standard film forming method, the active substance is the surface of the organic base material. Reaches the department,
The decomposition cannot be prevented.

【0007】このような分解が生じても、例えば屋外使
用環境下で期待寿命1年以下の用途であればそれ程問題
ないが、それ以上の長期耐久性を必要とする部材に光触
媒をコーティングする場合、様々な問題が発生する。具
体的には、有機基材表面部が分解すると、その上に存在
している中間層、光触媒層ともに足場を失うため、脱落
する。またそれにより、光触媒作用を利用した目的の機
能(防汚性や、抗菌性、脱臭性など)が失われるだけで
なく、表面光沢が低下したり、粉吹き状態になるなど、
本来の外観特性や意匠性も失われてしまう。
[0007] Even if such decomposition occurs, it is not a big problem in applications where the expected life is 1 year or less in an outdoor environment, but when a photocatalyst is coated on a member that requires longer durability. , Various problems occur. Specifically, when the surface portion of the organic base material is decomposed, both the intermediate layer and the photocatalyst layer existing thereon lose the scaffold, and thus fall off. In addition, it not only loses the desired function (antifouling property, antibacterial property, deodorizing property, etc.) that utilizes the photocatalytic action, but also reduces the surface gloss and creates a powder blown state.
The original appearance and design are lost.

【0008】従って、本発明の基本的な目的は、前記し
たような問題を解決し、抗菌、防黴、防汚、脱臭、空気
浄化などの作用を長期間に亘って安定して発揮できる光
触媒層を有する屋外で使用される建築用材料を提供する
ことにある。さらに本発明の目的は、製造段階で光触媒
層及びその下の中間層に多数の微細な亀裂が発生した
り、経時劣化や歪み、突起物の衝突や衝撃などによりこ
れらの膜の一部に欠けが生じた場合でも、屋外など波長
400nm程度以下の光の存在する環境下での長期使用
において、光触媒作用が下地の有機基材表面部にまで及
ぶことがなく、いつまでも光触媒層が有機基材上に安定
に保たれるような光触媒膜構造を提供することにある。
Therefore, a basic object of the present invention is to solve the above-mentioned problems, and to exert the effects of antibacterial, antifungal, antifouling, deodorant, air purification, etc. stably over a long period of time. An object is to provide a building material having a layer and used outdoors . Furthermore, the object of the present invention is to produce a large number of fine cracks in the photocatalyst layer and the intermediate layer thereunder during the production stage, and to a part of these films due to deterioration with time, distortion, projection collision or impact, etc. Even if occurs, the photocatalytic action does not extend to the surface of the underlying organic base material in the long-term use in an environment where light with a wavelength of about 400 nm or less exists, and the photocatalyst layer remains on the organic base material forever. Another object of the present invention is to provide a photocatalyst film structure that can be stably maintained.

【0009】[0009]

【課題を解決するための手段】前記目的を達成するため
に、本発明によれば、基材の有機質表面と、塗料中に塗
料基剤に対し1〜100重量%の割合で粒径5nm〜1
μmのTiO 2 からなる光触媒粒子を分散させた薄膜か
ら形成され、平均膜厚が0.05〜10μmである表面
層としての光触媒層との間に、光触媒作用によって侵さ
れない材料の中間層を介在させ、上記有機質表面と光触
媒層との間の距離を3.2〜10μmとすることを特徴
とする光触媒層を有する屋外で使用される建築用材料が
提供される。さらにより特定的な態様によれば、基材の
有機質表面と、塗料中に塗料基剤に対し1〜100重量
%の割合で粒径5nm〜1μmのTiO 2 からなる光触
媒粒子を分散させた薄膜から形成され、平均膜厚が0.
05〜10μmである表面層としての光触媒層との間
に、光触媒作用によって侵されない材料からなり、亀裂
もしくはピンホールを有する構造又は多孔質構造の中間
層が介在し、上記有機質表面と光触媒層との間の距離が
3.2〜10μmであることを特徴とする光触媒層を有
する屋外で使用される建築用材料が提供される。ここ
で、基材の有機質表面とは、製品や部材の基材自体が有
機材料からなる場合にはその表面、任意の材料からなる
基材の表面に塗装、含浸、ラミネート等の適宜の手段に
より有機材料の被膜が形成されている場合には該被膜の
表面を意味する。上記光触媒層は、光触媒作用を発揮す
る層を意味し、光触媒作用を有するTiO 2 を含む(担
持及び/又は含有する)薄膜である。半導体微粒子を含
む薄膜のバインダーとしては、無機バインダー、特にシ
リカを用いることが好ましく、また上記中間層としても
このようなシリカを主成分とする無機質材料を用いるこ
とが好ましい。
In order to achieve the above object, according to the present invention, an organic surface of a substrate and a coating material are applied.
Particle size 5 nm to 1 at a ratio of 1 to 100% by weight with respect to the base material
Is it a thin film in which photocatalytic particles made of TiO 2 of μm are dispersed?
And a photocatalyst layer as a surface layer having an average film thickness of 0.05 to 10 μm, an intermediate layer of a material that is not attacked by photocatalysis is interposed, and the distance between the organic surface and the photocatalyst layer. The construction material used outdoors is provided with a photocatalytic layer having a thickness of 3.2 to 10 μm . According to an even more specific aspect, the substrate
1-100% by weight of organic surface and paint base
Touch light consists of TiO 2 particle size 5nm~1μm in percentage of
It is formed from a thin film in which medium particles are dispersed, and has an average film thickness of 0.
Between the photocatalyst layer as a surface layer having a thickness of 05 to 10 μm
Is made of a material that is not attacked by photocatalysis and cracks
Or intermediate structure with pinhole or porous structure
The layer is interposed, and the distance between the organic surface and the photocatalyst layer is
It has a photocatalyst layer characterized by having a thickness of 3.2 to 10 μm.
A building material for outdoor use is provided. Here, the organic surface of the substrate, when the substrate itself of the product or member is made of an organic material, the surface, by the appropriate means such as coating, impregnation, lamination on the surface of the substrate made of any material When a film of an organic material is formed, it means the surface of the film. The photocatalyst layer means a layer exhibiting a photocatalytic action, and is a thin film containing (supporting and / or containing) TiO 2 having a photocatalytic action. An inorganic binder, particularly silica, is preferably used as a binder for a thin film containing semiconductor particles, and an inorganic material containing silica as a main component is also preferably used as the intermediate layer.

【0010】[0010]

【発明の実施の形態】有機基材/中間層/光触媒層の膜
構造において、従来、耐久性の面から、中間層の膜厚
や、有機基材と光触媒層との間の間隔の最適範囲につい
て示されたものは無かった。そこで、本発明者らは、こ
れらの膜厚や間隔について各種の検討を行った。その結
果、屋外など400nm以下の波長の光が当たる環境下
での長期使用においても、有機基材を侵すことなく、長
期耐久性を発揮させる重要なポイントは、有機基材と光
触媒層の物理的間隔にあることを見い出した。すなわ
ち、屋外など波長400nm程度以下の光の存在する環
境下で長期間使用した場合、光触媒作用により空気中の
水分が酸化されて発生した・OHラジカルや、空気中の
酸素が還元されて発生したO2 -などの活性物質は、それ
らの移動可能距離範囲内にある有機物を分解する作用が
ある。その移動距離は、屋外使用環境下では、概ね3.
2μm以下であることを確認した。以下、添付図面を参
照しながら説明する。
BEST MODE FOR CARRYING OUT THE INVENTION In the film structure of organic base material / intermediate layer / photocatalyst layer, the optimum range of the film thickness of the intermediate layer and the distance between the organic base material and the photocatalyst layer have been conventionally considered from the viewpoint of durability. Nothing was shown about. Therefore, the present inventors have made various studies on these film thicknesses and intervals. As a result, even in the long-term use in an environment such as outdoors exposed to light having a wavelength of 400 nm or less, the important point of exhibiting long-term durability without damaging the organic base material is that the physical properties of the organic base material and the photocatalyst layer are physical. I found that there was an interval. That is, when used for a long period of time in an environment where light with a wavelength of about 400 nm or less exists, such as outdoors, OH radicals generated by oxidation of water in the air due to photocatalytic action and reduction of oxygen in the air Active substances such as O 2 have a function of decomposing organic substances within their movable distance range. The movement distance is approximately 3. under an outdoor environment.
It was confirmed to be 2 μm or less. Hereinafter, description will be given with reference to the accompanying drawings.

【0011】図1は、有機基材1/中間層2/光触媒層
3の基本的な膜構造を概略的に示している。一般に、光
触媒層3の形成に加熱硬化工程が含まれる場合には、光
触媒層3の硬化収縮に伴って多数の微細な亀裂が発生
し、それに追従して中間層2にも多数の微細な亀裂が発
生する。その断面を電子顕微鏡で観察すると、概略、図
2に示すような断面構造になる。図2において、符号4
は発生した亀裂を示しており、この部分の有機基材1は
露出している。製造段階でこのような亀裂4が発生しな
い場合でも、長期間使用する間の経時劣化や歪み、突起
物の衝突や衝撃などにより、光触媒層3及び中間層2が
部分的に欠け、その部分の有機基材1は露出する。
FIG. 1 schematically shows the basic film structure of organic substrate 1 / intermediate layer 2 / photocatalyst layer 3. Generally, when the heat curing step is included in the formation of the photocatalyst layer 3, a large number of fine cracks are generated along with the curing shrinkage of the photocatalyst layer 3, and the fine cracks are also formed in the intermediate layer 2 in accordance with the shrinkage. Occurs. When the cross section is observed with an electron microscope, the cross section structure is roughly as shown in FIG. In FIG. 2, reference numeral 4
Indicates a crack that has occurred, and the organic base material 1 in this portion is exposed. Even if such a crack 4 does not occur in the manufacturing stage, the photocatalyst layer 3 and the intermediate layer 2 are partially chipped due to deterioration or distortion over time during long-term use, collision or impact of protrusions, and The organic base material 1 is exposed.

【0012】このような状態の膜構造を有する製品や部
材が長期間使用されると、亀裂4の部分に結露水が溜ま
り易くなる。また、この部分には空気中の水分も存在す
る。このようにして、図3に示すように亀裂4に水5が
存在すると、光触媒層3が光を受けて光触媒作用を発揮
することにより生成した・OHラジカルが上記水中を移
動し易くなるものと考えられる。その結果、図4に示す
ように、有機基材1の露出部表面は上記・OHラジカル
により侵され、さらに時間の経過と共に図5に示すよう
に有機基材1の表面部の分解は主として中間層2との界
面に沿って進行し、遂には中間層2と光触媒層3が剥落
してしまう。本発明者らは、このような現象について鋭
意研究の結果、有機基材1の露出表面部が侵されるか否
かは、有機基材1の表面と光触媒層3との間の距離dに
より決定付けられ、しかもその値が臨界的であることを
見い出した。すなわち、この距離dが3.2μmを境と
して、3.2μm未満では有機基材1の表面部は侵さ
れ、3.2μm以上では侵されない。このことから、上
記のような条件下での・OHラジカルの臨界的移動距離
は約3.2μm近傍又はそれ以下にあると考えられる。
When a product or member having a film structure in such a state is used for a long period of time, dew condensation water is likely to collect in the crack 4. Water in the air also exists in this portion. In this way, when water 5 is present in the crack 4 as shown in FIG. 3, the .OH radicals generated by the photocatalytic layer 3 receiving light and exhibiting a photocatalytic action are likely to move in the water. Conceivable. As a result, as shown in FIG. 4, the exposed surface of the organic base material 1 is attacked by the above-mentioned OH radicals, and as time passes, the surface portion of the organic base material 1 is mainly decomposed as shown in FIG. It progresses along the interface with the layer 2, and finally the intermediate layer 2 and the photocatalyst layer 3 come off. As a result of earnest research on such a phenomenon, the present inventors determined whether or not the exposed surface portion of the organic base material 1 is attacked by the distance d between the surface of the organic base material 1 and the photocatalyst layer 3. It was found that the value was attached and the value was critical. That is, when the distance d is 3.2 μm as a boundary, the surface portion of the organic base material 1 is corroded when the distance d is less than 3.2 μm, and is not corroded when the distance d is 3.2 μm or more. From this, it is considered that the critical migration distance of the · OH radical under the above conditions is around 3.2 μm or less.

【0013】なお、上記距離dは必ずしも中間層2の膜
厚を意味しない。例えば、中間層2の表面は凹凸状であ
ってもよく、その場合には中間層の最低膜厚が3.2μ
m以上あればよい。また、中間層2は光触媒作用により
侵されない材料から形成する必要はあるが、有機基材1
の表面部が侵されるか否かはそれと光触媒層3との間の
距離dに依存するものであるため、この距離dを一定に
保持できる構造の中間層であればよい。従って、中間層
2に多数の亀裂やピンホールがあってもよく、また多孔
質構造のものでもよい。光触媒作用により侵されない中
間層としては、シリカ、アルミナ、酸化インジウム、酸
化ジルコニウム、SiO2+MOX(MOXはP25、B2
3、ZrO2、Ta25等の少なくとも1種の金属酸化
物)あるいは窒化物、酸窒化物、硫化物、炭化物、カー
ボン等のセラミックス、金属などの各種無機材料の薄膜
を好適に用いることができる。また、光触媒作用により
侵されない、もしくは非常に侵され難いシリコーン樹
脂、ポリテトラフルオロエチレンなどの有機材料の薄膜
も用いることができる。
The distance d does not necessarily mean the film thickness of the intermediate layer 2. For example, the surface of the intermediate layer 2 may be uneven, and in that case, the minimum thickness of the intermediate layer is 3.2 μm.
It should be at least m. Further, the intermediate layer 2 needs to be formed of a material that is not affected by the photocatalytic action, but the organic substrate 1
Whether or not the surface portion of P is attacked depends on the distance d between it and the photocatalyst layer 3. Therefore, any intermediate layer having a structure capable of keeping this distance d constant may be used. Therefore, the intermediate layer 2 may have a large number of cracks and pinholes, or may have a porous structure. Examples of the intermediate layer which is not affected by the photocatalytic action are silica, alumina, indium oxide, zirconium oxide, SiO 2 + MO X (MO X is P 2 O 5 , B 2
At least one metal oxide such as O 3 , ZrO 2 and Ta 2 O 5 ) or nitride, oxynitride, sulfide, carbide, ceramics such as carbon, and thin films of various inorganic materials such as metal are preferably used. be able to. Further, a thin film of an organic material such as a silicone resin or polytetrafluoroethylene which is not or very hardly attacked by a photocatalytic action can also be used.

【0014】以上のように、有機基材1の表面と光触媒
層3(もしくは光触媒粒子)の下端との間の距離dを
3.2μm以上とすることにより、長期間の使用によっ
ても概ね有機基材の表面部が分解されることはなく、中
間層及びその上の光触媒層を安定に保持でき、抗菌、防
黴、防汚、脱臭、空気浄化などの作用を長期間に亘って
安定的に発揮させることが可能となる。ただし、屋外で
の使用の場合、使用場所や使用形態により、日射量、降
雨量、気温、湿度などの環境条件が最悪に重なり合う場
合もあり、・OHラジカルの移動距離も変動する可能性
があるため、有機基材の表面と光触媒層(もしくは光触
媒粒子)下端の間の距離dは、より好ましくは3.5μ
m以上とすることが望ましい。一方、この距離dの上限
は特に限定されるものではなく、例えば数十μm程度、
あるいは適用対象物によってはそれ以上でもよいが、生
産性や経済性、さらには適用対象物がシート状物の場合
にはその可撓性、などを考慮すると10μm以下が適
当である。
As described above, by setting the distance d between the surface of the organic base material 1 and the lower end of the photocatalyst layer 3 (or photocatalyst particles) to be 3.2 μm or more, the organic group can be generally used even if it is used for a long period of time. The surface of the material is not decomposed, the intermediate layer and the photocatalyst layer above it can be stably held, and the effects of antibacterial, antifungal, antifouling, deodorizing, air purification, etc. are stable over a long period of time. It will be possible to demonstrate. However, when used outdoors, environmental conditions such as the amount of solar radiation, rainfall, temperature, and humidity may overlap at worst depending on the location and type of usage, and the distance traveled by OH radicals may vary. Therefore, the distance d between the surface of the organic base material and the lower end of the photocatalyst layer (or photocatalyst particles) is more preferably 3 . 5μ
It is desirable that it is m or more. On the other hand, the upper limit of this distance d is not particularly limited, for example, about several tens of μm,
Alternatively, it may be more than 10 μm depending on the object to be applied, but in view of productivity and economy, and flexibility when the object to be applied is a sheet-like object , 10 μm or less is suitable.

【0015】有機基材又は任意の基材表面に形成される
有機被膜の材質としては、ABS樹脂、スチレンアクリ
ロニトリル共重合体(SAN)、酢酸繊維素、酪酢酸繊
維素、クレゾール樹脂、硝酸繊維素、カゼイン、エポキ
シ樹脂、メラミン樹脂、ポリアミド、ポリカーボネー
ト、三フッ化エチレン樹脂、ジアリルフタレート樹脂、
ポリエチレン、フェノール樹脂、アクリル樹脂、アセタ
ール樹脂、ポリプロピレン、ポリスチレン、ポリウレタ
ン、酢酸ビニル樹脂、塩化ビニル樹脂、塩化ビニリデン
樹脂、ケイ素樹脂、ユリア樹脂、不飽和ポリエステル樹
脂、フッ素樹脂などにより構成される樹脂材料や塗装膜
が挙げられる。また、セルロース等から構成される木材
や紙、さらにはゴム材料などを用いることもできる。さ
らに、有機被膜を形成する基材としても、アルミニウ
ム、鉄等の各種金属もしくは陽極酸化等の耐食性を付与
する表面処理を施した各種金属、セラミックス、合成樹
脂などを用いることができ、特定のものに限定されな
い。また、基材の形態も、形材、パネル、シート、フィ
ルム、各種形状の成形物などの製品、部品もしくは部材
であってよく、特定のものに限定されない。
The material of the organic base material or the organic coating formed on the surface of any base material is ABS resin, styrene-acrylonitrile copolymer (SAN), fibrin acetate, fibrin butyacetate, cresol resin, fibrin nitrate. , Casein, epoxy resin, melamine resin, polyamide, polycarbonate, trifluoroethylene resin, diallyl phthalate resin,
Resin materials composed of polyethylene, phenol resin, acrylic resin, acetal resin, polypropylene, polystyrene, polyurethane, vinyl acetate resin, vinyl chloride resin, vinylidene chloride resin, silicon resin, urea resin, unsaturated polyester resin, fluororesin, etc. An example is a coating film. Further, wood or paper made of cellulose or the like, or rubber material can also be used. Further, as the base material for forming the organic coating, various metals such as aluminum and iron or various metals surface-treated to impart corrosion resistance such as anodic oxidation, ceramics and synthetic resins can be used. Not limited to. Further, the form of the base material may be a product such as a shape member, a panel, a sheet, a film, or a molded product of various shapes, a part or a member, and is not limited to a particular one.

【0016】上記のような基材表面に中間層を形成する
方法としては、従来公知の種々の方法が適用でき、特定
の方法に限定されない。例えば、中間層をセラミックス
から形成する場合には、有機溶剤中にセラミックス微粒
子又はそれらの前駆体(金属アルコキシド、金属ハロゲ
ン化物等)を分散させた塗料を、その粘度に応じてスプ
レーコーティング法、ロールコーティング法、ディップ
コーティング法、スピンコーティング法、フローコーテ
ィング法など適宜の方法で基材表面にコーティングし、
加熱して溶剤を蒸散させると共に硬化させる方法が、生
産性やコストの点から有利である。一方、中間層を金属
から形成する場合には、金属箔のラミネート法やメッキ
法などを採用でき、シリコーン樹脂、ポリテトラフルオ
ロエチレンなどの有機材料の場合には種々の塗装方法を
採用できる。
As a method of forming the intermediate layer on the surface of the base material as described above, various conventionally known methods can be applied and are not limited to specific methods. For example, when the intermediate layer is formed of ceramics, a coating material in which ceramics fine particles or their precursors (metal alkoxide, metal halide, etc.) are dispersed in an organic solvent is spray-coated or rolled according to its viscosity. Coating on the substrate surface by an appropriate method such as a coating method, a dip coating method, a spin coating method, a flow coating method,
The method of heating and evaporating the solvent and curing the solvent is advantageous in terms of productivity and cost. On the other hand, when the intermediate layer is formed of metal, a metal foil laminating method, a plating method, or the like can be adopted, and various coating methods can be adopted when an organic material such as silicone resin or polytetrafluoroethylene is used.

【0017】光触媒作用を有する半導体としては、電子
−正孔移動度が比較的大きく、光触媒作用を有する半導
体であることが必要であり、特にTiO2が好ましい。
また、このような光触媒作用を有する半導体と共に銀、
銅、亜鉛等の抗菌性金属又は抗菌性金属化合物を共存さ
せれば、例えば光触媒層中に分散させたり、光触媒層の
表面に付着させたりすれば、夜間であっても抗菌・防黴
性が維持されるようになる。
The semiconductor having a photocatalytic action must be a semiconductor having a relatively large electron-hole mobility and a photocatalytic action , and TiO 2 is particularly preferable.
Moreover, silver, together with a semiconductor having such a photocatalytic action,
If an antibacterial metal or an antibacterial metal compound such as copper or zinc is allowed to coexist, for example, if dispersed in the photocatalyst layer or attached to the surface of the photocatalyst layer, the antibacterial and antifungal properties can be obtained even at night. Will be maintained.

【0018】光触媒作用を有する半導体、抗菌性金属又
は抗菌性金属化合物の形態としては、個々の微粒子の形
態、光触媒作用を有する半導体微粒子(以下、光触媒微
粒子という。)の表面に抗菌性金属又は抗菌性金属化合
物が部分的に(又は一部の粒子は全体的でも構わない)
付着している形態、光触媒微粒子の表面にシリカ等の無
機質微粒子が部分的に付着している形態、光触媒微粒子
の表面に無機質微粒子と抗菌性金属又は抗菌性金属化合
物が部分的に付着している形態、抗菌性金属又は抗菌性
金属化合物が付着している無機質微粒子が光触媒微粒子
の表面に付着している形態など、種々の形態を採用でき
る。
The semiconductor, antibacterial metal or antibacterial metal compound having a photocatalytic action may be in the form of individual fine particles, or the surface of semiconductor fine particles having a photocatalytic action (hereinafter referred to as photocatalytic fine particles) may be an antibacterial metal or antibacterial substance. Metal compounds are partially (or some particles may be wholly)
Adhesive form, inorganic fine particles such as silica partially adhere to the surface of photocatalyst fine particles, inorganic fine particles and antibacterial metal or antibacterial metal compound partially adhere to the surface of photocatalyst fine particles Various forms such as a form, a form in which the inorganic fine particles to which the antibacterial metal or the antibacterial metal compound is attached are attached to the surface of the photocatalyst particles, can be adopted.

【0019】光触媒作用を有する半導体のコーティング
方法としては、スパッタ法、溶射法、レーザーアブレー
ション法、ゾルーゲル法、メッキ法など種々の方法を用
いることができるが、前記中間層の場合と同様に、適当
な塗料中に光触媒微粒子又はその前駆体、あるいはさら
に必要に応じて抗菌性金属又は抗菌性金属化合物の微粒
子を分散させ、これを基材に塗布・乾燥することによっ
てコーティングし、加熱硬化する方法が好ましい。基材
や被膜が高温に耐えられる場合には、上記の種々のコー
ティング方法で光触媒膜の形成が可能であるが、耐熱性
が劣る樹脂材料からなる場合は、高温に加熱することが
難しくなる。その場合には、適当な塗料中に光触媒微粒
子を分散させ、これを基材に塗布・乾燥することによっ
てコーティングする方法を採用すればよい。また、光触
媒微粒子を分散させた塗料の基剤(無機系バインダー)
が前記したような中間層の塗料の被膜形成成分と同一の
場合、中間層と光触媒層の密着性がより一層向上すると
いう効果が得られる。
As a method for coating a semiconductor having a photocatalytic action, various methods such as a sputtering method, a thermal spraying method, a laser ablation method, a sol-gel method and a plating method can be used. Photocatalyst fine particles or their precursors, or further fine particles of an antibacterial metal or an antibacterial metal compound are dispersed in a different coating material, and the resulting composition is coated on a substrate by coating and drying, followed by heating and curing. preferable. The photocatalyst film can be formed by the various coating methods described above when the base material and the coating film can withstand high temperatures, but it is difficult to heat the photocatalyst film to a high temperature when the resin material is poor in heat resistance. In that case, a method may be adopted in which the photocatalyst fine particles are dispersed in a suitable coating material, and the coating is performed by applying and drying this on a base material. In addition, the base of the coating material (inorganic binder) in which photocatalyst fine particles are dispersed
Is the same as the film forming component of the paint for the intermediate layer as described above, the effect of further improving the adhesion between the intermediate layer and the photocatalyst layer can be obtained.

【0020】中間層の上にコーティングされる光触媒層
の膜厚は、0.05〜10μmが適当である。膜厚が厚
いと光触媒活性を長期間に亘って高く維持でき、また光
干渉による着色も減少するなどの利点があるが、10μ
mを超える膜厚になると、光触媒膜が基材から剥離し易
くなり、また生産性やコストの面からも好ましくない。
特に、光触媒膜をコーティングした後、組立時や施工時
に剥離が起き易くなる。なお、この程度の膜厚であれ
ば、光触媒膜に白化等の問題を生ずることなく充分に高
い透明性を保持できる。特に屋外で使用する場合は、耐
摩耗性も考慮し、平均膜厚を0.5μm以上とすること
が好ましい。
The thickness of the photocatalyst layer coated on the intermediate layer is suitably 0.05 to 10 μm. If the film thickness is thick, the photocatalytic activity can be kept high for a long period of time, and there is an advantage that coloring due to light interference is reduced.
When the film thickness exceeds m, the photocatalyst film is likely to be peeled from the base material, and it is not preferable in terms of productivity and cost.
In particular, after coating the photocatalyst film, peeling is likely to occur during assembly or construction. A film having such a thickness can maintain sufficiently high transparency without causing problems such as whitening on the photocatalyst film. Particularly when used outdoors, it is preferable to set the average film thickness to 0.5 μm or more in consideration of wear resistance.

【0021】塗料中に光触媒微粒子を分散させ、これを
塗布するコーティング方法の場合、混合される光触媒微
粒子の割合は、塗料基剤に対し1〜100重量%(ここ
で100重量%は、光触媒微粒子の重量と塗料基剤の重
量が等しいことに相当する。)の範囲にあることが好ま
しい。1重量%より少なくなると、光触媒作用を発揮す
る光触媒微粒子の量が不足し、ひいては充分な光触媒作
用が得られず、一方、100重量%を超えると、光触媒
作用の発揮に関しては問題ないが、塗膜の機械的特性が
著しく低下する。
In the case of a coating method in which photocatalyst fine particles are dispersed in a coating material and applied, the proportion of the photocatalyst fine particles to be mixed is 1 to 100% by weight (here, 100% by weight means the photocatalyst fine particles). Is equivalent to the weight of the paint base). If it is less than 1% by weight, the amount of the photocatalyst fine particles exhibiting a photocatalytic action is insufficient, and thus a sufficient photocatalytic action cannot be obtained. On the other hand, if it exceeds 100% by weight, there is no problem in exhibiting the photocatalytic action. The mechanical properties of the membrane are significantly reduced.

【0022】使用する光触媒微粒子の粒径は、5nm〜
1μm、好ましくは10nm〜300nmが適当であ
る。粒径が5nmよりも小さくなると、量子サイズ効果
によりバンドギャップが大きくなり、高圧水銀灯等の短
波長光を発生する照明下でないと光触媒作用が得られな
いといった問題がある。また、粒径があまりに小さ過ぎ
ると、取り扱いが困難であったり、塗料中への分散性が
悪くなるという問題も生じてくる。取り扱い性の点から
は10nm以上の粒径が好ましい。一方、粒径が1μm
を超えると、材料表面に比較的大きな光触媒微粒子が存
在することになるため、表面の滑らかさが乏しくなり、
また材料表面に露出した粒子が脱落し易くもなる。材料
表面の平滑さ等を考慮すると300nm以下の粒径が好
ましい。
The particle diameter of the photocatalyst fine particles used is from 5 nm to
1 μm, preferably 10 nm to 300 nm is suitable. If the particle size is smaller than 5 nm, the band gap becomes large due to the quantum size effect, and there is a problem that the photocatalytic action cannot be obtained unless under illumination such as a high-pressure mercury lamp that emits short-wavelength light. Further, if the particle size is too small, there arises a problem that the handling is difficult and the dispersibility in the paint is poor. From the viewpoint of handleability, a particle size of 10 nm or more is preferable. On the other hand, the particle size is 1 μm
If it exceeds, since relatively large photocatalyst fine particles are present on the material surface, the smoothness of the surface becomes poor,
Further, the particles exposed on the surface of the material are likely to fall off. Considering the smoothness of the material surface and the like, a particle size of 300 nm or less is preferable.

【0023】光触媒層上に抗菌性金属又は抗菌性金属化
合物を析出させる方法は、硝酸銀や塩化銅などの銀や銅
などの抗菌性金属を含む適当な化合物の溶液を調製し、
一つの方法としては、中間層及び光触媒層をコーティン
グした基材を該溶液中に浸し、紫外線ランプやブラック
ライトなどで紫外線を照射すると、光触媒層の光触媒作
用で生じた電子の作用により抗菌性金属イオン又は抗菌
性金属化合物イオンが還元され、光触媒層表面に抗菌性
金属又は抗菌性金属化合物が析出する。この場合、抗菌
性金属又は抗菌性金属化合物の析出量は、溶液中の抗菌
性金属イオンの量、すなわち調製した溶液の濃度や溶液
中に添加するアルコールやEDTA等の還元剤の濃度や
紫外線照射時間によって制御できる。
To deposit the antibacterial metal or the antibacterial metal compound on the photocatalyst layer, a solution of an appropriate compound containing an antibacterial metal such as silver or copper such as silver nitrate or copper chloride is prepared,
One method is to immerse the base material coated with the intermediate layer and the photocatalyst layer in the solution, and irradiate it with ultraviolet rays from an ultraviolet lamp or a black light to produce antibacterial metal by the action of electrons generated by the photocatalytic action of the photocatalyst layer. Ions or antibacterial metal compound ions are reduced and the antibacterial metal or antibacterial metal compound is deposited on the surface of the photocatalyst layer. In this case, the amount of the antibacterial metal or the antibacterial metal compound deposited depends on the amount of the antibacterial metal ion in the solution, that is, the concentration of the prepared solution, the concentration of the reducing agent such as alcohol or EDTA added to the solution, or the ultraviolet irradiation. It can be controlled by time.

【0024】また、別の方法としては、前記溶液を中間
層及び光触媒層をコーティングした基材上にスプレー等
の適当な方法で塗布した後、紫外線を照射する方法があ
る。この方法では、溶液中の抗菌性金属イオンの量、す
なわち調製した溶液の濃度や溶液中に添加するアルコー
ルやEDTA等の還元剤の濃度や塗布量あるいは紫外線
照射時間によって抗菌性金属又は抗菌性金属化合物の析
出量が制御できる。なお、上記のいずれの方法において
も、抗菌性金属又は抗菌性金属化合物で光触媒層表面全
体を被覆してしまうと、光触媒作用が発現できなくなる
ため、表面全体を被覆しない程度の析出量に制御する必
要がある。
As another method, there is a method in which the solution is applied onto a substrate coated with an intermediate layer and a photocatalyst layer by an appropriate method such as spraying, and then the solution is irradiated with ultraviolet rays. In this method, the antibacterial metal or the antibacterial metal is adjusted depending on the amount of the antibacterial metal ion in the solution, that is, the concentration of the prepared solution, the concentration of the reducing agent such as alcohol or EDTA added to the solution, the coating amount, or the ultraviolet irradiation time. The amount of compound deposited can be controlled. In any of the above methods, if the entire surface of the photocatalyst layer is coated with the antibacterial metal or the antibacterial metal compound, the photocatalytic action cannot be expressed, and therefore the amount of precipitation is controlled so that the entire surface is not covered. There is a need.

【0025】[0025]

【実施例】以下、実施例及び比較例を示して本発明の効
果について具体的に説明するが、本発明が下記実施例に
限定されるものでないことはもとよりである。
EXAMPLES The effects of the present invention will be specifically described below with reference to Examples and Comparative Examples, but it goes without saying that the present invention is not limited to the following Examples.

【0026】実施例1〜10及び比較例1〜15 膜厚30μmのフッ素樹脂塗膜を形成したアルミ板の表
面に、シリコン系コーティング剤(日本曹達(株)製、
ビストレイターL NSC−200A、有機溶剤系シリ
コン−アクリル含有コーティング剤、固形分10wt
)をスプレー法でコーティングし、90℃で30分加
熱して硬化させ、表1に示す種々の膜厚のシリコン系の
中間層を形成した。この上に、光触媒酸化チタンコーテ
ィング剤(日本曹達(株)製、ビストレイターL NS
C−200C、有機溶剤系酸化チタン含有コーティング
剤、固形分8wt%)をスプレー法でコーティングし、
120℃で30分加熱して硬化させ、表1に示す種々の
膜厚の光触媒層を形成した。このようにして得られた試
料の膜部分を鉄筆で引っ掻き、図6に示すような亀裂4
を入れた。
Examples 1 to 10 and Comparative Examples 1 to 15 A silicon coating agent (manufactured by Nippon Soda Co., Ltd.,
Vistorator L NSC-200A , organic solvent type silicone
Con-acrylic containing coating agent, solid content 10 wt
% ) By a spray method and cured by heating at 90 ° C. for 30 minutes to form silicon-based intermediate layers of various thicknesses shown in Table 1. On top of this, a photocatalytic titanium oxide coating agent (manufactured by Nippon Soda Co., Ltd., VISTRATER L NS
C-200C , organic solvent based titanium oxide containing coating
Agent, solid content 8 wt% ) by spray method,
The coating was heated at 120 ° C. for 30 minutes for curing to form photocatalyst layers having various film thicknesses shown in Table 1. The film portion of the sample thus obtained was scratched with an iron brush and cracked as shown in FIG.
I put.

【0027】劣化促進試験: 試料の劣化促進は、デューパネルウエザーメーター(ス
ガ試験機(株)製、DPWL−5R)を用い、紫外線蛍
光ランプの照射(60℃、4時間、放射照度30W/m
2nm)及び結露(50℃、4時間)を250時間、5
00時間、又は1,000時間繰り返すことにより行っ
た。試験終了後の試料の断面構造を電子顕微鏡により観
察することによって、図7に概略的に示す断面モデルの
ような亀裂箇所の塗膜(樹脂)部の劣化の有無を調べ
た。その結果を表1にまとめて示す。なお、表1におけ
る各符号の意味は以下のとおりである。 ○:塗膜部の分解無し。 △:塗膜部に僅かに分解が認められる。 ×:塗膜部の分解有り。
Deterioration accelerated test: Deterioration of the sample was accelerated using a Dew Panel Weather Meter (DPWL-5R manufactured by Suga Test Instruments Co., Ltd.) by irradiation with an ultraviolet fluorescent lamp (60 ° C., 4 hours, irradiance 30 W / m).
2 nm) and condensation (50 ° C, 4 hours) for 250 hours, 5
It was carried out by repeating 00 hours or 1,000 hours. By observing the cross-sectional structure of the sample after the test with an electron microscope, the presence or absence of deterioration of the coating film (resin) portion at the crack portion as in the cross-sectional model schematically shown in FIG. 7 was examined. The results are summarized in Table 1. The meaning of each symbol in Table 1 is as follows. ◯: No decomposition of coating film part. Δ: A slight decomposition is observed in the coating film part. X: There is decomposition of the coating film part.

【0028】[0028]

【表1】 表1に示されるように、中間層の最低膜厚が3.2μm
未満かそれ以上かによって、塗膜(樹脂)部に分解が生
じるか否か明瞭に分かれることがわかる。
[Table 1] As shown in Table 1, the minimum thickness of the intermediate layer is 3.2 μm.
It can be clearly understood whether the coating film (resin) part is decomposed or not depending on whether it is less than or more than that.

【0029】[0029]

【発明の効果】以上のように、本発明の光触媒層を有す
屋外で使用される建築用材料では、製造段階で光触媒
層及びその下の中間層に多数の微細な亀裂が発生した
り、経時劣化や歪み、突起物の衝突や衝撃などによりこ
れらの膜の一部に欠けが生じた場合でも、屋外など波長
400nm程度以下の光の存在する環境下での長期使用
において、光触媒作用が下地の有機基材表面部にまで及
ぶことがなく、いつまでも光触媒層が有機基材上に安定
に保たれ、抗菌、防黴、防汚、脱臭、空気浄化などの作
用を長期間に亘って安定して発揮できる。また、光触媒
層を様々な有機基材表面に適用し、長期間に亘って光触
媒機能を維持することができるので、サッシ、パネル
材、網戸等の建築用外装材のみでなく、種成形材な
ど、幅広い分野で光触媒機能の利用が可能となる。
INDUSTRIAL APPLICABILITY As described above, in the building material having a photocatalyst layer according to the present invention to be used outdoors, a large number of fine cracks are generated in the photocatalyst layer and the intermediate layer below the photocatalyst layer during the production stage, and Even if a part of these films is chipped due to deterioration, distortion, collision of bumps, impact, etc., the photocatalytic action will not cause the photocatalytic action as a base in long-term use in an environment where light with a wavelength of about 400 nm or less exists, such as outdoors. The photocatalytic layer does not extend to the surface of the organic base material and the photocatalyst layer is kept stable on the organic base material forever, and the effects of antibacterial, antifungal, antifouling, deodorizing, air purification, etc. are stable over a long period of time. Can be demonstrated. Further, by applying the photocatalyst layer to a variety of organic substrate surface, it is possible to maintain the photocatalytic function for a long period of time, sash, panel material, not only building exterior material such as a screen door, each species profiled The photocatalytic function can be used in a wide range of fields.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光触媒層を有する建築用材料の基本的
な膜構造を示す概略部分断面図である。
FIG. 1 is a schematic partial cross-sectional view showing a basic film structure of a building material having a photocatalyst layer of the present invention.

【図2】製造後の建築用材料の光触媒層及び中間層に亀
裂が生じた状態を示す概略部分断面図である。
FIG. 2 is a schematic partial cross-sectional view showing a state in which cracks have occurred in the photocatalyst layer and the intermediate layer of the building material after manufacturing.

【図3】建築用材料の亀裂に存在する水を介して・OH
ラジカルが移動する状態を説明するための概略部分断面
図である。
[Fig. 3] ・ OH through water existing in cracks of building materials
FIG. 6 is a schematic partial cross-sectional view for explaining a state in which radicals move.

【図4】建築用材料の有機基材表面部の分解が発生した
状態を説明するための概略部分断面図である。
FIG. 4 is a schematic partial cross-sectional view for explaining a state where decomposition of an organic base material surface portion of a building material occurs.

【図5】建築用材料の有機基材表面部の分解がさらに進
んだ状態を説明するための概略部分断面図である。
FIG. 5 is a schematic partial cross-sectional view for explaining a state in which the surface portion of the organic base material of the building material is further decomposed.

【図6】実施例及び比較例で作製した試料の概略部分断
面図である。
FIG. 6 is a schematic partial cross-sectional view of samples prepared in Examples and Comparative Examples.

【図7】実施例及び比較例において劣化促進試験後の試
料の塗膜部の分解状態を示す概略部分断面図である。
FIG. 7 is a schematic partial cross-sectional view showing a decomposed state of a coating film portion of a sample after a deterioration acceleration test in Examples and Comparative Examples.

【符号の説明】[Explanation of symbols]

1 有機基材 2 中間層 3 光触媒層 4 亀裂 5 水 1 organic base material 2 Middle class 3 Photocatalyst layer 4 cracks 5 water

───────────────────────────────────────────────────── フロントページの続き (72)発明者 福井 英夫 富山県黒部市三日市4016 (72)発明者 番匠 信幸 富山県滑川市上小泉13 (72)発明者 中田 信之 富山県黒部市堀切1300 (72)発明者 相川 和夫 富山県滑川市上小泉526−2 (72)発明者 米屋 年将 富山県黒部市生地神区335−8 (72)発明者 佐藤 敏次 富山県魚津市天神野新552−2 (72)発明者 藤嶋 昭 神奈川県川崎市中原区中丸子710番地5 (72)発明者 橋本 和仁 神奈川県横浜市栄区飯島町2073番地2 ニューシティ本郷台D棟213号 (56)参考文献 特開 平7−171408(JP,A) 特開 平9−57911(JP,A) 特開 平9−313887(JP,A) 特開 平11−52487(JP,A) 特開 平11−52491(JP,A) 特開2000−1314(JP,A) 特開 平11−291408(JP,A) (58)調査した分野(Int.Cl.7,DB名) B32B 1/00 - 35/00 B01J 21/00 - 37/36 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hideo Fukui 4016 Mikkaichi, Kurobe City, Toyama Prefecture (72) Inventor Nobuyuki Bansaku 13 Kamikoizumi, Namerikawa City, Toyama Prefecture (72) Nobuyuki Nakata 1300, Horikiri, Kurobe City, Toyama Prefecture (72) Inventor Kazuo Aikawa 526-2 Kamikoizumi, Namerikawa-shi, Toyama Prefecture (72) Inventor Toshiji Yoneya 335-8 Doujin-ku, Kurobe-shi, Toyama Prefecture (72) Toshiji Sato Tenjinno Shin552-2, Uozu-shi, Toyama Prefecture ( 72) Inventor Akira Fujishima 710 Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 5 (72) Kazuhito Hashimoto 2073 Iijima-cho, Sakae-ku, Yokohama-shi, Kanagawa 2 New City Hongodai D Bldg. 213 (56) Reference Japanese Patent Laid-Open No. 7- 171408 (JP, A) JP 9-57911 (JP, A) JP 9-313887 (JP, A) JP 11-52487 (JP, A) JP 11-52491 (JP, A) JP 2000-1314 (JP, ) Patent flat 11-291408 (JP, A) (58 ) investigated the field (Int.Cl. 7, DB name) B32B 1/00 - 35/00 B01J 21/00 - 37/36

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基材の有機質表面と、塗料中に塗料基剤
に対し1〜100重量%の割合で粒径5nm〜1μmの
TiO 2 からなる光触媒粒子を分散させた薄膜から形成
され、平均膜厚が0.05〜10μmである表面層とし
ての光触媒層との間に、光触媒作用によって侵されない
材料の中間層を介在させ、上記有機質表面と光触媒層と
の間の距離を3.2〜10μmとすることを特徴とする
光触媒層を有する屋外で使用される建築用材料。
1. A paint base in an organic surface of a base material and in a paint.
In the ratio of 1 to 100% by weight, the particle size is 5 nm to 1 μm.
Formed from a thin film in which TiO 2 photocatalyst particles are dispersed
An intermediate layer of a material that is not affected by photocatalytic action is interposed between the photocatalyst layer as a surface layer having an average film thickness of 0.05 to 10 μm, and the distance between the organic surface and the photocatalyst layer is 3 mm. A building material used outdoors having a photocatalyst layer having a thickness of 2 to 10 μm .
【請求項2】 基材の有機質表面と、塗料中に塗料基剤2. A paint base in an organic surface of a base material and in a paint.
に対し1〜100重量%の割合で粒径5nm〜1μmのIn the ratio of 1 to 100% by weight, the particle size is 5 nm to 1 μm.
TiOTiO 22 からなる光触媒粒子を分散させた薄膜から形成Formed from a thin film in which photocatalytic particles consisting of
され、平均膜厚が0.05〜10μmである表面層としAs a surface layer having an average film thickness of 0.05 to 10 μm
ての光触媒層との間に、光触媒作用によって侵されないNot affected by photocatalytic action between all photocatalytic layers
材料からなり、亀裂もしくはピンホールを有する構造又Structures or cracks or pinholes made of material
は多孔質構造の中間層が介在し、上記有機質表面と光触Has an intermediate layer having a porous structure, and is exposed to the above-mentioned organic surface by light contact.
媒層との間の距離が3.2〜10μmであることを特徴The distance between the medium layer and the medium layer is 3.2 to 10 μm
とする光触媒層を有する屋外で使用される建築用材料。A building material used outdoors having a photocatalyst layer.
【請求項3】 前記有機質表面と光触媒層との間の距離
が3.5〜10μmであることを特徴とする請求項1
は2に記載の建築用材料。
3. A process according to claim 1 the distance between the organic surface and the photocatalyst layer is characterized in that it is a 3.5~10μm also
Is the building material described in 2 .
【請求項4】 前記中間層が無機薄膜又はシリコーン樹
脂もしくはポリテトラフルオロエチレンからなる有機薄
膜であることを特徴とする請求項1乃至3のいずれか一
に記載の建築用材料。
Wherein said intermediate layer is any one of claims 1 to 3, characterized in that an organic thin film made of an inorganic thin film or a silicone resin or polytetrafluoroethylene
The building material described in paragraph .
【請求項5】 前記有機質表面が、有機基材の表面又は
基材表面に形成された有機材料の被膜の表面であること
を特徴とする請求項1乃至4のいずれか一項に記載の建
築用材料。
5. The building according to claim 1, wherein the organic surface is a surface of an organic base material or a surface of a film of an organic material formed on the surface of the base material. Materials.
【請求項6】 前記光触媒層の平均膜厚が0.5〜10
μmであることを特徴とする請求項1乃至のいずれか
一項に記載の建築用材料。
6. The average thickness of the photocatalyst layer is 0.5 to 10.
Building material according to any one of claims 1 to 5, characterized in that it is [mu] m.
JP19364598A 1998-06-25 1998-06-25 Outdoor building materials with photocatalytic layers Expired - Lifetime JP3523787B2 (en)

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Application Number Priority Date Filing Date Title
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JP3523787B2 true JP3523787B2 (en) 2004-04-26

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