JP3496081B2 - Oxadiazole compound and method for producing the same - Google Patents

Oxadiazole compound and method for producing the same

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Publication number
JP3496081B2
JP3496081B2 JP15807794A JP15807794A JP3496081B2 JP 3496081 B2 JP3496081 B2 JP 3496081B2 JP 15807794 A JP15807794 A JP 15807794A JP 15807794 A JP15807794 A JP 15807794A JP 3496081 B2 JP3496081 B2 JP 3496081B2
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JP
Japan
Prior art keywords
formula
group
general formula
substituted
chemical
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JP15807794A
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Japanese (ja)
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JPH083149A (en
Inventor
一清 永井
千波矢 安達
望 田元
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Ricoh Co Ltd
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Ricoh Co Ltd
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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、蛍光増白剤として、あ
るいは有機電界発光素子用材料、特に電子輸送材料とし
て有用な、新規オキサジアゾール化合物、及びその製造
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel oxadiazole compound which is useful as a fluorescent whitening agent or as a material for organic electroluminescent devices, especially as an electron transport material, and a method for producing the same.

【0002】[0002]

【従来の技術】有機電界発光素子用の材料として種々の
オキサジアゾール化合物が知られている。例えば、日本
化学会誌,1991,(11),p.1540−154
8には発光材料及び電子輸送材料としてオキサジアゾー
ル化合物を使用した例が記載されている。また、特開平
3−205479号公報、特開平4−212286号公
報、特開平4−363891号公報、特開平4−363
894号公報にもオキサジアゾール化合物を使用した例
が記載されている。しかしながら、未だに薄膜の安定性
に問題があり、高輝度、高信頼性の有機電界発光素子は
得られていない。
Various oxadiazole compounds are known as materials for organic electroluminescence devices. For example, the Chemical Society of Japan, 1991, (11), p. 1540-154
8 describes an example using an oxadiazole compound as a light emitting material and an electron transporting material. Further, JP-A-3-205479, JP-A-4-212286, JP-A-4-363891, and JP-A-4-363.
Japanese Patent No. 894 also describes an example using an oxadiazole compound. However, there is still a problem with the stability of the thin film, and a high-luminance, high-reliability organic electroluminescent device has not been obtained yet.

【0003】[0003]

【発明が解決しようとする課題】本発明は、有機電界発
光素子用の材料として、安定した製膜性を有し、特に発
光材料、電子輸送材料等として有用であり、しかも長期
保存によっても変質しにくい新規オキサジアゾール化合
物およびその製造方法を提供することを目的とする。
The present invention has a stable film-forming property as a material for an organic electroluminescence device, and is particularly useful as a light-emitting material, an electron-transporting material, and the like, and is denatured even after long-term storage. It is an object of the present invention to provide a novel oxadiazole compound that is difficult to produce and a method for producing the same.

【0004】[0004]

【課題を解決するための手段】本発明者らは、前記課題
を解決するため鋭意検討した結果、ある特定な構造を有
するオキサジアゾール化合物が有効であることを見い出
し、本発明を完成するに至った。すなわち、本発明によ
れば、下記一般式(I)(化1)で表わされるオキサジ
アゾール化合物が提供される。
Means for Solving the Problems As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that an oxadiazole compound having a specific structure is effective, and have completed the present invention. I arrived. That is, according to the present invention, an oxadiazole compound represented by the following general formula (I) (Formula 1) is provided.

【化1】 (式中、Aは、各々置換もしくは無置換の芳香族炭化水
素基、置換もしくは無置換の芳香族複素環基を表し、そ
れぞれ同じでも異なっていても良い。又、Rは、水素原
子、ハロゲン原子、置換もしくは無置換のアルキル基、
置換もしくは無置換のアルコキシ基、ヒドロキシル基を
表わす。) また、下記一般式(II)(化2)
[Chemical 1] (In the formula, A represents a substituted or unsubstituted aromatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group, which may be the same or different. R is a hydrogen atom or halogen. An atom, a substituted or unsubstituted alkyl group,
It represents a substituted or unsubstituted alkoxy group or hydroxyl group. ) Also, the following general formula (II) (Chemical formula 2)

【化2】 (式中、Rは、水素原子、ハロゲン原子、置換もしくは
無置換のアルキル基、置換もしくは無置換のアルコキシ
基、ヒドロキシル基を表わす。Xはハロゲン原子を表
す。)で表される酸ハライド化合物を、下記一般式(II
I)(化3)あるいは一般式(IV)(化4)
[Chemical 2] (In the formula, R represents a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a hydroxyl group. X represents a halogen atom.) , The following general formula (II
I) (formula 3) or general formula (IV) (formula 4)

【化3】 [Chemical 3]

【化4】 (式中、Aは、各々置換もしくは無置換の芳香族炭化水
素基、置換もしくは無置換の芳香族複素環基を表す。)
で表されるテトラゾール化合物とを反応させて前記一般
式(I)(化1)で表されるオキサジアゾール化合物を
製造することを特徴とするオキサジアゾール化合物の製
造方法が提供される。
[Chemical 4] (In the formula, A represents a substituted or unsubstituted aromatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group, respectively.)
There is provided a method for producing an oxadiazole compound, which comprises reacting with a tetrazole compound represented by the formula (1) to produce the oxadiazole compound represented by the general formula (1).

【0005】前記一般式(I)において、Aにおける芳
香族炭化水素基あるいは芳香族複素環基の具体例として
は、スチリル、フェニル、ビフェニル、ターフェニル、
ナフチル、アントリル、アセナフテニル、フルオレニ
ル、フェナントリル、インデニル、ピレニル、ピリジ
ル、ピリミジル、フラニル、ピロニル、チオフェニル、
キノリル、ベンゾフラニル、ベンゾチオフェニル、イン
ドリル、カルバゾリル、ベンゾオキサゾリル、キノキサ
リル、ベンゾイミダゾリル、ピラゾリル、ジベンゾフラ
ニル、ジベンゾチオフェニル、オキサゾリル、オキサジ
アゾリル基等が挙げられる。
In the general formula (I), specific examples of the aromatic hydrocarbon group or aromatic heterocyclic group for A include styryl, phenyl, biphenyl, terphenyl,
Naphthyl, anthryl, acenaphthenyl, fluorenyl, phenanthryl, indenyl, pyrenyl, pyridyl, pyrimidyl, furanyl, pyronyl, thiophenyl,
Examples thereof include quinolyl, benzofuranyl, benzothiophenyl, indolyl, carbazolyl, benzoxazolyl, quinoxalyl, benzimidazolyl, pyrazolyl, dibenzofuranyl, dibenzothiophenyl, oxazolyl and oxadiazolyl groups.

【0006】これらの芳香族炭化水素基あるいは芳香族
複素環基は更に一つ以上のハロゲン原子、水酸基、シア
ノ基、ニトロ基、アミノ基、トリフルオロメチル基、炭
素数1から12、好ましくは1から6のアルキル基、炭
素数1から12、好ましくは1から6のアルコキシ基、
アリールオキシ基、フェニル基、スチリル基、ナフチル
基、チオフェニル基、アラルキル基、ビフェニル基、ビ
チオフェニル基、フラニル基、ビフラニル基、ピロニル
基、ビピロニル基、等の置換基を有していてもよい。
These aromatic hydrocarbon groups or aromatic heterocyclic groups are further one or more of a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, a trifluoromethyl group, a carbon number of 1 to 12, and preferably 1 To 6 alkyl groups, 1 to 12 carbon atoms, preferably 1 to 6 alkoxy groups,
It may have a substituent such as an aryloxy group, a phenyl group, a styryl group, a naphthyl group, a thiophenyl group, an aralkyl group, a biphenyl group, a bithiophenyl group, a furanyl group, a bifuranyl group, a pyronyl group or a bipyronyl group.

【0007】また、前記一般式(I)において、Rにお
ける置換もしくは無置換のアルキル基としては、炭素数
1〜12、好ましくは1〜6のアルキル基が挙げられ、
その置換基としては、ハロゲン原子、水酸基、フェニル
基、アルコキシ基又はアミノ基等が挙げられる。置換も
しくは無置換のアルコキシ基としては、炭素数1〜1
2、好ましくは1〜6のアルコキシ基が挙げられ、その
置換基としては、ハロゲン原子、水酸基、アミノ基等が
挙げられる。
In the general formula (I), examples of the substituted or unsubstituted alkyl group for R include an alkyl group having 1 to 12 carbon atoms, preferably 1 to 6 carbon atoms,
Examples of the substituent include a halogen atom, a hydroxyl group, a phenyl group, an alkoxy group, an amino group and the like. The substituted or unsubstituted alkoxy group has 1 to 1 carbon atoms.
2, preferably 1 to 6 alkoxy groups are mentioned, and the substituents thereof include halogen atom, hydroxyl group, amino group and the like.

【0008】一般式(I)で表される本発明のオキサジ
アゾール化合物は、前記した如く、下記一般式(II)
(化2)
The oxadiazole compound of the present invention represented by the general formula (I) has the following general formula (II) as described above.
(Chemical formula 2)

【化2】 (式中、R及びXは前記に同じ。)で表される酸ハライ
ド化合物を、下記一般式(III)(化3)あるいは一般
式(IV)(化4)
[Chemical 2] (Wherein R and X are the same as above), the acid halide compound represented by the following general formula (III) (Chemical formula 3) or general formula (IV) (Chemical formula 4)

【化3】 [Chemical 3]

【化4】 (式中、Aは、前記に同じ。)で表されるテトラゾール
化合物とを反応させることにより得られる。
[Chemical 4] (In the formula, A is the same as the above.) It is obtained by reacting with a tetrazole compound.

【0009】一般式(II)(化2)で表される酸ハライ
ド化合物は、下記一般式(V)(化5)
The acid halide compound represented by the general formula (II) (formula 2) is represented by the following general formula (V) (formula 5)

【化5】 (式中、Rは前記に同じ。)で表されるカルボン酸化合
物を塩化チオニル、五塩化リン、ホスゲン、塩化アルミ
ニウム等のハロゲン化剤で処理することにより合成され
る。
[Chemical 5] (In the formula, R is the same as above.) It is synthesized by treating the carboxylic acid compound with a halogenating agent such as thionyl chloride, phosphorus pentachloride, phosgene, and aluminum chloride.

【0010】一般式(III)(化3)及び一般式(IV)
(化4)のテトラゾール化合物は互変異性の関係にあっ
て互いに変化しやすく、別々に取り出すことが困難なも
のであり、両者が混在したものであるのが一般的であ
り、本発明でも混在したものを使用できる。ここで使用
される一般式(III)(化3)及び一般式(IV)(化
4)で表されるテトラゾール化合物は従来公知の方法で
製造される。例えば、Synthesis 71(1973)に記
載の方法で合成できる。
General formula (III) (formula 3) and general formula (IV)
The tetrazole compound of (Chemical Formula 4) is in a tautomeric relationship and is liable to change with each other, and it is difficult to take them out separately. Generally, both are mixed, and also in the present invention. You can use the one that you made. The tetrazole compound represented by the general formula (III) (Chemical formula 3) and the general formula (IV) (Chemical formula 4) used here is produced by a conventionally known method. For example, it can be synthesized by the method described in Synthesis 71 (1973).

【0011】また、一般式(II)(化2)で表される酸
ハライドと一般式(III)(化3)及び一般式(IV)
(化4)で表されるテトラゾール化合物との反応は、R.
D.Huisgenらのオキサジアゾール合成法に準じて行われ
る。例えば、Angew.Chem.,72,366(1960),
Chem.Ber.,93,2106(1960),Tetrahedro
n,11,241(1960),Chem.Ber.,98,29
66(1965)に記載の方法を適用することができ
る。
The acid halide represented by the general formula (II) (formula 2) and the general formula (III) (formula 3) and the general formula (IV)
The reaction with the tetrazole compound represented by (Chemical Formula 4) is described in R.
It is performed according to the oxadiazole synthesis method of D. Huisgen et al. For example, Angew. Chem., 72, 366 (1960),
Chem.Ber. , 93, 2106 (1960), Tetrahedro
n, 11, 241 (1960), Chem. Ber., 98, 29
66 (1965) can be applied.

【0012】反応はテトラゾール基とハロゲン化カルボ
ニル基との反応であり、一般式(II)(化2)で表され
る化合物と一般式(III)(化3)及び一般式(IV)
(化4)で表される化合物の前記官能基が交換された原
料からも一般式(I)(化1)で表されるオキサジアゾ
ール化合物を合成することができる。すなわち下記一般
式(VI)(化6)で表されるテトラゾール化合物と一般
式(VII)(化7)との反応によっても一般式(I)
(化1)で表されるオキサジアゾール化合物を合成する
ことができる。
The reaction is a reaction between a tetrazole group and a carbonyl halide group. The compound represented by the general formula (II) (chemical formula 2) and the general formula (III) (chemical formula 3) and the general formula (IV)
The oxadiazole compound represented by the general formula (I) (chemical formula 1) can also be synthesized from a raw material in which the functional group of the compound represented by the chemical formula (4) is exchanged. That is, the reaction of the tetrazole compound represented by the following general formula (VI) (chemical formula 6) with the general formula (VII)
The oxadiazole compound represented by (Chemical Formula 1) can be synthesized.

【化6】 (式中、テトラゾール基は互変性異性体を含んでもよ
い。Rは前記に同じ。)
[Chemical 6] (In the formula, the tetrazole group may include a tautomeric isomer.
Yes. R is the same as above. )

【化7】 A−COX ・・・ (VII) (式中、Aは前記に同じ。Xはハロゲン原子を表す。)[Chemical 7]         A-COX ... (VII) (In the formula, A is the same as above. X represents a halogen atom.)

【0013】また、一般式(I)(化1)で表されるオ
キサジアゾール化合物は次の反応によっても合成するこ
とができる。すなわち、下記一般式(II)(化2)
The oxadiazole compound represented by the general formula (I) (Formula 1) can also be synthesized by the following reaction. That is, the following general formula (II)

【化2】 (式中、R、Xは前記に同じ。)で表される酸ハライド
化合物と、下記一般式(VIII)(化8)の化合物
[Chemical 2] (Wherein R and X are the same as above), and a compound of the following general formula (VIII)

【化8】 A−CONHNH2 ・・・ (VIII) (式中、Aは前記に同じ。)で表される化合物とを反応
させて、下記一般式(IX)(化9)
Embedded image A-CONHNH 2 ... (VIII) (wherein A is the same as above) is reacted to give a compound represented by the following general formula (IX) (Chemical formula 9)

【化9】 (式中、A、Rは上記に同じ。)で表される化合物を製
造し、さらに脱水反応を行うことにより、前記一般式
(I)(化1)で表されるオキサジアゾール化合物を製
造することができる。
[Chemical 9] (Wherein A and R are the same as above), and a dehydration reaction is carried out to produce the oxadiazole compound represented by the general formula (I) (Formula 1). can do.

【0014】更にまた、一般式(I)(化1)で表され
るオキサジアゾール化合物は、下記一般式(VII)(化
7)
Furthermore, the oxadiazole compound represented by the general formula (I) (formula 1) has the following general formula (VII) (formula 7)

【化7】 A−COX ・・・ (VII) (式中、A、Xは前記に同じ。)で表される化合物と、
下記一般式(X)(化10)
Embedded image A-COX ... (VII) (wherein A and X are the same as defined above),
The following general formula (X) (Chemical formula 10)

【化10】 (式中、Rは前記に同じ。)で表される化合物とを反応
させて、前記一般式(IX)(化9)で表される化合物を
製造し、さらに脱水反応を行うことにより、前記一般式
(I)(化1)で表されるオキサジアゾール化合物を製
造することができる。
[Chemical 10] (In the formula, R is the same as above.) To produce a compound represented by the general formula (IX) (Chemical Formula 9), and further dehydration reaction The oxadiazole compound represented by the general formula (I) (Formula 1) can be produced.

【0015】出発原料として使用される一般式(X)
(化10)で表される化合物は下記一般式(XI)(化1
1)
General formula (X) used as a starting material
The compound represented by the chemical formula 10 is represented by the following general formula (XI)
1)

【化11】 (式中、Rは前記に同じ、R’はアルキル基を表す。)
で表されるエステル誘導体と、ヒドラジンとの反応によ
り容易に製造することができる。
[Chemical 11] (In the formula, R is the same as above, and R'represents an alkyl group.)
It can be easily produced by the reaction of the ester derivative represented by and hydrazine.

【0016】前記一般式(IX)(化9)で表される化合
物の前記2種の合成工程は通常塩基性触媒の存在下で行
なわれる。塩基性触媒としては、ピリジン、及びその誘
導体、トリエチルアミン、トリブチルアミン、トリエタ
ノールアミン、キノリン、ピペラジン、モルホリンなど
の有機塩基あるいは水酸化ナトリウム、水酸化カリウ
ム、炭酸ナトリウムなどの無機塩基が挙げられるが、特
に有機の塩基性触媒が好ましい。該工程の反応溶媒とし
ては前記一般式(IX)(化9)で表される化合物を少し
でも溶解するものであればすべてのものが使用できる
が、エタノール、ブタノール等のアルコール系溶媒、ジ
オキサン、テトラヒドロフラン等のエーテル系溶媒、ベ
ンゼン、トルエン、クロルベンゼン、ニトロベンゼン等
の芳香族系溶媒、N,N−ジメチルホルムアミド、ジメ
チルスルホキシド等が好ましい。又、前記したピリジン
等の有機の塩基性触媒を過剰に用い、溶媒としても良
い。
The above-mentioned two synthetic steps of the compound represented by the general formula (IX) (formula 9) are usually carried out in the presence of a basic catalyst. Examples of the basic catalyst include pyridine and its derivatives, organic bases such as triethylamine, tributylamine, triethanolamine, quinoline, piperazine and morpholine, or inorganic bases such as sodium hydroxide, potassium hydroxide and sodium carbonate. Particularly, an organic basic catalyst is preferable. As the reaction solvent in this step, any solvent can be used as long as it can dissolve the compound represented by the general formula (IX) (Chemical Formula 9) even a little, but alcohol solvents such as ethanol and butanol, dioxane, Ether-based solvents such as tetrahydrofuran, aromatic solvents such as benzene, toluene, chlorobenzene and nitrobenzene, N, N-dimethylformamide, dimethyl sulfoxide and the like are preferable. Further, an organic basic catalyst such as pyridine described above may be used in excess and used as a solvent.

【0017】また、前記一般式(IX)(化9)で表され
る化合物を脱水反応させ、閉環させる工程は、オキシ塩
化リン、塩化チオニル、ポリリン酸、ホウ酸、トルエン
スルホン酸等の脱水剤の存在下に行なう。この時の反応
溶媒としては前記工程で示した溶媒が使用できるが、ク
ロルベンゼン、ジクロルベンゼン、キシレン、ニトロベ
ンゼン等の芳香族系溶媒、トリクロルエタン、トリクロ
ルメタン等のハロゲン系溶媒等が特に好ましい。脱水剤
の使用量は出発原料化合物1モルに対して1モルから1
0モル程度が適切であるが、例えば、オキシ塩化リンを
大過剰に用い、溶媒としても良い。通常、反応は、50
℃から300℃で数分から10時間で完了する。
In the step of dehydrating the compound represented by the general formula (IX) (Chemical Formula 9) to perform ring closure, a dehydrating agent such as phosphorus oxychloride, thionyl chloride, polyphosphoric acid, boric acid or toluenesulfonic acid is used. In the presence of. As the reaction solvent at this time, the solvent shown in the above step can be used, but aromatic solvents such as chlorobenzene, dichlorobenzene, xylene and nitrobenzene, halogen solvents such as trichloroethane and trichloromethane are particularly preferable. The amount of the dehydrating agent used is 1 mol to 1 mol based on 1 mol of the starting material compound.
About 0 mol is appropriate, but for example, phosphorus oxychloride may be used in a large excess and used as a solvent. Usually, the reaction is 50
Completed within a few minutes to 10 hours at a temperature of 300 ° C to 300 ° C.

【0018】本発明に係わる一般式(I)(化1)で表
されるオキサジアゾール化合物の具体例を表1に示す。
Table 1 shows specific examples of the oxadiazole compound represented by the general formula (I) (Formula 1) according to the present invention.

【0019】[0019]

【表1−(1)】 [Table 1- (1)]

【0020】[0020]

【表1−(2)】 [Table 1- (2)]

【0021】[0021]

【表1−(3)】 [Table 1- (3)]

【0022】本発明の一般式(I)で示されるオキサジ
アゾール化合物は、有機電界発光素子の構成成分として
特に優れており、例えば、真空蒸着法、溶液塗布法等に
より薄膜化し、陽極及び陰極で直接または間接的に挟持
することにより素子を得ることができる。
The oxadiazole compound represented by the general formula (I) of the present invention is particularly excellent as a constituent component of an organic electroluminescent device. For example, a thin film is formed by a vacuum deposition method, a solution coating method or the like, and an anode and a cathode are formed. The element can be obtained by directly or indirectly sandwiching with.

【0023】[0023]

【実施例】以下、本発明を実施例に基づいて更に詳細に
説明する。尚、本発明はこれら実施例により限定される
ものではない。
EXAMPLES The present invention will now be described in more detail based on examples. The present invention is not limited to these examples.

【0024】合成例1 下記構造式(化12)で表され
る化合物の合成〔一般式(II),R=H〕
Synthesis Example 1 Synthesis of a compound represented by the following structural formula (Formula 12) [general formula (II), R = H]

【化12】 無水ピロメリット酸11gと五塩化リン23gとオキシ
塩化リン9mlとを反応容器中で約16時間加熱還流さ
せ反応を終了させた。反応液から蒸留によって約27g
のオキシ塩化リンを除去し、さらに減圧蒸留により目的
生成物15.34gを得た(収率93.5%)。この化
合物の融点は66.5〜68.5℃であった。KBr錠
剤法により赤外線吸収スペクトルを測定したところ17
90cm-1と1740cm-1に塩化カルボニル基に由来
するCO伸縮振動の吸収が見られた。
[Chemical 12] 11 g of pyromellitic dianhydride, 23 g of phosphorus pentachloride and 9 ml of phosphorus oxychloride were heated to reflux in the reaction vessel for about 16 hours to complete the reaction. About 27g by distillation from the reaction solution
After removing phosphorus oxychloride, the product was distilled under reduced pressure to obtain 15.34 g of the desired product (yield 93.5%). The melting point of this compound was 66.5 to 68.5 ° C. When the infrared absorption spectrum was measured by the KBr tablet method, it was 17
Absorption of CO stretching vibration derived from carbonyl chloride group was observed at 90 cm -1 and 1740 cm -1 .

【0025】合成例2 下記構造式(化13)で表わさ
れる化合物の合成〔一般式(III),A=ビフェニル−
4−イル〕
Synthesis Example 2 Synthesis of a compound represented by the following structural formula (Formula 13) [general formula (III), A = biphenyl-
4-yl]

【化13】 p−シアノビフェニル20.0gとアジ化ソーダ7.9
8gと塩化アンモニウム6.57gを反応容器に入れ、
溶媒としてN,N−ジメチルホルムアミドを55ml加
え、100℃〜110℃にて15時間加熱還流した。放
冷後、水500mlに反応物を注ぎ、濾過し、水500
mlで水洗を行い、粗生成物24.0g(収率96.8
%)を得た。これをジオキサン650mlにて再結晶を
行い、9.94g(収率40.1%)の白色粉末物を得
た。この化合物の分解点は239.5℃〜240.3℃
であった。赤外線吸収スペクトルは、3200cm-1
2500cm-1にかけてテトラゾールのN−H伸縮振動
に帰属されるブロードなピークが観察され、目的化合物
物であることを確認した。
[Chemical 13] 20.0 g of p-cyanobiphenyl and sodium azide 7.9
8 g and ammonium chloride 6.57 g were put into a reaction vessel,
55 ml of N, N-dimethylformamide was added as a solvent, and the mixture was heated under reflux at 100 ° C to 110 ° C for 15 hours. After standing to cool, the reaction product was poured into 500 ml of water, filtered, and washed with water 500
It was washed with water to give 24.0 g of a crude product (yield 96.8).
%) Was obtained. This was recrystallized with 650 ml of dioxane to obtain 9.94 g (yield 40.1%) of a white powder. The decomposition point of this compound is 239.5 ° C to 240.3 ° C.
Met. Infrared absorption spectrum is 3200 cm -1 ~
A broad peak attributable to N—H stretching vibration of tetrazole was observed over 2500 cm −1, and it was confirmed to be a target compound.

【0026】合成例3 化合物No.26の合成〔一般
式(I),A=ビフェニル−4−イル, R=
H〕 合成例1で得られた酸クロリド化合物1.0gと合成例
2で得られたテトラゾール化合物3.48gを反応容器
に入れ、溶媒としてモレキュラシーブで脱水したピリジ
ンを36ml加え、30時間加熱還流した。放冷後メタ
ノール70mlを加え析出物をろ過し、メタノール25
0mlで洗浄して粗生成物2.01g(収率68.8
%)を得た。これを、N,N−ジメチルホルムアミド7
60mlにて再結晶を行い、1.37g(収率46.9
%)の淡黄色針状晶を得た。この化合物の融点は37
2.8℃(DTAピーク)であった。赤外線吸収スペク
トル(KBr錠剤法)を図1に示す。
Synthesis Example 3 Compound No. Synthesis of 26 [general formula (I), A = biphenyl-4-yl, R =
H] 1.0 g of the acid chloride compound obtained in Synthesis Example 1 and 3.48 g of the tetrazole compound obtained in Synthesis Example 2 were placed in a reaction vessel, 36 ml of pyridine dehydrated with molecular sieve as a solvent was added, and the mixture was heated under reflux for 30 hours. . After allowing to cool, 70 ml of methanol was added, the precipitate was filtered, and methanol 25
The product was washed with 0 ml to obtain 2.01 g of a crude product (yield: 68.8).
%) Was obtained. This is N, N-dimethylformamide 7
Recrystallization was performed in 60 ml to give 1.37 g (yield 46.9).
%) Pale yellow needle crystals were obtained. The melting point of this compound is 37
It was 2.8 ° C (DTA peak). The infrared absorption spectrum (KBr tablet method) is shown in FIG.

【0027】[0027]

【表1】 [Table 1]

【0028】応用例 ガラス基板上に大きさ2mm×2mm、厚さ170n
の酸化錫インジウム(ITO)による陽極を形成し、そ
の上に下記式(XIV)(化14)で示されるジアミン誘
導体からなるホール輸送層40nm、下記式(XV)(化
15)で示されるジアミン誘導体からなる発光層15n
m、前記化合物No.26からなる電子輸送層20n
m、下記式(XVI)(化16)で示される電子輸送層3
0nm、10:1原子比のMgAg電極を200nm、
各々真空蒸着により形成し、電界発光素子を作製した。
蒸着時の真空度は0.7×10-6Torrであり、基板
温度は室温である。このようにして作製した素子の陽極
及び陰極にリード線を介して直流電源を接続したとこ
ろ、電流密度425mA/cm2において印加電圧が1
7.2Vであり、緑色の明瞭な発光が長時間にわたっ
て、確認された。なお、この素子は3カ月保存後におい
ても明瞭に発光が確認された。
[0028] Application Example glass substrate size 2mm × 2mm on, thickness 17 0n m
Forming an anode of indium tin oxide (ITO), and having a hole transport layer of 40 nm composed of a diamine derivative represented by the following formula (XIV) (Chemical formula 14) and a diamine represented by the following formula (XV) (Chemical formula 15) Light emitting layer 15n made of a derivative
m, the compound No. 20n of electron transport layer composed of
m, an electron transport layer 3 represented by the following formula (XVI)
0 nm, MgAg electrode of 10: 1 atomic ratio 200 nm,
Each was formed by vacuum vapor deposition to produce an electroluminescent device.
The degree of vacuum during vapor deposition is 0.7 × 10 −6 Torr, and the substrate temperature is room temperature. When a direct current power supply was connected to the anode and cathode of the device thus manufactured through a lead wire, the applied voltage was 1 at a current density of 425 mA / cm 2 .
It was 7.2 V, and a clear green light emission was confirmed over a long period of time. In addition, it was confirmed that the device emitted light clearly even after storage for 3 months.

【化14】 [Chemical 14]

【化15】 [Chemical 15]

【化16】 [Chemical 16]

【0029】比較例 前記化合物No.26の代わりに下記化合物(XVII)
(化17)を用いた以外は応用例1と同様にEL素子を
作製した。この素子に直流電圧を印加したところ、明瞭
な青緑色の発光が認められた。しかし、1ケ月保存後に
おいては、EL発光は認められなかった。
Comparative Example The compound No. The following compound (XVII) instead of 26
An EL device was produced in the same manner as in Application Example 1 except that (Chemical Formula 17) was used. When a DC voltage was applied to this device, clear blue-green light emission was observed. However, no EL emission was observed after storage for 1 month.

【化17】 [Chemical 17]

【0030】[0030]

【発明の効果】本発明のオキサジアゾール化合物は新規
化合物であって、蒸着等によって容易に均質な透明膜を
形成することができ、有機電界発光素子用の電子輸送材
料としての優れた機能も備えており、且つ経時での変質
が少ないので高信頼性有機電界発光用材料として有用で
ある。また、本発明により、該オキサジアゾール化合物
の有利な製造法を提供することができる。
EFFECTS OF THE INVENTION The oxadiazole compound of the present invention is a novel compound and can easily form a homogeneous transparent film by vapor deposition or the like, and also has an excellent function as an electron transport material for an organic electroluminescence device. Since it is provided and has little deterioration over time, it is useful as a highly reliable organic electroluminescent material. Further, the present invention can provide an advantageous method for producing the oxadiazole compound.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のオキサジアゾール化合物〔一般式
(I)においてA=4−ビフェニル−4−イル,R=
H〕の赤外線吸収スペクトル図(KBr錠剤法)であ
る。
1 is an oxadiazole compound of the present invention [in the general formula (I), A = 4-biphenyl-4-yl, R =
It is an infrared absorption spectrum figure (KBr tablet method) of [H].

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI (C07D 413/14 C07D 271:10 271:10 333:10 333:10) C07D 213:16 (C07D 413/14 209:32 213:16 C07D 215:04 271:10) 307:79 (C07D 413/14 209:32 271:10) (C07D 413/14 215:04 271:10) (C07D 413/14 271:10 307:79) (56)参考文献 特開 平4−363891(JP,A) 特開 平6−136359(JP,A) (58)調査した分野(Int.Cl.7,DB名) C07D 271/10 CA(STN) REGISTRY(STN) CASREACT(STN)─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 7 Identification code FI (C07D 413/14 C07D 271: 10 271: 10 333: 10 333: 10) C07D 213: 16 (C07D 413/14 209: 32 213 : 16 C07D 215: 04 271: 10) 307: 79 (C07D 413/14 209: 32 271: 10) (C07D 413/14 215: 04 271: 10) (C07D 413/14 271: 10 307: 79) ( 56) References JP-A-4-363891 (JP, A) JP-A-6-136359 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) C07D 271/10 CA (STN) REGISTRY (STN) CASREAT (STN)

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 下記一般式(I)(化1)で表されるオ
キサジアゾール化合物。 【化1】 (式中、Aは、各々置換もしくは無置換の芳香族炭化水
素基、置換もしくは無置換の芳香族複素環基を表し、そ
れぞれ同じでも異なっていても良い。又、Rは、水素原
子、ハロゲン原子、置換もしくは無置換のアルキル基、
置換もしくは無置換のアルコキシ基、ヒドロキシル基を
表し、それぞれ同じでも異なっていても良い。)
1. An oxadiazole compound represented by the following general formula (I) (Formula 1). [Chemical 1] (In the formula, A represents a substituted or unsubstituted aromatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group, which may be the same or different. R is a hydrogen atom or halogen. An atom, a substituted or unsubstituted alkyl group,
It represents a substituted or unsubstituted alkoxy group or hydroxyl group, which may be the same or different. )
【請求項2】 下記一般式(II)(化2) 【化2】 (式中、Rは、水素原子、ハロゲン原子、置換もしくは
無置換のアルキル基、置換もしくは無置換のアルコキシ
基、ヒドロキシル基を表す。Xはハロゲン原子を表
す。)で表される酸ハライド化合物を、下記一般式(II
I)(化3)あるいは一般式(IV)(化4) 【化3】 【化4】 (式中、Aは、各々置換もしくは無置換の芳香族炭化水
素基、置換もしくは無置換の芳香族複素環基を表す。)
で表されるテトラゾール化合物とを反応させて下記一般
式(I)(化1) 【化1】 (式中、Aは、各々置換もしくは無置換の芳香族炭化水
素基、置換もしくは無置換の芳香族複素環基を表し、そ
れぞれ同じでも異なっていても良い。又、Rは、水素原
子、ハロゲン原子、置換もしくは無置換のアルキル基、
置換もしくは無置換のアルコキシ基、ヒドロキシル基を
表し、それぞれ同じでも異なっていても良い。)で表さ
れるオキサジアゾール化合物を製造することを特徴とす
るオキサジアゾール化合物の製造方法。
2. The following general formula (II) (Chemical formula 2) (In the formula, R represents a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a hydroxyl group. X represents a halogen atom.) , The following general formula (II
I) (Chemical Formula 3) or general formula (IV) (Chemical Formula 4) [Chemical 4] (In the formula, A represents a substituted or unsubstituted aromatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group, respectively.)
By reacting with a tetrazole compound represented by the following general formula (I) (In the formula, A represents a substituted or unsubstituted aromatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group, which may be the same or different. R is a hydrogen atom or halogen. An atom, a substituted or unsubstituted alkyl group,
It represents a substituted or unsubstituted alkoxy group or hydroxyl group, which may be the same or different. The manufacturing method of the oxadiazole compound characterized by manufacturing the oxadiazole compound represented by these.
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