JP3480105B2 - Display panel - Google Patents

Display panel

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Publication number
JP3480105B2
JP3480105B2 JP06669095A JP6669095A JP3480105B2 JP 3480105 B2 JP3480105 B2 JP 3480105B2 JP 06669095 A JP06669095 A JP 06669095A JP 6669095 A JP6669095 A JP 6669095A JP 3480105 B2 JP3480105 B2 JP 3480105B2
Authority
JP
Japan
Prior art keywords
pixel electrode
display panel
capacitance
side edge
scanning line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP06669095A
Other languages
Japanese (ja)
Other versions
JPH08240812A (en
Inventor
郁博 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Casio Computer Co Ltd
Original Assignee
Casio Computer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Casio Computer Co Ltd filed Critical Casio Computer Co Ltd
Priority to JP06669095A priority Critical patent/JP3480105B2/en
Publication of JPH08240812A publication Critical patent/JPH08240812A/en
Application granted granted Critical
Publication of JP3480105B2 publication Critical patent/JP3480105B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明はアクティブマトリック
ス型液晶表示装置などにおける表示パネルに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display panel in an active matrix type liquid crystal display device or the like.

【0002】[0002]

【従来の技術】例えばアクティブマトリックス型液晶表
示装置には、画素容量部のほかに補助容量部を備えたも
のがある。図7および図8は従来のこのようなアクティ
ブマトリックス型液晶表示装置における表示パネルの一
部を示したものである。この表示パネルはガラス基板1
を備えている。ガラス基板1の上面側には補助容量ライ
ンを兼ねた走査ライン(ゲートライン)2A、2Bと信
号ライン(ドレインライン)3がマトリックス状に設け
られ、その各交点近傍にはスイッチング素子としての薄
膜トランジスタ4A、4Bおよび画素電極5A、5B、
5Cが設けられている。
2. Description of the Related Art For example, some active matrix type liquid crystal display devices have an auxiliary capacitance portion in addition to a pixel capacitance portion. 7 and 8 show a part of a display panel in such a conventional active matrix type liquid crystal display device. This display panel is a glass substrate 1
Is equipped with. Scanning lines (gate lines) 2A and 2B also serving as auxiliary capacitance lines and signal lines (drain lines) 3 are provided in a matrix on the upper surface side of the glass substrate 1, and a thin film transistor 4A as a switching element is provided near each intersection thereof. 4B and pixel electrodes 5A, 5B,
5C is provided.

【0003】すなわち、ガラス基板1の上面の所定の個
所にはゲート電極6を含む走査ライン2A、2B(補助
容量ライン兼用部については後で説明する。)が形成さ
れ、その上面全体にはゲート絶縁膜7が形成されてい
る。ゲート絶縁膜7の上面の所定の個所にはアモルファ
スシリコンからなる半導体薄膜8が形成され、半導体薄
膜8の上面の中央部にはチャネル保護膜9が形成されて
いる。半導体薄膜8およびチャネル保護膜9の上面の両
側にはn+シリコンからなるコンタクト層10、11が
形成され、コンタクト層10、11の上面にはドレイン
電極12およびソース電極13が形成され、またこれら
電極12、13の形成と同時に信号ライン3が形成され
ている。ゲート絶縁膜7の上面の所定の個所にはITO
からなる画素電極5A、5B、5Cがソース電極13に
接続されて形成されている。
That is, scanning lines 2A and 2B including a gate electrode 6 (a portion which also serves as an auxiliary capacitance line will be described later) are formed at predetermined positions on the upper surface of the glass substrate 1, and the gate is formed on the entire upper surface. The insulating film 7 is formed. A semiconductor thin film 8 made of amorphous silicon is formed at a predetermined position on the upper surface of the gate insulating film 7, and a channel protective film 9 is formed at the center of the upper surface of the semiconductor thin film 8. Contact layers 10 and 11 made of n + silicon are formed on both sides of the upper surfaces of the semiconductor thin film 8 and the channel protection film 9, and a drain electrode 12 and a source electrode 13 are formed on the upper surfaces of the contact layers 10 and 11. The signal line 3 is formed simultaneously with the formation of the electrodes 12 and 13. ITO is provided at a predetermined position on the upper surface of the gate insulating film 7.
Pixel electrodes 5A, 5B, and 5C are formed by being connected to the source electrode 13.

【0004】次に、走査ライン2A、2Bの補助容量ラ
イン兼用部について説明する。図7の中央部に示す画素
電極5Bに薄膜トランジスタ4Bを介して接続された走
査ライン2Bは当該画素電極5Bの下辺側に設けられて
いるが、その前段の走査ライン2Aつまり当該画素電極
5Bの上辺側に設けられた走査ライン2Aは当該画素電
極5B用の補助容量ラインを兼ねている。前段の走査ラ
イン2Aは、当該画素電極5Bの上辺部に対応する位置
に設けられた共通直線部2aと、この共通直線部2aか
ら当該画素電極5Bの左辺部および右辺部に沿って引き
出された引出部2b、2cとからなっている。そして、
共通直線部2aおよび引出部2b、2cの各所定の部分
は当該画素電極5Bの上辺部、左辺部および右辺部と重
ね合わされ、この重ね合わされた部分によって補助容量
部が形成されている。一方、図示していないが、画素容
量部は、当該画素電極5Bとこれに対向配置された共通
電極とその間に配置された液晶とによって形成されてい
る。
Next, a portion of the scanning lines 2A and 2B which also serves as an auxiliary capacitance line will be described. The scanning line 2B connected to the pixel electrode 5B shown in the central portion of FIG. 7 via the thin film transistor 4B is provided on the lower side of the pixel electrode 5B, but the scanning line 2A in the preceding stage, that is, the upper side of the pixel electrode 5B. The scanning line 2A provided on the side also serves as an auxiliary capacitance line for the pixel electrode 5B. The scanning line 2A in the previous stage is drawn out along the common straight line portion 2a provided at a position corresponding to the upper side portion of the pixel electrode 5B, and from the common straight line portion 2a along the left side portion and the right side portion of the pixel electrode 5B. It consists of drawer parts 2b and 2c. And
The respective predetermined portions of the common linear portion 2a and the lead portions 2b, 2c are overlapped with the upper side portion, the left side portion and the right side portion of the pixel electrode 5B, and the overlapped portion forms an auxiliary capacitance portion. On the other hand, although not shown, the pixel capacitance portion is formed by the pixel electrode 5B, a common electrode arranged to face the pixel electrode 5B, and liquid crystal arranged between them.

【0005】次に、図9は以上のような表示パネルを備
えたアクティブマトリックス型液晶表示装置の等価回路
を示したものである。符号21は画素容量部、22は補
助容量部、23は薄膜トランジスタ4Bのゲート電極6
とソース電極13との間の寄生容量部、24は画素電極
5Bと当該画素電極5B用の走査ライン2Bとの間の寄
生容量部を示す。そして、画素容量部21の容量をCLC
とし、補助容量部22の容量をCSとし、両寄生容量部
23、24の合計容量をCGSとし、ゲートパルスのハイ
レベルとローレベルの電位差をVGHLとすると、ゲート
パルスがオフするときに、次の(1)式で求められる飛
び込み電圧ΔVが生じる。 ΔV=(CGS・VGHL)/(CLC+CS+CGS)……(1)
Next, FIG. 9 shows an equivalent circuit of an active matrix type liquid crystal display device having the above-mentioned display panel. Reference numeral 21 is a pixel capacitance portion, 22 is an auxiliary capacitance portion, and 23 is a gate electrode 6 of the thin film transistor 4B.
And a parasitic capacitance portion between the source electrode 13 and 24, a parasitic capacitance portion between the pixel electrode 5B and the scanning line 2B for the pixel electrode 5B. Then, the capacitance of the pixel capacitance section 21 is changed to C LC.
When the capacitance of the auxiliary capacitance portion 22 is C S , the total capacitance of the parasitic capacitance portions 23 and 24 is C GS, and the potential difference between the high level and the low level of the gate pulse is V GHL , the gate pulse is turned off. Then, a jump voltage ΔV obtained by the following equation (1) is generated. ΔV = (C GS · V GHL ) / (C LC + C S + C GS ) …… (1)

【0006】ところで、画素容量部21の容量CLCはオ
ン状態のときとオフ状態のときとで異なるので、飛び込
み電圧ΔVもオン状態のときとオフ状態のときとで異な
った値をとる。両状態における飛び込み電圧ΔVの電圧
差ΔΔVを求めると、次の(2)式のようになる。ただ
し、画素容量部21の容量CLCはオン状態のときでもデ
ータ(階調)によってすべて異なるので、最大容量をC
LC/FULLとし、データによる変動容量をCLC/DATAとす
る。 ΔΔV=(CLC/FULL−CLC/DATA)・CGS・VGHL/ {(CLC/FULL+CS+CGS)・(CLC/DATA+CS+CGS)}……(2)
By the way, since the capacitance C LC of the pixel capacitance section 21 is different between the ON state and the OFF state, the jump voltage ΔV also takes different values in the ON state and the OFF state. When the voltage difference ΔΔV of the jump voltage ΔV in both states is obtained, the following equation (2) is obtained. However, since the capacitance C LC of the pixel capacitance unit 21 is all different depending on the data (gradation) even in the ON state, the maximum capacitance is C
LC / FULL, and the variable capacity due to data is C LC / DATA . ΔΔV = (C LC / FULL- C LC / DATA ) ・ C GS・ V GHL / {(C LC / FULL + C S + C GS ) ・ (C LC / DATA + C S + C GS )} …… (2)

【0007】この電圧差ΔΔVは、残像や焼き付けの原
因となるので、その絶対値をできるだけ小さくした方が
望ましい。このための1つの方法として、薄膜トランジ
スタ4Bをセルフアライメント構造とすることにより、
薄膜トランジスタ4Bのゲート電極6とソース電極13
との間の寄生容量部23の容量を小さくして、合計容量
GSを小さくする方法がある。しかしながら、この場
合、画素電極5Bと当該画素電極5B用の走査ライン2
Bとの間の寄生容量部24の容量を低減することはでき
ない。
Since this voltage difference ΔΔV causes afterimages and image sticking, it is desirable to make its absolute value as small as possible. As one method for this, by forming the thin film transistor 4B in a self-alignment structure,
Gate electrode 6 and source electrode 13 of thin film transistor 4B
There is a method of reducing the total capacitance C GS by reducing the capacitance of the parasitic capacitance section 23 between the and. However, in this case, the pixel electrode 5B and the scanning line 2 for the pixel electrode 5B
It is not possible to reduce the capacitance of the parasitic capacitance section 24 between B and B.

【0008】[0008]

【発明が解決しようとする課題】このように、従来のア
クティブマトリックス型液晶表示装置では、特に、画素
電極5Bと当該画素電極5B用の走査ライン2Bとの間
の寄生容量部24の容量を低減することができず、この
結果オン状態とオフ状態における飛び込み電圧ΔVの電
圧差ΔΔVの絶対値の低減に限界があり、ひいてはより
一層良好な画質を得ることができないという問題があっ
た。この発明の目的は、画素電極と当該画素電極用走査
ラインとの間の寄生容量部の容量を低減することができ
る表示パネルを提供することにある。
As described above, in the conventional active matrix type liquid crystal display device, in particular, the capacitance of the parasitic capacitance portion 24 between the pixel electrode 5B and the scanning line 2B for the pixel electrode 5B is reduced. As a result, there is a limit to the reduction of the absolute value of the voltage difference ΔΔV between the jump voltages ΔV in the on-state and the off-state, and there is a problem that it is not possible to obtain a better image quality. An object of the present invention is to provide a display panel capable of reducing the capacitance of a parasitic capacitance portion between a pixel electrode and the pixel electrode scanning line.

【0009】[0009]

【課題を解決するための手段】請求項1に記載の発明
は、マトリックス状に設けられた走査ラインおよび信号
ラインにスイッチング素子を介して画素電極が接続さ
れ、隣接の画素電極用走査ラインと当該画素電極とが重
ね合わされた部分により補助容量を形成する表示パネル
において、前記隣接の画素電極用走査ラインを前記当該
画素電極における、隣接の画素電極側の一側縁と該一側
縁に対向する他側縁との中央部よりも前記他側縁側に
置したものである
According to a first aspect of the present invention, pixel electrodes are connected to scanning lines and signal lines provided in a matrix form via switching elements, and adjacent pixel electrode scanning lines and in the display panel to form an auxiliary capacitor by a portion where the pixel electrode are overlapped, the in the adjacent pixel electrode scan lines wherein the pixel electrode, one side edge of the adjacent pixel electrode side and the one side
Than the central portion of the other side edge opposite to the edge is obtained by distributing <br/> location to the other side edge.

【0010】[0010]

【作用】請求項1に係る発明によれば、隣接の画素電極
用走査ラインを当該画素電極における、隣接の画素電極
側の一側縁と該一側縁に対向する他側縁との中央部より
前記他側縁側に配置したので、画素電極の一側縁と当
該画素電極用走査ラインとの間の間隔がある程度大きく
なり、これに伴い画素電極と当該画素電極用走査ライン
との容量結合が小さくなり、したがって画素電極と当該
画素電極用走査ラインとの間の寄生容量部の容量を低減
することができる
In accordance with the invention according to claim 1, in the adjacent pixel electrode scan line the pixel electrode, adjacent pixel electrodes
Since the one side edge on the one side and the other side edge opposite to the one side edge are arranged on the other side edge side with respect to the central portion, the distance between the one side edge of the pixel electrode and the pixel electrode scanning line is The capacitance is increased to some extent, and the capacitive coupling between the pixel electrode and the pixel electrode scanning line is reduced accordingly. Therefore, the capacitance of the parasitic capacitance portion between the pixel electrode and the pixel electrode scanning line can be reduced .

【0011】[0011]

【実施例】図1はこの発明の第1実施例を適用した表示
パネルの要部を示したものである。なお、この図におい
て、図7と同一名称部分には同一の符号を付し、その説
明を適宜省略する。この第1実施例では、図1の中央部
に示す画素電極5B用の補助容量ラインを兼ねた前段の
走査ライン2Aは、当該画素電極5Bの上下方向ほぼ中
央部に設けられた共通直線部2dと、この共通直線部2
dから当該画素電極5Bの左辺部に沿って上方に引き出
された引出部2eとからなっている。共通直線部2dお
よび引出部2eの各所定の部分は当該画素電極5Bの上
下方向ほぼ中央部および左辺部と重ね合わされ、この重
ね合わされた部分によって補助容量部が形成されてい
る。なお、引出部2eの先端部は、前段の画素電極5A
に接続された前段の薄膜トランジスタ4Aのゲート電極
6となっている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a main part of a display panel to which a first embodiment of the present invention is applied. In this figure, the same reference numerals are given to the same names as those in FIG. 7, and the description thereof will be omitted as appropriate. In the first embodiment, the scanning line 2A at the previous stage, which also serves as the auxiliary capacitance line for the pixel electrode 5B shown in the central portion of FIG. 1, has a common straight line portion 2d provided substantially at the central portion in the vertical direction of the pixel electrode 5B. And this common straight line part 2
It is composed of a lead-out portion 2e which is led out from d along the left side portion of the pixel electrode 5B. The respective predetermined portions of the common straight line portion 2d and the lead portion 2e are overlapped with the substantially central portion in the vertical direction and the left side portion of the pixel electrode 5B, and the overlapped portion forms an auxiliary capacitance portion. In addition, the leading end of the lead-out portion 2e is the pixel electrode 5A in the previous stage.
Is the gate electrode 6 of the thin film transistor 4A in the previous stage connected to.

【0012】以上の結果、当該画素電極5B用の走査ラ
イン2Bの共通直線部2dは、後段の画素電極5Cの上
下方向ほぼ中央部に配置されている。この配置の仕方を
別の方向から見ると、当該画素電極5Bの下辺(一側
縁)と当該画素電極5B用の走査ライン2Bとの間に当
該画素電極5Bの後段に隣接する後段の画素電極5Cの
一側縁(上辺)が配置されていることになる。この結
果、図7に示す従来の場合と比較して、当該画素電極5
Bと当該画素電極5B用の走査ライン2Bの共通直線部
2dとの水平方向の間隔tがある程度大きくなり、これ
に伴い当該画素電極5Bと当該画素電極5B用の走査ラ
イン2Bとの容量結合が小さくなり、したがって当該画
素電極5Bと当該画素電極5B用の走査ライン2Bとの
間の寄生容量部の容量を低減することができ、ひいては
より一層良好な画質を得ることができる。
As a result of the above, the common straight line portion 2d of the scanning line 2B for the pixel electrode 5B is disposed substantially vertically in the center of the pixel electrode 5C in the subsequent stage. When this arrangement is viewed from another direction, the pixel electrode at the rear stage adjacent to the rear stage of the pixel electrode 5B between the lower side (one side edge) of the pixel electrode 5B and the scanning line 2B for the pixel electrode 5B. One side edge (upper side) of 5C is arranged. As a result, as compared with the conventional case shown in FIG.
The horizontal interval t between B and the common straight line portion 2d of the scanning line 2B for the pixel electrode 5B becomes large to some extent, and accordingly, the capacitive coupling between the pixel electrode 5B and the scanning line 2B for the pixel electrode 5B is performed. Therefore, the capacitance of the parasitic capacitance portion between the pixel electrode 5B and the scanning line 2B for the pixel electrode 5B can be reduced, and further, a better image quality can be obtained.

【0013】ところで、当該画素電極5B用の走査ライ
ン2Bの共通直線部2dを後段の画素電極5Cの上下方
向ほぼ中央部に配置しているので、透過型のアクティブ
マトリックス型液晶表示装置に適用する場合には、走査
ライン2Bを例えば画素電極と同一の材料であるITO
によって形成すると、開口率が低下しないようにするこ
とができる。反射型のアクティブマトリックス型液晶表
示装置に適用する場合には、走査ライン2Bをアルミニ
ウムやクロム等の不透明な材料によって形成しても、開
口率が低下しないようにすることができる。
By the way, since the common straight line portion 2d of the scanning line 2B for the pixel electrode 5B is arranged substantially vertically in the center of the pixel electrode 5C in the subsequent stage, it is applied to a transmissive active matrix type liquid crystal display device. In this case, the scan line 2B is made of, for example, ITO which is the same material as the pixel electrode.
When formed by, the aperture ratio can be prevented from lowering. When applied to a reflection type active matrix type liquid crystal display device, even if the scanning line 2B is made of an opaque material such as aluminum or chromium, the aperture ratio can be prevented from lowering.

【0014】次に、図2はこの発明の第2実施例を適用
した表示パネルの要部を示したものである。なお、この
図において、図1と同一名称部分には同一の符号を付
し、その説明を適宜省略する。この第2実施例では、走
査ライン2Aの共通直線部2dの一部は下方に向かって
突出するほぼコ字状の突出部とされ、すなわち画素電極
5Bの左辺部に沿って下方に延びる左延出部2fと、画
素電極5Bの右辺部に沿って下方に延びる右延出部2g
と、画素電極5Bの下辺部に沿って両延出部2f、2g
間に設けられた下部2hとからなるほぼコ字状の突出部
とされている。そして、左延出部2fのほぼ全部は画素
電極5Bと重ね合わされ、右延出部2gおよび下部2h
の各所定の部分は画素電極5Bの右辺部及び下辺部と重
ね合わされ、これら重ね合わされた部分によっても補助
容量部が形成されている。この場合、特に、下部2hの
下側は画素電極5Bの下辺(他側縁)の外側に配置され
ているが、後段の画素電極5Cの上辺までは到っていな
い。
Next, FIG. 2 shows a main part of a display panel to which the second embodiment of the present invention is applied. In this figure, the same reference numerals are given to the same names as those in FIG. 1, and the description thereof will be omitted as appropriate. In the second embodiment, a part of the common straight line portion 2d of the scanning line 2A is a substantially U-shaped protruding portion that protrudes downward, that is, extends leftward extending downward along the left side portion of the pixel electrode 5B. The protrusion 2f and the right extension 2g extending downward along the right side portion of the pixel electrode 5B.
And both extending portions 2f and 2g along the lower side of the pixel electrode 5B.
It is a substantially U-shaped projecting portion including a lower portion 2h provided therebetween. Then, almost all of the left extending portion 2f is overlapped with the pixel electrode 5B, and the right extending portion 2g and the lower portion 2h are formed.
The respective predetermined portions are overlapped with the right side portion and the lower side portion of the pixel electrode 5B, and the overlapped portion also forms the auxiliary capacitance portion. In this case, in particular, the lower side of the lower portion 2h is arranged outside the lower side (the other side edge) of the pixel electrode 5B, but does not reach the upper side of the pixel electrode 5C in the subsequent stage.

【0015】次に、図3は図2のX−X線に沿う断面を
簡略化して示したものである。この図において、点線は
電気力線を示す。この電気力線は、当該画素電極5Bと
後段の画素電極5Cとの間、当該画素電極5Bと下部
(補助容量電極)2hとの間および後段の画素電極5B
と下部2hとの間でそれぞれ結ばれ、その両端点におい
て両画素電極5B、5Cおよび下部2hに対して垂直に
なるという性質を持っている。そして、電気力線が多い
ほどその間の容量が大きくなる。この場合、両画素電極
5B、5C間に下部2hの所定の一側縁が位置している
ので、両画素電極5B、5Cの容量結合が弱められ、よ
り一層良好な画質を得ることができる。これに対して、
図4に示すように、両画素電極5B、5C間に下部2h
が存在しない場合には、両画素電極5B、5Cの容量結
合が強くなり、この結果薄膜トランジスタ4Bのオフ状
態における当該画素電極5Bの電位が後段の画素電極5
Cの電位の影響を受けて変動し、より一層良好な画質を
得ることができなくなる。
Next, FIG. 3 shows a simplified cross section taken along line XX of FIG. In this figure, the dotted lines indicate the lines of electric force. The lines of electric force are generated between the pixel electrode 5B and the pixel electrode 5C in the rear stage, between the pixel electrode 5B and the lower portion (auxiliary capacitance electrode) 2h, and the pixel electrode 5B in the rear stage.
And the lower portion 2h are connected to each other, and both end points thereof are perpendicular to the pixel electrodes 5B and 5C and the lower portion 2h. And, the more the lines of electric force are, the larger the capacity therebetween is. In this case, since one predetermined side edge of the lower portion 2h is located between the pixel electrodes 5B and 5C, the capacitive coupling between the pixel electrodes 5B and 5C is weakened, so that a better image quality can be obtained. On the contrary,
As shown in FIG. 4, a lower portion 2h is placed between the pixel electrodes 5B and 5C.
Is not present, the capacitive coupling between the pixel electrodes 5B and 5C becomes strong, and as a result, the potential of the pixel electrode 5B in the OFF state of the thin film transistor 4B is the pixel electrode 5 in the subsequent stage.
It fluctuates under the influence of the potential of C, and it becomes impossible to obtain better image quality.

【0016】なお、図2に示す第2実施例では、走査ラ
イン2Aの共通直線部2dを画素電極5Bの上下方向ほ
ぼ中央部に配置するとともに、薄膜トランジスタ4Bの
ドレイン電極12およびソース電極13をゲート電極6
の左側および右側にそれぞれ配置しているが、図5に示
す第3実施例のように、走査ライン2Aの共通直線部2
dを画素電極5Bの上下方向ほぼ中央部よりも下辺側に
配置するとともに、薄膜トランジスタ4Bのドレイン電
極12およびソース電極13をゲート電極6の下側およ
び上側にそれぞれ配置するようにしてもよい。
In the second embodiment shown in FIG. 2, the common straight line portion 2d of the scanning line 2A is arranged substantially vertically in the center of the pixel electrode 5B, and the drain electrode 12 and the source electrode 13 of the thin film transistor 4B are gated. Electrode 6
Although they are arranged on the left side and the right side respectively, as in the third embodiment shown in FIG.
It is also possible to dispose d on the lower side of the pixel electrode 5B substantially in the vertical center and to dispose the drain electrode 12 and the source electrode 13 of the thin film transistor 4B on the lower side and the upper side of the gate electrode 6, respectively.

【0017】また、上記第1〜第3実施例では、画素電
極5A〜5Cをストライプ型に配列しているが、図6に
示す第4実施例のように、カラー化の場合に特に有効で
ある、デルタ型に配列してもよい。この場合、走査ライ
ン2Aと信号ライン3との重なり部は、符号Pの平行斜
線で示す交差部だけであるので、最も小さくすることが
できる。この結果、この表示パネルを駆動するためのド
ライバからみた負荷容量が軽減されることになる。
In the first to third embodiments, the pixel electrodes 5A to 5C are arranged in stripes, but it is particularly effective in the case of colorization as in the fourth embodiment shown in FIG. There may be a delta arrangement. In this case, since the scanning line 2A and the signal line 3 overlap with each other only at the intersection indicated by the parallel hatched line P, it can be minimized. As a result, the load capacity seen from the driver for driving this display panel is reduced.

【0018】さらに、例えば図1に示す第1実施例で
は、中央部の画素電極5Bに薄膜トランジスタ4Bを介
して接続された走査ライン2Bを後段の画素電極5Cの
上下方向ほぼ中央部に配置しているが、図1の上下関係
を逆とし、中央部の画素電極5Bに薄膜トランジスタ4
Bを介して接続された走査ライン2Bを前段の画素電極
5Aの上下方向ほぼ中央部に配置するようにしてもよ
い。このようなことは、上記第2〜第4実施例の場合も
同様であることはもちろんである。
Further, in the first embodiment shown in FIG. 1, for example, the scanning line 2B connected to the pixel electrode 5B in the central portion through the thin film transistor 4B is arranged substantially vertically in the central portion of the pixel electrode 5C in the subsequent stage. However, the vertical relationship of FIG. 1 is reversed, and the thin film transistor 4 is formed on the pixel electrode 5B in the central portion.
The scanning line 2B connected via B may be arranged substantially at the center in the vertical direction of the pixel electrode 5A in the preceding stage. Needless to say, this is also the case with the second to fourth embodiments.

【0019】[0019]

【発明の効果】以上説明したように、請求項1に係る発
明によれば、隣接の画素電極用走査ラインを当該画素電
における、隣接の画素電極側の一側縁と該一側縁に対
向する他側縁との中央部よりも前記他側縁側に配置した
ので、画素電極の一側縁と当該画素電極用走査ラインと
の間の間隔がある程度大きくなり、これに伴い画素電極
と当該画素電極用走査ラインとの容量結合が小さくな
り、したがって画素電極と当該画素電極用走査ラインと
の間の寄生容量部の容量を低減することができる。
As described above, according to the first aspect of the present invention, the adjacent pixel electrode scanning line is provided on one side edge of the pixel electrode adjacent to the adjacent pixel electrode side.
Since it is arranged closer to the other side edge than the central portion with the other side edge facing, the distance between the one side edge of the pixel electrode and the pixel electrode scanning line is increased to some extent, and accordingly the pixel electrode and the pixel electrode Capacitive coupling with the pixel electrode scanning line is reduced, so that the capacitance of the parasitic capacitance portion between the pixel electrode and the pixel electrode scanning line can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の第1実施例を適用した表示パネルの
要部の平面図。
FIG. 1 is a plan view of a main part of a display panel to which a first embodiment of the present invention is applied.

【図2】この発明の第2実施例を適用した表示パネルの
要部の平面図。
FIG. 2 is a plan view of a main part of a display panel to which a second embodiment of the present invention is applied.

【図3】図2のX−X線に沿う断面を簡略化して示す
図。
FIG. 3 is a diagram showing a simplified cross section taken along line XX of FIG.

【図4】比較のために示す図3同様の断面図。FIG. 4 is a sectional view similar to FIG. 3 shown for comparison.

【図5】この発明の第3実施例を適用した表示パネルの
要部の平面図。
FIG. 5 is a plan view of an essential part of a display panel to which a third embodiment of the invention is applied.

【図6】この発明の第4実施例を適用した表示パネルの
要部の平面図。
FIG. 6 is a plan view of a main part of a display panel to which a fourth embodiment of the invention is applied.

【図7】従来の表示パネルの一部の平面図。FIG. 7 is a plan view of part of a conventional display panel.

【図8】図7のY−Y線に沿う断面図。8 is a cross-sectional view taken along the line YY of FIG.

【図9】アクティブマトリックス型液晶表示装置の等価
回路を示す図。
FIG. 9 is a diagram showing an equivalent circuit of an active matrix type liquid crystal display device.

【符号の説明】[Explanation of symbols]

2A、2B 走査ライン 3 信号ライン 4A、4B 薄膜トランジスタ(スイッチング素子) 5A、5B、5C 画素電極 2A, 2B scanning line 3 signal lines 4A, 4B Thin film transistor (switching element) 5A, 5B, 5C Pixel electrode

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 マトリックス状に設けられた走査ライン
および信号ラインにスイッチング素子を介して画素電極
が接続され、隣接の画素電極用走査ラインと当該画素電
極とが重ね合わされた部分により補助容量を形成する表
示パネルにおいて、前記隣接の画素電極用走査ラインを
前記当該画素電極における、隣接の画素電極側の一側縁
と該一側縁に対向する他側縁との中央部よりも前記他側
縁側に配置したことを特徴とする表示パネル。
1. A pixel electrode is connected to a scan line and a signal line provided in a matrix form via a switching element, and an auxiliary capacitance is formed by a portion where an adjacent pixel electrode scan line and the pixel electrode are overlapped. In the display panel, the adjacent pixel electrode scan lines are
In the corresponding pixel electrode, one side edge of the adjacent pixel electrode side
The other side of the central portion of the other side edge opposite to said one side edge and
A display panel characterized by being arranged on the edge side .
【請求項2】 前記隣接の画素電極用走査ラインは、そ
の一部が前記当該画素電極の他側縁の外側に位置する
とを特徴とする請求項1記載の表示パネル。
2. The adjacent pixel electrode scan lines are
The display panel of claim 1, wherein a part and wherein the this <br/> located outside the other side edge of the corresponding pixel electrode.
【請求項3】 前記隣接の画素電極用走査ラインの一部
は、前記当該画素電極の画素電極用走査ラインと直交す
る側辺部の少なくとも一辺部と重ね合わされていること
を特徴とする請求項1または2に記載の表示パネル。
Wherein a portion of the adjacent pixel electrode scan lines, claims, characterized in that are superimposed with the at least one side portion of the side portion perpendicular to the pixel electrode scanning line of the pixel electrode The display panel according to 1 or 2.
【請求項4】 前記隣接の画素電極用走査ラインの一部
は、前記当該画素電極の画素電極用走査ラインと直交す
る両側辺部と重ね合わされていることを特徴とする請求
項1または2に記載の表示パネル。
Wherein a portion of the adjacent pixel electrode scan line, to claim 1 or 2, characterized in that they are overlapped with both side portions perpendicular to the said pixel electrodes of the pixel electrode for the scanning lines Display panel described.
【請求項5】 前記隣接の画素電極用走査ラインは、
当該画素電極の他側縁側に位置する画素電極側に向か
ってコ字状に突出された形状であることを特徴とする請
求項1または2に記載の表示パネル。
Wherein said adjacent pixel electrodes for the scanning lines, before
Serial display panel according to claim 1 or 2, characterized in that a shape that protrudes in a U-shape toward the pixel electrode side positioned on the other side edge of the pixel electrode.
JP06669095A 1995-03-02 1995-03-02 Display panel Expired - Lifetime JP3480105B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06669095A JP3480105B2 (en) 1995-03-02 1995-03-02 Display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06669095A JP3480105B2 (en) 1995-03-02 1995-03-02 Display panel

Publications (2)

Publication Number Publication Date
JPH08240812A JPH08240812A (en) 1996-09-17
JP3480105B2 true JP3480105B2 (en) 2003-12-15

Family

ID=13323195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06669095A Expired - Lifetime JP3480105B2 (en) 1995-03-02 1995-03-02 Display panel

Country Status (1)

Country Link
JP (1) JP3480105B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006053267A (en) * 2004-08-10 2006-02-23 Sony Corp Display device and its manufacturing method
JP4633060B2 (en) * 2004-10-05 2011-02-16 シャープ株式会社 Electrode substrate and display device including the same
KR101303943B1 (en) 2006-11-15 2013-09-05 삼성디스플레이 주식회사 Liquid crystal display and menufacturing method thereof
US20100033665A1 (en) * 2006-12-12 2010-02-11 Kohei Tanaka Liquid crystal display device
TWI597552B (en) 2012-01-20 2017-09-01 群康科技(深圳)有限公司 Pixel structures

Also Published As

Publication number Publication date
JPH08240812A (en) 1996-09-17

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