JP3489979B2 - MOS-FET output optical coupling device and method of manufacturing the same - Google Patents
MOS-FET output optical coupling device and method of manufacturing the sameInfo
- Publication number
- JP3489979B2 JP3489979B2 JP28892597A JP28892597A JP3489979B2 JP 3489979 B2 JP3489979 B2 JP 3489979B2 JP 28892597 A JP28892597 A JP 28892597A JP 28892597 A JP28892597 A JP 28892597A JP 3489979 B2 JP3489979 B2 JP 3489979B2
- Authority
- JP
- Japan
- Prior art keywords
- mos
- fet
- injection
- photoelectric conversion
- optical coupling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、MOS−FET出
力光結合素子及びその製造方法に関し、より詳しくは、
電気的特性及び品質が安定し、且つ低入力タイプの小型
のMOS−FET光結合素子及びその製造方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a MOS-FET output optical coupling device and a method of manufacturing the same, and more specifically,
The present invention relates to a small-input type small-sized MOS-FET optical coupling element having stable electric characteristics and quality and a manufacturing method thereof.
【0002】[0002]
【従来の技術】モデム装置の電話回線への接続切り換え
用のリレーは、高信頼性及び無接点化への対応を図るべ
く、従来の電磁リレーから半導体リレーへの移行が進ん
でおり、その中でも特に、双方向通電が可能なMOS−
FET出力光結合素子の開発が近年急速に進められてい
る。更に、モデム装置の小型化、薄型化により使用する
素子も小型化、薄型化が要望されている。2. Description of the Related Art A relay for switching a connection of a modem device to a telephone line is shifting from a conventional electromagnetic relay to a semiconductor relay in order to achieve high reliability and non-contact. Especially, a MOS-
In recent years, the development of FET output optical coupling elements has been rapidly advanced. Further, as the modem device is made smaller and thinner, the elements used are also required to be smaller and thinner.
【0003】図5(a)、(b)は従来のMOS−FE
T出力光結合素子の構造を示す。同図(b)に示すよう
に、上下一対のリードフレーム1、1は金属製の板材を
折り曲げ加工してL字状に形成されており、その一端部
は上下に対向している。5A and 5B show a conventional MOS-FE.
The structure of a T output optical coupling element is shown. As shown in FIG. 1B, the pair of upper and lower lead frames 1 and 1 are formed into an L shape by bending a metal plate material, and one ends thereof vertically oppose each other.
【0004】リードフレーム1、1の対向面には、同図
(a)、(b)に示すように、発光素子2、光電変換素
子3及びMOS−FET4がダイボンドされている。よ
り具体的には、上側のリードフレーム1の対向面に発光
素子2がダイボンドされ、下側のリードフレーム1の対
向面に光電変換素子3及びMOS−FET4がダイボン
ドされている。なお、このMOS−FET出力光結合素
子は、双方向出力タイプのMOS−FET出力光結合素
子であるため、MOS−FET4は光電変換素子3の左
右両側に設けられている。As shown in FIGS. 1A and 1B, a light emitting element 2, a photoelectric conversion element 3 and a MOS-FET 4 are die-bonded to the opposing surfaces of the lead frames 1 and 1. More specifically, the light emitting element 2 is die-bonded to the facing surface of the upper lead frame 1, and the photoelectric conversion element 3 and the MOS-FET 4 are die-bonded to the facing surface of the lower lead frame 1. Since this MOS-FET output optical coupling element is a bidirectional output type MOS-FET output optical coupling element, the MOS-FET 4 is provided on both left and right sides of the photoelectric conversion element 3.
【0005】加えて、これらの素子2、3、4には金線
5がワイヤーボンドされている。また、発光素子2と光
電変換素子3との間には、シリコーン樹脂等の透明樹脂
からなる光のパス(ドッキングパス)6が形成されてい
る。光のパス6は下側に向かうに連れて直径が緩やかに
増大する形状に形成されている。そして、上記の素子及
び部材は、遮光性エポキシ樹脂7にてモールドされてい
る。In addition, a gold wire 5 is wire-bonded to these elements 2, 3 and 4. A light path (docking path) 6 made of a transparent resin such as a silicone resin is formed between the light emitting element 2 and the photoelectric conversion element 3. The light path 6 is formed in a shape in which the diameter gradually increases toward the lower side. The above-mentioned elements and members are molded with the light-shielding epoxy resin 7.
【0006】次に、図6に基づき上記従来のMOS−F
ET出力光結合素子の出荷迄の工程について説明する。
まず、上記形状のリードフレーム1、1に発光素子2、
光電変換素子3及びMOS−FET4、4を各々ダイボ
ンドする。次に、金線5にてワイヤーボンドを施した
後、発光素子2と光電変換素子3との間に透明樹脂を充
填し、これにより光のパス6を作製する。続いて、遮光
性エポキシ樹脂7にてモールドを行う。Next, referring to FIG. 6, the conventional MOS-F described above is used.
The process of shipping the ET output optical coupling device will be described.
First, the light emitting element 2 is attached to the lead frames 1 and 1 having the above shapes
The photoelectric conversion element 3 and the MOS-FETs 4 and 4 are die-bonded. Next, after wire bonding is performed with the gold wire 5, a transparent resin is filled between the light emitting element 2 and the photoelectric conversion element 3 to thereby form the light path 6. Subsequently, molding is performed with the light-shielding epoxy resin 7.
【0007】その後、図6に示すように、外装めっき、
リードフォーミング、絶縁耐圧試験、電気的特性試験、
マーキング及び外観検査を行い、その後、梱包を経て出
荷される。Thereafter, as shown in FIG. 6, exterior plating,
Lead forming, dielectric strength test, electrical characteristic test,
Marking and visual inspection are performed, and then the product is packaged before shipping.
【0008】なお、上記の製造工程は、パッケージの違
い(DIP,SOP)に関わらず同一の工程によって行
われる。The above manufacturing process is performed by the same process regardless of the difference in package (DIP, SOP).
【0009】[0009]
【発明が解決しようとする課題】ところで、上記従来の
MOS−FET出力光結合素子では、以下に示すような
問題がある。The conventional MOS-FET output optical coupling device described above has the following problems.
【0010】(1)ドッキングパス6の形状に起因する
問題点
発光素子2と光電変換素子3との間にシリコーン樹脂等
でドッキングパス6を形成し、光を伝達する際、従来の
技術ではドッキングパス6を形成する樹脂の粘度変化、
粘度ばらつき及び樹脂を注入する際の角度のばらつき等
に起因してドッキングパス6の形状が安定しにくく、発
光素子2の側面からの反射光もほとんど光電変換素子3
には伝達されない。(1) Problems caused by the shape of the docking path 6 When the docking path 6 is formed between the light emitting element 2 and the photoelectric conversion element 3 with a silicone resin or the like and light is transmitted, the docking according to the conventional technique is performed. Change in viscosity of resin forming path 6,
The shape of the docking path 6 is difficult to stabilize due to variations in viscosity, variations in angle when injecting resin, and the like, and almost all reflected light from the side surface of the light emitting element 2 is included in the photoelectric conversion element 3.
Is not transmitted to.
【0011】例えば、図7(a)、(b)に示すよう
に、ドッキングパス6を形成する樹脂量が少ないと、光
電変換素子3のエッジ8がドッキングパス6から露出
し、その露出したエッジ8にクラックが発生する可能性
がある。For example, as shown in FIGS. 7A and 7B, when the amount of resin forming the docking path 6 is small, the edge 8 of the photoelectric conversion element 3 is exposed from the docking path 6, and the exposed edge is exposed. 8 may be cracked.
【0012】また、光電変換素子3は複数の受光セルを
直列に配列した構造になっており、その構造上、受光部
全体に光を受けないと、必要とする電圧が得られなくな
る。The photoelectric conversion element 3 has a structure in which a plurality of light receiving cells are arranged in series. Due to the structure, the required voltage cannot be obtained unless the entire light receiving portion receives light.
【0013】更に、光電変換素子3は上述したように、
より多くの光を受光部全体に受けて電圧に変換する必要
があるが、MOS−FET4に関しては逆に光を受ける
と誤動作(リーク)を起こす欠点がある。Further, the photoelectric conversion element 3 is, as described above,
Although it is necessary to receive a larger amount of light in the entire light receiving portion and convert it into a voltage, the MOS-FET 4 has a drawback that malfunction (leakage) occurs when receiving light.
【0014】よって、図8(a)、(b)に示すよう
に、樹脂量が多いと、発光素子2と光電変換素子3との
間を構成するドッキングパス6がMOS−FET4、4
側に流れ、発光素子2からの光がMOS−FET4、4
に漏れ、MOS−FET4、4がリークし、特性不良と
なる。Therefore, as shown in FIGS. 8A and 8B, when the amount of resin is large, the docking path 6 forming between the light emitting element 2 and the photoelectric conversion element 3 has MOS-FETs 4 and 4.
The light from the light-emitting element 2 flows to the side, and the MOS-FETs 4 and 4
To the MOS-FETs 4 and 4, resulting in poor characteristics.
【0015】(2)光電素子2とMOS−FET4との
間の配線に起因する問題点
図9は、一般的なMOS−FET出力光結合素子(双方
向出カタイプ)の内部結線図及びワイヤレイアウトを示
す。図9に示す通り、光電変換素子3とMOS−FET
4、4は電気的に接続する必要があり、ダミーリードを
介さない場合、チップ−チップ間にワイヤを打つ必要が
生じる。なお、SOPタイプのように、パッケージに余
裕がない場合は、ダミーリードをつくることは不可能で
ある。(2) Problems Caused by Wiring Between Optoelectronic Element 2 and MOS-FET 4 FIG. 9 shows the internal wiring diagram and wire layout of a general MOS-FET output optical coupling element (bidirectional output type). Indicates. As shown in FIG. 9, the photoelectric conversion element 3 and the MOS-FET
4 and 4 need to be electrically connected, and if a dummy lead is not used, it is necessary to hit a wire between chips. It should be noted that it is impossible to make dummy leads if the package does not have enough space as in the SOP type.
【0016】ここで、チップ−チップ間にワイヤを打つ
場合、一般的に2ndボンデイングは、1stボンディ
ングと比較してボンディング部へかかるストレスが大き
いため、チップパッドの大きさやパッドの厚み等に制約
ができてくる。In the case of hitting a wire between chips, generally, in the second bonding, the stress applied to the bonding portion is larger than that in the first bonding, so that the size of the chip pad and the thickness of the pad are restricted. It's done.
【0017】このため、チップパッドに2ndボンディ
ングを実施する場合は、一般的なチップ−リード間のワ
イヤボンドと比較して工程上の調整が難しくなり、ひい
ては工程歩留りの低下につながる。Therefore, when the second bonding is performed on the chip pad, the adjustment in the process becomes difficult as compared with the general wire bond between the chip and the lead, and the process yield is lowered.
【0018】本発明は、このような現状に鑑みてなされ
たものであり、電気的特性及び品質が安定し、歩留りの
向上を図ることができるMOS−FET出力光結合素子
及びその製造方法を提供することを目的とする。The present invention has been made in view of the above circumstances, and provides a MOS-FET output optical coupling element and a method of manufacturing the same, which have stable electric characteristics and quality and can improve the yield. The purpose is to do.
【0019】本発明の他の目的は、低入力タイプの小型
のMOS−FET光結合素子及びその製造方法を提供す
ることにある。Another object of the present invention is to provide a small input type small-sized MOS-FET optical coupling element and a manufacturing method thereof.
【0020】また、本発明の他の目的は、工程数を削減
でき、その分、製造能率を向上できるMOS−FET出
力光結合素子の製造方法を提供することにある。Another object of the present invention is to provide a method of manufacturing a MOS-FET output optical coupling device which can reduce the number of steps and correspondingly improve the manufacturing efficiency.
【0021】[0021]
【課題を解決するための手段】本発明のMOS−FET
出力光結合素子は、一対の射出成型樹脂基板にめっきパ
ターンを設け、一方の射出成型樹脂基板に発光素子を搭
載し、他方の射出成型樹脂基板に光電変換素子及びMO
S−FETを搭載し、双方の射出成型樹脂基板を透光性
樹脂を介して貼り合わせた構造のMOS−FET出力光
結合素子であって、前記各射出成型樹脂基板に、少なく
とも2本の壁部がそれぞれ設けられ、前記各射出成型樹
脂基板における該2本の壁部間に該発光素子および前記
光電変換素子がそれぞれ配置され、該光電変換素子が配
置された射出成型樹脂基板の外壁と、少なくとも一方の
壁部との間に前記MOS−FETが配置されており、該
光電変換素子と該MOS−FETとの間にめっきパター
ンが設けられて、該めっきパターンと該光電変換素子お
よび該MOS−FETとが、それぞれワイヤーボンドさ
れており、該発光素子の両側に位置する各壁部の対向面
に該発光素子の側面からの反射光を該光電変換素子に効
率よく伝達させる傾斜反射面が形成されており、そのこ
とにより上記目的が達成される。Means for Solving the Problems MOS-FET of the present invention
In the output optical coupling element, a plating pattern is provided on a pair of injection-molded resin substrates, a light-emitting element is mounted on one injection-molded resin substrate, and a photoelectric conversion element and a MO light-emitting element are mounted on the other injection-molded resin substrate.
A MOS-FET output optical coupling device having a structure in which an S-FET is mounted and both injection-molded resin substrates are bonded to each other through a translucent resin, wherein each injection-molded resin substrate has at least two walls. parts are respectively provided, the light emitting element and the between the two walls in each of the injection molding resin substrate
Each photoelectric conversion element is arranged, and the photoelectric conversion element is arranged.
The outer wall of the injection-molded resin substrate placed on the
The MOS-FET is arranged between the wall and
A plating pattern is provided between the photoelectric conversion element and the MOS-FET.
Are provided, the plating pattern and the photoelectric conversion element
And the MOS-FET are wire-bonded respectively.
In addition, inclined reflecting surfaces that efficiently transmit the reflected light from the side surface of the light emitting element to the photoelectric conversion element are formed on the facing surfaces of the respective wall portions located on both sides of the light emitting element. The above object is achieved.
【0022】 好ましくは、前記光電変換素子が配置さ
れた他方の射出成型樹脂基板の前記光電変換素子の両側
に位置する各壁部の対向面にも、該発光素子の側面から
の反射光を該光電変換素子に効率よく伝達させる傾斜反
射面がそれぞれ形成されている。Preferably, the photoelectric conversion element is arranged.
Both sides of the photoelectric conversion element of the other injection molded resin substrate
From the side surface of the light emitting element to the facing surface of each wall portion located at
Tilt reflection that efficiently transmits the reflected light of the
Each of the shooting surfaces is formed .
【0023】また、好ましくは、前記射出成型樹脂基板
の前記傾斜反射面に反射効率の高い材料からなるめっき
を施す構成とする。Further, it is preferable that the inclined reflection surface of the injection-molded resin substrate is plated with a material having high reflection efficiency.
【0024】 また、好ましくは、前記両射出成型樹脂
基板にそれぞれ形成された前記壁部の先端面同士が、該
両射出成型樹脂基板を貼り合わせた際に密着するように
構成する。[0024] Preferably, the front end surfaces of the wall portions formed on the both injection-molded resin substrates are in close contact with each other when the both injection-molded resin substrates are attached to each other. .
【0025】[0025]
【0026】また、好ましくは、前記MOS−FETが
前記光電変換素子の両側に配置されている構成とする。Preferably, the MOS-FET is arranged on both sides of the photoelectric conversion element.
【0027】また、本発明のMOS−FET出力光結合
素子の製造方法は、請求項1〜請求項6記載のMOS−
FET出力光結合素子の製造方法であって、一方の射出
成型樹脂基板の対向面に発光素子をダイボンドし、他方
の射出成型樹脂基板の対向面に光電変換素子及びMOS
−FETをダイボンドし、更にこれらの素子にワイヤボ
ンドを施す工程と、両射出成型樹脂基板を透光性樹脂を
介して貼り合わせる工程と、貼り合わせた基板をチップ
毎に分割する工程と、その後に絶縁耐圧試験等の検査を
行う工程とを包含しており、そのことにより上記目的が
達成される。A method of manufacturing a MOS-FET output optical coupling element according to the present invention is a MOS-type device according to any one of claims 1 to 6.
A method of manufacturing a FET output optical coupling element, comprising: die-bonding a light emitting element to a facing surface of one injection-molded resin substrate; and photoelectric conversion element and MOS on a facing surface of another injection-molded resin substrate.
-The step of die-bonding the FET and the wire-bonding to these elements, the step of bonding both injection-molded resin substrates through the translucent resin, the step of dividing the bonded substrates into chips, and then And a step of performing an inspection such as a dielectric strength test, thereby achieving the above object.
【0028】以下に、本発明の作用を説明する。The operation of the present invention will be described below.
【0029】上記のように、少なくとも一方の射出成型
樹脂基板に、少なくとも2本の壁部を設け、2本の壁部
間に発光素子を配置し、壁部の対向面に発光素子の側面
からの反射光を光電変換素子に効率よく伝達させる傾斜
反射面を形成する構成によれば、光電変換素子に導かれ
る反射光の利用効率を向上できるので、MOS−FET
がリークすることに起因する特性不良を来すことがな
い。加えて、低入力電流タイプの小型のMOS−FET
出力光結合素子を実現できる利点もある。As described above, at least one injection-molded resin substrate is provided with at least two wall portions, the light emitting element is disposed between the two wall portions, and the side surface of the light emitting element is provided on the opposite surface of the wall portion. According to the configuration in which the inclined reflection surface that efficiently transmits the reflected light of the photoelectric conversion element is formed, the utilization efficiency of the reflected light guided to the photoelectric conversion element can be improved.
Does not cause a characteristic defect due to the leakage. In addition, a small input current type small MOS-FET
There is also an advantage that an output optical coupling element can be realized.
【0030】また、壁部及び傾斜反射面を他方の射出成
型樹脂基板にも形成し、壁部間に光電変換素子を搭載す
る構成によれば、より一層反射光の利用効率を向上でき
るMOS−FET出力光結合素子を実現できる。Further, according to the construction in which the wall portion and the inclined reflecting surface are formed on the other injection-molded resin substrate and the photoelectric conversion element is mounted between the wall portions, the efficiency of utilizing the reflected light can be further improved. A FET output optical coupling element can be realized.
【0031】また、傾斜反射面に反射効率の高い材料か
らなるめっきを施す構成によれば、光の減衰を少なくで
きるので、発光素子からの反射光をより一層効率よく光
電変換素子に導くことができる。このため、より一層特
性が安定した、低入力電流タイプの小型のMOS−FE
T出力光結合素子を実現できる。Further, according to the configuration in which the inclined reflecting surface is plated with a material having high reflection efficiency, the attenuation of light can be reduced, so that the reflected light from the light emitting element can be guided to the photoelectric conversion element more efficiently. it can. For this reason, a low input current type small-sized MOS-FE with more stable characteristics.
A T output optical coupling element can be realized.
【0032】また、壁部が前記両射出成型樹脂基板に形
成され、該両射出成型樹脂基板を貼り合わせた際に、両
壁部の先端面同士が密着する構成によれば、発光素子と
MOS−FET出力光結合素子が壁部によって光学的に
遮断されるので、MOS−FETに発光素子からの光が
漏れることがない。このため、MOS−FETが誤動作
を起こすことがないので、電気的特性の優れたMOS−
FET出力光結合素子を実現できる。Further, according to the construction in which the wall portions are formed on the both injection-molded resin substrates, and when the both injection-molded resin substrates are bonded together, the front end surfaces of the both wall portions are in close contact with each other, the light emitting element and the MOS Since the -FET output optical coupling element is optically blocked by the wall portion, light from the light emitting element does not leak to the MOS-FET. Therefore, since the MOS-FET does not malfunction, the MOS-FET having excellent electrical characteristics is used.
A FET output optical coupling element can be realized.
【0033】また、光電変換素子とMOS−FET間に
めっきパターンを形成する構成によれば、このめっきパ
ターン上に2ndボンディングを実施することにより、
チップ−チップ間のワイヤを削除でき、その分、ワイヤ
ーボンド工程が安定するので、製品の歩留りを向上でき
る。Further, according to the structure in which the plating pattern is formed between the photoelectric conversion element and the MOS-FET, the 2nd bonding is performed on the plating pattern.
The wire between the chips can be deleted, and the wire bonding process can be stabilized accordingly, so that the product yield can be improved.
【0034】また、MOS−FETを光電変換素子の両
側に配置する構成によれば、双方向出力タイプのMOS
−FET出力光結合素子を実現できる。Further, according to the configuration in which the MOS-FET is arranged on both sides of the photoelectric conversion element, the bidirectional output type MOS is provided.
A FET output optical coupling device can be realized.
【0035】[0035]
【発明の実施の形態】以下に本発明の実施の形態を図面
に基づき具体的に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be specifically described below with reference to the drawings.
【0036】(実施形態1)図1及び図2は本発明MO
S−FET出力光結合素子の実施形態1を示す。まず、
図1に基づきMOS−FET出力光結合素子の構成を説
明する。このMOS−FET出力光結合素子は、発光素
子2がダイボンドされた射出成型樹脂基板9と、光電変
換素子3及びMOS−FET4、4がダイボンドされた
射出成型樹脂基板9とをシリコーン樹脂等の透光性樹脂
6を介して貼り合わせることによって作製される。射出
成型樹脂基板9、9の材質としては、例えば、液晶ポリ
マーを用いればよい。(Embodiment 1) FIGS. 1 and 2 show the MO of the present invention.
1 shows Embodiment 1 of an S-FET output optical coupling element. First,
The structure of the MOS-FET output optical coupling element will be described with reference to FIG. In this MOS-FET output optical coupling element, an injection-molded resin substrate 9 to which the light emitting element 2 is die-bonded and an injection-molded resin substrate 9 to which the photoelectric conversion element 3 and the MOS-FETs 4 and 4 are die-bonded are made of a silicone resin or the like. It is manufactured by pasting together through the light-sensitive resin 6. As a material for the injection molded resin substrates 9 and 9, for example, liquid crystal polymer may be used.
【0037】射出成型樹脂基板9、9は、いずれも正面
断面視コ字状をなし、その左右方向中間部には、2本の
壁部10、10がそれぞれ立設されている。2本の壁部
10、10の対向面(水平方向の対向面)は、先端に向
けて幅狭になった傾斜面10’、10’に形成されてい
る。両射出成型樹脂基板9、9を貼り合わせた状態にお
いて、上下の壁部10、10間には隙間が形成されてい
る。Each of the injection-molded resin substrates 9 and 9 has a U-shape in a front sectional view, and two wall portions 10 and 10 are provided upright in the middle portion in the left-right direction thereof. The facing surfaces (horizontal facing surfaces) of the two wall portions 10 and 10 are formed as inclined surfaces 10 ′ and 10 ′ that become narrower toward the tip. A gap is formed between the upper and lower wall portions 10 and 10 when the two injection-molded resin substrates 9 and 9 are bonded to each other.
【0038】上側の射出成型樹脂基板9の2本の壁部1
0、10間には発光素子2がダイボンドされている。即
ち、2本の壁部10、10で形成される凹部の底面に発
光素子2がダイボンドされている。加えて、発光素子2
には金線5にてワイヤーボンドが施されている。Two walls 1 of the upper injection-molded resin substrate 9
The light emitting element 2 is die-bonded between 0 and 10. That is, the light emitting element 2 is die-bonded to the bottom surface of the recess formed by the two wall portions 10 and 10. In addition, the light emitting element 2
A wire bond is made with a gold wire 5.
【0039】壁部10、10に形成された傾斜面1
0’、10’は、発光素子2からの反射光を効率よく光
電変換素子3に導くために形成されている。即ち、傾斜
面10’、10’の傾斜角度は発光素子2(特に、その
側面)からの反射光を効率よく光電変換素子3に導ける
角度に選定されている。Inclined surface 1 formed on the walls 10 and 10.
0 ′ and 10 ′ are formed in order to efficiently guide the reflected light from the light emitting element 2 to the photoelectric conversion element 3. That is, the inclination angles of the inclined surfaces 10 ′ and 10 ′ are selected so that the reflected light from the light emitting element 2 (particularly the side surface thereof) can be efficiently guided to the photoelectric conversion element 3.
【0040】なお、本実施形態1では、反射光をより一
層効率よく光電変換素子3に導くため、傾斜面10’、
10’には、金めっき、パラジュウムめっき、銀めっき
等の反射効率の高い材料からなるめっき11を施してあ
る。即ち、このようなめっき11を施すと、光の減衰を
少なくでき、その分、反射光をより一層効率よく光電変
換素子3に導けるからである。In the first embodiment, in order to guide the reflected light to the photoelectric conversion element 3 more efficiently, the inclined surface 10 ',
10 'is provided with a plating 11 made of a material having high reflection efficiency such as gold plating, palladium plating, silver plating and the like. That is, when such plating 11 is applied, the attenuation of light can be reduced, and the reflected light can be guided to the photoelectric conversion element 3 more efficiently.
【0041】一方、下側の射出成型樹脂基板9の壁部1
0、10間には光電変換素子3がダイボンドされてい
る。また、その左右両側にはMOS−FET4、4がダ
イボンドされている。即ち、壁部10と射出成型樹脂基
板9の外壁との間にMOS−FET4がダイボンドされ
ている。上記同様の理由により、下側の射出成型樹脂基
板9の壁部10、10の傾斜面10’、10’にもめっ
き11が施されている。On the other hand, the wall portion 1 of the lower injection-molded resin substrate 9
The photoelectric conversion element 3 is die-bonded between 0 and 10. Further, MOS-FETs 4 and 4 are die-bonded on the left and right sides thereof. That is, the MOS-FET 4 is die-bonded between the wall portion 10 and the outer wall of the injection-molded resin substrate 9. For the same reason as above, plating 11 is also applied to the inclined surfaces 10 'and 10' of the wall portions 10 and 10 of the lower injection-molded resin substrate 9.
【0042】なお、光電変換素子3及びMOS−FET
4、4には金線5にてワイヤーボンドが施されている。The photoelectric conversion element 3 and the MOS-FET
Wire bonds are applied to the wires 4 and 4 with a gold wire 5.
【0043】上記構成において、発光素子2からの直接
光はそのまま光電変換素子3の受光部に伝達される。ま
た、発光素子2の側面からの光は、上下の射出成型樹脂
基板9、9の壁部10に形成された傾斜面10’によっ
て光電変換素子3の受光部に伝達される。In the above structure, the direct light from the light emitting element 2 is directly transmitted to the light receiving portion of the photoelectric conversion element 3. Further, the light from the side surface of the light emitting element 2 is transmitted to the light receiving portion of the photoelectric conversion element 3 by the inclined surface 10 ′ formed on the wall portions 10 of the upper and lower injection molded resin substrates 9, 9.
【0044】次に、図2に基づき本実施形態1のMOS
−FET出力光結合素子の製造工程について説明する。Next, the MOS of the first embodiment will be described with reference to FIG.
The manufacturing process of the -FET output optical coupling element will be described.
【0045】上下の射出成型樹脂基板9、9の対応する
箇所に上記従来例同様に、発光素子2、光電変換素子3
及びMOS−FET4、4をダイボンドし、続いて、こ
れらの素子に金線5にてワイヤーボンドを施す。Similar to the above-mentioned conventional example, the light emitting element 2 and the photoelectric conversion element 3 are provided on the corresponding portions of the upper and lower injection molded resin substrates 9, 9.
Then, the MOS-FETs 4 and 4 are die-bonded, and subsequently, a gold wire 5 is wire-bonded to these elements.
【0046】次に、シリコーン樹脂等の透光性樹脂6を
介して上下の射出成型樹脂基板9、9を貼り合わせる。Next, the upper and lower injection-molded resin substrates 9 and 9 are attached to each other with a translucent resin 6 such as a silicone resin interposed therebetween.
【0047】次に、ダイシング工程によって貼り合わせ
た基板を個々のチップに分割する。そして、分割された
チップ毎に、それぞれ絶縁耐圧試験、電気的特性試験、
マーキング及び外観検査を行い、その後、梱包を経て出
荷される。Next, the bonded substrates are divided into individual chips by the dicing process. Then, for each of the divided chips, withstand voltage test, electrical characteristic test,
Marking and visual inspection are performed, and then the product is packaged before shipping.
【0048】本発明製造方法を図6に示す従来の製造工
程と比較すると、金属フレームの溶接工程、ドッキング
形成工程、モールド工程、外装めっき工程及びリードフ
ォーミング工程が不要となり、貼り合わせ工程を付加す
るだけでよいので、従来方法に比べて工程数を大幅に削
減できる。When the manufacturing method of the present invention is compared with the conventional manufacturing process shown in FIG. 6, the welding process of the metal frame, the docking forming process, the molding process, the exterior plating process and the lead forming process are unnecessary, and the bonding process is added. Therefore, the number of steps can be significantly reduced as compared with the conventional method.
【0049】よって、本発明方法によれば、製造能率を
向上でき、安価なMOS−FET出力光結合素子を提供
できる利点がある。Therefore, according to the method of the present invention, there is an advantage that the manufacturing efficiency can be improved and an inexpensive MOS-FET output optical coupling element can be provided.
【0050】なお、本実施形態1においては、上下の射
出成型樹脂基板9、9の壁部10に傾斜面10’を形成
しているが、上側の射出成型樹脂基板9の壁部10のみ
に傾斜面10’を形成する構成によっても、光電変換素
子に導かれる反射光の利用効率を向上できるので、かか
る実施形態も本発明の適用範囲である。In the first embodiment, the upper and lower injection-molded resin substrates 9 and 9 are provided with the inclined surfaces 10 'on the walls 10, but only the wall 10 of the upper injection-molded resin substrate 9 is formed. Since the utilization efficiency of the reflected light guided to the photoelectric conversion element can also be improved by the configuration of forming the inclined surface 10 ′, such an embodiment is also within the scope of application of the present invention.
【0051】(実施形態2)図3は本発明MOS−FE
T出力光結合素子の実施形態2を示す。本実施形態2の
MOS−FET出力光結合素子は、上下の射出成型樹脂
基板9、9に形成された壁部12の高さが異なる他は実
施形態1のMOS−FET出力光結合素子と同様の構成
になっている。よって、対応する部分に同一の符号を付
し、重複する説明は省略し、以下では異なる点のみにつ
いて説明する。(Embodiment 2) FIG. 3 shows the MOS-FE of the present invention.
Embodiment 2 of a T output optical coupling element is shown. The MOS-FET output optical coupling element of the second embodiment is the same as the MOS-FET output optical coupling element of the first embodiment except that the heights of the wall portions 12 formed on the upper and lower injection-molded resin substrates 9, 9 are different. It has a configuration of. Therefore, the same reference numerals are given to corresponding parts, duplicated description will be omitted, and only different points will be described below.
【0052】図3に示すように、上下いずれの射出成型
樹脂基板9、9においても、壁部12の高さは外壁の高
さと同一であり、両者を貼り合わせると、上下の壁部1
2、12の先端面同士が密着する構成になっている。As shown in FIG. 3, the height of the wall portion 12 is the same as the height of the outer wall in both the upper and lower injection-molded resin substrates 9 and 9.
The tip surfaces of 2 and 12 are in close contact with each other.
【0053】このため、光電素子3とMOS−FET
4、4とはこれらの壁部12によって光学的に分離され
る。よって、発光素子2からの光がMOS−FET4、
4に漏れることがないので、MOS−FET4、4が誤
動作することはない。Therefore, the photoelectric element 3 and the MOS-FET are
The walls 4 and 4 are optically separated from each other. Therefore, the light from the light emitting element 2 is emitted from the MOS-FET 4,
Since there is no leakage to the MOS-FET 4, the MOS-FETs 4 and 4 do not malfunction.
【0054】それ故、本実施形態2によれば、電気的特
性に優れたMOS−FET出力光結合素子を実現するこ
とができる。Therefore, according to the second embodiment, it is possible to realize a MOS-FET output optical coupling element having excellent electrical characteristics.
【0055】なお、本実施形態2においても、壁部12
の傾斜面12’にめっき11を施すことが可能である。In the second embodiment as well, the wall portion 12
It is possible to apply the plating 11 to the inclined surface 12 ′.
【0056】また、本実施形態2のMOS−FET出力
光結合素子は、図2に示す工程により作製される。同様
に、次に説明する本実施形態3のMOS−FET出力光
結合素子も同じ工程によって作製される。Further, the MOS-FET output optical coupling element of the second embodiment is manufactured by the process shown in FIG. Similarly, the MOS-FET output optical coupling element of the third embodiment, which will be described next, is also manufactured by the same process.
【0057】(実施形態3)図4は本発明MOS−FE
T出力光結合素子の実施形態3を示す。本実施形態3の
MOS−FET出力光結合素子は、光電素子3とMOS
−FET4、4間にめっきパターン13、13を形成し
た点が実施形態1及び実施形態2と異なる他は同様の構
成になっている。対応する部分に同一の符号を付し、重
複する説明は省略する。なお、図4において、壁部10
等については省略してある。(Third Embodiment) FIG. 4 shows the MOS-FE of the present invention.
Embodiment 3 of a T output optical coupling element is shown. The MOS-FET output optical coupling element according to the third embodiment includes a photoelectric element 3 and a MOS.
The configuration is the same as that of the first and second embodiments except that the plating patterns 13 and 13 are formed between the -FETs 4 and 4. Corresponding parts are designated by the same reference numerals, and overlapping description will be omitted. In FIG. 4, the wall portion 10
Etc. are omitted.
【0058】本実施形態3のMOS−FET出力光結合
素子においては、めっきパターン13、13上に2nd
ボンディングを実施し、これによりチップ−チップ間の
ワイヤを削除している。In the MOS-FET output optical coupling element of the third embodiment, 2nd is formed on the plating patterns 13 and 13.
Bonding is performed, thereby removing the chip-to-chip wire.
【0059】このため、本実施形態4のMOS−FET
出力光結合素子によれば、その分、ワイヤーボンド工程
を安定的且つ容易に行えるので、製品の歩留りを向上で
きる利点がある。Therefore, the MOS-FET of the fourth embodiment is
According to the output optical coupling element, since the wire bonding process can be stably and easily performed correspondingly, there is an advantage that the yield of products can be improved.
【0060】[0060]
【発明の効果】以上の本発明MOS−FET出力光結合
素子によれば、少なくとも一方の射出成型樹脂基板に、
少なくとも2本の壁部を設け、2本の壁部間に発光素子
を配置し、壁部の対向面に発光素子の側面からの反射光
を光電変換素子に効率よく伝達させる傾斜反射面を形成
する構成によれば、光電変換素子に導かれる反射光の利
用効率を向上できるので、MOS−FETがリークする
ことに起因する特性不良を来すことがない。加えて、低
入力電流タイプの小型のMOS−FET出力光結合素子
を実現できる利点もある。According to the above MOS-FET output optical coupling element of the present invention, at least one injection-molded resin substrate,
At least two wall portions are provided, the light emitting element is arranged between the two wall portions, and an inclined reflection surface that efficiently transmits light reflected from the side surface of the light emitting element to the photoelectric conversion element is formed on the opposite surface of the wall portion. According to this configuration, the utilization efficiency of the reflected light guided to the photoelectric conversion element can be improved, so that characteristic defects due to leakage of the MOS-FET do not occur. In addition, there is an advantage that a small input current type MOS-FET output optical coupling element can be realized.
【0061】また、特に請求項2記載のMOS−FET
出力光結合素子によれば、壁部及び傾斜反射面を他方の
射出成型樹脂基板にも形成し、壁部間に光電変換素子を
搭載する構成をとるので、より一層反射光の利用効率を
向上できるMOS−FET出力光結合素子を実現でき
る。In particular, the MOS-FET according to claim 2
According to the output light coupling element, since the wall portion and the inclined reflection surface are formed on the other injection-molded resin substrate and the photoelectric conversion element is mounted between the wall portions, the utilization efficiency of reflected light is further improved. A possible MOS-FET output optical coupling device can be realized.
【0062】また、特に請求項3記載のMOS−FET
出力光結合素子によれば、傾斜反射面に反射効率の高い
材料からなるめっきを施す構成をとるので、光の減衰を
少なくできるので、発光素子からの反射光をより一層効
率よく光電変換素子に導くことができる。このため、よ
り一層特性が安定した、低入力電流タイプの小型のMO
S−FET出力光結合素子を実現できる。In particular, the MOS-FET according to claim 3
According to the output light coupling element, since the inclined reflection surface is plated with a material having high reflection efficiency, the attenuation of light can be reduced, so that the reflected light from the light emitting element can be more efficiently converted into a photoelectric conversion element. I can guide you. Therefore, the characteristics are much more stable, and the low input current type small MO
An S-FET output optical coupling device can be realized.
【0063】また、特に請求項4記載のMOS−FET
出力光結合素子によれば、壁部が前記両射出成型樹脂基
板に形成され、該両射出成型樹脂基板を貼り合わせた際
に、両壁部の先端面同士が密着する構成をとるので、発
光素子とMOS−FET出力光結合素子が壁部によって
光学的に遮断されるので、MOS−FETに発光素子か
らの光が漏れることがない。このため、MOS−FET
が誤動作を起こすことがないので、電気的特性の優れた
MOS−FET出力光結合素子を実現できる。In particular, the MOS-FET according to claim 4
According to the output optical coupling element, since the wall portions are formed on the both injection-molded resin substrates, and when the both injection-molded resin substrates are bonded together, the tip surfaces of the both wall portions are in close contact with each other, the light emission is improved. Since the element and the MOS-FET output optical coupling element are optically blocked by the wall portion, light from the light emitting element does not leak to the MOS-FET. Therefore, MOS-FET
Does not cause a malfunction, it is possible to realize a MOS-FET output optical coupling element having excellent electrical characteristics.
【0064】また、特に請求項5記載のMOS−FET
出力光結合素子によれば、光電変換素子とMOS−FE
T間にめっきパターンを形成する構成をとるので、この
めっきパターン上に2ndボンディングを実施すること
により、チップ−チップ間のワイヤを削除でき、その
分、ワイヤーボンド工程を安定的且つ容易に行えるの
で、製品の歩留りを向上できる。In particular, the MOS-FET according to claim 5
According to the output optical coupling element, the photoelectric conversion element and the MOS-FE
Since the plating pattern is formed between T, by performing the 2nd bonding on this plating pattern, the wire between the chips can be deleted, and the wire bonding process can be performed stably and easily by that amount. The product yield can be improved.
【0065】また、特に請求項6記載のMOS−FET
出力光結合素子によれば、MOS−FETを光電変換素
子の両側に配置する構成をとるので、双方向出力タイプ
のMOS−FET出力光結合素子を実現できる。In particular, the MOS-FET according to claim 6
According to the output optical coupling element, since the MOS-FET is arranged on both sides of the photoelectric conversion element, a bidirectional output type MOS-FET output optical coupling element can be realized.
【0066】また、本発明のMOS−FET出力光結合
素子の製造方法によれば、上記効果を奏するMOS−F
ET出力光結合素子を少ない工程数で作製でき、その製
造効率を向上できる結果、MOS−FET出力光結合素
子のコストダウンを図ることが可能になる。Further, according to the method of manufacturing the MOS-FET output optical coupling element of the present invention, the MOS-F having the above-mentioned effects is obtained.
The ET output optical coupling element can be manufactured in a small number of steps, and the manufacturing efficiency can be improved. As a result, the cost of the MOS-FET output optical coupling element can be reduced.
【図1】実施形態1のMOS−FET出力光結合素子の
構造を示す正面断面図。FIG. 1 is a front sectional view showing a structure of a MOS-FET output optical coupling element according to a first embodiment.
【図2】実施形態1のMOS−FET出力光結合素子の
製造工程を示す工程フロー図。FIG. 2 is a process flow chart showing a manufacturing process of the MOS-FET output optical coupling element according to the first embodiment.
【図3】実施形態2のMOS−FET出力光結合素子の
構造を示す正面断面図。FIG. 3 is a front sectional view showing the structure of a MOS-FET output optical coupling device according to a second embodiment.
【図4】実施形態3のMOS−FET出力光結合素子の
構造を示す正面断面図。FIG. 4 is a front sectional view showing a structure of a MOS-FET output optical coupling element according to a third embodiment.
【図5】従来のMOS−FET出力光結合素子の構造を
示す、(a)は正面断面図、(b)は側面図。5A and 5B show a structure of a conventional MOS-FET output optical coupling device, FIG. 5A is a front sectional view, and FIG. 5B is a side view.
【図6】従来のMOS−FET出力光結合素子の製造工
程を示す工程フロー図。FIG. 6 is a process flow chart showing a manufacturing process of a conventional MOS-FET output optical coupling element.
【図7】従来のMOS−FET出力光結合素子の問題点
を説明するための図であり、(a)は正面断面図、
(b)は側面図。FIG. 7 is a diagram for explaining a problem of a conventional MOS-FET output optical coupling element, (a) is a front sectional view,
(B) is a side view.
【図8】従来のMOS−FET出力光結合素子の他の問
題点を説明するための図であり、(a)は正面断面図、
(b)は側面図。FIG. 8 is a diagram for explaining another problem of the conventional MOS-FET output optical coupling element, (a) is a front sectional view,
(B) is a side view.
【図9】一般的なMOS−FET出力光結合素子の内部
結線図及びワイヤレイアウトを示す図。FIG. 9 is a diagram showing an internal connection diagram and a wire layout of a general MOS-FET output optical coupling element.
【符号の説明】 2 発光素子 3 光電変換素子 4 MOS−FET 5 金線 9 射出成型樹脂基板 10、12 壁部 10’、12’ 壁部に形成した傾斜面 11 傾斜面に施しためっき 13 めっきパターン[Explanation of symbols] 2 light emitting element 3 Photoelectric conversion element 4 MOS-FET 5 gold wire 9 Injection molded resin substrate 10 and 12 walls Inclined surface formed on the 10 'and 12' walls 11 Plating on inclined surface 13 Plating pattern
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 31/12 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) H01L 31/12
Claims (6)
ンを設け、一方の射出成型樹脂基板に発光素子を搭載
し、他方の射出成型樹脂基板に光電変換素子及びMOS
−FETを搭載し、双方の射出成型樹脂基板を透光性樹
脂を介して貼り合わせた構造のMOS−FET出力光結
合素子であって、前記各 射出成型樹脂基板に、少なくとも2本の壁部がそ
れぞれ設けられ、前記各射出成型樹脂基板における該2
本の壁部間に該発光素子および前記光電変換素子がそれ
ぞれ配置され、該光電変換素子が配置された射出成型樹
脂基板の外壁と、少なくとも一方の壁部との間に前記M
OS−FETが配置されており、 該光電変換素子と該MOS−FETとの間にめっきパタ
ーンが設けられて、該めっきパターンと該光電変換素子
および該MOS−FETとが、それぞれワイヤーボンド
されており、 該発光素子の両側に位置する各 壁部の対向面に該発光素
子の側面からの反射光を該光電変換素子に効率よく伝達
させる傾斜反射面が形成されている、MOS−FET出
力光結合素子。1. A pair of injection-molded resin substrates are provided with plating patterns, one injection-molded resin substrate is mounted with a light emitting element, and the other injection-molded resin substrate is provided with a photoelectric conversion element and a MOS.
-A MOS-FET output optical coupling device having a structure in which an FET is mounted and both injection-molded resin substrates are bonded together via a translucent resin, wherein each injection-molded resin substrate has at least two wall portions. Gazo
Each of the two is provided on each of the injection molded resin substrates.
Between the wall of the book, the light emitting element and the photoelectric conversion element are
An injection molding tree in which the photoelectric conversion elements are respectively arranged
Between the outer wall of the oil substrate and at least one wall portion, the M
An OS-FET is arranged, and a plating pattern is provided between the photoelectric conversion element and the MOS-FET.
And a photoelectric conversion element provided with the plating pattern.
And the MOS-FET are wire-bonded, respectively.
In the MOS-FET , inclined reflection surfaces for efficiently transmitting the reflected light from the side surface of the light emitting element to the photoelectric conversion element are formed on the facing surfaces of the walls located on both sides of the light emitting element. Output optocoupler.
出成型樹脂基板の前記光電変換素子の両側に位置する各
壁部の対向面にも、該発光素子の側面からの反射光を該
光電変換素子に効率よく伝達させる傾斜反射面がそれぞ
れ形成されている請求項1記載のMOS−FET出力光
結合素子。2. Each of the injection-molded resin substrates , on which the photoelectric conversion element is arranged , located on both sides of the photoelectric conversion element.
Reflected light from the side surface of the light emitting element is also applied to the facing surface of the wall portion.
Each slanted reflective surface that efficiently transmits to the photoelectric conversion element
The MOS-FET output optical coupling element according to claim 1, which is formed by the above method.
に反射効率の高い材料からなるめっきを施した請求項1
又は請求項2記載のMOS−FET出力光結合素子。3. The injection molding resin substrate, wherein the inclined reflecting surface is plated with a material having high reflection efficiency.
Alternatively, the MOS-FET output optical coupling device according to claim 2.
された前記壁部の先端面同士が、該両射出成型樹脂基板
を貼り合わせた際に密着するように構成した請求項1〜
3のいずれかに記載のMOS−FET出力光結合素子。4. The structure in which the front end surfaces of the wall portions formed on both of the injection molded resin substrates are in close contact with each other when the both injection molded resin substrates are bonded to each other .
4. The MOS-FET output optical coupling element according to any one of 3 above.
の両側に配置されている請求項1〜請求項4のいずれか
に記載のMOS−FET出力光結合素子。5. The MOS-FET output optical coupling device according to claim 1, wherein the MOS-FETs are arranged on both sides of the photoelectric conversion device.
T出力光結合素子の製造方法であって、 一方の射出成型樹脂基板の対向面に発光素子をダイボン
ドし、他方の射出成型樹脂基板の対向面に光電変換素子
及びMOS−FETをダイボンドし、更にこれらの素子
にワイヤボンドを施す工程と、 両射出成型樹脂基板を透光性樹脂を介して貼り合わせる
工程と、 貼り合わせた基板をチップ毎に分割する工程と、 その後に絶縁耐圧試験等の検査を行う工程と を包含するMOS−FET出力光結合素子の製造方法。6. The MOS-FE according to claim 1.
A method of manufacturing a T-output optical coupling element, comprising: die-bonding a light-emitting element to the facing surface of one injection-molded resin substrate, and die-bonding a photoelectric conversion element and a MOS-FET to the facing surface of the other injection-molded resin substrate. The process of wire-bonding these elements, the process of bonding both injection-molded resin substrates through the translucent resin, the process of dividing the bonded substrates into chips, and the subsequent inspection such as dielectric strength test. A method of manufacturing a MOS-FET output optical coupling device, including the step of performing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28892597A JP3489979B2 (en) | 1997-10-21 | 1997-10-21 | MOS-FET output optical coupling device and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28892597A JP3489979B2 (en) | 1997-10-21 | 1997-10-21 | MOS-FET output optical coupling device and method of manufacturing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11126919A JPH11126919A (en) | 1999-05-11 |
JP3489979B2 true JP3489979B2 (en) | 2004-01-26 |
Family
ID=17736587
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JP28892597A Expired - Fee Related JP3489979B2 (en) | 1997-10-21 | 1997-10-21 | MOS-FET output optical coupling device and method of manufacturing the same |
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JP (1) | JP3489979B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2007258399A (en) * | 2006-03-23 | 2007-10-04 | Rohm Co Ltd | Photocoupler |
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1997
- 1997-10-21 JP JP28892597A patent/JP3489979B2/en not_active Expired - Fee Related
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