JP3465675B2 - Piezoelectric / electrostrictive film type element - Google Patents

Piezoelectric / electrostrictive film type element

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Publication number
JP3465675B2
JP3465675B2 JP2000275137A JP2000275137A JP3465675B2 JP 3465675 B2 JP3465675 B2 JP 3465675B2 JP 2000275137 A JP2000275137 A JP 2000275137A JP 2000275137 A JP2000275137 A JP 2000275137A JP 3465675 B2 JP3465675 B2 JP 3465675B2
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JP
Japan
Prior art keywords
piezoelectric
electrostrictive film
electrostrictive
film type
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000275137A
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Japanese (ja)
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JP2002094135A (en
Inventor
浩文 山口
伸夫 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
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Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP2000275137A priority Critical patent/JP3465675B2/en
Priority to US09/948,077 priority patent/US6495945B2/en
Priority to DE60127780T priority patent/DE60127780T2/en
Priority to EP01307651A priority patent/EP1187234B1/en
Publication of JP2002094135A publication Critical patent/JP2002094135A/en
Application granted granted Critical
Publication of JP3465675B2 publication Critical patent/JP3465675B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349Creating layers of material on a substrate
    • B81C1/0038Processes for creating layers of materials not provided for in groups B81C1/00357 - B81C1/00373
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/46Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
    • C04B35/462Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/46Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
    • C04B35/462Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
    • C04B35/475Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on bismuth titanates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/20Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047Membrane type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/02Sensors
    • B81B2201/0292Sensors not provided for in B81B2201/0207 - B81B2201/0285
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/03Bonding two components
    • B81C2203/038Bonding techniques not provided for in B81C2203/031 - B81C2203/037
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3201Alkali metal oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3251Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof
    • C04B2235/3255Niobates or tantalates, e.g. silver niobate
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3298Bismuth oxides, bismuthates or oxide forming salts thereof, e.g. zinc bismuthate

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

A ceramic substrate 1 comprises a thin diaphragm portion 3 and a thick portion 2. A lower electrode 4 is formed on the ceramic substrate and is spaced apart from an auxiliary electrode 8, also formed on the ceramic substrate. A bonding layer 7C comprises an insulator and is formed on the ceramic substrate between the lower and auxiliary electrodes. A piezoelectric/electrostrictive layer 5 is formed on at least a portion of each of the lower electrode, the auxiliary electrode and the bonding layer. An upper electrode 6 extends over the piezoelectric/electrostrictive layer and contacts the auxiliary electrode. A bonded portion exist wherein the bonding layer serves to completely bond together the substrate and the piezoelectric/electrostrictive film layer. <IMAGE>

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、圧電/電歪膜型素
子に係り、中でも屈曲変位を利用するアクチュエータ
や、流体特性や音圧、微小重量、加速度等のセンサとし
て、例えばマイクロホンや粘度センサに用いられる圧電
/電歪膜型素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a piezoelectric / electrostrictive film type element, and in particular, an actuator utilizing bending displacement, a sensor for fluid characteristics, sound pressure, minute weight, acceleration, etc., such as a microphone or a viscosity sensor. The present invention relates to a piezoelectric / electrostrictive film type element used in.

【0002】[0002]

【従来の技術】圧電/電歪電歪膜型素子は、従来よりア
クチュエータや各種センサとして用いられている。セン
サとして用いられる圧電/電歪膜型素子は、例えば特開
平8−201265号公報に開示されるように、流体の
密度、濃度、粘度等の特性測定に利用される。このよう
な素子にあっては、圧電体振動子の振幅と振動子に接触
する流体の粘性抵抗に相関があることを利用しセンサと
して用いるものである。振動子の振動のような機械系で
の振動形態は、電気系での等価回路に置き換えることが
でき、流体中で圧電/電歪膜型振動子を振動させ、この
振動子が流体の粘性抵抗に基づいて機械的抵抗を受ける
ことにより振動子を構成する圧電体の等価回路の電気的
定数が変化するのを検出し、流体の粘度、密度、濃度等
の特性を測定することが可能となる。測定可能な流体と
しては、液体及び気体を意味し、水、アルコール、油等
単一の成分からなる液体のみならず、これらの液体に可
溶または不溶な媒質を溶解または混合あるいは懸濁せし
めた液体、スラリー、ペーストが含まれる。また、検出
する電気的定数としては、損失係数、位相、抵抗、リア
クタンス、コンダクタンス、サセプタンス、インダクタ
ンス及びキャパシタンス等を挙げることができ、特に等
価回路の共振周波数近傍で極大または極小変化点を1つ
もつ損失係数または位相が好ましく用いられる。これに
より流体の粘度のみならず、密度や濃度をも測定するこ
とができ、例えば、硫酸水溶液中の硫酸濃度を測定する
ことができる。なお、振動形態の変化を検出する指標と
して電気的定数以外に、測定精度、耐久性の観点から特
に問題が無ければ共振周波数の変化を利用することもで
きる。
2. Description of the Related Art Piezoelectric / electrostrictive electrostrictive film type elements have been conventionally used as actuators and various sensors. The piezoelectric / electrostrictive film type element used as a sensor is used for measuring characteristics such as density, concentration and viscosity of a fluid as disclosed in, for example, Japanese Patent Laid-Open No. 8-201265. Such an element is used as a sensor by utilizing the fact that there is a correlation between the amplitude of the piezoelectric vibrator and the viscous resistance of the fluid in contact with the vibrator. A vibration form in a mechanical system such as a vibration of a vibrator can be replaced with an equivalent circuit in an electric system, which vibrates a piezoelectric / electrostrictive film type vibrator in a fluid, and this vibrator viscous resistance of the fluid. It is possible to detect changes in the electrical constants of the equivalent circuit of the piezoelectric body that constitutes the vibrator by receiving mechanical resistance based on the above, and measure the characteristics such as viscosity, density, and concentration of the fluid. . The measurable fluid means a liquid and a gas, and not only a liquid composed of a single component such as water, alcohol, or oil, but a medium soluble or insoluble in these liquids is dissolved, mixed or suspended. Includes liquids, slurries and pastes. The electrical constants to be detected include loss coefficient, phase, resistance, reactance, conductance, susceptance, inductance and capacitance. In particular, there is one maximum or minimum change point near the resonance frequency of the equivalent circuit. A loss factor or phase is preferably used. With this, not only the viscosity of the fluid but also the density and the concentration can be measured, and for example, the sulfuric acid concentration in the sulfuric acid aqueous solution can be measured. It should be noted that, as an index for detecting a change in vibration form, a change in resonance frequency can be used as well as an electric constant, as long as there is no particular problem from the viewpoint of measurement accuracy and durability.

【0003】かかる圧電/電歪膜型素子にあっては、特
開平5−267742号公報に開示されるように、図2
のように厚肉部2を周縁部に持つ薄肉ダイヤフラム部3
を有するセラミックスからなる基板1に積層した下部電
極4とは独立した位置に、補助電極8を形成し、その補
助電極の一部が前記圧電/電歪膜5の下側の一部に入り
込ませるように形成されている。このような構成によ
り、上部電極6を補助電極8及び圧電/電歪膜5の面上
で断線すること無く連続して形成することが可能とな
り、上部電極6の接続の信頼性が向上する。なお図2に
あっては、被測定流体は空洞部10に存在し、貫通孔9
により導入される。
Such a piezoelectric / electrostrictive film type element is disclosed in FIG. 2 as disclosed in Japanese Patent Laid-Open No. 5-267742.
A thin diaphragm part 3 having a thick part 2 on the periphery as shown in
An auxiliary electrode 8 is formed at a position independent of the lower electrode 4 laminated on the substrate 1 made of ceramics having the above-mentioned structure, and a part of the auxiliary electrode is inserted into a part of the lower side of the piezoelectric / electrostrictive film 5. Is formed. With such a configuration, the upper electrode 6 can be continuously formed on the surfaces of the auxiliary electrode 8 and the piezoelectric / electrostrictive film 5 without disconnection, and the reliability of connection of the upper electrode 6 is improved. In FIG. 2, the fluid to be measured exists in the cavity 10 and the through hole 9
Introduced by.

【0004】さらに、かかる圧電/電歪膜型素子にあっ
ては、特開平6−260694号公報に開示されるよう
に、図2のように、下部電極4上の圧電/電歪膜5を、
下部電極4を覆いかつ圧電/電歪膜5の周囲部がセラミ
ック基板1上に張り出す大きさとされることがある。こ
れにより、下部電極4と圧電/電歪膜5の精密な位置合
わせが不要となり、上下電極間の短絡が容易に防止でき
る。さらに、この圧電/電歪膜5の張り出し部11を前
記基板1と不完全な結合状態とし、不完全結合部7Aと
することで、張り出し部11が基板と結合していないた
めに、十二分な屈曲変位や発生力や振動を発現すること
ができる。不完全結合状態とは、張り出し部の一部がセ
ラミック基板と部分的に結合した状態または、結合した
部分が全く無い未結合状態のことを意味し、具体的に
は、張り出し部とセラミック基板のピール(引き剥がし)
強度で、0.5 kg/mm2以下とされる。このような不完全
結合状態の形成には、基板材料と圧電/電歪材料の相互
の反応性が低くなるように、それらを選択してなされる
ほか、圧電/電歪膜と基板が直接接しないように、ダミ
ー層を形成したうえで、圧電/電歪膜5を形成する場合
もある。このダミー層の形成には、スタンピング法、ス
クリーン印刷法、あるいはインクジェット法が好適に用
いられる。ダミー層は、圧電/電歪膜5が焼結のために
熱処理される場合には、この熱処理により燃焼・消失す
る材料、例えば樹脂材料等で形成され、消失後不完全結
合部7Aが形成されるのである。または、圧電/電歪膜
及び上部電極が熱処理されない場合には、ダミー層を水
や有機溶媒等に溶解する樹脂材料で形成し、圧電/電歪
膜5を形成後あるいは圧電/電歪膜5と上部電極6を形
成後、水や有機溶媒等により溶解・除去処理され不完全
結合部7Aが形成される。
Further, in such a piezoelectric / electrostrictive film type element, as disclosed in JP-A-6-260694, the piezoelectric / electrostrictive film 5 on the lower electrode 4 is provided as shown in FIG. ,
The size may cover the lower electrode 4 and the peripheral portion of the piezoelectric / electrostrictive film 5 may project to the ceramic substrate 1. This eliminates the need for precise alignment of the lower electrode 4 and the piezoelectric / electrostrictive film 5 and easily prevents a short circuit between the upper and lower electrodes. Further, the protruding portion 11 of the piezoelectric / electrostrictive film 5 is incompletely bonded to the substrate 1 to form the incompletely bonded portion 7A, so that the protruding portion 11 is not bonded to the substrate. It is possible to develop sufficient bending displacement, generated force, and vibration. The incompletely bonded state means a state in which a part of the overhanging portion is partially bonded to the ceramic substrate or an unbonded state in which there is no bonded portion at all. Peel (peeling off)
The strength is 0.5 kg / mm 2 or less. The formation of such an incompletely bonded state is performed by selecting the substrate material and the piezoelectric / electrostrictive material so that the mutual reactivity is low, and the piezoelectric / electrostrictive film and the substrate are directly contacted with each other. In some cases, the piezoelectric / electrostrictive film 5 may be formed after forming the dummy layer so as not to do so. A stamping method, a screen printing method, or an inkjet method is suitably used for forming the dummy layer. When the piezoelectric / electrostrictive film 5 is heat-treated for sintering, the dummy layer is formed of a material that burns and disappears by this heat treatment, for example, a resin material, and the incompletely bonded portion 7A is formed after the disappearance. It is. Alternatively, when the piezoelectric / electrostrictive film and the upper electrode are not heat-treated, the dummy layer is formed of a resin material that dissolves in water or an organic solvent, and after the piezoelectric / electrostrictive film 5 is formed or the piezoelectric / electrostrictive film 5 is formed. After the upper electrode 6 is formed, it is dissolved and removed by water, an organic solvent or the like to form the incompletely bonded portion 7A.

【0005】[0005]

【発明が解決しようとする課題】このような振動におけ
る電気的特性を検知することによりセンシングを行うセ
ンサ用素子にあっては、電気的特性がばらつかないのが
望ましいのに対し、従来の圧電/電歪膜型素子の構造に
おいては、初期の電気的定数が素子固体間でばらついた
り、電気的定数の経時変化が生じたりする場合があり、
そのような場合には、微調整の手間をかける必要があっ
た。
In a sensor element that performs sensing by detecting the electrical characteristics of such vibrations, it is desirable that the electrical characteristics do not vary, whereas the conventional piezoelectric elements. / In the structure of the electrostrictive film type element, the initial electric constant may vary among the element solids, or the electric constant may change over time.
In such a case, it was necessary to take the trouble of fine adjustment.

【0006】[0006]

【課題を解決するための手段】そこで、研究の結果、従
来の圧電/電歪膜型素子においては、図2に示すよう
に、張り出し部11の不完全結合部7Aと同様な不完全
結合状態にある不完全結合部7Bが、下部電極4と補助
電極8間で、基板の薄肉ダイヤフラム3上と厚肉部2に
跨り形成され、振動における電気的定数を利用したセン
サ素子等にあっては、かかる不完全結合部7Bの不完全
結合状態のばらつきや経時変化が、振動形態の変化ひい
ては電気的定数の変化を引き起こす主原因の一つである
ことを見出した。すなわち、不完全結合状態であるがた
めに、不完全結合状態を再現性よく安定的に形成するこ
とができないほか、実使用時に薄肉ダイヤフラム部が振
動あるいは変位するため、部分的に結合がとれたり、マ
イクロクラックが生じたりするなどの現象が生じる。
Therefore, as a result of research, in the conventional piezoelectric / electrostrictive film type element, as shown in FIG. 2, an incompletely bonded state similar to the incompletely bonded portion 7A of the overhanging portion 11 is obtained. The incompletely coupled portion 7B is formed between the lower electrode 4 and the auxiliary electrode 8 over the thin diaphragm 3 and the thick portion 2 of the substrate, and is not applicable to a sensor element or the like utilizing an electric constant in vibration. It has been found that such a variation in the incompletely bonded state of the incompletely bonded portion 7B and a change with time are one of the main causes of the change in the vibration form and the change in the electric constant. In other words, since the incompletely bonded state cannot be stably formed with good reproducibility, the thin diaphragm part vibrates or displaces during actual use, so that the partial connection may be lost. , Phenomenon such as generation of microcracks occurs.

【0007】本発明は、厚肉部を周縁部に持つ薄肉ダイ
ヤフラム部を有するセラミックスからなる基板に、下部
電極及び補助電極と、圧電/電歪膜と、上部電極を順次
積層させた圧電/電歪膜型素子であって、下部電極と補
助電極間に、絶縁体からなる結合層を設けることによ
り、圧電/電歪膜とセラミック基板を完全結合状態とし
たことを特徴とする圧電/電歪膜型素子である。完全結
合状態とは、基板と結合層と圧電/電歪膜が一体化処理
がなされた後の、圧電/電歪膜のピール(引き剥がし)
強度が2kg/mm2以上の状態をいう。
The present invention is a piezoelectric / electrostrictive device in which a lower electrode and an auxiliary electrode, a piezoelectric / electrostrictive film, and an upper electrode are sequentially laminated on a substrate made of ceramics having a thin diaphragm portion having a thick portion on its peripheral portion. A piezoelectric / electrostrictive device, which is a strained film type element, in which a piezoelectric / electrostrictive film and a ceramic substrate are completely bonded by providing a bonding layer made of an insulator between a lower electrode and an auxiliary electrode. It is a film type device. Completely bonded state means peeling of the piezoelectric / electrostrictive film after the substrate, bonding layer, and piezoelectric / electrostrictive film have been integrated.
It means a state where the strength is 2 kg / mm 2 or more.

【0008】前記圧電/電歪膜としては、チタン酸鉛、
ジルコン酸鉛、マグネシウムニオブ酸鉛、ニッケルニオ
ブ酸鉛から選ばれた少なくとも1種以上を主成分とする
材料で構成されることが好ましい。
As the piezoelectric / electrostrictive film, lead titanate,
It is preferably composed of a material containing at least one selected from lead zirconate, lead magnesium niobate, and lead nickel niobate as a main component.

【0009】また、前記圧電/電歪膜が、(Bi0.5Na0.5)
TiO3またはこれを主成分とする材料で構成されることが
好ましく、さらには、前記圧電/電歪膜は、(1−x)
(Bi0 .5Na0.5)TiO3−xKNbO3(xはモル分率で0≦x≦
0.06)またはこれを主成分とする材料で構成されること
がより好ましい。
Further, the piezoelectric / electrostrictive film is (Bi 0.5 Na 0.5 ).
It is preferably composed TiO 3 or containing a material whose main component, and further, the piezoelectric / electrostrictive film is (1-x)
(Bi 0 .5 Na 0.5) TiO 3 -xKNbO 3 (x is 0 ≦ x ≦ mole fraction
0.06) or a material containing this as a main component is more preferable.

【0010】前記絶縁体からなる結合層としては、圧電
/電歪膜の熱処理温度以上の軟化点を有するガラスであ
ることがより好ましい。
It is more preferable that the bonding layer made of the above-mentioned insulator is glass having a softening point equal to or higher than the heat treatment temperature of the piezoelectric / electrostrictive film.

【0011】加えて、圧電/電歪膜が、(Bi0.5Na0.5)Ti
O3またはこれを主成分とする材料、または、(1−x)
(Bi0.5Na0.5)TiO3−xKNbO3(xはモル分率で0≦x≦
0.06)またはこれを主成分とする材料で構成される場合
には、下部電極と補助電極間に、(1−x)(Bi0.5Na
0.5)TiO3−xKNbO3(xはモル分率で0.08≦x≦0.5)を
主成分とする材料で構成された結合層を設けることによ
り、圧電/電歪膜とセラミック基板を完全結合状態とす
ることができる。
In addition, the piezoelectric / electrostrictive film is (Bi 0.5 Na 0.5 ) Ti
O 3 or a material containing it as a main component, or (1-x)
(Bi 0.5 Na 0.5 ) TiO 3 −xKNbO 3 (x is a mole fraction, 0 ≦ x ≦
0.06) or a material containing this as a main component, (1-x) (Bi 0.5 Na
0.5 ) TiO 3 −xKNbO 3 (x is a mole fraction 0.08 ≦ x ≦ 0.5) By providing a bonding layer composed of a material having a main component, the piezoelectric / electrostrictive film and the ceramic substrate are completely bonded. can do.

【0012】[0012]

【発明の実施の形態】図1には、本発明の圧電/電歪膜
型素子の実施形態が示されている。かかる圧電/電歪膜
型素子は、薄肉のダイヤフラム部3と厚肉部2からなる
セラミック基板1の上に、下部電極4及び補助電極8
と、圧電/電歪膜5及び、上部電極6が、通常の膜形成
法によって順次積層されてなる一体構造となって形成さ
れている。下部電極4と補助電極8の間で、絶縁体から
なる結合層7Cにより、圧電/電歪膜とセラミック基板
が完全結合状態にある完全結合部となっている。本発明
においては、張り出し部11は必ずしも必要ではなく、
素子特性としての電気的定数のばらつきや経時変化をよ
り小さくすることが求められる場合には、下部電極4と
圧電/電歪膜5は、ほぼ同等の大きさとされる場合もあ
る。
1 shows an embodiment of a piezoelectric / electrostrictive film type element of the present invention. Such a piezoelectric / electrostrictive film type element has a lower electrode 4 and an auxiliary electrode 8 on a ceramic substrate 1 composed of a thin diaphragm portion 3 and a thick portion 2.
Then, the piezoelectric / electrostrictive film 5 and the upper electrode 6 are formed as an integral structure by sequentially laminating by a normal film forming method. Between the lower electrode 4 and the auxiliary electrode 8, the piezoelectric / electrostrictive film and the ceramic substrate are in a completely bonded state by the bonding layer 7C made of an insulator. In the present invention, the overhanging portion 11 is not always necessary,
The lower electrode 4 and the piezoelectric / electrostrictive film 5 may have substantially the same size when it is required to further reduce variations in the electric constants as element characteristics and changes over time.

【0013】セラミック基板1の材質としては、耐熱
性、化学的安定性、絶縁性を有する材質が好ましい。こ
れは、後述するように下部電極4、圧電/電歪膜5、上
部電極6を一体化する際に、熱処理する場合があるこ
と、センサ素子としての圧電/電歪膜型素子が液体の特
性をセンシングする場合、その液体が導電性や、腐食性
を有する場合があるためである。かかる観点から使用で
きるセラミックスとしては、安定化された酸化ジルコニ
ウム、酸化アルミニウム、酸化マグネシウム、ムライ
ト、窒化アルミニウム、窒化珪素及びガラス等を例示す
ることができる。これらの内、安定化された酸化ジルコ
ニウムは薄肉ダイヤフラム部を薄く形成した場合にも機
械的強度を高く保てること、靭性に優れることなどか
ら、好適に使用することができる。
The material of the ceramic substrate 1 is preferably a material having heat resistance, chemical stability and insulation. This is because heat treatment may be performed when the lower electrode 4, the piezoelectric / electrostrictive film 5 and the upper electrode 6 are integrated as described later, and the piezoelectric / electrostrictive film type element as a sensor element has a liquid characteristic. This is because the liquid may have conductivity or corrosiveness when sensing. Examples of ceramics that can be used from this point of view include stabilized zirconium oxide, aluminum oxide, magnesium oxide, mullite, aluminum nitride, silicon nitride and glass. Among these, stabilized zirconium oxide can be preferably used because it can maintain high mechanical strength and excellent toughness even when the thin diaphragm portion is formed thinly.

【0014】セラミック基板1の薄肉ダイヤフラム部2
の厚さとしては、圧電/電歪膜の振動を妨げないため
に、一般に50μm以下、好ましくは30μm以下、さ
らに好ましくは15μm以下とされる。また、薄肉ダイ
ヤフラム部の表面形状としては、長方形、正方形、三角
形、楕円形、真円形等いかなる形状もとりうるが、励起
される共振モードを単純化させる必要のあるセンサ素子
の応用では、長方形や真円形が必要に応じて選択され
る。
Thin diaphragm portion 2 of ceramic substrate 1
The thickness of is generally 50 μm or less, preferably 30 μm or less, and more preferably 15 μm or less in order not to disturb the vibration of the piezoelectric / electrostrictive film. The surface shape of the thin diaphragm portion can be any shape such as rectangle, square, triangle, ellipse, and true circle, but in the application of the sensor element that needs to simplify the excited resonance mode, the shape of the rectangle or true The circular shape is selected as needed.

【0015】このようなセラミック基板1の表面上に、
下部電極4及び補助電極8が形成されている。かかる下
部電極4は、セラミック基板の一方の端から、薄肉ダイ
ヤフラム部3上の、圧電/電歪膜5が形成されるべき大
きさと同等か、より小さい所定の大きさで形成される。
下部電極4の一方の端は、リード用端子として用いられ
る。一方、補助電極8は、セラミック基板1の下部電極
4とは反対側の端部から、薄肉ダイヤフラム3に向かっ
て所定の位置まで形成されている。補助電極8の一方の
端部は、リード用端子として用いられる。
On the surface of such a ceramic substrate 1,
The lower electrode 4 and the auxiliary electrode 8 are formed. The lower electrode 4 is formed from one end of the ceramic substrate to a predetermined size equal to or smaller than the size on the thin diaphragm portion 3 where the piezoelectric / electrostrictive film 5 is to be formed.
One end of the lower electrode 4 is used as a lead terminal. On the other hand, the auxiliary electrode 8 is formed from the end of the ceramic substrate 1 opposite to the lower electrode 4 toward the thin diaphragm 3 to a predetermined position. One end of the auxiliary electrode 8 is used as a lead terminal.

【0016】下部電極4及び補助電極8は、異なる材質
でも、同一の材質でもよく、セラミック基板1と圧電/
電歪膜5とのいずれとも接合性のよい導電性材料が用い
られる。具体的には、白金、パラジウム、ロジウム、
銀、あるいはこれらの合金を主成分とする電極材料が好
適に用いられ、特に、圧電/電歪膜を形成する際に焼結
のための熱処理が行われる場合には、白金、及びごれを
主成分とする合金が好適に用いられる。
The lower electrode 4 and the auxiliary electrode 8 may be made of different materials or the same material.
A conductive material having good bonding properties with the electrostrictive film 5 is used. Specifically, platinum, palladium, rhodium,
An electrode material containing silver or an alloy thereof as a main component is preferably used. Particularly, when heat treatment for sintering is performed when forming the piezoelectric / electrostrictive film, platinum and dust are removed. An alloy containing the main component is preferably used.

【0017】下部電極4と補助電極8の形成には、公知
の各種の膜形成手法が用いられる。具体的には、イオン
ビーム、スパッタリング、真空蒸着、CVD、イオンプ
レーティング、メッキ等の薄膜形成手法や、スクリーン
印刷、スプレー、ディッピング等の厚膜形成手法が適宜
選択されるが、その中でも特にスパッタリング法及びス
クリーン印刷法が好適に選択される。
For forming the lower electrode 4 and the auxiliary electrode 8, various known film forming methods are used. Specifically, thin film forming methods such as ion beam, sputtering, vacuum deposition, CVD, ion plating, and plating, and thick film forming methods such as screen printing, spraying, and dipping are appropriately selected. Method and screen printing method are suitably selected.

【0018】圧電/電歪膜5の形成に先立ち、圧電/電
歪膜5とセラミック基板1を、下部電極4と補助電極8
間で、完全結合状態とするための絶縁体からなる結合層
7Cが形成される。絶縁体からなる結合層7Cとして
は、圧電/電歪膜5とセラミック基板1の双方と密着
性、結合性が高ければ、有機材料、無機材料のいずれの
材料でもよい。また、結合層7Cとして用いる材料の熱
膨張係数が、基板材料の熱膨張係数及び、圧電/電歪膜
5に用いる材料の熱膨張係数の中間の値を有すること
が、信頼性の高い結合性が得られるためより好ましい。
圧電/電歪膜5が焼結のために熱処理される場合には、
結合層7Cを構成する材料としてガラス材料が、圧電/
電歪膜5とセラミック基板1の双方と密着性、結合性が
高いので、好適に用いられ、中でも圧電/電歪膜5の熱
処理温度以上の軟化点を有するガラス材料が、圧電/電
歪膜5と基板1をより強固に結合せしめ、また、軟化点
が高いために熱処理による変形を抑制できることから、
より好適に用いられる。
Prior to the formation of the piezoelectric / electrostrictive film 5, the piezoelectric / electrostrictive film 5 and the ceramic substrate 1, the lower electrode 4 and the auxiliary electrode 8 are formed.
In the meantime, a bonding layer 7C made of an insulating material for forming a completely bonded state is formed. As the bonding layer 7C made of an insulating material, any material such as an organic material or an inorganic material may be used as long as it has high adhesiveness and bondability with both the piezoelectric / electrostrictive film 5 and the ceramic substrate 1. Further, the coefficient of thermal expansion of the material used for the bonding layer 7C has an intermediate value between the coefficient of thermal expansion of the material of the substrate and the coefficient of thermal expansion of the material used for the piezoelectric / electrostrictive film 5, and the highly reliable bondability is obtained. Is more preferable because
When the piezoelectric / electrostrictive film 5 is heat treated for sintering,
As a material forming the coupling layer 7C, a glass material is piezoelectric /
A glass material having a softening point equal to or higher than the heat treatment temperature of the piezoelectric / electrostrictive film 5 is preferably used because it has high adhesion and bondability with both the electrostrictive film 5 and the ceramic substrate 1. 5 and the substrate 1 are more firmly bonded, and since the softening point is high, deformation due to heat treatment can be suppressed,
It is more preferably used.

【0019】さらに、圧電/電歪膜5が、後述の(Bi0.5
Na0.5)TiO3またはこれを主成分とする材料、または(1
−x)(Bi0.5Na0.5)TiO3−xKNbO3(xはモル分率で0
≦x≦0.06)またはこれを主成分とする材料で構成され
る場合には、(1−x)(Bi0. 5Na0.5)TiO3−xKNbO
3(xはモル分率で0.08≦x≦0.5)を主成分とする材料
で構成された結合層7Cが、圧電/電歪膜5とセラミッ
ク基板1の双方との密着性が高く、熱処理の際の圧電/
電歪膜5及び基板1への悪影響を抑制できることから、
より好適に用いられる。すなわち、結合層7Cを(1−
x)(Bi0.5Na0.5)TiO3−xKNbO3(xはモル分率で0.08
≦x≦0.5)とすることで、圧電/電歪膜5と同様の成分
を有することから、圧電/電歪膜5との密着性が高く、
また、ガラスを用いた場合に生じ易い異種元素の拡散に
よる問題が少なく、KNbO3を多く含むことから、基板と
の反応性が高く強固な結合が可能となる。また、(1−
x)(Bi0 .5Na0.5)TiO3−xKNbO3(xはモル分率で0.08
≦x≦0.5)は、圧電特性をほとんど示さないので、使用
時に下部電極4と補助電極8に生じる電界に対し、振動
や変位及び応力を発生しないため、安定した素子特性を
得ることができる。
Further, the piezoelectric / electrostrictive film 5 is formed by (Bi 0.5
Na 0.5 ) TiO 3 or a material containing it as a main component, or (1
-X) (Bi 0.5 Na 0.5 ) TiO 3 -x KNbO 3 (x is a mole fraction of 0
When ≦ x ≦ 0.06) or composed of a material mainly containing this, (1-x) (Bi 0. 5 Na 0.5) TiO 3 -xKNbO
The bonding layer 7C made of a material containing 3 (x is a mole fraction of 0.08 ≦ x ≦ 0.5) as a main component has high adhesiveness with both the piezoelectric / electrostrictive film 5 and the ceramic substrate 1, Piezoelectricity /
Since adverse effects on the electrostrictive film 5 and the substrate 1 can be suppressed,
It is more preferably used. That is, the coupling layer 7C is (1-
x) (Bi 0.5 Na 0.5 ) TiO 3 −xKNbO 3 (x is 0.08 in mole fraction)
≦ x ≦ 0.5), since it has the same components as the piezoelectric / electrostrictive film 5, the adhesiveness with the piezoelectric / electrostrictive film 5 is high,
Further, there is little problem due to diffusion of a different element that tends to occur when glass is used, and since a large amount of KNbO 3 is contained, it has high reactivity with the substrate and a strong bond is possible. In addition, (1-
x) (Bi 0 .5 Na 0.5 ) TiO 3 -xKNbO 3 (x is the mole fraction 0.08
Since ≦ x ≦ 0.5) shows almost no piezoelectric characteristics, vibration, displacement and stress do not occur with respect to the electric field generated in the lower electrode 4 and the auxiliary electrode 8 during use, so stable element characteristics can be obtained.

【0020】これらの結合層7Cの形成には、通常の厚
膜手法が用いられ、特にスタンピング法、スクリーン印
刷法、あるいは形成すべき部分の大きさが数十μm〜数
100μm程度の場合にはインクジェット法が好適に用い
られる。また、結合層7Cの熱処理が必要な場合には、
次の圧電/電歪膜5の形成前に熱処理されてもよいし、
圧電/電歪膜5の形成後同時に熱処理されてもよい。
A usual thick film method is used for forming these bonding layers 7C, and particularly, the stamping method, the screen printing method, or the size of the portion to be formed is several tens of μm to several tens.
In the case of about 100 μm, the inkjet method is preferably used. When heat treatment of the bonding layer 7C is required,
It may be heat-treated before forming the next piezoelectric / electrostrictive film 5,
Heat treatment may be performed simultaneously after the formation of the piezoelectric / electrostrictive film 5.

【0021】圧電/電歪膜5は、下部電極4、補助電極
8及び結合層7Cに跨るようにして、また、下部電極4
を覆う大きさで形成されている。圧電/電歪膜の材料と
しては、圧電/電歪効果を示す材料であればいずれの材
料でもよく、このような材料として、ジルコン酸鉛、チ
タン酸鉛、チタン酸ジルコン酸鉛(PZT)等の鉛系セラ
ミック圧電/電歪材料や、チタン酸バリウム及びこれを
主成分とするチタバリ系セラミック強誘電体や、ポリ弗
化ビニリデン(PVDF)に代表される高分子圧電体、ある
いは(Bi0.5Na0.5)TiO3に代表されるBi系セラミック圧
電体、Bi層状セラミックを挙げることができる。もちろ
ん、圧電/電歪特性を改善した、これらの混合物や、固
溶体及び、これらに添加物を添加せしめたものが用いら
れうることは言うまでもない。PZT系圧電体は、圧電特
性が高く、高感度検出が可能なセンサの材料として好適
に用いられる。本発明にあっては特に、チタン酸鉛、ジ
ルコン酸鉛、マグネシウムニオブ酸鉛、ニッケルニオブ
酸鉛から選ばれた少なくとも1種以上を主成分とする材
料で構成されることが、基板を構成する材料との反応性
が低く、熱処理中の成分の偏析が起き難く、組成を保つ
ための処理が良好に行われ得、目的とする組成、結晶構
造が得られやすいことから、より好適に用いられる。
The piezoelectric / electrostrictive film 5 extends over the lower electrode 4, the auxiliary electrode 8 and the coupling layer 7C, and the lower electrode 4
It is formed in a size to cover. The material of the piezoelectric / electrostrictive film may be any material as long as it exhibits a piezoelectric / electrostrictive effect. Examples of such materials include lead zirconate, lead titanate, and lead zirconate titanate (PZT). Lead-based ceramic piezoelectric / electrostrictive materials, barium titanate and titanium-based ceramic ferroelectrics containing them as a main component, polymer piezoelectric materials typified by polyvinylidene fluoride (PVDF), or (Bi 0.5 Na 0.5 ) Bi-based ceramic piezoelectric materials typified by TiO 3 and Bi layered ceramics can be mentioned. Of course, it goes without saying that a mixture thereof, a solid solution, or a material obtained by adding an additive thereto, which has improved piezoelectric / electrostrictive properties, can be used. The PZT-based piezoelectric body has high piezoelectric characteristics and is suitably used as a material for a sensor capable of highly sensitive detection. In the present invention, in particular, the substrate is composed of a material containing at least one selected from lead titanate, lead zirconate, lead magnesium niobate, and lead nickel niobate as a main component. It is more preferably used because it has low reactivity with materials, segregation of components during heat treatment does not easily occur, treatment for maintaining the composition can be favorably performed, and a target composition and crystal structure are easily obtained. .

【0022】また、下部電極4及び補助電極8に白金ま
たは白金を主成分とする合金が用いられる場合には、こ
れらとの接合性がより高く、素子の特性ばらつきを少な
くし、高い信頼性が得られることから、(Bi0.5Na0.5
TiO3またはこれを主成分とする材料が好適に用いられ
る。これらの中でも、特に、(1−x)(Bi0.5Na0.5)Ti
O3−xKNbO3(xはモル分率で0≦x≦0.06)またはこれ
を主成分とする材料が、比較的高い圧電特性を有するこ
とから、より好適に用いられる。
When platinum or an alloy containing platinum as a main component is used for the lower electrode 4 and the auxiliary electrode 8, the bondability with them is higher, the characteristic variation of the element is reduced, and the high reliability is obtained. Since it is obtained, (Bi 0.5 Na 0.5 ).
TiO 3 or a material containing this as a main component is preferably used. Among these, particularly (1-x) (Bi 0.5 Na 0.5 ) Ti
O 3 −xKNbO 3 (x is a mole fraction of 0 ≦ x ≦ 0.06) or a material containing this as a main component is more preferably used because it has relatively high piezoelectric characteristics.

【0023】このような圧電/電歪材料は、圧電/電歪
膜5として、下部電極4と補助電極8と同様に公知の各
種膜形成法により形成される。中でも、低コストの観点
からスクリーン印刷が好適に用いられる。
Such a piezoelectric / electrostrictive material is formed as the piezoelectric / electrostrictive film 5 by various known film forming methods like the lower electrode 4 and the auxiliary electrode 8. Among them, screen printing is preferably used from the viewpoint of low cost.

【0024】これにより形成された圧電/電歪膜5は必
要に応じて熱処理され、下部電極4、補助電極8及び結
合層7Cと、一体化される。本発明にあっては、素子の
特性ばらつきを抑え、信頼性を高くするために、圧電/
電歪膜4と下部電極5及び補助電極8、結合層7Cの接
合性を強固にする必要があるため、(Bi0.5Na0.5)TiO3
またはこれを主成分とする材料、特に、(1−x)(Bi
0.5Na0.5)TiO3−xKNbO 3(xはモル分率で0≦x≦0.0
6)またはこれを主成分とする材料を用い、900℃から140
0℃好ましくは1000℃から1300℃の温度で熱処理される
ことが好ましい。PZT系材料を用いた場合にも同様であ
る。この際、高温時に圧電/電歪膜5が不安定にならな
いように、圧電/電歪材料の蒸発源とともに雰囲気制御
を行いながら熱処理することが好ましい。
The piezoelectric / electrostrictive film 5 thus formed is indispensable.
If necessary, heat treatment is applied to lower electrode 4, auxiliary electrode 8 and connection.
It is integrated with the composite layer 7C. In the present invention,
In order to suppress characteristic variations and increase reliability, piezoelectric /
The contact between the electrostrictive film 4, the lower electrode 5, the auxiliary electrode 8 and the coupling layer 7C
Since it is necessary to strengthen compatibility, (Bi0.5Na0.5) TiO3
Or the material which has this as a main component, especially (1-x) (Bi
0.5Na0.5) TiO3-XKNbO 3(X is a mole fraction, 0 ≦ x ≦ 0.0
6) Or using a material containing this as a main component, 900 to 140
Heat treated at a temperature of 0 ° C, preferably 1000 ° C to 1300 ° C
It is preferable. The same applies when using PZT-based materials.
It At this time, the piezoelectric / electrostrictive film 5 should not become unstable at high temperature.
Control the atmosphere together with the evaporation source of the piezoelectric / electrostrictive material.
It is preferable to perform the heat treatment while performing.

【0025】さらに、このようにして形成された圧電/
電歪膜5の上に、上部電極6が、圧電/電歪膜5から補
助電極8にまで跨って連続的に形成されている。この上
部電極6の材質としては、圧電/電歪膜5との接合性の
高い導電性材料が用いられ、下部電極4及び補助電極8
と同様の膜形成法により形成される。さらに、上部電極
6は、膜形成後必要に応じて熱処理され、圧電/電歪膜
5及び補助電極8と接合され、一体構造とされる。この
ような熱処理がかならずしも必要でないことは下部電極
4と同様である。
Further, the piezoelectric / piezoelectric element thus formed
The upper electrode 6 is continuously formed on the electrostrictive film 5 from the piezoelectric / electrostrictive film 5 to the auxiliary electrode 8. As a material of the upper electrode 6, a conductive material having a high bonding property with the piezoelectric / electrostrictive film 5 is used, and the lower electrode 4 and the auxiliary electrode 8 are used.
It is formed by a film forming method similar to the above. Further, the upper electrode 6 is heat-treated as necessary after the film formation and is joined to the piezoelectric / electrostrictive film 5 and the auxiliary electrode 8 to form an integrated structure. Similar to the lower electrode 4, such heat treatment is not always necessary.

【0026】なお、下部電極4、接合層、圧電/電歪膜
5、上部電極6が熱処理により接合される場合には、そ
れぞれを形成の都度熱処理してもよいし、それぞれを順
次膜形成後、同時に熱処理してもよい。熱処理する際、
良好な接合性や構成元素の拡散による変質を抑制するた
めに、熱処理温度が適切に選ばれるのは言うまでもな
い。また、図1では空洞部10に貫通孔9を形成してい
るが、素子が流体に接触する空洞部10以下の構造は、
蓋部の無い単純なキャビティ構造等、どのような構造で
もよく、限定しない。
When the lower electrode 4, the bonding layer, the piezoelectric / electrostrictive film 5, and the upper electrode 6 are bonded by heat treatment, they may be heat-treated each time they are formed, or they may be sequentially formed after film formation. At the same time, heat treatment may be performed. When heat treatment
It goes without saying that the heat treatment temperature is appropriately selected in order to obtain good bondability and suppress alteration due to diffusion of constituent elements. Although the through hole 9 is formed in the cavity 10 in FIG. 1, the structure of the cavity 10 and below in which the element contacts the fluid is
Any structure such as a simple cavity structure without a lid may be used without limitation.

【0027】[0027]

【発明の効果】本発明による圧電/電歪膜型素子にあっ
ては、下部電極と補助電極間において、圧電/電歪膜と
基板とが完全結合状態であるため、振動のばらつきや経
時変化が無く、振動における電気的定数の検知により流
体特性や液体/気体を判別する素子、あるいは音圧や微
小重量、加速度等の測定素子、さらにはアクチュエータ
素子として、好適な素子が得られることとなる。
In the piezoelectric / electrostrictive film type element according to the present invention, since the piezoelectric / electrostrictive film and the substrate are completely coupled between the lower electrode and the auxiliary electrode, there are variations in vibration and changes with time. Therefore, a suitable element can be obtained as an element for discriminating fluid characteristics or liquid / gas by detecting an electric constant in vibration, a measuring element for sound pressure, minute weight, acceleration, etc., and an actuator element. .

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のセンサ用圧電/電歪膜型素子の実施形
態を示す説明図である。
FIG. 1 is an explanatory view showing an embodiment of a piezoelectric / electrostrictive film type element for sensor of the present invention.

【図2】従来のセンサ用圧電/電歪膜型素子の実施形態
を示す説明図である。
FIG. 2 is an explanatory diagram showing an embodiment of a conventional piezoelectric / electrostrictive film type element for a sensor.

【符号の説明】[Explanation of symbols]

1・・基板、2・・厚肉部、3・・ダイヤフラム部、4
・・下部電極、5・・圧電/電歪膜、6・・上部電極、
7A,7B・・不完全結合部、7C・・結合層、8・・
補助電極、9・・貫通孔、10・・空洞部。
1 ... Board, 2 ... Thick part, 3 ... Diaphragm part, 4
..Lower electrode, 5 ... Piezoelectric / electrostrictive film, 6 ... Upper electrode,
7A, 7B ... Incompletely joined part, 7C ... Joined layer, 8 ...
Auxiliary electrode, 9 ... through hole, 10 ... cavity.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 41/09 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) H01L 41/09

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 厚肉部を周縁部に持つ薄肉ダイヤフラム
部を有するセラミックスからなる基板に、下部電極及び
補助電極と、圧電/電歪膜と、上部電極を順次積層させ
た圧電/電歪膜型素子であって、 下部電極と補助電極間に、絶縁体からなる結合層を設け
ることにより、圧電/電歪膜とセラミック基板を完全結
合状態としたことを特徴とする圧電/電歪膜型素子。
1. A piezoelectric / electrostrictive film in which a lower electrode and an auxiliary electrode, a piezoelectric / electrostrictive film, and an upper electrode are sequentially laminated on a substrate made of ceramics having a thin diaphragm part having a thick part on a peripheral portion. Piezoelectric / electrostrictive film type, characterized in that the piezoelectric / electrostrictive film and the ceramic substrate are completely bonded by providing a bonding layer made of an insulator between the lower electrode and the auxiliary electrode. element.
【請求項2】 前記圧電/電歪膜が、チタン酸鉛、ジル
コン酸鉛、マグネシウムニオブ酸鉛、ニッケルニオブ酸
鉛から選ばれた少なくとも1種以上を主成分とする材料
で構成された請求項1記載の圧電/電歪膜型素子。
2. The piezoelectric / electrostrictive film is made of a material containing at least one selected from lead titanate, lead zirconate, lead magnesium niobate, and lead nickel niobate as a main component. 1. The piezoelectric / electrostrictive film type device according to 1.
【請求項3】 前記圧電/電歪膜が、(Bi0.5Na0.5)TiO3
またはこれを主成分とする材料で構成された請求項1記
載の圧電/電歪膜型素子。
3. The piezoelectric / electrostrictive film is (Bi 0.5 Na 0.5 ) TiO 3
Alternatively, the piezoelectric / electrostrictive film type element according to claim 1, which is made of a material containing this as a main component.
【請求項4】 前記圧電/電歪膜が、(1−x)(Bi0.5
Na0.5)TiO3−xKNbO 3(xはモル分率で0≦x≦0.06)ま
たはこれを主成分とする材料で構成された請求項3記載
の圧電/電歪膜型素子。
4. The piezoelectric / electrostrictive film is (1-x) (Bi0.5
Na0.5) TiO3-XKNbO 3(X is a mole fraction 0 ≦ x ≦ 0.06)
Or composed of a material containing this as a main component.
Piezoelectric / electrostrictive film type device.
【請求項5】 前記絶縁体からなる結合層が、該圧電/
電歪膜の熱処理温度以上の軟化点を有するガラスである
ことを特徴とする請求項1乃至4のいずれかに記載の圧
電/電歪膜型素子。
5. The piezoelectric / coupling layer comprising the insulating layer
The piezoelectric / electrostrictive film type element according to any one of claims 1 to 4, which is a glass having a softening point equal to or higher than a heat treatment temperature of the electrostrictive film.
【請求項6】 前記絶縁体からなる結合層が、(1−
x)(Bi0.5Na0.5)TiO3−xKNbO3(xはモル分率で0.08
≦x≦0.5)を主成分とする材料で構成されていることを
特徴とする請求項3又は4に記載の圧電/電歪膜型素
子。
6. The bonding layer formed of the insulator is (1-
x) (Bi 0.5 Na 0.5 ) TiO 3 −xKNbO 3 (x is 0.08 in mole fraction)
The piezoelectric / electrostrictive film type element according to claim 3 or 4, wherein the piezoelectric / electrostrictive film type element is made of a material containing ≤x≤0.5) as a main component.
JP2000275137A 2000-09-11 2000-09-11 Piezoelectric / electrostrictive film type element Expired - Fee Related JP3465675B2 (en)

Priority Applications (4)

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US09/948,077 US6495945B2 (en) 2000-09-11 2001-09-06 Piezoelectric/electrostrictive element
DE60127780T DE60127780T2 (en) 2000-09-11 2001-09-10 Piezoelectric / electrostrictive device
EP01307651A EP1187234B1 (en) 2000-09-11 2001-09-10 Piezoelectric/electrostrictive element

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EP1187234A2 (en) 2002-03-13
DE60127780T2 (en) 2008-01-24
EP1187234A3 (en) 2004-09-01
US20020070639A1 (en) 2002-06-13

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