JP3485273B2 - Metal-silicon composite alkoxide and method for producing the same - Google Patents

Metal-silicon composite alkoxide and method for producing the same

Info

Publication number
JP3485273B2
JP3485273B2 JP19586894A JP19586894A JP3485273B2 JP 3485273 B2 JP3485273 B2 JP 3485273B2 JP 19586894 A JP19586894 A JP 19586894A JP 19586894 A JP19586894 A JP 19586894A JP 3485273 B2 JP3485273 B2 JP 3485273B2
Authority
JP
Japan
Prior art keywords
formula
metal
different
same
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19586894A
Other languages
Japanese (ja)
Other versions
JPH0840722A (en
Inventor
宏一 井柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pola Chemical Industries Inc
Original Assignee
Pola Chemical Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pola Chemical Industries Inc filed Critical Pola Chemical Industries Inc
Priority to JP19586894A priority Critical patent/JP3485273B2/en
Publication of JPH0840722A publication Critical patent/JPH0840722A/en
Application granted granted Critical
Publication of JP3485273B2 publication Critical patent/JP3485273B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/25Oxides by deposition from the liquid phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/212TiO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/22ZrO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/23Mixtures
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/113Deposition methods from solutions or suspensions by sol-gel processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は新規な金属−珪素複合ア
ルコキシド化合物に関し、詳しくは表面処理剤、特にプ
ライマー等として有用な金属−珪素複合アルコキシド化
合物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel metal-silicon composite alkoxide compound, and more particularly to a metal-silicon composite alkoxide compound useful as a surface treating agent, particularly as a primer.

【0002】[0002]

【従来の技術】従来から、自然光による室内家具、調度
類の変質、変色や、室内温度の過度の上昇を防ぐため
に、紫外線、赤外線(熱線)をカットする目的でガラス
等の表面を屈折率の高い酸化チタン等の薄膜で処理する
ことが行われている。
2. Description of the Related Art Conventionally, the surface of glass or the like has a refraction index for the purpose of cutting off ultraviolet rays and infrared rays (heat rays) in order to prevent the interior furniture from changing due to natural light, the discoloration of the furniture, and the excessive rise in the room temperature. Treatment with a thin film of high titanium oxide or the like is performed.

【0003】このような方法としては、金属アルコキシ
ドを使用して、いわゆるゾルゲルプロセスによりガラス
表面にコーティング膜を生成させる方法や、イオンスパ
ッタリング、CVD、PVD等によりガラス表面を処理
する方法が知られている。
As such a method, there is known a method of using a metal alkoxide to form a coating film on the glass surface by a so-called sol-gel process, and a method of treating the glass surface by ion sputtering, CVD, PVD or the like. There is.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、このよ
うなガラスは通常シリカ骨格を主体とする物質であり、
それ故、紫外線、赤外線防御に対して効果のある酸化チ
タン、酸化ジルコニウムなどに対する親和性が低い。従
って、ゾルゲルプロセスによりガラス表面に酸化チタ
ン、酸化ジルコニウムの均一な皮膜を形成させることは
困難であり、又形成させた皮膜にも耐候性、耐摩擦性な
どの強度の点で問題があった。イオンスパッタリング、
CVD、PVD等の物理的若しくは物理化学的方法で
は、均一で強固な皮膜を形成させる事は可能であるが、
充分な厚さの皮膜を得るには時間がかかり、コストも相
当高いものとなる。又、処理する物品の大きさは装置の
大きさにより限定されてしまうため、大面積の物品の処
理が難しいという欠点がある。
However, such a glass is usually a substance mainly composed of a silica skeleton,
Therefore, it has a low affinity for titanium oxide, zirconium oxide, etc., which are effective against ultraviolet rays and infrared rays. Therefore, it is difficult to form a uniform film of titanium oxide and zirconium oxide on the glass surface by the sol-gel process, and the formed film also has problems in strength such as weather resistance and abrasion resistance. Ion sputtering,
Although it is possible to form a uniform and strong film by a physical or physicochemical method such as CVD or PVD,
It takes time to obtain a film having a sufficient thickness, and the cost is considerably high. Further, since the size of the article to be processed is limited by the size of the apparatus, it is difficult to process a large area article.

【0005】[0005]

【課題を解決するための手段】上記課題を解決する為に
本発明者は鋭意研究を重ねた結果、珪素に結合したアル
コキシ基部分とチタン或いはジルコニウムに結合したア
ルコキシ基部分を有する金属−珪素複合アルコキシド化
合物でガラスの表面をプライマー処理した後、酸化チタ
ン、酸化ジルコニウムの被膜を形成させることにより均
一で強固な被膜が得られる事を見出し、本発明を完成す
るに至った。即ち、本発明は一般組成式(1)で表され
るガラスの表面処理のプライマー等として有用な新規な
金属−珪素複合アルコキシド化合物に関する。また本発
明は一般組成式(2)の有機珪素化合物と一般組成式
(3)の金属アルコキシドとを反応させて製造する事を
特徴とする前記一般組成式(1)で表される新規な金属
−珪素複合アルコキシド化合物の製造方法に関する。
In order to solve the above-mentioned problems, the present inventor has conducted extensive studies and as a result, a metal-silicon composite having an alkoxy group part bonded to silicon and an alkoxy group part bonded to titanium or zirconium. The inventors have found that a uniform and strong coating can be obtained by forming a coating of titanium oxide or zirconium oxide after subjecting the surface of glass to a primer with an alkoxide compound, and completed the present invention. That is, the present invention relates to a novel metal-silicon composite alkoxide compound represented by the general composition formula (1), which is useful as a primer for surface treatment of glass. Further, the present invention is a novel metal represented by the above general composition formula (1), which is produced by reacting an organosilicon compound of the general composition formula (2) with a metal alkoxide of the general composition formula (3). -A method for producing a silicon composite alkoxide compound.

【0006】[0006]

【化4】 (但し、式中MはTi或いはZrを表し、Rはアルキル
基を表し、互いに異なっていても互いに同一のものを含
んでいても良く、R* は炭素数4以下のアルキル基を表
し、互いに異なっていても互いに同一のものを含んでい
ても良く、Qは二価の炭化水素基またはイオウ原子を含
有する二価の有機基を表し、互いに異なっていても互い
に同一のものを含んでいても良く、Xは一価の炭化水素
基を表し、互いに異なっていても互いに同一のものを含
んでいても良く、aは0〜2の整数を、nは1乃至2を
表す。)
[Chemical 4] (However, in the formula, M represents Ti or Zr, R represents an alkyl group, may be different from each other or may contain the same ones, and R * represents an alkyl group having 4 or less carbon atoms, They may be different or the same as each other, Q represents a divalent hydrocarbon group or a divalent organic group containing a sulfur atom, and different from each other include the same one. Also, X represents a monovalent hydrocarbon group, which may be different from each other or may include the same ones, a represents an integer of 0 to 2, and n represents 1 to 2.)

【0007】[0007]

【化5】 (但し、式中Rはアルキル基を表し、互いに異なってい
ても互いに同一のものを含んでいても良く、Qは二価の
炭化水素基またはイオウ原子を含有する二価の有機基を
表し、R’はQより少ない炭素数を有し且つ炭素数3以
下の一価の炭化水素基を表し、Xは一価の炭化水素基を
表し、互いに異なっていても互いに同一のものを含んで
いても良く、aは0〜2の整数を表す。)
[Chemical 5] (However, in the formula, R represents an alkyl group, which may be different from each other or may include the same ones, and Q is a divalent group.
Hydrocarbon group or divalent organic group containing sulfur atom
Where R'has a carbon number less than Q and a carbon number of 3 or more.
Represents a monovalent hydrocarbon group below, and X represents a monovalent hydrocarbon group.
May represent the same or different from each other, and a represents an integer of 0 to 2. )

【0008】[0008]

【化6】 (但し、式中MはTi或いはZrを表し、R* は炭素数
4以下のアルキル基を表し、互いに異なっていても互い
に同一のものを含んでいても良い。)
[Chemical 6] (However, in the formula, M represents Ti or Zr, and R * represents an alkyl group having 4 or less carbon atoms, which may be different from each other or may be the same as each other.)

【0009】式(2)のR' としては具体的にはメチル
基、エチル基、n−プロピル基、イソプロピル基又はこ
れらの基の水素原子が部分的にハロゲン原子で置換され
た基を挙げることができる。炭素数が4以上になると前
記一般組成式(2)の化合物と前記一般組成式(3)の
化合物の反応の副生成物であるエステルの沸点が高くな
り、反応系からの除去が困難になるので好ましくない。
Specific examples of R'in the formula (2) include a methyl group, an ethyl group, an n-propyl group, an isopropyl group or a group in which a hydrogen atom of these groups is partially substituted with a halogen atom. You can When the carbon number is 4 or more, the boiling point of the ester, which is a by-product of the reaction between the compound of the general composition formula (2) and the compound of the general composition formula (3), becomes high, and it becomes difficult to remove it from the reaction system. It is not preferable.

【0010】前記一般組成式(2)の化合物は、例えば
以下に挙げる1、2の方法で合成することができる。 1.下記一般式(4)で表される酸無水物と a)下記一般式(5)で表されるモノハイドロジェンシ
ランとを白金系触媒の存在下で反応させる方法又は b)下記一般式(6)で表されるメルカプト基を有する
アルコキシランとを紫外線照射下または有機過酸化物の
存在下で反応させる方法。
The compound of the general composition formula (2) can be synthesized, for example, by the following methods 1 and 2. 1. A method of reacting an acid anhydride represented by the following general formula (4) with a) a monohydrogensilane represented by the following general formula (5) in the presence of a platinum-based catalyst or b) the following general formula (6) ) A method of reacting with an alkoxylane having a mercapto group represented by the formula (1) under ultraviolet irradiation or in the presence of an organic peroxide.

【0011】[0011]

【化7】 (但し、Zは不飽和結合を有する一価の有機基を表し、
R' は炭素数3以下の一価の炭化水素基を表す)
[Chemical 7] (However, Z represents a monovalent organic group having an unsaturated bond,
R'represents a monovalent hydrocarbon group having 3 or less carbon atoms)

【0012】[0012]

【化8】 (但し、Rはアルキル基を表し、互いに異なっていても
互いに同一のものを含んでいても良く、Xは一価の炭化
水素基を表し、互いに異なっていても互いに同一のもの
を含んでいても良く、aは0〜2の整数を表す。)
[Chemical 8] (However, R represents an alkyl group, which may be different from each other or may include the same ones, X represents a monovalent hydrocarbon group, and different from each other may include the same ones. Also, a represents an integer of 0 to 2.)

【0013】[0013]

【化9】 (但し、Pは二価の炭化水素基を表し、Rはアルキル基
を表し、互いに異なっていても互いに同一のものを含ん
でいても良く、Xは一価の炭化水素基を表し、互いに異
なっていても互いに同一のものを含んでいても良く、a
は0〜2の整数を表す。)
[Chemical 9] (However, P represents a divalent hydrocarbon group, R represents an alkyl group, may be different from each other or may include the same ones, and X represents a monovalent hydrocarbon group and different from each other. Or may contain the same ones as each other, a
Represents an integer of 0 to 2. )

【0014】2.下記一般式(7)で表される酸誘導体
を、例えば、下記一般式(8)で表される化合物と反応
させる等の公知の有機反応によって無水物化する方法。
2. A method in which an acid derivative represented by the following general formula (7) is converted into an anhydride by a known organic reaction such as reacting with a compound represented by the following general formula (8).

【0015】[0015]

【化10】 (但し、式中Rはアルキル基を表し、互いに異なってい
ても互いに同一のものを含んでいても良く、Qは二価の
炭化水素基またはイオウ原子を含有する二価の有機基を
表し、Xは一価の炭化水素基を表し、互いに異なってい
ても互いに同一のものを含んでいても良く、aは0〜2
の整数を表す。)
[Chemical 10] (However, in the formula, R represents an alkyl group, which may be different from each other or may include the same ones, and Q is a divalent group.
Hydrocarbon group or divalent organic group containing sulfur atom
In the formula, X represents a monovalent hydrocarbon group, which may be different from each other or may be the same as each other, and a is 0 to 2
Represents the integer. )

【0016】[0016]

【化11】 (但し、R' は炭素数3以下の一価の炭化水素基を表
す)
[Chemical 11] (However, R'represents a monovalent hydrocarbon group having 3 or less carbon atoms)

【0017】前記一般式(4)で表される酸無水物は、
例えば下記一般式(9)の化合物と下記一般式(10)
の化合物との反応や、下記一般式(11)の化合物と下
記一般式(12)の化合物との反応等の公知の有機反応
によって合成でき、前記一般式(7)で表される酸誘導
体は、下記一般式(9)で表される化合物と a)前記一般式(5)で表されるモノハイドロジェンシ
ランとを白金系触媒の存在下で反応させるか或いは b)前記一般式(6)で表されるメルカプト基を有する
アルコキシランとを紫外線照射下または有機過酸化物の
存在下反応させることにより合成できる。
The acid anhydride represented by the general formula (4) is
For example, the compound of the following general formula (9) and the following general formula (10)
Can be synthesized by a known organic reaction such as a reaction with a compound of formula (11) or a compound of the following general formula (11) with a compound of the following general formula (12), and the acid derivative represented by the general formula (7) is , A compound represented by the following general formula (9) and a) a monohydrogensilane represented by the general formula (5) are reacted in the presence of a platinum-based catalyst, or b) the general formula (6) It can be synthesized by reacting with an alkoxylane having a mercapto group represented by the formula (1) under UV irradiation or in the presence of an organic peroxide.

【0018】[0018]

【化12】 (但し、Zは不飽和結合を有する一価の有機基を表す)[Chemical 12] (However, Z represents a monovalent organic group having an unsaturated bond)

【0019】[0019]

【化13】 (但し、R' は炭素数3以下の一価の炭化水素基を表
す。)
[Chemical 13] (However, R'represents a monovalent hydrocarbon group having 3 or less carbon atoms.)

【0020】[0020]

【化14】 (但し、Zは不飽和結合を有する一価の有機基を表
す。)
[Chemical 14] (However, Z represents a monovalent organic group having an unsaturated bond.)

【0021】[0021]

【化15】 (但しR' は炭素数3以下の一価の炭化水素基を表
す。)
[Chemical 15] (However, R'represents a monovalent hydrocarbon group having 3 or less carbon atoms.)

【0022】前記一般組成式(3)で表されるチタンあ
るいはジルコニウムのアルコキシドとしては、具体的に
はチタンテトラメトキシド、チタンテトラエトキシド、
チタンテトライソプロポキシド、チタンテトラ−n−プ
ロポキシド、チタンテトラ−n−ブトキシド、チタンテ
トライソブトキシド、チタンテトラ−sec −ブトキシ
ド、チタンテトラ−tert−ブトキシド、ジルコニウムテ
トラメトキシド、ジルコニウムテトラエトキシド、ジル
コニウムテトライソプロポキシド、ジルコニウムテトラ
−n−プロポキシド、ジルコニウムテトラ−n−ブトキ
シド、ジルコニウムテトライソブトキシド、ジルコニウ
ムテトラ−sec −ブトキシド、ジルコニウムテトラ−te
rt−ブトキシドなどが挙げられる。
The titanium or zirconium alkoxide represented by the above general composition formula (3) is specifically titanium tetramethoxide, titanium tetraethoxide,
Titanium tetraisopropoxide, titanium tetra-n-propoxide, titanium tetra-n-butoxide, titanium tetraisobutoxide, titanium tetra-sec-butoxide, titanium tetra-tert-butoxide, zirconium tetramethoxide, zirconium tetraethoxide, Zirconium tetraisopropoxide, zirconium tetra-n-propoxide, zirconium tetra-n-butoxide, zirconium tetraisobutoxide, zirconium tetra-sec-butoxide, zirconium tetra-te.
Examples include rt-butoxide.

【0023】さらに、本発明の金属−珪素複合アルコキ
シドの製造方法について詳細に説明する。
Further, the method for producing the metal-silicon composite alkoxide of the present invention will be described in detail.

【0024】本発明の有機珪素化合物を製造する際に
は、前記一般組成式(2)で表される有機珪素化合物と
前記一般組成式(3)で表される金属のアルコキシドと
を反応させる。この反応においてはアルコール以外の有
機溶媒を用いることが好ましい。アルコールを用いると
副反応として、前記一般組成式(3)で表されるアルコ
キシシラン化合物とのエステル化が進行し、主反応が定
量的に進行しない。アルコール以外の有機溶媒として
は、金属のアルコキシドとアルコキシシラン化合物の両
者を溶解するものであれば良く、具体的には、ベンゼ
ン、トルエン、キシレン等の芳香族炭化水素、ジエチル
エーテル、ジイソプロピルエーテル等のエ−テル類、酢
酸メチル、酢酸エチル等のエステル類、メチルエチルケ
トン、アセトン等のケトン類、テトラヒドロフラン、ジ
メチルスルフォキシド等及びこれらの混合物が挙げられ
るが、なかでもエーテル類、炭化水素類が特に好まし
い。これらの溶媒はそのまま用いても良いが、前記一般
組成式(2)、(3)で表される化合物の加水分解反応
を抑制するため、金属ナトリウムや金属マグネシウム等
を反応させて蒸留する等の方法で脱水精製して用いれば
さらに好ましい。
When the organosilicon compound of the present invention is produced, the organosilicon compound represented by the general composition formula (2) is reacted with the metal alkoxide represented by the general composition formula (3). In this reaction, it is preferable to use an organic solvent other than alcohol. When alcohol is used, as a side reaction, esterification with the alkoxysilane compound represented by the general composition formula (3) proceeds, and the main reaction does not proceed quantitatively. As the organic solvent other than alcohol, any solvent capable of dissolving both metal alkoxide and alkoxysilane compound may be used, and specific examples thereof include aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, diisopropyl ether and the like. Examples thereof include ethers, esters such as methyl acetate and ethyl acetate, ketones such as methyl ethyl ketone and acetone, tetrahydrofuran, dimethyl sulfoxide and the like, and mixtures thereof. Among them, ethers and hydrocarbons are particularly preferable. . These solvents may be used as they are, but in order to suppress the hydrolysis reaction of the compounds represented by the above general composition formulas (2) and (3), metal sodium, metal magnesium, etc. are reacted and distilled. It is more preferable to use it after dehydration purification by the method.

【0025】反応温度は特に限定されないが、通常は用
いた溶媒の沸点での還流条件下で行うことが反応温度制
御の面から好ましい。また、反応はアルコキシド部分の
分解を防ぐため、乾燥条件下、例えばアルゴン、乾燥窒
素等の不活性ガス気流下で行うことが望ましい。反応が
終了後は、真空蒸留、減圧蒸留、凍結乾燥等の手段によ
って、使用した有機溶媒および副反応生成物であるエス
テルを除去して目的の有機珪素化合物を取り出すことが
できる。
The reaction temperature is not particularly limited, but it is usually preferable to carry out under reflux conditions at the boiling point of the solvent used from the viewpoint of reaction temperature control. Further, the reaction is preferably carried out under a dry condition, for example, under an inert gas stream such as argon or dry nitrogen in order to prevent decomposition of the alkoxide portion. After the reaction is completed, the organic solvent used and the ester which is a side reaction product can be removed by a means such as vacuum distillation, reduced pressure distillation, and freeze-drying to take out the desired organosilicon compound.

【0026】以下、前記一般組成式(2)で表される有
機珪素化合物の製造例を示し、本発明をさらに詳細に説
明する。
The present invention will be described in more detail below with reference to production examples of the organosilicon compound represented by the general composition formula (2).

【0027】[0027]

【製造例1】還流冷却器、撹拌装置及びガス導入管付き
三つ口フラスコに10−ウンデセン酸36.9g、3−
メルカプトプロピルトリメトキシシラン39.3g、ベ
ンゼン300mlを秤り取り、撹拌混合した。さらに、
この溶液にアゾビスイソブチロニトリル0.5gをベン
ゼン100mlに溶解した溶液を添加し、撹拌混合し
た。撹拌を続けながら、室温で乾燥窒素ガスによるバブ
リングを一時間行った後、加熱してベンゼンの沸点での
還流を12時間行った。反応終了後、氷浴で冷却した。
さらに、トリエチルアミン100mlを添加し撹拌混合
した。氷浴で冷却し撹拌を続けながらこの溶液にプロパ
ノイルクロライド18.5gをベンゼン100mlに溶
解した溶液を滴下により徐々に添加した。添加が終了し
た後撹拌をさらに30分間続けた。生じた白色の沈殿を
濾別した後、ロータリーエバポレーターにより溶媒を除
去し粘性液体を得た。IR、NMR測定を行ったとこ
ろ、この液体が式(13)で表される有機珪素化合物で
あることが示された。
[Production Example 1] 36.9 g of 10-undecenoic acid was added to a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube.
39.3 g of mercaptopropyltrimethoxysilane and 300 ml of benzene were weighed out and mixed with stirring. further,
A solution prepared by dissolving 0.5 g of azobisisobutyronitrile in 100 ml of benzene was added to this solution and mixed with stirring. After bubbling with dry nitrogen gas at room temperature for 1 hour while continuing stirring, the mixture was heated and refluxed at the boiling point of benzene for 12 hours. After the reaction was completed, it was cooled in an ice bath.
Further, 100 ml of triethylamine was added and mixed with stirring. A solution prepared by dissolving 18.5 g of propanoyl chloride in 100 ml of benzene was gradually added dropwise to this solution while cooling with an ice bath and stirring. After the addition was complete, stirring was continued for another 30 minutes. After the white precipitate that had formed was filtered off, the solvent was removed by a rotary evaporator to obtain a viscous liquid. IR and NMR measurements showed that this liquid was an organosilicon compound represented by the formula (13).

【0028】[0028]

【化学式16】 (但し、Qは−CH2(CH28CH2SCH2CH2CH
2−を表す。)
[Chemical Formula 16] (Where, Q is -CH 2 (CH 2) 8 CH 2 SCH 2 CH 2 CH
Represents 2- . )

【0029】[0029]

【製造例2】還流冷却器、撹拌装置及びガス導入管付き
三つ口フラスコに酢酸18.0g、テトラヒドロフラン
400ml及びトリエチルアミン100mlを秤り取
り、撹拌混合した。氷浴により冷却し撹拌を続けなが
ら、この溶液に、メタクリロイルクロライド31.4g
をテトラヒドロフラン100mlに溶解した溶液を滴下
により徐々に添加した。添加が終了した後撹拌をさらに
30分間続けた。生じた白色の沈殿を濾別した後、ロー
タリーエバポレーターにより溶媒を除去し粘性液体を得
た。この液体25.6gを耐圧ビン型の反応容器に入
れ、モノハイドロジェントリエトキシシラン32.9g
を添加し混合溶解した。次に、塩化白金酸(H2 PtC
6・6H20)をテトラヒドロフラン中で加熱し、0.
02モル%溶液とし、白金0.1ミリモルに相当する量
の溶液を前述の混合溶液に添加した後、反応容器を80
℃で4時間加熱した。テトラヒドロフランを除去した
後、固形物を除去し粘性液体を得た。IR、NMR測定
を行ったところ、この液体が式(14)で表される有機
珪素化合物であることが示された。
[Production Example 2] 18.0 g of acetic acid, 400 ml of tetrahydrofuran and 100 ml of triethylamine were weighed out in a three-necked flask equipped with a reflux condenser, a stirrer and a gas inlet tube, and mixed with stirring. 31.4 g of methacryloyl chloride was added to this solution while cooling with an ice bath and continuing stirring.
Was dissolved in 100 ml of tetrahydrofuran and the solution was gradually added dropwise. After the addition was complete, stirring was continued for another 30 minutes. After the white precipitate that had formed was filtered off, the solvent was removed by a rotary evaporator to obtain a viscous liquid. 25.6 g of this liquid was placed in a pressure bottle type reaction vessel, and 32.9 g of monohydrogentriethoxysilane was added.
Was added and mixed and dissolved. Next, chloroplatinic acid (H 2 PtC
The l 6 · 6H 2 0) was heated in tetrahydrofuran, 0.
As a 02 mol% solution, a solution corresponding to 0.1 mmol of platinum was added to the above mixed solution, and the reaction vessel was heated to 80
Heated at ° C for 4 hours. After removing tetrahydrofuran, the solid substance was removed to obtain a viscous liquid. IR and NMR measurements showed that this liquid was an organosilicon compound represented by the formula (14).

【0030】[0030]

【化学式17】 [Chemical formula 17]

【0031】[0031]

【製造例3】還流冷却器、撹拌装置及びガス導入管付き
三つ口フラスコに4−ペンテン酸20.0g、プロピオ
ン酸14.8g、無水酢酸20.4gを秤り取り、撹拌
溶解した。この溶液を2時間還流した後、生成する酢酸
を蒸発除去して4−ペンテン酸プロピオン酸複合無水物
を得た。この4−ペンテン酸プロピオン酸複合無水物2
0.7gを別の還流冷却器、撹拌装置及びガス導入管付
き三つ口フラスコに入れ、3−メルカプトプロピルメチ
ルジエトキシシラン31.3g、ベンゼン300mlを
秤り取り、撹拌混合した。さらに、この溶液にアゾビス
イソブチロニトリル0.2gをベンゼン50mlに溶解
した溶液を添加し、撹拌混合した。撹拌を続けながら、
室温で乾燥窒素ガスによるバブリングを1時間行った
後、加熱してベンゼンの沸点付近での還流を12時間行
った。反応終了後、ロータリーエバポレーターにより溶
媒を除去し、粘性液体を得た。IR、NMR測定を行っ
たところ、この液体が式(15)で表される有機珪素化
合物であることが示された。
[Production Example 3] 4-pentenoic acid (20.0 g), propionic acid (14.8 g) and acetic anhydride (20.4 g) were weighed out and dissolved in a three-necked flask equipped with a reflux condenser, a stirrer and a gas introduction tube. After refluxing this solution for 2 hours, the acetic acid formed was removed by evaporation to obtain 4-pentenoic acid propionic acid complex anhydride. This 4-pentenoic acid propionic acid complex anhydride 2
0.7 g was put into another three-necked flask equipped with a reflux condenser, a stirrer and a gas introduction tube, 31.3 g of 3-mercaptopropylmethyldiethoxysilane and 300 ml of benzene were weighed and mixed with stirring. Further, a solution prepared by dissolving 0.2 g of azobisisobutyronitrile in 50 ml of benzene was added to this solution, and mixed by stirring. While continuing to stir
After bubbling with dry nitrogen gas for 1 hour at room temperature, the mixture was heated and refluxed near the boiling point of benzene for 12 hours. After completion of the reaction, the solvent was removed by a rotary evaporator to obtain a viscous liquid. IR and NMR measurements showed that this liquid was an organosilicon compound represented by the formula (15).

【0032】[0032]

【化学式18】 (但し、Qは−CH2(CH22CH2SCH2CH2CH
2−を表す。)
[Chemical formula 18] (Where, Q is -CH 2 (CH 2) 2 CH 2 SCH 2 CH 2 CH
Represents 2- . )

【0033】[0033]

【製造例4】耐圧ビン型の反応容器にモノハイドロジェ
ンメチルジエトキシシラン53.7g及び3−ブテノン
酸を34.4g秤り取り、混合溶解した。次に塩化白金
酸(H2 PtCl6・6H20)をテトラヒドロフラン中
で加熱し、0.02モル%溶液とし、白金0.2ミリモ
ルに相当する量の溶液を前述の混合溶液に添加した後、
反応容器を80℃で4時間加熱した。テトラヒドロフラ
ンを除去した後、固形物を除去し粘性液体を得た。還流
冷却器、撹拌装置及びガス導入管付き三つ口フラスコに
上記の液体66.1g、テトラヒドロフラン320ml
及びトリエチルアミン80mlを秤り取り、撹拌混合し
た。氷浴により冷却し撹拌を続けながら、この溶液に、
プロピオン酸クロライド27.8gをテトラヒドロフラ
ン100mlに溶解した溶液を滴下により徐々に添加し
た。添加が終了した後、撹拌をさらに30分間続けた。
生じた白色の沈殿を濾別した後、ロータリーエバポレー
ターにより溶媒を除去し粘性液体を得た。IR、NMR
測定を行ったところ、この液体が式(16)で表される
有機珪素化合物であることが示された。
[Production Example 4] 53.7 g of monohydrogenmethyldiethoxysilane and 34.4 g of 3-butenoic acid were weighed out and mixed and dissolved in a pressure-resistant bottle-type reaction vessel. Next, chloroplatinic acid (H 2 PtCl 6 · 6H 2 0) was heated in tetrahydrofuran to form a 0.02 mol% solution, and a solution corresponding to 0.2 mmol of platinum was added to the above mixed solution. ,
The reaction vessel was heated at 80 ° C. for 4 hours. After removing tetrahydrofuran, the solid substance was removed to obtain a viscous liquid. 66.1 g of the above liquid and 320 ml of tetrahydrofuran in a three-necked flask equipped with a reflux condenser, a stirrer and a gas introduction tube.
And 80 ml of triethylamine were weighed and mixed with stirring. While cooling with an ice bath and continuing stirring, add to this solution,
A solution of 27.8 g of propionic acid chloride in 100 ml of tetrahydrofuran was gradually added dropwise. After the addition was complete, stirring was continued for another 30 minutes.
After the white precipitate that had formed was filtered off, the solvent was removed by a rotary evaporator to obtain a viscous liquid. IR, NMR
Upon measurement, it was shown that this liquid was an organosilicon compound represented by the formula (16).

【0034】[0034]

【化学式19】 (但し、Qは−CH2CH2CH2−を表す。)[Chemical formula 19] (Where, Q is -CH 2 CH 2 CH 2 - represents a.)

【0035】製造例1〜4の化合物を用いて金属−珪素
複合アルコキシドを調製した。
Metal-silicon composite alkoxides were prepared using the compounds of Production Examples 1 to 4.

【0036】[0036]

【実施例1】十分に乾燥しアルゴン置換を行った、還流
器、撹拌機付きのフラスコ中に、金属ナトリウムによる
還流及び蒸留により脱水精製したジエチルエーテル10
0mlを秤り取り、これにチタニウムテトライソプロポ
キシド28.4gを溶解した。さらにフラスコ内をアル
ゴンで十分置換した後、脱水精製ジエチルエーテル10
0mlに製造例1の有機珪素化合物47.0gを溶解し
たものを添加し、撹拌を続けながら30℃で20時間反
応した。反応終了後、真空蒸留による精製を行って粘性
液体を得た。IR、 1H−NMR、13C−NMR、29
i−NMR測定を行ったところ、この液体が式(17)
で表される化合物であると推定された。
Example 1 Diethyl ether 10 dehydrated and purified by refluxing with sodium metal and distillation in a flask equipped with a reflux condenser and a stirrer, which was sufficiently dried and purged with argon.
0 ml was weighed out and 28.4 g of titanium tetraisopropoxide was dissolved therein. After thoroughly replacing the inside of the flask with argon, dehydrated and purified diethyl ether 10
A solution prepared by dissolving 47.0 g of the organosilicon compound of Production Example 1 was added to 0 ml, and the mixture was reacted at 30 ° C. for 20 hours while continuing stirring. After completion of the reaction, purification by vacuum distillation was performed to obtain a viscous liquid. IR, 1 H-NMR, 13 C-NMR, 29 S
As a result of i-NMR measurement, this liquid was found to have the formula (17).
Was presumed to be a compound represented by

【0037】[0037]

【化20】 (但し、Qは−CH2(CH28CH2SCH2CH2CH
2−を表す。)
[Chemical 20] (Where, Q is -CH 2 (CH 2) 8 CH 2 SCH 2 CH 2 CH
Represents 2- . )

【0038】[0038]

【実施例2】十分に乾燥しアルゴン置換を行った、還流
器、撹拌機付きのフラスコ中に、金属ナトリウムによる
還流及び蒸留により脱水精製したジイソプロピルエーテ
ル100mlを秤り取り、これにジルコニウムテトライ
ソプロポキシド39.3gを溶解した。さらにフラスコ
内をアルゴンで十分置換した後、脱水精製ジイソプロピ
ルエーテル100mlに製造例2の有機珪素化合物3
9.0gを溶解したものを添加し、撹拌を続けながらジ
イソプロピルエーテルの沸点で20時間反応させた。反
応終了後、真空蒸留による精製を行って粘性液体を得
た。IR、 1H−NMR、13C−NMR、29Si−NM
R測定を行ったところ、この液体が式(18)で表され
る化合物であると推定された。
Example 2 100 ml of diisopropyl ether dehydrated and purified by refluxing with sodium metal and distillation was weighed in a flask equipped with a reflux condenser and a stirrer, which was sufficiently dried and purged with argon, and zirconium tetraisopropoxy was added to this. 39.3 g of the solution was dissolved. Further, after thoroughly replacing the inside of the flask with argon, the organic silicon compound 3 of Production Example 2 was added to 100 ml of dehydrated and purified diisopropyl ether.
What melt | dissolved 9.0g was added, and it was made to react with the boiling point of diisopropyl ether for 20 hours, continuing stirring. After completion of the reaction, purification by vacuum distillation was performed to obtain a viscous liquid. IR, 1 H-NMR, 13 C-NMR, 29 Si-NM
When R measurement was performed, it was estimated that this liquid was a compound represented by the formula (18).

【0039】[0039]

【化21】 [Chemical 21]

【0040】[0040]

【実施例3】十分に乾燥しアルゴン置換を行った、還流
器、撹拌機付きのフラスコ中に、金属ナトリウムによる
還流および蒸留により脱水精製したベンゼン50mlを
採り、これにチタニウムテトラエトキシド18.2gを
溶解した。さらにフラスコ内をアルゴンで十分置換した
後、脱水精製ベンゼン70mlに製造例3の有機珪素化
合物55.5gを溶解したものを添加し、撹拌を続けな
がらベンゼンの沸点で24時間反応した。反応終了後、
真空蒸留による精製を行って粘性液体を得た。IR、 1
H−NMR、13C−NMR、29Si−NMR測定を行っ
たところ、この液体が式(19)で表される化合物であ
ると推定された。
Example 3 50 ml of benzene dehydrated and refined by refluxing with sodium metal and distillation was placed in a flask equipped with a reflux condenser and a stirrer, which had been sufficiently dried and purged with argon, and 18.2 g of titanium tetraethoxide was added thereto. Was dissolved. Further, after thoroughly replacing the inside of the flask with argon, a solution of 55.5 g of the organosilicon compound of Production Example 3 dissolved in 70 ml of dehydrated and purified benzene was added, and the mixture was reacted for 24 hours at the boiling point of benzene while continuing stirring. After the reaction,
Purification by vacuum distillation gave a viscous liquid. IR, 1
H-NMR, 13 C-NMR, and 29 Si-NMR measurements were performed, and it was estimated that this liquid was a compound represented by the formula (19).

【0041】[0041]

【化22】 (但し、Qは−CH2(CH22CH2SCH2CH2CH
2−を表す。)
[Chemical formula 22] (Where, Q is -CH 2 (CH 2) 2 CH 2 SCH 2 CH 2 CH
Represents 2- . )

【0042】[0042]

【実施例4】十分に乾燥しアルゴン置換を行った、還流
器、撹拌機付きのフラスコ中に、金属ナトリウムによる
還流および蒸留により脱水精製したトルエン50mlを
秤り取り、これにジルコニウムテトラ−n−ブトキシド
19.2gを撹拌溶解した。さらにフラスコ内をアルゴ
ンで十分置換した後、脱水精製トルエン50mlに製造
例4の有機珪素化合物27.6gを溶解したものを添加
し、撹拌を続けながらトルエンの沸点で20時間反応さ
せた。反応終了後、真空蒸留による精製を行って粘性液
体を得た。IR、 1H−NMR、13C−NMR、29Si
−NMR測定を行ったところ、この液体が式(20)で
表される化合物であると推定された。
Example 4 50 ml of toluene dehydrated and purified by refluxing with metal sodium and distillation was weighed in a flask equipped with a reflux condenser and a stirrer, which was sufficiently dried and purged with argon, and zirconium tetra-n- 19.2 g of butoxide was dissolved with stirring. Furthermore, after thoroughly replacing the inside of the flask with argon, a solution prepared by dissolving 27.6 g of the organosilicon compound of Production Example 4 in 50 ml of dehydrated and purified toluene was added, and the mixture was reacted at the boiling point of toluene for 20 hours while continuing stirring. After completion of the reaction, purification by vacuum distillation was performed to obtain a viscous liquid. IR, 1 H-NMR, 13 C-NMR, 29 Si
When NMR measurement was performed, it was estimated that this liquid was a compound represented by the formula (20).

【0043】[0043]

【化23】 (但し、Qは−CH2CH2CH2−を表す。)[Chemical formula 23] (Where, Q is -CH 2 CH 2 CH 2 - represents a.)

【0044】[0044]

【プライマー性能試験】実施例1〜4の金属−珪素複合
アルコキシドを用いて酸化チタン膜及び酸化ジルコニウ
ム膜コーティングに対するプライマーとしての特性評価
を行った。 (試験法)実施例1〜4の金属−珪素複合アルコキシド
をそれぞれ0.1モル重量%になるようにテトラヒドロ
フランに溶解し、各々の溶液をスプレー装置を用いて市
販のスライドグラス上に噴霧塗布した。このスライドグ
ラスを室温で4時間乾燥した後、真空下150℃で12
時間加熱処理した。チタニウムテトライソプロポキシド
56.8gおよびアセチルアセトン20gをエチルアル
コール100mlに溶解した溶液に水15gをエチルア
ルコール50mlに溶解した溶液を撹拌下添加しさらに
室温で撹拌を続けた。(以下、この溶液をA液と略称す
る。)別途ジルコニウムテトラ−n−ブトキシド76.
7gおよびアセチルアセトン20gをエチルアルコール
100mlに溶解した溶液に水15gをエチルアルコー
ル50mlに溶解した溶液を撹拌下添加しさらに室温で
撹拌を続けた。(以下、この溶液をB液と略称する。)
A液に前記実施例1、3の金属−珪素複合アルコキシド
で処理したスライドグラスを、B液に前記実施例2、4
の金属−珪素複合アルコキシドで処理したスライドグラ
スを各々浸漬した後、500mm/minの速度で引き
上げ、室温で乾燥してから真空下150℃で24時間加
熱処理して、それぞれ酸化チタン膜及び酸化ジルコニウ
ム膜コーティングを行った。また比較例として、未処理
ガラスを用いて同様の方法で酸化チタン膜及び酸化ジル
コニウム膜コーティングを行った。このようにして酸化
チタン膜及び酸化ジルコニウム膜コーティングを行った
スライドグラスを、500gの荷重下、スチールウール
で摩擦し、コーティング膜が剥離するまでの摩擦回数を
測定することによりコーティング膜の耐摩擦性を評価し
た。結果を表1に示す。
[Primer performance test] The metal-silicon composite alkoxides of Examples 1 to 4 were used to evaluate the characteristics of the titanium oxide film and zirconium oxide film coatings as a primer. (Test Method) Each of the metal-silicon composite alkoxides of Examples 1 to 4 was dissolved in tetrahydrofuran so as to be 0.1 mol% by weight, and each solution was spray-coated on a commercially available slide glass by using a spray device. . After drying this slide glass at room temperature for 4 hours, it is vacuumed at 150 ° C for 12 hours.
Heat treated for hours. To a solution prepared by dissolving 56.8 g of titanium tetraisopropoxide and 20 g of acetylacetone in 100 ml of ethyl alcohol was added a solution of 15 g of water dissolved in 50 ml of ethyl alcohol with stirring, and the stirring was continued at room temperature. (Hereinafter, this solution is abbreviated as solution A.) Separately zirconium tetra-n-butoxide 76.
To a solution prepared by dissolving 7 g and 20 g of acetylacetone in 100 ml of ethyl alcohol, a solution prepared by dissolving 15 g of water in 50 ml of ethyl alcohol was added with stirring, and the stirring was continued at room temperature. (Hereinafter, this solution is abbreviated as solution B.)
The slide glass treated with the metal-silicon composite alkoxide of Examples 1 and 3 was used as the solution A, and the slide glasses prepared in Examples 2 and 4 were used as the solution B.
After immersing each slide glass treated with the metal-silicon composite alkoxide of 1., pulled up at a rate of 500 mm / min, dried at room temperature, and then heat-treated under vacuum at 150 ° C. for 24 hours to obtain a titanium oxide film and a zirconium oxide film, respectively. Membrane coating was performed. Further, as a comparative example, a titanium oxide film and a zirconium oxide film were coated by the same method using untreated glass. The slide glass thus coated with the titanium oxide film and the zirconium oxide film was rubbed with steel wool under a load of 500 g, and the number of frictions until the coating film was peeled off was measured to determine the abrasion resistance of the coating film. Was evaluated. The results are shown in Table 1.

【0045】[0045]

【表1】 [Table 1]

【0046】表1の結果に見られるように、ガラス表面
を本発明の金属−珪素複合アルコキシドで処理した後、
酸化チタン若しくは酸化ジルコニウムでコーティングす
ると、無処理のコーティング膜に比較して、耐摩耗性が
2〜3倍程度に飛躍的に向上する事が明らかとなった。
As can be seen from the results in Table 1, after treating the glass surface with the metal-silicon composite alkoxide of the present invention,
It was revealed that coating with titanium oxide or zirconium oxide dramatically improves the wear resistance by about 2 to 3 times as compared with the untreated coating film.

【0047】[0047]

【発明の効果】本発明の金属−珪素複合アルコキシドを
用いる事により、耐摩耗性に優れた酸化チタン、酸化ジ
ルコニウムコーティング膜をガラスにコーティングする
事が出来る。
By using the metal-silicon composite alkoxide of the present invention, it is possible to coat glass with a titanium oxide or zirconium oxide coating film having excellent wear resistance.

【化24】 [Chemical formula 24]

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 下記一般組成式(1)で表される金属−
珪素複合アルコキシド。
1. A metal represented by the following general composition formula (1):
Silicon composite alkoxide.
【請求項2】 下記一般組成式(2)で表される有機珪
素化合物と下記一般組成式(3)で表される金属アルコ
キシドとを反応させて製造する事を特徴とする請求項1
に記載の金属−珪素複合アルコキシド。 【化1】 (但し、式中MはTi或いはZrを表し、Rはアルキル
基を表し、互いに異なっていても互いに同一のものを含
んでいても良く、R*は炭素数4以下のアルキル基を表
し、互いに異なっていても互いに同一のものを含んでい
ても良く、Qは二価の炭化水素基またはイオウ原子を含
有する二価の有機基を表し、互いに異なっていても互い
に同一のものを含んでいても良く、Xは一価の炭化水素
基を表し、互いに異なっていても互いに同一のものを含
んでいても良く、aは0〜2の整数を、nは1乃至2を
表す。) 【化2】 (但し、式中Rはアルキル基を表し、互いに異なってい
ても互いに同一のものを含んでいても良く、Qは二価の
炭化水素基またはイオウ原子を含有する二価の有機基を
表し、R’はQより少ない炭素数を有し且つ炭素数3以
下の一価の炭化水素基を表し、Xは一価の炭化水素基を
表し、互いに異なっていても互いに同一のものを含んで
いても良く、aは0〜2の整数を表す。) 【化3】 (但し、式中MはTi或いはZrを表し、R*は炭素数
4以下のアルキル基を表し、互いに異なっていても互い
に同一のものを含んでいても良い。)
2. An organic silicon compound represented by the following general composition formula (2) and a metal alkoxide represented by the following general composition formula (3) are reacted to produce the compound.
7. The metal-silicon composite alkoxide according to. [Chemical 1] (However, in the formula, M represents Ti or Zr, R represents an alkyl group, may be different from each other or may contain the same ones, and R * represents an alkyl group having 4 or less carbon atoms, They may be different or the same as each other, Q represents a divalent hydrocarbon group or a divalent organic group containing a sulfur atom, and different from each other include the same one. And X represents a monovalent hydrocarbon group, which may be different from each other or may contain the same ones, a is an integer of 0 to 2, and n is 1 to 2.) 2] (However, in the formula, R represents an alkyl group, which may be different from each other or may include the same ones, and Q is a divalent group.
Hydrocarbon group or divalent organic group containing sulfur atom
Where R'has a carbon number less than Q and a carbon number of 3 or more.
Represents a monovalent hydrocarbon group below, and X represents a monovalent hydrocarbon group.
May represent the same or different from each other, and a represents an integer of 0 to 2. ) [Chemical 3] (However, in the formula, M represents Ti or Zr, and R * represents an alkyl group having 4 or less carbon atoms, which may be different from each other or may be the same as each other.)
JP19586894A 1994-07-28 1994-07-28 Metal-silicon composite alkoxide and method for producing the same Expired - Fee Related JP3485273B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19586894A JP3485273B2 (en) 1994-07-28 1994-07-28 Metal-silicon composite alkoxide and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19586894A JP3485273B2 (en) 1994-07-28 1994-07-28 Metal-silicon composite alkoxide and method for producing the same

Publications (2)

Publication Number Publication Date
JPH0840722A JPH0840722A (en) 1996-02-13
JP3485273B2 true JP3485273B2 (en) 2004-01-13

Family

ID=16348331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19586894A Expired - Fee Related JP3485273B2 (en) 1994-07-28 1994-07-28 Metal-silicon composite alkoxide and method for producing the same

Country Status (1)

Country Link
JP (1) JP3485273B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008280313A (en) * 2007-05-14 2008-11-20 Konica Minolta Opto Inc Metal-silicon compound alkoxide, inorganic particle and method for producing the same

Also Published As

Publication number Publication date
JPH0840722A (en) 1996-02-13

Similar Documents

Publication Publication Date Title
JPS5898367A (en) Silicone film forming composition and production thereof
US4311821A (en) Process for the preparation of crosslinked organopoly-siloxanes and their use as active ingredient of abhesive coating materials for two-dimensional carriers
US4780337A (en) Hybrid polymers derived from Si-H containing organosilicon polymers and unsaturated metal alkoxides
JPH07179480A (en) Surface-active siloxane coating compounds, and their use during coating
JPS58167597A (en) Fluoroaminosilane
JPH0551459A (en) Method for producing organosilicon polymer
JPH02284958A (en) Liquid silecone resin composition and its manufacture
JPH06511463A (en) Silicon or silica substrate with modified surface, method for producing the same, novel orthoesters and method for producing the same
EP0286387B1 (en) Organosilicon compounds
JP4682290B2 (en) Polymer-coated metal oxide and method for producing the same
JP2021095474A (en) Perfluoropolyether modified polysilazane and method for producing the same, surface treatment agent, cured coat and article
JPS5915912B2 (en) Production method of organosilane
JPH0225990B2 (en)
US3371104A (en) Process of preparing acyloxyalkyl group containing polysiloxanes
JP3485273B2 (en) Metal-silicon composite alkoxide and method for producing the same
JP4655789B2 (en) Silicon compounds
JP6590294B2 (en) Method for producing titanium soap
US3258444A (en) Glass base coated with an acid hydrolyzed polysilanol, the method of coating, the coating composition, and the method of preparing the composition
JP5607091B2 (en) Fluorine-containing maleimide compound and method for producing the same
JP3519871B2 (en) Curable composition and method for producing the same
US5026810A (en) Vinyl ether siloxanes
KR20040035829A (en) Process for the preparation of organosilylated carboxylate monomers, and their use in antifouling coatings
JPH05112583A (en) Silane compound and anti-fogging coating agent
JP3273842B2 (en) Alkoxysilane compounds and silane coupling agents
JPS5850657B2 (en) Method for producing terminal hydroxyphenyl ladder polysiloxane

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees