JP3517148B2 - Connection structure between dielectric waveguide line and high-frequency line conductor - Google Patents

Connection structure between dielectric waveguide line and high-frequency line conductor

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Publication number
JP3517148B2
JP3517148B2 JP05250899A JP5250899A JP3517148B2 JP 3517148 B2 JP3517148 B2 JP 3517148B2 JP 05250899 A JP05250899 A JP 05250899A JP 5250899 A JP5250899 A JP 5250899A JP 3517148 B2 JP3517148 B2 JP 3517148B2
Authority
JP
Japan
Prior art keywords
conductor
line
conductor layer
slot hole
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP05250899A
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Japanese (ja)
Other versions
JP2000252712A (en
Inventor
敏史 清原
弘志 内村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
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Priority to JP05250899A priority Critical patent/JP3517148B2/en
Publication of JP2000252712A publication Critical patent/JP2000252712A/en
Application granted granted Critical
Publication of JP3517148B2 publication Critical patent/JP3517148B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、主にマイクロ波や
ミリ波等の高周波信号を伝送する誘電体導波管線路と高
周波線路導体との接続構造に関し、特に、誘電体導波管
線路と高周波線路導体とをスロット孔を介して電磁的に
接続した接続構造に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a connection structure between a dielectric waveguide line that mainly transmits high-frequency signals such as microwaves and millimeter waves and a high-frequency line conductor, and particularly to a dielectric waveguide line. The present invention relates to a connection structure in which a high frequency line conductor is electromagnetically connected via a slot hole.

【0002】[0002]

【従来の技術】近年、マイクロ波帯やミリ波帯等の高周
波信号を用いた移動体通信および車間レーダ等の研究が
盛んに進められている。これらの高周波回路において高
周波信号を伝送するための高周波伝送線路としては、従
来より、同軸線路や方形導波管・誘電体導波管・マイク
ロストリップ線路等の線路導体等が知られている。
2. Description of the Related Art In recent years, research on mobile communication and inter-vehicle radar using high-frequency signals in the microwave band, millimeter wave band, etc. has been actively pursued. As high-frequency transmission lines for transmitting high-frequency signals in these high-frequency circuits, coaxial lines, line waveguides such as rectangular waveguides, dielectric waveguides, and microstrip lines have been conventionally known.

【0003】また、最近では、高周波回路を構成する配
線回路内には高周波信号を伝送するために上記の高周波
伝送線路やアンテナ素子等の種類の異なる高周波線路が
複数配置されるために、これら高周波線路相互間の接続
技術が必要となっており、これについて様々な構造の接
続構造が報告されている。
Further, recently, a plurality of high-frequency lines of different types such as the above-mentioned high-frequency transmission line and antenna element are arranged for transmitting a high-frequency signal in a wiring circuit which constitutes a high-frequency circuit. A connection technology between lines is required, and connection structures of various structures have been reported for this.

【0004】例えば、同軸線路と方形導波管または誘電
体導波管との接続構造では、同軸線路の信号線を導波管
内に挿入して高周波的に結合することによって接続され
る。
For example, in the connection structure of the coaxial line and the rectangular waveguide or the dielectric waveguide, the signal line of the coaxial line is inserted into the waveguide and is coupled by high-frequency coupling.

【0005】また、導波管とマイクロストリップ線路と
の接続構造では、例えば導波管とマイクロストリップ線
路とを直角に接続する場合には、導波管内にマイクロス
トリップ線路の形成された誘電体基板を挿入する構造が
用いられる。また、導波管とマイクロストリップ線路と
を同じ伝送方向で接続する場合には、導波管としてマイ
クロストリップ線路が接続される端部へ向かってその幅
を曲線状に狭くしたいわゆるリッジ導波管を用い、その
内部にマイクロストリップ線路の信号線を挿入する構造
や、導波管または誘電体導波管にスロット孔を設け、ス
ロット孔を介した電磁結合により接続する構造などが提
案されている。
Further, in the connection structure of the waveguide and the microstrip line, for example, when the waveguide and the microstrip line are connected at a right angle, a dielectric substrate in which the microstrip line is formed in the waveguide. Is used. When the waveguide and the microstrip line are connected in the same transmission direction, a so-called ridge waveguide in which the width of the waveguide is narrowed toward the end to which the microstrip line is connected is curved. A structure has been proposed in which a signal line of a microstrip line is inserted into the inside of the waveguide and a slot hole is provided in a waveguide or a dielectric waveguide, and connection is made by electromagnetic coupling through the slot hole. .

【0006】[0006]

【発明が解決しようとする課題】最近に至り、高周波回
路を構成する基板上または基板内に形成すると小型化の
面で有利となることから、多層配線基板内に誘電体導波
線路を積層技術によって形成することが望まれている。
例えば、特開平6−53711 号においては、誘電体基板を
一対の主導体層で挟み、さらに主導体層間を接続する2
列に配設されたビアホール群によって側壁を形成した導
波管線路が提案されている。この導波管線路は誘電体材
料の四方を一対の主導体層とビアホール群による擬似的
な導体壁で囲むことによって導体壁内の領域を信号伝送
用の線路としたものである。
Recently, since it is advantageous in terms of downsizing when formed on or in a substrate that constitutes a high-frequency circuit, a technique of laminating a dielectric waveguide line in a multilayer wiring substrate is proposed. Is desired to be formed by.
For example, in Japanese Patent Laid-Open No. 6-53711, a dielectric substrate is sandwiched between a pair of main conductor layers, and the main conductor layers are connected to each other.
A waveguide line has been proposed in which a sidewall is formed by a group of via holes arranged in rows. In this waveguide line, a region inside the conductor wall is used as a signal transmission line by surrounding the dielectric material on four sides with a pseudo conductor wall composed of a pair of main conductor layers and via holes.

【0007】このような多層配線基板の内部に配設され
る積層型の誘電体導波管線路を、主にマイクロ波および
ミリ波用のセラミック多層配線基板あるいは高周波用半
導体パッケージの伝送線路として用いる上では、他の高
周波線路との接続が必要になる。
The laminated dielectric waveguide line arranged inside such a multilayer wiring board is mainly used as a transmission line of a microwave or millimeter wave ceramic multilayer wiring board or a high frequency semiconductor package. Above, connection with other high frequency lines is required.

【0008】これに対し、本発明者は既に特開平10−10
7518号公報において、スロット孔による電磁的な結合を
用いた接続構造を提案している。これによれば、誘電体
を挟んで所定の間隔をもって少なくとも線路形成位置を
挟む上下面に一対の主導体層が平行に形成されている。
また、主導体層間には、それらを電気的に接続する貫通
導体群が設けられている。貫通導体群は、所定の間隔
(幅)をもって2列に配列され、かつ貫通導体のそれぞ
れは高周波信号の伝送方向、つまり線路形成方向に信号
波長の2分の1未満の間隔をもって形成されている。こ
れにより、主導体層と貫通導体群とで囲まれる領域が誘
電体導波管線路となる。また、主導体層の間には、誘電
体導波管線路の側壁を形成する貫通導体群と電気的に接
続され、主導体層と平行に形成された副導体層が形成さ
れており、線路の側壁を格子状として電磁波の遮蔽効果
を高めている。そして、主導体層のうち少なくとも一
方、ここでは上側の主導体層に、導体を形成しないスロ
ット孔を形成しており、このスロット孔を介して誘電体
導波管線路と他の例えばマイクロストリップ線路等の高
周波線路導体とを接続するものである。
On the other hand, the present inventor has already disclosed in Japanese Unexamined Patent Publication No. 10-10.
In Japanese Patent No. 7518, a connection structure using electromagnetic coupling by slot holes is proposed. According to this, a pair of main conductor layers are formed in parallel on the upper and lower surfaces that sandwich at least the line formation position with a predetermined interval sandwiching the dielectric.
Further, a through conductor group that electrically connects the main conductor layers is provided between the main conductor layers. The through conductor groups are arranged in two rows with a predetermined interval (width), and each of the through conductors is formed with an interval of less than ½ of the signal wavelength in the transmission direction of the high-frequency signal, that is, the line forming direction. . As a result, the region surrounded by the main conductor layer and the through conductor group becomes the dielectric waveguide line. In addition, between the main conductor layers, a sub-conductor layer that is electrically connected to the through conductor group that forms the sidewall of the dielectric waveguide line and is formed in parallel with the main conductor layer is formed. The side walls of the are made grid-shaped to enhance the electromagnetic wave shielding effect. Then, at least one of the main conductor layers, here the main conductor layer on the upper side, has a slot hole in which a conductor is not formed, and the dielectric waveguide line and other microstrip lines are formed through the slot hole. Etc. to connect with a high frequency line conductor such as.

【0009】この接続構造によれば、主導体層の一部に
スロット孔を形成することにより容易に他の高周波線路
導体と電磁結合することができ、しかも、かかる構造を
有する誘電体導波管線路およびそれを使用した多層配線
基板は、従来のセラミック積層技術を応用して容易に作
製することができる。
According to this connection structure, by forming a slot hole in a part of the main conductor layer, it is possible to easily electromagnetically couple with another high-frequency line conductor, and further, the dielectric waveguide having such a structure. The line and the multilayer wiring board using the line can be easily manufactured by applying the conventional ceramic lamination technique.

【0010】しかしながら、このような積層型の誘電体
導波管線路の特性インピーダンスとスロット孔7を介し
て接続される他の高周波線路導体との特性インピーダン
スとは通常は一致していない。そのため、かかる接続部
において特性インピーダンスの不一致による高周波信号
の反射が発生し、同時に透過特性も劣化するという問題
点があった。
However, the characteristic impedance of such a laminated dielectric waveguide line and the characteristic impedance of another high frequency line conductor connected through the slot hole 7 do not normally match. Therefore, there is a problem in that the high-frequency signal is reflected at the connection portion due to the mismatch of the characteristic impedance, and at the same time, the transmission characteristic is deteriorated.

【0011】本発明は上記従来技術の問題点に鑑みて案
出されたものであり、その目的は、積層型の誘電体導波
管線路と、他のマイクロストリップ線路やコプレーナ線
路等の高周波線路導体とをスロット孔を用いて電磁的に
結合し、両者の特性インピーダンスが異なるものであっ
ても良好な特性で接続することができる誘電体導波管線
路と高周波線路導体との接続構造を提供することにあ
る。
The present invention has been devised in view of the above problems of the prior art, and its object is to provide a laminated dielectric waveguide line and other high frequency lines such as microstrip lines and coplanar lines. Providing a connection structure between a dielectric waveguide line and a high-frequency line conductor that can be electromagnetically coupled to a conductor using a slot hole and can be connected with good characteristics even if they have different characteristic impedances To do.

【0012】[0012]

【課題を解決するための手段】本発明者は、上記の問題
点に対して検討を重ねた結果、誘電体導波管線路の主導
体層に形成したスロット孔から所定の位置に誘電体導波
管線路の短絡端を形成するとともに、この短絡端からス
ロット孔の下部に至る、高周波線路導体と平行に対向す
る内部導体層を主導体層間に形成することにより、この
内部導体層が特性インピーダンスの整合用導体層として
機能し、接続部において優れた透過特性が得られること
を見出した。
As a result of repeated studies on the above problems, the present inventor has found that the dielectric conductor is located at a predetermined position from the slot hole formed in the main conductor layer of the dielectric waveguide line. By forming a short-circuited end of the waveguide line and forming an internal conductor layer facing the high-frequency line conductor from the short-circuited end to the lower part of the slot hole in parallel with the main conductor layer, the internal conductor layer has a characteristic impedance. It has been found that it functions as a matching conductor layer of, and excellent transmission characteristics are obtained at the connection part.

【0013】すなわち、本発明の誘電体導波管線路と高
周波線路導体との接続構造は、誘電体基板を挟持する一
対の主導体層と、この主導体層間を高周波信号の伝送方
向に信号波長の2分の1未満の繰り返し間隔および所定
の幅で電気的に接続する2列の側壁用貫通導体群と、前
記主導体層間に平行に形成され、前記側壁用貫通導体群
をそれぞれ電気的に接続する一対の副導体層と、前記主
導体層の一方に前記側壁用貫通導体群に直交する方向に
長方形状に形成したスロット孔と、このスロット孔から
前記伝送方向に管内波長の略2分の1倍の位置において
前記主導体層間を前記幅方向に前記信号波長の2分の1
未満の繰り返し間隔で電気的に接続する端面用貫通導体
群と、この端面用貫通導体群および前記一対の副導体層
と電気的に接続された端面用副導体層と、前記端面用貫
通導体群に電気的に接続され、前記主導体層の他方から
前記管内波長の4分の1未満の高さの位置に平行に前記
スロット孔の下部まで形成された内部導体層とを具備し
て成る誘電体導波管線路に、前記スロット孔に対向配置
した高周波線路導体を電磁結合させたことを特徴とする
ものである。
That is, the connection structure of the dielectric waveguide line and the high frequency line conductor of the present invention has a pair of main conductor layers sandwiching the dielectric substrate and a signal wavelength in the transmission direction of the high frequency signal between the main conductor layers. Of the side wall through conductor groups of two rows electrically connected to each other with a repeating interval of less than 1/2 and a predetermined width, and the side wall through conductor groups are electrically formed in parallel with each other between the main conductor layers. A pair of sub conductor layers to be connected, a slot hole formed in one of the main conductor layers in a rectangular shape in a direction orthogonal to the side wall through conductor group, and from this slot hole, approximately two minutes of the guide wavelength in the transmission direction is divided. ½ of the signal wavelength in the width direction between the main conductor layers at a position of
An end face through conductor group electrically connected at a repeating interval of less than, an end face through conductor group electrically connected to the end face through conductor group and the pair of sub conductor layers, and the end face through conductor group An inner conductor layer that is electrically connected to the other main conductor layer and that is formed parallel to the position of less than a quarter of the guide wavelength from the other of the main conductor layers to the lower portion of the slot hole. A high-frequency line conductor, which is arranged to face the slot hole, is electromagnetically coupled to the body waveguide line.

【0014】また、本発明の誘電体導波管線路と高周波
線路導体との接続構造は、誘電体基板を挟持する一対の
主導体層と、この主導体層間を高周波信号の伝送方向に
信号波長の2分の1未満の繰り返し間隔および所定の幅
で電気的に接続する2列の側壁用貫通導体群と、前記主
導体層間に平行に形成され、前記側壁用貫通導体群をそ
れぞれ電気的に接続する一対の副導体層と、前記主導体
層の一方に前記側壁用貫通導体群に直交する方向に長方
形状に形成したスロット孔と、このスロット孔から前記
伝送方向に管内波長の略2分の1倍の位置において前記
主導体層間を前記幅方向に前記信号波長の2分の1未満
の繰り返し間隔で電気的に接続する端面用貫通導体群
と、この端面用貫通導体群および前記一対の副導体層と
電気的に接続された端面用副導体層と、一端が前記端面
用貫通導体群に電気的に接続され、前記主導体層に平行
に前記スロット孔の下部まで形成された内部導体層と、
この内部導体層の他端と前記主導体層の他方とを前記管
内波長の2分の1未満の繰り返し間隔で電気的に接続す
る内部貫通導体群とを具備して成る誘電体導波管線路
に、前記スロット孔に対向配置した高周波線路導体を電
磁結合させたことを特徴とするものである。
Further, the connection structure of the dielectric waveguide line and the high frequency line conductor of the present invention has a pair of main conductor layers sandwiching the dielectric substrate and a signal wavelength in the transmission direction of the high frequency signal between the main conductor layers. Of the side wall through conductor groups of two rows electrically connected to each other with a repeating interval of less than 1/2 and a predetermined width, and the side wall through conductor groups are electrically formed in parallel with each other between the main conductor layers. A pair of sub conductor layers to be connected, a slot hole formed in one of the main conductor layers in a rectangular shape in a direction orthogonal to the side wall through conductor group, and from this slot hole, approximately two minutes of the guide wavelength in the transmission direction is divided. End face through conductor group for electrically connecting the main conductor layers in the width direction at a repeating interval of less than ½ of the signal wavelength, and the end face through conductor group and the pair of Electrically connected to the sub-conductor layer A surface for the sub conductive layer, one end is electrically connected to the end face through-conductor group, and the internal conductor layer formed to the bottom of the parallel said slot hole in the main conductor layer,
A dielectric waveguide line comprising an inner penetrating conductor group for electrically connecting the other end of the inner conductor layer and the other of the main conductor layers at a repeating interval of less than one half of the guide wavelength. In addition, the high-frequency line conductor arranged to face the slot hole is electromagnetically coupled.

【0015】本発明の誘電体導波管線路と高周波線路導
体との接続構造によれば、誘電体導波管線路のスロット
孔から所定の位置に短絡端を形成するとともに、この短
絡端からスロット孔の下部までの間の所定位置に、主導
体層間と平行に高周波線路導体と対向させて内部導体層
を形成し、また、その端部を主導体層と電気的に接続す
る内部貫通導体群を形成したことにより、この部分の誘
電体導波管線路の実効的な厚みが変化することとなり、
それにより、高周波線路導体との接続部の特性インピー
ダンスが変化して、誘電体導波管線路と高周波線路導体
との特性インピーダンスマッチングをとることが可能と
なる。そして、両者の特性インピーダンスを整合させる
ことにより、接続部における高周波信号の反射の発生を
充分に低減させて良好な透過特性が得られる接続構造と
なる。しかも、このような整合器として機能する内部導
体層ならびに内部貫通導体群は、従来のセラミック積層
技術や同時焼成技術により、誘電体導波管線路と一体的
に同時に製作することができ、量産性にも優れている。
According to the connection structure of the dielectric waveguide line and the high-frequency line conductor of the present invention, the short-circuit end is formed at a predetermined position from the slot hole of the dielectric waveguide line, and the slot is formed from this short-circuit end. An internal penetrating conductor group that forms an internal conductor layer at a predetermined position between the lower part of the hole and in parallel with the main conductor layer so as to face the high-frequency line conductor and electrically connects the end portion to the main conductor layer. By forming the, the effective thickness of the dielectric waveguide line in this part changes,
As a result, the characteristic impedance of the connection portion with the high-frequency line conductor changes, and the characteristic impedance matching between the dielectric waveguide line and the high-frequency line conductor can be achieved. Then, by matching the characteristic impedances of the both, the connection structure can sufficiently reduce the occurrence of reflection of the high frequency signal at the connection portion and obtain good transmission characteristics. Moreover, the internal conductor layer and the group of internal through conductors that function as such a matching unit can be manufactured simultaneously with the dielectric waveguide line integrally with the conventional ceramic lamination technology and co-firing technology. Is also excellent.

【0016】[0016]

【発明の実施の形態】以下、本発明の誘電体導波管線路
と高周波線路導体との接続構造について図面を参照しな
がら説明する。
BEST MODE FOR CARRYING OUT THE INVENTION A connection structure of a dielectric waveguide line and a high frequency line conductor of the present invention will be described below with reference to the drawings.

【0017】図1は、本発明の誘電体導波管線路と高周
波線路導体との接続構造の実施の形態の一例を示す部分
破断斜視図である。図1において1は誘電体基板、2お
よび3は誘電体基板1を上下から挟持する一対の主導体
層、4は信号伝送方向に信号波長の2分の1未満の繰り
返し間隔で、かつ信号伝送方向と直交する方向に所定の
幅で一対の主導体層2・3間を電気的に接続するように
形成された2列の側壁用貫通導体群である。なお、内部
の構造が分かるように、主導体層2の一部は破断して示
している。また、5は側壁用貫通導体群4の各列を形成
する貫通導体同士を電気的に接続する、主導体層2・3
と平行に形成された副導体層である。6はこれら一対の
主導体層2・3と側壁用貫通導体群4および副導体層5
により形成される誘電体導波管線路である。
FIG. 1 is a partially cutaway perspective view showing an example of an embodiment of a connection structure between a dielectric waveguide line and a high frequency line conductor according to the present invention. In FIG. 1, 1 is a dielectric substrate, 2 and 3 are a pair of main conductor layers that sandwich the dielectric substrate 1 from above and below, 4 is a signal transmission direction at a repeating interval of less than one half of a signal wavelength, and signal transmission. It is a two-row side wall through conductor group formed so as to electrically connect a pair of main conductor layers 2 and 3 with a predetermined width in a direction orthogonal to the direction. Note that a part of the main conductor layer 2 is shown in a cutaway manner so that the internal structure can be seen. Further, 5 is a main conductor layer 2/3 which electrically connects the through conductors forming each row of the sidewall through conductor group 4.
Is a sub-conductor layer formed in parallel with. Reference numeral 6 denotes the pair of main conductor layers 2 and 3, the sidewall through conductor group 4 and the sub conductor layer 5.
It is a dielectric waveguide line formed by.

【0018】このように、所定の厚みの誘電体基板1を
挟持する少なくとも伝送線路形成位置を挟む上下面に一
対の主導体層2・3が形成されるとともに、2列の側壁
用貫通導体群4が形成されており、この一対の主導体層
2・3と側壁用貫通導体群4とで囲まれた領域に対して
さらに副導体層5を形成することにより、誘電体導波管
線路6の内部から見るとその側壁は側壁用貫通導体群4
と副導体層5とによって細かな格子状になり、様々な方
向の電磁波が遮蔽される。
As described above, the pair of main conductor layers 2 and 3 are formed on the upper and lower surfaces sandwiching at least the transmission line forming position, which sandwiches the dielectric substrate 1 having a predetermined thickness, and two rows of sidewall through conductor groups. 4 is formed. By forming a sub conductor layer 5 in a region surrounded by the pair of main conductor layers 2 and 3 and the sidewall through conductor group 4, the dielectric waveguide line 6 is formed. Seen from the inside of the side wall, the side walls are
The sub-conductor layer 5 and the sub-conductor layer 5 form a fine grid, and shield electromagnetic waves in various directions.

【0019】7は上側の主導体層2に形成したスロット
孔であり、このスロット孔7に対して上側の主導体層2
に平行に配設された高周波線路導体8を対向させて、誘
電体導波管線路6と高周波線路導体8とがスロット孔7
を介して電磁結合することにより接続され、高周波信号
が伝達されることとなる。
Reference numeral 7 denotes a slot hole formed in the upper main conductor layer 2, and the upper main conductor layer 2 with respect to the slot hole 7.
The high-frequency line conductors 8 arranged in parallel with each other face each other, and the dielectric waveguide line 6 and the high-frequency line conductor 8 are connected to each other by the slot holes 7.
A high-frequency signal is transmitted by electromagnetically coupling via.

【0020】なお、この例では高周波線路導体8に対す
る接地面は誘電体導波管線路6の主導体層2の一部で兼
ねた構成となっている。この場合、高周波線路導体8と
主導体層2との間は、空気であっても誘電体であっても
よい。また、高周波線路導体8は、裏面に接地層が形成
された別の誘電体基板の上に形成されたもの(マイクロ
ストリップ線路)でもよく、誘電体基板の表面に同一面
接地層とともに形成されたもの(コプレーナ線路)でも
よい。
In this example, a part of the main conductor layer 2 of the dielectric waveguide line 6 also serves as a ground plane for the high frequency line conductor 8. In this case, the space between the high frequency line conductor 8 and the main conductor layer 2 may be air or a dielectric. Further, the high-frequency line conductor 8 may be one formed on another dielectric substrate having a ground layer formed on the back surface (microstrip line), or one formed on the surface of the dielectric substrate together with the same-plane ground layer. (Coplanar railway) may be used.

【0021】9は、誘電体導波管線路6のスロット孔7
から高周波信号の伝送方向に管内波長λgの略2分の1
倍(〜λg/2)の位置に、伝送方向の直交方向に信号
波長の2分の1未満の間隔で主導体層2・3間を電気的
に接続して形成された端面用貫通導体群である。また、
10は主導体層2・3間に主導体層2・3と平行に形成さ
れ、副導体層5および端面用貫通導体群9と電気的に接
続された端面用副導体層である。これら端面用貫通導体
群9と端面用副導体層10とにより、誘電体導波管線路6
のスロット孔7から〜λg/2の位置に、誘電体導波管
線路6の短絡端を形成している。
Reference numeral 9 denotes a slot hole 7 of the dielectric waveguide line 6.
To half of the guide wavelength λg in the transmission direction of the high frequency signal
A group of end face through conductors formed by electrically connecting between the main conductor layers 2 and 3 at a position of double (~ λg / 2) at intervals of less than one-half of the signal wavelength in the direction orthogonal to the transmission direction. Is. Also,
Reference numeral 10 denotes an end face sub-conductor layer which is formed between the main conductor layers 2 and 3 in parallel with the main conductor layers 2 and 3 and is electrically connected to the sub conductor layer 5 and the end face through conductor group 9. By the end face through conductor group 9 and the end face sub-conductor layer 10, the dielectric waveguide line 6 is formed.
The short-circuited end of the dielectric waveguide line 6 is formed at a position ˜λg / 2 from the slot hole 7.

【0022】そして、11は、下側の主導体層3から高周
波信号の管内波長の4分の1未満の高さの位置に、主導
体層2・3と平行に高周波線路導体8に対向させて、そ
の一端が端面用貫通導体群9に電気的に接続され、他端
がスロット孔7の下部に至る内部導体層である。このよ
うに、誘電体導波管線路6の短絡端を形成するととも
に、その短絡端からスロット孔7の下部に至る内部導体
層11を形成したことにより、この内部導体層11の下側す
なわち主導体層3との間には高周波信号が侵入すること
ができず、スロット孔7から短絡端までの誘電体導波管
線路6の厚みを薄くしたことと同様の結果となる。そこ
で、この内部導体層11を形成する高さを調整し、また幅
や長さを調整することにより、接続部において誘電体導
波管線路6と高周波線路導体8とのインピーダンスをマ
ッチングさせることができ、接続部における伝送信号の
反射を充分に低減させるとともに良好な透過特性が得ら
れるものとなる。
Reference numeral 11 is opposed to the high-frequency line conductor 8 in parallel with the main conductor layers 2 and 3 at a position which is less than a quarter of the guide wavelength of the high-frequency signal from the lower main conductor layer 3. The inner conductor layer has one end electrically connected to the end face through conductor group 9 and the other end reaching the lower portion of the slot hole 7. In this way, by forming the short-circuited end of the dielectric waveguide line 6 and forming the internal conductor layer 11 extending from the short-circuited end to the lower part of the slot hole 7, the lower side of the internal conductor layer 11, that is, the lead. A high-frequency signal cannot penetrate into the body layer 3, and the same result can be obtained by reducing the thickness of the dielectric waveguide line 6 from the slot hole 7 to the short-circuit end. Therefore, by adjusting the height of forming the inner conductor layer 11 and adjusting the width and the length, the impedances of the dielectric waveguide line 6 and the high frequency line conductor 8 can be matched at the connection portion. As a result, the reflection of the transmission signal at the connection portion can be sufficiently reduced, and good transmission characteristics can be obtained.

【0023】このような図1に示す構成の本発明の誘電
体導波管線路と高周波線路導体との接続構造は、誘電体
基板を上下から挟持する一対の主導体層と、高周波信号
の伝送方向に信号波長の2分の1未満の繰り返し間隔
で、かつ前記伝送方向と直交する方向に所定の幅で前記
主導体層間を電気的に接続して形成された2列の側壁用
貫通導体群と、前記主導体層間に主導体層と平行に形成
され、前記側壁用貫通導体群と電気的に接続された副導
体層とを具備して成り、前記主導体層、側壁用貫通導体
群および副導体層で囲まれた領域によって高周波信号を
伝送する誘電体導波管線路に対して、上側の前記主導体
層に平行に配設された高周波信号を伝送する高周波線路
導体を上側の前記主導体層に前記側壁用貫通導体群に直
交する方向に長方形状に形成したスロット孔を介して対
向させて電磁的に結合させるとともに、前記スロット孔
から前記伝送方向に管内波長の略2分の1倍の位置に、
伝送方向の直交方向に前記信号波長の2分の1未満の間
隔で前記主導体層間を電気的に接続して形成された端面
用貫通導体群と、前記主導体層間に主導体層と平行に形
成され、前記副導体層および前記端面用貫通導体群と電
気的に接続された端面用副導体層とから成る短絡端を形
成し、かつ、下側の前記主導体層から前記管内波長の4
分の1未満の高さの位置に前記主導体層と平行に前記高
周波線路導体に対向させて、一端が前記端面用貫通導体
群に電気的に接続され他端が前記スロット孔の下部に至
る内部導体層を形成したものである。
The connection structure between the dielectric waveguide line and the high frequency line conductor of the present invention having the structure shown in FIG. 1 has a pair of main conductor layers that sandwich the dielectric substrate from above and below, and a high frequency signal transmission. Group of two side wall through conductors formed by electrically connecting the main conductor layers with a predetermined interval in the direction and a predetermined width in the direction orthogonal to the transmission direction. And a sub conductor layer formed in parallel with the main conductor layer between the main conductor layers and electrically connected to the sidewall through conductor group, the main conductor layer, the sidewall through conductor group, and With respect to the dielectric waveguide line that transmits a high frequency signal by the area surrounded by the sub conductor layer, the high frequency line conductor that transmits a high frequency signal is disposed parallel to the main conductor layer on the upper side, Rectangle in the body layer in the direction orthogonal to the side wall through conductor group Through the formed slot holes are opposed causes electromagnetically coupled, to 1 times the position of approximately half of the transmission direction in the guide wavelength from the slot hole,
A group of end face through conductors formed by electrically connecting the main conductor layers at intervals of less than ½ of the signal wavelength in a direction orthogonal to the transmission direction, and between the main conductor layers in parallel with the main conductor layer. A short-circuited end formed of the sub-conductor layer and the end-face sub-conductor layer electrically connected to the end-face penetrating conductor group is formed, and the in-tube wavelength of 4 from the lower main conductor layer is formed.
One of the ends is electrically connected to the end face through conductor group and the other end is located below the slot hole so as to face the high-frequency line conductor in parallel with the main conductor layer at a position less than one-half the height. The internal conductor layer is formed.

【0024】なお、図1において内部導体層11は一端を
端面用副導体層10と一体化させ、両側を副導体層5と一
体化させて形成しているが、内部導体層11を形成する高
さは副導体層5・10と合わせる必要はなく、また、幅も
少なくとも高周波線路導体8に対向する幅があればよ
い。
In FIG. 1, one end of the inner conductor layer 11 is formed integrally with the end face sub-conductor layer 10 and both sides thereof are formed together with the sub-conductor layer 5, but the inner conductor layer 11 is formed. It is not necessary to match the height with the sub conductor layers 5 and 10, and the width may be at least the width facing the high frequency line conductor 8.

【0025】例えば、図1に示す例では誘電体基板1を
3層構造として誘電体導波管線路6を構成し、1層目の
誘電体基板1の上に内部導体層11を形成しているが、誘
電体基板の各層の厚みを調整したり積層数を調整するこ
とにより、任意の高さの位置に内部導体層11を設けるこ
とができる。
For example, in the example shown in FIG. 1, the dielectric substrate 1 has a three-layer structure to form the dielectric waveguide 6, and the inner conductor layer 11 is formed on the first dielectric substrate 1. However, by adjusting the thickness of each layer of the dielectric substrate or adjusting the number of laminated layers, the internal conductor layer 11 can be provided at a position of arbitrary height.

【0026】また、内部導体層11の長さとしては、短絡
端からスロット孔7の下部に至るものとして設定される
が、その他端がスロット孔7の中央から短絡端と反対側
に約λg/8の位置にくるように形成することが望まし
い。
The length of the inner conductor layer 11 is set so as to extend from the short-circuited end to the lower part of the slot hole 7, and the other end is about λg / from the center of the slot hole 7 to the side opposite to the short-circuited end. It is desirable to form so as to come to the position of 8.

【0027】2列の側壁用貫通導体群4は、高周波信号
の伝送方向すなわち線路形成方向に信号波長の2分の1
未満の所定の繰り返し間隔で、かつ伝送方向と直交する
方向に所定の一定の間隔(幅)をもって形成されてい
る。これにより、この誘電体導波管線路6における電気
的な側壁を形成している。
The two rows of the side wall through conductor groups 4 have a half of the signal wavelength in the transmission direction of the high frequency signal, that is, in the line forming direction.
It is formed with a predetermined repeating interval of less than and a predetermined constant interval (width) in the direction orthogonal to the transmission direction. As a result, the electrical side wall of the dielectric waveguide line 6 is formed.

【0028】ここで、誘電体基板1の厚みすなわち一対
の主導体層2・3間の間隔に対する制限は特にないが、
シングルモードで用いる場合には側壁用貫通導体群4の
幅に対して2分の1程度または2倍程度とすることがよ
い。図1の例では誘電体導波管線路6のH面に当たる部
分が主導体層2・3で、E面に当たる部分が側壁用貫通
導体群4および副導体層5でそれぞれ形成される。ま
た、側壁用貫通導体群4の幅に対して誘電体基板1の厚
みを2倍程度とすれば、誘電体導波管線路6のE面に当
たる部分が主導体層2・3で、H面に当たる部分が側壁
用貫通導体群4および副導体層5でそれぞれ形成される
こととなる。
Here, there is no particular limitation on the thickness of the dielectric substrate 1, that is, the distance between the pair of main conductor layers 2 and 3,
When used in the single mode, the width is preferably about ½ or twice the width of the sidewall through conductor group 4. In the example of FIG. 1, the portion corresponding to the H surface of the dielectric waveguide line 6 is formed of the main conductor layers 2 and 3, and the portion corresponding to the E surface is formed of the sidewall through conductor group 4 and the sub conductor layer 5. If the thickness of the dielectric substrate 1 is about twice the width of the sidewall through conductor group 4, the portion corresponding to the E surface of the dielectric waveguide line 6 is the main conductor layers 2 and 3 and the H surface. The portions corresponding to are formed by the sidewall through conductor group 4 and the sub conductor layer 5, respectively.

【0029】また、貫通導体の繰り返し間隔が信号波長
の2分の1未満の間隔に設定されることで、側壁用貫通
導体群4により電気的な壁が形成できる。この間隔は、
望ましくは信号波長の4分の1未満である。
By setting the repeating interval of the through conductors to be less than half the signal wavelength, the side wall through conductor group 4 can form an electrical wall. This interval is
It is preferably less than a quarter of the signal wavelength.

【0030】平行に配置された一対の主導体層2・3間
にはTEM波が伝播できるため、側壁用貫通導体群4の
各列における貫通導体の繰り返し間隔が信号波長λの2
分の1(λ/2)よりも大きいと、その隙間がスロット
として作用して電磁波が漏れるので、この誘電体導波管
線路6に電磁波を給電しても電磁波は側壁用貫通導体群
4の間から漏れてしまい、ここで作られる疑似的な導波
管線路に沿って伝播しない。しかし、側壁用貫通導体群
4の繰り返し間隔がλ/2よりも小さいと、電気的な側
壁を形成することとなって電磁波は誘電体導波管線路6
に対して垂直方向に伝播することができず、反射しなが
ら誘電体導波管線路6の信号伝送方向に伝播される。そ
の結果、図1のような構成によれば、一対の主導体層2
・3と2列の側壁用貫通導体群4および副導体層5とに
よって囲まれる領域が誘電体導波管線路6となる。
Since the TEM wave can propagate between the pair of main conductor layers 2 and 3 arranged in parallel, the repetition interval of the through conductors in each row of the sidewall through conductor group 4 is 2 of the signal wavelength λ.
If it is larger than 1 / (λ / 2), the gap acts as a slot and the electromagnetic wave leaks. Therefore, even if the electromagnetic wave is fed to this dielectric waveguide 6, the electromagnetic wave is not generated by the side wall through conductor group 4. It leaks from the space and does not propagate along the pseudo waveguide line created here. However, if the repetition interval of the side wall through conductor groups 4 is smaller than λ / 2, an electric side wall is formed, and the electromagnetic wave causes the dielectric waveguide line 6 to pass.
It is not possible to propagate in the direction perpendicular to, and is propagated in the signal transmission direction of the dielectric waveguide 6 while reflecting. As a result, according to the configuration as shown in FIG. 1, the pair of main conductor layers 2
A region surrounded by 3 and two rows of the side wall through conductor groups 4 and the sub conductor layer 5 becomes the dielectric waveguide line 6.

【0031】そして、この誘電体導波管線路6中を伝播
する高周波信号は、その一部または全部が、主導体層2
に形成されたスロット孔7を介してスロット孔7の上部
に対向して配置される様々な高周波線路導体8と電磁的
に結合して伝播することとなる。
The high-frequency signal propagating in the dielectric waveguide 6 is partially or entirely part of the main conductor layer 2.
Through the slot hole 7 formed in the above, it propagates by being electromagnetically coupled to various high frequency line conductors 8 arranged facing the upper portion of the slot hole 7.

【0032】図1に示した態様では側壁用貫通導体群4
は2列に形成したが、この側壁用貫通導体群4を4列あ
るいは6列に配設して、側壁用貫通導体群4による疑似
的な導体壁を2重・3重に形成することにより導体壁か
らの電磁波の漏れをより効果的に防止することもでき
る。
In the embodiment shown in FIG. 1, the sidewall through conductor group 4 is used.
Is formed in two rows. By arranging the side wall through conductor groups 4 in four rows or six rows, and forming the pseudo conductor walls by the side wall through conductor groups 4 in double or triple layers. It is also possible to more effectively prevent leakage of electromagnetic waves from the conductor wall.

【0033】このような誘電体導波管線路6によれば、
誘電体導波管による伝送線路となるので、誘電体基板1
の比誘電率をεr とするとその導波管サイズは通常の導
波管の1/√εr の大きさになる。従って、誘電体基板
1を構成する材料の比誘電率εr を大きいものとするほ
ど導波管サイズを小さくすることができて高周波回路の
小型化を図ることができ、高密度に配線が形成される多
層配線基板または半導体素子収納用パッケージあるいは
車間レーダの伝送線路としても利用可能な大きさの誘電
体導波管線路6とすることができる。
According to such a dielectric waveguide line 6,
Since the transmission line is a dielectric waveguide, the dielectric substrate 1
When the relative permittivity of is ε r , the waveguide size is 1 / √ε r of a normal waveguide. Therefore, the larger the relative permittivity ε r of the material forming the dielectric substrate 1 is, the smaller the size of the waveguide can be, and the size of the high frequency circuit can be reduced. It is possible to use the dielectric waveguide line 6 of a size that can be used as a transmission line for a multilayer wiring board, a package for housing semiconductor elements, or an inter-vehicle radar.

【0034】なお、側壁用貫通導体群4を構成する貫通
導体は前述のように信号波長の2分の1未満の繰り返し
間隔で配設されており、この繰り返し間隔は良好な伝送
特性を実現するためには一定の繰り返し間隔とすること
が望ましいが、信号波長の2分の1未満の間隔であれ
ば、適宜変化させたりいくつかの値を組み合わせたりし
てもよい。
As described above, the through conductors forming the sidewall through conductor group 4 are arranged at a repeating interval of less than one half of the signal wavelength, and this repeating interval realizes good transmission characteristics. For this purpose, it is desirable to set a constant repetition interval, but if the interval is less than ½ of the signal wavelength, it may be appropriately changed or some values may be combined.

【0035】このような誘電体導波管線路6を構成する
誘電体基板1としては、誘電体として機能し高周波信号
の伝送を妨げることのない特性を有するものであればと
りわけ限定するものではないが、伝送線路を形成する際
の精度および製造の容易性の点からは、誘電体基板1は
セラミックスから成ることが望ましい。
The dielectric substrate 1 constituting such a dielectric waveguide line 6 is not particularly limited as long as it functions as a dielectric and has characteristics that do not hinder the transmission of high frequency signals. However, it is desirable that the dielectric substrate 1 be made of ceramics from the viewpoint of accuracy and ease of manufacturing when forming the transmission line.

【0036】このようなセラミックスとしてはこれまで
様々な比誘電率を持つセラミックスが知られているが、
本発明に係る誘電体導波管線路によって高周波信号を伝
送するためには常誘電体であることが望ましい。これ
は、一般に強誘電体セラミックスは高周波領域では誘電
損失が大きく伝送損失が大きくなるためである。従っ
て、誘電体基板1の比誘電率εr は4〜100 程度が適当
である。
Ceramics having various relative dielectric constants have been known as such ceramics.
In order to transmit a high frequency signal by the dielectric waveguide line according to the present invention, a paraelectric material is desirable. This is because ferroelectric ceramics generally have large dielectric loss and high transmission loss in the high frequency region. Therefore, it is suitable that the dielectric constant ε r of the dielectric substrate 1 is about 4 to 100.

【0037】また、一般に多層配線基板や半導体素子収
納用パッケージあるいは車間レーダに形成される配線層
の線幅は最大でも1mm程度であることから、比誘電率
が100 の材料を用い、上部がH面すなわち磁界が上側の
面に平行に巻く電磁界分布になるように用いた場合は、
用いることのできる最小の周波数は15GHzと算出さ
れ、マイクロ波帯の領域でも利用可能となる。
In general, the wiring layer formed on the multilayer wiring board, the package for storing semiconductor elements, or the inter-vehicle radar has a maximum line width of about 1 mm. Therefore, a material having a relative permittivity of 100 is used and the upper portion is H. When used so that the surface, that is, the magnetic field, has an electromagnetic field distribution that winds parallel to the upper surface,
The minimum frequency that can be used is calculated as 15 GHz, and it can be used in the microwave band region.

【0038】一方、一般的に誘電体基板1として用いら
れる樹脂からなる誘電体は、比誘電率εr が2程度であ
るため、線幅が1mmの場合は約100 GHz以上でない
と利用することができないものとなる。
On the other hand, since a dielectric made of resin which is generally used as the dielectric substrate 1 has a relative dielectric constant ε r of about 2, when the line width is 1 mm, it should be used unless it is about 100 GHz or more. Will not be possible.

【0039】また、このような常誘電体セラミックスの
中にはアルミナやシリカ等のように誘電正接が非常に小
さなものが多いが、全ての常誘電体セラミックスが利用
可能であるわけではない。誘電体導波管線路の場合は導
体による損失はほとんどなく、信号伝送時の損失のほと
んどは誘電体による損失である。その誘電体による損失
α(dB/m)は次のように表わされる。 α=27.3×tanδ/〔λ/{1−(λ/λc )2
1/2 〕 式中、tanδ:誘電体の誘電正接 λ :誘電体中の波長 λc :遮断波長 規格化された矩形導波管(WRJシリーズ)形状に準ず
ると、上式中の{1−(λ/λc )2 1/2 は0.75程度
である。
Although many paraelectric ceramics such as alumina and silica have a very small dielectric loss tangent, not all paraelectric ceramics can be used. In the case of the dielectric waveguide line, there is almost no loss due to the conductor, and most of the loss during signal transmission is due to the dielectric. The loss α (dB / m) due to the dielectric is expressed as follows. α = 27.3 × tan δ / [λ / {1- (λ / λc) 2 }
1/2 ] In the formula, tan δ: dielectric loss tangent of the dielectric λ: wavelength in the dielectric λc: cutoff wavelength According to the standardized rectangular waveguide (WRJ series) shape, {1- ( λ / λc) 2 } 1/2 is about 0.75.

【0040】従って、実用に供し得る伝送損失である−
100 dB/m以下にするには、次の関係が成立するよう
に誘電体を選択することが必要である。 f×εr 1/2 ×tanδ≦0.8 式中、fは使用する高周波信号の周波数(GHz)であ
る。
Therefore, the transmission loss can be put to practical use-
In order to achieve 100 dB / m or less, it is necessary to select a dielectric material so that the following relationship holds. f × ε r 1/2 × tan δ ≦ 0.8 In the formula, f is the frequency (GHz) of the high frequency signal used.

【0041】このような誘電体基板1としては、例えば
アルミナセラミックスや窒化アルミニウムセラミックス
・ガラスセラミックス等がある。これらによる誘電体基
板1は、例えばセラミックス原料粉末に適当な有機溶剤
・溶媒を添加混合して泥漿状になすとともに、これを従
来周知のドクターブレード法やカレンダーロール法等を
採用してシート状となすことによって複数枚のセラミッ
クグリーンシートを得て、しかる後、これらセラミック
グリーンシートの各々に適当な打ち抜き加工を施すとと
もにこれらを積層し、アルミナセラミックスの場合は15
00〜1700℃、ガラスセラミックスの場合は850 〜1000
℃、窒化アルミニウムセラミックスの場合は1600〜1900
℃の温度で焼成することによって製作される。
Examples of such a dielectric substrate 1 include alumina ceramics, aluminum nitride ceramics and glass ceramics. The dielectric substrate 1 made of these is formed into a slurry form by adding and mixing an appropriate organic solvent / solvent to the ceramic raw material powder, and is formed into a sheet form by adopting the conventionally known doctor blade method, calendar roll method, or the like. By doing so, a plurality of ceramic green sheets are obtained, and then each of these ceramic green sheets is appropriately punched and laminated, and in the case of alumina ceramics, 15
00 to 1700 ℃, 850 to 1000 for glass ceramics
° C, 1600 to 1900 for aluminum nitride ceramics
It is manufactured by firing at a temperature of ℃.

【0042】また、一対の主導体層2・3および副導体
層5は、例えば誘電体基板1がアルミナセラミックスか
ら成る場合には、タングステン等の金属粉末に適当なア
ルミナ・シリカ・マグネシア等の酸化物や有機溶剤・溶
媒等を添加混合してペースト状にしたものを用いて厚膜
印刷法により少なくとも伝送線路を完全に覆うようにセ
ラミックグリーンシート上に印刷し、しかる後、約1600
℃の高温で焼成し、厚み5〜15μm程度となるようにし
て形成する。なお、金属粉末としては、ガラスセラミッ
クスの場合は銅・金・銀が、窒化アルミニウムセラミッ
クスの場合はタングステン・モリブデンが好適である。
また、主導体層2・3および副導体層5の厚みは一般的
に5〜15μm程度とされる。
Further, the pair of main conductor layers 2 and 3 and sub conductor layer 5 are, for example, when the dielectric substrate 1 is made of alumina ceramics, an oxide of alumina, silica, magnesia, etc. suitable for metal powder such as tungsten. Using a thick film printing method, a paste is prepared by adding and mixing materials, organic solvents, solvents, etc., and printing on a ceramic green sheet so as to completely cover at least the transmission line, and then about 1600
It is fired at a high temperature of ℃ to form a thickness of about 5 to 15 μm. As the metal powder, copper / gold / silver is suitable for glass ceramics, and tungsten / molybdenum is suitable for aluminum nitride ceramics.
The thickness of the main conductor layers 2 and 3 and the sub conductor layer 5 is generally about 5 to 15 μm.

【0043】また、側壁用貫通導体群4を構成する貫通
導体は、例えばビアホール導体やスルーホール導体等に
より形成すればよい。その断面形状は製作が容易な円形
の他、矩形や菱形等の多角形であってもよい。これら貫
通導体は、例えばセラミックグリーンシートに打ち抜き
加工を施して作製した貫通孔に主導体層2・3と同様の
金属ペーストを埋め込み、しかる後、誘電体基板1と同
時に焼成して形成する。なお、貫通導体は直径50〜300
μmが適当である。また、上側の主導体層2に形成する
スロット孔7は、これに対向して主導体層2の上部に主
導体層2と平行に配設される高周波線路導体8と誘電体
導波管線路6とを電磁的に結合して高周波信号の接続を
行なうものである。このスロット孔7を形成する位置や
形状・大きさ等は、次のように設定される。
The through conductors forming the side wall through conductor group 4 may be formed of, for example, via hole conductors or through hole conductors. The cross-sectional shape may be a polygon such as a rectangle or a rhombus, as well as a circle which is easy to manufacture. These penetrating conductors are formed by, for example, embedding a metal paste similar to that of the main conductor layers 2 and 3 in a penetrating hole formed by punching a ceramic green sheet, and then firing the dielectric substrate 1 at the same time. The through conductor has a diameter of 50 to 300.
μm is suitable. Further, the slot hole 7 formed in the upper main conductor layer 2 is provided with a high frequency line conductor 8 and a dielectric waveguide line which are arranged facing the slot hole 7 in parallel with the main conductor layer 2. 6 is electromagnetically coupled to connect a high frequency signal. The position, shape, size, etc. of forming the slot hole 7 are set as follows.

【0044】スロット孔7の形状は、図1に示すよう
に、誘電体導波管線路6の幅方向、すなわち側壁用貫通
導体群4に直交する方向に、長さが信号波長の2分の
1、幅が長さの3分の1から10分の1程度とした長方形
状とすればよい。また、スロット孔7の位置は、誘電体
導波管線路6と高周波線路導体8とが電磁界により電磁
結合ができる位置関係にあればよい。具体的には、高周
波線路導体8がマイクロストリップ線路やコプレーナ線
路等の場合は、スロット孔7の長手方向と完全に平行で
なければ結合され、直交する場合に最も良好に結合され
る。
As shown in FIG. 1, the shape of the slot hole 7 is such that the length thereof is half the signal wavelength in the width direction of the dielectric waveguide line 6, that is, in the direction orthogonal to the side wall through conductor group 4. 1. The rectangular shape may have a width of about one third to one tenth of the length. The position of the slot hole 7 may be any position as long as the dielectric waveguide line 6 and the high frequency line conductor 8 can be electromagnetically coupled by an electromagnetic field. Specifically, when the high-frequency line conductor 8 is a microstrip line, a coplanar line, or the like, the high-frequency line conductor 8 is coupled unless it is completely parallel to the longitudinal direction of the slot hole 7, and when it is orthogonal, the coupling is best performed.

【0045】そして、図1に示すように、本発明の接続
構造にかかる誘電体導波管線路6においては、誘電体導
波管線路6のスロット孔7から伝送方向に管内波長の略
2分の1のn倍(nは自然数)の位置に、端面用貫通導
体群9と端面用副導体層10とから成る短絡端を形成する
とともに、下側の主導体層3から管内波長の4分の1未
満の高さの位置に短絡端からスロット孔7の下部に至る
内部導体層11を形成することにより、スロット孔7から
短絡端までの部分に、4分の1波長整合回路として機能
する、誘電体導波管線路6の厚みを薄くした部分を形成
していることが特徴である。これにより、整合回路部分
の厚みを調整することによってこの部分の特性インピー
ダンスを調節することが可能となり、スロット孔7を介
して特性インピーダンスの異なる高周波線路導体8を低
反射の状態で電磁結合させることができる。このような
整合回路部分の厚みの調整は、内部導体層11の位置や幅
・長さを調整して設けることにより行なうことができ
る。
As shown in FIG. 1, in the dielectric waveguide line 6 according to the connection structure of the present invention, from the slot hole 7 of the dielectric waveguide line 6 to the transmission direction, approximately 2 minutes of the guide wavelength is divided. At a position n times as large as 1 (n is a natural number), a short-circuited end composed of the end face through conductor group 9 and the end face sub conductor layer 10 is formed, and the lower main conductor layer 3 is divided into four minutes of the guide wavelength. By forming the internal conductor layer 11 from the short-circuited end to the lower part of the slot hole 7 at a position less than 1 of the above, the portion from the slot hole 7 to the short-circuited end functions as a quarter-wavelength matching circuit. The feature is that the thin portion of the dielectric waveguide line 6 is formed. As a result, by adjusting the thickness of the matching circuit portion, the characteristic impedance of this portion can be adjusted, and the high frequency line conductors 8 having different characteristic impedances can be electromagnetically coupled through the slot holes 7 in a low reflection state. You can Such adjustment of the thickness of the matching circuit portion can be performed by adjusting the position, width and length of the internal conductor layer 11.

【0046】このように誘電体導波管線路6の整合回路
部分を形成したことにより、他の種々の高周波線路導体
8と誘電体導波管線路6とを高性能で接続することがで
き、しかも、この整合回路部分は高周波用多層配線基板
や高周波用半導体素子収納用パッケージを構成する誘電
体基板内にグリーンシート積層法等のシート積層技術に
より容易に作製して作り込むことができるので、生産性
が高く安価な製造が可能な接続構造となる。
By forming the matching circuit portion of the dielectric waveguide line 6 in this way, various other high-frequency line conductors 8 and the dielectric waveguide line 6 can be connected with high performance, Moreover, since this matching circuit portion can be easily produced and built in by a sheet laminating technique such as a green sheet laminating method in a dielectric substrate that constitutes a high frequency multilayer wiring substrate or a high frequency semiconductor element housing package, The connection structure has high productivity and can be manufactured at low cost.

【0047】次に、図2に本発明の誘電体導波管線路と
高周波線路導体との接続構造の実施の形態の他の例を図
1と同様の部分破断斜視図で示す。
Next, FIG. 2 shows another example of the embodiment of the connection structure of the dielectric waveguide line and the high-frequency line conductor of the present invention in a partially cutaway perspective view similar to FIG.

【0048】図2において図1と同様の箇所には同じ符
号を付してある。図2において、12は、図1における内
部導体層11に代えて形成した、主導体層2・3間に主導
体層と平行に高周波線路導体8に対向させて、一端が端
面用貫通導体群9に電気的に接続され、他端がスロット
孔7の下部に至る内部導体層であり、13は、高周波信号
の管内波長の2分の1未満の繰り返し間隔で内部導体層
12の他端とその下側の主導体層3とを電気的に接続する
ように形成した内部貫通導体群である。
In FIG. 2, the same parts as those in FIG. 1 are designated by the same reference numerals. In FIG. 2, reference numeral 12 is formed in place of the internal conductor layer 11 in FIG. 1 and is opposed to the high-frequency line conductor 8 between the main conductor layers 2 and 3 in parallel with the main conductor layer, and one end of the through conductor group for an end face. 9 is an internal conductor layer that is electrically connected to 9 and the other end reaches the lower part of the slot hole 7, and 13 is an internal conductor layer with a repeating interval of less than half of the guide wavelength of the high frequency signal.
It is an internal through conductor group formed so as to electrically connect the other end of 12 and the main conductor layer 3 therebelow.

【0049】このような内部導体層12と内部貫通導体群
13とを形成したことにより、内部導体層12の高さが下側
の主導体層3から管内波長の4分の1を越えるものとな
っても、スロット孔7の下部に位置する内部導体層12の
他端側からの内部導体層12の下側への伝送信号の侵入は
内部貫通導体群13により阻止されるので、図1に示す接
続構造の例に比べて、より電気的に安定した、しかも内
部導体層12の高さの設定可能な範囲がより広範囲となっ
た整合回路部分を構成することができる。これにより、
この内部導体層12を形成する高さを調整し、また幅や長
さを調整することにより、接続部において誘電体導波管
線路6と高周波線路導体8とのインピーダンスをより良
好にマッチングさせることができ、接続部における伝送
信号の反射をより効果的に低減させるとともに極めて良
好な透過特性が得られるものとなる。
Such an internal conductor layer 12 and an internal through conductor group
By forming 13 and 13, even if the height of the inner conductor layer 12 exceeds the quarter of the guide wavelength from the lower main conductor layer 3, the inner conductor layer located below the slot hole 7 Since the transmission signal from the other end side of 12 to the lower side of the internal conductor layer 12 is blocked by the internal through conductor group 13, it is more electrically stable than the example of the connection structure shown in FIG. Moreover, it is possible to configure the matching circuit portion in which the range in which the height of the internal conductor layer 12 can be set is wider. This allows
The impedance of the dielectric waveguide line 6 and the high-frequency line conductor 8 is better matched at the connecting portion by adjusting the height of the inner conductor layer 12 and adjusting the width and length. Therefore, it is possible to more effectively reduce the reflection of the transmission signal at the connection portion and obtain a very good transmission characteristic.

【0050】このような接続構造において、内部導体層
12とともに整合回路部分を構成する内部貫通導体群13
は、その繰り返し間隔を管内波長の2分の1より小さく
しておくとその貫通導体間からの電磁波の漏れがなくな
ることとなるため、内部貫通導体群13の間隔は管内波長
の2分の1未満であることが必要である。なお、図2の
例では内部貫通導体群13を内部導体層12の他端に沿って
1列に配置したが、これを複数列に配置してもよく、ま
た、いわゆる千鳥状に配置してもよい。
In such a connection structure, the inner conductor layer
Group of internal through conductors 13 that together with 12 form a matching circuit part
If the repeating interval is set to be smaller than 1/2 of the guide wavelength, the leakage of electromagnetic waves from between the through conductors is eliminated, so that the interval of the internal through conductor group 13 is 1/2 of the guide wavelength. Must be less than. In the example of FIG. 2, the inner through conductor groups 13 are arranged in one row along the other end of the inner conductor layer 12, but they may be arranged in a plurality of rows, or in a so-called staggered arrangement. Good.

【0051】また、内部導体層12については、内部導体
層11と同様に、この内部導体層12の伝送方向の長さは〜
λg/2となることから、この部分が誘電体導波管線路
6と高周波線路導体8との接続部における両者のインピ
ーダンスの整合器として機能するものとなる。その結
果、この内部導体層12を形成する高さを調整し、また幅
や長さを調整することにより、接続部において誘電体導
波管線路6と高周波線路導体8とのインピーダンスを良
好にマッチングさせることができ、接続部における伝送
信号の反射をより充分に低減させるとともに極めて良好
な透過特性が得られるものとなる。
As for the inner conductor layer 12, the length of the inner conductor layer 12 in the transmission direction is
Since it becomes λg / 2, this portion functions as a matching device for the impedances of the dielectric waveguide line 6 and the high-frequency line conductor 8 at the connecting portion. As a result, by adjusting the height of forming the inner conductor layer 12 and adjusting the width and the length, the impedances of the dielectric waveguide line 6 and the high-frequency line conductor 8 are well matched at the connection portion. Therefore, the reflection of the transmission signal at the connection portion can be more sufficiently reduced, and extremely good transmission characteristics can be obtained.

【0052】このような図2に示す構成の本発明の誘電
体導波管線路と高周波線路導体との接続構造は、誘電体
基板を上下から挟持する一対の主導体層と、高周波信号
の伝送方向に信号波長の2分の1未満の繰り返し間隔
で、かつ前記伝送方向と直交する方向に所定の幅で前記
主導体層間を電気的に接続して形成された2列の側壁用
貫通導体群と、前記主導体層間に主導体層と平行に形成
され、前記側壁用貫通導体群と電気的に接続された副導
体層とを具備して成り、前記主導体層、側壁用貫通導体
群および副導体層で囲まれた領域によって高周波信号を
伝送する誘電体導波管線路に対して、上側の前記主導体
層に平行に配設された高周波信号を伝送する高周波線路
導体を上側の前記主導体層に前記側壁用貫通導体群に直
交する方向に長方形状に形成したスロット孔を介して対
向させて電磁的に結合させるとともに、前記スロット孔
から前記伝送方向に管内波長の略2分の1倍の位置に、
伝送方向の直交方向に前記信号波長の2分の1未満の間
隔で前記主導体層間を電気的に接続して形成された端面
用貫通導体群と、前記主導体層間に主導体層と平行に形
成され、前記副導体層および前記端面用貫通導体群と電
気的に接続された端面用副導体層とから成る短絡端を形
成し、かつ、前記主導体層間に前記主導体層と平行に前
記高周波線路導体に対向させて、一端が前記端面用貫通
導体群に電気的に接続され他端が前記スロット孔の下部
に至る内部導体層を形成するとともに、前記管内波長の
2分の1未満の繰り返し間隔で前記内部導体層の他端と
下側の前記主導体層とを電気的に接続する内部貫通導体
群を形成したものである。
The connection structure between the dielectric waveguide line and the high-frequency line conductor of the present invention having the structure shown in FIG. 2 has a pair of main conductor layers that sandwich the dielectric substrate from above and below, and a high-frequency signal transmission. Group of two side wall through conductors formed by electrically connecting the main conductor layers with a predetermined interval in the direction and a predetermined width in the direction orthogonal to the transmission direction. And a sub conductor layer formed in parallel with the main conductor layer between the main conductor layers and electrically connected to the sidewall through conductor group, the main conductor layer, the sidewall through conductor group, and With respect to the dielectric waveguide line that transmits a high frequency signal by the area surrounded by the sub conductor layer, the high frequency line conductor that transmits a high frequency signal is disposed parallel to the main conductor layer on the upper side, Rectangle in the body layer in the direction orthogonal to the side wall through conductor group Through the formed slot holes are opposed causes electromagnetically coupled, to 1 times the position of approximately half of the transmission direction in the guide wavelength from the slot hole,
A group of end face through conductors formed by electrically connecting the main conductor layers at intervals of less than ½ of the signal wavelength in a direction orthogonal to the transmission direction, and between the main conductor layers in parallel with the main conductor layer. And forming a short-circuited end formed of the sub-conductor layer and the end-face sub-conductor layer electrically connected to the end-face penetrating conductor group, and between the main conductor layers in parallel with the main conductor layer. While facing the high frequency line conductor, one end is electrically connected to the end face penetrating conductor group and the other end forms an inner conductor layer reaching the lower part of the slot hole, and the inner conductor layer has a length of less than half of the guide wavelength. An inner penetrating conductor group for electrically connecting the other end of the inner conductor layer and the lower main conductor layer is formed at repeating intervals.

【0053】なお、図2においても内部導体層12は一端
を端面用副導体層10と一体化させ、両側を副導体層5と
一体化させて形成しているが、内部導体層12を形成する
高さは副導体層5・10と合わせる必要はなく、また、幅
も少なくとも高周波線路導体8に対向する幅があればよ
い。
In FIG. 2, one end of the inner conductor layer 12 is integrated with the end face sub-conductor layer 10 and both sides are formed with the sub-conductor layer 5, but the inner conductor layer 12 is formed. It is not necessary to match the height with the sub conductor layers 5 and 10, and the width may be at least the width facing the high frequency line conductor 8.

【0054】また、内部導体層12の長さも、内部導体層
11と同様に、その他端がスロット孔7の中央から短絡端
と反対側に約λg/8の位置にくるように形成すること
が望ましい。
The length of the inner conductor layer 12 is also
Similar to 11, it is desirable to form the other end of the slot hole 7 at a position of about λg / 8 from the center to the side opposite to the short-circuit end.

【0055】なお、端面用貫通導体群9および内部貫通
導体群13は側壁用貫通導体群4と同様にして形成すれば
よく、端面用副導体層10や内部導体層11・12は主導体層
2・3や副導体層5と同様にして形成すればよい。
The end face through conductor group 9 and the inner through conductor group 13 may be formed in the same manner as the side wall through conductor group 4, and the end face sub conductor layer 10 and the inner conductor layers 11 and 12 are the main conductor layers. It may be formed in the same manner as the second and third or the sub-conductor layer 5.

【0056】また、端面用貫通導体群9および内部貫通
導体群13の断面形状や直径等も、側壁用貫通導体4と同
様にして形成すればよい。
The cross-sectional shapes and diameters of the end face through conductor groups 9 and the inner through conductor groups 13 may be formed in the same manner as the side wall through conductors 4.

【0057】[0057]

【実施例】次に、本発明の誘電体導波管線路と高周波線
路導体との接続構造の具体例について説明する。
EXAMPLES Next, specific examples of the connection structure between the dielectric waveguide line and the high frequency line conductor of the present invention will be described.

【0058】比誘電率εr が4.8 のセラミックス材料か
らなる厚みが0.15mmの誘電体層を4層積層して誘電体
基板1を構成し、この誘電体基板1に断面のサイズが1.
5 mm×0.6 mmの誘電体導波管線路6を形成した。ま
た、その主導体層2に、長さ0.894 mm×幅0.3 mmの
スロット孔7を形成するとともに、このスロット孔7か
ら伝送方向に76.5GHzの高周波信号の管内波長の2分
の1の距離にほぼ相当する1.20mmの位置に、端面用貫
通導体群9と端面用副導体層10を形成して短絡端を形成
した。また、この短絡端からスロット孔7の下部にかけ
て1.48mmの距離まで主導体層3から0.30mmの高さに
内部導体層12を形成し、この端部を内部貫通導体群13に
より主導体層3と電気的に接続した。
The dielectric substrate 1 is formed by laminating four 0.15 mm-thick dielectric layers made of a ceramic material having a relative dielectric constant ε r of 4.8, and the dielectric substrate 1 has a cross-sectional size of 1.
A 5 mm × 0.6 mm dielectric waveguide line 6 was formed. In addition, a slot hole 7 having a length of 0.894 mm and a width of 0.3 mm is formed in the main conductor layer 2, and the distance from the slot hole 7 is half the guide wavelength of the high frequency signal of 76.5 GHz in the transmission direction. The through conductor group 9 for the end face and the sub conductor layer 10 for the end face were formed at a position of approximately 1.20 mm, which corresponds to the short-circuit end. In addition, an internal conductor layer 12 is formed at a height of 0.30 mm from the main conductor layer 3 up to a distance of 1.48 mm from this short-circuited end to the lower part of the slot hole 7. Electrically connected with.

【0059】そして、高周波線路導体8の線路幅を0.26
7 mm、誘電体導波線路6と高周波線路導体8とのギャ
ップを0.15mm、高周波線路導体8のスタブ長(スロッ
ト孔7の中心から高周波線路導体8の先端までの長さ)
を0.351 mmとして高周波線路導体8をスロット孔7に
対向させ、図2に示す本発明の誘電体導波管線路6と高
周波線路導体8との接続構造を構成した。
The line width of the high frequency line conductor 8 is set to 0.26.
7 mm, the gap between the dielectric waveguide 6 and the high frequency line conductor 8 is 0.15 mm, the stub length of the high frequency line conductor 8 (the length from the center of the slot hole 7 to the tip of the high frequency line conductor 8)
Is 0.351 mm and the high frequency line conductor 8 is opposed to the slot hole 7 to form the connection structure of the dielectric waveguide line 6 and the high frequency line conductor 8 of the present invention shown in FIG.

【0060】そして、この例ならびに誘電体導波管線路
6における整合回路部分(内部導体層12および内部貫通
導体群13)を設けなかった比較例につき、接続構造の反
射係数S11をネットワークアナライザにより求めた。そ
の結果を図3に示す。
Then, for this example and the comparative example in which the matching circuit portion (internal conductor layer 12 and internal through conductor group 13) in the dielectric waveguide line 6 is not provided, the reflection coefficient S 11 of the connection structure is measured by a network analyzer. I asked. The result is shown in FIG.

【0061】図3は誘電体導波管線路と高周波線路導体
との接続構造における反射係数S11の周波数特性を示す
線図であり、横軸は周波数 FREQUENCY(単位:GHz)
を、縦軸は反射係数S11(単位:dB)を表わしてお
り、反射係数S11の周波数特性を示す特性曲線のうちA
は比較例の特性を、Bは本発明の実施例の特性を示して
いる。
FIG. 3 is a diagram showing the frequency characteristic of the reflection coefficient S 11 in the connection structure of the dielectric waveguide line and the high frequency line conductor, and the horizontal axis shows the frequency FREQUENCY (unit: GHz).
And the vertical axis represents the reflection coefficient S 11 (unit: dB). Of the characteristic curves showing the frequency characteristics of the reflection coefficient S 11 , A
Indicates the characteristics of the comparative example, and B indicates the characteristics of the example of the present invention.

【0062】図3に示す結果より、整合回路部分が無い
比較例の結果であるAにおいては反射係数S11は−6d
B程度までにしかならなかったのに対し、本発明の接続
構造の結果であるBによれば、スロット孔7から所定の
位置に短絡端を設けるとともに内部導体層12と内部貫通
導体群13とにより整合回路部分を設けたことにより、反
射係数S11が−20dB以下の良好な特性が得られたこと
が分かる。このことは、本発明の接続構造にかかる整合
回路部分により、誘電体導波管線路6と高周波線路導体
8との特性インピーダンスのマッチングが行なわれてい
ることを示すものである。
From the results shown in FIG. 3, the reflection coefficient S 11 is -6d in A which is the result of the comparative example having no matching circuit portion.
However, according to B, which is the result of the connection structure of the present invention, the short-circuit end is provided at a predetermined position from the slot hole 7 and the internal conductor layer 12 and the internal through conductor group 13 are provided. It can be seen that, by providing the matching circuit portion, a good characteristic with a reflection coefficient S 11 of −20 dB or less was obtained. This indicates that the matching circuit portion according to the connection structure of the present invention matches the characteristic impedances of the dielectric waveguide line 6 and the high frequency line conductor 8.

【0063】なお、比較例と本発明の実施例とでは反射
係数S11が最も小さい周波数の位置が若干ずれている
が、これは誘電体導波管線路6の短絡端の位置、または
内部導体層12の短絡端からスロット孔7下部の端部まで
の長さ、または内部導体層12の幅を調整することで容易
に調整することができる。
In the comparative example and the example of the present invention, the position of the frequency where the reflection coefficient S 11 is the smallest is slightly deviated, but this is due to the position of the short-circuited end of the dielectric waveguide line 6 or the internal conductor. It can be easily adjusted by adjusting the length from the short-circuited end of the layer 12 to the end of the lower portion of the slot hole 7 or the width of the inner conductor layer 12.

【0064】なお、この本発明の実施例に対して、内部
貫通導体群13を形成せず、内部導体層12の高さを0.3 m
mとして図1に示す例における内部導体層11とし、その
他は同様にして図1に示す本発明の接続構造を構成して
評価したところ、同じく整合回路部分により誘電体導波
管線路6と高周波線路導体8との特性インピーダンスの
マッチングが行なわれ、反射係数S11が−20dB以下の
良好な特性が得られた。
In this embodiment of the present invention, the internal through conductor group 13 is not formed and the height of the internal conductor layer 12 is 0.3 m.
When m is the internal conductor layer 11 in the example shown in FIG. 1 and the others are constructed and evaluated in the same manner as the connection structure of the present invention shown in FIG. Matching of the characteristic impedance with the line conductor 8 was performed, and good characteristics with a reflection coefficient S 11 of −20 dB or less were obtained.

【0065】なお、本発明は以上の例に限定されるもの
ではなく、本発明の要旨を逸脱しない範囲で種々の変更
・改良を施すことは何ら差し支えない。例えば、上記の
例では誘電体導波管線路6に対して接続する高周波線路
導体8を両者の伝送方向が平行になるように配置した場
合を示したが、誘電体導波管線路6に対して高周波線路
導体8を直交させても、あるいは任意の角度で交差させ
てもよく、そのような場合もスロット孔7の位置・形状
・寸法等を適宜調整することにより同様の良好な接続特
性が得られる。
The present invention is not limited to the above examples, and various modifications and improvements can be made without departing from the gist of the present invention. For example, in the above example, the case where the high-frequency line conductor 8 connected to the dielectric waveguide line 6 is arranged so that the transmission directions of both are parallel to each other has been shown. The high frequency line conductors 8 may be orthogonal to each other or may intersect at an arbitrary angle. In such a case, the same good connection characteristics can be obtained by appropriately adjusting the position, shape, size, etc. of the slot hole 7. can get.

【0066】[0066]

【発明の効果】以上詳述した通り、本発明の誘電体導波
管と高周波線路導体との接続構造によれば、誘電体導波
管線路のスロット孔から所定の位置に短絡端を形成する
とともに、この短絡端からスロット孔の下部までの間の
所定位置に内部導体層を形成し、また、その端部を主導
体層と電気的に接続する内部貫通導体群を形成したこと
により、この部分によって誘電体導波管線路と高周波線
路導体との接続部の特性インピーダンスを変化させて両
者の特性インピーダンスマッチングをとることが可能と
なった。そして、両者の特性インピーダンスを整合させ
ることにより、接続部における高周波信号の反射の発生
を充分に低減させ、良好な透過特性を得ることができ
た。
As described in detail above, according to the connection structure of the dielectric waveguide and the high frequency line conductor of the present invention, the short-circuited end is formed at a predetermined position from the slot hole of the dielectric waveguide line. At the same time, by forming an internal conductor layer at a predetermined position from the short-circuited end to the lower part of the slot hole, and by forming an internal through conductor group that electrically connects the end portion to the main conductor layer, It became possible to change the characteristic impedance of the connection part between the dielectric waveguide line and the high frequency line conductor by the part to achieve the characteristic impedance matching between them. Then, by matching the characteristic impedances of both, the occurrence of reflection of the high frequency signal at the connection portion was sufficiently reduced, and good transmission characteristics could be obtained.

【0067】しかも、本発明の接続構造は、このような
整合回路部分を有する誘電体導波管線路を例えばグリ一
ンシート積層法等のシート積層技術により容易に作製す
ることができるので、生産性が高く安価に製造すること
ができる。
In addition, the connection structure of the present invention can easily manufacture the dielectric waveguide line having such a matching circuit portion by the sheet laminating technique such as the green sheet laminating method. It is expensive and can be manufactured at low cost.

【0068】以上により、本発明によれば、積層型の誘
電体導波管線路と、他のマイクロストリップ線路やコプ
レーナ線路等の高周波線路導体とをスロット孔を用いて
電磁的に結合し、両者の特性インピーダンスが異なるも
のであっても良好な特性で接続することができる誘電体
導波管線路と高周波線路導体との接続構造を提供するこ
とができた。
As described above, according to the present invention, a laminated dielectric waveguide line and another high frequency line conductor such as a microstrip line or a coplanar line are electromagnetically coupled to each other by using a slot hole. It was possible to provide a connection structure between a dielectric waveguide line and a high-frequency line conductor, which can be connected with good characteristics even if they have different characteristic impedances.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の誘電体導波管線路と高周波線路導体と
の接続構造の実施の形態の一例を示す部分破断斜視図で
ある。
FIG. 1 is a partially cutaway perspective view showing an example of an embodiment of a connection structure between a dielectric waveguide line and a high-frequency line conductor according to the present invention.

【図2】本発明の誘電体導波管線路と高周波線路導体と
の接続構造の実施の形態の他の例を示す部分破断斜視図
である。
FIG. 2 is a partially cutaway perspective view showing another example of the embodiment of the connection structure of the dielectric waveguide line and the high frequency line conductor of the present invention.

【図3】誘電体導波管線路と高周波線路導体との接続構
造における反射係数の周波数特性を示す線図である。
FIG. 3 is a diagram showing a frequency characteristic of a reflection coefficient in a connection structure of a dielectric waveguide line and a high frequency line conductor.

【符号の説明】[Explanation of symbols]

1・・・・・誘電体基板 2、3・・・主導体層 4・・・・・側壁用貫通導体群 5・・・・・副導体層 6・・・・・誘電体導波管線路 7・・・・・スロット孔 8・・・・・高周波線路導体 9・・・・・端面用貫通導体群 10・・・・・端面用副導体層 11、12・・・内部導体層 13・・・・・内部貫通導体群 1. Dielectric substrate 2, 3 ... Main conductor layer 4 ... Side wall through conductor group 5 ... Sub conductor layer 6 ... Dielectric waveguide line 7: Slot hole 8: High frequency line conductor 9 ... Through conductor group for end face 10 ・ ・ ・ ・ ・ Sub-conductor layer for end face 11、12 ・ ・ ・ Inner conductor layer 13 ・ ・ ・ ・ ・ Internal through conductor group

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 誘電体基板を挟持する一対の主導体層
と、該主導体層間を高周波信号の伝送方向に信号波長の
2分の1未満の繰り返し間隔および所定の幅で電気的に
接続する2列の側壁用貫通導体群と、前記主導体層間に
平行に形成され、前記側壁用貫通導体群をそれぞれ電気
的に接続する一対の副導体層と、前記主導体層の一方に
前記側壁用貫通導体群に直交する方向に長方形状に形成
したスロット孔と、該スロット孔から前記伝送方向に管
内波長の略2分の1の位置において前記主導体層間を
前記幅方向に前記信号波長の2分の1未満の繰り返し間
隔で電気的に接続する端面用貫通導体群と、該端面用貫
通導体群および前記一対の副導体層と電気的に接続され
た端面用副導体層と、前記端面用貫通導体群に電気的に
接続され、前記主導体層の他方から前記管内波長の4分
の1未満の高さの位置に平行に前記スロット孔の下部ま
で形成された内部導体層とを具備して成る誘電体導波管
線路に、前記スロット孔に対向配置した高周波線路導体
を電磁結合させたことを特徴とする誘電体導波管線路と
高周波線路導体との接続構造。
1. A pair of main conductor layers sandwiching a dielectric substrate, and the main conductor layers are electrically connected to each other in a transmission direction of a high frequency signal at a repeating interval of less than one-half of a signal wavelength and a predetermined width. In one of the main conductor layers, a pair of side wall through conductor groups and a pair of sub conductor layers which are formed in parallel between the main conductor layers and electrically connect the side wall through conductor groups, respectively.
Wherein a slot hole formed in a rectangular shape in a direction orthogonal to the side-wall through conductor group, said main conductor layers in 1x position approximately half the guide wavelength in the transmission direction from the slot hole in the width direction An end face through conductor group electrically connected at a repeating interval of less than one half of a signal wavelength, and an end face sub conductor layer electrically connected to the end face through conductor group and the pair of sub conductor layers. An inner conductor layer that is electrically connected to the end face through conductor group and that is formed parallel to the lower portion of the slot hole at a height lower than a quarter of the guide wavelength from the other of the main conductor layers. A structure for connecting a dielectric waveguide line and a high-frequency line conductor, wherein a high-frequency line conductor arranged opposite to the slot hole is electromagnetically coupled to the dielectric waveguide line comprising:
【請求項2】 誘電体基板を挟持する一対の主導体層
と、該主導体層間を高周波信号の伝送方向に信号波長の
2分の1未満の繰り返し間隔および所定の幅で電気的に
接続する2列の側壁用貫通導体群と、前記主導体層間に
平行に形成され、前記側壁用貫通導体群をそれぞれ電気
的に接続する一対の副導体層と、前記主導体層の一方に
前記側壁用貫通導体群に直交する方向に長方形状に形成
したスロット孔と、該スロット孔から前記伝送方向に管
内波長の略2分の1の位置において前記主導体層間を
前記幅方向に前記信号波長の2分の1未満の繰り返し間
隔で電気的に接続する端面用貫通導体群と、該端面用貫
通導体群および前記一対の副導体層と電気的に接続され
た端面用副導体層と、一端が前記端面用貫通導体群に電
気的に接続され、前記主導体層に平行に前記スロット孔
の下部まで形成された内部導体層と、該内部導体層の他
端と前記主導体層の他方とを前記管内波長の2分の1未
満の繰り返し間隔で電気的に接続する内部貫通導体群と
を具備して成る誘電体導波管線路に、前記スロット孔に
対向配置した高周波線路導体を電磁結合させたことを特
徴とする誘電体導波管線路と高周波線路導体との接続構
造。
2. A pair of main conductor layers sandwiching a dielectric substrate, and the main conductor layers are electrically connected to each other in a transmission direction of a high frequency signal at a repeating interval of less than one half of a signal wavelength and a predetermined width. In one of the main conductor layers, a pair of side wall through conductor groups and a pair of sub conductor layers which are formed in parallel between the main conductor layers and electrically connect the side wall through conductor groups, respectively.
Wherein a slot hole formed in a rectangular shape in a direction orthogonal to the side-wall through conductor group, said main conductor layers in 1x position approximately half the guide wavelength in the transmission direction from the slot hole in the width direction An end face through conductor group electrically connected at a repeating interval of less than one half of a signal wavelength, and an end face sub conductor layer electrically connected to the end face through conductor group and the pair of sub conductor layers. An inner conductor layer whose one end is electrically connected to the end face through conductor group and which is formed in parallel to the main conductor layer to the lower part of the slot hole, and the other end of the inner conductor layer and the main conductor layer. A high-frequency line conductor disposed opposite to the slot hole is provided in a dielectric waveguide line including an inner penetrating conductor group that electrically connects the other with a repeating interval of less than one-half of the guide wavelength. Dielectric conductor characterized by electromagnetic coupling Connection structure between the tube line and the high-frequency line conductor.
JP05250899A 1999-03-01 1999-03-01 Connection structure between dielectric waveguide line and high-frequency line conductor Expired - Fee Related JP3517148B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05250899A JP3517148B2 (en) 1999-03-01 1999-03-01 Connection structure between dielectric waveguide line and high-frequency line conductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05250899A JP3517148B2 (en) 1999-03-01 1999-03-01 Connection structure between dielectric waveguide line and high-frequency line conductor

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Publication Number Publication Date
JP2000252712A JP2000252712A (en) 2000-09-14
JP3517148B2 true JP3517148B2 (en) 2004-04-05

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2197072A1 (en) 2008-12-12 2010-06-16 Toko, Inc. Dielectric waveguide-microstrip transition structure
CN104009272A (en) * 2013-02-26 2014-08-27 台扬科技股份有限公司 Laminated waveguide diplexer with shielded signal-coupling structure
EP2963729A1 (en) 2014-07-03 2016-01-06 Fujitsu Limited Stacked waveguide substrate, radio communication module, and radar system

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004153367A (en) 2002-10-29 2004-05-27 Tdk Corp High frequency module, and mode converting structure and method
KR100731544B1 (en) 2006-04-13 2007-06-22 한국전자통신연구원 Multi-metal coplanar waveguide
JP4854622B2 (en) * 2007-07-27 2012-01-18 京セラ株式会社 Connection structure of rectangular waveguide section and differential line section
JP5179513B2 (en) 2007-12-28 2013-04-10 京セラ株式会社 High-frequency transmission line connection structure, wiring board, high-frequency module, and radar device
JP4954151B2 (en) * 2008-06-26 2012-06-13 京セラ株式会社 Connection structure between high-frequency circuit and waveguide section

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2197072A1 (en) 2008-12-12 2010-06-16 Toko, Inc. Dielectric waveguide-microstrip transition structure
US8368482B2 (en) 2008-12-12 2013-02-05 Toko, Inc. Dielectric waveguide-microstrip transition including a cavity coupling structure
CN104009272A (en) * 2013-02-26 2014-08-27 台扬科技股份有限公司 Laminated waveguide diplexer with shielded signal-coupling structure
CN104009272B (en) * 2013-02-26 2017-04-12 台扬科技股份有限公司 Laminated waveguide diplexer with shielded signal-coupling structure
EP2963729A1 (en) 2014-07-03 2016-01-06 Fujitsu Limited Stacked waveguide substrate, radio communication module, and radar system

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